KINOSHITA Hiroo 木下博雄

Researcher Number	50285334
External Links
Affiliation (based on the past Project Information) *help	2015 – 2017: 兵庫県立大学, 産学連携・研究推進機構, 特任教授 2015: 兵庫県立大学, 高度産業科学技術研究所, 特任教授 2014: 兵庫県立大学, 産学連携機構, 特任教授 2010 – 2013: 兵庫県立大学, 高度産業科学技術研究所, 教授 2004 – 2005: 兵庫県立大学, 高度産業科学技術研究所, 教授 1998 – 2003: 姫路工業大学, 高度産業科学技術研究所, 教授 2001: 姫路工業大学, 高度産業化学技術研究所, 教授
Review Section/Research Field	Principal Investigator Quantum beam science / Applied optics/Quantum optical engineering Except Principal Investigator Applied optics/Quantum optical engineering / Electron device/Electronic equipment / Structural/Functional materials
Keywords	Principal Investigator 多層膜 / 軟X線光学定数 / 偏光 / 軟X線 / 軟Ｘ線 / PMMA / フォトダイオード / 反射率 / フィルター / 極端紫外線 … More / フォトレジスト / 吸収係数 / 透過率 / 光学定数 / Multilayer coating / Mirau Interferometer / Phase defect / Defect Inspection / EUV Lithography / Extreme Ultraviolet / X-ray microscope / ミラウ干渉計 / EUVリソグラフィー / 軟X線位相差顕微鏡 / ミラウ干渉 / 位相欠陥 / 欠陥検査 / EUVリソグラフィ / X線顕微鏡 … More Except Principal Investigator EUVL / EUVリソグラフィ / 感度 / 半導体微細加工 / レジスト / 極端紫外線リソグラフィ / Wavefront error / Point Diffraction Interferometer / Lithography / Multilayer / Thin Film / Aspherical / Optical Element / Soft X-Rays / 表面粗さ / 内部応力 / X線 / 波面収差 / 点回折干渉法 / リソグラフィ / 多層膜 / 薄膜 / 非球面 / 光学素子 / 軟X線 / Spot diagram / Aberration analysis / Ray tracing / Telecentric optical system / Schwarzschild optics / Double-element optical system / Microfocus / シャバルツシルト光学系 / スポットダイアグラム / 収差解析 / 光線追跡 / テレセントリック光学系 / シュバルツシルト光学系 / 2素子光学系 / マイクロフォーカス / 軟Ｘ線吸収分光 / 高感度 / 金属レジスト / 化学増幅系レジスト / 非化学増幅系レジスト / 軟X線光電子分光 / アウトガス / LWR / 解像度 / EUVレジスト / 干渉霞光 / レジス / 微細加工技術 / 半導体 / line edge roughness / 化学増幅系 / 干渉露光 / 微細プロセス技術 / 拡散型 / 放射光 / ジルコニアセラミックス / 集合組織 / 変態 / イットリア / ジルコニア / バイオ / 中性子線回折 / アルミナ / インプラント材 / 相変態 / シンクロトロン放射光 / 部分安定化ジルコニア Less

Precise measurement of optical constants of thin films in soft X-ray regionPrincipal Investigator
- Principal Investigator
  
  Kinoshita Hiroo
- Project Period (FY)
  2015 – 2017
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Quantum beam science
- Research Institution
  University of Hyogo
Development of 1X nm EUV Resist with high sensitivity and Low LWR
- Principal Investigator
  
  Watanabe Takeo
- Project Period (FY)
  2013 – 2015
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Electron device/Electronic equipment
- Research Institution
  University of Hyogo
Resist pattern replication using EUV interference lithography for 20 nm and below
- Principal Investigator
  
  WATANABE Takeo
- Project Period (FY)
  2010 – 2012
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Electron device/Electronic equipment
- Research Institution
  University of Hyogo
Observation of surface nano- structure using EUV phase shift microscopePrincipal Investigator
- Principal Investigator
  
  KINOSHITA Hiroo
- Project Period (FY)
  2003 – 2005
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Applied optics/Quantum optical engineering
- Research Institution
  Laboratory of Advanced Science and Technology for Industry, University of Hyougo
  Himeji Institute of Technology
放射光によるジルコニアバイオセラミックスの擬似体液中でのその場相変態観察
- Principal Investigator
  
  椿野晴繁
- Project Period (FY)
  2002 – 2004
- Research Category
  
  Grant-in-Aid for Exploratory Research
- Research Field
  
  Structural/Functional materials
- Research Institution
  University of Hyogo
  Himeji Institute of Technology
Fabrication of aspherical surfaces for soft X-Ray optical elements by means of Deposition techniques
- Principal Investigator
  
  NIIBE Masahito
- Project Period (FY)
  1999 – 2001
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Applied optics/Quantum optical engineering
- Research Institution
  Himeji Institute of Technology
Development of Methods for the design of Microfocus Optical Systems
- Principal Investigator
  
  NAMIOKA Takeshi
- Project Period (FY)
  1998 – 1999
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Applied optics/Quantum optical engineering
- Research Institution
  TOHOKU UNIVERSITY

