Habuka Hitoshi 羽深等

… Alternative Names

Researcher Number	40323927
Other IDs
Affiliation (based on the past Project Information) *help	2017 – 2019: 横浜国立大学, 大学院工学研究院, 教授 2014 – 2015: 横浜国立大学, 工学(系)研究科(研究院), 教授 2010 – 2013: 横浜国立大学, 工学研究院, 教授 2012: 横浜国立大学, 大学院・工学研究院, 教授 2006 – 2007: 横浜国立大学, 工学研究院, 教授
Review Section/Research Field	Principal Investigator Material processing/treatments / Material processing/Microstructural control engineering / Reaction engineering/Process system / Reaction engineering/Process system
Keywords	Principal Investigator 化学気相堆積 / 材料合成プロセス / 炭化珪素 / 表面活性化 / 低温薄膜形成 / 圧電性結晶振動子 / その場評価技術 / 水晶振動子 / 有機物分子 / 吸着 … More

Research Projects
(4 results)
Research Products
(79 results)

Main and Side Reaction Design for Exceeding the chemical vapor deposition rate limitPrincipal Investigator
- Principal Investigator
  
  Habuka Hitoshi
- Project Period (FY)
  2017 – 2019
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Reaction engineering/Process system
- Research Institution
  Yokohama National University
Entire process view for film formation by chemical vapor depositionPrincipal Investigator
- Principal Investigator
  
  Habuka Hitoshi
- Project Period (FY)
  2013 – 2015
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Material processing/Microstructural control engineering
- Research Institution
  Yokohama National University
Study on low temperature thin film formation method by controlling chemical bonds on solid surfacePrincipal Investigator
- Principal Investigator
  
  HABUKA Hitoshi
- Project Period (FY)
  2010 – 2012
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Material processing/treatments
- Research Institution
  Yokohama National University
Study on interaction between molecules adsorbed on silicon surface using quartz crystal microbalance and the multi-component organic species adsorption-induced contamination modelPrincipal Investigator
- Principal Investigator
  
  HABUKA Hitoshi
- Project Period (FY)
  2006 – 2007
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Reaction engineering/Process system
- Research Institution
  Yokohama National University

All 2020 2019 2018 2017 2016 2015 2014 2013 2012 2011 2010 2007 2006 Other

All Journal Article Presentation Book

[Book] InTech,(Vienna, Austria)2011
- Author(s)
  Hitoshi Habuka
- Publisher
  Properties andApplications of Silicon Carbide
- Data Source
  KAKENHI-PROJECT-22560713
[Book] Silicon Carbide : New Materials, Production Methods and Applications2011
- Author(s)
  Hitoshi Habuka
- Publisher
  Nova Science Publishers (Hauppauge NY USA)(印刷中につき不明)
- Data Source
  KAKENHI-PROJECT-22560713
[Book] Nova Science Publishers(Hauppauge NY USA)2011
- Author(s)
  Hitoshi Habuka
- Publisher
  Silicon Carbide: New Materials, Production Methods and Applications
- Data Source
  KAKENHI-PROJECT-22560713
[Book] Properties and Applications of Silicon Carbide2011
- Author(s)
  Hitoshi Habuka
- Publisher
  In Tech, (Vienna, Austria)(印刷中につき不明)
- Data Source
  KAKENHI-PROJECT-22560713
[Journal Article] Deposition and Etching Behaviour of Boron Trichloride Gas at Silicon Surface2020
- Author(s)
  Mitsuko Muroi, Ayami Yamada, Ayumi Saito, and Hitoshi Habuka
- Journal Title
  
  , Journal of Crystal Growth
  
  Volume: 529
- DOI
  10.1016/j.jcrysgro.2019.125301
- NAID
  120006796059
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17K06904
[Journal Article] Silicon epitaxial growth accelerated by parallel Langmuir processes using SiH2Cl2 and SiH3CH3 gases2018
- Author(s)
  Yamada Ayami、Muroi Mitsuko、Watanabe Toru、Saito Ayumi、Sakurai Ayumi、Habuka Hitoshi
- Journal Title
  
