HAYASHI Toshio 林俊雄

Researcher Number	30519591
Affiliation (based on the past Project Information) *help	2015: 名古屋大学, 大学院工学研究科, 教授
Review Section/Research Field	Except Principal Investigator Plasma electronics
Keywords	Except Principal Investigator プラズマビーム / レジスト / 凹凸 / プラズマ加工 / プラズマエッチング / プラズマ化学

Plasma science for nano-scale fabrication of fragile materials
- Principal Investigator
  
  Sekine Makoto
- Project Period (FY)
  2013 – 2015
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Plasma electronics
- Research Institution
  Nagoya University

All 2015

All Journal Article

[Journal Article] Silicon nitride (SiN) etch performance of CH2F2 plasmas diluted with argon or krypton2015
- Author(s)
  Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori
- Journal Title
  
  Japan. J. Appl. Phys.
  
  Volume: 54 Issue: 4 Pages: 040303-040303
- DOI
  10.7567/jjap.54.040303
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25286080
[Journal Article] Hydrofluorocarbon ion density of argon- or krypton-diluted CH2F2 plasmas: Generation of CH2F+ and CHF2+ by dissociative-ionization in charge exchange collisions2015
- Author(s)
  Yusuke Kondo, Yudai Miyawaki, Kenji Ishikawa, Toshio Hayashi, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori
- Journal Title
  
  J. Phys. D: Appl. Phys.
  
  Volume: 48 Issue: 4 Pages: 045202-045202
- DOI
  10.1088/0022-3727/48/4/045202
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25286080
[Journal Article] Electronic properties of HBr, O2 and Cl2 used in Si etching2015
- Author(s)
  Toshio Hayashi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
- Journal Title
  
  Japan. J. Appl. Phys.
  
  Volume: 54 Issue: 6S2 Pages: 06GA03-06GA03
- DOI
  10.7567/jjap.54.06ga03
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25286080
[Journal Article] CF3+ fragmentation by electron impact ionization of perfluoro-propyl-vinyl-ethers, C5F10O, in gas phase2015
- Author(s)
  Yusuke Kondo, Kenji Ishikawa, Toshio Hayashi, Yudai Miyawaki, Keigo Takeda, Hiroki Kondo, Makoto Sekine, and Masaru Hori
- Journal Title
  
  Japan. J. Appl. Phys.
  
  Volume: 54 Issue: 4 Pages: 040301-040301
- DOI
  10.7567/jjap.54.040301
- NAID
  210000144897
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25286080

1. Sekine Makoto (80437087)

# of Collaborated Projects: 1 results

# of Collaborated Products: 4 results
2. TAKEDA Keigo (00377863)

# of Collaborated Projects: 1 results

# of Collaborated Products: 3 results
3. KONDO Hiroki (50345930)

# of Collaborated Projects: 1 results

# of Collaborated Products: 3 results
4. ISHIKAWA Kenji (60417384)

# of Collaborated Projects: 1 results

# of Collaborated Products: 4 results

HAYASHI Toshio 林俊雄

Research Projects

Research Products

Co-Researchers

Plasma science for nano-scale fabrication of fragile materials

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

[Journal Article] Silicon nitride (SiN) etch performance of CH2F2 plasmas diluted with argon or krypton2015

Author(s)

Journal Title

DOI

Data Source

[Journal Article] Hydrofluorocarbon ion density of argon- or krypton-diluted CH2F2 plasmas: Generation of CH2F+ and CHF2+ by dissociative-ionization in charge exchange collisions2015

Author(s)

Journal Title

DOI

Data Source

[Journal Article] Electronic properties of HBr, O2 and Cl2 used in Si etching2015

Author(s)

Journal Title

DOI

Data Source

[Journal Article] CF3+ fragmentation by electron impact ionization of perfluoro-propyl-vinyl-ethers, C5F10O, in gas phase2015

Author(s)

Journal Title

DOI

NAID

Data Source

HAYASHI Toshio 林 俊雄

Research Projects

Research Products

Co-Researchers

Plasma science for nano-scale fabrication of fragile materials

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

[Journal Article] Silicon nitride (SiN) etch performance of CH2F2 plasmas diluted with argon or krypton2015

Author(s)

Journal Title

DOI

Data Source

[Journal Article] Hydrofluorocarbon ion density of argon- or krypton-diluted CH2F2 plasmas: Generation of CH2F+ and CHF2+ by dissociative-ionization in charge exchange collisions2015

Author(s)

Journal Title

DOI

Data Source

[Journal Article] Electronic properties of HBr, O2 and Cl2 used in Si etching2015

Author(s)

Journal Title

DOI

Data Source

[Journal Article] CF3+ fragmentation by electron impact ionization of perfluoro-propyl-vinyl-ethers, C5F10O, in gas phase2015

Author(s)

Journal Title

DOI

NAID

Data Source

HAYASHI Toshio 林俊雄