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Kyuno Kentaro  弓野 健太郎

ORCIDConnect your ORCID iD *help
… Alternative Names

弓野 健太郎  キユウノ ケンタロウ

KYUNO Kentaro  弓野 健太郎

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Researcher Number 40251467
Other IDs
External Links
Affiliation (Current) 2025: 芝浦工業大学, 工学部, 教授
Affiliation (based on the past Project Information) *help 2025: 芝浦工業大学, 工学部, 教授
2022 – 2023: 芝浦工業大学, 工学部, 教授
2013 – 2016: 芝浦工業大学, 工学部, 教授
2010: Shibaura Institute of Technology, 工学部, 教授
2008 – 2009: Shibaura Institute of Technology, 工学部, 准教授 … More
2001 – 2005: 東京大学, 大学院・工学系研究科, 講師
2000: University of Tokyo, Faculty of Engineering, lecturer, 工学部, 講師
1999: 東京大学, 生産技術研究所, 助手
1994 – 1995: 東京大学, 生産技術研究所, 助手 Less
Review Section/Research Field
Principal Investigator
Basic Section 26010:Metallic material properties-related / Inorganic materials/Physical properties / Physical properties of metals / Nanomaterials/Nanobioscience
Except Principal Investigator
Electronic materials/Electric materials / Physical properties of metals / Structural/Functional materials
Keywords
Principal Investigator
結晶成長 / 薄膜 / 太陽電池 / 半導体物性 / 表面・界面物性 / 構造・機能材料 / 半導体 / Molecular Thin Film / Scanning Probe Microscopy / Crystal Growth … More / Thin Film / 分子膜 / 走査型トンネル顕微鏡 / RRAM / スイッチング / ReRAM / ナノ細線 / 酸化物 / メモリ / 光磁気メモリ材料 / 金属多層膜 / 分子線エピタキシ-法 / 第一原理的電子論 / 垂直磁気異方性 … More
Except Principal Investigator
MEAM / シリコン / amorphous / polarizability / germanium / silicon / lanthanum oxide / yttrium oxide / hafnium oxide / high-k dielectrics / MISキャパシタ / ゲート絶縁膜 / オフアクシススパッタリング / オープンサーキットポテンシャル / スパックリング / Open Circuit Potential法 / 分光エリプソメトリー / 斜入射X線反射率測定 / 原子状酸素 / 酸化レート / 界面制御 / 基板面方位 / 高誘電率膜 / 光学フォノン / シリケート / Y2O3 / HfO2 / 界面層 / Y_2O_3 on Ge / LaYO_3薄膜 / 遠赤外特性 / Y-doped HfO_2 / High-k膜 / Y_2O_3 / La_2O_3 / HfO_2 / アモルファス / 分極率 / ゲルマニウム / 酸化ランタン / 酸化イットリウム / 酸化ハフニウム / 高誘電率絶縁膜 / Diffusivity / Cluster / Nucleation / Dissociation / Surface diffusion / Crystal growth / Scanning tunneling-microscope / Field ion microscope / 拡散係数 / クラスター / 核生成 / 解離 / 表面拡散 / 結晶成長 / 走査型トンネル顕微鏡 / 電界イオン顕微鏡 / giant magnetoresistance effect / perpendicular magnetic anisotropy / metallic multilayr / surfactant epitaxy / 金属多層膜 / 巨大磁気抵抗効果 / 垂直磁気異方性 / 金属人工格子 / サーファクタントエピタキシ- Less
  • Research Projects

    (11 results)
  • Research Products

    (102 results)
  • Co-Researchers

    (8 People)
  •  流動性を有する共晶合金の準安定相に関する研究と溶液成長likeな固相成長への応用Principal Investigator

    • Principal Investigator
      弓野 健太郎
    • Project Period (FY)
      2025 – 2027
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Review Section
      Basic Section 26010:Metallic material properties-related
    • Research Institution
      Shibaura Institute of Technology
  •  金属触媒を利用した半導体結晶薄膜の低温形成Principal Investigator

    • Principal Investigator
      弓野 健太郎
    • Project Period (FY)
      2022 – 2024
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Review Section
      Basic Section 26010:Metallic material properties-related
    • Research Institution
      Shibaura Institute of Technology
  •  Study on the fluid phases on the surface of eutectic systems at room temperaturePrincipal Investigator

    • Principal Investigator
      Kyuno Kentaro
    • Project Period (FY)
      2015 – 2016
    • Research Category
      Grant-in-Aid for Challenging Exploratory Research
    • Research Field
      Inorganic materials/Physical properties
    • Research Institution
      Shibaura Institute of Technology
  •  Low temperature crystallization of Si by metal-induced crystallization methodPrincipal Investigator

    • Principal Investigator
      Kyuno Kentaro
    • Project Period (FY)
      2013 – 2016
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Inorganic materials/Physical properties
    • Research Institution
      Shibaura Institute of Technology
  •  Creation and annihilation of conductive nanowires in insulatorsPrincipal Investigator

