Nakano Takeo 中野武雄

… Alternative Names

NAKANO Takeo 中野武雄

中野武雄ナカノタケオ

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Researcher Number	40237342
Other IDs
External Links
Affiliation (Current)	2025: 成蹊大学, 理工学部, 教授
Affiliation (based on the past Project Information) *help	2017 – 2019: 成蹊大学, 理工学部, 教授 2014: 成蹊大学, 理工学部, 准教授 2008 – 2013: Seikei University, 理工学部, 助教 2007: Seikei University, 理工学部, 助手 1999 – 2000: 成蹊大学, 工学部, 助手 1993 – 1994: 成蹊大学, 工学部, 助手
Review Section/Research Field	Principal Investigator Applied physics, general / General applied physics / 表面界面物性 Except Principal Investigator Applied physics, general / Applied physics, general
Keywords	Principal Investigator プラズマ電位制御 / 大電力パルススパッタ / 堆積粒子エネルギー / 薄膜構造制御 / プラズマ電位 / 大電力パルススパッタリング / スパッタリング / デュアルターゲット / プラズマ加工 / 薄膜微細構造 … More / プラズマ制御 / 低温製膜 / 構造制御 / 金属膜堆積 / 膜応力 / 薄膜作製プロセス / 銅薄膜 / 微細電子放出源 / 薄膜堆積プロセス / モデリング / 反応性スパッタリング / プラズマ発光分光法 / 境界要素法 / 膜厚分布 / 気体分子運動論 / モンテカルロ・シミュレーション / 粒子輸送 … More Except Principal Investigator SCRATCH TEST / X-RAY PHOTOELECTRON SPECTROSCOPY / FILM ADHESION / FRACTO-EMISSION / EXOELECTRON / 密着性 / 薄膜 / スクラッチ / X線光電子スペクトル / 付着力 / フラクトエミッション / エキソ電子 / 窒化物薄膜 / 酸窒化物 / モード遷移 / 高純度金属窒化物 / 大電力パルススパッタ / 高純度窒化物薄膜 / パルススパッタリング / 窒化チタン / 反応性スパッタリング Less

Plasma potential control by dual target HPPMS for film structure modificationPrincipal Investigator
- Principal Investigator
  
  Nakano Takeo
- Project Period (FY)
  2017 – 2019
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  General applied physics
- Research Institution
  Seikei University
Film structure modification using high power pulsed magnetron sputtering with target voltage control during pulse-off periodPrincipal Investigator
- Principal Investigator
  
  NAKANO Takeo
- Project Period (FY)
  2012 – 2014
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Applied physics, general
- Research Institution
  Seikei University
Reactive Sputtering of Oxygen-Free Metal Nitride Films : Oxygen Incorporation and Effect on Electrical Properties
- Principal Investigator
  
  BABA Shigeru
- Project Period (FY)
  2009 – 2011
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Applied physics, general
- Research Institution
  Seikei University
Study on the modeling of reactive sputter deposition including the transport process of sputtered and gas particlesPrincipal Investigator
- Principal Investigator
  
  NAKANO Takeo
- Project Period (FY)
  2007 – 2009
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Applied physics, general
- Research Institution
  Seikei University
高圧環境下のスパッタリング製膜過程におけるシミュレーションモデルの開発Principal Investigator
- Principal Investigator
  
  中野武雄
- Project Period (FY)
  1999 – 2000
- Research Category
  
  Grant-in-Aid for Encouragement of Young Scientists (A)
- Research Field
  
  表面界面物性
- Research Institution
  Seikei University
Detection of Exo-Electrons From a Scratch Damage of Thin Films
- Principal Investigator
  
  BABA Shigeru
- Project Period (FY)
  1993 – 1994
- Research Category
  
  Grant-in-Aid for General Scientific Research (C)
- Research Field
  
  Applied physics, general
- Research Institution
  Seikei University

All 2019 2018 2017 2015 2014 2012 2011 2010 2009 2008 2007 Other

All Journal Article Presentation Book Patent

[Book] スパッタ実務[q&a集]2009
- Author(s)
  中野武雄, 他
- Total Pages
  315
- Publisher
  技術情報協会
- Data Source
  KAKENHI-PROJECT-19560048
[Book] スパッタ実務[Q & A集]2009
- Author(s)
  中野武雄, 他21名
- Total Pages
  315
- Publisher
  技術情報協会
- Data Source
  KAKENHI-PROJECT-19560048
[Book] 薄膜ハンドブック(第2版)2008
- Author(s)
  中野武雄, 他
- Publisher
  オーム社
- Data Source
  KAKENHI-PROJECT-19560048
[Journal Article] 大電力パルススパッタ法によるスピント型陰極作製における放電ガス(アルゴン、クリプトン)の効果2018
- Author(s)
  谷口日向，中野武雄，大家渓，長尾昌善，大崎壽，村上勝久
- Journal Title
  
  電子情報通信学会技術研究報告
  
  Volume: 118(263) Pages: 5-8
- NAID
  40021713360
- Data Source
  KAKENHI-PROJECT-17K05106
[Journal Article] Growth of target race track profile during magnetron sputtering2015
- Author(s)
  Takeo Nakano, Yudai Saitou, Mariko Ueda, Noriaki Itamura, Shigeru Baba
- Journal Title
  
  J. Vac. Soc. Jpn.
  
  Volume: 58
- NAID
  130005091231
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-24560063
[Journal Article] Fabrication of precious metals recovery materials using grape seed-waste2015
- Author(s)
  Motoki Inoue, Takeo Nakano, Akihiro Yamasaki
- Journal Title
  
  Sust. Mater. Technol.
  