  Semiconductor Science and Technology
  
  Volume: 33 Pages: 094002-094002
- DOI
  10.1088/1361-6641/aad294
- NAID
  120006630613
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17K06904
[Journal Article] Parallel langmuir processes for silicon epitaxial growth in a SiHCl 3 -SiH x -H 2 system2017
- Author(s)
  Watanabe Toru、Yamada Ayami、Saito Ayumi、Sakurai Ayumi、Habuka Hitoshi
- Journal Title
  
  Materials Science in Semiconductor Processing
  
  Volume: 72 Pages: 134-138
- DOI
  10.1016/j.mssp.2017.09.034
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17K06904
[Journal Article] Increase in silicon film deposition rate in a SiHCl 3 -SiH x -H 2 system2017
- Author(s)
  Saito Ayumi、Sakurai Ayumi、Habuka Hitoshi
- Journal Title
  
  Journal of Crystal Growth
  
  Volume: 468 Pages: 204-207
- DOI
  10.1016/j.jcrysgro.2016.10.035
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17K06904
[Journal Article] In Situ Measurement for Evaluating Temperature Change Related to Silicon film Formation in a SiHCl3-H2 System2016
- Author(s)
  Kento Miyazaki, Ayumi Saito and Hitoshi Habuka
- Journal Title
  
  ECS Journal of Solid State Science and Technology
  
  Volume: 5
- DOI
  10.1149/2.0101602jss
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-25420772
[Journal Article] In-situ Observation of Chemical Vapor Deposition Using SiHCl3 and BCl3 Gases2015
- Author(s)
  Ayumi Saito, Kento Miyazaki, Misako Matsui and Hitoshi Habuka
- Journal Title
  
  Physica Status Solidi C
  
  Volume: 12 Pages: 953-957
- DOI
  10.1002/pssc.201510002
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-25420772
[Journal Article] In-Situ Monitoring of Chemical Vapor Deposition from Trichlorosilane Gas and Monomethylsilane Gas Using Langasite Crystal Microbalance2013
- Author(s)
  Hitoshi Habuka and Yurie Tanaka
- Journal Title
  
  Journal of Surface Engineered Materials and Advanced Technology
  
  Volume: 3 Pages: 61-66
- DOI
  10.4236/jsemat.2013.31a009
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25420772
[Journal Article] Langasite Crystal Microbalance Frequency Behavior over Wide Gas Phase Conditions for Chemical Vapor Deposition2013
- Author(s)
  Hitoshi Habuka and Misako Matsui
- Journal Title
  
  Surface and Coatings Technology
  
  Volume: 230 Pages: 312-315
- DOI
  10.1016/j.surfcoat.2013.06.052
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25420772
[Journal Article] Amorphous Silicon Carbide Chemical Vapor Deposition on Metal Surface Using Monomethylsilane Gas at Low Temperatures2013
- Author(s)
  Hitoshi Habuka and Masaki Tsuji
- Journal Title
  
  Surface and Coating Technology
  
  Pages: 88-93
- DOI
  10.1016/j.surfcoat.2012.11.078
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560713
[Journal Article] Amorphous Silicon Carbide Film Formation at Room Temperature by Monomethylsilane Gas2012
- Author(s)
  Hitoshi Habuka and Masaki Tsuji
- Journal Title
  
  Materials Science Forum
  
  Volume: 740-742巻 Pages: 235-238
- DOI
  10.4028/www.scientific.net/msf.740-742.235
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560713
[Journal Article] Yusuke Ando and Masaki Tsuji, Room Temperature Process for Chemical Vapor Deposition of Silicon Carbide Thin Film Using Monomethylsilane Gas2011
- Author(s)
  Hitoshi Habuka
- Journal Title
  
  Surface & Coatings Technology
  
  Volume: 206巻 Pages: 1503-1506
- DOI
  10.1016/j.surfcoat.2011.09.037
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560713
[Journal Article] Mechanism of Silicon Carbide Film Deposition at Room Temperature Using Monomethylsilane Gas2011
- Author(s)
  Hitoshi Habuka and Yusuke Ando
- Journal Title
  
  Journal of Electrochemical Society
  
  Volume: 158巻
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560713
[Journal Article] Mechanism of Silicon Carbide Film Deposition at Room Temperature Using Monomethylsilane Gas2011
- Author(s)
  Hitoshi Habuka, Yusuke Ando
- Journal Title
  
