OHTA Masato 大田正人

Researcher Number	50052874
External Links
Affiliation (based on the past Project Information) *help	2006: 芝浦工業大学, 工学部応用化学科, 助教授 2006: SHIBAURA INSTITUTE OF TECHNOLOGY, PROFESSOR, 工学部応用化学科, 教授 1998 – 2005: 芝浦工業大学, 工学部, 助教授
Review Section/Research Field	Except Principal Investigator Production engineering/Processing studies / 機械工作・生産工学
Keywords	Except Principal Investigator CMP / Si / シリカ / スラリー / ガラス / 研磨 / pH / Siウエハー / 研磨剤 / SOLID CONTACT … More / SLURRY / GLASS / PHYSICAL ACTION / CHEMICAL ACTION / POLISHING PAD / ポリウレタン / 微小変形 / 表面トポグラフィ / 実接触面積 / 物理的作用 / 化学的作用 / 研磨パット / Slurry / Colloidal Silica / Sol-gel / Copper / Glass / Polishing / ウエハー / メタル / CPM / 研磨抵抗 / 作用点 / Prestonの定理 / パッド / 砥粒間隔 / 粒径 / スラリー濃度 / CNP / コロイダルシリカ / ゾル-ゲル法 / 銅 / SILICA / LAPPING SLURRY / LAPPING MACHINE / ROUNDNESS / CENTRIFUGAL FORCE / GLASS BALL / SMALL BALL / POLISHING / カップ研磨方式 / シリカ粒子 / 真球度 / 球研磨 / ゾルゲル法 / 研磨スラリー / 研磨加工 / ラップ盤 / 真円度 / 遠心力 / ガラス球 / 微小ボール / silica / pad / Si water / slurry / sol-gel method / planerization / 研磨布 / ゾル・ゲル法 / プラナリゼーション Less

A STUDY ON CONTACT MECHANISM AND CMP ACTION OF POLISHING PAD
- Principal Investigator
  
  SHIBATA Junji
- Project Period (FY)
  2005 – 2006
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  SHIBAURA INSTITUTE OF TECHNOLOGY
A BASIC STUDY ON METAL CMP MECHANISM AND A TRIAL FOR PRODUCING CMP SLURRY BY SOL-GEL METHOD
- Principal Investigator
  
  SHIBATA Junji
- Project Period (FY)
  2003 – 2004
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  SHIBAURA INSTITUTE OF TECHNOLOGY
PRECISION FINISHING OF MONO-CRYSTAL SILICON BALLS FOR SPHERICAL SEMI-CONDUCTORS
- Principal Investigator
  
  SHIBATA Junji
- Project Period (FY)
  2001 – 2002
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  機械工作・生産工学
- Research Institution
  SHIBAURA INSTITUTE OF TECHNOLOGY
A basic study on CMP mechanism and production of CMP slurry
- Principal Investigator
  
  SHIBATA Junii
- Project Period (FY)
  1998 – 2000
- Research Category
  
  Grant-in-Aid for Scientific Research (B).
- Research Field
  
  機械工作・生産工学
- Research Institution
  SHIBAURA INSTITUTE OF TECHNOLOGY

All 2004

All Journal Article

[Journal Article] A Basic Study on CMP Mechanism and a Trial to produce CMP Slurry by Sol-gel Method2004
- Author(s)
  J.SHIBATA, M.OHTA, A.Oda
- Journal Title
  
  Advances in Abrasive Technology -7^<th> International Symposium in Abrasives
  
  Pages: 389-392
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560101
[Journal Article] ポリシングにおける研磨作用点に関する考察2004
- Author(s)
  李鋼成, 柴田順二, 大田正人
- Journal Title
  
  2004年度砥粒加工学会学術講演会講演論文集 2004年度
  
  Pages: 57-58
- Data Source
  KAKENHI-PROJECT-15560101
[Journal Article] A Basic Study on CMP Mechanism and a Trial to produce CMP Slurry by Sol-gel Method2004
- Author(s)
  J.SHIBATA, M.OHTA, A.Oda
- Journal Title
  
  Advances in Abrasive Technology-7^<th> International Symposium in Abrasive
  
  Pages: 389-392
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560101

1. SHIBATA Junii (30052822)

# of Collaborated Projects: 4 results

# of Collaborated Products: 3 results
2. UEKI Tadahiro (50052890)

# of Collaborated Projects: 3 results

# of Collaborated Products: 0 results
3. KIMURA Takayasu (90052711)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results

OHTA Masato 大田 正人

Research Projects

Research Products

Co-Researchers

A STUDY ON CONTACT MECHANISM AND CMP ACTION OF POLISHING PAD

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

A BASIC STUDY ON METAL CMP MECHANISM AND A TRIAL FOR PRODUCING CMP SLURRY BY SOL-GEL METHOD

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

PRECISION FINISHING OF MONO-CRYSTAL SILICON BALLS FOR SPHERICAL SEMI-CONDUCTORS

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

A basic study on CMP mechanism and production of CMP slurry

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

[Journal Article] A Basic Study on CMP Mechanism and a Trial to produce CMP Slurry by Sol-gel Method2004

Author(s)

Journal Title

Description

Data Source

[Journal Article] ポリシングにおける研磨作用点に関する考察2004

Author(s)

Journal Title

Data Source

[Journal Article] A Basic Study on CMP Mechanism and a Trial to produce CMP Slurry by Sol-gel Method2004

Author(s)

Journal Title

Description

Data Source

OHTA Masato 大田正人