UENO Kazuyoshi 上野和良

Researcher Number	10433765
Other IDs
Affiliation (based on the past Project Information) *help	2010 – 2023: 芝浦工業大学, 工学部, 教授
Review Section/Research Field	Principal Investigator Basic Section 21060:Electron device and electronic equipment-related / Electron device/Electronic equipment Except Principal Investigator Rehabilitation science/Welfare engineering
Keywords	Principal Investigator エレクトロマイグレーション / 電流作用 / 配線 / 低温化 / 電流印加 / 固相析出 / 低抵抗化 / グラフェン / ナノカーボン / 構造変化 … More / ラマン分光 / 抵抗変化型メモリ / グラファイト結合 / ダイヤモンド結合 / 抵抗変化 / 結合状態変化 / 結晶性向上 / ナノプロセス / 結晶化 / 電子デバイス / 電極・配線 / 電流の作用 / ドーピング / 多層グラフェン / 膜質向上 / 電流ストレス / アニール / 均一性改善 / 直接堆積 / 電流密度 / 結晶性改善 / 電流印加アニール / グラフェン形成 / 集積回路 / 結晶性 / 低温プロセス / 化学的気相成長 / グラフェン配線 / 電子散乱 / 熱処理方法 / 微細構造制御 / 超臨界流体 / 集積回路プロセス / 電子デバイス・機器 / 電子・電気材料 / デバイス設計・製造プロセス / 半導体超微細化 / 集積回路配線 … More Except Principal Investigator 薄膜 / Ge / 環境制御装置 / ALS / 多変量解析 / 脳血流量 / めっき法 / フレキシブル基板 / ゲルマニウムセンサー / YES/NO判定 / 脳血流 / 薄膜センサ / NIRS / flexible sensor / YES/NO judge system Less

電流印加によるナノカーボンの構造変化と抵抗変化の関係解明Principal Investigator
- Principal Investigator
  
  上野和良
- Project Period (FY)
  2022 – 2024
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 21060:Electron device and electronic equipment-related
- Research Institution
  Shibaura Institute of Technology
Process temperature and resistance reduction for solid-phase deposition of multi-layer graphene by current applicationPrincipal Investigator
- Principal Investigator
  
  Ueno Kazuyoshi
- Project Period (FY)
  2018 – 2022
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 21060:Electron device and electronic equipment-related
- Research Institution
  Shibaura Institute of Technology
Current-enhanced CVD and annealing of multilayer graphene for reduction of resistancePrincipal Investigator
- Principal Investigator
  
  Ueno Kazuyoshi
- Project Period (FY)
  2014 – 2017
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electron device/Electronic equipment
- Research Institution
  Shibaura Institute of Technology
Study on near-infrared sensors on flexible substrate for oxy-hemoglobin.
- Principal Investigator
  
  UCHIDA Yasutaka
- Project Period (FY)
  2012 – 2014
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Rehabilitation science/Welfare engineering
- Research Institution
  Teikyo University of Science & Technology
Resistance Reduction of Ultra-fine Copper Interconnects by Annealing in Supercritical Fluids or with ElectromigrationPrincipal Investigator
- Principal Investigator
  
  UENO Kazuyoshi
- Project Period (FY)
  2010 – 2012
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electron device/Electronic equipment
- Research Institution
  Shibaura Institute of Technology

[Book] 半導体・MEMSのための超臨界流体2012
- Author(s)
  上野和良、他
- Publisher
  コロナ社
- Data Source
  KAKENHI-PROJECT-22560344
[Journal Article] Advances in multilayer graphene processes for metallization and high-frequency devices2023
- Author(s)
  Kazuyoshi Ueno
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 62 Issue: SA Pages: SA0802-SA0802
- DOI
  10.35848/1347-4065/ac8884
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18K04289
[Journal Article] Optimization of MoCl5 intercalation for low-resistance and low-damage exfoliated highly oriented graphite2022
- Author(s)
  Ekkaphop Ketsombun, Kazuyoshi Ueno
- Journal Title
  
  Microelectronic Engineering
  
  Volume: 252 Pages: 111666-111666
- DOI
  10.1016/j.mee.2021.111666
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18K04289
[Journal Article] Present Status and Prospect of Graphene Interconnect Applications2022
- Author(s)
  Kazuyoshi Ueno
- Journal Title
  
  IEICE Trans. Electron.
  