    • Principal Investigator
      KYUNO Kentaro
    • Project Period (FY)
      2008 – 2010
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      Nanomaterials/Nanobioscience
    • Research Institution
      Shibaura Institute of Technology
  •  シリコン基板上に作製した超薄膜・希土類金属酸化物の誘電率制御指針の構築

    • Principal Investigator
      TORIUMI Akira
    • Project Period (FY)
      2001 – 2003
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Electronic materials/Electric materials
    • Research Institution
      The University of Tokyo
  •  Control of thin-film growth by controlling the shape of 2-dimensional nucleus during initial stagePrincipal Investigator

    • Principal Investigator
      KYUNO Kentaro
    • Project Period (FY)
      2001 – 2002
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Physical properties of metals
    • Research Institution
      The University of Tokyo
  •  Study of Interface Control in Ultra-thin High-k Film on Silicon Substrate

    • Principal Investigator
      TORIUMI Akira
    • Project Period (FY)
      2001 – 2005
    • Research Category
      Grant-in-Aid for Scientific Research (S)
    • Research Field
      Electronic materials/Electric materials
    • Research Institution
      The University of Tokyo
  •  Development of combined FIM/STM system and investigation of the mechanism of thin-film growth on the atomic level

    • Principal Investigator
      YAMAMOTO Ryoichi
    • Project Period (FY)
      1999 – 2000
    • Research Category
      Grant-in-Aid for Scientific Research (A).
    • Research Field
      Physical properties of metals
    • Research Institution
      University of Tokyo
  •  極限的垂直磁気異方性をもつ金属人工格子の理論的設計Principal Investigator

    • Principal Investigator
      弓野 健太郎
    • Project Period (FY)
      1995
    • Research Category
      Grant-in-Aid for Encouragement of Young Scientists (A)
    • Research Field
      Physical properties of metals
    • Research Institution
      The University of Tokyo
  •  Study on the initial stage of thin film growth to control the structure of hetero-interface on the atomic level

    • Principal Investigator
      YAMAMOTO Ryoichi
    • Project Period (FY)
      1994 – 1995
    • Research Category
      Grant-in-Aid for General Scientific Research (B)
    • Research Field
      Structural/Functional materials
    • Research Institution
      Institute of Industrial Science

All 2024 2023 2022 2017 2016 2015 2014 2013 2011 2010 2009 2006 2005 2004 2003 2002 Other

All Journal Article Presentation Patent

  • [Journal Article] Fabrication of an atomically smooth Ge(111) surface by Au-induced crystallization at 170 °C2023

    • Author(s)
      Narin Sunthornpan, Kentaro Kyuno
    • Journal Title

      Applied Physics Letters

      Volume: 122 Issue: 17 Pages: 172101-172101

    • DOI

      10.1063/5.0145370

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22K04675
  • [Journal Article] Morphology of Ge thin films crystallized by Au-induced layer exchange at low temperature (220 °C)2022

    • Author(s)
      Sunthornpan Narin、Kimura Kenjiro、Kyuno Kentaro
    • Journal Title

      Journal of Vacuum Science & Technology B

      Volume: 40 Issue: 3 Pages: 030601-030601

    • DOI

      10.1116/6.0001774

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22K04675
  • [Journal Article] Fabrication of crystalline Ge thin films by co-deposition of Au and Ge at low substrate temperatures (<200 °C) without post annealing2016

    • Author(s)
      Takatoshi Sugiyama, Naoya Mishiba, Masao Kamiko, and Kentaro Kyuno
    • Journal Title

      Applied Physics Express

      Volume: 9 Issue: 9 Pages: 095501-095501

    • DOI

      10.7567/apex.9.095501

    • NAID

      210000138051

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-25289231, KAKENHI-PROJECT-15K14130
  • [Journal Article] Effect of seed layers on structure of self-organized Ag nanodots on MgO substrates2015

    • Author(s)
      M.Kamiko,R.Suenaga,J.W.Koo,K.Kyuno,Y.Mitsuda,J.G.Ha
    • Journal Title

      Japanese Journal of Applied Phyiscs

      Volume: 54 Issue: 6S1 Pages: 06FH06-06FH06

    • DOI

      10.7567/jjap.54.06fh06

    • NAID

      210000145254

    • Peer Reviewed / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-15K14130, KAKENHI-PROJECT-25289231
  • [Journal Article] Ge 結晶薄膜の低温合成: フレキシブルデバイスへの 応用を目指して2015

    • Author(s)
      弓野 健太郎
    • Journal Title

      真空ジャーナル

      Volume: 151 Pages: 13-15

    • Data Source
      KAKENHI-PROJECT-25289231
  • [Journal Article] Effect of Ti seed layers on structure of self-organized epitaxial face-centered-cubic -Ag(001) oriented nanodots2013

    • Author(s)
      M. Kamiko, R. Suenaga, J.-W. Koo, K. Nose, K. Kyuno, J.-G. Ha
    • Journal Title

      Journal of Applied Physics

      Volume: 114 Issue: 24 Pages: 244307-244307

    • DOI

      10.1063/1.4856975

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-24560874, KAKENHI-PROJECT-25289231
  • [Journal Article] Epitaxial growth of fcc-Ag(001) nanodot on MgO(001) substrate via Ti seed layer assisted agglomeration2013