All 2016 2015 2014 2013 2012 2011 2010 2008 2006 2005 2004 2003 Other

All Journal Article Presentation Patent

[Journal Article] Actual defect observation results of an extreme ultraviolet blank mask by coherent diffraction imaging2016
- Author(s)
  Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita
- Journal Title
  
  Appl. Phys. Express
  
  Volume: 9 Pages: 35202-35202
- NAID
  210000137831
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-15H03592
[Journal Article] Phase Imaging Results of Phase Defect Using Micro Coherent EUV Scatterometry Microscope2016
- Author(s)
  Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita
- Journal Title
  
  J. Micro-Nanolith. Mem
  
  Volume: 15 Pages: 21007-21007
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-15H03592
[Journal Article] Development of a reflectometer for a large EUV mirror in NewSUBARU2015
- Author(s)
  Haruki Iguchi, Hiraku Hashimoto, Masaki Kuki, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  Proc. SPIE
  
  Volume: 9658 Pages: 965819-965819
- Open Access
- Data Source
  KAKENHI-PROJECT-15H03592
[Journal Article] Development of Transmission Grating for EUV Interference Lithography of 1X nm HP2015
- Author(s)
  Tsubasa Fukui, Hirohito Tanino, Yuki Fukuda, Takeo Watanabe, Hiroo Kinoshita and Tetsuo Harada
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 28 Pages: 525-529
- NAID
  130005101110
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Phase Imaging Results of Phase Defect Using Micro Coherent EUV Scatterometry Microscope2015
- Author(s)
  Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita
- Journal Title
  
  Proc. SPIE
  
  Volume: 9635
- Open Access
- Data Source
  KAKENHI-PROJECT-15H03592
[Journal Article] Development of High=Reflective W/Si-multilayer Diffraction Grating for the Analysis of Fluorine Materials2015
- Author(s)
  Makaski Kuki, Tomoyuki Uemura, Masato Yamaguchi, Testuo Harada, Takeo Watanabe, Yasuji Muramatsu and Hiroo Kinoshita
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 28 Pages: 530-536
- NAID
  130005101111
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Development of element technologies for EUVL2015
- Author(s)
  Hiroo Kinoshita, Takeo Watanabe and Tetsuo Harada
- Journal Title
  
  Adv. Opt. Techn
  
  Volume: 4(4) Pages: 319-331
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-15H03592
[Journal Article] (169)EUV Resist Chemical Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity　Achievement2014
- Author(s)
  Kazuya Emura, Takeo Watanabe, Masato Yamaguchi, Hirohito Tanino,Tsubasa Fukui, Daiju Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 27 Pages: 631-638
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Study of Acid Diffusion Behaviors of PAG by Using Top Coat Method for EUVL2014
- Author(s)
  Atsushi Sekiguchi, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 27 Pages: 623-629
- NAID
  130004691094
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] EUV Resist Chemical Reaction Analysis using SR2013
- Author(s)
  Takeo Watanabe, Kazuya Emura, Daiji Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada and Hiroo Kinoshita
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 26 Pages: 635-642
- NAID
  130004465045
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Comparison of Resist Family Outgassing Characterization between EUV and EB2013
- Author(s)
  Isamu Takagi, Toshiya Takahashi, Norihiko Sugie, Kazuhiro Katayam, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichiro Inoue, Takeo Watanabe, Tetsuo Harada and Hiroo Kinoshita
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 26 Pages: 673-678
- NAID
  130004465050
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Development of Tool for Contamination Layer Thickness Measurement Using High Power Extreme Ultraviolet Light and in Situ Ellipsometer2013
- Author(s)
  Takeo Watanabe, Yukiko Kikuchi, Toshiya Takahashi, Kazuhiro Katayama, Isamu Takagi, Norihiko Sugie, Hiroyuki Tanaka, Eishi Shiobara, Soichi Inoue, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 52 Issue: 5R Pages: 056701-056701
- DOI
  10.7567/jjap.52.056701
- NAID
  210000142182
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Comparison of Resist Outgassing Characterization between High Power EUV and EB2012
- Author(s)
  Norihiko Sugie, Toshiya Takahashi, Kazuhiro Katayama, Isamu Takagi, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 25 Pages: 617-624
- NAID
  130004833488
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Extreme Ultraviolet (EUV)-Resist Material Based on Noria (Water Wheel-like Macrocycle) Derivatives with Pendant Alkoxyl and Adamantyl Ester Groups2012
- Author(s)
  Hiroto Kudo, Nobumitsu Niina, Tomoharu Sato, Hiroaki Oizumi, Toshiro Itani, Takuro Miura, Takeo Watanabe and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 25 Pages: 587-592
- NAID
  130004833483
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] EUV リソグラフィ研究開発センターにおけるリソグラフィ開発2012
- Author(s)
  渡邊健夫、原田哲男、木下博雄
- Journal Title
  
  クリーンテクノロジー
  
  Volume: 22 Pages: 1-5
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Chemical Reaction Analysis of EUV CA Resist using SR Absorption Spectroscopy2012
- Author(s)
  Takeo Watanabe, Yuichi Haruyama, Daiju Shiono, Kazuya Emura, Takuro Urayama, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 25 Pages: 569-574
- NAID
  130004833480
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] EUV Interference Lithography for 1X nm2011
- Author(s)
  Takuro Urayama, Takeo Watanabe, Yuya Yamaguchi, Naohiro Matsuda, Yasuyuki Fukushima, Takafumi Iguchi, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 23 Pages: 681-686
- NAID
  130004833387
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Development of interference lithography for 22 nm node and below2011
- Author(s)
  Yasuyuki Fukushima, Yuya Yamaguchi, Takafumi Iguchi, Takuro Urayama, Tetsuo Harada, Takeo Watanabe and Hiroo Kinoshita
- Journal Title
  