  Volume: E105.C Issue: 10 Pages: 572-577
- DOI
  10.1587/transele.2021FUP0008
- ISSN
  0916-8524, 1745-1353
- Year and Date
  2022-10-01
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18K04289
[Journal Article] Present status and prospect of graphene interconnect applications2022
- Author(s)
  Kazuyoshi Ueno
- Journal Title
  
  IEICE Transaction
  
  Volume: E105-C, No.10
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18K04289
[Journal Article] Low-temperature synthesis of multilayer graphene directly on SiO2 by current-enhanced solid-phase deposition using Ni catalyst2020
- Author(s)
  Tomohiro Tamura and Kazuyoshi Ueno
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 59 Issue: 6 Pages: 066501-066501
- DOI
  10.35848/1347-4065/ab9165
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18K04289
[Journal Article] Reaction temperature and time dependence of MoCl5 intercalation to few-layer graphene2020
- Author(s)
  Ekkaphop Ketsombun, Xiangyu Wu, Inge Asselberghs, Swati Achra, Cedric Huyghebaert, Dennis Lin, Zsolt Tokei and Kazuyoshi Ueno
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 59 Issue: SL Pages: SLLE01-SLLE01
- DOI
  10.35848/1347-4065/ab7e3c
- Peer Reviewed / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Journal Article] Enhancing Interface Doping in Graphene-Metal Hybrid Devices using H2 Plasma Clean2020
- Author(s)
  2)S. Achra, T. Akimoto, J-F. Mameffe, T. Nuytten, X. Wu, S. Brems, I. Asselberghs, Z. Tokei, K. Ueno, M, Heyns
- Journal Title
  
  Applied Surface Science
  
  Volume: 538 Pages: 148046-148046
- DOI
  10.1016/j.apsusc.2020.148046
- Peer Reviewed / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Journal Article] Thermal stability of a Schottky diode fabricated with transfer-free deposition of multilayer graphene on n-GaN by solid-phase reactions2017
- Author(s)
  Uddin Md. Sahab　Ueno Kazuyoshi
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 56 Issue: 7S2 Pages: 07KD05-07KD05
- DOI
  10.7567/jjap.56.07kd05
- NAID
  210000148107
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-26420319
[Journal Article] Effect of current stress during thermal CVD of multilayer graphene on cobalt catalytic layer2016
- Author(s)
  K. Ueno, H. Ichikawa, T. Uchida
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 55 Issue: 4S Pages: 04EC13-04EC13
- DOI
  10.7567/jjap.55.04ec13
- NAID
  210000146293
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-26420319
[Journal Article] Improvement of multilayer graphene crystallinity by solid-phase precipitation with current stress application during annealing2016
- Author(s)
  Md. S. Uddin, H. Ichikawa, S. Sano, K. Ueno
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 55 Issue: 6S3 Pages: 06JH02-06JH02
- DOI
  10.7567/jjap.55.06jh02
- NAID
  210000146738
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-26420319
[Journal Article] Properties of electrodeposited germanium thin films2014
- Author(s)
  Y. Uchida, T. Funayama, Y. Kogure and K. Ueno
- Journal Title
  
  Phys. Status Solidi C
  
  Volume: 11-12 Issue: 11-12 Pages: 1661-1664
- DOI
  10.1002/pssc.201400094
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-24500661, KAKENHI-PROJECT-26350635
[Journal Article] Impurities in Electroplated Copper Films for LSI Interconnection2012
- Author(s)
  上野和良
- Journal Title
  
  Journal of The Surface Finishing Society of Japan
  
  Volume: 63 Issue: 4 Pages: 227
- DOI
  10.4139/sfj.63.227
- NAID
  130002553394
- ISSN
  0915-1869, 1884-3409
- Language
  Japanese
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560344
[Journal Article] Japanese Journal of Applied Physics2012
- Author(s)
  Liyana Razak, Takamasa Yamaguchi, Seishi Akahori, Hideki Hashimoto, Kazuyoshi Ueno
- Journal Title
  
  Current Induced Grain Growth of Electroplated Copper Film
  
  Volume: 51 05EA04 Issue: 5S Pages: 1-6
- DOI
  10.1143/jjap.51.05ea04
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560344
[Journal Article] 半導体集積回路の配線に用いる銅めっき膜の不純物（解説）2012
- Author(s)
  上野　和良
- Journal Title
  
