Nunomura Shota 布村正太

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NUNOMURA Shota 布村正太

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Researcher Number	50415725
Other IDs	https://orcid.org/0000-0002-6746-2619
Affiliation (Current)	2024: 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 上級主任研究員
Affiliation (based on the past Project Information) *help	2020 – 2024: 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 上級主任研究員 2019 – 2020: 国立研究開発法人産業技術総合研究所, エネルギー・環境領域, 上級主任研究員 2017 – 2018: 国立研究開発法人産業技術総合研究所, エネルギー・環境領域, 主任研究員 2015 – 2016: 国立研究開発法人産業技術総合研究所, 太陽光発電研究センター, 主任研究員 2014: 独立行政法人産業技術総合研究所, 太陽光発電研究センター, 主任研究員 2012 – 2014: 独立行政法人産業技術総合研究所, 太陽光発電工学研究センター, 主任研究員
Review Section/Research Field	Principal Investigator Basic Section 14030:Applied plasma science-related / Plasma electronics / Plasma science Except Principal Investigator Medium-sized Section 14:Plasma science and related fields
Keywords	Principal Investigator プラズマプロセス / 光電流 / 欠陥 / 太陽電池 / 半導体 / プラズマ / シリコン / プラズマエレクトロニクス / 水素化アモルファスシリコン / トラップ … More / キャリア輸送 / アモルファスシリコン / イメージセンサー / 先端半導体 / 低欠陥プロセス / 欠陥修復 / ダングリングボンド / 水素パッシベーション / 分光エリプソメトリ / 表面欠陥層 / 水素原子 / 水素プラズマ / フィールドエフェクト / パッシベーション / シリコン窒化膜 / 結晶シリコン / 水素 / ラジカル / キャリア / プラズマ誘起欠陥 / ポンプ－プローブ法 / トラップキャリア / 実時間観測 / その場測定 / 半導体薄膜 / ＰＥＣＶＤ / プラズマＣＶＤ … More Except Principal Investigator プラズマプロセス / EDA / 一般則 / 膜形成 / シース電場揺らぎ / 光ピンセット / エッチング / 高アスペクト比 / ゆらぎ / 高感度電場計測 / 微粒子プラズマ / 高アスペクト比エッチング / シース電場ゆらぎ / 光捕捉 / 2体問題 / 電場揺動計測 / 電場計測 / 微粒子トラップ Less

Integration Study of General Principles of Thin Film Formation by Plasma Processes.
- Principal Investigator
  
  白谷正治
- Project Period (FY)
  2024 – 2028
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Review Section
  
  Medium-sized Section 14:Plasma science and related fields
- Research Institution
  Kyushu University
Plasma annealing for defect passivation in semiconductor materialsPrincipal Investigator
- Principal Investigator
  
  布村正太
- Project Period (FY)
  2023 – 2025
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 14030:Applied plasma science-related
- Research Institution
  National Institute of Advanced Industrial Science and Technology
Mechanism elucidation of spatio-temporal structure formation of sheath fluctuation using optically trapped fine particles in plasmas
- Principal Investigator
  
  白谷正治
- Project Period (FY)
  2020 – 2023
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Review Section
  
  Medium-sized Section 14:Plasma science and related fields
- Research Institution
  Kyushu University
Hydrogen-mediated defect passivation of semiconductor materials during plasma processingPrincipal Investigator
- Principal Investigator
  
  Nunomura Shota
- Project Period (FY)
  2018 – 2020
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 14030:Applied plasma science-related
- Research Institution
  National Institute of Advanced Industrial Science and Technology
Generation and annihilation mechanisms of plasma-induced defects on semiconductor surfacePrincipal Investigator
- Principal Investigator
  
  Nunomura Shota
- Project Period (FY)
  2015 – 2017
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Plasma electronics
- Research Institution
  National Institute of Advanced Industrial Science and Technology
Transport properties and defect kinetics during silicon thin film growthPrincipal Investigator
- Principal Investigator
  
  NUNOMURA Shota
- Project Period (FY)
  2012 – 2014
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Plasma science
- Research Institution
  National Institute of Advanced Industrial Science and Technology