  Volume: 3 Pages: 14-16
- DOI
  10.1016/j.susmat.2014.11.005
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-24560063
[Journal Article] Effects of Atomic Weight, Gas Pressure, and Target-to-substrate Distance on Deposition Rates in the Sputter Deposition Process2014
- Author(s)
  Takeo Nakano, Ryo Yamazaki, Shigeru Baba
- Journal Title
  
  Journal of the Vacuum Society of Japan
  
  Volume: 57 Issue: 4 Pages: 152-154
- DOI
  10.3131/jvsj2.57.152
- NAID
  130004952507
- ISSN
  1882-2398, 1882-4749
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24560063
[Journal Article] Oxygen Incorporation in Reactive-Sputter-Deposited TiN Films: Influence of the Metal to O<sub>2</sub> Gas Flux Ratio2014
- Author(s)
  Takeo Nakano, Takuya Umahashi, Shigeru Baba
- Journal Title
  
  Journal of the Vacuum Society of Japan
  
  Volume: 57 Issue: 1 Pages: 16-22
- DOI
  10.3131/jvsj2.57.16
- NAID
  130004512911
- ISSN
  1882-2398, 1882-4749
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24560063
[Journal Article] Estimation of the pressure‐distance product for thermalization in sputtering for some selected metal atoms by Monte Carlo simulation2014
- Author(s)
  Takeo Nakano, Shigeru Baba
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 53 Issue: 3 Pages: 38002-3
- DOI
  10.7567/jjap.53.038002
- NAID
  210000143458
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24560063
[Journal Article] Effects of target voltage during pulse-off period in pulsed magnetron sputtering on afterglow plasma and de-posited film structure2012
- Author(s)
  T. Nakano, N. Hirukawa, S. Saeki, S. Baba
- Journal Title
  
  Vacuum
  
  Volume: vol.86(in press)
- URL
  http://dx.doi.org/10.1016/j.vacuum.2012.03.010
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21560054
[Journal Article] Structural and optical properties of reactive-sputtered films of V2O5 : Meas-urement of optical bandgap and roughness correction2012
- Author(s)
  K. Maki, T. Fukuda, T. Nakano, S. Baba
- Journal Title
  
  成蹊大学理工学研究報告
  
  Volume: 49巻 Pages: 41-44
- URL
  http://hdl.handle.net/10928/
- Data Source
  KAKENHI-PROJECT-21560054
[Journal Article] Effects of target voltage during pulse-off period in pulsed magnetron sputtering on afterglow plasma and deposited film structure2012
- Author(s)
  T.Nakano, N.Hirukawa, S.Saeki, S.Baba
- Journal Title
  
  Vacuum
  
  Volume: 86(in press) Pages: 109-113
- DOI
  10.1016/j.vacuum.2012.03.010
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21560054
[Journal Article] Structural and optical properties of reactive-sputtered films of V_2O_5 : Measurement of optical bandgap and roughness correction2012
- Author(s)
  K.Maki, T.Fukuda, H.Momose, T.Nakano, S.Baba
- Journal Title
  
  成蹊大学理工学研究報告
  
  Volume: 49巻1号(in press)
- Data Source
  KAKENHI-PROJECT-21560054
[Journal Article] Structural Properties of Island Films of Indium on Si(111) and the Sputter-Etching Profile2011
- Author(s)
  S.Baba, M.Iozaki, S.Sato, T.Nakano
- Journal Title
  
  成蹊大学理工学研究報告
  
  Volume: 48巻1号 Pages: 1-8
- NAID
  120005614688
- Data Source
  KAKENHI-PROJECT-21560054
[Journal Article] Structural Properties of Island Films of Indium on Si(111) and the Sputter-Etching Profile2011
- Author(s)
  S. Baba, M. Iozaki, S. Sato, T. Nakano
- Journal Title
  
  成蹊大学理工学研究報告
  
  Volume: 48巻 Pages: 1-8
- NAID
  120005614688
- URL
  http://hdl.handle.net/10928/90
- Data Source
  KAKENHI-PROJECT-21560054
[Journal Article] Effect of the target bias voltage during off-pulse period on the impulse mag-netron sputtering2010
- Author(s)
  T. Nakano, C. Murata, S. Baba
- Journal Title
  
  Vacuum vol.84
  
  Pages: 1368-1371
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19560048
[Journal Article] Effect of the target bias voltage during off-pulse period on the impulsemagnetron sputtering2010
- Author(s)
  T.Nakano, C.Murata, S.Baba
- Journal Title
  
  Vacuum
  
  Volume: 84 Pages: 4-4
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21560054
[Journal Article] Effect of the target bias voltage during off-pulse period on the impulse magnetron sputtering2010
- Author(s)
  T.Nakano, C.Murata, S.Baba
- Journal Title
  
  Vacuum(DOI : 10.1016.2010.01.014) (in press)
  
  Pages: 4-4
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21560054
[Journal Article] Effect of the target bias voltage during off-pulse period on the impulse magnetron sputtering2010
- Author(s)
  T. Nakano, C. Murata, S. Baba
- Journal Title
  
  Vacuum
  
  Volume: vol.84 Pages: 1368-1371
- URL
  http://dx.doi.org/10.1016/j.vacuum.2010.01.014
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21560054
[Journal Article] Effect of background gas environment on oxy-gen incorporation in TiN films depos-ited using UHV reactive magnetron sputtering2008
- Author(s)
  T. Nakano, K. Hoshi, S. Baba
- Journal Title
  