  J.Electrochem.Soc
  
  Volume: 158
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560713
[Journal Article] Development of Reactive Surface Preparation for Room Temperature Silicon Carbide Film Deposition from Monomethylsilane Gas2011
- Author(s)
  Hitoshi Habuka, Ken-Ichi Kote
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 50
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560713
[Journal Article] Mechanism of Silicon Carbide Film Deposition at Room Temperature Using Monomethylsilane Gas2011
- Author(s)
  Hitoshi Habuka, Yusuke Ando
- Journal Title
  
  Journal of Electrochemical Society
  
  Volume: 158
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560713
[Journal Article] Low Temperature SiC Film Deposition Using Trichlorosilane Gas and Monomethylsilane Gas2011
- Author(s)
  Hitoshi Habuka, Yusuke Ando
- Journal Title
  
  Journal of Nanoscience and Nanotechnology
  
  Volume: 11 Pages: 8374-8377
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560713
[Journal Article] Silicon Carbide Film Deposition at Low Temperatures Using Monomethylsilane Gas2010
- Author(s)
  Hitoshi Habuka Hiroshi Ohmori and Yusuke Ando
- Journal Title
  
  Surface and Coating Technology
  
  Volume: 204巻
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560713
[Journal Article] Silicon Carbide Film Deposition at Low Temperatures Using Monomethylsilane Gas2010
- Author(s)
  Hitoshi Habuka Hiroshi Ohmori, Yusuke Ando
- Journal Title
  
  Surf.Coat.Tech
  
  Volume: 204 Pages: 1432-1437
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22560713
[Journal Article] In-Situ Measurement Method and Rate Theory for Clarifying Multi-Component Organic Compounds Adsorption and Desorption on Silicon Surface2007
- Author(s)
  H. Habuka
- Journal Title
  
  Electrochemical Society Transaction 11・3
  
  Pages: 363-374
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] Physisorption and Desorption of Diethylphthalate and Isopropanol on a Silicon Surface2007
- Author(s)
  H. Habuka
- Journal Title
  
  Journal of the Electrochemical Society 154
- Description
  「研究成果報告書概要(和文)」より
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] 複数種類有機物のシリコン表面吸着脱離挙動2007
- Author(s)
  羽深等, 山屋大輔
- Journal Title
  
  クリーンテクノロジー 1月号
  
  Pages: 36-39
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] 複数種類有機物のシリコン表面吸着脱離挙動2007
- Author(s)
  羽深等
- Journal Title
  
  クリーンテクノロジー 17
  
  Pages: 36-39
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] In-Situ Measurement Method and Rate Theory for Clarifying Multi-Component Organic Compounds Adsorption and Desorption on Silicon Surface2007
- Author(s)
  H. Habuka
- Journal Title
  
  Electrochemical Society Transaction 11
  
  Pages: 363-374
- Description
  「研究成果報告書概要(和文)」より
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] シリコン表面における複数種有機物分子の吸着脱離挙動2007
- Author(s)
  羽深等
- Journal Title
  
  クリーンテクノロジー 17・10
  
  Pages: 1-5
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] Physisorption and Desorption of Diethylphthalate and Isopropanol on a Silicon Surface2007
- Author(s)
  H. Habuka, D. Yamaya
- Journal Title
  
  Journal of the Electrochemical Society 154
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] Physisorption and Desorption of Diethylphthalate and Isopropanol on a Silicon Surface2007
- Author(s)
  H. Habuka
- Journal Title
  
  Journal of the Electrochemical Society 154・12
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] Tn-_Sit Measurement Metho Rate Theory for Clarifying Multi-Component Organic Compounds Adsorption and Desorption on Silicon Surface2007
- Author(s)
  H. Habuka, D. Iramaya
- Journal Title
  
  Electrrochemical SocietyTransaction 11
  
  Pages: 363-374
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] Adsorption and Desorption of Multi-component Organic Compounds on Silicon Surface2007
- Author(s)
  H. Habuka, D. Yamaya
- Journal Title
  
  Clean Technology 17
  
  Pages: 36-39
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] シリコン表面における複数種有機物分子の吸着脱離挙動2007
- Author(s)
  羽深等
- Journal Title
  
  クリーンテクノロジー 17
  
  Pages: 1-5
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] Influence of Gas Velocity and Humidity on Diethyl Phthalate Adsorption and Desorption on Silicon Surface2006
- Author(s)
  H. Habuka
- Journal Title
  