All 2021 2020 2019 2018 2017 2016 2015 2014 2013 2012 Other

All Journal Article Presentation Book Patent

[Book] プラズマCVD/PVD2015
- Author(s)
  布村正太
- Total Pages
  99
- Publisher
  応用物理学会　プラズマエレクトロニクス分科会
- Data Source
  KAKENHI-PROJECT-15K04717
[Book] 発光分光計測法によるプロセスプラズマの実践的計測の基礎と応用第２部　応用～「プロセスモニタリングへの適用」2015
- Author(s)
  布村正太
- Total Pages
  27
- Publisher
  応用物理学会
- Data Source
  KAKENHI-PROJECT-24540546
[Book] シリコン系太陽電池の高効率化に向けたプラズマＣＶＤ技術2014
- Author(s)
  布村正太
- Total Pages
  11
- Publisher
  日本真空学会 Sputtering & Plasma Processes
- Data Source
  KAKENHI-PROJECT-24540546
[Journal Article] Double-sided TOPCon solar cells on textured wafer with ALD SiOx layer2020
- Author(s)
  Lozac'h Mickael、Nunomura Shota、Matsubara Koji
- Journal Title
  
  Solar Energy Materials and Solar Cells
  
  Volume: 207 Pages: 110357-110357
- DOI
  10.1016/j.solmat.2019.110357
- Peer Reviewed / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K03603
[Journal Article] Real-time monitoring of surface passivation of crystalline silicon during growth of amorphous and epitaxial silicon layer2020
- Author(s)
  Nunomura Shota、Sakata Isao、Sakakita Hajime、Koga Kazunori、Shiratani Masaharu
- Journal Title
  
  Journal of Applied Physics
  
  Volume: 128 Issue: 3 Pages: 033302-033302
- DOI
  10.1063/5.0011563
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20H00142, KAKENHI-PROJECT-18K03603
[Journal Article] Hydrogen-induced defects in crystalline silicon during growth of an ultrathin a-Si:H layer2020
- Author(s)
  Nunomura Shota、Sakata Isao、Matsubara Koji
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 59 Issue: SH Pages: SHHE05-SHHE05
- DOI
  10.35848/1347-4065/ab7478
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18K03603
[Journal Article] Role of silicon surface, polished 〈100〉 and 〈111〉 or textured, on the efficiency of double‐sided TOPCon solar cells2020
- Author(s)
  Lozac'h Micka?l、Nunomura Shota
- Journal Title
  
  Progress in Photovoltaics: Research and Applications
  
  Volume: 28 Issue: 10 Pages: 1001-1011
- DOI
  10.1002/pip.3304
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18K03603
[Journal Article] In-situ detection of interface defects in a-Si:H/c-Si heterojunction during plasma processing2019
- Author(s)
  Nunomura Shota、Sakata Isao、Matsubara Koji
- Journal Title
  
  Applied Physics Express
  
  Volume: 12 Issue: 5 Pages: 051006-051006
- DOI
  10.7567/1882-0786/ab128b
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18K03603
[Journal Article] Formation of electronic defects in crystalline silicon during hydrogen plasma treatment2019
- Author(s)
  Nunomura Shota、Sakata Isao、Matsubara Koji
- Journal Title
  
  AIP Advances
  
  Volume: 9 Issue: 4 Pages: 045110-045110
- DOI
  10.1063/1.5089202
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18K03603
[Journal Article] Roles of hydrogen atoms in p-type Poly-Si/SiOx passivation layer for crystalline silicon solar cell applications2019
- Author(s)
  Lozac’h Mickael、Nunomura Shota、Umishio Hiroshi、Matsui Takuya、Matsubara Koji
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 58 Issue: 5 Pages: 050915-050915
- DOI
  10.7567/1347-4065/ab14fe
- Peer Reviewed / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K03603
[Journal Article] Plasma-Induced Electronic Defects: Generation and Annihilation Kinetics in Hydrogenated Amorphous Silicon2018
- Author(s)
  Shota Nunomura, Isao Sakata, and Koji Matsubara
- Journal Title
  