  表面技術
  
  Volume: 63 Pages: 227-232
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560344
[Journal Article] 超臨界流体中アニールによるめっき銅膜の改質2010
- Author(s)
  上野和良, (他計10名)
- Journal Title
  
  表面技術
  
  Volume: 61 Pages: 583-586
- NAID
  10026542629
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560344
[Journal Article] Grain Growth Enhancement of Electroplated Copper Film by Supercritical Annealing2010
- Author(s)
  上野和良, (他計10名)
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 49
- NAID
  210000068523
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560344
[Journal Article] Grain Growth Enhancement of Electroplated Copper Film by Supercritical Annealing2010
- Author(s)
  Kazuyoshi Ueno, Yuji Shimada, Shigeru Yomogida, Seishi Akahori,Tomohiko Yamamoto,Takamasa Yamaguchi, Yoshinori Aoki, Akiko Matsuyama, Takashi Yata,, Hideki Hashimoto
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 49 05FA08 Issue: 5S2 Pages: 05FA08-05FA08
- DOI
  10.1143/jjap.49.05fa08
- NAID
  210000068523
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560344
[Patent] グラフェン膜製造方法、グラフェン膜製造装置2013
- Inventor(s)
  上野　和良、ラザク　リヤナ
- Industrial Property Rights Holder
  芝浦工業大学
- Industrial Property Rights Type
  特許
- Filing Date
  2013-01-24
- Data Source
  KAKENHI-PROJECT-22560344
[Patent] グラフェン膜製造方法、グラフェン膜製造装置2013
- Inventor(s)
  上野和良、ラザクリヤナ
- Industrial Property Rights Holder
  芝浦工業大学
- Acquisition Date
  2013-01-24
- Data Source
  KAKENHI-PROJECT-22560344
[Presentation] Optimization for current-enhanced solid-phase deposition of multi-layer graphene with high crystallinity and uniformity2023
- Author(s)
  Ryutaro Tsuchida,　Kazuyoshi .Ueno
- Organizer
  7th International Conference on Nano and Materials Science (ICNMS)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] パターンNi触媒を用いた固相析出法による多層グラフェン形成2023
- Author(s)
  小笹滉太、上野和良
- Organizer
  第84回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-22K04222
[Presentation] Adhesion improvement of multilayer graphene formed by solid phase deposition on SiO2 with Ti adhesion layer2023
- Author(s)
  Takumi Nishimura, Motonobu Sato, Kazuyoshi Ueno
- Organizer
  Advanced Metallization Conference, Asian session (ADMETA Plus) 2023
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-22K04222
[Presentation] Intercalated multilayer graphene / nickel hybrid antenna　with enhanced inductance density for size reduction2023
- Author(s)
  Keigo Hosokawa, Kenta Matsunaga, Kazuyoshi Ueno
- Organizer
  7th IEEE Electron Devices Technology and Manufacturing (EDTM) Conf. 2023
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] Effect of current on Ni catalyst layer used for current-enhanced CVD of multilayer graphene2022
- Author(s)
  Junpei Tokida, Reno Hasumi, Kazuyoshi Ueno
- Organizer
  2022 IEEE International Interconnect Technology Conference
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] 電流を印加した多層グラフェンの層交換成長2022
- Author(s)
  土田龍太郎、上野和良
- Organizer
  電気化学会 2022年電気化学春季大会
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] Recent progress in graphene processes for metallization and RF applications2022
- Author(s)
  Kazuyoshi Ueno
- Organizer
  IEEE International Interconnect Technology Conference (IITC2022)
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] 電流印加多層グラフェンCVDのNi触媒層における電流の影響2022
- Author(s)
  時田　純平、上野　和良
- Organizer
  電気化学会2022年電気化学春季大会
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] 多層グラフェンの電流印加層交換成長における昇温速度依存性2022
- Author(s)
  土田　龍太郎, 上野和良
- Organizer
  2022年第83回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] Advances in graphene processes for metallization and high frequency devices2022
- Author(s)
  Kazuyoshi Ueno
- Organizer
  14th Int. Symp. Advanced Plasma Sci. and its Applications for Nitrides and Nanomaterials /15th Int.Conf. Plasma-Nano Technology & Sci.
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] Effect of current on Ni catalyst layer used for current-enhanced CVD of multilayer graphene2022
- Author(s)
  Junpei Tokida, Reno Hasumi, Kazuyoshi Ueno
- Organizer
  IEEE International Interconnect Technology Conference (IITC2022)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] ドープ多層グラフェンを用いたパッチアンテナの作製2022
- Author(s)
  松永健太、秋本　知輝、ケトソンブン　エッカフォップ、上野　和良
- Organizer
  電気化学会 2022年電気化学春季大会
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] Advances in graphene processes for metallization and high frequency devices2022