  Microelectric Engineering
  
  Volume: 88 Pages: 1944-1947
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] elationships between EUV resist outgassing and contamination deposition at Selete2011
- Author(s)
  Hiroaki Oizumi, Kazuyuki Matsumaro, Satoshi Nomura, Julius Joseph Santillan, Toshiro Itani, Takeo Watanabe, Naohiro Matsuda, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  Proc. SPIE
  
  Volume: 7969
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Transmission Grating Fabrication for Replicating Resist Patterns of 20 nm and Below2011
- Author(s)
  Yuya Yamaguchi, Yasuyuki Fukushima, Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 50
- NAID
  210000070661
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] In-situ Contamination Thickness Measurement by Novel Resist Evaluation System at NewSUBARU2011
- Author(s)
  Naohiro Matsuda, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita, Hiroaki Oizumi, and Toshiro Itani
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 50
- NAID
  210000070653
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] EUVレジスト材料開発の現状と将来展望について、先端リソグラフィの展望2010
- Author(s)
  渡邊健夫、木下博雄
- Journal Title
  
  第19回光反応・電子用材料研究会講座講演予稿集、高分子学会
  
  Pages: 14-17
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Fundamental Decomposition Analysis of Chemically Amplified Molecular Resist for below 22 nm Resolution2010
- Author(s)
  aiju Shiono, Hideo Hada, Kazufumi Sato, Yasuyuki Fukushima, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 23 Pages: 649-656
- NAID
  130004464848
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] EUV interference lithography for 22 nm node and below2010
- Author(s)
  Yasuyuki Fukushima, Yuya Yamaguchi, Teruhiko Kimura, Takafumi Iguchi, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 23 Pages: 673-680
- NAID
  130004464851
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Decomposition and Roughness Analysis of Chemically Amplified Molecular Resist for Reducing LWR2010
- Author(s)
  Daiju Shiono, Hideo Hada, Kazufumi Sato, Yasuyuki Fukushima, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 49
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Fabrication process of EUV -IL transmission grating2010
- Author(s)
  Yuya Yamaguchi, Yakusyuki Fukushima, Takafumi Iguchi, Hiroo Kinoshita, Tetsuo Harada, and Takeo Watanabe
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 23 Pages: 681-386
- NAID
  130004464852
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Development of Extreme Ulytaviolet Interference Lithography System2010
- Author(s)
  Y. Fukushima, Naqoki. Sakagami, Teruhiko Kimura, Yoshito Kamaji, Takafumi Iguchi, Y. Yamaguchi, Masaki Tada, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 49
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Optimization of photo-acid generation in CA resist for EUVL2008
- Author(s)
  T.Watanebe, H.Hada, H.Kinoshita, H.Komano
- Journal Title
  
  SPIE
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Phase defect observation using an EUV microscope2008
- Author(s)
  K.Hamamoto, Y.Tanaka, N.Sakaya, T.shoki, T.Watanabe, H.Kinoshita
- Journal Title
  
  SPIE
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Reducing off Hyderocarbon Contaminations for EUVL2005
- Author(s)
  Y.Tanaka, K.Hamamoto, T.watanabe, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys 44, 7B
  
  Pages: 5547-5551
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Actinic Mask Inspection Using an EUV Microscope -Preparation of a Mirau Interferometer for Phase-defect Detection-2005
- Author(s)
  K.Hamamoto, Y.Tanaka, H.Kawashima, S.Y.Lee, N.Hosokawa, N.Sakaya, M.Hosoya, T.Shoki, T.Watanabe, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys. 44
  
  Pages: 5474-5478
- NAID
  10016677217
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Outgassing Characteristics of Low-Molecular-Weight Resist for EUVL2005
- Author(s)
  H.Hada, T.Hirayama, D.Shino, T.Watanabe, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys 44, 7B
  
  Pages: 5824-5828
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Novel Resist Evaluation System for EUV Resist2005
- Author(s)
  T.Watanabe, H.Kinoshita, N.Sakaya, T.Shoki, S.Y.Lee
- Journal Title
  
  Jpn.J.Appl.Phys. 44
  
  Pages: 5556-5559
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Reducing off Hydrocarbon Contaminants for EUVL2005
- Author(s)
  Y.Tanaka, K.Hamamoto, H.Tsubakino, T.Watanabe, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys. 44
  
  Pages: 5547-5551
- NAID
  10016677385
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Development of Beam Splitter Using Multilayer Membrane for Extreme Ultraviolet Phase-Shift Microscopes2005
- Author(s)
  N.Hosokawa, T.Watanabe, N.Sakaya, T.Shoki, K.Hamamoto, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys. 44
  