    • Author(s)
      Masao Kamiko, Ryo Suenaga, Jung-Woo Koo, Kenji Nose, Kentaro Kyuno, Jae-Geun Ha
    • Journal Title

      Journal of Physics D: Applied Physics

      Volume: 46 Issue: 50 Pages: 505304-505304

    • DOI

      10.1088/0022-3727/46/50/505304

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-24560874, KAKENHI-PROJECT-25289231
  • [Journal Article] Two-Step Forming Process in Planar-Type Cu_2O-Based Resistive Switching Devices2011

    • Author(s)
      K.Suzuki, N.Igarashi, K.Kyuno
    • Journal Title

      Applied Physics Express 4

      Pages: 51801-51801

    • NAID

      10028210204

    • Data Source
      KAKENHI-PROJECT-20510108
  • [Journal Article] Observation of the Creations and Annihilations of Local Current Paths in HfO_2 thin films on Pt by Ultrahigh Vacuum Conductive-Atomic Force Microscopy : Evidence of Oxygen Spill Over during the Forming Process2009

    • Author(s)
      N.Sasaki, K.Kita, A.Toriumi, K.Kyuno
    • Journal Title

      Japanese Journal of Applied Physics 48

      Pages: 60202-60202

    • Data Source
      KAKENHI-PROJECT-20510108
  • [Journal Article] Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon2006

    • Author(s)
      Y.Zhao, M.Toyama, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Applied Physics Letters 88(7)

      Pages: 72904-72904

    • NAID

      10022542508

    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Origin of Permittivity Enhancement of HfSiO and HfON Film with High Temperature Annealing2006

    • Author(s)
      K.Tomida, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      International Conference on Microelectronics and Interfaces (ICMI'06)

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon2006

    • Author(s)
      Y.Zhao, M.Toyama, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Appl.Phys.Lett. 88

      Pages: 72904-72904

    • NAID

      10022542508

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Dielectric Properties of Metal-Doped HfO_2 for Higher-k Gate Insulators (invited paper)2006

    • Author(s)
      K.Kita, K.Tomida, Y.Yamamoto, Y.Zhao, K.Kyuno, A.Toriumi
    • Journal Title

      2006 International Meeting for Future of Electron Devices, Kansai (IMFEDK)

      Pages: 27-28

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] GIXR Analysis of High-k Multilayer Structure2005

    • Author(s)
      H.Shimizu, K.Tomida, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 10th Workshop on Gate Stacks -Physics in Materials, Fabrication Processes and Characterizations-

      Pages: 167-172

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Polarity Dependence of Leakage Current in HfO_2/SiO_2 Stacked Structures : An Observation by UHV-C-AFM2005

    • Author(s)
      K.Kyuno, K.Kita, A.Toriumi
    • Journal Title

      Ext.Abst. 10th Workshop on Gate Stacks -Physics in Materials, Fabrication Processes and Characterizations-

      Pages: 309-314

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Thermally Robust Y_2O_3/Ge MOS Capacitors2005

    • Author(s)
      H.Nomura, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 2005 Int.Conf. on Solid State Devices and Materials (SSDM)

      Pages: 858-859

    • NAID

      10022543442

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Evolution of Leakage Paths in HfO_2/SiO_2 Stacked Gate Dielectrics : A Stable Direct Observation by Ultrahigh Vacuum Conducting Atomic Force Microscopy2005

    • Author(s)
      K.Kyuno, K.Kita, A.Toriumi
    • Journal Title

      Appl.Phys.Lett. 86(6)

      Pages: 63510-63510

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Kinetic Model of Si Oxidation at HfO_2/Si Interface with Post Deposition Annealing2005

    • Author(s)
      H.Shimizu, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Japanese Journal of Applied Physics Pt.1,44

      Pages: 6131-6135

    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Far- and Mid- Infrared Absorption Study of HfO_2/SiO_2/Si System (invited paper)2005

    • Author(s)
      A.Toriumi, K.Tomida, H.Shimizu, K.Kita, K.Kyuno
    • Journal Title

      207th Meeting of the Electrochemical Society

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Moisture Absorption-Induced Permittivity Deterioration and Surface Roughness Enhancement of Lanthanum Oxide Films on Silicon2005

    • Author(s)
      Y.Zhao, M.Toyama, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 2005 Int.Conf. on Solid State Devices and Materials (SSDM)

      Pages: 546-547

    • NAID

      10022542508

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Evolution of leakage paths in HfO_2/SiO_2 stacked gate dielectrics : A stable direct observation by ultrahigh vacuum conducting atomic force microscopy2005

    • Author(s)
      K.Kyuno, K.Kita, A.Toriumi
    • Journal Title

      Applied Physics Letters 86(6)

      Pages: 63510-63510

    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Evolution of Leakage Path in HfO^2/SiO^2 Stacked Gate Dielectrics : A Stable Direct Observation by Ultrahigh Vacuum Conducting Atomic Force Microscopy,2005

