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MUSHIAKE Katsuhiko  虫明 克彦

ORCIDConnect your ORCID iD *help
Researcher Number 10092347
External Links
Affiliation (based on the past Project Information) *help 1999: 東大, 生産技術研究所, 助手
1996 – 1999: 東京大学, 生産技術研究所, 助手
1998: 生産技術研究所, 助手
1992 – 1993: 東京大学, 生産技術研究所, 助手
Review Section/Research Field
Principal Investigator
Material processing/treatments / 金属材料(含表面処理・腐食防食)
Except Principal Investigator
Material processing/treatments / Structural/Functional materials
Keywords
Principal Investigator
Extended service life / Electrocatalyst / Gradient concentration / Colloidal silica / IrO_2 electrode / 表面処理 / 高耐久性 / 不陽性陽極 / 寿命 / 電極触媒 … More / 濃度傾斜 / シリカ / 酸化イリジウム電極 / Glass Coating / Titanium Substrate / Iridium Dioxide / Electroplating / Acidic Sulfate Bath / Durability / Insoluble Anode / ガラスコート / 導電性セラミクス / 耐食性 / 酸性硫酸電解浴 / 鋼板の電気亜鉛めっき / 不溶性電極 / 導電性ガラスコート / 電極基体 / 酸化イリジウム / 電気亜鉛めっき / 酸性硫酸浴 / 耐久性 / 不溶性陽極 … More
Except Principal Investigator
CVD / ダイヤモンド / マイクロ波プラズマ / 二段階成長 / ADHESION / SUPER HARD SUBSTRATE / RELIABILITY / MICROWAVE PLASMA / TWO-STEP GROWTH / CUTTING TOOL / DIAMOND / 密着性 / 超硬基盤材料 / 高信頼性 / 切削工具 / LARGE AREA DEPOSITION / MICROWAVE / BIAS PRETREATMENT / HIGH ORIENTED GROWTH / EPITAXIAL GROWTH / DIAMOND THIN FILM / 大面積堆積 / バイアス印加前処理 / 高配向成長 / エピタキシャル成長 / ダイヤモンド薄膜 / OHラジカル / 発光分光分析 / 走査トンネル分光解析 / 表面増感ラマン分光法 / 窒化ホウ素中間層 / 核生成 / 高過飽和 / 原子間力顕微鏡 / ラマン散乱分光分析 / 核生成サイト炭素質微細粒 / 過飽和度 / 核生成現象 / カーボンアロイ / 比誘電率 / 低温結晶化 / 高周波基板バイアス / チタン酸バリウム / バイアススパッタリング / 強誘電体薄膜 Less
  • Research Projects

    (8 results)
  • Co-Researchers

    (1 People)
  •  皮膜内に自然形成するシリカの濃度傾斜構造−表面処理用金属電極の長寿命化への応用−Principal Investigator

    • Principal Investigator
      虫明 克彦
    • Project Period (FY)
      1999
    • Research Category
      Grant-in-Aid for Exploratory Research
    • Research Field
      Material processing/treatments
    • Research Institution
      The University of Tokyo
  •  ダイヤモンドCVD成長における核生成サイト炭素質材料の周定

    • Principal Investigator
      光田 好孝
    • Project Period (FY)
      1998
    • Research Category
      Grant-in-Aid for Scientific Research on Priority Areas (A)
    • Research Institution
      The University of Tokyo
  •  Reliability Improvement of Diamond Film Cutting Tools by Two-step CVD Growth Technique

    • Principal Investigator
      MITSUDA Yoshitaka
    • Project Period (FY)
      1998 – 2000
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Material processing/treatments
    • Research Institution
      The University of Tokyo
  •  ダイヤモンド膜のCVD成長における核生成サイトとなる炭素質材料の探索

    • Principal Investigator
      光田 好孝
    • Project Period (FY)
      1997
    • Research Category
      Grant-in-Aid for Scientific Research on Priority Areas
    • Research Institution
      The University of Tokyo
  •  Enlargement of Deposition Area in Heteroepitaxial Growth of Diamond Film by CVD.

    • Principal Investigator
      MITSUDA Yoshitaka
    • Project Period (FY)
      1997 – 1998
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      Material processing/treatments
    • Research Institution
      The University of Tokyo
  •  高周波バイアススパッタリング法による強誘電体薄膜の低温成長

    • Principal Investigator
      MITSUDA Yoshitaka
    • Project Period (FY)
      1996
    • Research Category
      Grant-in-Aid for Exploratory Research
    • Research Field
      Structural/Functional materials
    • Research Institution
      The University of Tokyo
  •  Extension of the Service Life of IrO_2 Anodes by the Addition of Colloidal SilicaPrincipal Investigator

    • Principal Investigator
      MUSHIAKE Katsuhiko
    • Project Period (FY)
      1996 – 1997
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Material processing/treatments
    • Research Institution
      The University of Tokyo
  •  Corrosing Prevention of Insoluble Anode for Steel Strip ElectroplatingPrincipal Investigator

    • Principal Investigator
      MUSHIAKE Katsuhiko
    • Project Period (FY)
      1992 – 1993
    • Research Category
      Grant-in-Aid for General Scientific Research (C)
    • Research Field
      金属材料(含表面処理・腐食防食)
    • Research Institution
      Institute of Industrial Science, The University of Tokyo
  • 1.  MITSUDA Yoshitaka (20212235)
    # of Collaborated Projects: 6 results
    # of Collaborated Products: 0 results

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