Izumi Akira 和泉亮

… Alternative Names

IZUMI AKIRA 和泉亮

IZUMI Akira 和泉亮

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Researcher Number	30223043
External Links
Affiliation (Current)	2025: 九州工業大学, 大学院工学研究院, 教授
Affiliation (based on the past Project Information) *help	2024: 九州工業大学, 大学院工学研究院, 教授 2015: 九州工業大学, 大学院工学研究院, 教授 2013 – 2014: 九州工業大学, 工学(系)研究科(研究院), 教授 2009: 九州工業大学, 工学研究院, 教授 2008: 九州工業大学, 工学研究院, 准教授 … More 2007: 九州工業大学, 工学部, 准教授 2005 – 2006: 九州工業大学, 工学部, 助教授 2002 – 2003: 九州工業大学, 工学部, 助教授 1998 – 2002: 北陸先端科学技術大学院大学, 材料科学研究科, 助手 1996: Japan Advanced Institute of Science and Technology, Hokuriku, School of Material, 材料科学研究科, 助手 Less
Review Section/Research Field	Principal Investigator Applied materials science/Crystal engineering / Basic Section 21050:Electric and electronic materials-related / Applied materials science/Crystal engineering / Electronic materials/Electric materials Except Principal Investigator 電子デバイス・機器工学 / 固体物性Ⅱ(磁性・金属・低温) / Engineering / Science and Engineering / Applied materials science/Crystal engineering / Electronic materials/Electric materials
Keywords	Principal Investigator 表面窒化 / シリコン窒化膜 / Cat-CVD / ラジカル / 極薄酸化膜 / SiCN / HMDS / silicon nitride / ammmonia / nitridation … More / Hot wire / シリコン炭窒化膜 / ヘキサメチルジシラザン / アンモニア分解種 / ホットワイヤー / 界面準位 / 絶縁物 / 熱処理 / 表面改質 / 触媒窒化 / HRTEM / 触媒CVD / MIS / C-V / HWCVD / XPS / アンモニア分 / 低温窒化 / 低温酸化 / ゲート絶縁膜 / SiO_2 … More Except Principal Investigator MITT / Ti / Cat-CVD / Rare Earth Doped Fullerenes / Fullerene Polymer / Carrier Control / Carrier Injection / Interface Modification / Self-Assembled Monolayer / Field Effect Transistor / Fullerene / MBE / 誘電異常 / 分子回転 / 金属内包フラーレン / 強磁性 / ネットワーク構造 / インターカレーション / ドーピング / カーボンナノチューブ / 希土類ドープフラーレン / フラーレンポリマー / キャリヤ数制御 / 電荷注入 / 界面修飾 / 自己組織化単分子膜 / 電界効果トランジスタ / フラーレン / liquid crystal display / thin film transistor / lithography / patterning / in-print method / 液晶ディスプレイ / 薄膜トランジスタ / パターン転写 / リソグラフィー / インプリント技術 / anodic oxidation / TiOx / nano-technology / super-micro-technology / ナノテクノリジ- / 陽極酸化 / Ti酸化物 / ナノテクノロジー / 超微細加工 / 反応ダイナミクス / 氷表面 / 水素分子生成 / スピン効果 / 水氷表面 / 反応ダイナミックス / スピン偏極原子 / 吸着脱離 / シリコン表面 / 水素原子 / 太陽電池 / 窒化シリコン / 微結晶シリコン / アモルファスシリコン / 薄膜 / ホットワイアCVD / 触媒化学気相成長 / 低温成長 / 真空エジェクタポンプ / アルゴン / シラン / シリコン膜 / 常圧CVD / ホットワイヤ-CVD Less

Formation of ultra-thin oxide films by high density radicalPrincipal Investigator
- Principal Investigator
  
  和泉亮
- Project Period (FY)
  2024 – 2026
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 21050:Electric and electronic materials-related
- Research Institution
  Kyushu Institute of Technology
Formation of insulators for the power devices inserting interface control layer by high-density radical methodPrincipal Investigator
- Principal Investigator
  
  IZUMI AKIRA
- Project Period (FY)
  2013 – 2015
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Kyushu Institute of Technology
Basic Processes in Hydrogen Atom-Surface Reactions: Spin Effect, Reaction Dynamics, and Origin of Interstellar Hydrogen Molecules
- Principal Investigator
  
  NAMIKI Akira
- Project Period (FY)
  2005 – 2009
- Research Category
  
  Grant-in-Aid for Specially Promoted Research
- Review Section
  
  Science and Engineering
  Engineering
- Research Institution
  Kyushu Institute of Technology
Hydrophilic of substrate surface for high quality film deposition using by high density radical treatmentPrincipal Investigator
- Principal Investigator
  