  Phys. Rev. Applied
  
  Volume: 10 Issue: 5
- DOI
  10.1103/physrevapplied.10.054006
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18K03603
[Journal Article] Passivation property of ultrathin SiOx:H / a-Si:H stack layers for solar cell applicatio2018
- Author(s)
  Mickael Lozac’h, Shota Nunomura, Hitoshi Sai, and Koji Matsubara
- Journal Title
  
  Solar Energy Materials and Solar Cells
  
  Volume: 185 Pages: 5-5
- DOI
  10.1016/j.solmat.2018.05.004
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18K03603
[Journal Article] Electronic properties of ultrathin hydrogenated amorphous silicon2017
- Author(s)
  Shota Nunomura, Isao Sakata, and Koji Matsubara
- Journal Title
  
  Applied Physics Express
  
  Volume: 10 Issue: 8 Pages: 081401-081401
- DOI
  10.7567/apex.10.081401
- NAID
  210000135936
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-15K04717
[Journal Article] Hydrogen atom kinetics in capacitively coupled hydrogen plasmas2017
- Author(s)
  Shota Nunomura, Hirotaka Katayama, and Isao Yoshida
- Journal Title
  
  Plasma Sources Science and Technology
  
  Volume: 26 Issue: 5 Pages: 055018-055018
- DOI
  10.1088/1361-6595/aa6610
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-15K04717
[Journal Article] Impact of band tail distribution on carrier trapping in hydrogenated amorphous silicon for solar cell applications2016
- Author(s)
  S. Nunomura, I. Sakata, K. Matsubara
- Journal Title
  
  Journal of Non-Crystalline Solids
  
  Volume: 436 Pages: 44-50
- DOI
  10.1016/j.jnoncrysol.2016.01.021
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-15K04717
[Journal Article] Science and Technology of Plasma-Enhanced Chemical Vapor Deposition for High-Efficiency Silicon Solar Cells:Summary2015
- Author(s)
  S. Nunomura
- Journal Title
  
  J. Plasma Fusion Res.
  
  Volume: 91 Pages: 360-361
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-15K04717
[Journal Article] Science and Technology of Plasma-Enhanced Chemical Vapor Deposition for High-Efficiency Silicon Solar Cells: Introduction2015
- Author(s)
  S. Nunomura
- Journal Title
  
  J. Plasma Fusion Res.
  
  Volume: 91 Pages: 314-316
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-15K04717
[Journal Article] Charge Trapping in Mixed Organic Donor-Acceptor Semiconductor Thin Films2014
- Author(s)
  Shota Nunomura, Xiaozhou Che, Stephen R. Forrest
- Journal Title
  
  Advanced Materials
  
  Volume: 26 Issue: 45 Pages: 7555-7560
- DOI
  10.1002/adma.201403198
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-24540546
[Journal Article] In-situ characterization of trapped charges in amorphous semiconductor films during plasma-enhanced chemical vapor deposition2014
- Author(s)
  S Nunomura, I Sakata
- Journal Title
  
  AIP Advances
  
  Volume: 4 Issue: 9
- DOI
  10.1063/1.4895345
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-24540546
[Journal Article] In situ Photocurrent Measurements of Thin-Film Semiconductors during Plasma-Enhanced Chemical Vapor Deposition2013
- Author(s)
  Shota Nunomura, Isao Sakata, and Michio Kondo
- Journal Title
  
