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Sasago Masaru  笹子 勝

ORCIDConnect your ORCID iD *help
Researcher Number 40727145
Other IDs
Affiliation (Current) 2025: 大阪公立大学, 大学院工学研究科 , 客員教授
Affiliation (based on the past Project Information) *help 2022 – 2023: 大阪公立大学, 大学院工学研究科, 客員研究員
2020 – 2021: 大阪府立大学, 工学(系)研究科(研究院), 客員研究員
Review Section/Research Field
Principal Investigator
Basic Section 28050:Nano/micro-systems-related
Keywords
Principal Investigator
三次元 / 最適化 / デザインルール / シードパターン / 3次元リソグラフィ / 3次元構造 / フォトマスク / 位相振幅 / 3次元リソグラフィ / 一括露光 … More / 3次元結像 / ビルトインレンズマスク / 三次元結像 / 複素透過率 / マスク / 複素振幅 / 波面 / 3次元加工 / フォトリソグラフィ Less
  • Research Projects

    (1 results)
  • Research Products

    (10 results)
  • Co-Researchers

    (1 People)
  •  3-dimensional photolithographyPrincipal Investigator

    • Principal Investigator
      Sasago Masaru
    • Project Period (FY)
      2020 – 2023
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Review Section
      Basic Section 28050:Nano/micro-systems-related
    • Research Institution
      Osaka Metropolitan University
      Osaka Prefecture University

All 2024 2023 2021

All Journal Article Presentation

  • [Journal Article] Computational study of 3-dimensional photo lithography on limitations and possibility for novel structures2023

    • Author(s)
      Hirai Yoshihiko、Osumi Tomoaki、Tanaka Toshiaki、Yasuda Masaaki、Sasago Masaru
    • Journal Title

      Proceedings of SPIE Advanced Lithography + Patterning

      Volume: 12497 Pages: 1-7

    • DOI

      10.1117/12.2658128

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-20K05289
  • [Journal Article] Automatic design of the build-in lens mask for three-dimensional photo lithography2021

    • Author(s)
      Osumi Tomoaki、Sasago Masaru、Yasuda Masaaki、Hirai Yoshihiko
    • Journal Title

      Proceedings Volume 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology

      Volume: 11908 Pages: 1-5

    • DOI

      10.1117/12.2598156

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-20K05289
  • [Journal Article] Computational Lithography for 3-Dimensional Fine Photolithography using Sophisticated Built-in Lens Mask2021

    • Author(s)
      Osumi Tomoaki、Misaka Akio、Sato Kousuke、Yasuda Masaaki、Sasago Masaru、Hirai Yoshihiko
    • Journal Title

      J. Photopol. Sci. Technol.

      Volume: 34 Issue: 2 Pages: 123-126

    • DOI

      10.2494/photopolymer.34.123

    • NAID

      130008119664

    • ISSN
      0914-9244, 1349-6336
    • Year and Date
      2021-06-11
    • Language
      English
    • Peer Reviewed / Open Access
    • Data Source
      KAKENHI-PROJECT-20K05289
  • [Presentation] ビルトインレンズマスクを用いた三次元フォトリソグラフィによる パターン形成2024

    • Author(s)
      田中 敏章, 安田 雅昭,笹子 勝, 平井 義彦
    • Organizer
      第71回応用物理学会春季学術講演会(3月,2024,東京)
    • Data Source
      KAKENHI-PROJECT-20K05289
  • [Presentation] Computational study of 3-dimensional photo lithography on limitations and possibility for novel structures2023

    • Author(s)
      Hirai Yoshihiko、Osumi Tomoaki、Tanaka Toshiaki、Yasuda Masaaki、Sasago Masaru
    • Organizer
      SPIE Advanced Lithography + Patterning
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K05289
  • [Presentation] Computational Lithography for 3-Dimensional Fine Photolithography using Sophisticated Built-in Lens Mask2021

    • Author(s)
      T. Osumi, A. Misaka, K. Sato, M. Yasuda, M. Sasago, Y. Hirai,
    • Organizer
      The 38th International Conference of Photopolymer Science and Technology (ICPST-38)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K05289
  • [Presentation] ビルトインレンズマスクによる三次元フォトリソグラフィ(マスクパターンの最適化検討)2021

    • Author(s)
      大住知暉、安田雅昭、笹子勝、平井義彦、
    • Organizer
      68回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-20K05289
  • [Presentation] Automatic Design of the Built-in Lens Mask for ThreeDimensional Photo Lithography2021

    • Author(s)
      T. Osumi, M. Sasago, M. Yasuda, Y. Hirai
    • Organizer
      Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K05289
  • [Presentation] Optimization of the Built-in Lens Mask for Three-Dimensional Photo Lithography2021

    • Author(s)
      T. Osumi, M. Sasago, M. Yasuda, Y. Hirai
    • Organizer
      The 64th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 2021),
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K05289
  • [Presentation] ビルトインレンズマスクによる三次元フォトリソグラフィ2021

    • Author(s)
      大住 知暉, 安田 雅昭,笹子 勝, 平井 義彦
    • Organizer
      応用物理学会
    • Data Source
      KAKENHI-PROJECT-20K05289
  • 1.  平井 義彦 (50285300)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 9 results

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