  Electrochemical Society Transaction 2
  
  Pages: 523-536
- Description
  「研究成果報告書概要(和文)」より
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] Influence of Gas Velocity and Humidity on Diethy1 Phthalate Adsorption and Desorption on Silicon Surface2006
- Author(s)
  H.Habuka, M.Tawada, K.Suzuki, T.Takeuchi, M.Aihara
- Journal Title
  
  Electrochemical Society Transaction 2・2
  
  Pages: 523-536
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] シリコン表面有機物汚染における流速の影響2006
- Author(s)
  羽深等
- Journal Title
  
  クリーンテクノロジー 16
  
  Pages: 66-69
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] Influence of Gas Velocity and Humidity on Diethyl Phthalate Adsorption and Desorption on Silicon Surface2006
- Author(s)
  H. Habuka, M. Tawada, K. Suzuki, T. Takeuchi, M. Aihara
- Journal Title
  
  Electrochemical Society Transaction 2
  
  Pages: 523-536
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Journal Article] Influence of Gas Velocity on Organic Contamination on Silicon Surface2006
- Author(s)
  H. Habuka, M. Tawada, T. Takeuchi, M. Aihara
- Journal Title
  
  Clean Technology 16
  
  Pages: 66-69
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Presentation] シリコン表面における三塩化ホウ素ガスの化学反応2019
- Author(s)
  室井光子, 山田彩未, 齋藤あゆ美, 羽深等
- Organizer
  化学工学会横浜大会
- Data Source
  KAKENHI-PROJECT-17K06904
[Presentation] Boron trichloride gas behaviour for chemical vapour deposition and etching at silicon surface2019
- Author(s)
  Mitsuko Muroi, Ayumi Saito and Hitoshi Habuka
- Organizer
  19th International Conference on Crystal Growth and Epitaxy (ICCGE-19)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06904
[Presentation] シリコン表面における三塩化ホウ素ガスの化学反応2019
- Author(s)
  室井光子，山田彩未，齋藤あゆ美，羽深等
- Organizer
  第80回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-17K06904
[Presentation] Silicon epitaxial growth rate accelerated by parallel langmuir processes2018
- Author(s)
  Ayami Yamada, Toru Watanabe, Ayumi Saito, Ayumi Sakurai and Hitoshi Habuka
- Organizer
  The first joint conference of international SiGe technology and device meeting (ISTDM) and international conference on silicon epitaxy and heterostructures (ICSI)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06904
[Presentation] SiH2Cl2-SiHx-H2系によるシリコン薄膜成長速度増大方法2018
- Author(s)
  室井光子,山田彩未,羽深等
- Organizer
  第79回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-17K06904
[Presentation] SiHCl3-SiHx-H2系シリコンエピタキシャル成長の反応速度解析2017
- Author(s)
  入倉健太, 渡部亨、羽深等
- Organizer
  第78回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-17K06904
[Presentation] Silicon epitaxial growth rate increased by adding SiHx to a SiHCl3-H2 system2017
- Author(s)
  Toru Watanabe, Ayami Yamada, Ayumi Saito, Ayumi Sakurai, Hitoshi Habuka
- Organizer
  Joint EuroCVD-BalticALD 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06904
[Presentation] CVD装置内熱挙動のランガサイト結晶振動子によるその場測定2015
- Author(s)
  宮崎賢都, 齋藤あゆ美,　松井美沙子,　羽深等
- Organizer
  第76回応用物理学会秋季学術講演会
- Place of Presentation
  名古屋（名古屋国際会議場）
- Year and Date
  2015-09-14
- Data Source
  KAKENHI-PROJECT-25420772
[Presentation] In-situ observation of chemical vapor deposition using SiHCl3 and BCl3 Gases2015
- Author(s)
  Ayumi Saito, Kento Miyazaki, Misako Matsui, and Hitoshi Habuka
- Organizer
  EuroCVD20
- Place of Presentation
  Sempach, Switzerland
- Year and Date
  2015-07-14
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25420772
[Presentation] Hitoshi HabukaAtmospheric Pressure Chemical Vapor Deposition Observed by Langasite Crystal Microbalance2015
- Author(s)
  Hitoshi Habuka
- Organizer
  BIT’s 4th Annual World Congress of Advanced Materials-2015
- Place of Presentation
  Chongqing, China
- Year and Date
  2015-05-28
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25420772
[Presentation] ランガサイト結晶振動子を用いたその場測定によるSiHCl3-BCl3混合系化学気相堆積の観察2014
- Author(s)
  齋藤あゆ美, 宮崎賢都, 松井美沙子, 羽深等
- Organizer
  第75回応用物理学会秋季学術講演会
- Place of Presentation
  北海道大学、札幌