  Pages: 5540-5543
- NAID
  10016677365
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Cleaning of extreme ultraviolet lithography optics and masks using 13.5 nm and 172 nm radiation2005
- Author(s)
  K.Hamamoto, Y.Tanaka, T.Watanabe, N.Sakaya, M.Hosoya, T.Shoki, H.Hada, N.Hishinuma, H.Sugahara, H.Kinoshita
- Journal Title
  
  J.Vac.Sci.Technol. B23
  
  Pages: 247-251
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] History of Extreme Ultraviolet Lithography2005
- Author(s)
  H.Kinoshita
- Journal Title
  
  J.Vac.Sci.Technol. 23,6B
  
  Pages: 2584-2588
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] 光ファイバーを用いた点回折干渉計に関する研究(第2報) コヒーレント長が測定精度に及ぼす影響2005
- Author(s)
  格内敏, 木下博雄, 渡邊健夫, 坂本亨
- Journal Title
  
  精密工学会誌第71巻第8号
  
  Pages: 1031-1035
- NAID
  10016679113
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Mask Defect Inspection using EUV Microscope2005
- Author(s)
  K.Hamamoto, Y.Tanaka, S.Y.Lee, N.Hosokawa, N.Sakaya, M.Hosoya, T.Shoki, T.Watanabe, H.Kinoshita
- Journal Title
  
  J.Vac.Sci.Technol. 23,6B
  
  Pages: 2852-2855
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Development of Beam Splitter Using Multilayer Membrane For Extreme Ultraviolet Ohase-shift Microscopes2005
- Author(s)
  N.Hosokawa, K.Hamamoto, Y.Tanaka, T.Watanabe, N.Sakaya, M.Hosoya, T.Shoki, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys 44, 7B
  
  Pages: 5540-5543
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] History of Extreme Ultraviolet Lithography2005
- Author(s)
  H.Kinoshita
- Journal Title
  
  J.Vac.Sci.Technol 23-6
  
  Pages: 2584-2588
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Novel resist evaluation system for EUV resist2005
- Author(s)
  T.Watanabe, H.Kinoshita, N.Sakaya, T.Shoki, S.Y.Lee
- Journal Title
  
  Jpn.J.Appl.Phys 44, 7B
  
  Pages: 5556-5559
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Actinic Mask Inspection Using an EUV Microscope2005
- Author(s)
  K.Hamamoto, Y.Tanaka, T.Watanabe, N.Sakaya, M.Hosoya, T.Shoki, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys 44, 7B
  
  Pages: 5474-5478
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] マグネシウムおよびマグネシウム合金のガス放出特性2005
- Author(s)
  田中弓弦, 木下博雄, 渡邊健夫, 劉莉, 椿野晴繁
- Journal Title
  
  軽金属 55-9
  
  Pages: 412-413
- NAID
  130004481784
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] 巻頭言加工と計測:ナノからピコの時代を迎えて2005
- Author(s)
  木下博雄
- Journal Title
  
  光学 34-3
  
  Pages: 123-123
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] 光ファイバーを用いた点回折干渉計に関する研究2005
- Author(s)
  格内敏, 木下博雄, 渡邊健夫, 坂本亨
- Journal Title
  
  精密工学会誌 71-8
  
  Pages: 1031-1035
- NAID
  110001373589
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] マグネシウムおよびマグネシウム合金のガス放出特性2005
- Author(s)
  田中弓弦, 木下博雄, 渡邊健夫, 劉莉, 椿野晴繁
- Journal Title
  
  軽金属 55,9
  
  Pages: 412-413
- NAID
  130004481784
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Cleaning of extreme ultraviolet lithography optics and masks using 13.5 nm and 172 nm radiation2005
- Author(s)
  K.Hamamoto, Y.Tanaka, T.Watanabe, N.Sakaya, M.Hosoya, T.Shoki, H.Hada, N.Hishinuma, H.Sugahara, H.Kinoshita
- Journal Title
  
  J.Vac.Sci.Technol. B23-1
  
  Pages: 247-251
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Development of fast photospeed chemically amplified resist in EUVL2005
- Author(s)
  T.Watanabe, H.Kinoshita, N.Sakaya, T.Shoki, S.Y.Lee
- Journal Title
  
  Jpn.J.Appl.Phys 44, 7B
  
  Pages: 5866-5870
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] 放射光を用いた極限リソグラフィの現状2005
- Author(s)
  木下博雄
- Journal Title
  
  光アライアンス 16-12
  
  Pages: 14-14
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Mask Defect Inspection using EUV Microscope2005
- Author(s)
  K.Hamamoto, Y.Tanaka, S.Y.Lee, T.Watanabe, H.Kinoshita
- Journal Title
  
  J.Vac.Sci.Technol 23-6
  
  Pages: 2852-2855
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Reducing off Hyderocarbon Contaminations for EUVL2005
- Author(s)
  Y.Tanaka, K.Hamamoto, T.Watanabe, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys 44, 7B
  
  Pages: 5547-5551
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Hitory of Extreme Ultraviolet Lithography2005
- Author(s)
  H.Kinoshita
- Journal Title
  
  J.Vac.Sci.Technol 23-6
  
  Pages: 2584-2588
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography,2005
- Author(s)
  H.Hideo, T.Hirayama, D.Shiono, J.Onodera, T.Watanabe, S.Y.Lee, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys. 44
  