  Vacuum vol.83
  
  Pages: 467-469
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19560048
[Journal Article] Effect of the target bias voltage during off-pulse period on the impulse magnetron sputtering
- Author(s)
  T.Nakano, C.Murata, S.Baba
- Journal Title
  
  Vacuum(Web 公開済み:doi:10.1016/j.vacuum.2010.01.014) (in press)
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19560048
[Patent] 生体適合性高分子材料のマーキング方法及びマーキングされた生体適合性高分子材料2017
- Inventor(s)
  中野武雄，大家　渓，岸田晶夫，舩本誠一，橋本良秀
- Industrial Property Rights Holder
  中野武雄，大家　渓，岸田晶夫，舩本誠一，橋本良秀
- Industrial Property Rights Type
  特許
- Industrial Property Number
  2017-105843
- Filing Date
  2017
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] デュアルカソード大電力パルススパッタ装置におけるプラズマ電位制御2019
- Author(s)
  前田直彦，藤井奈々，中野武雄
- Organizer
  2019年日本表面真空学会学術講演会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] HPPMSを用いたSpindt型エミッタ作製におけるキャビティ構造の影響2019
- Author(s)
  谷口日向，中野武雄，大家渓，長尾昌善，大崎壽，村上勝久
- Organizer
  第66階応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 反応性スパッタで作製した酸化チタン薄膜の結晶構造の製膜時圧力依存性2019
- Author(s)
  西島葵，田村咲希，大家渓，中野武雄
- Organizer
  2019年日本表面真空学会学術講演会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 大電力パルススパッタによる薄膜構造制御と微小錐構造形成2019
- Author(s)
  中野武雄
- Organizer
  2019年日本表面真空学会学術講演会
- Invited
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 高圧力下における反応性スパッタで作製した酸化タングステン薄膜におけるエレクトロクロミック特性の膜厚依存性2019
- Author(s)
  八木理子, 室伏麻理子, ミヤモハメッドシュルズ, 中野武雄
- Organizer
  第67回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 高圧力下における反応性スパッタで作製した酸化タングステン薄膜におけるエレクトロクロミック特性の膜厚依存性2019
- Author(s)
  八木理子，室伏麻理子，中野武雄
- Organizer
  2019年日本表面真空学会学術講演会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] デュアルカソード大電力パルススパッタにおけるプラズマ電位制御2019
- Author(s)
  前田直彦，藤井奈々，ミヤモハメッドシュルズ, 中野武雄
- Organizer
  第67回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] Optimization of Spindt-type emitter cathode shape prepared by high power pulsed magnetron sputtering: The effect of template cavity dimensions2019
- Author(s)
  T. Nakano, H. Taniguchi, K. Oya, M. Nagao, H. Ohsaki, K. Murakami
- Organizer
  21st International Vacuum Congress (IVC-21)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] Cytocompatibility of titanium oxide thin films deposited by reactive sputtering2019
- Author(s)
  Aoi Nishijima, Kei Oya, Takeo Nakano, Yoshihide Hashimoto, Seiichi Funamoto, Akio Kishida
- Organizer
  The 15th International Symposium on Sputtering and Plasma Processes (ISSP2019)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] エレクトロクロミック特性を示す酸化タングステン薄膜の反応性スパッタによる作製2018
- Author(s)
  八木理子，宗田愛，大家渓，中野武雄
- Organizer
  第34回新材料工学研究会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 反応性スパッタで製膜したチタンおよび酸化チタン薄膜の血液適合性2018
- Author(s)
  西島葵，大家渓，中野武雄
- Organizer
  第34回新材料工学研究会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] Fabrication of visible marker on decellularized tissue for non-invasive techniques via sputtering2018
- Author(s)
  Naruki Kimura, Kei Oya, Yoshihide Hashimoto, Seiichi Funamoto, Yuki Suzuki, Yuichiro Nawa, Akio Kishida, Takeo Nakano
- Organizer
  Tissue Engineering and Regenerative Medicine International Society World Congress 2018
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 非蒸発ゲッタポンプ用St707スパッタ合金膜の熱活性化過程におけるPd の表面修飾の効果2018
- Author(s)
  三嶋　東，出家広大，中野武雄，大家　渓，菊地貴司，間瀬一彦
- Organizer
  表面技術協会第137回講演大会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 反応性スパッタで製膜したチタン酸化物薄膜の硬組織適合性評価2018
- Author(s)
  竹内将人，大家　渓，細谷和輝，北條健太，岩森　暁，中野武雄
- Organizer
  第65回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 反応性スパッタで作製した酸化タングステン薄膜のエレクトロクロミズム特性における製膜時圧力依存性2018
- Author(s)
  飯嶋佑斗，坪田祐貴，中野武雄，大家　渓
- Organizer
  表面技術協会第137回講演大会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 放電ガスにKrを用いたHPPMSによるSpindt陰極作製の試み2018
- Author(s)
  谷口日向，中野武雄，大家　渓，長尾昌善，大崎　壽，村上勝久
- Organizer
  第65回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] Simple linear relationship between reactive gas flow rate and discharge power at mode transition on reactive sputter deposition of metal oxides2018
- Author(s)
  Takeo Nakano, Kei Oya, Kosuke Kimura, Masayorhi Nagao, Hisashi Ohsaki
- Organizer
  The 9th Vacuum and Surface Science Conference of Asia and Australia
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] チタン薄膜をスパッタした超音波造影下で視認可能な脱細胞化組織用薄膜マーカーの作製2018
- Author(s)
  木村成輝，大家　渓，橋本良秀，舩本誠一，鈴木夕稀，名和裕一朗，岸田晶夫，中野武雄
- Organizer
  表面技術協会第137回講演大会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 非侵襲診断のための脱細胞化組織用薄膜マーカーの作製2018
- Author(s)
  木村成輝，大家渓，橋本良秀，舩本誠一，岸田晶夫，中野武雄
- Organizer
  平成30年度日本材料科学会学術講演大会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 基板電位を制御した大電力スパッタによるSpindt型エミッタ作製における放電ガスKrを用いた応力緩和2018
- Author(s)
  谷口日向，中野武雄，大家渓，長尾昌善，大崎壽，村上勝久
- Organizer
  2018年日本表面真空学会学術講演会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] Characteristics of titanium oxide thin films deposited by reactive sputtering for biomaterial applications2017
- Author(s)
