• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

HAYASHI Toshio  林 俊雄

ORCIDConnect your ORCID iD *help
Researcher Number 30519591
Affiliation (based on the past Project Information) *help 2015: 名古屋大学, 大学院工学研究科, 教授
Review Section/Research Field
Except Principal Investigator
Plasma electronics
Keywords
Except Principal Investigator
プラズマビーム / レジスト / 凹凸 / プラズマ加工 / プラズマエッチング / プラズマ化学
  • Research Projects

    (1 results)
  • Research Products

    (4 results)
  • Co-Researchers

    (4 People)
  •  Plasma science for nano-scale fabrication of fragile materials

    • Principal Investigator
      Sekine Makoto
    • Project Period (FY)
      2013 – 2015
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Plasma electronics
    • Research Institution
      Nagoya University

All 2015

All Journal Article

  • [Journal Article] Silicon nitride (SiN) etch performance of CH2F2 plasmas diluted with argon or krypton2015

    • Author(s)
      Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori
    • Journal Title

      Japan. J. Appl. Phys.

      Volume: 54 Issue: 4 Pages: 040303-040303

    • DOI

      10.7567/jjap.54.040303

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-25286080
  • [Journal Article] Hydrofluorocarbon ion density of argon- or krypton-diluted CH2F2 plasmas: Generation of CH2F+ and CHF2+ by dissociative-ionization in charge exchange collisions2015

    • Author(s)
      Yusuke Kondo, Yudai Miyawaki, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori
    • Journal Title

      J. Phys. D: Appl. Phys.

      Volume: 48 Issue: 4 Pages: 045202-045202

    • DOI

      10.1088/0022-3727/48/4/045202

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-25286080
  • [Journal Article] Electronic properties of HBr, O2 and Cl2 used in Si etching2015

    • Author(s)
      Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
    • Journal Title

      Japan. J. Appl. Phys.

      Volume: 54 Issue: 6S2 Pages: 06GA03-06GA03

    • DOI

      10.7567/jjap.54.06ga03

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-25286080
  • [Journal Article] CF3+ fragmentation by electron impact ionization of perfluoro-propyl-vinyl-ethers, C5F10O, in gas phase2015

    • Author(s)
      Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori
    • Journal Title

      Japan. J. Appl. Phys.

      Volume: 54 Issue: 4 Pages: 040301-040301

    • DOI

      10.7567/jjap.54.040301

    • NAID

      210000144897

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-25286080
  • 1.  Sekine Makoto (80437087)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 4 results
  • 2.  TAKEDA Keigo (00377863)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 3 results
  • 3.  KONDO Hiroki (50345930)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 3 results
  • 4.  ISHIKAWA Kenji (60417384)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 4 results

URL: 

Are you sure that you want to link your ORCID iD to your KAKEN Researcher profile?
* This action can be performed only by the researcher himself/herself who is listed on the KAKEN Researcher’s page. Are you sure that this KAKEN Researcher’s page is your page?

この研究者とORCID iDの連携を行いますか?
※ この処理は、研究者本人だけが実行できます。

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi