KOTERA Masatoshi 小寺正敏

Researcher Number	40170279
Other IDs
External Links
Affiliation (based on the past Project Information) *help	2010 – 2021: 大阪工業大学, 工学部, 教授 1995 – 1997: 大阪工業大学, 工学部, 教授 1991 – 1993: 大阪工業大学, 工学部, 助教授 1987: Assosiate Prof.,Faculty of Engineering, Osaka Institute of Technology, 工学部, 助教授 1986: 大阪工業大学, 工学部, 講師
Review Section/Research Field	Principal Investigator Basic Section 21060:Electron device and electronic equipment-related / Electron device/Electronic equipment / 計測・制御工学 / 計測・制御工学 / Thin film/Surface and interfacial physical properties Except Principal Investigator Electron device/Electronic equipment / 電子機器工学 / Applied physics, general
Keywords	Principal Investigator フォギング電子 / フォギング電子軌道追跡 / フォギング電子空間分布測定 / 帯電現象の解析 / 静電気力顕微鏡 / 電子ビームリソグラフィ / Design of the System / Simulation of Electron Beam Trajectory / 電子散乱のシミュレーション / 静電気力顕微鏡法 … More / 無帯電露光条件 / マルチスケール分析 / フォギング電子解析 / 無帯電条件 / 電子ビーム誘起導電現象 / レジスト帯電現象の解析 / マルチスケール / マルチスケール解析 / レジスト無帯電露光条件 / Low Temperature SEM / Type-I Magnetic contrast / Scanning Electron Microscopy / Type I磁気コントラスト / 磁束量子観察 / マイクロチャンネルプレート / 高温超伝導薄膜 / Type-I磁気コントラスト / 走査電子顕微鏡法 / 磁束観察 / Optimization of the Electron Optics / Reflection Electron Image / Electrostatic Scanning Electron Microscope / 反射電子検出 / ディジタル電子ビ-ム走査 / 電子軌道シミュレ-ション / システム設計 / 電子軌道シミュレーション / 電子光学系の最適化 / 反射電子像 / 静電型走査電子顕微鏡 / プローブ顕微鏡法 / 帯電電位測定 / 静電気力顕微鏡システム / 電子ビーム照射に伴う帯電 / 走査電子顕微鏡 / 加速電圧依存性 / 電位分布 / 試料帯電 / 電子ビーム機器 / EBIC / 帯電電荷計測 / 電子顕微鏡 … More Except Principal Investigator ESEM / 分子動力学法 / モンテカルロ法 / 半導体リソグラフィ / マルチスケール解析 / 確率論的シミュレーション / レジスト分子 / スケール境界領域 / マルチスケールシミュレーション / ナノインプリント / 極端紫外線リソグラフィ / 電子線リソグラフィ / パターン形成 / 3D Microscopy / Acoustic microscopy / 超音波ホログラム顕微鏡 / ホログラム顕微鏡 / 赤外線顕微鏡 / 立体顕微鏡 / 超音波顕微鏡 / single scattering model / Monte Carlo simulation / Oligo-scattering phenomenon / Oligo-scattering electron beam / electron beam analyzer / 検体 / 試料分析 / 電子ビーム分析 / AIRSEM / ASEM / Oligo Scattering / Origo Scatlering / 細胞観察 / 生体試料 / オリゴ散乱 / 生体観察 / 環境顕微鏡 / 計算物理 / 分子動力学 / マルチフィジックス / ナノプロセス / 電子ビーム Less

Systematization of Non-Charging Exposure Conditions in Electron Beam LithographyPrincipal Investigator
- Principal Investigator
  
  KOTERA MASATOSHI
- Project Period (FY)
  2019 – 2021
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 21060:Electron device and electronic equipment-related
- Research Institution
  Osaka Institute of Technology
Multiscale analysis of charging phenomena to reduce the effects of charging in electron beam lithographyPrincipal Investigator
- Principal Investigator
  
  KOTERA Masatoshi
- Project Period (FY)
  2016 – 2018
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electron device/Electronic equipment
- Research Institution
  Osaka Institute of Technology
Computational study of pattern formation process in scale-boundary region
- Principal Investigator
  
  YASUDA MASAAKI
- Project Period (FY)
  2015 – 2017
- Research Category
  
  Grant-in-Aid for Challenging Exploratory Research
- Research Field
  
  Electron device/Electronic equipment
- Research Institution
  Osaka Prefecture University
Multiphysics simulation of electron beam nanoprocess
- Principal Investigator
  
  YASUDA Masaaki
- Project Period (FY)
  2013 – 2015
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Electron device/Electronic equipment
- Research Institution
  Osaka Prefecture University
Development of wide range-nanometer resolution-real time measurement system of charged up specimen irradiated by electron beamPrincipal Investigator
- Principal Investigator
  
  KOTERA Masatoshi
- Project Period (FY)
  2010 – 2012
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Thin film/Surface and interfacial physical properties
- Research Institution
  Osaka Institute of Technology
DEVELOPMENT OF AN IMAGING TECHNIQUE OF MAGNETIC FLUX PENETRATING THROUGH SUPERCONDUCTING FILMPrincipal Investigator
- Principal Investigator
  
  KOTERA Masatoshi
- Project Period (FY)
  1995 – 1997
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  計測・制御工学
- Research Institution
  OSAKA INSTITUTE OF TECHNOLOGY
INVESTIGATION OF ELECTRON BEAM ANALYZER FOR OBSERVING THE SPECIMEN IN THE AIR
- Principal Investigator
  
  SUGA Hiroshi
- Project Period (FY)
  1995 – 1996
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Applied physics, general
- Research Institution
  OSAKA INSTITUTE OF TECHNOLOGY (OIT)
A PRODUCTION OF AN ELECTROSTATIC SCANNING ELECTRON MICROSCOPEPrincipal Investigator
- Principal Investigator
  
  KOTERA Masatoshi
- Project Period (FY)
  1991 – 1993
- Research Category
  
  Grant-in-Aid for General Scientific Research (C)
- Research Field
  
  計測・制御工学
- Research Institution
  OSAKA INSTITUTE OF TECHNOLOGY
3D microscopy by using acoustic wave and electron beam
- Principal Investigator
  
  SUGA Hiroshi
- Project Period (FY)
  1986 – 1987
- Research Category
  
  Grant-in-Aid for General Scientific Research (C)
- Research Field
  
  電子機器工学
- Research Institution
  Osaka Institute of Technology

All 2021 2020 2019 2018 2017 2016 2015 2014 2013 2012 2011 2010 Other

All Journal Article Presentation Book

[Book] 電子・イオンビームハンドブック第4版2021
- Author(s)
  松井真二、高岡義寛、臼井博明、谷口淳、八坂行人、高橋由夫、桑原真、糟谷圭吾、豊田紀章、千葉敦也、百田佐多生、岡山重夫、近藤行人、森下茂幸、村田英一、安田雅昭、小寺正敏、古澤孝弘、園山百代、揚村寿英他
- Total Pages
  593
- Publisher
  日刊工業新聞社
- ISBN
  9784600006242
- Data Source
  KAKENHI-PROJECT-19K04519
[Journal Article] Investigation of non-charging exposure conditions for insulating resist films in electron beam lithography2021
- Author(s)
  Kubo Kento、Kojima Kentaro、Kono Yoshinobu、Kotera Masatoshi
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 60 Issue: SC Pages: SCCB02-SCCB02
- DOI
  10.35848/1347-4065/abf46a
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19K04519
[Journal Article] Non-charging Conditions of Insulating Film under Electron Beam Irradiation2020
- Author(s)
  Hideya Mizuno, Kento Kubo, Kentaro Kojima, Masatoshi Kotera
- Journal Title
  
  e-J. Surf. Sci. Nanotechnol.
  
  Volume: 18 Issue: 0 Pages: 106-109
- DOI
  10.1380/ejssnt.2020.106
- NAID
  130007813455
- ISSN
  1348-0391
- Year and Date
  2020-03-21
- Language
  English
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-19K04519
[Journal Article] 電子ビーム照射を受けた導体上レジスト薄膜の帯電現象の解析2020
- Author(s)
  小寺正敏
- Journal Title
  
  荷電粒子ビームの工業への応用第132委員会第第242回研究会資料
  
  Volume: 2A-1478 Pages: 15-22
- Data Source
  KAKENHI-PROJECT-19K04519
[Journal Article] Simulation of fogging electron trajectories in a scanning electron microscope2018
- Author(s)
  Yuka Ito, Takatoshi Donga, Kentaro Morimoto and Masatoshi Kotera
- Journal Title
  
  Proc. SPIE 10810, Photomask Technology
  
  Volume: 10810 Pages: 10-10
- DOI
  10.1117/12.2504822
- Peer Reviewed / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Journal Article] Multiphysics Simulation of Nanopatterning in Electron Beam Lithography2016
- Author(s)
  M. Yasuda, K. Tada and M. Kotera
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 29 Issue: 5 Pages: 725-730
- DOI
  10.2494/photopolymer.29.725
- NAID
  130005261816
- ISSN
  0914-9244, 1349-6336
- Language
  English
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-15K13978
[Journal Article] Measurement of surface potential of insulating film on a conductive substrate in a scanning electron microscope specimen chamber2011
- Author(s)
  Masatoshi Kotera, Akira Osada, Masaru Otani , Yasuhiro Ohara
- Journal Title
  
