SHIRAI Masamitsu 白井正充

… Alternative Names

白井正光シライマサミツ

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Researcher Number	00081331
Other IDs
Affiliation (based on the past Project Information) *help	2014: 大阪府立大学, 工学(系)研究科, 教授 2011 – 2012: 大阪府立大学, 工学(系)研究科(研究院), 教授 2011: 大阪府立大学, 大学院・工学研究科, 教授 2009 – 2011: Osaka Prefecture University, 工学研究科, 教授 2005: Osaka Prefecture University, Department of Applied Chemistry, Professor, 工学研究科, 教授 … More 2004: 大阪府立大学, 大学院・工学研究科, 教授 2000 – 2003: Osaka Prefecture University, Department of Applied Chemistry Professor, 工学研究科, 教授 1999: 大阪府立大学, 工学部, 教授 1995: University of Osaka Prefecture, Department of Applied Chemistry, Associate Professor, 工学部, 助教授 1994: 大阪府立大学, 工学部, 講師 1987: University of Osaka Prefecture, 工学部, 助手 1986: 阪府大, 工学部, 助手 Less
Review Section/Research Field	Principal Investigator 高分子合成 / Polymer/Textile materials / 高分子合成 Except Principal Investigator Organic industrial materials / Polymer/Textile materials
Keywords	Principal Investigator 光酸発生剤 / フォトレジスト / 光架橋 / 光塩基発生剤 / Photoacid generator / Photoresist / 表面イメージング / 表面修飾 / 感光性高分子 / レプリカモールド … More / 分解型光硬化樹脂 / UVインプリント / Cation binding / Cinnamic acid ester / Photosensitive polymer / Photodimerization / Poly crown ether / アルカリカチオン捕捉 / 非環状ポリエーテル / グライム / 光二量化反応 / 感光性ポリマー / ケイ皮酸エステル / カチオン捕捉 / ポリベンゾジグライム / 光二量化 / ポリクラウンエーテル / Rework / Photocuring / Epoxy resin / Redissolution / Thermal degradation / Photocrossliking / Photobase Generator / Photoacid Generator / ネガ型フォトレジスト / 高分子の熱分解 / 光架橋高分子 / エポキシ / リワーク / 光硬化 / エポキシ樹脂 / 再溶解 / 熱分解 / Acyl oxime / Imino Sulfonate / Photocrosslinking / VUV light / Surface Imaging / Photobase generator / 表面修飾レジスト / 146nm光 / オキシムエステル / ドライ現像 / ポシ型フォトレジスト / アシルオキシム / イミノスルホナート / 真空紫外光 / Surface imaging / Surface Modification / Photosensitive Polymer / ポリシロキサン / 光反応性高分子 / 表面特性 / ＵＶインプリント / 複製樹脂モールド / 分解性光硬化樹脂 / 離型剤フリー / 樹脂モールド / 環境調和型硬化樹脂 / 低収縮性モノマー / 多官能モノマー / リワーク樹脂 / 分解型硬化樹脂 / UV硬化樹脂 / 光インプリント材料 / 犠牲材料 / 架橋と分解 / 光硬化樹脂 / 高分子材料合成 … More Except Principal Investigator crosslinking / UV curing / sensitization / tertiary amine / photo-reaction / carboxylate / quaternary ammonium salt / photobase generator / チオシアナート / 硬化剤 / エポキシ樹脂 / 熱安定性 / ベンゾエート / 架橋 / UV硬化 / 増感 / 第三級アミン / 光反応 / カルボキシラート / 第四級アンモニウム塩 / 光塩基発生剤 / モールド / ハイブリッド光硬化系 / 表面自由エネルギー / インプリント / レジスト / 連鎖長 / チオール/エン / デュアル光硬化系 / 樹脂モールド / デュアル硬化 / 光開始剤 / 光分解 / 光重合 / 光硬化樹脂 Less

Design concept of photosenitive polymers irradiated by multiple light sources
- Principal Investigator
  
  OKAMURA Haruyuki
- Project Period (FY)
  2012 – 2014
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Polymer/Textile materials
- Research Institution
  Osaka Prefecture University
Development of De-molding Agent-Free Resin Mold for UV NanoimprintPrincipal Investigator
- Principal Investigator
  
  SHIRAI Masamitsu
- Project Period (FY)
  2011 – 2012
- Research Category
  
  Grant-in-Aid for Challenging Exploratory Research
- Research Field
  
  Polymer/Textile materials
- Research Institution
  Osaka Prefecture University
UV Curable Resins with Degradable Property and Their Application for Sacrificial MaterialsPrincipal Investigator
- Principal Investigator
  
  SHIRAI Masamitsu
- Project Period (FY)
  2009 – 2011
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Polymer/Textile materials
- Research Institution
  Osaka Prefecture University
Development of Photobase Generators for Tertiary Amines and Its Application to Curing Systems
- Principal Investigator
  
  SUYAMA Kanji
- Project Period (FY)
  2003 – 2005
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Organic industrial materials
- Research Institution
  Osaka Prefecture University
Studies on Environmentally Friendly Photocrosslinkable PolymersPrincipal Investigator
- Principal Investigator
  
  SHIRAI Masamitsu
- Project Period (FY)
  2001 – 2003
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  高分子合成
- Research Institution
  Osaka Prefecture University
Synthesis of Photoacid-and Photobase-Generating Polymers and Its ApplicationsPrincipal Investigator
- Principal Investigator
  