  Pages: 5824-5828
- NAID
  10016678315
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Development of Fast Photospeed Chemically Amplified Resist in EUV Lithography,2005
- Author(s)
  T.Watanabe, H.Hada, S.Y.Lee, H.Kinoshita, K.Hamamoto, H.Komano
- Journal Title
  
  Jpn.J.Appl.Phys. 44
  
  Pages: 5866-5870
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Actinic mask metrology for extreme ultraviolet lithography2004
- Author(s)
  H.Kinoshita, T.Haga, K.Hamamoto, S.Takada, N.Kazui, S.Kakunai, H.Tsubakino, T.Shoki, M.Endo, T.Watanabe
- Journal Title
  
  J.Vac.Sci.Technol. B22(1)
  
  Pages: 264-267
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Mitigation of Low Outgassing and Small Line Edge roughness for EUVL Resist2004
- Author(s)
  T.Watanabe, H.Kinoshita, K.Hamamoto, H.Hada, H.Komano
- Journal Title
  
  J.Photopolym.Sci.Technol. 17,3
  
  Pages: 361-366
- NAID
  40006276558
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Mitigation of Low Outgassing and Small Line Edge Roughness for EUVL Resist2004
- Author(s)
  T.Watanabe, H.Kinoshita, K.Hamamoto, H.Hada, H.Komano
- Journal Title
  
  J.Photopolym.Sci.Technol. 17
  
  Pages: 361-366
- NAID
  40006276558
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Mitigation of Low Outgassing and Small Line Edge Roughness for EUVL Resist2004
- Author(s)
  T.Watanabe, H.Kinoshita, K.Hamamoto, H.Hada, H.Komano
- Journal Title
  
  J.Photopolym.Sci.Technol. 17,3
  
  Pages: 361-366
- NAID
  40006276558
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Resist Outgassing Characteristics in EUVL2004
- Author(s)
  F.Watanabe, K.Hamamoto, H.Kinoshita, H.hada, H.Komano
- Journal Title
  
  Jpn.J.Appl.Phys 43
  
  Pages: 3713-3717
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Outgassing Characteristics of Structural Materials and the Removal of Contaminants from EUVL Masks using 172-nm Radiation2004
- Author(s)
  K.Hamamoto, Y.Tanaka, T.Watanabe, N.Sakaya, M.Hosoya, T.Shoki, H.Sugahara, N.Hishinuma, H.Hada, H.Kinoshita
- Journal Title
  
  J.Photopolym.Sci.Technol. 17
  
  Pages: 367-372
- NAID
  130004464356
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Resist Outgassing Charateristics in EUVL2004
- Author(s)
  T.Watanabe, K.Hamamoto, H.Kinoshita, H.hada, H.Komano
- Journal Title
  
  Jpn.J.Appl.Phys 43
  
  Pages: 3713-3717
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Resist Outgassing Characteristics in Extreme Ultraviolet Lithography,2004
- Author(s)
  T.Watanabe, K.Hamamoto, H.Kinoshita, H.Hada, H.Komano
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 3713-3717
- NAID
  10013275620
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Actinic Mask Inspection Using EUV Microscope2004
- Author(s)
  H.Kinoshita, T.Haga, K.Hamamoto, S.Takada, N.Kazui, S.Kakunai, H.Tsubakino, T.Shoki, M.Endo, T.Watanabe
- Journal Title
  
  J.Vac.Sci.Technol. B22
  
  Pages: 264-267
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Outgassing Characteristics of Structural Materials and the Removal of Contaminants from EUVL Masks using 172-nm Radiation2004
- Author(s)
  K.Hamamoto, Y.Tanaka, T.Watanabe, N.Sakaya, M.Hosoya, T.Shoki, H.Sugahara, N.Hishinuma, H.Hada, H.Kinoshita
- Journal Title
  
  J.Photopolym.Sci.Technol. 17,3
  
  Pages: 367-372
- NAID
  130004464356
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] 光ファイバーを用いた点回折干渉計に関する研究2003
- Author(s)
  格内敏, 木下博雄, 渡邊健夫, 坂本亨
- Journal Title
  
  精密工学会誌第69巻第8号
  
  Pages: 1170-1175
- NAID
  110001373589
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] 光ファイバーを用いた点回折干渉計に関する研究2003
- Author(s)
  格内敏, 木下博雄, 渡邊健夫, 坂本亨
- Journal Title
  
  精密工学会誌 69,8
  
  Pages: 1170-1175
- NAID
  110001373589
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Investigation of Contamination Removal from Finished EUVL Mask2003
- Author(s)
  K.Hamamoto, S.Takada, T.Watanabe, N.Sakaya, T.Shoki, M.Hosoya, H.Kinoshita
- Journal Title
  
  J.Photopolym.Sci.Technol. 16,3
  
  Pages: 395-400
- NAID
  130004464266
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Pattern Inspection of EUV Mask using a EUV Microscope2003
- Author(s)
  T.Watanabe, T.Haga, T.Shoki, K.Hamamoto, S.Takada, N.Kazui, S.Kakunai, H.Tsubakino, H.Kinoshita
- Journal Title
  