    • Author(s)
      K.Kyuno et al.
    • Journal Title

      Appl. Phys. Lett. 86(6)

      Pages: 63510-63510

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Hfo^2/SiO^2スタック構造におけるリーク電流の極性依存性 : UHV-C-AFMによる観察2005

    • Author(s)
      弓野健太郎, 他
    • Journal Title

      ゲートスタック研究会-材料・プロセス・評価の物理- 第10回

      Pages: 309-314

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] High Crystallization Temperature and Low Fixed Charge Density of HfLaO_x Films2005

    • Author(s)
      Y.Yamamoto, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      36th IEEE Semiconductor Interface Specialists Conference (SISC) P-11

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Ion-Implanted p/n Junction Characteristics p- and n-type Germanium2005

    • Author(s)
      T.Nishimura, M.Toyama, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 2005 Int.Conf. on Solid State Devices and Materials (SSDM)

      Pages: 520-521

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Effects of Germanium Surface Orientation on HfO_2/Ge Interface2005

    • Author(s)
      M.Toyama, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 10th Workshop on Gate Stacks -Physics in Materials, Fabrication Processes and Characterizations-

      Pages: 209-214

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] High Crystallization Temperature and Low Fixed Charge Density of HfLaOx Films2005

    • Author(s)
      Y.Yamamoto, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      36th IEEE Semiconductor Interface Specialists Conference (SISC) 36

      Pages: 10-10

    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Design Methodology for La_2O_3-Based Ternary Higher-k Dielectrics2005

    • Author(s)
      K.Kita, Yi Zhao, Y.Yamamoto, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 2005 Int.Conf. on Solid State Devices and Materials (SSDM)

      Pages: 252-253

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Design Methodology for La2O_3-Based Ternary Higher-k Dielectrics2005

    • Author(s)
      K.Kita, Yi Zhao, Y.Yamamoto, K.Kyuno, A.Toriumi
    • Journal Title

      Extended Abstracts of 2005 International Conference on Solid State Devices and Materials 2005

      Pages: 858-859

    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Kinetic Model of Si Oxidation at HfO_2/Si Interface with Post Deposition Annealing2005

    • Author(s)
      H.Shimizu, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Jpn.J.Appl.Phys.Pt.1 44(8)

      Pages: 6131-6135

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] A New Hf-based Dielectric Member, HfLaO_x, for Amorphous High-k Gate Insulators in Advanced CMOS2005

    • Author(s)
      Y.Yamamoto, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 2005 Int.Conf. on Solid State Devices and Materials (SSDM)

      Pages: 254-255

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Annealing Effects on CVD-SiO_2 Films Characterized by OCP Measurement2005

    • Author(s)
      K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 10th Workshop on Gate Stacks -Physics in Materials, Fabrication Processes and Characterizations-

      Pages: 265-270

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Permittivity Increase of Yttrium-Doped HfO_2 through Structural Phase Transformation2004

    • Author(s)
      K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      35th IEEE Semiconductor Interface Specialists Conference (SISC) LP-3

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Initial Growth Mechanism Difference between HfO_2 Films on Ge and Si Substrates2004

    • Author(s)
      K.Kita, M.Sasagawa, M.Toyama, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 9th Workshop on Formation, Characterization and Reliability of Ultrathin Silicon Oxides

      Pages: 259-264

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Stable Observation of the Evolution of Leakage Spots in HfO_2/SiO_2 stacked structures.2004

    • Author(s)
      K.Kyuno et al.
    • Journal Title

      Extended Abstracts of 2004 International Conference on Solid State Devices and Materials

      Pages: 788-789

    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Stable Observation of the Evolution of Leakage Spots in HfO_2/SiO_2 Stacked Structures2004

    • Author(s)
      K.Kyuno, K.Kita, A.Toriumi
    • Journal Title

      Ext.Abst. 2004 Int.Conf. Solid State Dev.Mater. (SSDM)

      Pages: 788-789

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] IR Absorption Study of HfO_2 and HfO_2/Si Interface Ranging from 200cm^<-1> to 2000cm^<-1>2004

    • Author(s)
      K.Tomida, H.Shimizu, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Integration of Advanced Micro- and Nanoelectronic Devices - Critical Issues and Solutions, MRS Symp.Proc. 811

      Pages: 319-324

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Difference between O_2 and N_2 Annealing Effects on CVD-SiO_2 Film Quality Studied by Open-Circuit Measurement2004

    • Author(s)
      K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 2004 Int.Conf. Solid State Dev.Mater. (SSDM)

      Pages: 786-787

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Far Infrared Study of Structural Distortion and Transformation of HfO_2 by Introducing a Slight Amount Si2004

    • Author(s)
      K.Tomida, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 2004 Int.Conf. Solid State Dev.Mater. (SSDM)

      Pages: 790-791

    • NAID

      10022540150

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Dielectric Constant Increase of Yttrium-Doped HfO_2 by Structural Phase Modification2004