  SHIRAI Masamitsu
- Project Period (FY)
  1999 – 2000
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  高分子合成
- Research Institution
  Osaka Prefecture University
Chemical Modification of Surface of Polymer Thin Film Using Photochemical Reaction and Its ApplicationPrincipal Investigator
- Principal Investigator
  
  SHIRAI Masamitsu
- Project Period (FY)
  1994 – 1995
- Research Category
  
  Grant-in-Aid for General Scientific Research (C)
- Research Field
  
  高分子合成
- Research Institution
  University of Osaka Prefecture
Synthesis of Photodimerizable Poly(crown ether)s and Their ApplicationPrincipal Investigator
- Principal Investigator
  
  SHIRAI Masamitsu
- Project Period (FY)
  1986 – 1987
- Research Category
  
  Grant-in-Aid for General Scientific Research (C)
- Research Field
  
  高分子合成
- Research Institution
  University of Osaka Prefecture

All 2015 2014 2013 2012 2011 2010 2009 2006 2005 2004 2003 Other

All Journal Article Presentation Book

[Book] 高分子の架橋と分解III2012
- Author(s)
  白井正充(分担執筆)
- Total Pages
  14
- Publisher
  シーエムシー
- Data Source
  KAKENHI-PROJECT-21350128
[Book] 光学用粘・接着剤と貼り合わせ技術2012
- Author(s)
  白井正充
- Publisher
  S&T出版
- Data Source
  KAKENHI-PROJECT-23655218
[Book] 光学用粘・接着剤と貼り合わせ技術2012
- Author(s)
  白井正充
- Publisher
  Ｓ＆Ｔ出版
- Data Source
  KAKENHI-PROJECT-23655218
[Book] 高機能アクリル樹脂の開発と応用2011
- Author(s)
  白井正充
- Publisher
  シーエムシー出版
- Data Source
  KAKENHI-PROJECT-23655218
[Book] 高分子の架橋と分解III2011
- Author(s)
  白井正充
- Publisher
  シーエムシー
- Data Source
  KAKENHI-PROJECT-21350128
[Book] 高機能アクリル樹脂の開発と応用2011
- Author(s)
  白井正充
- Publisher
  シーエムシー
- Data Source
  KAKENHI-PROJECT-21350128
[Book] 高機能アクリル樹脂の開発と応用2011
- Author(s)
  白井正充（分担執筆）
- Total Pages
  10
- Publisher
  シーエムシー
- Data Source
  KAKENHI-PROJECT-23655218
[Book] 高分子の架橋と分解III2011
- Author(s)
  白井正充
- Publisher
  シーエムシー出版
- Data Source
  KAKENHI-PROJECT-23655218
[Book] 高分子の架橋と分解III2011
- Author(s)
  白井正充（分担執筆）
- Total Pages
  14
- Publisher
  シーエムシー
- Data Source
  KAKENHI-PROJECT-23655218
[Book] 高機能アクリル樹脂の開発と応用2011
- Author(s)
  白井正充(分担執筆)
- Total Pages
  10
- Publisher
  シーエムシー
- Data Source
  KAKENHI-PROJECT-21350128
[Book] LED-UV硬化技術と硬化材料の現状と展望-発光ダイオードを用いた紫外線硬化技術2010
- Author(s)
  白井正充
- Publisher
  シーエムシー
- Data Source
  KAKENHI-PROJECT-21350128
[Book] 総説エポキシ樹枝最近の進歩I2009
- Author(s)
  白井正充
- Publisher
  エポキシ樹脂技術協会
- Data Source
  KAKENHI-PROJECT-21350128
[Book] 総説エポキシ樹枝最近の進歩I2009
- Author(s)
  白井正充
- Total Pages
  12
- Publisher
  エポキシ樹脂技術協会
- Data Source
  KAKENHI-PROJECT-21350128
[Book] 高分子の架橋・分解技術-グリーンケミストリー2009
- Author(s)
  白井正充
- Total Pages
  26
- Publisher
  シーエムシー出版
- Data Source
  KAKENHI-PROJECT-21350128
[Book] フォトレジスト材料開発の新展開2009
- Author(s)
  白井正充
- Publisher
  シーエムシー
- Data Source
  KAKENHI-PROJECT-21350128
[Book] Basics and Applications of Photopolymerization Reactions2009
- Author(s)
  Masamitsu Shirai
- Total Pages
  10
- Publisher
  Research Signpost, India
- Data Source
  KAKENHI-PROJECT-21350128
[Book] 高分子の架橋・分解技術-グリーンケミストリー2009
- Author(s)
  白井正充
- Publisher
  シーエムシー
- Data Source
  KAKENHI-PROJECT-21350128
[Book] フォトレジスト材料開発の新展開2009
- Author(s)
  白井正充
- Total Pages
  15
- Publisher
  シーエムシー出版
- Data Source
  KAKENHI-PROJECT-21350128
[Book] 高分子の架橋と分解-環境保全を目指して-2004
- Author(s)
  角岡正弘, 白井正充監修
- Total Pages
  299
- Publisher
  シーエムシー出版
- Data Source
  KAKENHI-PROJECT-15550168
[Book] 高分子の架橋と分解 -環境保全を目指して-2004
- Author(s)
  白井正充ほか
- Total Pages
  299
- Publisher
  シーエムシー出版
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15550168
[Journal Article] i-Line Sensitive PAGs and Their Application to Photocrosslinking System2015
- Author(s)
  H. Okamura, T. Ashida, S. Kodama, and M. Shirai
- Journal Title
  
  Macromol. Symp.
  