- Year and Date
  2014-09-19
- Invited
- Data Source
  KAKENHI-PROJECT-25420772
[Presentation] In-Situ Observation of Chemical vapor deposition Using Langasite Crystal Microbalance2014
- Author(s)
  Hitoshi Habuka
- Organizer
  Collaborative Conference on Crystal Growth 3CG 2014
- Place of Presentation
  Holyday Inn. Phuket, Thailand
- Year and Date
  2014-11-03
- Invited
- Data Source
  KAKENHI-PROJECT-25420772
[Presentation] Langasite Crystal Microbalance for In-Situ Monitor of Chemical Vapor Deposition2014
- Author(s)
  Hitoshi Habuka
- Organizer
  IUMRS-ICA2014
- Place of Presentation
  福岡大学,福岡市
- Year and Date
  2014-08-26
- Invited
- Data Source
  KAKENHI-PROJECT-25420772
[Presentation] 炭化珪素薄膜の低温形成法(2)2012
- Author(s)
  津地雅希,羽深等
- Organizer
  第73回応用物理学会学術講演会
- Place of Presentation
  愛媛大学・松山大学
- Year and Date
  2012-09-12
- Data Source
  KAKENHI-PROJECT-22560713
[Presentation] 炭化珪素薄膜の低温形成法2012
- Author(s)
  津地雅希,羽深等
- Organizer
  2012年化学工学会横浜大会
- Place of Presentation
  横浜国立大学
- Data Source
  KAKENHI-PROJECT-22560713
[Presentation] Amorphous Silicon Carbide Film Formation at Room Temperature by Monomethylsilane Gas2012
- Author(s)
  Hitoshi Habuka, Masaki Tsuji and Yusuke Ando
- Organizer
  The 9th European Conference on Silicon Carbide and Related Materials
- Place of Presentation
  Saint Petersburg, Russia
- Year and Date
  2012-09-04
- Data Source
  KAKENHI-PROJECT-22560713
[Presentation] シリコン中間層を用いた炭化珪素薄膜低温形成法2012
- Author(s)
  津地雅希,羽深等
- Organizer
  第21回SiC研究会講演会
- Place of Presentation
  大阪市中央公会堂
- Year and Date
  2012-11-19
- Data Source
  KAKENHI-PROJECT-22560713
[Presentation] Amorphous Silicon Carbide Thin Film Formation at Room Temperature Using Monomethylsilane Gas2012
- Author(s)
  Hitoshi Habuka, Masaki Tsuji and Yusuke Ando
- Organizer
  Materials Research Society
- Place of Presentation
  San Francisco
- Year and Date
  2012-04-10
- Data Source
  KAKENHI-PROJECT-22560713
[Presentation] 炭化珪素薄膜の室温形成法2011
- Author(s)
  津地雅希、安藤祐介、羽深等
- Organizer
  第20回シリコンカーバイド(SiC)及び関連ワイドギャップ半導体研究会
- Place of Presentation
  名古屋
- Year and Date
  2011-12-08
- Data Source
  KAKENHI-PROJECT-22560713
[Presentation] 炭化珪素薄膜の室温形成法2011
- Author(s)
  安藤裕介、津地雅希、羽深等
- Organizer
  第72回応用物理学会学術講演会
- Place of Presentation
  山形大学
- Year and Date
  2011-08-30
- Data Source
  KAKENHI-PROJECT-22560713
[Presentation] 炭化珪素薄膜の室温形成法2011
- Author(s)
  津地雅希、安藤祐介、羽深, 等
- Organizer
  第20回シリコンカーバイド(SiC)及び関連ワイドギャップ半導体研究会
- Place of Presentation
  名古屋
- Year and Date
  2011-12-08
- Data Source
  KAKENHI-PROJECT-22560713
[Presentation] モノメチルシランガスを用いたSiC薄膜の低温堆積2010
- Author(s)
  安藤裕介、羽深, 等
- Organizer
  2010年(平成22年)秋第71回応用物理学会学術講演会
- Place of Presentation
  長崎大学
- Year and Date
  2010-09-14
- Data Source
  KAKENHI-PROJECT-22560713
[Presentation] モノメチルシランガスを用いたSiC薄膜の低温堆積2010
- Author(s)
  安藤裕介、羽深等
- Organizer
  第71回応用物理学会学術講演会
- Place of Presentation
  長崎大学
- Year and Date
  2010-09-14
- Data Source
  KAKENHI-PROJECT-22560713
[Presentation] モノメチルシランガスによるSiC薄膜の低温堆積2010
- Author(s)
  安藤裕介、大森弘士、羽深等
- Organizer
  第19回シリコンカーバイド(SiC)及び関連ワイドギャップ半導体研究会
- Place of Presentation
  つくば
- Year and Date
  2010-10-21
- Data Source
  KAKENHI-PROJECT-22560713
[Presentation] Amount of Adsorbed Diethylphthalate and Isopropyl alcohol on Silicon Surface(2)2007
- Author(s)
  D, Yamaya, H, Habuka
- Organizer
  The 54th Spring Meeting, 2006 of the Japan Society of Applied Physics
- Place of Presentation
  Tokyo, Japan
- Year and Date
  2007-03-28
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Presentation] シリコン表面における有機物分子吸着脱離挙動のその場観察2007
- Author(s)
  羽深等
- Organizer
  化学工学会秋季大会(2007)
- Place of Presentation
  札幌
- Year and Date
  2007-09-15
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Presentation] Amount of Adsorbed Diethylphthalate and Isopropyl alcohol on Silicon Surface(3)2007
- Author(s)
  D, Yamaya, N, Kawahara, H, Habuka
- Organizer
  The 68th Fall Meeting, 2007 of the Japan Society of Applied Physics