  Appl. Phys. Express
  
  Volume: 6 Issue: 12 Pages: 126201-126201
- DOI
  10.7567/apex.6.126201
- NAID
  40019923411
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24540546
[Patent] パッシベーション膜2021
- Inventor(s)
  布村正太
- Industrial Property Rights Holder
  国立研究開発法人産業技術総合研究所
- Industrial Property Rights Type
  特許
- Filing Date
  2021
- Data Source
  KAKENHI-PROJECT-18K03603
[Patent] 酸化物半導体材料の開発とｐｎ接合の作製と光電変換素子への応用2015
- Inventor(s)
  高島, 菊地, 外岡, 川中, 吉田, 相浦, 布村
- Industrial Property Rights Holder
  高島, 菊地, 外岡, 川中, 吉田, 相浦, 布村
- Industrial Property Rights Type
  特許
- Industrial Property Number
  2015-117010
- Filing Date
  2015-06-09
- Data Source
  KAKENHI-PROJECT-15K04717
[Patent] 太陽電池の製造工程における発電性能の予測方法、並びにそれを用いた製造工程における最適化方法及び異常検知方法2012
- Inventor(s)
  布村正太、坂田功、吉田郵司、近藤道雄
- Industrial Property Rights Holder
  布村正太、坂田功、吉田郵司、近藤道雄
- Industrial Property Rights Type
  特許
- Industrial Property Number
  2012-141225
- Filing Date
  2012-06-22
- Data Source
  KAKENHI-PROJECT-24540546
[Presentation] [第12回シリコンテクノロジー分科会論文賞受賞記念講演] c-Si表面パッシベーションにおけるプラズマ誘起欠陥とバンド構造2021
- Author(s)
  布村正太他
- Organizer
  2021年第68回応用物理学会春季学術講演会
- Invited
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] シリコンにおけるプラズマ誘起欠陥の発生と修復2020
- Author(s)
  布村正太
- Organizer
  応用物理学会シリコンテクノロジー分科会223回研究会
- Invited
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] Plasma-induced electronic defects: formation and recovery kinetics in silicon2020
- Author(s)
  布村正太
- Organizer
  4th Asia Pacific Conference on Plasma Physics
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] プラズマ誘起欠陥の発生と修復～c-Siへの水素拡散と欠陥～2020
- Author(s)
  布村正太、坂田功、松原浩司
- Organizer
  第67回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] プラズマ誘起欠陥の発生と修復～Arイオン照射の効果～2020
- Author(s)
  布村正太、中根一也、堤隆嘉、松原浩司、堀勝
- Organizer
  第67回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] プラズマ誘起欠陥の発生と修復～結晶シリコンの表面パッシベーションへの影響～2020
- Author(s)
  布村正太他
- Organizer
  2020年第81回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] Defect kinetics in c-Si during ultrathin a-Si:H layer growth by PECVD2019
- Author(s)
  S. Nunomura, I. Sakata, K. Matsubara
- Organizer
  The 41st International Symposium on Dry Process (DPS2019)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] In-situ monitoring of hydrogen plasma-induced electronic defects in silicon2019
- Author(s)
  S. Nunomura, I. Sakata, K. Matsubara
- Organizer
  The 2019 Spring Meeting of the European Materials Research Society (E-MRS)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] High-efficiency silicon heterojunction solar cells ~ defect kinetics during solar cell fabrication~2019
- Author(s)
  Shota Nunomura
- Organizer
  Symposium on Advanced Solar Cells 2019
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] Generation and annihilation kinetics of plasma-induced electronic defects in hydrogenated amorphous silicon2019
- Author(s)
  S. Nunomura, I. Sakata, K. Matsubara
- Organizer
  The Joint Conference of XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] プラズマ誘起欠陥：モニタリングと物理化学2019
- Author(s)
  布村正太、坂田功、松原浩司
- Organizer
  第36回プラズマプロセシング研究会/第31回プラズマ材料科学シンポジウム
- Invited
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] プラズマ誘起欠陥の発生と修復～欠陥抑止半導体プラズマプロセスにむけ～2019
- Author(s)
  布村正太、坂田功、松原浩司
- Organizer
  2019年第80回応用物理学会秋季学術講演会
- Invited
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] プラズマ誘起欠陥の発生と修復～結晶シリコン内の水素と欠陥～2019
- Author(s)
  布村正太、坂田功、松原浩司
- Organizer
  2019年第66回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] Defect generation and annihilation in hydrogenated amorphous silicon2019
- Author(s)
  S. Nunomura, I. Sakata, K. Matsubara
- Organizer
  the 24th International Symposium on Plasma Chemistry (ISPC 24)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] シランプラズマ中の気相化学と表面反応2019
- Author(s)
  布村正太、
- Organizer
  東北大学電気通信研究所共同プロジェクト研究会
- Invited
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] ヘテロ接合太陽電池作製時における界面欠陥のその場評価2019