  Volume: 349 Issue: 1 Pages: 29-33
- DOI
  10.1002/masy.201400002
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24550260
[Journal Article] i-Line Sensitive Photoacid Generators2013
- Author(s)
  H. Okamura and M. Shirai
- Journal Title
  
  Trends Photochem. Photobiol.
  
  Volume: 15 Pages: 51-61
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24550260
[Journal Article] Hybrid UV Curing System Using Methacrylates Having a Chalcone Moiety2013
- Author(s)
  H. Okamura, Y. Ueda, and M. Shirai
- Journal Title
  
  J. Photopolym. Sci. Technol.,
  
  Volume: 26 Pages: 245-248
- NAID
  130004465028
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24550260
[Journal Article] A Reworkable Photothermal Dual-curing System2013
- Author(s)
  M. Adachi, H. Okamura, and M. Shirai
- Journal Title
  
  Chem. Lett.
  
  Volume: 42 Issue: 9 Pages: 1056-1058
- DOI
  10.1246/cl.130415
- NAID
  10031194340
- ISSN
  0366-7022, 1348-0715
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24550260
[Journal Article] ヘミアセタールエステル部位を有する新規メタクリラートの合成とリワーク型樹脂への応用2013
- Author(s)
  岡村晴之、初瀬達也、白井正充
- Journal Title
  
  ネットワークポリマー
  
  Volume: 35 Pages: 2-7
- NAID
  130004648286
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-23655218
[Journal Article] ヘミアセタールエステル部位を有する新規メタクリラートの合成とリワーク型樹脂への応用2013
- Author(s)
  岡村晴之、初瀬達也、白井正充
- Journal Title
  
  ネットワークポリマー
  
  Volume: 35 Pages: 2-7
- NAID
  130004648286
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24550260
[Journal Article] カルコン部位含有ジメタクリラートの合成とそのハイブリッドUV硬化系への応用2013
- Author(s)
  岡村晴之，上田勇太，白井正充
- Journal Title
  
  ネットワークポリマー
  
  Volume: 34 Pages: 196-206
- NAID
  130004648300
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24550260
[Journal Article] 分解性を有する架橋・硬化ポリマーの合成と応用2012
- Author(s)
  白井正充
- Journal Title
  
  高分子
  
  Volume: 61 Pages: 865-867
- NAID
  10031117777
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-23655218
[Journal Article] Photoacid- and Photobase-Generating Monomers for Surface Modification of Cured Resin : Application to Novel Resin Mold for UV Imprint2012
- Author(s)
  S. Horii, K. Yamane, H. Okamura, M. Shirai
- Journal Title
  
  J. Photopolym. Sci. Technol
  
  Volume: 25 Pages: 735-740
- NAID
  130004833509
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-23655218
[Journal Article] Photo-cross-linking and De-cross-linking of modified Polystyrenes having Degradable Linkages2011
- Author(s)
  H. Okamura, E. Yamaguchi, M. Shirai
- Journal Title
  
  React. Funct. Polym
  
  Volume: 71巻 Pages: 480-488
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] Reworkable Dimethacrylates with Low Shrinkage and Their Application to UV Imprint Lithography2011
- Author(s)
  D.Matsukawa, H.Okamura, M.Shirai
- Journal Title
  
  J.Mater.Chem.
  
  Volume: 21 Pages: 10407-10414
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] リワーク型低収縮ジメタクリラートとそのＵＶインプリント材料への応用2011
- Author(s)
  岡村晴之、白井正充
- Journal Title
  
  ネットワークポリマー
  
  Volume: 33 Pages: 74-78
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-23655218
[Journal Article] Reworkable Dimethacrylates with Low Shrinkage and Their Application to UV Imprint Lithography2011
- Author(s)
  D. Matsukawa, H. Okamura, M. Shirai
- Journal Title
  
  J. Mater. Chem
  
  Volume: 21巻 Pages: 10407-10414
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] リワーク型低収縮ジメタクリラートとそのUVインプリント材料への応用2011
- Author(s)
  岡村晴之、白井正充
- Journal Title
  
  ネットワークポリマー
  
  Volume: 33巻 Pages: 74-78
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] Photo-cross-linking of Modified Polystyrene Having Degradable Linkages2011
- Author(s)
  H. Okamura, E. Yamaguchi, M. Shirai
- Journal Title
  
  React. Func. Polym
  
  Volume: 71 Pages: 480-488
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-23655218
[Journal Article] Photo-cross-linking and De-cross-linking of Modified Polystyrenes having Degradable Linkages2011
- Author(s)
  H. Okamura, E. Yamaguchi, M. Shirai
- Journal Title
  
  React. Func. Polym.
  