  Journal of Vacuum Science and Technology
  
  Volume: B 29(6) Issue: 6 Pages: 06F316-06F316
- DOI
  10.1116/1.3662079
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Effect of Time Variation on Charging Phenomenon and Exposure Dose Dependency of Surface potential2021
- Author(s)
  Yoshinobu Kono, Kentaro Kojima, Kento Kubo and Masatoshi Kotera
- Organizer
  Photomask Japan 2021
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] 電子ビームリソグラフィにおける無帯電条件について2021
- Author(s)
  小寺正敏
- Organizer
  2020 年度日本顕微鏡学会SEM の物理学分科会討論会
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Investigation of Non-Charging Exposure Conditions for Insulating ResistFilms in Electron Beam Lithography2021
- Author(s)
  Kentaro Kojima, Kento Kubo, Yoshinobu Kono and Masatoshi Kotera
- Organizer
  The 64th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] 電子ビームリソグラフィにおけるレジスト帯電の分析2021
- Author(s)
  河野由伸，小島健太郎，小寺正敏
- Organizer
  第82回応用物理学会周期学術講演会
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] 電子ビームリソグラフィにおけるレジスト無帯電の露光条件探索2021
- Author(s)
  小島健太郎、久保建統、河野由伸、小寺正敏
- Organizer
  2021年第68回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Analysis of resist charging in electron beam lithography2021
- Author(s)
  Yoshinobu Kono, Kentaro Kojima and Masatoshi Kotera
- Organizer
  Micro and Nano Engineering Conference 2021
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] 電子ビーム照射を受けた導体上レジスト薄膜の帯電現象の解析2021
- Author(s)
  小寺正敏
- Organizer
  応用物理学会次世代リソグラフィ（NGL）技術研究会
- Invited
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] 電子ビーム照射を受けた導体上レジスト薄膜の帯電現象の解析2020
- Author(s)
  小寺正敏
- Organizer
  荷電粒子ビームの工業への応用第132委員会第第242回研究会
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] 電子ビームリソグラフィにおけるレジストの無帯電露光条件2020
- Author(s)
  小寺正敏、水野秀哉、久保建統、小島健太郎
- Organizer
  2020年度実用表面分析講演会
- Invited
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Investigation of non-charging exposure conditions for insulating resist films in electron beam lithography2020
- Author(s)
  Kento Kubo, Kentaro Kojima Yoshinobu Kono and Masatoshi Kotera
- Organizer
  33rd International Microprocesses and Nanotechnology Conference
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Potential distribution on the resist surface after electron beam irradiation with respect to resist thickness and elapsed time2020
- Author(s)
  Kentaro Kojima, Kento Kubo, Yoshinobu Kono and Masatoshi Kotera
- Organizer
  33rd International Microprocesses and Nanotechnology Conference
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Investigation of Non-Charging Exposure Condition in Electron Beam Lithography2019
- Author(s)
  Kento Kubo, Hideya Mizuno and Masatoshi Kotera
- Organizer
  Photomask Japan 2019
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Simulation of multiply scattered electron trajectories in scanning electron microscope specimen chamber2019
- Author(s)
  Yuka Ito, Kentaro Morimoto, Masatoshi Kotera
- Organizer
  Microscopy Congress 2019
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Observation of charging image of insulating film under electron beam irradiation2019
- Author(s)
  Kento Kubo, Hideya Mizuno, Kentaro Kojima and Masatoshi Kotera
- Organizer
  12th International Symposium on Atomic Level Characterizations for New Materials and Devices '19
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Non-charging conditions of insulating film under electron beam irradiation2019
- Author(s)
  Hideya Mizuno, Kento Kubo, Kentaro Kojima and Masatoshi Kotera
- Organizer
  12th International Symposium on Atomic Level Characterizations for New Materials and Devices '19
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Measurement of absorbed current for quantitative evaluation of scattered electrons in a scanning electron microscope2019
- Author(s)
  Kentaro Morimoto, Yuka Ito, Masatoshi Kotera
- Organizer
  Microscopy Congress 2019
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] 走査電子顕微鏡試料室における多重散乱電子軌道のシミュレーション2019
- Author(s)
  伊藤優花, 森本健太郎, 小寺正敏
- Organizer
  第80回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Non-Charging Exposure Condition of Insulating Resist in Electron Beam Lithography2019
- Author(s)
  Masatoshi Kotera, Kento Kubo and Hideya Mizuno
- Organizer
  International Materials Research Congress 2019
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] 走査電子顕微鏡における散乱電子の定量的評価のための吸収電流の測定2019
- Author(s)
  森本健太郎, 伊藤優花, 小寺正敏
- Organizer
  第80回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Investigation of Non-Charging Exposure Condition in Electron Beam Lithography2019
- Author(s)
  Hideya Mizuno, Kento Kubo, Kentaro Kojima, Masatoshi Kotera
- Organizer
  32nd International Microprocesses and Nanotechnology Conference 2019
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Simulation Of Electron Trajectories In Scanning Electron Microscope Specimen Chamber2019
- Author(s)
  Yuka Ito, Kentaro Morimoto, Masatoshi Kotera
- Organizer
  Microscience Microscopy Congress 2019
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] 電子ビームリソグラフィにおけるレジスト無帯電の露光条件探索2019
- Author(s)
  久保建統，水野秀哉，小寺正敏
- Organizer
  NGL(次世代リソグラフィ)研究会ワークショップ
- Invited
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] 電子ビームリソグラフィにおけるレジスト無帯電の露光条件探索2019
- Author(s)
  水野秀哉，久保建統，小島健太郎,　小寺正敏
- Organizer
  第80回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] 低エネルギー電子の試料室内部での散乱2019
- Author(s)
  小寺正敏
- Organizer
  日本顕微鏡学会　SEMの物理学分科会討論会
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Non-Charging Exposure Conditions of Insulating Resist in Electron Beam Lithography2019
- Author(s)
  Masatoshi Kotera, Kento Kubo, Kentaro Kojima, Hideya Mizuno
- Organizer
  32nd International Microprocesses and Nanotechnology Conference 2019
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Measurement of absorbed current for quantitative evaluation of scattered electrons in a scanning electron microscope2019
- Author(s)
  Kentaro Morimoto, Yuka Ito, Masatoshi Kotera
- Organizer
  32nd International Microprocesses and Nanotechnology Conference 2019
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Measurement Of Scattered Electron Current Distribution In Scanning Electron Microscope2019
- Author(s)
  Kentaro Morimoto, Yuka Ito, Masatoshi Kotera
- Organizer
  Microscience Microscopy Congress 2019
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Investigation Of Non-Charging Exposure Condition In Electron Beam Lithography2019
- Author(s)
  Kento Kubo, Hideya Mizuno and Masatoshi Kotera
- Organizer
  Microscience Microscopy Congress 2019
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04519
[Presentation] Time evolution simulation of scattered electrons in scanning electron microscope specimen chamber2018
- Author(s)
  Takatoshi Donga, Yuka Ito, Masatoshi Kotera
- Organizer
  19th International Microscopy Congress
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Flare electrons that cause positive charging by scattering in scanning electron microscope2018
- Author(s)
  Shota Nishimura, Hideya Mizuno, Masatoshi Kotera
- Organizer
  19th International Microscopy Congress
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Contribution of flare electrons to produce potential distribution on an insulator film by electron beam irradiation2018
- Author(s)
  Hideya Mizuno, Shota Nishimura, Masatoshi Kotera
- Organizer
  Photomask Japan 2018
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Investigation of Non-Charging Condition of Resist in Electon Beam Lithography2018
- Author(s)
  Shota Nishimura, Hideya Mizuno, Masatoshi Kotera
- Organizer
  31st International Microprocesses and Nanotechnology Conference
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 同一電界によるフォギング電子のエネルギー分析2018
- Author(s)
  水野秀哉，西村将太，久保建統，小寺正敏
- Organizer
  第79回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 電子ビーム照射された絶縁体試料表面電位分布の負バイアス依存性2018
- Author(s)
  西村将太，水野秀哉，久保建統，小寺正敏
- Organizer
  第79回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Three-dimensional trajectory simulation of scattered electrons in scanning electron microscope specimen chamber2018
- Author(s)
  Yuka Ito, Takatoshi Donga, Kentaro Morimoto, Masatoshi Kotera
- Organizer
  19th International Microscopy Congress
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Measurement of scattered electron current distribution in scanning electron microscope2018
- Author(s)
  Kentaro Morimoto, Yuka Ito, Masatoshi Kotera
- Organizer
  19th International Microscopy Congress
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Measurement of the Flare Electron Current in Scanning Electron Microscope2018
- Author(s)
  Kentaro Morimoto, Yoshifumi Hagiwara, Masatoshi Kotera
- Organizer
  Photomask Japan 2018
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Three-Dimensional Trajectory Simulation of Fogging Electrons in Scanning Electron Microscope2018
- Author(s)
  Yuka Ito, Takatoshi Donga, Kentaro Morimoto, Masatoshi Kotera
- Organizer
  31st International Microprocesses and Nanotechnology Conference, (MNC2018)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] SEM試料室内散乱電子の解析2018
- Author(s)
  小寺正敏
- Organizer
  2018 年度　日本顕微鏡学会 SEM の物理学分科会研究会
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Simulation of fogging electron trajectories in a scanning electron microscope2018
- Author(s)
  Yuka Ito, Takatoshi Donga, Kentaro Morimoto, Masatoshi Kotera
- Organizer
  Photomask Japan 2018
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Simulation of fogging electron trajectories in a scanning electron microscope2018