  Masato Takeuchi, Kazuki Hosoya, Naruki Kimura, Kazuki Fukuda, Kei Oya, Satoru Iwamori, Takeo Nakano
- Organizer
  The 14th International Symposium on Sputtering and Plasma Processes (ISSP2017)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] プラズマ電位を制御した HPPMS による Spindt 型エミッタの作製（3）2017
- Author(s)
  谷口日向，中野武雄，大家　渓，長尾昌善，大崎　壽，村上勝久
- Organizer
  2017年真空・表面科学合同講演会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 超音波造影で視認可能な生体由来材料用マーカーの作製2017
- Author(s)
  鈴木夕稀，木村成輝，橋本良秀，舩本誠一，大家　渓，岸田晶夫，中野武雄
- Organizer
  日本機械学会第30回バイオエンジニアリング講演会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 反応性スパッタで作製したWO3-x薄膜のエレクトロクロミック特性(2)2017
- Author(s)
  飯嶋佑斗，中野武雄，大家　渓
- Organizer
  2017年真空・表面科学合同講演会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 反応性スパッタで製膜したチタン酸化物薄膜の組成比が生体適合性に及ぼす影響2017
- Author(s)
  吉澤慶祐，竹内将人，北条健太，細谷和輝，岩森　暁，大家　渓，中野武雄
- Organizer
  日本機械学会第30回バイオエンジニアリング講演会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] Fabrication of Mo microcones for vacuum electron emitters using HPPMS2017
- Author(s)
  Takeo Nakano, Kei Oya, Masayoshi Nagao, Hisashi Ohsaki
- Organizer
  11th Asian-European International Conference on Plasma Surface Engineering
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] チタン薄膜をスパッタした脱細胞化組織の生物学的評価2017
- Author(s)
  木村成輝，橋本良秀，舩本誠一，大家　渓，鈴木夕稀，名和裕一朗，岸田晶夫，中野武雄
- Organizer
  日本バイオマテリアル学会北信越ブロック第6回若手研究発表会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] XPS evaluation on thermal activation process of Zr-V-Fe (St707) alloy films for non evaporable getter applications2017
- Author(s)
  Azuma Mishima, Riki Kuwajima, Takeo Nakano, Kei Oya
- Organizer
  The 14th International Symposium on Sputtering and Plasma Processes (ISSP2017)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] スパッタ法を用いた超音波造影下で視認可能な脱細胞化組織薄膜マーカの作製2017
- Author(s)
  木村成輝，鈴木夕稀，名和裕一朗，橋本良秀，舩本誠一，張　永巍，山下暁立，大家　渓，岸田晶夫，中野武雄
- Organizer
  第39回日本バイオマテリアル学会大会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] スパッタ製膜したチタン酸化物薄の結晶構造制御2017
- Author(s)
  竹内将人，吉澤慶祐，細谷和輝，大家　渓，岩森　暁，中野武雄
- Organizer
  第39回日本バイオマテリアル学会大会
- Data Source
  KAKENHI-PROJECT-17K05106
[Presentation] 大電力パルススパッタを用いた薄膜堆積と微小電子源陰極作製2015
- Author(s)
  中野武雄
- Organizer
  日本学術振興会マイクロビームアナリシス第141委員会第159回研究会
- Place of Presentation
  成蹊大学吉祥寺キャンパス
- Year and Date
  2015-02-20
- Invited
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] マグネトロンスパッタにおけるエロージョン形状の材料・圧力依存性2015
- Author(s)
  齋藤悠大、門井裕樹、板村賢明、中野武雄
- Organizer
  表面技術協会第131回講演大会
- Place of Presentation
  関東学院大学金沢八景キャンパス
- Year and Date
  2015-03-04
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] 大電力パルススパッタを用いたSpindt 型エミッタ用陰極の形状制御2015
- Author(s)
  成田智基、木村光佑、板村賢明、中野武雄、長尾昌善、大崎　壽、政岡文平
- Organizer
  表面技術協会第131回講演大会
- Place of Presentation
  関東学院大学金沢八景キャンパス
- Year and Date
  2015-03-04
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] 大電力パルススパッタの物理と薄膜構造の制御2014
- Author(s)
  中野武雄
- Organizer
  表面技術協会高機能トライボ表面プロセス部会第2回例会
- Place of Presentation
  名城大学名駅サテライト
- Year and Date
  2014-12-19
- Invited
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] マグネトロンスパッタリングにおけるターゲットエロージョン形成の圧力・材料依存性2014
- Author(s)
  齋藤悠大、門井裕樹、板村賢明、中野武雄
- Organizer
  第55回真空に関する連合講演会
- Place of Presentation
  I-site なんば
- Year and Date
  2014-11-19
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] スパッタ成膜速度・膜厚分布のガス圧力・ターゲット－基板間距離依存性(2)2014
- Author(s)
  山崎　遼、板村賢明、中野武雄
- Organizer
  第55回真空に関する連合講演会
- Place of Presentation
  I-site なんば
- Year and Date
  2014-11-19
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] 大電力パルススパッタを用いて作製したSpindt型エミッタ用陰極の構造制御2014
- Author(s)
  木村光佑、成田智基、板村賢明、中野武雄、長尾昌善、大崎　壽、政岡文平
- Organizer
  第55回真空に関する連合講演会
- Place of Presentation
  I-site なんば
- Year and Date
  2014-11-19
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] Diagnostics of impulse magnetron sputtering plasma with modified target bias voltage during pulse-off period2011
- Author(s)
  T. Nakano, N. Hirukawa, S. Saeki, S. Baba
- Organizer
  11th International Symposium on Sput-tering & Plasma Processes
- Place of Presentation
  京都
- Year and Date
  2011-07-07
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] パルスoff期のターゲット電位を変化させた高電力パルスマグネトロンスパッタにおけるプラズマ診断2011
- Author(s)
  中野武雄, 日留川紀彦, 佐伯修平, 馬場茂
- Organizer
  第56回応用物理関係連合講演会19p-ZB-5
- Place of Presentation
  東海大,神奈川
- Year and Date
  2011-03-27
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Application of high power impulse sputtering to reactive deposition of titanium nitride to suppress oxygen impurity from environment2011
- Author(s)
  T.Sekiya, H.Ishida, T.Nakano, S.Baba
- Organizer
  11th International Symposium on Sputtering & Plasma Processes, SP P-10
- Place of Presentation
  京都リサーチパーク,京都
- Year and Date
  2011-07-07
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Electrical breakdown characteristics of MgO films deposited by RF magnetron dputtering and its dependence on process gas pressure2011
- Author(s)