  Volume: 71 Pages: 480-488
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-23655218
[Journal Article] リワーク型低収縮性ジメタクリラートとそのUVインプリント材料への応用2011
- Author(s)
  岡村晴之、白井正充
- Journal Title
  
  ネットワークポリマー
  
  Volume: 33 Pages: 74-78
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-23655218
[Journal Article] Reworkable Dimethacrylates with Low Shrinkage and Their Application to UV Imprint Lithography2011
- Author(s)
  D.D. Matsukawa, H. Okamura, M. Shirai
- Journal Title
  
  J. Mater. Chem.,
  
  Volume: 21 Pages: 10407-10417
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-23655218
[Journal Article] Photo-cross-linking and De-cross-linking of modified Polystyrenes having Degradable Linkages2011
- Author(s)
  H.Okamura, E.Yamaguchi, M.Shirai
- Journal Title
  
  React.Funct.Polym.
  
  Volume: 71 Pages: 480-488
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] Reworkable Dimethacrylates with Low Shrinkage and Their Application to UV Imprint Lithography2011
- Author(s)
  D. Matsukawa, H. Okamura, M. Shirai
- Journal Title
  
  J. Mater. Chem.
  
  Volume: 21 Pages: 10407-10417
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-23655218
[Journal Article] Analysis of Chain Propagation in UV Curing Using Reworkable Resin2010
- Author(s)
  D.Matsukawa, H.Okamura, M.Shirai
- Journal Title
  
  J.Photopolym.Sci.Technol.
  
  Volume: 23 Pages: 125-128
- NAID
  130004833323
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] Analysis of Chain Propagation in UV Curing Using Reworkable Resin2010
- Author(s)
  D. Matsukawa, H. Okamura, M. Shirai
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 23巻 Pages: 125-128
- NAID
  130004833323
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] Preparation of Replicated Resin Mold for UV Nanoimprint Using Reworkable Dimethacrylate2010
- Author(s)
  D. Matsukawa, H. Okamura, M. Shirai
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 23巻 Pages: 781-787
- NAID
  130004833379
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] Preparation of Replicated Resin Mold for UV Nanoimprint Using Reworkable Dimethacrylate2010
- Author(s)
  D.Matsukawa, H.Okamura, M.SHirai
- Journal Title
  
  J.Photopolym.Sci.Technol.
  
  Volume: 23 Pages: 781-787
- NAID
  130004833379
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] Novel Photo-Cross-Linkable Dendrimers Having Thermal De-Cross-linking Properties2010
- Author(s)
  H.Okamura, M.Shirai
- Journal Title
  
  Polymer
  
  Volume: 51 Pages: 5087-5094
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] Novel Photo-Cross-Linkable Dendrimers Having Thermal De-Cross-linking Properties2010
- Author(s)
  H. Okamura, M. Shirai
- Journal Title
  
  Polymer
  
  Volume: 51巻 Pages: 5087-5094
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] Novel Reworkable Resins : Thermo-and Photo-Curable Di(meth) acrylates2009
- Author(s)
  D. Matsukawa, H. Okamura, M. Shirai
- Journal Title
  
  Polym. International
  
  Volume: 59巻 Pages: 263-268
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] Photo-and Thermal Curing of Trifunctional Methacrylate with Degradable Property2009
- Author(s)
  H. Okamura, M. Shirai
- Journal Title
  
  Res. Chem. Intermediate
  
  Volume: 35巻 Pages: 865-878
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] A UV Curable Resin with Reworkable Properties : Application to Imprint Lithography2009
- Author(s)
  D. Matsukawa, H. Okamura, M. Shirai
- Journal Title
  
  J. Mater. Chem.
  
  Volume: 19巻 Pages: 4085-4087
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] Photocurable Oligo(hemiacetal ester) s Having Methacrylate Side Chains2009
- Author(s)
  D. Matsukawa, H. Okamura, M. Shirai
- Journal Title
  
  Eur. Polym. J.
  
  Volume: 45巻 Pages: 2087-2095
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] アニオン硬化2009
- Author(s)
  白井正充
- Journal Title
  
  接着の技術 29
  
  Pages: 8-14
- Data Source
  KAKENHI-PROJECT-21350128
[Journal Article] Photochemical Formation of Ammonium / Thiolate Complexes from Quaternary Ammonium Thiocyanates and Its Use in Crosslinking of Polymers2006
- Author(s)
  K.Suyama, K.Fuke, T.Yamamoto, Y.Kurokawa, M.Tsunooka, M.Shirai
- Journal Title
  
  J.Photochem.Photobiol.A : Chem. 179
  
  Pages: 87-94
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15550168
[Journal Article] Thermally Stable Carbamates as Novel Photobase Generator2005
- Author(s)
  K.Suyama, S.Nakao, M.Shirai
- Journal Title
  
  J.Photopolym.Sci.Technol 18
  
  Pages: 141-148
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15550168
[Journal Article] Crosslinking of Oligomers Bearing Carbamoyloxyimino Groups with Their Photochemical and Thermal Reactions2004
- Author(s)
  K.Suyama, H.Iriyama, M.Tsunooka, M.Shirai
- Journal Title
  
  J.Polym.Sci.Part A : Polym.Chem. 42
  
  Pages: 2612-2620
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15550168
[Journal Article] Effect of Anions on Photoreactivity and Stability of Quaternary Ammonium Salts as Photobase Generators2004
- Author(s)
  K.Suyama, K.Fuke, M.Shirai
- Journal Title
  
  J.Photopolym.Sci.Technol. 17
  
  Pages: 15-18
- NAID
  130004832967
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15550168
[Journal Article] Crosslinking of Oligomers Utilizing Sensitized Photoreaction at 366 nm and Thermal Decomposition of Pendant Carbamoyloxyimino Groups2004
- Author(s)
  K.Suyama, H.Iriyama, M.Tsunooka, M.Shirai
- Journal Title
  
  J.Photopolym.Sci.Technol. 17
  
  Pages: 707-712
- NAID
  130004832990
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15550168
[Journal Article] Development of Photoacid and Photobase Generators and Their Use for Design of Novel Photopolymers2003
- Author(s)
  M.Tsunooka, K.Suyama, H.Okamura, M.Shirai
- Journal Title
  
  Nihon Shashin Gakkai Shi (in Japanese) 66
  
  Pages: 355-366
- NAID
  130004284510
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15550168
[Journal Article] Visible Light-Induced Formation of Pendant Basic Groups by Using Triplet Sensitizers
- Author(s)
  T.Ohba, K.Suyama, M.Shirai
- Journal Title
  
  React.Funct.Polym. (in press)
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15550168
[Presentation] リワーク型ジメタクリレートを用いたチオール・エン光ラジカル硬化系の重合連鎖解2014
- Author(s)
  岡村晴之，山垣将，白井正充，松本章一
- Organizer
  高分子学会第61回高分子討論会
- Place of Presentation
  長崎大学、長崎
- Year and Date
  2014-09-25
- Data Source
  KAKENHI-PROJECT-24550260
[Presentation] Dual UV curing system using a dimethacrylate containing a chalcone moiety2014
- Author(s)
  H. Okamura, Y. Ueda, M. Shirai, and A. Matsumoto
- Organizer
  RadTech 2014
- Place of Presentation
  Hyatt Regency O'hare, Chicago, USA
- Year and Date
  2014-05-12
- Data Source
  KAKENHI-PROJECT-24550260
[Presentation] カルコン部位含有ジメタクリレートを用いたデュアルUV硬化系の構築2014
- Author(s)
  岡村晴之，上田勇太，白井正充，松本章一
- Organizer
  高分子学会第23回ポリマー材料フォーラム
- Place of Presentation
  奈良公会堂、奈良
- Year and Date
  2014-11-07
- Data Source
  KAKENHI-PROJECT-24550260
[Presentation] カルコン部位含有ジメタクリラートを用いたハイブリッドUV硬化系2013
- Author(s)
  上田勇太，岡村晴之，白井正充
- Organizer
  第62回高分子学会年次大会
- Place of Presentation
  京都
- Data Source
  KAKENHI-PROJECT-24550260
[Presentation] 分解性を有する架橋・硬化ポリマーの合成と応用2013
- Author(s)
  白井正充
- Organizer
  高分子学会講演会
- Place of Presentation
  東京
- Invited
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] i-Line Sensitive PAGs and Their Application to Photocrosslinking System2013
- Author(s)
  H. Okamura and M. Shirai
- Organizer
  IUPAC International Symposium on Ionic Polymerization 2013
- Place of Presentation
  淡路、兵庫
- Data Source
  KAKENHI-PROJECT-24550260
[Presentation] リワーク型多官能メタクリラートを用いたUVインプリント用樹脂材料2013
- Author(s)
  村上雄基，岡村晴之，白井正充
- Organizer
  第62回高分子学会年次大会
- Place of Presentation
  京都
- Data Source
  KAKENHI-PROJECT-24550260
[Presentation] Hybrid UV Curing System Using Methacryalates Having Chalcone Moiety2013
- Author(s)
  H. Okamura, Y. Ueda, and M. Shirai
- Organizer
  The 30th International Conference of Photopolymer Science and Technology
- Place of Presentation
  千葉
- Data Source
  KAKENHI-PROJECT-24550260
[Presentation] Synthesis of a Dimethacrylate Containing a Chalcone Moiety and Its Application to Hybrid UV Curing System2013
- Author(s)
  H. Okamura, Y. Ueda, and M. Shirai
- Organizer
  The 13th Pacific Polymer Conference
- Place of Presentation
  高雄、台湾
- Data Source
  KAKENHI-PROJECT-24550260
[Presentation] 光重合性部位を有する酸無水物を用いたリワーク型デュアル硬化系の反応設計2013
- Author(s)
  足立全功，岡村晴之，白井正充
- Organizer
  高分子学会第61回高分子討論会
- Place of Presentation
  金沢
- Data Source
  KAKENHI-PROJECT-24550260
[Presentation] 濡れ性の差を利用した離型剤フリー樹脂モールド2013
- Author(s)
  岡村晴之，甲斐康司，白井正充
- Organizer
  第62回高分子学会年次大会
- Place of Presentation
  京都
- Data Source
  KAKENHI-PROJECT-24550260
[Presentation] 近紫外光対応光酸発生剤とその光架橋系への応用2013
- Author(s)
  岡村晴之，芦田拓也，小玉晋太朗，白井正充
- Organizer
  第62回高分子学会年次大会
- Place of Presentation
  京都
- Data Source
  KAKENHI-PROJECT-24550260
[Presentation] リワーク型多官能メタクリラートを用いたUVインプリント用モノマーの設計指針2013
- Author(s)
  村上雄基，岡村晴之，白井正充
- Organizer
  高分子学会第61回高分子討論会
- Place of Presentation
  金沢
- Data Source
  KAKENHI-PROJECT-24550260
[Presentation] 光酸発生剤を活用するフォトポリマー材料に関する研究2012
- Author(s)
  白井正充
- Organizer
  61回高分子討論会
- Place of Presentation
  名古屋
- Invited
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] 新規リワーク型多官能メタクリラートのUVインプリント材料への応用2012
- Author(s)
  白井正充
- Organizer
  第61回高分子年次大会
- Place of Presentation
  横浜
- Year and Date
  2012-05-29
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Photoacid and Photobase Generators for UV Curing2012
- Author(s)
  M. Shirai
- Organizer
  The 2nd International Forum on Radiation Curing Industry Developmen
- Place of Presentation
  中国
- Invited
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Synthesis and UV curing of multi-functional monomers with degradable property2012
- Author(s)
  M. Shirai
- Organizer
  SERMACS 2012
- Place of Presentation
  アメリカ
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] カルコン部位ジメタクリラートの合成とそのハイブリッドUV硬化系への応用2012
- Author(s)
  上田勇太、岡村晴之、白井正充
- Organizer
  第62回ネットワークポリマー講演討論会
- Place of Presentation
  三重県津市
- Data Source
  KAKENHI-PROJECT-24550260
[Presentation] Photoacid and Photobase Generating Monomers: Photochemistry and Application to UV Imprint Materials2012
- Author(s)
  M. Shirai
- Organizer
  European Symposium on Photopolymer Science 2012
- Place of Presentation
  イタリア
- Year and Date
  2012-09-05
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Preparation of Novel Resin Mold fro UV Imprint Lithography using UV-Curable Monomers2012
- Author(s)
  M. Shirai
- Organizer
  RadTech UV & EB Technology Expo and Conference
- Place of Presentation
  アメリカ
- Year and Date
  2012-05-01
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] 新規リワーク型多官能メタクリラートのUVインプリント材料への応用2012
- Author(s)
  白井正充
- Organizer
  第61回高分子学会年次大会
- Place of Presentation
  横浜
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Preparation of Novel Resin Mold for UV Imprint Lithography using UV-Curable Monomers2012
- Author(s)
  M. Shirai
- Organizer
  RadTech UV&EB Technology Expo & Conference
- Place of Presentation
  アメリカ
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] 再可溶化できる光架橋型高分子2012
- Author(s)
  白井正充
- Organizer
  プラスチックリサイクル化学研究会（FSRJ）第15回討論会
- Place of Presentation
  米沢
- Invited
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] 分解型光硬化樹脂とUVインプリント等への応用2012
- Author(s)
  白井正充
- Organizer
  第192回フォトポリマー懇話会講演会
- Place of Presentation
  東京
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Synthesis and UV Curing of Multi-functional Monomers with Degradable Property2012
- Author(s)
  M. Shirai
- Organizer
  SERMACS 2012
- Place of Presentation
  アメリカ
- Year and Date
  2012-11-14
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Photoacid and Photobase Generators for UV Curing2012
- Author(s)
  M. Shirai
- Organizer
  The 2nd International Forum on Radiation Curing Industrial Development
- Place of Presentation
  中国
- Year and Date
  2012-09-20
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Photoacid and Photobase generating monomers-Photochemistry and application to UV imprint materials2012
- Author(s)
  M. Shirai
- Organizer
  European Symposium of Photopolymer Science 2012
- Place of Presentation
  イタリア
- Invited
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Novel Monomers with Degradable Property and Their Application to UV Imprint Lithography2011
- Author(s)
  M. Shirai
- Organizer
  Photopolymerization Fundamentals 2011
- Place of Presentation
  アメリカ
- Year and Date
  2011-06-27
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] UV Imprint Lithography: Process, Materials, Materials, and Applications2011
- Author(s)
  M. Shirai
- Organizer
  Korea-Japan Symposium on Frontier Photoscience
- Place of Presentation
  韓国
- Year and Date
  2011-11-29
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] UV Curing and Degradation of Reworkable Methacrylates Having Hemiacetal Ester LInkage2011
- Author(s)
  Y.Murakami, H.Okamura, M.Shirai
- Organizer
  Photopolymerization Fundamentals 2011
- Place of Presentation
  Breckenridge, Co, USA
- Year and Date
  2011-06-27
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] Novel Resin Mold for UV Nanoimprint: A Demolding Agent Free System2011
- Author(s)
  M. Shirai
- Organizer
  37th International Conference on Micro and Nano Engineering
- Place of Presentation
  Berlin, Germany
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] UV Imprint Lithography : Process, Materials and Applications2011
- Author(s)
  M.Shirai
- Organizer
  Korea-Japan Symposium on Frontier Photoscience
- Place of Presentation
  Seoul, Korea(招待講演)
- Year and Date
  2011-10-29
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] Novel Monomers with Degradable Property and Their Applications to UV Imprint Lithography2011
- Author(s)
  M.Shirai
- Organizer
  Photopolymerization Fundamentals2011
- Place of Presentation
  Breckenridge, Co, USA(招待講演)
- Year and Date
  2011-06-27
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] リワーク型多官能メタクリラートのＵＶインプリント材料への応用2011
- Author(s)
  松川大作、村上雄基、岡村晴之、白井正充
- Organizer
  第６０回高分子年次大会
- Place of Presentation
  大阪
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] UV Imprint Lithography: Process, Materials and Applications2011
- Author(s)
  M. Shirai
- Organizer
  Korea-Japan Symposium on Frontier Photoscience(招待講演)
- Place of Presentation
  Seoul, Korea
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Reworkable Dimethacrylates Having Hemiacetal Ester Units2011
- Author(s)
  H. Okamura, T. Hatsuse, D. Matsukawa, M. Shirai
- Organizer
  RadTech Asia 2011
- Place of Presentation
  Yokohama, Japan
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] UV Curing of Reworkable Dendrimers2011
- Author(s)
  H. Okamura, M. Shirai
- Organizer
  RadTech Asia 2011
- Place of Presentation
  Yokohama, Japan
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Novel Resin Mold for UV nanoimprint: A Demolding Agent Free System2011
- Author(s)
  M. Shirai
- Organizer
  37th International Conference on Micro and NanoEngineering
- Place of Presentation
  ドイツ
- Year and Date
  2011-09-20
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] UV Imprint Lithography : Process, Materials and Applications2011
- Author(s)
  M. Shirai
- Organizer
  Korea-Japan Symposium on Frontier Photoscience
- Place of Presentation
  Seoul, Korea
- Year and Date
  2011-10-29
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] Reworkable Resin Using Thiol-Ene System2011
- Author(s)
  H. Okamura, M. Shirai
- Organizer
  The 28th International Conference of Photopolymer Science and Technology
- Place of Presentation
  Chiba, Japan
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Novel Monomers with Degradable Property and Their Applications to UV Imprint Lithography2011
- Author(s)
  M. Shirai
- Organizer
  Photopolymerization Fundamentals 2011(招待講演)
- Place of Presentation
  Breckenridge, CO, USA
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Duplication of Mold for UV Imprint Lithography Using UV Curable Resin with Reworkable Property2011
- Author(s)
  S. Horii, D. Matsukawa, H. Okamura, M. Shirai
- Organizer
  RadTech Asia 2011
- Place of Presentation
  Yokohama, Japan
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Novel Resin Mold for UV Nanoimprint : A Demolding Agent Free System2011
- Author(s)
  M. Shirai
- Organizer
  37th International Conference on Micro and Nano Engineering
- Place of Presentation
  Berlin, Germany
- Year and Date
  2011-09-20
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] UV Curing and Degradation of Reworkable Methacrylates Having Hemiacetal Ester LInkage2011
- Author(s)
  Y. Murakami, H. Okamura, M. Shirai
- Organizer
  Photopolymerization Fundamentals 2011
- Place of Presentation
  Breckenridge, CO, USA
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] UV Curing of Reworkable Resin: Analysis of Chain Propagation2011
- Author(s)
  D. Matsukawa, H. Okamura, M. Shirai
- Organizer
  RadTech Asia 2011
- Place of Presentation
  Yokohama, Japan
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Reworkable Dimethacrylates Having Hemiacetal Ester Units2011
- Author(s)
  H.Okamura, T.Hatsuse, D.Matsukawa, M.Shirai
- Organizer
  RadTech Asia 2011
- Place of Presentation
  Yokohama, Japan
- Year and Date
  2011-06-23
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] 離型剤フリーなUVインプリント用モールドのための樹脂材料2011
- Author(s)
  白井正充
- Organizer
  第60回高分子年次大会
- Place of Presentation
  大阪
- Year and Date
  2011-05-25
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] Novel Monomers with Degradable Property and Their Applications to UV Imprint Lithography2011
- Author(s)
  M. Shirai
- Organizer
  Photopolymerization Fundamentals 2011
- Place of Presentation
  Breckenridge, CO, USA
- Year and Date
  2011-06-27
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] 離型剤フリーなＵＶインプリント用モールドのための樹脂材料2011
- Author(s)
  堀井俊哉、岡村晴之、白井正充
- Organizer
  第６０回高分子年次大会
- Place of Presentation
  大阪
- Data Source
  KAKENHI-PROJECT-23655218
[Presentation] UV Curable Monomers for Imprint Lithography2010
- Author(s)
  M. Shirai
- Organizer
  RadTech UV & EB 2010 Technology Expo and Conference
- Place of Presentation
  Baltimore, MD, USA
- Year and Date
  2010-05-23
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] UV Curable Monomers for Imprint Lithography2010
- Author(s)
  M.Shirai
- Organizer
  RadTech UV & EB 2010 Technology Expo and Conference
- Place of Presentation
  Baltimore, MD, USA(招待講演)
- Year and Date
  2010-05-23
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] UV Curable Monomers with Degradable Property-Molecular Design and Application to UV Imprint Lithography2010
- Author(s)
  M. Shirai
- Organizer
  1st European Symposium of Photopolymer Science
- Place of Presentation
  Mulhouse, France
- Year and Date
  2010-12-01
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] UV Curable Monomers with Degradable Property-Molecular Design and Application to UV Imprint Lithography-2010
- Author(s)
  M.Shirai
- Organizer
  1st European Symposium of Photopolymer Science
- Place of Presentation
  Mulhouse, France(招待講演)
- Year and Date
  2010-12-01
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] Degradable Resist for UV Nanoimprint Lithography2009
- Author(s)
  Masamitsu Shirai
- Organizer
  The International Conference on Nanoimprint and Nanoprint Technology
- Place of Presentation
  米国, サンノゼ
- Year and Date
  2009-11-12
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] メタクリラートユニットを側鎖に有するヘミアセタールエステルオリゴマーの光架橋と解架橋2009
- Author(s)
  白井正充
- Organizer
  第58回高分子討論会
- Place of Presentation
  熊本
- Year and Date
  2009-09-16
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] ヘミアセタールエステル部位を有する新規メタクリラートの合成とリワーク樹脂への応用2009
- Author(s)
  白井正充
- Organizer
  第59回ネットワークポリマー講演討論会
- Place of Presentation
  大阪
- Year and Date
  2009-10-16
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] UV Curable Resin with Degradable Property(Invited)2009
- Author(s)
  M. Shirai
- Organizer
  11th Pacific Polymer Conference 2009
- Place of Presentation
  Cairns, Australia
- Year and Date
  2009-12-07
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] エポキシ基を含むリワーク型モノマーのUVナノインプリントリソグラフィーへの応用2009
- Author(s)
  白井正充
- Organizer
  第58回高分子討論会
- Place of Presentation
  熊本
- Year and Date
  2009-09-16
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] リワーク型エポキシ樹脂のUVナノインプリントリソグラフィーへの応用2009
- Author(s)
  白井正充
- Organizer
  第58回高分子学会年次大会
- Place of Presentation
  神戸
- Year and Date
  2009-05-27
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] UV Curable Resin with Degradable Property(Invited)2009
- Author(s)
  Masamitsu Shirai
- Organizer
  11th Pacific Polymer Conference 2009
- Place of Presentation
  オーストラリア, ケアンズ
- Year and Date
  2009-12-07
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] リワーク能を有する低収縮性UV硬化樹脂2009
- Author(s)
  白井正充
- Organizer
  第58回高分子学会年次大会
- Place of Presentation
  神戸
- Year and Date
  2009-05-27
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] リワーク型UV架橋ポリマーの設計と応用(招待講演)2009
- Author(s)
  白井正充
- Organizer
  第58回高分子学会年次大会
- Place of Presentation
  神戸
- Year and Date
  2009-05-27
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] リワーク能を有する低収縮性UV硬化樹脂の合成とその応用2009
- Author(s)
  白井正充
- Organizer
  第58回高分子討論会
- Place of Presentation
  熊本
- Year and Date
  2009-09-16
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] リワーク型UV架橋ポリマーの設計と応用2009
- Author(s)
  白井正充
- Organizer
  第58回高分子学会年次大会
- Place of Presentation
  神戸
- Year and Date
  2009-05-27
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] リワーク型光硬化樹脂のUVナノインプリントへの応用2009
- Author(s)
  白井正充
- Organizer
  第58回高分子学会年次大会
- Place of Presentation
  神戸
- Year and Date
  2009-05-27
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] Degradable Resist for UV Nanoimprint Lithography2009
- Author(s)
  M. Shirai
- Organizer
  The International Conference on Nanoimprint and Nanoprint Technology
- Place of Presentation
  San Jose, CA, USA
- Year and Date
  2009-11-12
- Data Source
  KAKENHI-PROJECT-21350128
[Presentation] 多官能光酸発生剤の合成とその光架橋系への応用
- Author(s)
  岡村晴之，本谷大地，白井正充
- Organizer
  高分子学会第59回高分子研究発表会（神戸）
- Place of Presentation
  神戸
- Data Source
  KAKENHI-PROJECT-24550260