- Author(s)
  Yuka Ito, Takatoshi Donga, Kentaro Morimoto, Masatoshi Kotera
- Organizer
  SPIE Photomask Technology + EUV Lithography 2018
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Positive and negative charge accumulation mechanism generated by electron beam irradiation to insulating specimen2018
- Author(s)
  Hideya Mizuno, Shota Nishimura, Masatoshi Kotera
- Organizer
  19th International Microscopy Congress
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Energy Analysis of Fogging Electrons in Scanning Electron Microscope2018
- Author(s)
  Kentaro Morimoto, Takatoshi Donga, Yuka Ito, Masatoshi Kotera
- Organizer
  31st International Microprocesses and Nanotechnology Conference
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Energy Analysis of Fogging Electrons by The Same Electric Field2018
- Author(s)
  Hideya Mizuno, Shota Nishimura, Kento Kubo, Masatoshi Kotera
- Organizer
  31st International Microprocesses and Nanotechnology Conference
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 走査電子顕微鏡内におけるフォギング電子軌道シミュレーション2017
- Author(s)
  西野大輝，小寺正敏
- Organizer
  平成28年度日本材料学会第5回半導体エレクトロニクス部門委員会第1回講演会・見学会
- Place of Presentation
  鳥取大学（鳥取県鳥取市）
- Year and Date
  2017-01-28
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Enormous lateral distribution of electrons generated by electron beam in a scanning electron microscope2017
- Author(s)
  Shota Nishimura, Takuya Kawamoto, Masatoshi Kotera
- Organizer
  Photomask Japan 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Contribution of flare electrons on enormous large areal positive charging2017
- Author(s)
  Shota Nishimura,Takuya Kawamoto,Hideaki Mizuno, Masaki Moriyama, Masatoshi Kotera
- Organizer
  Atomic Level Characterization 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 電子ビーム照射付近から遠方で正帯電を引き起こすフレア電子について2017
- Author(s)
  西村将太，河本拓也，小寺正敏
- Organizer
  第78回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 査電子顕微鏡試料室における散乱電子の三次元軌道のシミュレーション2017
- Author(s)
  寺田一真，萩原佳史，小寺正敏
- Organizer
  第78回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Measurement of the flare electron current distribution with various accelerating voltage in scanning electron microscope2017
- Author(s)
  Yoshifumi Hagiwara, Kentaro Morimoto, Yuka Ito, Masatoshi Kotera
- Organizer
  Atomic Level Characterization 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 走査電子顕微鏡内におけるフレア電子の電流分布測定2017
- Author(s)
  萩原佳史, 森本健太郎, 伊藤優花，小寺正敏
- Organizer
  第78回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Simulation of fogging electron trajectories in Faraday cup2017
- Author(s)
  Takatoshi Donga, Masatoshi Kotera
- Organizer
  Atomic Level Characterization 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] ファラデーカップ設計のための電子散乱シミュレーション2017
- Author(s)
  頓花貴俊，伊藤優花，小寺正敏
- Organizer
  第78回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Simulation of Fogging Electron Trajectories in a Scanning Electron Microscope2017
- Author(s)
  T. Nishino and M. Kotera
- Organizer
  Symposium on Surface Science & Nanotechnology -25th Anniversary of SSSJ Kanasi-
- Place of Presentation
  Kyoto International Community House, Kyoto, Japan
- Year and Date
  2017-01-25
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Measurement of Fogging Electron Current at the Objective Lens and the Specimen Surface in SEM2017
- Author(s)
  Y. Hagiwara, T. Noda, M. Kotera and R. Gauvin
- Organizer
  Symposium on Surface Science & Nanotechnology -25th Anniversary of SSSJ Kanasi-
- Place of Presentation
  Kyoto International Community House, Kyoto, Japan
- Year and Date
  2017-01-24
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Measurement of enormous spatial distribution of scattered electrons in scanning electron microscope2017
- Author(s)
  Shota Nishimura, Takuya Kawamoto, Hideya Mizuno, Masaki Moriyama, Masatoshi Kotera
- Organizer
  Microscopy Conference 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Three-dimensional trajectory simulation of scattered electrons in scanning electron microscope specimen chamber2017
- Author(s)
  Kazumasa Terada, Yoshifumi Hagiwara, Masatoshi Kotera
- Organizer
  Atomic Level Characterization 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 電子ビーム照射された絶縁体試料表面電位分布のワーキングディスタンスと印加バイアス依存性2016
- Author(s)
  東海昌司，河本拓也，小寺正敏
- Organizer
  第63回応用物理学会春季学術講演会
- Place of Presentation
  東京工業大学（東京都目黒区）
- Year and Date
  2016-03-21
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Measurement of Fogging Electron Current for Various Beam Energies at Acceleration Bias in Scanning Electron Microscope2016
- Author(s)
  Yoshifumi Hagiwara, Taku Noda, Masatoshi Kotera
- Organizer
  29th International Microprocesses and Nanotechnology Conference, (MNC2016)
- Place of Presentation
  ANA Crowne Plaza Kyoto, Kyoto, Japan
- Year and Date
  2016-11-10
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Dependence of the working distance and the applied bias on the surface potential distribution of insulating specimen irradiated by electron beam2016
- Author(s)
  Takuya Kawamoto, Masashi Tokai, Shota Nishimura, Tatsuya Toyama, Masatoshi Kotera
- Organizer
  42nd International Conference on Micro and Nano Engineering, (MNE2016)
- Place of Presentation
  Congress Center, Vienna, Austria
- Year and Date
  2016-09-20
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 走査電子顕微鏡内におけるフォギング電子の加速電圧変化2016
- Author(s)
  萩原佳史，野田　拓，小寺正敏，Raynald Gauvin
- Organizer
  第77回応用物理学会学術講演会
- Place of Presentation
  朱鷺メッセ（新潟県新潟市）
- Year and Date
  2016-09-15
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Dependence of the working distance and the applied bias on the surface potential distribution of insulating specimen irradiated by electron beam2016
- Author(s)
  Masashi Toukai, Takuya Kawamoto, Masatoshi Kotera
- Organizer
  Photomask Japan 2016
- Place of Presentation
  Pacifico Yokohama, Yokohama, Japan
- Year and Date
  2016-04-08
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Multiphysics Simulation of Nanopatterning in Electron Beam Lithography2016
- Author(s)
  M. Yasuda, K. Tada and M. Kotera
- Organizer
  33nd International Conference of Photopolymer Science and Technology
- Place of Presentation
  Makuhari Messe, Chiba, Japan
- Year and Date
  2016-06-24
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K13978
[Presentation] Simulation of Three-dimensional Electron Charge distribution of PMMA film on Si substrate by electron beam irradiation2016
- Author(s)
  A. Fukuzawa and M. Kotera
- Organizer
  The 23rd Symposium on Photomask and NGL Mask Technology
- Place of Presentation
  Pacifico Yokohama, Yokohama, Japan
- Year and Date
  2016-04-07
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Development of a Simulation of Fogging Electron Trajectories in a Scanning Electron Microscope2016
- Author(s)
  Taiki Nishino, Kazumasa Terada, Masatoshi Kotera
- Organizer
  29th International Microprocesses and Nanotechnology Conference, (MNC2016)
- Place of Presentation
  ANA Crowne Plaza Kyoto, Kyoto, Japan
- Year and Date
  2016-11-10
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Simulation of Three-dimensional Electron Charge distribution of PMMA film on Si substrate by electron beam irradiation2016
- Author(s)
  Akihiro Fukuzawa, Masatoshi Kotera
- Organizer
  Photomask Japan 2016
- Place of Presentation
  Pacifico Yokohama, Yokohama, Japan
- Year and Date
  2016-04-08
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 走査電子顕微鏡内のフォギング電流測定2016
- Author(s)
  野田　拓，小寺正敏
- Organizer
  日本顕微鏡学会　「SEMの物理学」分科会討論会
- Place of Presentation
  鞆シーサイドホテル（広島県福山市）
- Year and Date
  2016-11-12
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] EB照射後の絶縁体試料表面電位のワーキングディスタンスと印加バイアス依存性2016
- Author(s)
  東海昌司，河本拓也，小寺正敏
- Organizer
  日本顕微鏡学会第72回学術講演会
- Place of Presentation
  仙台国際センター（宮城県仙台市）
- Year and Date
  2016-06-15
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 走査電子顕微鏡内のフォギング電子軌道のシミュレーション2016
- Author(s)
  西野大輝，小寺正敏
- Organizer
  日本顕微鏡学会　「SEMの物理学」分科会討論会
- Place of Presentation
  鞆シーサイドホテル（広島県福山市）
- Year and Date
  2016-11-12
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Measurement of fogging electron current in scanning electron microscope2016
- Author(s)
  Yoshifumi Hagiwara, Taku Noda, Masatoshi Kotera, Raynald Gauvin
- Organizer
  11th Asia-Pacific Microscopy Conference, (APMC11)
- Place of Presentation
  Graceland, Phuket, Thailand
- Year and Date
  2016-05-25
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Measurement of Fogging Electron Current at a Specimen Surface in Scanning Electron Microscope2016
- Author(s)
  Taku Noda, Yoshifumi Hagiwara, Masatoshi Kotera
- Organizer
  29th International Microprocesses and Nanotechnology Conference, (MNC2016)
- Place of Presentation
  ANA Crowne Plaza Kyoto, Kyoto, Japan
- Year and Date
  2016-11-10
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 走査電子顕微鏡内のフォギング電子軌道のシミュレーション2016
- Author(s)
  西野大輝，小寺正敏
- Organizer
  日本顕微鏡学会第59回シンポジウム
- Place of Presentation
  帝京平成大学池袋キャンパス（東京都豊島区）
- Year and Date
  2016-11-18
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Dependence of the working distance and the applied bias on the surface potential distribution of insulating specimen irradiated by electron beam2016
- Author(s)
  M. Toukai, T. Kawamoto and M. Kotera
- Organizer
  The 23rd Symposium on Photomask and NGL Mask Technology
- Place of Presentation
  Pacifico Yokohama, Yokohama, Japan
- Year and Date
  2016-04-07
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Multiphysics Simulation of Nanopatterning in Electron Beam Lithography2016
