Nanolithography Based on Photocatalysis of TiO2 Using an Atomic Force Microscope
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- Kobayashi Kenkichiro
- Department of Materials Science, Faculty of Engineering, Shizuoka University
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- Tomita Yasumasa
- Department of Materials Science, Faculty of Engineering, Shizuoka University
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- Maeda Yasuhiha
- Department of Materials Science, Faculty of Engineering, Shizuoka University
Bibliographic Information
- Other Title
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- Nanolithography Based on Photocatalysis of TiO<sub>2</sub> Using an Atomic Force Microscope
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Abstract
Stearic-acid films have been deposited on single-crystalline TiO2(110) substrates by vacuum evaporation. No changes are seen in atomic-force microscope (AFM) topographic images of the stearic-acid films after a scan at a bias voltage of −10 to 10 V in the dark. Similarly, ultraviolet irradiation at bias voltage < 0.0 V brings about no changes in the AFM topographic images. In contrast, a rectangular hole with a size of 200nm×200nm is formed in the stearic-acid film after a scan at 10 V under ultraviolet irradiation. No current flows on the stearic-acid film, whereas an appreciable current flows at −2.0 V at the rectangular hole. Photocatalytic decomposition of the stearic-acid films deposited on the TiO2(110) substrates occurs at the area in which a bias voltage of 10 V is applied. The letters “YT” with a line width of 30 nm are drawn in the stearic-acid film by AFM-based photocatalysis.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 44 (7B), 5829-5831, 2005
The Japan Society of Applied Physics
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Details
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- CRID
- 1390001206265150208
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- NII Article ID
- 210000058556
- 10016678337
- 130004534516
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- NII Book ID
- AA10457675
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- ISSN
- 13474065
- 00214922
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- NDL BIB ID
- 7379501
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed