Motomura Taisei 本村大成

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MOTOMURA Taisei 本村大成

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Researcher Number	00635815
Other IDs
Affiliation (Current)	2025: 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 主任研究員
Affiliation (based on the past Project Information) *help	2017 – 2018: 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 主任研究員 2016: 国立研究開発法人産業技術総合研究所, 製造技術研究部門, 主任研究員 2015: 国立研究開発法人産業技術総合研究所, 製造技術研究部門, 研究員 2014: 独立行政法人産業技術総合研究所, 製造技術研究部門, 研究員
Review Section/Research Field	Principal Investigator Plasma electronics
Keywords	Principal Investigator プラズマ / プラズマ加工 / 高速成膜 / ガリウムターゲット / 窒素プラズマ / 高密度プラズマ / 窒化ガリウム / 液体金属 / スパッタリング / プラズマエッチング / エッチング

Development of plasma sputtering device for paramagnetic and low melting point metal targetPrincipal Investigator
- Principal Investigator
  
  Motomura Taisei
- Project Period (FY)
  2016 – 2018
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Plasma electronics
- Research Institution
  National Institute of Advanced Industrial Science and Technology
High speed and high aspect ratio reactive ion etching by using high density and ion orbit controlled plasmaPrincipal Investigator
- Principal Investigator
  
  MOTOMURA Taisei
- Project Period (FY)
  2014 – 2015
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Plasma electronics
- Research Institution
  National Institute of Advanced Industrial Science and Technology

All 2019 2018 2017 2016 2015 2014

All Journal Article Presentation

[Journal Article] Potential of High-density Convergent Plasma Sputtering Device for Magnetic Film Deposition2019
- Author(s)
  T. Motomura and T. Tabaru
- Journal Title
  
  e-J. Surf. Sci. Nanotechnol.
  
  Volume: 17 Issue: 0 Pages: 27-31
- DOI
  10.1380/ejssnt.2019.27
- NAID
  130007618362
- ISSN
  1348-0391
- Year and Date
  2019-03-23
- Language
  English
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-16K05000
[Journal Article] High-density convergent plasma sputtering device for a liquid metal target using an unheated glass plate2018
- Author(s)
  T. Motomura and T. Tabaru
- Journal Title
  
  Review of Scientific Instruments
  
  Volume: 89 Issue: 6 Pages: 063501-063501
- DOI
  10.1063/1.5025093
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K05000
[Journal Article] Evaluation of SF<sub>6</sub> Reactive Ion Etching Performance with a Permanent Magnet Located behind the Substrate based on a Simple Design Concept2016
- Author(s)
  Taisei Motomura, Kazunori Takahashi, Yuji Kasashima, Kazuya Kikunaga, Fumihiko Uesugi and Akira Ando
- Journal Title
  
  Journal of the Vacuum Society of Japan
  
  Volume: 59 Issue: 1 Pages: 11-15
- DOI
  10.3131/jvsj2.59.11
- NAID
  130005123319
- ISSN
  1882-2398, 1882-4749
- Language
  Japanese
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-26790066
[Journal Article] Effect of External Magnetic Field on Compact Inductively-coupled Reactive Ion Etching Reactor2015
- Author(s)
  Taisei Motomura, Kazunori Takahashi, Yuji Kasashima, Fumihiko Uesugi, Akira Ando
- Journal Title
  