- Author(s)
  Kazuyoshi Ueno
- Organizer
  14th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma-Nano Technology & Science
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] Recent progress in graphene processes for metallization and RF applications2022
- Author(s)
  Kazuyoshi Ueno
- Organizer
  2022 IEEE International Interconnect Technology Conference
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] 電流を印加した多層グラフェンの層交換成長2022
- Author(s)
  土田　龍太郎、上野　和良
- Organizer
  電気化学会2022年電気化学春季大会
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] Present status and prospect of graphene interconnect applications2021
- Author(s)
  Kazuyoshi Ueno
- Organizer
  2021 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] Fabrication of highly doped MLG patterns using selective CVD and MoCl5 intercalation2021
- Author(s)
  Ekkaphop Ketsombun, Tomoki Akimoto, Kazuyoshi Ueno
- Organizer
  2021 IEEE International Interconnect Technology Conference
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] フォトリソグラフィで形成したNiパターンへの選択CVDによる高濃度ドープMLGパターン形成2021
- Author(s)
  大山　嵩太、Ekkaphop Ketsombun、上野　和良
- Organizer
  第85回半導体・集積回路技術シンポジウム
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] 窒素添加ニッケル触媒を用いた電流印加固相析出法による多層グラフェン形成2020
- Author(s)
  泉沢　錬、小早川　祥輝、上野　和良
- Organizer
  第84回半導体・集積回路シンポジウム
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] Efficient MoCl5 intercalation doping of multilayer graphene for low-resistance and low-damage2020
- Author(s)
  2)Ekkaphop Ketsombun, Kazuyoshi Ueno
- Organizer
  International Conference on Solid State Devices and Materials (SSDM)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] MoCl5 Intercalation for CVD Graphene at Low Temperature using High Chemical Concentration2019
- Author(s)
  Ketsombun Ekkaphop,Kosuke Yokosawa, Xiangyu Wu, Inge Asselberghs, Swati Achra, Cedric Huyghebaert, Zsolt Tokei and Kazuyoshi Ueno
- Organizer
  IEEE International Interconnect Technology Conference (IITC 2019) and the Materials for Advanced Metallization Conference (MAM 2019)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] Layer Number Dependence of MoCl5 Intercalation to Few-Layer Graphene2019
- Author(s)
  Ekkaphop Ketsombun, Xiangyu Wu, Inge Asselberghs, Swati Achra, Cedric Huyghebaert, Dennis Lin, Zsolt Tokei and Kazuyoshi Ueno
- Organizer
  Advanced Metallization Conference 2019 (ADMETA2019)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] Chemical Concentration Dependence of MoCl5 Intercalation to Bilayer Graphene2019
- Author(s)
  Ekkaphop Ketsombun, Xiangyu Wu, Inge Asselberghs, Swati Achra, Cedric Huyghebaert, Dennis Lin, Zsolt Tokei and Kazuyoshi Ueno
- Organizer
  第80回応用物理学会秋季学術講演会（2019　北海道）
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] Synthesis of Nintrogen-doped Multilayer Graphene Film by Solid-Phase Deposition Using Co-N Catalyst2019
- Author(s)
  Yuki Fujishima and Kazuyoshi Ueno
- Organizer
  IEEE Electron Device Technology and Manufacturing (EDTM2019)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] ナノカーボンの配線・電極への応用2018
- Author(s)
  上野　和良
- Organizer
  電気化学会第85回大会
- Invited
- Data Source
  KAKENHI-PROJECT-26420319
[Presentation] 電流印加固相析出によるSiO2上への多層グラフェンの直接形成2018
- Author(s)
  田村智洋, 上野和良
- Organizer
  第79回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] Current-Enhanced Solid Phase Precipitation of Multilayer Graphnen Directly on SiO22018
- Author(s)
  Tomohiro Tamura and Kazuyoshi Ueno
- Organizer
  29th International Conference on Diamond and Carbon Materials (DIAM2018)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04289
[Presentation] Improvement of multilayer graphene (MLG) / n-GaN Schottky diode properties fabricated with transfer-free deposition of MLG on n-GaN by solid-phase reaction2017
- Author(s)
  Uddin Md. Sahab and Ueno Kazuyoshi
- Organizer
  第81回半導体・集積回路シンポジウム
- Data Source
  KAKENHI-PROJECT-26420319
[Presentation] Current enhanced solid phase precipitation (CE-SPP) for direct deposition of multilayer graphene on SiO2 from a Cu capped Co-C layer2017
- Author(s)
  H. Ichikawa, K. Ueno
- Organizer
  2017 IEEE Electron Devices Technology and Manufacturing Conference
- Place of Presentation
  Toyama International Conference Center
- Year and Date
  2017-02-28
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26420319