- Place of Presentation
  Sapporo, Japan
- Year and Date
  2007-09-08
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Presentation] シリコン表面における有機物分子吸着脱離挙動のその場観察2007
- Author(s)
  羽深等
- Organizer
  化学工学会
- Place of Presentation
  北海道
- Year and Date
  2007-09-15
- Data Source
  KAKENHI-PROJECT-18560730
[Presentation] In-Situ Observation of organic molecules adsorbed on Silicon Surface2007
- Author(s)
  D, Yamaya, H, Habuka
- Organizer
  Autumn Annual Meeting of the Society for Chemical Engineers Japan
- Place of Presentation
  Sapporo, Japan
- Year and Date
  2007-09-15
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Presentation] In-Situ Measurement Method and Rate Theory for Clarifying Multi-Component Organic Compounds Adsorption and Desorption on Silicon Surface2007
- Author(s)
  H. Habuka
- Organizer
  Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes
- Place of Presentation
  Washington, USA
- Year and Date
  2007-10-10
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Presentation] Adsorption and Desorption of Multi-component Organic Compounds on Silicon Surface2006
- Author(s)
  D, Yamaya, H, Habuka, T, Takeuchi, M, Aihara
- Organizer
  The 67th Fall Meeting, 2006 of the Japan Society of Applied Physics
- Place of Presentation
  Shiga, Japan
- Year and Date
  2006-08-29
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Presentation] Influence of Gas Velocity on Organic Contamination on Silicon Surface2006
- Author(s)
  H, Habuka, M, Tawada, T, Takeuchi, M, Aihara
- Organizer
  Proceedings of 24th Annual Tech. Meeting on Air Cleaning and Contamination Control
- Place of Presentation
  Tokyo, Japan
- Year and Date
  2006-04-14
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Presentation] Influence of Gas Velocity and Humidity on Diethyl Phthalate Adsorption and Desorption on Silicon Surface2006
- Author(s)
  H. Habuka
- Organizer
  Silicon Materials Science and Technology X
- Place of Presentation
  Denver, USA
- Year and Date
  2006-05-11
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Presentation] シリコン表面有機物汚染における気流流速の影響解析,2006
- Author(s)
  羽深等
- Organizer
  第24回空気清浄とコンタミネーションコントロール研究大会
- Place of Presentation
  東京
- Year and Date
  2006-04-11
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-18560730
[Presentation] Langasite crystal microbalance frequency behavior over wide　gas phase conditions for chemical vapor deposition
- Author(s)
  Hitoshi Habuka* and Misako Matsui
- Organizer
  EuroCVD19
- Place of Presentation
  Varna (Bulgaria)
- Data Source
  KAKENHI-PROJECT-25420772
[Presentation] 炭化珪素薄膜の低温形成法(2)
- Author(s)
  津地雅希，羽深等
- Organizer
  第73回応用物理学会学術講演会
- Place of Presentation
  愛媛大学・松山大学
- Data Source
  KAKENHI-PROJECT-22560713
[Presentation] シリコン中間層を用いた炭化珪素薄膜低温形成法
- Author(s)
  津地雅希，羽深等
- Organizer
  第21回SiC研究会講演会
- Place of Presentation
  大阪市中央公会堂
- Data Source
  KAKENHI-PROJECT-22560713
[Presentation] ランガサイト結晶振動子による化学気相堆積プロセス測定法(2)
- Author(s)
  松井美沙子, 羽深等
- Organizer
  第74回応用物理学会秋季学術講演会
- Place of Presentation
  同志社大学(京都府)
- Data Source
  KAKENHI-PROJECT-25420772
[Presentation] Amorphous Silicon Carbide Thin Film Formation at Room Temperature Using Monomethylsilane Gas
- Author(s)
  Hitoshi Habuka, Masaki Tsuji, and Yusuke Ando
- Organizer
  Materials Research Society
- Place of Presentation
  San Francisco, USA
- Data Source
  KAKENHI-PROJECT-22560713
[Presentation] Method for Determining Chemical Vapor Deposition Occurrence Using Langasite Crystal Microbalance
- Author(s)
  Hitoshi Habuka, Misako Matsui and Ayumi Saito
- Organizer
  17th International Conference of Crystal Growth and Epitaxy
- Place of Presentation
  Univ. Warsaw (Warsaw, Poland)
- Data Source
  KAKENHI-PROJECT-25420772
[Presentation] ランガサイト結晶振動子による化学気相堆積プロセス測定法(1)
- Author(s)
  松井美沙子, 齋藤あゆ美、羽深等
- Organizer
  第74回応用物理学会秋季学術講演会
- Place of Presentation
  同志社大学(京都府)
- Data Source
  KAKENHI-PROJECT-25420772