  IZUMI Akira
- Project Period (FY)
  2005 – 2006
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Applied materials science/Crystal engineering
- Research Institution
  Kyushu Institute of Technology
界面制御層を導入した高品質ゲート絶縁膜の低温形成Principal Investigator
- Principal Investigator
  
  和泉亮
- Project Period (FY)
  2002 – 2003
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Applied materials science/Crystal engineering
- Research Institution
  Kyushu Institute of Technology
Phase Control of Fullerene Materials through Chemical Synthesis and Field Effect Doping
- Principal Investigator
  
  IWASA Yoshihiro
- Project Period (FY)
  2001 – 2003
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  固体物性Ⅱ(磁性・金属・低温)
- Research Institution
  Tohoku University
活性ラジカルを用いたミリコン集積回路用ゲート絶縁膜の低温形成Principal Investigator
- Principal Investigator
  
  和泉亮
- Project Period (FY)
  2000 – 2001
- Research Category
  
  Grant-in-Aid for Encouragement of Young Scientists (A)
- Research Field
  
  Applied materials science/Crystal engineering
- Research Institution
  Japan Advanced Institute of Science and Technology
Novel Low-Cost Technology for Fabrication of Liquid Crystal Display
- Principal Investigator
  
  MATSUMURA Hideki
- Project Period (FY)
  2000 – 2002
- Research Category
  
  Grant-in-Aid for University and Society Collaboration
- Research Field
  
  電子デバイス・機器工学
- Research Institution
  JAIST (Japan Advanced Institute of Science and Technology)
触媒化学気相成長法によるシリコン系薄膜の成長プロセス
- Principal Investigator
  
  松村英樹
- Project Period (FY)
  1999
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Applied materials science/Crystal engineering
- Research Institution
  Japan Advanced Institute of Science and Technology
常圧触媒CVD(Cat-CVD)法
- Principal Investigator
  
  MATSUMURA Hideki
- Project Period (FY)
  1998
- Research Category
  
  Grant-in-Aid for Exploratory Research
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Japan Advanced Institute of Science and Technology
Fabrication of new type transistor using metal/metaloxide/metal tunneling junction
- Principal Investigator
  
  MATSUMURA Hideki
- Project Period (FY)
  1996
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  電子デバイス・機器工学
- Research Institution
  Japan Advanced Institute of Science and Technology, Hokuriku

All 2015 2009 2008 2007 2006 Other

All Journal Article Presentation Book Patent

[Book] 低温ポリシリコン薄膜トランジスターの開発第9章HWCVD(Cat-CVD)法による薄膜の成膜技術2006
- Author(s)
  浦岡行治(監修), 和泉亮
- Total Pages
  342
- Publisher
  シーエムシー出版
- Data Source
  KAKENHI-PROJECT-17560009
[Journal Article] Crystalization of D2O thin films on Ru(001) surfaces2009
- Author(s)
  T. Yamauchi, K. Mine, Y. Nakashima, A. Izumi, A. Namiki
- Journal Title
  
  Appl. Surf. Sci. 256
  
  Pages: 1124-1127
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17002011
[Journal Article] Crtstakuzatuib of D_2O thin films on Ru (001) surfaces2009
- Author(s)
  T.Yamauchi, K.Mine, Y.Nakashima, A.Izumi, A.Namiki
- Journal Title
  
  Applied Surface Science 256
  
  Pages: 1124-1127
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17002011
[Journal Article] Oxidation and reduction of thin Ru films by gas plasma2008
- Author(s)
  Y. Iwasaki, A. Izumi, H. Tsurumaki, A. Namiki, H. Oizumi, I. Nishiyama
- Journal Title
  
  Appl. Surf. Sci. 253
  
  Pages: 8699-8704
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17002011
[Journal Article] Oxidation and reduction of thin Ru films by gas plasma2007
- Author(s)
  Y.Iwasaki, A.Izumi, H.Tsurumaki, A.Namiki, H.Oizumi, I.Nishiyama
- Journal Title
  
  Applied Surface Science (印刷中)
- Data Source
  KAKENHI-PROJECT-17002011
[Journal Article] Reduction of oxide layer on various metal surfaces by atomic-hydrogen treatment2006
- Author(s)
  A.Izumi, T.Ueno, Y.Miyazaki, H.Oizumi, I.Nishiyama
- Journal Title
  