    • Author(s)
      K Kita, K Kyuno, A Toriumi
    • Journal Title

      Ext.Abst. 2004 Int.Conf. Solid State Dev.Mater. (SSDM)

      Pages: 794-795

    • NAID

      10022540160

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Growth Mechanism Difference of Sputtered HfO_2 between on Ge and on Si2004

    • Author(s)
      K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Appl.Phys.Lett. 85(1)

      Pages: 52-54

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Oxidation Mechanism at HfO_2/Si Interface2004

    • Author(s)
      H.Shimizu, K.Tomida, M.Sasagawa, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 9th Workshop on Formation, Characterization and Reliability of Ultrathin Silicon Oxides

      Pages: 265-270

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Stable Observation of the Evolution of Leakage Spots in HfO^2/SiO^2 stacked structures2004

    • Author(s)
      K.Kyuno et al.
    • Journal Title

      Extended Abstracts of 2004 International Conference on Solid State Devices and Materials 2004

      Pages: 788-789

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Retarded Growth of Sputtered HfO_2 films on Germanium2004

    • Author(s)
      K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Integration of Advanced Micro- and Nanoelectronic Devices - Critical Issues and Solutions, MRS Symp.Proc. 811

      Pages: 169-174

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Permittivity Increase of Yttrium-Doped HfO_2 through Structural Phase Transformation2004

    • Author(s)
      K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Appl.Phys.Lett. 86(7)102906(2005).rface Specialists Conference (SISC) LP-3

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Advantages of Ge (111) Surface for High Quality HfO_2/Ge Interface2004

    • Author(s)
      M.Toyama, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 2004 Int.Conf. Solid State Dev.Mater. (SSDM)

      Pages: 226-227

    • NAID

      10022538299

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Post-Deposition Annealing Effects on Interface States Generation in HfO_2/SiO_2/Si MOS Capacitors2004

    • Author(s)
      M.Sasagawa, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 2004 Int.Conf. Solid State Dev.Mater. (SSDM)

      Pages: 534-535

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Generalized Model of Oxidation Mechanism at HfO_2/Si Interface with Post-Deposition Annealing2004

    • Author(s)
      H.Shimizu, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 2004 Int.Conf. Solid State Dev.Mater. (SSDM)

      Pages: 796-797

    • NAID

      10022540167

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Oxidation-Induced Damages on Germanium MIS Capacitors with HfO_2 Gate Dielectrics2003

    • Author(s)
      K.Kita, M.Sasagawa, K.Tomida, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst. 2003 Int.Conf. Solid State Dev.Mater. (SSDM)

      Pages: 292-293

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] New Method for Characterizing Dielectric Properties of High-k Films with Time-Dependent Open-Circuit Potential Measurement2003

    • Author(s)
      K.Kita, M.Sasagawa, K.Kyuno, A.Toriumi
    • Journal Title

      Jpn.J.Appl.Phys. 42,Pt.2(6B)

    • NAID

      10011259919

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] A New Characterization Technique for Depth-Dependent Dielectric Properties of High-k Films by Open-Circuit Potential Measurement2003

    • Author(s)
      K.Kita, M.Sasagawa, K.Kyuno, A.Toriumi
    • Journal Title

      2003 Int. Conference on Characterization and Metrology for ULSI Technology, AIP Conf.Proc. 550

      Pages: 166-170

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Further EOT Scaling of Ge/HfO_2 over Si/HfO_2 MOS Systems2003

    • Author(s)
      K.Kita, M.Sasagawa, K.Tomida, M.Toyama, K.Kyuno, A.Toriumi
    • Journal Title

      Int. Workshop on Gate Insulator (IWGI)

      Pages: 186-191

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] Interface Oxidation Mechanism in HfO_2/Silicon System with Post-Deposition Annealing2003

    • Author(s)
      H.Shimizu, M.Sasagawa, K.Kita, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst.Int.Conf. Solid State Dev.Mater. (SSDM)

      Pages: 486-487

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Journal Article] New method for Characterizing Dielectric Properties of High-k Films Using Time-Dependent Open-Circuit Potential Measurement2002

    • Author(s)
      K.Kita M.Sasagawa, K.Kyuno, A.Toriumi
    • Journal Title

      Ext.Abst.Int.Conf. Solid State Dev.Mater. (SSDM)

      Pages: 66-67

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-13852009
  • [Patent] ゲルマニウム層の製造方法、ゲルマニウム層、ゲルマニウム層付基板、ゲルマニウムナノドット、ゲルマニウムナノワイヤ付き基板及び薄膜トランジスタ2015

    • Inventor(s)
      弓野健太郎、大石知司、三芝直也、杉山貴俊、原浩子
    • Industrial Property Rights Holder
      芝浦工業大学
    • Industrial Property Rights Type
      特許
    • Industrial Property Number
      2015-016009
    • Filing Date
      2015-01-29
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] AuSb,Au触媒を用いたアニールによるGe薄膜の結晶化及びその電気特性2024

    • Author(s)
      楊 淳祥、弓野 健太郎
    • Organizer
      日本金属学会 2024年春期講演大会(第174回)
    • Data Source
      KAKENHI-PROJECT-22K04675
  • [Presentation] Ag触媒を用いたMIC法による多結晶Ge薄膜の成膜プロセスおよび電気特性2024