- Author(s)
  M. Yasuda, K. Tada and M. Kotera
- Organizer
  33rd International Conference of Photopolymer Science and Technology
- Place of Presentation
  Makuhari Messe, Chiba, Japan
- Year and Date
  2016-06-24
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 電子ビーム照射による試料表面電位と電荷蓄積のシミュレーション2016
- Author(s)
  福澤諒大，小寺正敏
- Organizer
  第77回応用物理学会学術講演会
- Place of Presentation
  朱鷺メッセ（新潟県新潟市）
- Year and Date
  2016-09-14
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Dependence of the working distance and the applied bias on the surface potential distribution of insulating specimen irradiated by electron beam2016
- Author(s)
  Takuya Kawamoto, Masashi Tokai, Masatoshi Kotera
- Organizer
  11th Asia-Pacific Microscopy Conference, (APMC11)
- Place of Presentation
  Graceland, Phuket, Thailand
- Year and Date
  2016-05-25
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 電子ビーム照射された絶縁体試料表面電位分布のワーキングディスタンスと印加バイアス依存性2016
- Author(s)
  東海昌司，河本拓也，小寺正敏
- Organizer
  第77回応用物理学会学術講演会
- Place of Presentation
  朱鷺メッセ（新潟県新潟市）
- Year and Date
  2016-09-14
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Dependence of fogging electron current on the collection field2016
- Author(s)
  Yoshifumi Hagiwara, Taku Noda, Masatoshi Kotera, Raynald Gauvin
- Organizer
  42nd International Conference on Micro and Nano Engineering, (MNE2016)
- Place of Presentation
  Congress Center, Vienna, Austria
- Year and Date
  2016-09-20
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 電子ビーム照射による試料表面電位と電荷蓄積のシミュレーション2016
- Author(s)
  福澤諒大，小寺正敏
- Organizer
  日本顕微鏡学会　「SEMの物理学」分科会討論会
- Place of Presentation
  鞆シーサイドホテル（広島県福山市）
- Year and Date
  2016-11-12
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Simulation of Charging Process of PMMA Film on Si Substrate under Electron Beam Irradiation2016
- Author(s)
  Akihiro Fukuzawa, Masatoshi Kotera
- Organizer
  29th International Microprocesses and Nanotechnology Conference, (MNC2016)
- Place of Presentation
  ANA Crowne Plaza Kyoto, Kyoto, Japan
- Year and Date
  2016-11-10
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Development of trajectory simulation of fogging electrons in a vacuum specimen chamber2016
- Author(s)
  Kazumasa Terada1, Taiki Nishino, Taku Noda, Masatoshi Kotera
- Organizer
  11th Asia-Pacific Microscopy Conference, (APMC11)
- Place of Presentation
  Graceland, Phuket, Thailand
- Year and Date
  2016-05-25
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Measurement of fogging electrons in scanning electron microscope2016
- Author(s)
  Y. Hagiwara, T. Noda, M. Kotera and R. Gauvin
- Organizer
  The 23rd Symposium on Photomask and NGL Mask Technology
- Place of Presentation
  Pacifico Yokohama, Yokohama, Japan
- Year and Date
  2016-04-07
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Development of trajectory simulation of fogging electrons in a vacuum specimen chamber2016
- Author(s)
  Kazumasa Terada1, Taiki Nishino, Taku Noda, Masatoshi Kotera
- Organizer
  42nd International Conference on Micro and Nano Engineering, (MNE2016)
- Place of Presentation
  Congress Center, Vienna, Austria
- Year and Date
  2016-09-20
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 走査電子顕微鏡内のフォギング電子電流の測定2016
- Author(s)
  野田拓，萩原佳史，小寺正敏，Raynald Gauvin
- Organizer
  第63回応用物理学会春季学術講演会
- Place of Presentation
  東京工業大学（東京都目黒区）
- Year and Date
  2016-03-21
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Measurement of fogging electrons in scanning electron microscope2016
- Author(s)
  Yoshifumi Hagiwara, Taku Noda, Masatoshi Kotera, Raynald Gauvin
- Organizer
  Photomask Japan 2016
- Place of Presentation
  Pacifico Yokohama, Yokohama, Japan
- Year and Date
  2016-04-08
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] 電子ビーム照射された絶縁体試料表面電位分布のワーキングディスタンスと印加バイアス依存性2016
- Author(s)
  東海昌司，小寺正敏
- Organizer
  日本顕微鏡学会　「SEMの物理学」分科会討論会
- Place of Presentation
  鞆シーサイドホテル（広島県福山市）
- Year and Date
  2016-11-12
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Surface Potential Distribution of a Resist Film Irradiated by Electron Beam under Acceleration Bias2016
- Author(s)
  Masashi Toukai, Takuya Kawamoto, Masatoshi Kotera
- Organizer
  29th International Microprocesses and Nanotechnology Conference, (MNC2016)
- Place of Presentation
  ANA Crowne Plaza Kyoto, Kyoto, Japan
- Year and Date
  2016-11-10
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06324
[Presentation] Simulation of Time-Dependent Charging of PMMA Film on Si Substrate under Electron Beam Irradiation2015
- Author(s)
  A. Fukuzawa, M. Tokai, K. Terada and M. Kotera
- Organizer
  10th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’15
- Place of Presentation
  Kunibiki Messe, Matsue, Japan
- Year and Date
  2015-10-27
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 電子ビーム照射による絶縁体薄膜帯電のバイアス電圧依存性2015
- Author(s)
  東海昌司，半田勇希，小寺正敏
- Organizer
  日本顕微鏡学会第71回学術講演会
- Place of Presentation
  京都国際会館、京都
- Year and Date
  2015-05-14
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Dependence of charging of insulator film by electron beam irradiation on the bias-voltage2015
- Author(s)
  Y. Handa, M. Toukai and M. Kotera
- Organizer
  The 22nd Symposium on Photomask and NGL Mask Technology
- Place of Presentation
  Pacifico Yokohama, Yokohama, Japan
- Year and Date
  2015-04-21
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Simulation of charging process of PMMA film on Si substrate under electron beam irradiation2015
- Author(s)
  A. Fukuzawa, K. Terada and M. Kotera
- Organizer
  28th International Microprocesses and Nanotechnology Conference
- Place of Presentation
  Toyama International Conference Center, Toyama, Japan
- Year and Date
  2015-11-12
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Dependence of charging of insulator film by electron beam irradiation on the bias-voltage2015
- Author(s)
  M. Tokai, Y. Handa and M. Kotera
- Organizer
  31st European Conference on Surface Science
- Place of Presentation
  International Convention Center of Barcelona, Barcelona, Spain
- Year and Date
  2015-08-31
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 電子ビーム露光によるフォギング電子のバイアス電圧依存性2015
- Author(s)
  東海昌司，半田勇希，河本拓也，小寺正敏
- Organizer
  第76回応用物理学会秋季学術講演会
- Place of Presentation
  名古屋国際会議場、名古屋
- Year and Date
  2015-09-15
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Measurement of fogging electron current at a specimen surface in scanning electron microscope2015
- Author(s)
  T. Noda, M. Toukai, M. Kotera and R. Gauvin
- Organizer
  The 22nd Symposium on Photomask and NGL Mask Technology
- Place of Presentation
  Pacifico Yokohama, Yokohama, Japan
- Year and Date
  2015-04-21
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 走査電子顕微鏡におけるフォギング電子軌跡のシミュレーション2015
- Author(s)
  西野大輝，小寺正敏
- Organizer
  日本顕微鏡学会第71回学術講演会
- Place of Presentation
  京都国際会館、京都
- Year and Date
  2015-05-14
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Simulation of charging process of PMMA film on Si substrate under electron beam irradiation2015
- Author(s)
  A. Fukuzawa and M. Kotera
- Organizer
  31st European Conference on Surface Science
- Place of Presentation
  International Convention Center of Barcelona, Barcelona, Spain
- Year and Date
  2015-08-31
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 電子ビーム照射による試料表面電位形成過程のシミュレーション2015
- Author(s)
  福澤諒大，小寺正敏
- Organizer
  日本顕微鏡学会第71回学術講演会
- Place of Presentation
  京都国際会館、京都
- Year and Date
  2015-05-14
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 電子ビーム照射による試料表面電位形成過程のシミュレーション2015
- Author(s)
  福澤諒大，小寺正敏
- Organizer
  第76回応用物理学会秋季学術講演会
- Place of Presentation
  名古屋国際会議場、名古屋
- Year and Date
  2015-09-15
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 走査電子顕微鏡におけるフォギング電子軌跡のシミュレーション2015
- Author(s)
  西野大輝，小寺正敏
- Organizer
  第76回応用物理学会秋季学術講演会
- Place of Presentation
  名古屋国際会議場、名古屋
- Year and Date
  2015-09-15
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Dependence of charging of insulator film by electron beam irradiation on the bias-voltage2015
- Author(s)
  Y. Handa, M. Toukai, T. Kawamoto and M. Kotera
- Organizer
  28th International Microprocesses and Nanotechnology Conference
- Place of Presentation
  Toyama International Conference Center, Toyama, Japan
- Year and Date
  2015-11-12
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Simulation of fogging electron trajectories in Scanning Electron Microscope2015
- Author(s)
  T. Nishino and M. Kotera
- Organizer
  31st European Conference on Surface Science
- Place of Presentation
  International Convention Center of Barcelona, Barcelona, Spain
- Year and Date
  2015-08-31
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Surface Potential Distribution of Insulating Film on a Conductive Substrate Irradiated by Electron Beam with an Application of the Bias-Voltage (Student Award受賞)2015
- Author(s)
  Y. Handa, M. Tokai, T. Kawamoto and M. Kotera
- Organizer
  10th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’15
- Place of Presentation
  Kunibiki Messe, Matsue, Japan
- Year and Date
  2015-10-27
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 試料表面のフォギング電子電流のバイアス電圧依存性2015
- Author(s)
  野田拓，萩原佳史，小寺正敏，Raynald Gauvin
- Organizer
  第76回応用物理学会秋季学術講演会
- Place of Presentation
  名古屋国際会議場、名古屋
- Year and Date
  2015-09-15
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Dependence of fogging electron current at a specimen surface on the bias-voltage2015
- Author(s)
  T. Noda, Y. Hagiwara, M. Kotera and R. Gauvin
- Organizer