- Author(s)
  布村正太、坂田功、松原浩司
- Organizer
  2019年第66回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] プラズマ誘起欠陥の発生と修復～欠陥修復の活性化エネルギー～2018
- Author(s)
  布村正太、坂田功、松原浩司
- Organizer
  第65回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] 極薄a-Si:Hのギャップ内準位と輸送特性～水素希釈とアニールの効果～2018
- Author(s)
  布村正太、坂田功、松原浩司
- Organizer
  第65回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] プラズマ誘起欠陥の発生と修復～結晶シリコン上でのモニタリング～2018
- Author(s)
  布村正太、坂田功、松原浩司
- Organizer
  2018年第79回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] プラズマ誘起欠陥の発生と修復～イオン照射に伴う残留欠陥の形成～2018
- Author(s)
  布村正太、坂田功、松原浩司
- Organizer
  第65回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] シリコン PECVD 中の膜評価2018
- Author(s)
  布村正太
- Organizer
  第28回プラズマエレクトロニクス新領域研究会
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] 水素プラズマ照射時の材料内欠陥のその場モニタリング2018
- Author(s)
  布村正太
- Organizer
  第35回プラズマ・核融合学会年会
- Invited
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] Defect kinetics in high-efficiency silicon heterojunction solar cells2018
- Author(s)
  S. Nunomura, M. Lozac’h, I. Sakata and K. Matsubara
- Organizer
  the 28th Annual Meeting of MRS-J
- Invited
- Data Source
  KAKENHI-PROJECT-18K03603
[Presentation] 極薄a-Si:Hのギャップ内準位とキャリア捕捉2017
- Author(s)
  布村正太、坂田功、松原浩司
- Organizer
  2017年第78回応用物理学会秋季学術講
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] In-Situ Diagnostics of Processing Plasma andSemiconductor Films for High-Efficiency Silicon Hetero-Junction Solar Cells2017
- Author(s)
  Shota Nunomura
- Organizer
  AVS 64th International Symposium and Exhibition (AVS 64)
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] Electronic transport properties of a-Si:H passivation layers for silicon hetero-junction solar cells2017
- Author(s)
  Shota Nunomura, Isao Sakata, and Koji Matsubara
- Organizer
  The 2017 E-MRS Spring Meeting and Exhibit
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] Electronic Properties of Ultrathin a-Si:H Passivation Layers for Silicon Heterojunction Solar Cells2017
- Author(s)
  Shota Nunomura, Isao Sakata, and Koji Matsubara
- Organizer
  EU PVSEC 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] Optoelectronic properties of a-Si:H passivation layer for high-efficiency silicon heterojunction solar cells2017
- Author(s)
  Shota Nunomura, Isao Sakata, and Koji Matsubara
- Organizer
  2017 Symposium on Advanced Solar Cells
- Place of Presentation
  Kyushu Univ. Fukuoka
- Year and Date
  2017-02-09
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] シリコンヘテロ太陽電池のトラップとキャリア輸送2017
- Author(s)
  布村正太
- Organizer
  WFF & WFSM 2017
- Place of Presentation
  Hokkaido Univ., Sapporo
- Year and Date
  2017-03-03
- Invited
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] H atom generation and loss kinetics in VHF plasmas2017
- Author(s)
  Shota Nunomura, Hirotaka Katayama and Isao Yoshida
- Organizer
  The International Conference on Phenomena in Ionized Gases (ICPIG)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] Characterization of electronic transport properties of semiconductor films during plasma processing2017
- Author(s)
  Shota Nunomura
- Organizer
  The International Conference on Phenomena in Ionized Gases (ICPIG)
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] CHARACTERIZATION OF ELECTRONIC PROPERTIES OF A-SI:H PASSIVATION LAYERS FOR SILICON HETERO-JUNCTION SOLAR CELLS2017
- Author(s)
  Shota Nunomura, Isao Sakata, and Koji Matsubara
- Organizer
  PVSEC-27
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] State of the art silicon heterojunction solar cell devices ~ plasma processing for high-quality passivation~ (Plenary lecture)2017
- Author(s)
  Shota Nunomura
- Organizer
  5th Korea-Japan Joint Symposium on Advanced Solar Cells 2018, 2nd International Symposium on Energy Research and Application
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] Experimental and simulation study on hydrogen atom kinetics in low-pressure capacitively coupled plasmas2017