    • Author(s)
      渡部 祐大、小林 和矢、弓野 健太郎
    • Organizer
      日本金属学会 2024年春期講演大会(第174回)
    • Data Source
      KAKENHI-PROJECT-22K04675
  • [Presentation] Auで被膜した加熱基板上におけるGe薄膜の結晶化:Ge膜厚依存性2024

    • Author(s)
      小杉 哲平、弓野 健太郎
    • Organizer
      日本金属学会 2024年春期講演大会(第174回)
    • Data Source
      KAKENHI-PROJECT-22K04675
  • [Presentation] Au薄膜上へのスパッタによるGe薄膜の結晶化と電気特性2024

    • Author(s)
      星 佑樹、弓野 健太郎
    • Organizer
      日本金属学会 2024年春期講演大会(第174回)
    • Data Source
      KAKENHI-PROJECT-22K04675
  • [Presentation] Auで被覆した加熱基板へのスパッタによるGe薄膜の結晶化2023

    • Author(s)
      赤坂駿英, 弓野健太郎
    • Organizer
      日本金属学会 第172回講演大会
    • Data Source
      KAKENHI-PROJECT-22K04675
  • [Presentation] Crystallization behavior of Ge thin films during metal-induced crystallization using Au2023

    • Author(s)
      Narin Sunthornpan, Kentaro Kyuno
    • Organizer
      The 9th International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-22K04675
  • [Presentation] AuSb合金を用いたMIC法で作製したGe薄膜の構造と電気特性2023

    • Author(s)
      加藤雅基, 弓野健太郎
    • Organizer
      日本金属学会 第172回講演大会
    • Data Source
      KAKENHI-PROJECT-22K04675
  • [Presentation] Low temperature growth of crystalline semiconductor thin films by metal-induced crystallization: A simulation based on Cahn Hilliard model2023

    • Author(s)
      Tetsunosuke Harada, Kentaro Kyuno
    • Organizer
      The 9th International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-22K04675
  • [Presentation] AgSb合金を用いたMIC法によるn型Ge結晶薄膜の作製と電気特性の膜厚依存性2023

    • Author(s)
      大久保拓海, 弓野健太郎
    • Organizer
      日本金属学会 第172回講演大会
    • Data Source
      KAKENHI-PROJECT-22K04675
  • [Presentation] Ag-Sb合金を用いたGe薄膜の低温結晶化2023

    • Author(s)
      浅野友太、弓野健太郎
    • Organizer
      日本金属学会 2023年秋期講演大会(第173回)
    • Data Source
      KAKENHI-PROJECT-22K04675
  • [Presentation] AuGe合金の第一原理電子状態計算2023

    • Author(s)
      原田哲之介, 弓野健太郎
    • Organizer
      日本金属学会 第172回講演大会
    • Data Source
      KAKENHI-PROJECT-22K04675
  • [Presentation] Realizing an atomically flat surface of Ge (111) thin film at low temperature (220°C) by gold-induced layer exchange2022

    • Author(s)
      Narin Sunthornpan, Kentaro Kyuno
    • Organizer
      The 64th Electronic Materials Conference
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-22K04675
  • [Presentation] CRYSTALLIZATION OF GERMANIUM THIN FILMS USING GOLD-ANTIMONY (AuSb) AS A CATALYST2017

    • Author(s)
      Joseph B. Mutunga,Takumi Kondo,Tatsuya Suzuki,Masao Kamiko,Kentaro Kyuno
    • Organizer
      11th South East Asian Technical University Consortium Symposium
    • Place of Presentation
      ベトナム
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] CRYSTALLIZATION OF GERMANIUM THIN FILMS USING GOLD-ANTIMONY (AuSb) AS A CATALYST2017

    • Author(s)
      Joseph B. Mutunga,Takumi Kondo,Tatsuya Suzuki,Masao Kamiko,Kentaro Kyuno
    • Organizer
      11th South East Asian Technical University Consortium Symposium
    • Place of Presentation
      ベトナム
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-15K14130
  • [Presentation] AuGe/Au積層膜のアニールによるGe結晶薄膜の作成 (2)2016

    • Author(s)
      熊谷健太、神子公男、弓野健太郎
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      新潟市
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] AuとGeの同時スパッタによるGe薄膜の結晶化(Ⅲ)2016

    • Author(s)
      高鳥毛怜, 神子公男, 弓野健太
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      新潟市
    • Data Source
      KAKENHI-PROJECT-15K14130
  • [Presentation] AuGe/Au積層膜のアニールによるGe結晶薄膜の作成 (2)2016

    • Author(s)
      熊谷健太、神子公男、弓野健太郎
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      新潟市
    • Data Source
      KAKENHI-PROJECT-15K14130
  • [Presentation] AuとGeの同時スパッタによるGe薄膜の結晶化(Ⅲ)2016

    • Author(s)
      高鳥毛 怜, 神子公男, 弓野健太郎
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      新潟市
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] AuSb induced crystallization of Ge thin films2016