  Ext. abs. 4th Int. conf. Hot-Wire CVD (Cat-CVD) Process
  
  Pages: 314-316
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-17560009
[Journal Article] Deposition of SiCN films using organic liquid materials by HWCVD2006
- Author(s)
  A.Izumi, K.Oda
- Journal Title
  
  Thin Solid Films 501
  
  Pages: 195-197
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-17560009
[Journal Article] Evaluation of corrosion resistance of SiCN films deposited by HWCVD using organic liquid materials2006
- Author(s)
  T.Nakayamada, K.Matsuo, Y.Hayashi, A.Izumi, Y.Kadotani
- Journal Title
  
  Ext. abs. 4th Int. conf. Hot-Wire CVD (Cat-CVD) Process
  
  Pages: 234-236
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-17560009
[Journal Article] Ultra thin silicon nitride prepared by direct nitridation using ammonia decomposed species2006
- Author(s)
  Akira Izumi
- Journal Title
  
  Thin Solid Films 501
  
  Pages: 157-159
- Data Source
  KAKENHI-PROJECT-17560009
[Journal Article] Deposition of SiCN films using organic liquid materials by HWCVD method2006
- Author(s)
  Akira Izumi, Koshi Oda
- Journal Title
  
  Thin Solid Films 501
  
  Pages: 195-197
- Data Source
  KAKENHI-PROJECT-17560009
[Journal Article] Ultra thin silicon nitride prepared by direct nitridation using ammonia decomposed species2006
- Author(s)
  A.Izumi
- Journal Title
  
  Thin Solid Films 501
  
  Pages: 157-159
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-17560009
[Journal Article] Evaluation of corrosion resistance of SiCN films deposited by HWCVD using organic liquid materials2006
- Author(s)
  T.Nakayamada, K.Matsuo, Y.Hayashi, A.Izumi, Y.KAdotani
- Journal Title
  
  Ext. abs. 4th Int. conf. Hot-Wire CVD (Cat-CVD) Process
  
  Pages: 234-236
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-17560009
[Journal Article] Evaluation of corrosion resistance of SiGN films deposited by HWCVD using organic liquid materials2006
- Author(s)
  T.Nakayamada, K.Matsuo, Y.Hayashi, A.Izumi, Y.KAdotani
- Journal Title
  
  Ext. abs. 4th Int. conf. Hot-Wire CVD (Cat-CVD) Process
  
  Pages: 234-236
- Data Source
  KAKENHI-PROJECT-17560009
[Patent] 原子状水素定量方法及びその装置2008
- Inventor(s)
  並木章, 和泉亮, 鶴巻浩
- Industrial Property Rights Holder
  国立大学法人九州工業大学
- Acquisition Date
  2008-02-01
- Data Source
  KAKENHI-PROJECT-17002011
[Presentation] 窒化層を導入したSiCN/Si(100)の絶縁特性2015
- Author(s)
  林田祥吾、和泉亮
- Organizer
  応用物理学会九州支部学術講演会
- Place of Presentation
  琉球大学工学部
- Year and Date
  2015-12-05
- Data Source
  KAKENHI-PROJECT-25420290
[Presentation] Si基板上に堆積したSiCN膜の機械的特性調査および熱処理効果の検討2015
- Author(s)
  山本賢宏、山田知宏、門谷豊、和泉亮
- Organizer
  第12回Cat-CVD研究会
- Place of Presentation
  名古屋大学大学院工学研究科
- Year and Date
  2015-07-03
- Data Source
  KAKENHI-PROJECT-25420290
[Presentation] HWCVD法により堆積したSiCN/SI(100)の熱処理による電気的特性の向上2015
- Author(s)
  林田祥吾、井上洋平、和泉亮
- Organizer
  九州表面・真空研究会2015
- Place of Presentation
  九州工業大学工学部
- Year and Date
  2015-06-13
- Data Source
  KAKENHI-PROJECT-25420290
[Presentation] IRAS study on crystallization process of thin D_2O ice films on Ru(0001) surface2008
- Author(s)
  K. Mine, Y, Nakashima, T. Yamauchi, A. Izumi, and A. Namiki
- Organizer
  The 4th Vacuum and Surface Sciences Conference of Asia and Australia
- Place of Presentation
  松江、くにびきメッセ
- Year and Date
  2008-10-27
- Data Source
  KAKENHI-PROJECT-17002011
[Presentation] HW 法により堆積したSiCN 膜の電気的特性
- Author(s)
  森田慎弥、井上洋平、和泉　亮
- Organizer
  応用物理学会九州支部学術講演会
- Place of Presentation
  長崎大学工学部
- Data Source
  KAKENHI-PROJECT-25420290
[Presentation] 窒化層導入したSiCN/Si(100)の電気的特性評価
- Author(s)
  井上洋平、森田慎弥、和泉亮
- Organizer
  第11回Cat-CVD研究会
- Place of Presentation
  東北大学
- Year and Date
  2014-07-11 – 2014-07-12
- Data Source
  KAKENHI-PROJECT-25420290
[Presentation] HWCVD法により成膜したSiCN膜の剥離強度特性～熱処理効果の検討～
- Author(s)
  伊勢田徹平、中上昌俊、山本賢宏、山田知広、門谷豊、和泉亮
- Organizer
  応用物理学会九州支部学術講演会
- Place of Presentation
  大分大学
- Year and Date
  2014-12-06 – 2014-12-07
- Data Source
  KAKENHI-PROJECT-25420290
[Presentation] Evaluation of friction coefficient of silicon carbon nitride films deposited by HWCVD
- Author(s)
  Tomohiro Yamada, Masatoshi Nakagami, Yutaka Kadotani, Akira Izumi
- Organizer
  The 15th IUMRS-International Conference in Asia (IUMRS-ICA 2014)
- Place of Presentation
  Fukuoka
- Year and Date
  2014-08-24 – 2014-08-30
- Data Source
  KAKENHI-PROJECT-25420290
[Presentation] Adhesion properties of SiCN films deposited by hot-wire chemical deposition
- Author(s)
  Teppei Iseda, Masatoshi Nakagami, Tomohiro Yamada, Yutaka Kadotani, Akira Izumi
- Organizer
  HWCVD 8 Conference
- Place of Presentation
  Braunschweig (Germany)
- Year and Date
  2014-10-13 – 2014-10-16
- Data Source
  KAKENHI-PROJECT-25420290

1. MATSUMURA Hideki (90111682)

# of Collaborated Projects: 4 results

# of Collaborated Products: 0 results
2. MASUDA Atsushi (30283154)

# of Collaborated Projects: 3 results

# of Collaborated Products: 0 results
3. NAMIKI Akira (40126941)

# of Collaborated Projects: 1 results

# of Collaborated Products: 5 results
4. NITTA Koh-hei (70260560)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
5. TERANO Minoru (90251975)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
6. IWASA Yoshihiro (20184864)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
7. KOBAYASHI Shinichiro (20361173)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
8. TAHENOBU Taishi (70343035)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
9. TAGUCHI Yasujiro (70301132)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
10. 梅本宏信 (80167288)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
11. 野々村修一 (80164721)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
12. 小長井誠 (40111653)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
13. 鶴巻浩 (20315162)

# of Collaborated Projects: 1 results

# of Collaborated Products: 2 results
14. 山内貴志 (70419620)

# of Collaborated Projects: 1 results

# of Collaborated Products: 3 results
15. 成田克 (30396543)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
16. 稲永征司 (30093959)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
17. 内藤正路 (60264131)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
18. 孫勇 (60274560)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
19. KIDA Ken-ichiro

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results

Izumi Akira 和泉 亮

IZUMI AKIRA 和泉 亮

IZUMI Akira 和泉 亮

Research Projects

Research Products

Co-Researchers

Formation of ultra-thin oxide films by high density radicalPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

Formation of insulators for the power devices inserting interface control layer by high-density radical methodPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Basic Processes in Hydrogen Atom-Surface Reactions: Spin Effect, Reaction Dynamics, and Origin of Interstellar Hydrogen Molecules

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

Hydrophilic of substrate surface for high quality film deposition using by high density radical treatmentPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

界面制御層を導入した高品質ゲート絶縁膜の低温形成Principal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Phase Control of Fullerene Materials through Chemical Synthesis and Field Effect Doping

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

活性ラジカルを用いたミリコン集積回路用ゲート絶縁膜の低温形成Principal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Novel Low-Cost Technology for Fabrication of Liquid Crystal Display

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

触媒化学気相成長法によるシリコン系薄膜の成長プロセス

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

常圧触媒CVD(Cat-CVD)法

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Fabrication of new type transistor using metal/metaloxide/metal tunneling junction

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

[Book] 低温ポリシリコン薄膜トランジスターの開発 第9章HWCVD(Cat-CVD)法による薄膜の成膜技術2006

Author(s)

Total Pages

Publisher

Data Source

[Journal Article] Crystalization of D2O thin films on Ru(001) surfaces2009

Author(s)

Journal Title

Izumi Akira 和泉亮

IZUMI AKIRA 和泉亮

IZUMI Akira 和泉亮

[Book] 低温ポリシリコン薄膜トランジスターの開発第9章HWCVD(Cat-CVD)法による薄膜の成膜技術2006