  Proc.SPIE 5130
  
  Pages: 1005-1013
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Pattern Inspection of EUV Mask Using a EUV Microscope2003
- Author(s)
  T.Watanabe, T.Haga, T.Shoki, K.Hamamoto, S.Takada, N.Kazui, S.Kakunai, H.Tsubakino, H.Kinoshita
- Journal Title
  
  Proc.SPIE 5130
  
  Pages: 1005-1013
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Evaluation of Finished EUVL Mask using a Mirau Intergerometric Microscope2003
- Author(s)
  T.Haga, H.Kinoshita, K.Hamamoto, S.Takada, N.Kazui, S.Kakunai, H.Tsubakino, T.Watanabe
- Journal Title
  
  Jpn.J.Appl.Phys. 42
  
  Pages: 3771-3775
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Evaluation of Finished EUVL Mask using a Mirau Intergerometric Microscope2003
- Author(s)
  T.Haga, H.Kinoshita, K.Hamamoto, S.Takada, N.Kazui, S.Kakunai, H.Tsubakino, T.Watanabe
- Journal Title
  
  Jpn.J.Appl.Phys 42、6
  
  Pages: 3771-3775
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] ナノ平滑性とエッチング耐性を有するフォトレジストポリマー2006
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2006-066513
- Filing Date
  2006
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 光学素子及び光学素子製造方法2005
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2005-360553
- Filing Date
  2005
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 極端紫外線顕微鏡及び検査方法2005
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2005-246736
- Filing Date
  2005
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] カリックスレゾルシナレン化合物並びにそれからなるEUV及び電子線レジスト2005
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Filing Date
  2005
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 極端紫外線顕微鏡及び検査方法2005
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2005-246736
- Filing Date
  2005
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] ナノ平滑性とエッチング耐性を有するフォトレジストポリマー2005
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2005-234801
- Filing Date
  2005
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 電子線又はEUV用レジスト組成物2004
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2004-044737
- Filing Date
  2004
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 電子線又はEUV用レジスト組成物及びレジストパタン形成方法2004
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2004-262488
- Filing Date
  2004
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 電子線又はEUV用レジスト組成物2004
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2004-044737
- Filing Date
  2004
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 電子線又はEUV用レジスト組成物2004
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2004-100206
- Filing Date
  2004
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 電子線又はEUV用レジスト組成物2003
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2003-371111
- Filing Date
  2003-10-30
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 電子線又はEUV用レジスト組成物2003
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2003-362223
- Filing Date
  2003-10-22
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Presentation] 30 years have passed from the first experiment2015
- Author(s)
  Hiroo Kinoshita
- Organizer
  EUVL Symposium
- Place of Presentation
  Maastricht Netherlland
- Year and Date
  2015-10-06
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] Early Stage of EUVL Development2015
- Author(s)
  HirooKinoshita
- Organizer
  Next Generation Lithography 応用物理学会分科会
- Place of Presentation
  東京工業大学
- Year and Date
  2015-07-07
- Invited
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] Development of Transmission Grating for EUV Interference Lithography of 1X nm HP2015
- Author(s)
  Tsubasa Fukui, Hirohito Tanino, Yuki Fukuda, Takeo Watanabe, Hiroo Kinoshita and Tetsuo Harada
- Organizer
  The 32nd International Conference of Photopolymer Science and Technology
- Place of Presentation
  幕張メッセ（千葉県千葉市美浜区）
- Year and Date
  2015-06-24
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 1X nm HPレジスト評価用EUV二光束干渉露光系の透過型回折格子の製作2015
- Author(s)
  福田裕貴、福井　翼、谷野寛仁、九鬼真輝、渡邊健夫、木下博雄、原田哲男
- Organizer
  NGLワークショップ2015
- Place of Presentation
  東京工業大学蔵前館（東京都目黒区）
- Year and Date
  2015-07-06
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] コヒーレントスキャトロメトリー顕微鏡を用いたマスク検査装置の開発2015
- Author(s)
  木下博雄
- Organizer
  レーザー学会第483回研究会
- Place of Presentation
  広島大学
- Year and Date
  2015-12-02
- Invited
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] 極端紫外線リソグラフィー研究30年2015
- Author(s)
  木下博雄
- Organizer
  半導体親和会
- Place of Presentation
  NTT 武蔵野研究所
- Year and Date
  2015-06-05
- Invited
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] 30 years of R&D of EUVL and its mask inspection technologies2015
- Author(s)
  Hiroo Kinoshita
- Organizer
  Photo mask Japan 2015
- Place of Presentation
  Pacifico Yokohama Japan
- Year and Date
  2015-04-22
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] Development of High=Reflective W/Si-multilayer Diffraction Grating for the Analysis of Fluorine Materials2015
- Author(s)
  Makaski Kuki, Tomoyuki Uemura, Masato Yamaguchi, Testuo Harada, Takeo Watanabe, Yasuji Muramatsu and Hiroo Kinoshita
- Organizer
  The 32nd International Conference of Photopolymer Science and Technology
- Place of Presentation
  幕張メッセ（千葉県千葉市美浜区）
- Year and Date
  2015-06-24
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Contribution of EUV resist components to the noncleanable contaminations2014
- Author(s)
  Eishi Shiobara, Toshiya Takahashi, Norihiko Sugie, Yukiko Kikuchi, Isamu Takagi, Kazuhiro Katayama, Hiroyuki Tanaka, Soichi Inoue, Tetsuro Harada, Takeo Watanabe, and Hiroo Kinoshita
- Organizer
  SPIE Advanced Lithography 2014
- Place of Presentation
  San Jose, California, USA
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Chemical Reaction Analysis by SR Absorption Spectroscopy to Increase the Acid Generation Efficiency of EUV CA Resist2013
- Author(s)
  Takeo Watanabe, Kazuya Emura, Daiju Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  2013 Internationa Symposium on Extreme Ultraviolet Lithography
- Place of Presentation
  富山国際会議場（富山県富山市））
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Recent Activities of the Actinic Mask Inspection using the EUV Microscope at Center for EUVL2013