    • Author(s)
      J.B.Mutunga, T.Kondo, T.Suzuki, M.Kamiko, K.Kyuno
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      新潟市
    • Data Source
      KAKENHI-PROJECT-15K14130
  • [Presentation] AuGe/Au積層膜のアニールによるGe結晶薄膜の作製(1)2016

    • Author(s)
      阿久津敏 、神子公男、弓野健太郎
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      新潟市
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] AuSb induced crystallization of Ge thin films2016

    • Author(s)
      J.B.Mutunga, T.Kondo, T.Suzuki, M.Kamiko, K.Kyuno
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      新潟市
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] AuGe/Au積層膜のアニールによるGe結晶薄膜の作製(1)2016

    • Author(s)
      阿久津敏 、神子公男、弓野健太郎
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      新潟市
    • Data Source
      KAKENHI-PROJECT-15K14130
  • [Presentation] AuとGeの同時スパッタによる Ge薄膜の結晶化の膜厚依存性2015

    • Author(s)
      山本怜,杉山貴俊,神子公男,弓野 健太郎
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      名古屋国際会議場
    • Year and Date
      2015-09-13
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] AuとGeの同時スパッタによるGe薄膜の結晶化の膜厚依存性2015

    • Author(s)
      山本怜、杉山貴俊、神子公男、弓野健太郎
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      名古屋国際会議場
    • Year and Date
      2015-09-13
    • Data Source
      KAKENHI-PROJECT-15K14130
  • [Presentation] Au(111)表面上におけるGeのSTM観察2015

    • Author(s)
      若林陽介、橋口浩平、神子公男、弓野健太郎
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      名古屋国際会議場
    • Year and Date
      2015-09-13
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] AuとGeの同時スパッタによる結晶Ge薄膜の作製:リンドープの影響2015

    • Author(s)
      鈴木竜也、高鳥毛怜、杉山貴俊、神子公男、弓野健太郎
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      名古屋国際会議場
    • Year and Date
      2015-09-13
    • Data Source
      KAKENHI-PROJECT-15K14130
  • [Presentation] AuとGeの同時スパッタによる結晶Ge薄膜の作製:リンドープの影響2015

    • Author(s)
      鈴木竜也 、高鳥毛怜、杉山貴俊、神子公男、弓野健太郎
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      名古屋国際会議場
    • Year and Date
      2015-09-13
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] Au(111)表面上におけるGeのSTM観察2015

    • Author(s)
      若林陽介、橋口浩平、神子公男、弓野健太郎
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      名古屋国際会議場
    • Year and Date
      2015-09-13
    • Data Source
      KAKENHI-PROJECT-15K14130
  • [Presentation] AuとGeの同時スパッタによるGe薄膜の結晶化2014

    • Author(s)
      杉山貴俊,神子公男,弓野健太郎
    • Organizer
      応用物理学会春季学術講演会
    • Place of Presentation
      青山学院大学
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] Si/Ag(111)の表面形態のSTM観察(II)2014

    • Author(s)
      稲瀬陽介,神子公男,弓野健太郎
    • Organizer
      応用物理学会春季学術講演会
    • Place of Presentation
      青山学院大学
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] Tiシード層による自己組織化Ag薄膜の凝集過程2013

    • Author(s)
      神子公男,末永亮,野瀬健二,具正祐,弓野健太郎,光田好孝,河在根
    • Organizer
      応用物理学会秋季学術講演会
    • Place of Presentation
      同志社大学
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] Cuを触媒に用いたMIC法によるSi薄膜の結晶化2013

    • Author(s)
      庫井 俊輔, 飯島 裕貴, 三芝 直也, 神子 公男, 弓野 健太郎
    • Organizer
      日本金属学会秋期講演大会
    • Place of Presentation
      金沢大学
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] Cu_2Oを用いた平面型ReRAM素子におけるフォーミング過程の直接観察2010

    • Author(s)
      弓野健太郎、鈴木和典
    • Organizer
      第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学
    • Year and Date
      2010-09-17
    • Data Source
      KAKENHI-PROJECT-20510108
  • [Presentation] 平面型ReRAM素子におけるフォーミング現象初期過程の直接観察2010

    • Author(s)
      鈴木和典、弓野健太郎
    • Organizer
      応用物理学会
    • Place of Presentation
      東海大学
    • Year and Date
      2010-03-18
    • Data Source
      KAKENHI-PROJECT-20510108
  • [Presentation] Direct observation of the forming process in crystalline Cu2O resistive switching devices2010

    • Author(s)
      N.Igarashi, K.Suzuki, K.Kyuno
    • Organizer
      20th Materials Research Society of Japan Academic Symposium
    • Place of Presentation
      Yokohama
    • Year and Date
      2010-12-21
    • Data Source
      KAKENHI-PROJECT-20510108
  • [Presentation] Improvement of the Device Yield of TiO2 based ReRAM by Oxidation of Electrodes2009