  R.Kosone, Y.Nakagawa, K.Arai, T.Nakano, S.Baba
- Organizer
  15th Internation Conference on Thin Films, P-S17-05
- Place of Presentation
  京都テルサ,京都
- Year and Date
  2011-11-10
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Structural and optical properties of V2O5 thin films prepared by reactive magnetron sputtering : preparation and annealing behavior2011
- Author(s)
  K. Maki, T. Fukuda, T. Nakano, S. Baba
- Organizer
  15th International Conference on Thin Films
- Place of Presentation
  京都
- Year and Date
  2011-11-08
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Structural and optical properties of V_2O_5 thin films prepared by reactive magnetron sputtering : preparation and snnealing behavior2011
- Author(s)
  K.Maki, T.Fukuda, T.Nakano, S.Baba
- Organizer
  15th Internation Conference on Thin Films, P-S1-02
- Place of Presentation
  京都テルサ,京都
- Year and Date
  2011-11-08
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] パルスoff期のターゲット電位を変化させた高電力パルスマグネトロンスパッタにおけるプラズマ診断2011
- Author(s)
  中野武雄, 日留川紀彦, 佐伯修平, 馬場茂
- Organizer
  第58回応用物理関係連合講演会
- Place of Presentation
  神奈川
- Year and Date
  2011-03-27
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Growth of target race track profile during magnetron sputtering2011
- Author(s)
  M. Ueda, T. Nakano, S. Baba
- Organizer
  11th Interna-tional Symposium on Sputtering & Plasma Processes
- Place of Presentation
  京都
- Year and Date
  2011-07-07
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Growth of target race track profile during magnetron sputtering2011
- Author(s)
  M.Ueda, T.Nakano, S.Baba
- Organizer
  11th International Symposium on Sputtering & Plasma Processes, SP P-9
- Place of Presentation
  京都リサーチパーク,京都
- Year and Date
  2011-07-07
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Application of high power impulse sputtering to reactive deposition of titanium nitride to suppress oxygen im-purity from environment2011
- Author(s)
  T. Sekiya, H. Ishida, T. Nakano, S. Baba
- Organizer
  11th Inter-national Symposium on Sputtering & Plasma Processes
- Place of Presentation
  京都
- Year and Date
  2011-07-07
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Electrical breakdown characteristics of MgO films deposited by RF magnetron sputtering and its dependence on process gas pressure2011
- Author(s)
  R. Kosone, Y. Nakagawa, K. Arai, T. Nakano, S. Baba
- Organizer
  15th Interna-tional Conference on Thin Films
- Place of Presentation
  京都
- Year and Date
  2011-11-10
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Diagnostics of impulse magnetron sputtering plasma with modified target bias voltage during pulse-off period2011
- Author(s)
  Nakano, N.Hirukawa, S.Saeki, S.Baba
- Organizer
  11th International Symposium on Sputtering & Plasma Processes, SP 1-4
- Place of Presentation
  京都リサーチパーク,京都
- Year and Date
  2011-07-07
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Structure modification of films deposited by HiPIMS with target bias voltage during pulse-off period2010
- Author(s)
  N.Hirukawa, R.Hara, T.Nakano, S.Baba
- Organizer
  18th International Vacuum Congress, P1-Tf1-546266a94-6
- Place of Presentation
  Beijing, 中国
- Year and Date
  2010-08-24
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] 低付着性の炭素系薄膜の力学特性および界面エネルギー2010
- Author(s)
  丸山淳, 中野武雄, 馬場茂
- Organizer
  第122回表面技術講演大会 7D-16
- Place of Presentation
  東北大学(川内北), 仙台
- Year and Date
  2010-09-07
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Structure modification of films de-posited by HiPIMS with target bias voltage during pulse-off period2010
- Author(s)
  N. Hirukawa, R. Hara, T. Nakano, S. Baba
- Organizer
  18th Interna-tional Vacuum Congress
- Place of Presentation
  Beijing,中国
- Year and Date
  2010-08-24
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] 低付着性の炭素系薄膜の力学特性および界面エネルギー2010
- Author(s)
  丸山淳, 中野武雄, 馬場茂
- Organizer
  第122回表面技術講演大会
- Place of Presentation
  仙台
- Year and Date
  2010-09-07
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] マグネトロンスパッタリングにおけるターゲットエロージョンの時間発展2010
- Author(s)
  植田麻理子, 中野武雄, 馬場茂
- Organizer
  第51回真空に関する連合講演会
- Place of Presentation
  大阪
- Year and Date
  2010-11-05
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Secondary electron emission and elec-trical breakdown properties of sputtered MgO films at low gas pressures2010
- Author(s)
  K. Arai, T. Sekiya, T. Nakano, S. Baba
- Organizer
  18th International Vacuum Congress
- Place of Presentation
  Beijing,中国
- Year and Date
  2010-08-26
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] パルスoff期のターゲット電位を変化させたパルスマグネトロンスパッタによる薄膜構造制御2010
- Author(s)
  中野武雄, 原良輔, 日留川紀彦, 馬場茂
- Organizer
  第57回応用物理関係連合講演会
- Place of Presentation
  神奈川
- Year and Date
  2010-03-19
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] パルスoff時のターゲット電位を制御した高電力パルススパッタにおけるプラズマ分析2010
- Author(s)
  日留川紀彦, 中野武雄, 馬場茂
- Organizer