- Author(s)
  Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  2013 International Workshop on EUV Lithography
- Place of Presentation
  Maui, Hawaii, USA
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Resist outgassing characterization of PAG-blended and PAG-bound systems2013
- Author(s)
  Kazuhiro Katayama, Toshiya Takahashi, Norihiko Sugie, Isamu Takagi, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita
- Organizer
  2013 Internationa Symposium on Extreme Ultraviolet Lithography
- Place of Presentation
  富山国際会議場（富山県富山市）
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] EUV Resist Chemical Reaction Analysis using SR2013
- Author(s)
  Takeo Watanabe, Kazuya Emura, Daiji Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada and Hiroo Kinoshita
- Organizer
  The 30th International Conference of Photopolymer Science and Technology
- Place of Presentation
  千葉大学西千葉キャンパス（千葉県千葉市稲毛区）
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Comparison of Resist Family Outgassing Characterization2013
- Author(s)
  Isamu Takagi, Toshiya Takahashi, Kazuhiro Katayama, Norihiko Sugie, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  The 30th International Conference of Photopolymer Science and Technology
- Place of Presentation
  千葉大学西千葉キャンパス（千葉県千葉市稲毛区）
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Recent Activities of the EUV Resist Research and Development at Center for EUVL2013
- Author(s)
  Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  2013 International Workshop on EUV Lithography
- Place of Presentation
  Maui, Hawaii, USA
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] EUVL 研究開発センターにおけるEUV レジストの開発(基調講演)、アドバンスト・テクノロジー・プログラム(ATP)、新材料開発最前線、微細パターン化技術2012
- Author(s)
  渡邊健夫、原田哲男、木下博雄
- Organizer
  日本化学会第93春季年会(2013)
- Place of Presentation
  立命館大学びわこ・くさつキャンパス
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] Contamination Evaluation Tool by an In-situ Spectroscopic Ellipsometer with an Exposure of High Power EUV (Invited talk)2012
- Author(s)
  Takeo Watanabe, Masaki Tada, Yukiko Kikuchi, Toshiya Takahashi, Kazuhiro Katayama, Norihiko Sugie, Isamu Takagi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  Technical Working Group of EUV Resist Outgassing
- Place of Presentation
  Brussels Convention Center, Brussels, Belgium
- Year and Date
  2012-09-30
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] 極端紫外線リソグラフィ技術開発の現状と今後の展望(招待講演)2012
- Author(s)
  渡邊健夫、原田哲男、木下博雄
- Organizer
  リソグラフィセミナー(I)、セミフォーラムジャパン2012
- Place of Presentation
  グランキューブ大阪(大阪市)
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUV リソグラフィ-研究開発センターにおけるリソグラフィー開発(招待講演)、アドバンスト・テクノロジー・プログラム(ATP)2011
- Author(s)
  渡邊健夫、原田哲男、木下博雄
- Organizer
  次世代リソグラフィ、日本化学会第91 春季年会
- Place of Presentation
  神奈川大学(神奈川)
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUV Interference Lithography for 1X nm2011
- Author(s)
  Takuro Urayama, Takeo Watanabe, Yuya Yamaguchi, Naohiro Matsuda, Yasuyuki Fukushima, Takafumi Iguchi, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  The 28th International Conference ofPhotopolymer Science and Technology
- Place of Presentation
  Chiba Univ., Japan
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] Fabrication process of EUV-IL transmission grating2010
- Author(s)
  Yuya Yamaguchi, Yakusyuki Fukushima, Takafumi Iguchi, Hiroo Kinoshita, Tetsuo Harada, and Takeo Watanabe
- Organizer
  The 27th International Conference of Photopolymer Science and Technology
- Place of Presentation
  Chiba Univ., Japan
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUV interference lithography for 22 nm node and below2010
- Author(s)
  Yasuyuki Fukushima, Yuya Yamaguchi, Teruhiko Kimura, Takafumi Iguchi, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
- Organizer
  The 27th International Conference of Photopolymer Science and Technology
- Place of Presentation
  Chiba Univ., Japan
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] 非化学増幅系EUVレジストの低温現像による解像性能向上
- Author(s)
  山口太都，江村和也，福井翼，谷野寛仁，原田哲男，渡邊健夫，木下博雄，星野亮一
- Organizer
  NGLワークショップ2014
- Place of Presentation
  東京工業大学蔵前ホール　東京都目黒区大岡山２丁目１２－１
- Year and Date
  2014-07-17 – 2014-07-18
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] (136)Study of Acid Diffusion Behaves Form PAG by Using Top Coat Method for EUVL
- Author(s)
  Atsushi Sekiguchi, Takeo Watanabe, and Hiroo Kinoshita
- Organizer
  The 31st International Conference of Photopolymer Science and Technology
- Place of Presentation
  千葉大学けやき会館　千葉県千葉市稲毛区弥生町1－33
- Year and Date
  2014-07-08 – 2014-07-11
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] ニュースバルにおける極端紫外光リソグラフィー研究
- Author(s)
  木下博雄
- Organizer
  ニュースバルシンポジウム
- Place of Presentation
  東京ステーションコンファレンス　サビタワー（東京都）
- Invited
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] 10 nm 級 EUV 干渉露光用透過型回折格子の製作
- Author(s)
  福井　翼，谷野寛仁，福田裕貴，原田哲男，渡邊健夫，木下博雄
- Organizer
  第75回応用物理学会学術講演会
- Place of Presentation
  北海道大学札幌キャンパス　北海道札幌市北区北８条西５丁目
- Year and Date
  2014-09-17 – 2014-09-20
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] EUV Resist Chemical Reaction Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity Achievement
- Author(s)
  Kazuya Emura, Takeo Watanabe, Daiju Shiono, Masato Yamaguchi, Hirohito Tanino, TsubasaFukui, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada,and Hiroo Kinoshita
- Organizer
  The 31st International Conference of Photopolymer Science and Technology
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2014-07-08 – 2014-07-11
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 脱保護反応に起因した膜減量評価による化学増幅系EUV用レジストの反応解析
- Author(s)
  江村和也，渡邊健夫，山口太都，谷野寛仁，福井翼，塩野大寿，春山雄一，村松康司，大森克実，佐藤和史，原田哲男，木下博雄
- Organizer
  NGLワークショップ2014
- Place of Presentation
  東京工業大学蔵前ホール　東京都目黒区大岡山２丁目１２－１
- Year and Date
  2014-07-17 – 2014-07-18
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 極端紫外線リソグラフィー研究開発センターの23年度成果報告
- Author(s)
  木下博雄
- Organizer
  先端技術セミナー
- Place of Presentation
  イーグレ姫路（兵庫県姫路市）
- Invited
- Data Source
  KAKENHI-PROJECT-22360146