Habuka Hitoshi 羽深 等

HABUKA Hitoshi 羽深 等

Research Projects

Research Products

Main and Side Reaction Design for Exceeding the chemical vapor deposition rate limitPrincipal Investigator

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Entire process view for film formation by chemical vapor depositionPrincipal Investigator

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Study on low temperature thin film formation method by controlling chemical bonds on solid surfacePrincipal Investigator

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Study on interaction between molecules adsorbed on silicon surface using quartz crystal microbalance and the multi-component organic species adsorption-induced contamination modelPrincipal Investigator

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[Book] InTech,(Vienna, Austria)2011

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[Book] Silicon Carbide : New Materials, Production Methods and Applications2011

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[Book] Nova Science Publishers(Hauppauge NY USA)2011

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[Book] Properties and Applications of Silicon Carbide2011

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[Journal Article] Deposition and Etching Behaviour of Boron Trichloride Gas at Silicon Surface2020

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NAID

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[Journal Article] Silicon epitaxial growth accelerated by parallel Langmuir processes using SiH2Cl2 and SiH3CH3 gases2018

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NAID

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[Journal Article] Parallel langmuir processes for silicon epitaxial growth in a SiHCl 3 -SiH x -H 2 system2017

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[Journal Article] Increase in silicon film deposition rate in a SiHCl 3 -SiH x -H 2 system2017

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[Journal Article] In Situ Measurement for Evaluating Temperature Change Related to Silicon film Formation in a SiHCl3-H2 System2016

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[Journal Article] In-situ Observation of Chemical Vapor Deposition Using SiHCl3 and BCl3 Gases2015

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[Journal Article] In-Situ Monitoring of Chemical Vapor Deposition from Trichlorosilane Gas and Monomethylsilane Gas Using Langasite Crystal Microbalance2013

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Habuka Hitoshi 羽深等

HABUKA Hitoshi 羽深等