    • Author(s)
      E.Shinozaki, K.Kyuno
    • Organizer
      Academic Symposium of MRS-Japan
    • Place of Presentation
      Yokohama
    • Year and Date
      2009-12-08
    • Data Source
      KAKENHI-PROJECT-20510108
  • [Presentation] Direct Observation of Conductive Path after Forming Process in Planar ReRAM2009

    • Author(s)
      K.Suzuki, K.Kyuno
    • Organizer
      Academic Symposium of MRS-Japan
    • Place of Presentation
      Yokohama
    • Year and Date
      2009-12-08
    • Data Source
      KAKENHI-PROJECT-20510108
  • [Presentation] 平面型ReRAMにおけるフォーミング現象の直接観察2009

    • Author(s)
      鈴木和典、弓野健太郎
    • Organizer
      応用物理学会
    • Place of Presentation
      富山大学
    • Year and Date
      2009-09-09
    • Data Source
      KAKENHI-PROJECT-20510108
  • [Presentation] 電極の酸化によるTiO2薄膜の抵抗変化スイッチング現象の安定化2009

    • Author(s)
      星野智也、弓野健太郎
    • Organizer
      日本金属学会
    • Place of Presentation
      京都大学
    • Year and Date
      2009-09-16
    • Data Source
      KAKENHI-PROJECT-20510108
  • [Presentation] AuによるGeのMIC法における熱処理温度および膜厚依存性

    • Author(s)
      末永 容平、弓野 健太郎
    • Organizer
      日本金属学会2015年春期講演大会
    • Place of Presentation
      東京大学 駒場キャンパス
    • Year and Date
      2015-03-18 – 2015-03-20
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] Au-Ge同時スパッタによるアモルファスGeの結晶化

    • Author(s)
      小室 尚貴、神子 公男、弓野 健太郎
    • Organizer
      日本金属学会2015年春期講演大会
    • Place of Presentation
      東京大学 駒場キャンパス
    • Year and Date
      2015-03-18 – 2015-03-20
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] Alを用いたSurfactant Crystallization法による結晶Si薄膜の作製

    • Author(s)
      飯島 裕貴、弓野 健太郎、神子 公男
    • Organizer
      日本金属学会2014年秋期講演大会
    • Place of Presentation
      名古屋大学 東山キャンパス
    • Year and Date
      2014-09-24 – 2014-09-26
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] Ag/mica上に蒸着したSiの影響によるAgの構造変化(II)

    • Author(s)
      橋口 浩平、若林 陽介、稲瀬 陽介、神子 公男、弓野 健太郎
    • Organizer
      日本金属学会2015年春期講演大会
    • Place of Presentation
      東京大学 駒場キャンパス
    • Year and Date
      2015-03-18 – 2015-03-20
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] AuとGeの同時スパッタによるGe薄膜の結晶化(Ⅱ)

    • Author(s)
      杉山 貴俊、神子 公男、弓野 健太郎
    • Organizer
      2015年第62回応用物理学会春季学術講演会
    • Place of Presentation
      東海大学 湘南キャンパス
    • Year and Date
      2015-03-11 – 2015-03-14
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] Agを用いたMIC法によるSiの結晶化挙動

    • Author(s)
      谷口 公一、神子公男、弓野健太郎
    • Organizer
      日本金属学会2015年春期講演大会
    • Place of Presentation
      東京大学 駒場キャンパス
    • Year and Date
      2015-03-18 – 2015-03-20
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] Ag/mica上に蒸着したSiの影響によるAgの構造変化

    • Author(s)
      橋口 浩平、稲瀬 陽介、神子 公男、弓野 健太郎
    • Organizer
      日本金属学会2014年秋期講演大会
    • Place of Presentation
      名古屋大学 東山キャンパス
    • Year and Date
      2014-09-24 – 2014-09-26
    • Data Source
      KAKENHI-PROJECT-25289231
  • [Presentation] Au,Ge同時スパッタ法による結晶化Ge薄膜の作製

    • Author(s)
      三芝 直也、杉山 貴俊、神子 公男、弓野 健太郎
    • Organizer
      日本金属学会2014年秋期講演大会
    • Place of Presentation
      名古屋大学 東山キャンパス
    • Year and Date
      2014-09-24 – 2014-09-26
    • Data Source
      KAKENHI-PROJECT-25289231
  • 1.  TORIUMI Akira (50323530)
    # of Collaborated Projects: 3 results
    # of Collaborated Products: 41 results
  • 2.  KAMIKO Masao (80334366)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 31 results
  • 3.  YAMAMOTO Ryoichi (10107550)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 0 results
  • 4.  KITA Kita (00343145)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 41 results
  • 5.  HA Jae-Geun
    # of Collaborated Projects: 0 results
    # of Collaborated Products: 2 results
  • 6.  SUENAGA Ryo
    # of Collaborated Projects: 0 results
    # of Collaborated Products: 2 results
  • 7.  KOO Jung-Woo
    # of Collaborated Projects: 0 results
    # of Collaborated Products: 2 results
  • 8.  NOSE Kenji
    # of Collaborated Projects: 0 results
    # of Collaborated Products: 2 results

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