1. WATANABE Takeo (70285336)

# of Collaborated Projects: 6 results

# of Collaborated Products: 85 results
2. HARADA Tetsuo (30451636)

# of Collaborated Projects: 3 results

# of Collaborated Products: 43 results
3. NIIBE Masahito (10271199)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
4. MURAMATSU Yasuji (50343918)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
5. NAMIOKA Takeshi (90015743)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
6. YANAGIHARA Mihiro (40174552)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
7. KAKUNAI Satoshi (10101130)

# of Collaborated Projects: 1 results

# of Collaborated Products: 10 results
8. 椿野晴繁 (00109894)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
9. 山本厚之 (70220449)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
10. 福本信次 (60275310)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
11. SHIONO Daiju

# of Collaborated Projects: 1 results

# of Collaborated Products: 3 results
12. MUTO Masao

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
13. TSUNO Katsushige

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
14. KOIKE Masato

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
15. MASUI Shin

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results

KINOSHITA Hiroo 木下 博雄

Research Projects

Research Products

Co-Researchers

Precise measurement of optical constants of thin films in soft X-ray regionPrincipal Investigator

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Development of 1X nm EUV Resist with high sensitivity and Low LWR

Principal Investigator

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Resist pattern replication using EUV interference lithography for 20 nm and below

Principal Investigator

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Observation of surface nano- structure using EUV phase shift microscopePrincipal Investigator

Principal Investigator

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放射光によるジルコニアバイオセラミックスの擬似体液中でのその場相変態観察

Principal Investigator

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Fabrication of aspherical surfaces for soft X-Ray optical elements by means of Deposition techniques

Principal Investigator

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Development of Methods for the design of Microfocus Optical Systems

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[Journal Article] Actual defect observation results of an extreme ultraviolet blank mask by coherent diffraction imaging2016

Author(s)

Journal Title

NAID

Data Source

[Journal Article] Phase Imaging Results of Phase Defect Using Micro Coherent EUV Scatterometry Microscope2016

Author(s)

Journal Title

Data Source

[Journal Article] Development of a reflectometer for a large EUV mirror in NewSUBARU2015

Author(s)

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[Journal Article] Development of Transmission Grating for EUV Interference Lithography of 1X nm HP2015

Author(s)

Journal Title

NAID

Data Source

[Journal Article] Phase Imaging Results of Phase Defect Using Micro Coherent EUV Scatterometry Microscope2015

Author(s)

Journal Title

Data Source

[Journal Article] Development of High=Reflective W/Si-multilayer Diffraction Grating for the Analysis of Fluorine Materials2015

Author(s)

Journal Title

NAID

Data Source

[Journal Article] Development of element technologies for EUVL2015

Author(s)

Journal Title

Data Source

[Journal Article] (169)EUV Resist Chemical Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity Achievement2014

Author(s)

Journal Title

KINOSHITA Hiroo 木下博雄

[Journal Article] (169)EUV Resist Chemical Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity　Achievement2014