- Author(s)
  Shota Nunomura, Hirotaka Katayama and Isao Yoshida
- Organizer
  AVS 64th International Symposium and Exhibition (AVS 64)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] Real-time monitoring of defects creation and annealing during plasma processing2017
- Author(s)
  Shota Nunomura
- Organizer
  The 82nd IUVSTA Workshop on Plasma-based Atomic Layer Processes
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] H atom generation and loss kinetics in low-pressure processing plasmas2017
- Author(s)
  Shota Nunomura, Hirotaka Katayama, and Isao Yoshida
- Organizer
  第34回プラズマプロセシング研究会(SPP34)／第29回プラズマ材料科学シンポジウム(SPSM29)
- Place of Presentation
  北海道大学, 北海道
- Year and Date
  2017-01-16
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] Characterization of carrier transport and trapping in semiconductor films during plasma processing2016
- Author(s)
  S. Nunomura, I. Sakata, and K. Matsubara
- Organizer
  Korian vacuum society (KVS) annual meeting
- Place of Presentation
  Kangwon, Koria
- Year and Date
  2016-02-18
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] Characterization of charge carrier trapping in semiconductor films for photovoltaic application2016
- Author(s)
  S. Nunomura, X. Che, and S.R. Forrest
- Organizer
  EMN Photovoltaics Meeting 2016
- Place of Presentation
  Hong Kong, China
- Year and Date
  2016-01-19
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] Measurements of carrier transport and trapping in semiconductor films during plasma processing2016
- Author(s)
  Shota Nunomura, Isao Sakata, and Koji Matsubara
- Organizer
  15th International Conference on Plasma Surface Engineering
- Place of Presentation
  Cogress center, Garmisch-Partenkirchen, Germany
- Year and Date
  2016-09-17
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] Silicon-based thin-film and heterojunction solar cells2016
- Author(s)
  S. Nunomura
- Organizer
  Symposium on Advanced Solar Cells
- Place of Presentation
  Kangwon, Koria
- Year and Date
  2016-02-17
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] EFFECTS OF CARRIER TRAPPING ON SOLAR CELL PERFORMANCES2016
- Author(s)
  Shota Nunomura, Isao Sakata, and Koji Matsubara
- Organizer
  The Photovoltaic Technical Conference 2016
- Place of Presentation
  the International Center, Marseille, France
- Year and Date
  2016-05-10
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] Carrier transport and trapping during a-Si:H growth - for more efficient solar cells-2016
- Author(s)
  Shota Nunomura, Isao Sakata, and Koji Matsubara
- Organizer
  The 26th annual meeting of MRS-J
- Place of Presentation
  Kaikoukinennkaikan, Yokohama
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] Defects and carrier transport at growth of amorphous semiconductor2015
- Author(s)
  S. Nunomura
- Organizer
  Joint International Workshop of WFF&WFSM
- Place of Presentation
  Hokkaido Univ (Hokkaido)
- Year and Date
  2015-03-06
- Invited
- Data Source
  KAKENHI-PROJECT-24540546
[Presentation] Carrier transport and trapping in a-Si:H films during growth by plasma enhanced CVD2015
- Author(s)
  S Nunomura, I. Sakata, and K. Matsubara
- Organizer
  68th Gaseous Electronics Conference (GEC) / 9th International Conference on Reactive Plasmas (ICRP)
- Place of Presentation
  Honolulu, USA
- Year and Date
  2015-10-13
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] In-situ monitoring of carrier transport and trapping in amorphous semiconductors under plasma processing2015
- Author(s)
  S Nunomura and I. Sakata
- Organizer
  Dry process symposium 2015
- Place of Presentation
  Awaji, Japan
- Year and Date
  2015-11-06
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] 有機薄膜太陽電池のトラップと発電効率との相関2015
- Author(s)
  S. Nunomura, X. Che, and S.R. Forrest
- Organizer
  第12回次世代の太陽光発電システムシンポジウム
- Place of Presentation
  郡山, 福島