  Journal of the Vacuum Society of Japan
  
  Volume: 58 Issue: 10 Pages: 392-396
- DOI
  10.3131/jvsj2.58.392
- NAID
  130005106937
- ISSN
  1882-2398, 1882-4749
- Language
  English
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-26790066
[Presentation] 産総研九州での取り組み:プラズマプロセス用診断技術と新規スパッタ装置の開発2018
- Author(s)
  田原竜夫、本村大成、笠嶋悠司
- Organizer
  プラズマ材料科学第153委員会第139回研究会
- Invited
- Data Source
  KAKENHI-PROJECT-16K05000
[Presentation] Plasma sputtering device using convergent magnetic field for GaN film production2018
- Author(s)
  T. Motomura and T. Tabaru
- Organizer
  10th international symposium on organic molecular electronics
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K05000
[Presentation] 高速プロセスのための磁場を活用したプラズマ装置の研究2017
- Author(s)
  本村大成
- Organizer
  有機薄膜・デバイス・材料研究討論会
- Invited
- Data Source
  KAKENHI-PROJECT-16K05000
[Presentation] 高密度収束プラズマを用いた液体金属スパッタリング装置2017
- Author(s)
  本村大成、田原竜夫
- Organizer
  第78回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-16K05000
[Presentation] 電磁場を活用したプラズマプロセス装置の研究2017
- Author(s)
  本村大成、田原竜夫
- Organizer
  第４回産総研プラズマ研究会
- Data Source
  KAKENHI-PROJECT-16K05000
[Presentation] 高密度窒素プラズマ源を用いた液体金属スパッタリング装置2017
- Author(s)
  本村大成、田原竜夫
- Organizer
  第58回真空に関する連合講演会
- Data Source
  KAKENHI-PROJECT-16K05000
[Presentation] 有磁場RFプラズマ源を用いたプラズマプロセス装置の研究開発2016
- Author(s)
  本村大成
- Organizer
  第3回産総研プラズマ研究会
- Place of Presentation
  産総研つくば中央第２（茨城県）
- Data Source
  KAKENHI-PROJECT-16K05000
[Presentation] Plasma discharge characteristics in compact SF6 radio-frequency plasma source for plasma etching application2015
- Author(s)
  Taisei Motomura, Kazunori Takahashi, Yuji Kasashima, Fumihiko Uesugi and Akira Ando
- Organizer
  ICRP-9 / GEC-68 / SPP-33
- Place of Presentation
  Hawaii Convention Center（USA）
- Year and Date
  2015-10-13
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26790066
[Presentation] 超高速エッチングのための高密度プラズマについて2014
- Author(s)
  本村大成, 高橋和貴, 笠嶋悠司, 安藤晃, 上杉文彦, クンプアンソマワン, 原史朗
- Organizer
  第2回産総研プラズマワークショップ
- Place of Presentation
  産業技術総合研究所九州センター
- Year and Date
  2014-04-14
- Data Source
  KAKENHI-PROJECT-26790066

1. TAKAHASHI Kazunori

# of Collaborated Projects: 1 results

# of Collaborated Products: 2 results
2. ANDO Akira

# of Collaborated Projects: 1 results

# of Collaborated Products: 2 results
3. Uehara Masato

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
4. Tabaru Tatsuo

# of Collaborated Projects: 1 results

# of Collaborated Products: 6 results

Motomura Taisei 本村 大成

MOTOMURA Taisei 本村 大成

Research Projects

Research Products

Co-Researchers

Development of plasma sputtering device for paramagnetic and low melting point metal targetPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

High speed and high aspect ratio reactive ion etching by using high density and ion orbit controlled plasmaPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

[Journal Article] Potential of High-density Convergent Plasma Sputtering Device for Magnetic Film Deposition2019

Author(s)

Journal Title

DOI

NAID

ISSN

Year and Date

Language

Data Source

[Journal Article] High-density convergent plasma sputtering device for a liquid metal target using an unheated glass plate2018

Author(s)

Journal Title

DOI

Data Source

[Journal Article] Evaluation of SF<sub>6</sub> Reactive Ion Etching Performance with a Permanent Magnet Located behind the Substrate based on a Simple Design Concept2016

Author(s)

Journal Title

DOI

NAID

ISSN

Language

Data Source

[Journal Article] Effect of External Magnetic Field on Compact Inductively-coupled Reactive Ion Etching Reactor2015

Author(s)

Journal Title

DOI

NAID

ISSN

Language

Data Source

[Presentation] 産総研九州での取り組み:プラズマプロセス用診断技術と新規スパッタ装置の開発2018

Author(s)

Organizer

Data Source

[Presentation] Plasma sputtering device using convergent magnetic field for GaN film production2018

Author(s)

Organizer

Data Source

[Presentation] 高速プロセスのための磁場を活用したプラズマ装置の研究2017

Author(s)

Organizer

Data Source

[Presentation] 高密度収束プラズマを用いた 液体金属スパッタリング装置2017

Author(s)

Organizer

Data Source

[Presentation] 電磁場を活用したプラズマプロセス装置の研究2017

Author(s)

Organizer

Data Source

[Presentation] 高密度窒素プラズマ源を用いた 液体金属スパッタリング装置2017

Author(s)

Organizer

Data Source

[Presentation] 有磁場RFプラズマ源を用いたプラズマプロセス装置の研究開発2016

Author(s)

Organizer

Place of Presentation

Data Source

[Presentation] Plasma discharge characteristics in compact SF6 radio-frequency plasma source for plasma etching application2015

Author(s)

Organizer

Place of Presentation

Motomura Taisei 本村大成

MOTOMURA Taisei 本村大成

[Presentation] 高密度収束プラズマを用いた液体金属スパッタリング装置2017

[Presentation] 高密度窒素プラズマ源を用いた液体金属スパッタリング装置2017