1. OKAMURA Haruyuki (10316010)

# of Collaborated Projects: 3 results

# of Collaborated Products: 36 results
2. SUYAMA Kannji (90305649)

# of Collaborated Projects: 2 results

# of Collaborated Products: 7 results
3. TSUNOOKA Masahiro (50081328)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results

SHIRAI Masamitsu 白井 正充

白井 正光 シライ マサミツ

Research Projects

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Design concept of photosenitive polymers irradiated by multiple light sources

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Development of De-molding Agent-Free Resin Mold for UV NanoimprintPrincipal Investigator

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UV Curable Resins with Degradable Property and Their Application for Sacrificial MaterialsPrincipal Investigator

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Development of Photobase Generators for Tertiary Amines and Its Application to Curing Systems

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Studies on Environmentally Friendly Photocrosslinkable PolymersPrincipal Investigator

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Synthesis of Photoacid-and Photobase-Generating Polymers and Its ApplicationsPrincipal Investigator

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Chemical Modification of Surface of Polymer Thin Film Using Photochemical Reaction and Its ApplicationPrincipal Investigator

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Synthesis of Photodimerizable Poly(crown ether)s and Their ApplicationPrincipal Investigator

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[Book] 高分子の架橋と分解III2012

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[Book] 光学用粘・接着剤と貼り合わせ技術2012

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[Book] 光学用粘・接着剤と貼り合わせ技術2012

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[Book] 高機能アクリル樹脂の開発と応用2011

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[Book] 高分子の架橋と分解III2011

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[Book] 高機能アクリル樹脂の開発と応用2011

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[Book] 高機能アクリル樹脂の開発と応用2011

Author(s)

SHIRAI Masamitsu 白井正充

白井正光シライマサミツ

[Book] 総説エポキシ樹枝最近の進歩I2009