- Year and Date
  2015-05-28
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] Real-time monitoring of a defect-rich surface layer during plasma processing2015
- Author(s)
  S. Nunomura
- Organizer
  75th IUVSTA WWorkshop on Sheath Phenomena in Plasma Processing of Advanced Materials
- Place of Presentation
  Cerklje, Lubiana, Slovenia
- Year and Date
  2015-01-20
- Invited
- Data Source
  KAKENHI-PROJECT-24540546
[Presentation] 太陽電池用a-Si:Hのキャリア捕捉とデバイス特性2015
- Author(s)
  布村正太, 坂田功, 松原浩司
- Organizer
  第76回応用物理学会秋季学術講演会
- Place of Presentation
  名古屋, 愛知
- Year and Date
  2015-09-14
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] リモートプラズマ中の水素原子密度の測定2015
- Author(s)
  布村正太, 片山博貴, 吉田功
- Organizer
  第76回応用物理学会秋季学術講演会
- Place of Presentation
  名古屋, 日本
- Year and Date
  2015-09-15
- Data Source
  KAKENHI-PROJECT-15K04717
[Presentation] In-situ characterization of carrier transport in semiconductor thin-films under plasma processing2014
- Author(s)
  S.Nunomura
- Organizer
  plasma conference 2014
- Place of Presentation
  朱鷺メッセ（新潟県）
- Year and Date
  2014-11-21
- Data Source
  KAKENHI-PROJECT-24540546
[Presentation] In-situ monitoring of carrier transport in semiconductor active layer under plasma processing2014
- Author(s)
  S. Nunomura, I. Sakata, and M. Kondo
- Organizer
  The 36th International Symposium on Dry Process
- Place of Presentation
  パシフィコ横浜（神奈川県）
- Year and Date
  2014-11-28
- Data Source
  KAKENHI-PROJECT-24540546
[Presentation] In-Situ Diagnostics of Properties of Plasma CVD Si Films for Improving Si Thin-Film Photovoltaics2014
- Author(s)
  S. Nunomura
- Organizer
  International Conference on Microelectronics and Plasma Technology2014
- Place of Presentation
  Convention center, Gunsan, Korea
- Year and Date
  2014-07-10
- Invited
- Data Source
  KAKENHI-PROJECT-24540546
[Presentation] プラズマプロセス下の半導体薄膜の欠陥発生と修復の実時間モニタリング2014
- Author(s)
  布村正太、坂田功
- Organizer
  第75回応用物理学会秋季学術講演会
- Place of Presentation
  北海道大学（北海道）
- Year and Date
  2014-09-19
- Data Source
  KAKENHI-PROJECT-24540546
[Presentation] 薄膜シリコン成長時のトラップ電荷とキャリア輸送のその場評価2014
- Author(s)
  布村正太、坂田功
- Organizer
  第75回応用物理学会秋季学術講演会
- Place of Presentation
  北海道大学（北海道）
- Year and Date
  2014-09-17
- Data Source
  KAKENHI-PROJECT-24540546
[Presentation] In situ diagnsotics of properties of plasma CVD Si films for improving Si thin film photovoltaics2014
- Author(s)
  S. Nunomura
- Organizer
  (International Conference on Microelectronics and Plasma Technology 2014
- Place of Presentation
  Gunsan, Koria
- Invited
- Data Source
  KAKENHI-PROJECT-24540546
[Presentation] In-situ characterization of photoexcited carrier transport during a-Si:H film growth2014
- Author(s)
  S. Nunomura, I. Sakata, M. Kondo
- Organizer
  2014 MRS Spring Meeting & Exhibit
- Place of Presentation
  Moscone West Convention Center, San Francisco, USA
- Year and Date
  2014-04-22
- Data Source
  KAKENHI-PROJECT-24540546
[Presentation] プラズマプロセス下における薄膜半導体材料のダメージとアニーリング
- Author(s)
  布村正太、坂田功、吉田郵司、近藤道雄
- Organizer
  第73回応用物理学会学術講演会
- Place of Presentation
  愛媛大学
- Data Source
  KAKENHI-PROJECT-24540546
[Presentation] In-situ characterization of photoexcited carrier transport during a-Si:H film growth
- Author(s)
  Shota Nunomura, Isao Sakata, and Michio Kondoa,
- Organizer
  2014 MRS Spring Meeting & Exhibit
- Place of Presentation
  San Francisco
- Data Source
  KAKENHI-PROJECT-24540546
[Presentation] プラズマを用いた太陽電池開発の最先端
- Author(s)
  布村正太
- Organizer
  平成24年度電気関係学会東海支部連合大会
- Place of Presentation
  豊橋
- Invited
- Data Source
  KAKENHI-PROJECT-24540546
[Presentation] 薄膜シリコン成長時におけるキャリア輸送特性の実時間観測
- Author(s)
  布村正太、坂田功、吉田郵司、近藤道雄
- Organizer
  第73回応用物理学会学術講演会
- Place of Presentation
  愛媛大学
- Data Source
  KAKENHI-PROJECT-24540546
[Presentation] 低分子有機半導体薄膜のトラップ電荷の評価
- Author(s)
  布村正太、S. Forrest
- Organizer
  第61回応用物理学会春季学術講演会
- Place of Presentation
  青山学院大学
- Data Source
  KAKENHI-PROJECT-24540546