  第51回真空に関する連合講演会
- Place of Presentation
  大阪
- Year and Date
  2010-11-04
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] マグネトロンスパッタリングにおけるターゲットエロージョンの時間発展2010
- Author(s)
  植田麻理子, 中野武雄, 馬場茂
- Organizer
  第51回真空に関する連合講演会 5P-045
- Place of Presentation
  大阪大学(吹田),大阪
- Year and Date
  2010-11-05
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] パルスoff時のターゲット電位を制御した高電力パルススパッタにおけるプラズマ分析2010
- Author(s)
  日留川紀彦, 中野武雄, 馬場茂
- Organizer
  第51回真空に関する連合講演会 4Ba-04
- Place of Presentation
  大阪大学(吹田),大阪
- Year and Date
  2010-11-04
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Secondary electron emission and electrical breakdown properties of sputtered MgO films at low gas pressures2010
- Author(s)
  K Arai, T.Sekiya, T.Nakano, S.Baba
- Organizer
  18th International Vacuum Congress, P3 TF1-4 17ff6e2d-e
- Place of Presentation
  Beijing, 中国
- Year and Date
  2010-08-26
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] パルス off 期のターゲット電位を変化させたパルスマグネトロンスパッタによる薄膜構造制御2010
- Author(s)
  中野武雄, 原良輔, 日留川紀彦, 馬場茂
- Organizer
  第56回応用物理関係連合講演会 19p-ZB-5
- Place of Presentation
  東海大, 神奈川
- Year and Date
  2010-03-19
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] MgOスパッタ膜の電子放出特性と絶縁破壊特性の製膜時圧力依存性2009
- Author(s)
  新井完, 関谷賢明, 中野武雄, 馬場茂
- Organizer
  第50回真空に関する連合講演会
- Place of Presentation
  東京
- Year and Date
  2009-11-04
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] パルス off 時のバイアス電位を制御したパルスマグネトロンスパッタの特性(2)2009
- Author(s)
  中野武雄, 新井完, 馬場茂
- Organizer
  第70回応用物理学会学術講演会 9a-N-5
- Place of Presentation
  富山大, 富山
- Year and Date
  2009-09-09
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Effects of vacuum environment on oxygen impurity during the reactive sputtering deposition of metal nitrides2009
- Author(s)
  Hirukawa, Nakamura, Suzuki, Nakano, Baba
- Organizer
  10th International Symposium on Sputtering & Plasma Processes(日本真空協会)SP P2-5
- Place of Presentation
  金沢国際ホテル, 石川
- Year and Date
  2009-07-09
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] パルスoff時のバイアス電位を制御したパルスマグネトロンスパッタの特性(2)2009
- Author(s)
  中野武雄, 新井完, 馬場茂
- Organizer
  第70回応用物理学会学術講演会
- Place of Presentation
  富山
- Year and Date
  2009-09-09
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] パルスoff時のバイアス電位を制御したパルスマグネトロンスパッタの特性(2)2009
- Author(s)
  中野武雄, 新井完, 馬場茂
- Organizer
  第70回応用物理学会学術講演会
- Place of Presentation
  富山大学
- Year and Date
  2009-09-09
- Data Source
  KAKENHI-PROJECT-19560048
[Presentation] パルスoff期のターゲット電位を変化させたパルスマグネトロンスパッタによる薄膜構造制御2009
- Author(s)
  中野武雄, 原良輔, 日留川紀彦, 馬場茂
- Organizer
  第57回応用物理学関係連合講演会
- Place of Presentation
  東海大学
- Year and Date
  2009-03-19
- Data Source
  KAKENHI-PROJECT-19560048
[Presentation] Ef-fects of vacuum environment on oxygen impurity during the reac-tive sputtering deposition of metal nitrides2009
- Author(s)
  H. Hirukawa, T. Nakamura, A. Suzuki, T. Nakano, S. Baba
- Organizer
  ISSP2009
- Place of Presentation
  Kanazawa (Japan)
- Year and Date
  2009-07-09
- Data Source
  KAKENHI-PROJECT-19560048
[Presentation] PTFE・フラーレン重ね蒸着薄膜の摩擦・摩耗特性2009
- Author(s)
  丸山淳, 塚本英貴, 中野武雄, 馬場茂
- Organizer
  表面技術協会第120回講演大会
- Place of Presentation
  千葉
- Year and Date
  2009-09-18
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Effects of vacuum environment on oxygen impurity during the reactive sputtering deposition of metal nitrides2009
- Author(s)
  N. Hirukawa, A. Suzuki, T. Nakano, S. Baba
- Organizer
  10th International Symposium on Sput-tering & Plasma Processes
- Place of Presentation
  石川
- Year and Date
  2009-07-09
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Effects of vacuum environment on oxygen impurity during the reactive sputtering deposition of metal nitrides2009
- Author(s)
  N.Hirukawa, T.Nakamura, A.Suzuki, T.Nakano, S.Baba
- Organizer
  10th Intl.Symp.on Sputtering and Plasma Processes(ISSP2009)
- Place of Presentation
  金沢国際ホテル(金沢市)
- Year and Date
  2009-07-09
- Data Source
  KAKENHI-PROJECT-19560048
[Presentation] Effect of the bias voltage during off-pulse period on the impulse magnetron sput-tering2009
- Author(s)
  T. Nakano, C. Murata, S. Baba
- Organizer
  10th International Symposium on Sputtering & Plasma Processes
- Place of Presentation
  石川
- Year and Date
  2009-07-09
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Effect of the bias voltage during off-pulse period on the impulse magnetron sputtering2009
- Author(s)
  T.Nakano, C.Murata, S.Baba
- Organizer
  10th International Symposium on Sputtering & Plasma Processes(日本真空協会)SP 3-2
- Place of Presentation
  金沢国際ホテル, 石川
- Year and Date
  2009-07-09
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] PTFE・フラーレン(C60)重ね蒸着薄膜の摩擦・摩耗特性2009
- Author(s)
  丸山淳, 塚本英貴, 中野武雄, 馬場茂
- Organizer
  表面技術協会第120回講演大会 18D-02
- Place of Presentation
  幕張メッセ, 千葉
- Year and Date
  2009-09-18
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] MgOスパッタ膜の電子放出特性と絶縁破壊特性の製膜時圧力依存性2009