  31st European Conference on Surface Science
- Place of Presentation
  International Convention Center of Barcelona, Barcelona, Spain
- Year and Date
  2015-08-31
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Simulation of Fogging Electron Trajectories in Scanning Electron Microscope and Its Comparison with Experiment2015
- Author(s)
  T. Nishino, T. Noda and M. Kotera
- Organizer
  10th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’15
- Place of Presentation
  Kunibiki Messe, Matsue, Japan
- Year and Date
  2015-10-27
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Measurement and simulation of electric potential distribution at an insulator surface irradiated by electron beam2015
- Author(s)
  M. Kotera
- Organizer
  Electron Beam Scattering Simulation Workshop
- Place of Presentation
  Aranvert Hotel Kyoto, Kyoto, Japan
- Year and Date
  2015-11-09
- Invited
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 電子ビーム照射による絶縁体薄膜帯電のバイアス電圧依存性2015
- Author(s)
  半田勇希，東海昌司，小寺正敏
- Organizer
  第62回応用物理学会関係連合講演会
- Place of Presentation
  東海大学、神奈川県、平塚
- Year and Date
  2015-03-12
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Electron beam current dependence on a surface potential distribution at a resist film on a conductive substrate2014
- Author(s)
  K. Kumagai, S. Hosoi, Y. Handa, M. Kotera
- Organizer
  21st Symposium on Photomask and NGL Mask Technology
- Place of Presentation
  Pacifico Yokohama, Yokohama, Japan
- Year and Date
  2014-04-15
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Electron beam irradiation time dependence on a surface potential distribution at a resist film on a conductive substrate2014
- Author(s)
  K. Kumagai, Y. Handa, S. Hosoi, M. Kotera
- Organizer
  40th Int. Conf. on Micro- and Nano-Engineering 2014
- Place of Presentation
  Lausanne, Switzerland
- Year and Date
  2014-09-24
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 対物レンズへの炭素板設置による走査電子顕微鏡内多重反射電子の低減2014
- Author(s)
  半田勇希，熊谷健太朗，細井創介，小寺正敏
- Organizer
  日本顕微鏡学会第70回学術講演会
- Place of Presentation
  幕張メッセ、千葉県、幕張
- Year and Date
  2014-05-11
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 走査電子顕微鏡内の絶縁体薄膜表面電位分布のビーム電流依存性2014
- Author(s)
  熊谷健太朗，半田勇希，細井創介，小寺正敏
- Organizer
  日本顕微鏡学会第70回学術講演会
- Place of Presentation
  幕張メッセ、千葉県、幕張
- Year and Date
  2014-05-11
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 走査電子顕微鏡におけるフォギング電子シミュレーション2014
- Author(s)
  細井創介，熊谷健太朗，半田勇希，小寺正敏
- Organizer
  第75回応用物理学会秋季学術講演会
- Place of Presentation
  北海道大学、北海道、札幌
- Year and Date
  2014-09-19
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Reduction of multiple backscattering events of electrons by attaching a graphite plate to the objective lens in a scanning electron microscope2014
- Author(s)
  Y. Handa, K. Kumagai, S. Hosoi, M. Kotera
- Organizer
  40th Int. Conf. on Micro- and Nano-Engineering 2014
- Place of Presentation
  Lausanne, Switzerland
- Year and Date
  2014-09-24
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 絶縁体薄膜表面電位分布の電子ビーム露光時間依存性2014
- Author(s)
  熊谷健太朗，細井創介，半田勇希，小寺正敏
- Organizer
  第75回応用物理学会秋季学術講演会
- Place of Presentation
  北海道大学、北海道、札幌
- Year and Date
  2014-09-19
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Reduction of multiple re-backscattered electrons in scanning electron microscope by attaching a graphite plate to objective lens2014
- Author(s)
  Y. Handa, K. Kumagai, S. Hosoi, M. Kotera
- Organizer
  21st Symposium on Photomask and NGL Mask Technology
- Place of Presentation
  Pacifico Yokohama, Yokohama, Japan
- Year and Date
  2014-04-15
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Simulation of fogging electrons in a scanning electron microscope2014
- Author(s)
  S. Hosoi, K. Kumagai, Y. Handa, M. Kotera
- Organizer
  40th Int. Conf. on Micro- and Nano-Engineering 2014
- Place of Presentation
  Lausanne, Switzerland
- Year and Date
  2014-09-25
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 走査電子顕微鏡内における電子ビーム照射による絶縁体薄膜表面電位分布の測定2013
- Author(s)
  大谷優,長田明,小原康寛,熊谷健太朗,小寺正敏
- Organizer
  第60回応用物理学関係連合講演会
- Place of Presentation
  神奈川工科大学
- Year and Date
  2013-03-30
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 電子ビーム照射を受けた絶縁体薄膜の放電特性2013
- Author(s)
  熊谷健太朗,大谷優,小原康寛,小寺正敏
- Organizer
  第60回応用物理学関係連合講演会
- Place of Presentation
  神奈川工科大学
- Year and Date
  2013-03-30
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡におけるフォギング電子電流の測定とシミュレーション(III)2013
- Author(s)
  小原康寛,大谷優,長田明,小寺正敏
- Organizer
  第60回応用物理学関係連合講演会
- Place of Presentation
  神奈川工科大学
- Year and Date
  2013-03-30
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 絶縁物試料の表面電位計測と理論解析2012
- Author(s)
  小寺正敏
- Organizer
  日本顕微鏡学会SEMの物理科学研究部会講演会
- Place of Presentation
  常翔学園大阪センター
- Year and Date
  2012-11-29
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡内フォギング電子が形成する絶縁体薄膜表面電位分布の測定2012
- Author(s)
  大谷優,長田明,小原康寛,小寺正敏
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  早稲田大学
- Year and Date
  2012-03-16
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Electron Beam Current Dependence of Surface Potential Distribution at a Resist Film2012
- Author(s)
  Akira Osada, Masaru Otani, KentaroKumagai and Masatoshi Kotera
- Organizer
  2012 International Microprocesses andNanotechnology Conference
- Place of Presentation
  神戸メリケンパークオリエンタルホテル
- Year and Date
  2012-11-01
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡内フォギング電子が形成する絶縁体薄膜表面電位分布の測定2012
- Author(s)
  大谷優、小寺正敏
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  早稲田大学(東京)
- Year and Date
  2012-03-16
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Measurement of Surface Potential Distribution at an Insulating Film Produced by Fogging Electrons in a Scanning Electron Microscope2012
- Author(s)
  Masaru Otani, Akira Osada, YasuhiroOhara and Masatoshi Kotera
- Organizer
  The 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication2012,(EIPBN 2012)
- Place of Presentation
  Hilton WaikoloaVillage Resort in Waikoloa, Hawaii, USA
- Year and Date
  2012-05-31
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡におけるフォギング電子電流の測定とシミュレーション2012
- Author(s)
  小原康寛、小寺正敏
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  早稲田大学(東京)
- Year and Date
  2012-03-16
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡におけるフォギング電子電流の測定とシミュレーション2012
- Author(s)
  小原康寛,大谷優,長田明,小寺正敏
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  早稲田大学
- Year and Date
  2012-03-16
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡内フォギング電子が形成する絶縁体薄膜表面電位分布の測定22012
- Author(s)
  大谷優,長田明,小原康寛,小寺正敏
- Organizer
  第71回応用物理学会学術講演会
- Place of Presentation
  愛媛大学
- Year and Date
  2012-09-14
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Charging process simulation of a resist film on Si substrate under electron beam irradiation2012
- Author(s)
  Masatoshi Kotera, Akira Osada, MasaruOtani and Yasuhiro Ohara
- Organizer
  The 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication2012,(EIPBN 2012)
- Place of Presentation
  Hilton WaikoloaVillage Resort in Waikoloa, Hawaii, USA
- Year and Date
  2012-05-30
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Measurement of fogging electron current in scanning electron microscope2012
- Author(s)
  Yasuhiro Ohara, Akira Osada, MasaruOtani and Masatoshi Kotera
- Organizer
  The 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication 2012,(EIPBN 2012)
- Place of Presentation
  Hilton Waikoloa Village Resort in Waikoloa, Hawaii, USA
- Year and Date
  2012-05-31
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] モンテカルロ法と帯電解析への応用2012
- Author(s)
  小寺正敏
- Organizer
  日本顕微鏡学会SEMの物理科学研究部会合宿討論会
- Place of Presentation
  山梨山中湖ジュラク荘
- Year and Date
  2012-10-13
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡内の絶縁体薄膜表面電位分布のビーム電流依存性2012
- Author(s)
  長田明、小寺正敏
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  早稲田大学(東京)
- Year and Date
  2012-03-16
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡内の絶縁体薄膜表面電位分布のビーム電流依存性2012
- Author(s)
  長田明,大谷優,小原康寛,小寺正敏
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  早稲田大学
- Year and Date
  2012-03-16
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡におけるフォギング電子電流の測定とシミュレーション(II)2012
- Author(s)
  小原康寛,大谷優,長田明,小寺正敏
- Organizer
  第71回応用物理学会学術講演会
- Place of Presentation
  愛媛大学
- Year and Date
  2012-09-14
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Measurement of Surface Potential of Insulating Film on Conductive Substrate in a Scanning Electron Microscope2011
- Author(s)
  M.Kotera
- Organizer
  55th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
- Place of Presentation
  Las Vegas, USA
- Year and Date
  2011-06-03
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Measurement of Surface Potential of Insulating Film on Conductive Substrate in a Scanning Electron Microscope2011
- Author(s)
  Masatoshi Kotera, Akira Osada, TakeshiKawamura and Kazuhito Arita
- Organizer
  55th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 2011)
- Place of Presentation
  JW Marriott Resort Las Vegas, USA
- Year and Date
  2011-06-30
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Measurement of surface potential distribution of a resist film irradiated by electron beam2011
- Author(s)
  Masatoshi Kotera, Akira Osada, MasaruOtani and Yasuhiro Ohara
- Organizer
  37th International Conference on Micro & Nano Engineering (MNE 2011)
- Place of Presentation
  The bcc Berliner Congress Center Berlin, Germany
- Year and Date
  2011-09-20
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Measurement of surface potential distribution of resist irradiated by fogging electrons2011