1. SAKATA Isao (60357100)

# of Collaborated Projects: 2 results

# of Collaborated Products: 26 results
2. 白谷正治 (90206293)

# of Collaborated Projects: 2 results

# of Collaborated Products: 1 results
3. 鎌滝晋礼 (60582658)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
4. MATSYBARA Koji (90202324)

# of Collaborated Projects: 1 results

# of Collaborated Products: 16 results
5. 小林達哉 (30733703)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
6. 石川健治 (60417384)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
7. 富田健太郎 (70452729)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
8. 古閑一憲 (90315127)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results

Nunomura Shota 布村 正太

NUNOMURA Shota 布村 正太

Research Projects

Research Products

Co-Researchers

Integration Study of General Principles of Thin Film Formation by Plasma Processes.

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Plasma annealing for defect passivation in semiconductor materialsPrincipal Investigator

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Mechanism elucidation of spatio-temporal structure formation of sheath fluctuation using optically trapped fine particles in plasmas

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Hydrogen-mediated defect passivation of semiconductor materials during plasma processingPrincipal Investigator

Principal Investigator

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Generation and annihilation mechanisms of plasma-induced defects on semiconductor surfacePrincipal Investigator

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Transport properties and defect kinetics during silicon thin film growthPrincipal Investigator

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[Book] プラズマCVD/PVD2015

Author(s)

Total Pages

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Data Source

[Book] 発光分光計測法によるプロセスプラズマの実践的計測の基礎と応用 第２部 応用～「プロセスモニタリングへの適用」2015

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Total Pages

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Data Source

[Book] シリコン系太陽電池の高効率化に向けたプラズマＣＶＤ技術2014

Author(s)

Total Pages

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Data Source

[Journal Article] Double-sided TOPCon solar cells on textured wafer with ALD SiOx layer2020

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Journal Title

DOI

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[Journal Article] Real-time monitoring of surface passivation of crystalline silicon during growth of amorphous and epitaxial silicon layer2020

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[Journal Article] Hydrogen-induced defects in crystalline silicon during growth of an ultrathin a-Si:H layer2020

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[Journal Article] Role of silicon surface, polished 〈100〉 and 〈111〉 or textured, on the efficiency of double‐sided TOPCon solar cells2020

Author(s)

Journal Title

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Data Source

[Journal Article] In-situ detection of interface defects in a-Si:H/c-Si heterojunction during plasma processing2019

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DOI

Nunomura Shota 布村正太

NUNOMURA Shota 布村正太

[Book] 発光分光計測法によるプロセスプラズマの実践的計測の基礎と応用第２部　応用～「プロセスモニタリングへの適用」2015