- Author(s)
  新井完, 関谷賢明, 中野武雄, 馬場茂
- Organizer
  第50回真空に関する連合講演会 4Ba-2
- Place of Presentation
  学習院大, 東京
- Year and Date
  2009-11-04
- Data Source
  KAKENHI-PROJECT-21560054
[Presentation] Thickness and compositional uniformity of reactively sputter-deposited films: A consideration from particle transport processes2008
- Author(s)
  T. Nakano, S. Baba
- Organizer
  ICCG-7
- Place of Presentation
  Eindhoven (The Netherlands)
- Year and Date
  2008-06-17
- Data Source
  KAKENHI-PROJECT-19560048
[Presentation] スパッタリングにおける粒子輸送とプロセス圧力の効果2008
- Author(s)
  中野武雄, 馬場茂
- Organizer
  日本真空協会SP部会
- Place of Presentation
  第111回定例研究会(機械振興会館)
- Year and Date
  2008-11-20
- Data Source
  KAKENHI-PROJECT-19560048
[Presentation] Thickness and compositional uniformity of reactively sputter-deposited films : A consideration from particle transport processes (Invited lecture)2008
- Author(s)
  T. Nakano, S. Baba
- Organizer
  7^<th> Intl. Conf. on Coatings on Glass and Plastics
- Place of Presentation
  オランダ王国Eindhoven 市
- Year and Date
  2008-06-17
- Data Source
  KAKENHI-PROJECT-19560048
[Presentation] Con-taminating Oxygen Incorporation during Reactive Sputter Deposi-tion of Metal Nitride Films2008
- Author(s)
  T. Nakano, T. Nakamura, A. Su-zuki, N. Hirukawa, S. Baba
- Organizer
  VASSCAA-4
- Place of Presentation
  Matsue (Japan)
- Year and Date
  2008-10-28
- Data Source
  KAKENHI-PROJECT-19560048
[Presentation] スパッタリングにおける粒子輸送とプロセス圧力の効果2008
- Author(s)
  中野武雄, 馬場茂
- Organizer
  真空協会SP部会第111回定例研究会
- Place of Presentation
  東京・機械振興会館
- Year and Date
  2008-11-20
- Data Source
  KAKENHI-PROJECT-19560048
[Presentation] Effects of sputtered atom weight and ambient gas pressure on the target mode transition during reactive sputtering of metal oxides2007
- Author(s)
  T. Nakano, Y. Iimura, S. Baba
- Organizer
  IVC-17/ICSS-13 and ICN+T2007
- Place of Presentation
  Stockholm (Sweden)
- Year and Date
  2007-07-06
- Data Source
  KAKENHI-PROJECT-19560048
[Presentation] Effects of sputtered atom weight and ambient gas pressure on the target mode transition during reactive sputtering of metal oxides2007
- Author(s)
  Takeo Nakano, Yasuhiro Iimura And shigeru baba
- Organizer
  IVC-17/ICSS-13 and ICN+T2007
- Place of Presentation
  Sweden,Stockholm
- Year and Date
  2007-07-06
- Data Source
  KAKENHI-PROJECT-19560048
[Presentation] 大電力パルススパッタとプラズマ電位制御による薄膜構造の変化
- Author(s)
  中野武雄
- Organizer
  東京都立産業技術研究センター・表面技術協会三部会合同シンポジウム
- Place of Presentation
  都立産業技術研究センター
- Invited
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] 大電力パルススパッタのイオン化金属粒子を用いた薄膜構造の制御
- Author(s)
  中野武雄, 馬場　茂
- Organizer
  第74回応用物理学会秋季学術講演会
- Place of Presentation
  同志社大
- Invited
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] Dependence of transport process of sputtered atoms on atom weight, gas pressure and target to substrate distance
- Author(s)
  Ryo Yamazaki, Takeo Nakano, Shigeru Baba
- Organizer
  The 12th International Symposium on Sputtering & Plasma Processes (ISSP2013)
- Place of Presentation
  Kyoto Research Park (Kyoto, Japan)
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] スパッタ製膜プロセスにおけるプラズマ電位の計測・制御と薄膜構造への効果
- Author(s)
  中野武雄
- Organizer
  真空学会スパッタリング及びプラズマプロセス技術部会第132回定例研究会
- Place of Presentation
  機械振興会館
- Invited
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] スパッタ製膜におけるプラズマ電位制御
- Author(s)
  中野武雄、馬橋琢哉、馬場　茂
- Organizer
  第73回応用物理学会学術講演会
- Place of Presentation
  愛媛大学
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] Film structure modification by plasma potential control in triode HPPMS
- Author(s)
  Takuya Umahashi, Takeo Nakano, Shigeru Baba
- Organizer
  The 12th International Symposium on Sputtering & Plasma Processes (ISSP2013)
- Place of Presentation
  Kyoto Research Park (Kyoto, Japan)
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] プラズマ電位制御用電極を追加した三極スパッタによる銅薄膜構造の変化
- Author(s)
  馬橋琢哉、中野武雄、馬場　茂
- Organizer
  第53回真空に関する連合講演会
- Place of Presentation
  甲南大学ポートアイランドキャンパス
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] スパッタ製膜におけるプラズマ電位制御(2)
- Author(s)
  馬橋琢哉、中野武雄、馬場　茂
- Organizer
  第60回応用物理学会春季学術講演会
- Place of Presentation
  神奈川工科大学
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] 三極スパッタを用いたプラズマ電位制御における電極配置の影響
- Author(s)
  馬橋琢哉, 中野武雄, 馬場　茂
- Organizer
  第54回真空に関する連合講演会
- Place of Presentation
  つくば国際会議場
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] スパッタ成膜速度・膜厚分布のガス圧力・ターゲットー基板配置依存性
- Author(s)
  山崎　遼, 中野武雄, 馬場　茂
- Organizer
  第54回真空に関する連合講演会
- Place of Presentation
  つくば国際会議場
- Data Source
  KAKENHI-PROJECT-24560063
[Presentation] Film structure modification by plasma potential control in triode HPPMS
- Author(s)
  Takeo Nakano, Takuya Umahashi, Shigeru Baba
- Organizer
  19th International Vacuum Congress
- Place of Presentation
  Palais des Congres (Paris, France)
- Data Source
  KAKENHI-PROJECT-24560063