- Author(s)
  A.Osada, M.Kotera
- Organizer
  2011 International Microprocesses and Nanotechnology Conference
- Place of Presentation
  ANA Hotel Kyoto (Kyoto)
- Year and Date
  2011-10-26
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡内における絶縁体薄膜の表面電位分布測定2011
- Author(s)
  長田明、小寺正敏
- Organizer
  第72回応用物理学会学術講演会
- Place of Presentation
  山形大学(山形)
- Year and Date
  2011-08-30
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Measurement of surface potential of a resist film irradiated by electron beam2011
- Author(s)
  M.Kotera
- Organizer
  37th International Conference on Micro & Nano Engineering
- Place of Presentation
  Berlin, Germany
- Year and Date
  2011-09-20
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Charging process simulation of a resist film on Si substrate by electron beam irradiation2011
- Author(s)
  Akira Osada, Masatoshi Kotera, MasaruOtani and Yasuhiro Ohara
- Organizer
  37th International Conference on Micro & Nano Engineering (MNE 2011)
- Place of Presentation
  The bcc Berliner Congress Center Berlin, Germany
- Year and Date
  2011-09-20
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 静電気力顕微鏡法による走査電子顕微鏡内の試料帯電の計測2011
- Author(s)
  小寺正敏、長田明、大谷優、小原康寛
- Organizer
  NGL2011
- Place of Presentation
  東京工業大学
- Year and Date
  2011-07-12
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡内における絶縁体薄膜の表面電位測定2011
- Author(s)
  小寺正敏
- Organizer
  第58回応用物理学関係連合講演会
- Place of Presentation
  神奈川工科大学(神奈川県)
- Year and Date
  2011-03-24
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Charging process simulation of a resist film on Si substrate by electron beam irradiation2011
- Author(s)
  A.Osada, M.Kotera
- Organizer
  37th International Conference on Micro & Nano Engineering
- Place of Presentation
  Berlin, Germany
- Year and Date
  2011-09-20
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡内における絶縁体薄膜の表面電位分布測定2011
- Author(s)
  長田明、小寺正敏
- Organizer
  第72回応用物理学会学術講演会
- Place of Presentation
  山形大学
- Year and Date
  2011-08-30
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 静電気力顕微鏡法による走査電子顕微鏡内の試料帯電の計測2011
- Author(s)
  小寺正敏
- Organizer
  NGLワークショップ2011
- Place of Presentation
  東京工業大学(東京)
- Year and Date
  2011-07-12
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡内における絶縁体薄膜の表面電位分布測定2011
- Author(s)
  長田明、小寺正敏
- Organizer
  日本顕微鏡学会第67回学術講演会
- Place of Presentation
  福岡国際会議場
- Year and Date
  2011-05-16
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Measurement of surface potential distribution of resist irradiated by fogging electrons2011
- Author(s)
  Akira Osada, Masaru Otani, YasuhiroOhara and Masatoshi Kotera
- Organizer
  2011 International Microprocesses and Nanotechnology Conference
- Place of Presentation
  京都全日空ホテル
- Year and Date
  2011-10-26
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡内における絶縁体薄膜の表面電位分布測定2011
- Author(s)
  長田明、小寺正敏
- Organizer
  日本顕微鏡学会第67回学術講演会
- Place of Presentation
  福岡国際会議場(福岡)
- Year and Date
  2011-05-16
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 電子ビーム照射に伴う絶縁体帯電現象解析のためのシミュレーション高速化2010
- Author(s)
  小寺正敏
- Organizer
  第71回応用物理学会学術講演会
- Place of Presentation
  長崎大学(長崎県)
- Year and Date
  2010-09-17
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 電子ビーム照射に伴う絶縁体帯電現象解析のためのシミュレーション高速化2010
- Author(s)
  小寺正敏、長田明
- Organizer
  第71回応用物理学会学術講演会
- Place of Presentation
  長崎大学
- Year and Date
  2010-09-07
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Measurement of a surface potential of insulating materials in a scanning electron microscope2010
- Author(s)
  Masatoshi Kotera
- Organizer
  第23回マイクロプロセス・ナノテクノロジー国際会議(MNC2010)
- Place of Presentation
  小倉(福岡県)
- Year and Date
  2010-11-12
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Surface potential measurement of insulating materials in a scanning electron microscope2010
- Author(s)
  Masatoshi Kotera
- Organizer
  36^<th> International Conference on Micro & Nano Engineering (MNE2010)
- Place of Presentation
  Genoa (Italy)
- Year and Date
  2010-09-21
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Surface potential measurement of insulating materials in a scanning electron microscope2010
- Author(s)
  Masatoshi Kotera, Akira Osada, Takeshi Kawamura and Kazuhito Arita
- Organizer
  36th International Conference on Micro & Nano Engineering (MNE 2010)
- Place of Presentation
  Magazzini del Cotone Genoa, Italy
- Year and Date
  2010-09-21
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Measurement of a surface potential of insulating materials in a scanning electron microscope2010
- Author(s)
  Akira Osada, Masatoshi Kotera, Takeshi Kawamura and Kazuhito Arita
- Organizer
  2010 International Microprocesses and Nanotechnology Conference
- Place of Presentation
  リーガロイヤルホテル小倉
- Year and Date
  2010-11-12
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 電子ビーム照射を受けた導電性基板上絶縁体薄膜の二次元電位分布測定
- Author(s)
  熊谷健太朗，細井創介，大谷優，小寺正敏
- Organizer
  第74回応用物理学会秋季学術講演会
- Place of Presentation
  京都府、京田辺
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Measurements of surface potential distribution at FEP resist film on a conductive substrate irradiated by electron beam
- Author(s)
  Kentaro Kumagai, Msasaru Otani, Sosuke Hosoi, Masatoshi Kotera
- Organizer
  Microscopy Conference 2013
- Place of Presentation
  Regensburg, Germany
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Surface potential distribution of a resist film irradiated by electron beam
- Author(s)
  Kentaro Kumagai, Msasaru Otani, Sosuke Hosoi, Masatoshi Kotera
- Organizer
  2013 Int. Microprocesses and Nanotechnology Conf.
- Place of Presentation
  Sapporo, Japan
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Measurement of Surface Potential Distribution at Resist Film on Conductive Substrate Irradiated by Electron Beam
- Author(s)
  Kentaro Kumagai, Sosuke Hosoi, Masatoshi Kotera
- Organizer
  9th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’13
- Place of Presentation
  Hawaii, USA
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 対物レンズへの炭素板設置による走査電子顕微鏡内多重後方散乱電子の低減
- Author(s)
  半田勇希，熊谷健太朗，細井創介，小寺正敏
- Organizer
  第60回応用物理学会関係連合講演会
- Place of Presentation
  神奈川県、相模原
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 走査電子顕微鏡におけるフォギング電子電流の測定とシミュレーション(III)
- Author(s)
  小原康寛，大谷　優，長田　明，小寺正敏
- Organizer
  第60回応用物理学関係連合講演会
- Place of Presentation
  神奈川工科大学、神奈川
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡内における絶縁体薄膜の表面電位分布測定
- Author(s)
  小寺正敏
- Organizer
  ナノテスティング学会　電子線応用技術研究会
- Place of Presentation
  大阪府、吹田市
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] モンテカルロ法と帯電解析への応用
- Author(s)
  小寺正敏
- Organizer
  日本顕微鏡学会 SEMの物理科学研究部会合宿討論会
- Place of Presentation
  日本電子山中湖保養所ジュラク荘、山梨
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡内の絶縁体薄膜表面電位分布のビーム電流依存性
- Author(s)
  熊谷健太朗，半田勇希，細井創介，小寺正敏
- Organizer
  第60回応用物理学会関係連合講演会
- Place of Presentation
  神奈川県、相模原
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Measurement and simulation of fogging electron distribution in a scanning electron microscope
- Author(s)
  Sosuke Hosoi, Msasaru Otani, Kentaro Kumagai, Masatoshi Kotera
- Organizer
  2013 Int. Microprocesses and Nanotechnology Conf.
- Place of Presentation
  Sapporo, Japan
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 絶縁物試料の表面電位計測と理論解析
- Author(s)
  小寺正敏
- Organizer
  日本顕微鏡学会 SEMの物理科学研究部会講演会
- Place of Presentation
  常翔学園大阪センター、大阪
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡内フォギング電子が形成する絶縁体薄膜表面電位分布の測定2
- Author(s)
  大谷　優，長田　明，小原康寛，小寺正敏
- Organizer
  第71回応用物理学会学術講演会
- Place of Presentation
  愛媛大学、愛媛
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] 走査電子顕微鏡におけるフォギング電子軌跡のシミュレーション
- Author(s)
  細井創介，熊谷健太朗，小寺正敏
- Organizer
  第74回応用物理学会秋季学術講演会
- Place of Presentation
  京都府、京田辺
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 電子ビーム照射を受けた絶縁体薄膜の放電特性
- Author(s)
  熊谷健太朗，大谷　優，小原康寛，小寺正敏
- Organizer
  第60回応用物理学関係連合講演会
- Place of Presentation
  神奈川工科大学、神奈川
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Simulation of Charging Process of PMMA Film on Si Substrate under Electron Beam Irradiation
- Author(s)
  Sosuke Hosoi, Kentaro Kumagai, Masatoshi Kotera
- Organizer
  9th Int. Symp. on Atomic Level Characterizations for New Materials and Devices ’13
- Place of Presentation
  Hawaii, USA
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 走査電子顕微鏡内における電子ビーム照射による絶縁体薄膜表面電位分布の測定
- Author(s)
  大谷　優，長田　明，小原康寛，熊谷健太朗，小寺正敏
- Organizer
  第60回応用物理学関係連合講演会
- Place of Presentation
  神奈川工科大学、神奈川
- Data Source
  KAKENHI-PROJECT-22560026
[Presentation] Charging process simulation of PMMA film on Si substrate irradiated by electron beam
- Author(s)
  Masatoshi Kotera, Msasaru Otani, Sosuke Hosoi, Kentaro Kumagai
- Organizer
  Microscopy Conference 2013
- Place of Presentation
  Regensburg, Germany
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] Measurement and simulation of fogging electrons in a scanning electron microscope
- Author(s)
  Sosuke Hosoi, Msasaru Otani, Kentaro Kumagai, Masatoshi Kotera
- Organizer
  Microscopy Conference 2013
- Place of Presentation
  Regensburg, Germany
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 磁界を考慮した走査電子顕微鏡におけるフォギング電子シミュレーション
- Author(s)
  細井創介，熊谷健太朗，半田勇希，小寺正敏
- Organizer
  第60回応用物理学会関係連合講演会
- Place of Presentation
  神奈川県、相模原
- Data Source
  KAKENHI-PROJECT-25249052
[Presentation] 走査電子顕微鏡におけるフォギング電子電流の測定とシミュレーション(II)
- Author(s)
  小原康寛，大谷　優，長田　明，小寺正敏
- Organizer
  第71回応用物理学会学術講演会
- Place of Presentation
  愛媛大学、愛媛
- Data Source
  KAKENHI-PROJECT-22560026