[Presentation] Effect of current stress on formation and crystallinity of multilayer graphene by solid phase precipitation2016
- Author(s)
  Md. Sahab Uddin, Hiroyasu Ichikawa, Shota Sano, Kazuyoshi Ueno
- Organizer
  10th SEATAC Symposium
- Place of Presentation
  Shibaura Institute of Technology
- Year and Date
  2016-02-22
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26420319
[Presentation] 電流印加した固相析出法によるグラフェン形成2016
- Author(s)
  ウッディン　MD　サハブ、市川　博康、佐野　翔太、上野　和良
- Organizer
  応用物理学会シリコンテクノロジー分科会「配線・実装技術の新展開」
- Place of Presentation
  機械振興会館
- Year and Date
  2016-01-22
- Data Source
  KAKENHI-PROJECT-26420319
[Presentation] Improvement of multilayer graphene crystallinity by solid phase precipitation applying current stress during annealing2015
- Author(s)
  Md. Sahab Uddin, Hiroyasu Ichikawa, Shota Sano, Kazuyoshi Ueno
- Organizer
  Advanced Metallization Conference 2015 Asian Session
- Place of Presentation
  Seoul National University
- Year and Date
  2015-09-17
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26420319
[Presentation] Effect of current stress during thermal CVD of multilayer graphene on cobalt catalytic layer2015
- Author(s)
  Hiroyasu Ichikawa, Takaki Uchida, Kazuyoshi Ueno
- Organizer
  2015 International Conference on Solid State Devices and Materials
- Place of Presentation
  Sapporo Convention Center
- Year and Date
  2015-09-27
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26420319
[Presentation] 熱CVD中の電流印加による多層グラフェンの膜質改善2015
- Author(s)
  市川　博康、内田　昂紀、上野　和良
- Organizer
  第76回応用物理学会秋季学術講演会
- Place of Presentation
  名古屋国際会議場
- Year and Date
  2015-09-13
- Data Source
  KAKENHI-PROJECT-26420319
[Presentation] Properties of electrodeposited Germanium thin films2014
- Author(s)
  Y. Uchida, T. Funayama, Y. Kogure, K. Ueno,
- Organizer
  Europian-Material Research Society 2014 Spring Meeting
- Place of Presentation
  Lille,(France)
- Year and Date
  2014-05-27
- Data Source
  KAKENHI-PROJECT-24500661
[Presentation] Improvement of Multilayer Graphene Quality by Current Stress during Thermal CVD2013
- Author(s)
  Kazuyoshi Ueno
- Organizer
  Materials for Advanced Metallization (MAM) 2013
- Place of Presentation
  Leuven, Belgium
- Data Source
  KAKENHI-PROJECT-22560344
[Presentation] Improvement of Multilayer Graphene Quality by Current Stress during Thermal CVD2013
- Author(s)
  Liyana Razak, Daiki Tobino, Kazuyoshi Ueno
- Organizer
  Materials for Advanced Metallization 2013
- Place of Presentation
  Leuven、Belgium
- Year and Date
  2013-03-11
- Data Source
  KAKENHI-PROJECT-22560344
[Presentation] 電流を印加した熱CVD法によるナノカーボン成長2013
- Author(s)
  上野　和良
- Organizer
  第60回応用物理学会春季学術講演会
- Place of Presentation
  厚木市、神奈川県
- Data Source
  KAKENHI-PROJECT-22560344
[Presentation] 超臨界アニールによるめっき銅膜の粒成長(4) EBSDによる粒観察2011
- Author(s)
  青木和慶,蓬田茂,伊藤寛征, 中島里絵, 池野昌彦, 上野和良
- Organizer
  第72回応用物理学会学術講演会
- Place of Presentation
  山形
- Year and Date
  2011-09-02
- Data Source
  KAKENHI-PROJECT-22560344
[Presentation] Current Induced Grain Growth of Electro-plated Copper Film2011
- Author(s)
  Liyana Razak, Takamasa, Yamaguchi, Seishi Akahori, Hideki Hasimoto, and Kazuyoshi Ueno
- Organizer
  Advanced Metallization Conference 2011, Asian Session
- Place of Presentation
  Tokyo
- Year and Date
  2011-09-14
- Data Source
  KAKENHI-PROJECT-22560344
[Presentation] 電流ストレスによるめっきCu薄膜の粒成長:添加剤濃度依存性2011
- Author(s)
  上野和良
- Organizer
  第72回応用物理学会学術講演会
- Place of Presentation
  山形(山形大学)
- Year and Date
  2011-09-02
- Data Source
  KAKENHI-PROJECT-22560344
[Presentation] 超臨界アニールによるめっき銅膜の粒成長(4)EBSDによる粒観察2011
- Author(s)
  上野和良
- Organizer
  第72回応用物理学会学術講演会
- Place of Presentation
  山形(山形大学)
- Year and Date
  2011-09-02
- Data Source
  KAKENHI-PROJECT-22560344
[Presentation] Current Induced Grain Growth of Electroplated Copper Film2011
- Author(s)
  上野和良
- Organizer
  Advanced Metallization Conference 2011, 21^<st>. Asian Session
- Place of Presentation
  東京(芝浦工業大学)
- Year and Date
  2011-09-11
- Data Source
  KAKENHI-PROJECT-22560344
[Presentation] Evaluation of electrodeposited Germanium thin films
- Author(s)
  Y. Uchida, T. Funayama, Y. Kogure, K. Ueno
- Organizer
  第23回日本MRS年次大会、T-P10-025
- Place of Presentation
  横浜
- Data Source
  KAKENHI-PROJECT-24500661
[Presentation] めっき法により堆積したGe 膜の評価
- Author(s)
  内田恭敬，白濱大援，中島基博，舩山朋子，木暮嘉明，上野和良
- Organizer
  第74 回応用物理学会秋季学術講演会、17ｐ-P11-1
- Place of Presentation
  京都
- Data Source
  KAKENHI-PROJECT-24500661

1. UCHIDA Yasutaka (80134823)

# of Collaborated Projects: 1 results

# of Collaborated Products: 4 results
2. KOGURE Yoshiaki (20016124)

# of Collaborated Projects: 1 results

# of Collaborated Products: 4 results
3. FUNAYAMA Tomoko (20460389)

# of Collaborated Projects: 1 results

# of Collaborated Products: 4 results

UENO Kazuyoshi 上野 和良

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電流印加によるナノカーボンの構造変化と抵抗変化の関係解明Principal Investigator

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Process temperature and resistance reduction for solid-phase deposition of multi-layer graphene by current applicationPrincipal Investigator

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Current-enhanced CVD and annealing of multilayer graphene for reduction of resistancePrincipal Investigator

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Study on near-infrared sensors on flexible substrate for oxy-hemoglobin.

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Resistance Reduction of Ultra-fine Copper Interconnects by Annealing in Supercritical Fluids or with ElectromigrationPrincipal Investigator

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[Book] 半導体・MEMSのための超臨界流体2012

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[Journal Article] Advances in multilayer graphene processes for metallization and high-frequency devices2023

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[Journal Article] Optimization of MoCl5 intercalation for low-resistance and low-damage exfoliated highly oriented graphite2022

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[Journal Article] Present Status and Prospect of Graphene Interconnect Applications2022

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[Journal Article] Present status and prospect of graphene interconnect applications2022

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[Journal Article] Low-temperature synthesis of multilayer graphene directly on SiO2 by current-enhanced solid-phase deposition using Ni catalyst2020

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[Journal Article] Reaction temperature and time dependence of MoCl5 intercalation to few-layer graphene2020

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[Journal Article] Enhancing Interface Doping in Graphene-Metal Hybrid Devices using H2 Plasma Clean2020

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[Journal Article] Thermal stability of a Schottky diode fabricated with transfer-free deposition of multilayer graphene on n-GaN by solid-phase reactions2017

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NAID

UENO Kazuyoshi 上野和良