1. BABA Shigeru (80114619)

# of Collaborated Projects: 2 results

# of Collaborated Products: 43 results

Nakano Takeo 中野 武雄

NAKANO Takeo 中野 武雄

中野 武雄 ナカノ タケオ

Research Projects

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Co-Researchers

Plasma potential control by dual target HPPMS for film structure modificationPrincipal Investigator

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Film structure modification using high power pulsed magnetron sputtering with target voltage control during pulse-off periodPrincipal Investigator

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Reactive Sputtering of Oxygen-Free Metal Nitride Films : Oxygen Incorporation and Effect on Electrical Properties

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Study on the modeling of reactive sputter deposition including the transport process of sputtered and gas particlesPrincipal Investigator

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高圧環境下のスパッタリング製膜過程におけるシミュレーションモデルの開発Principal Investigator

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Detection of Exo-Electrons From a Scratch Damage of Thin Films

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[Book] スパッタ実務[q&a集]2009

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[Book] スパッタ実務[Q & A集]2009

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[Book] 薄膜ハンドブック(第2版)2008

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[Journal Article] 大電力パルススパッタ法によるスピント型陰極作製における放電ガス(アルゴン、クリプトン)の効果2018

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[Journal Article] Growth of target race track profile during magnetron sputtering2015

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[Journal Article] Fabrication of precious metals recovery materials using grape seed-waste2015

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[Journal Article] Effects of Atomic Weight, Gas Pressure, and Target-to-substrate Distance on Deposition Rates in the Sputter Deposition Process2014

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[Journal Article] Oxygen Incorporation in Reactive-Sputter-Deposited TiN Films: Influence of the Metal to O<sub>2</sub> Gas Flux Ratio2014

Nakano Takeo 中野武雄

NAKANO Takeo 中野武雄

中野武雄ナカノタケオ