1. YASUDA Masaaki (30264807)

# of Collaborated Projects: 2 results

# of Collaborated Products: 2 results
2. SUGA Hiroshi (80079574)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
3. TADA KAZUHIRO (90579731)

# of Collaborated Projects: 1 results

# of Collaborated Products: 1 results
4. OCHI Kanyoshi (80079582)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
5. UMEDA Wataru (30079579)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
6. NISHIKAWA Haruyoshi (00079568)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
7. IMAI Kenzo (50079571)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
8. HIRAI YOSHIHIKO (50285300)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results

KOTERA Masatoshi 小寺 正敏

Research Projects

Research Products

Co-Researchers

Systematization of Non-Charging Exposure Conditions in Electron Beam LithographyPrincipal Investigator

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Multiscale analysis of charging phenomena to reduce the effects of charging in electron beam lithographyPrincipal Investigator

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Computational study of pattern formation process in scale-boundary region

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Multiphysics simulation of electron beam nanoprocess

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Development of wide range-nanometer resolution-real time measurement system of charged up specimen irradiated by electron beamPrincipal Investigator

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DEVELOPMENT OF AN IMAGING TECHNIQUE OF MAGNETIC FLUX PENETRATING THROUGH SUPERCONDUCTING FILMPrincipal Investigator

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INVESTIGATION OF ELECTRON BEAM ANALYZER FOR OBSERVING THE SPECIMEN IN THE AIR

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A PRODUCTION OF AN ELECTROSTATIC SCANNING ELECTRON MICROSCOPEPrincipal Investigator

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3D microscopy by using acoustic wave and electron beam

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[Book] 電子・イオンビーム ハンドブック第4版2021

Author(s)

Total Pages

Publisher

ISBN

Data Source

[Journal Article] Investigation of non-charging exposure conditions for insulating resist films in electron beam lithography2021

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DOI

Data Source

[Journal Article] Non-charging Conditions of Insulating Film under Electron Beam Irradiation2020

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[Journal Article] 電子ビーム照射を受けた導体上レジスト薄膜の帯電現象の解析2020

Author(s)

KOTERA Masatoshi 小寺正敏

[Book] 電子・イオンビームハンドブック第4版2021