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MIYAMOTO Nobuo  宮本 信雄

ORCIDConnect your ORCID iD *help
Researcher Number 00006222
Affiliation (based on the past Project Information) *help 1987 – 1995: 東北大学, 電気通信研究所, 教授
1986: 東北大学, 電気通信研究所・固体電子工学部門, 教授
Review Section/Research Field
Principal Investigator
反応工学 / Applied materials science/Crystal engineering / 物理計測・光学
Except Principal Investigator
電子材料工学 / Electronic materials/Electric materials / 計測・制御工学
Keywords
Principal Investigator
光電子分光 / Si (100) / 気相成長 / GaAs / Si, / thin film, / epitaxial growth, / photon-induced surface reaction, / PSD, / UPS, … More / synchrotron radiation, / 砒化ガリウム / シリコン / 光CVD / 光刺激脱離 / シンクロトロン放射光 / 表面光化学反応 / 結晶成長 / photoelectron oscillation / gas-source epitaxy / in-situ observation / hydrogen desorption / photoelectron spectroscopy / epitaxial growth / light-assisted process / Si(100) / 光電子強度振動 / その場観察 / 水素脱離反応 / 紫外光電子分光 / 半導体結晶成長 / 光励起プロセス / mirror-polished surface / Titan Sublimation Pump / Aluminum-Alloy Vacuum System / Extrahigh Vacuum / ガス放出率 / 超高真空 / 鏡面化表面処理 / チタンサブリメ-ションポンプ / アルミニウム真空 / 極高真空 … More
Except Principal Investigator
半導体表面 / 放射光 / 拡散 / X線光電子回折 / Ge / GaAs / X線光電子回析法 / オーミック接触 / 砒化カリウム / Photodecomposition / Layred structure / Synchrotron radiation / Ultraviolet light / Ultra-thin film / Organometallic compound / Photo-induced catalytic reaction / 光分解反応 / 層状構造 / 紫外光 / 超薄膜 / 有機金属 / 光触媒反応 / Semiconductor fabrication process / Solid-liquid interface / In-situ monitoring / Multiple internal reflection / Atomic scale monitoring / Semiconductor surface / infrared reflection Spectroscopy / 表面処理 / 大気酸化 / 評価装置 / 原子制御 / 赤外分光 / 半導体プロセス / 固液界面 / その場観察 / 多重内部反射 / 原子制御計測 / 赤外反射分光 / Photo-Induced Reaction / Semiconductor Surface / Low-Temperature Process / Dielectric Film / Synchrotron Radiation / 放射光励起 / CVD / 光励起反応 / 低温薄膜形成 / 高誘電体薄膜 Less
  • Research Projects

    (7 results)
  • Co-Researchers

    (6 People)
  •  The Study of Synchrotron-Radiation-Stimulated Surface Chemical Reactiions on Semiconductors by Surface Electron SpectroscopyPrincipal Investigator

    • Principal Investigator
      SUEMITSU Maki, 宮本 信雄
    • Project Period (FY)
      1994 – 1996
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Research Field
      Applied materials science/Crystal engineering
    • Research Institution
      Tohoku University
  •  Fabrication of Multi-Layred Thin Film Structure by Photo-induced Catalytic Reactions of Organometallic Compounds

    • Principal Investigator
      NIWANO Michio
    • Project Period (FY)
      1994 – 1996
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Electronic materials/Electric materials
    • Research Institution
      Tohoku University
  •  Development of Atomic-Scale, Infrared Reflection Spectroscopic Techniques for Characterization of Semiconductor Surfaces

    • Principal Investigator
      NIWANO Michio
    • Project Period (FY)
      1993 – 1995
    • Research Category
      Grant-in-Aid for Developmental Scientific Research (B)
    • Research Field
      計測・制御工学
    • Research Institution
      Tohoku University
  •  Low-Temperature Deposition of Dielectric Films Using Synchrotron Radiation-Assisted Gas-Source CVD

    • Principal Investigator
      HIWANO Michio
    • Project Period (FY)
      1991 – 1993
    • Research Category
      Grant-in-Aid for General Scientific Research (B)
    • Research Field
      電子材料工学
    • Research Institution
      Tohoku University
  •  Development of aluminum-alloy extrahigh-vacuum (XHV) systems featured by new surface treatmentsPrincipal Investigator

    • Principal Investigator
      MIYAMOTO Nobuo
    • Project Period (FY)
      1990 – 1991
    • Research Category
      Grant-in-Aid for Developmental Scientific Research (B)
    • Research Field
      物理計測・光学
    • Research Institution
      Tohoku University
  •  Chemical Vapor Deposition of Epitaxial Thin Films by Synchrotron-Radiation-Assisted Surface ReactionPrincipal Investigator

    • Principal Investigator
      MIYAMOTO Nobuo
    • Project Period (FY)
      1988 – 1990
    • Research Category
      Grant-in-Aid for General Scientific Research (B)
    • Research Field
      反応工学
    • Research Institution
      Tohoku University
  •  X線光電子回析法によるGaAsのオーミック接触形成機構の研究

    • Principal Investigator
      高桑 雄二
    • Project Period (FY)
      1985 – 1987
    • Research Category
      Grant-in-Aid for General Scientific Research (C)
    • Research Field
      電子材料工学
    • Research Institution
      Tohoku University
  • 1.  HIWANO Michio (20134075)
    # of Collaborated Projects: 5 results
    # of Collaborated Products: 0 results
  • 2.  ENTA Yoshiharu (20232986)
    # of Collaborated Projects: 4 results
    # of Collaborated Products: 0 results
  • 3.  SUEMITSU Maki (00134057)
    # of Collaborated Projects: 3 results
    # of Collaborated Products: 0 results
  • 4.  TAKAKUWA Yuji (20154768)
    # of Collaborated Projects: 3 results
    # of Collaborated Products: 0 results
  • 5.  WATANABE Fumio
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 6.  MIYAMOTO Kazuo
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results

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