Khajorurungruang Panart カチョーンルンルアンパナート

… Alternative Names

KHAJORNRUNGRUNGANG Panart カチョーンルンルアンパナート

KHAJORNRUNGRUANG Panart カチョーンルンルアンパナート

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Researcher Number	60404092
Other IDs	https://orcid.org/0000-0002-9667-0919
Affiliation (Current)	2024: 九州工業大学, 大学院情報工学研究院, 准教授
Affiliation (based on the past Project Information) *help	2021 – 2023: 九州工業大学, 大学院情報工学研究院, 准教授 2016 – 2018: 九州工業大学, 大学院情報工学研究院, 准教授 2015: 九州工業大学, 大学院情報工学研究院, 助教 2014: 九州工業大学, 情報工学研究院, 助教 2011 – 2013: 九州工業大学, 先端金型センター, 助教 2008 – 2009: Kyushu Institute of Technology, 先端金型センター, 助教
Review Section/Research Field	Principal Investigator Production engineering/Processing studies / Design engineering/Machine functional elements/Tribology Except Principal Investigator Production engineering/Processing studies / Basic Section 18020:Manufacturing and production engineering-related
Keywords	Principal Investigator レーザ / ナノ粒子 / １分子計測(SMD) / 精密研磨 / 超精密計測 / 機械工作・生産工学 / CMP / 粒径 / 計測 / 加工現象 … More / ポリシング / 3次元 / 三次元 / 全反射顕微鏡 / 多波長 / 三次元位置計測 / ブラウン運動 / 全反射顕微鏡法 / エバネッセント光 / 可視化 / 散乱光 / 界面 / 散乱 / 微粒子 / 近接場 / エバネッセント / 国際研究者交流（米国） / surface / scattering / near field / evanescent / polishing / particle / visualization / laser / evanescent wave / optical microscopy / SiC / scattering light / nanoparticle / polishing phenomena / ナノ槽造作製 / リソグラフィ / めっき / エッチング / 紫外光 / 光応用加工 / ナノ構造作製 / ナノ・マイクロ加工 … More Except Principal Investigator 水酸化フラーレン / CMP / 化学的機械的研磨 / ナノチューブ・フラーレン / ナノ材料 / 精密研磨 / サファイアCMP / 電界 / 紫外線 / 選択加工技術 / SiC / 研磨 / 炭素微粒子 / フラーレン / パワー半導体 / 難加工材料 / 表面改質 / 研磨微粒子 / 精密加工 / 機械工作・生産工学 / 複合研磨微粒子 / 高速研磨 / 計測工学 / エバネッセント / ポリシングパッド / 結合型スマート研磨微粒子 / ナノ炭素微粒子 / 材料除去メカニズム / 炭素結合型スマート研磨微粒子 / 難加工材研磨技術 / マイクロ・ナノデバイス / 省エネルギー / 国際情報交換 / 混合微粒子 / 超精密加工 Less

触媒活性型フラーレンナノ微粒子を用いた加工制御法に関する研究
- Principal Investigator
  
  鈴木恵友
- Project Period (FY)
  2021 – 2023
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Review Section
  
  Basic Section 18020:Manufacturing and production engineering-related
- Research Institution
  Kyushu Institute of Technology
Study on 3 Dimension Trajectory and Size Measurment of Each Operating Particle in Nano-Scale Processing PhenomenaPrincipal Investigator
- Principal Investigator
  
  Khajornrungruang Panart
- Project Period (FY)
  2016 – 2018
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Kyushu Institute of Technology
Study on hybrid nano fine particles using fullerene hydroxide for hard to work materials
- Principal Investigator
  
  Suzuki Keisuke
- Project Period (FY)
  2015 – 2017
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Kyushu Institute of Technology
On-Machine Polishing Phenomena Observation Apparatus Development and Its Phenomenon AnalysisPrincipal Investigator
- Principal Investigator
  
  KHAJORNRUNGRUANG Panart
- Project Period (FY)
  2013 – 2014
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Design engineering/Machine functional elements/Tribology
- Research Institution
  Kyushu Institute of Technology
Study on nano machining technology using fullerenol molecules
- Principal Investigator
  
  SUZUKI Keisuke
- Project Period (FY)
  2011 – 2013
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Kyushu Institute of Technology
Study on electro plating and etching for metal interconnect in integrated circuit assisted with ArF excimer laserPrincipal Investigator
- Principal Investigator
  
  KHAJORNRUNGRUANG Panart
- Project Period (FY)
  2008 – 2009
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Kyushu Institute of Technology

All 2019 2018 2017 2016 2015 2014 2013 2011 2010 2009 2008 Other

All Journal Article Presentation Patent

[Journal Article] Study on Mechanism of High Material Removal in Sapphire-CMP with Sub-10nm Silica Particles using Evanescent Field Light2018
- Author(s)
  Natthaphon Bun-Athuek、Panart Khajornrungruang、Keisuke Suzuki
- Journal Title
  
  Proc. of ICPT 2018
  
  Volume: 2018 Pages: 76-81
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06015
[Journal Article] Effects of mixed ultrafine colloidal silica particles on chemical mechanical polishing of sapphire2018
- Author(s)
  Natthaphon Bun-Athuek, Hiroko Takazaki, Takuo Yasunaga, Yutaka Yoshimoto, Panart Khajornrungruang, and Keisuke Suzuki
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: in press
- NAID
  210000149384
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-15H03903
[Journal Article] Study on Structure and Optimization of Hybrid Silica Particles on Chemical Mechanical Polishing of Sapphire2018
- Author(s)
  Bun-Athuek Natthaphon、Takazaki Hiroko、Yasunaga Takuo、Yoshimoto Yutaka、Khajornrungruang Panart、Suzuki Keisuke
- Journal Title
  
  WCMNM 2018 World Congress on Micro and Nano Manufacturing, ISBN: 978-981-11-2727-4
  
  Volume: 2018 Pages: 47-50
- DOI
  10.3850/978-981-11-2728-1_20
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06015
[Journal Article] Evaluation Method of the Approach of Nanoparticles-to-Surface in Chemical Mechanical Polishing using Optical Evanescent Field2018
- Author(s)
  Thitipat Permpatdechakul, Yutaka Terayama, Panart Khajornrungruang, Keisuke Suzuki, Natthaphon Bun-Athuek
- Journal Title
  
  Proc. of ICPT 2018
  
  Volume: 2018 Pages: 356-360
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06015
[Journal Article] In situ measurement method for film thickness using transparency resin sheet with low refractive index under wet condition on chemical mechanical polishing2017
- Author(s)
  Takahiro Oniki, Panart Khajornrungruang, and Keisuke Suzuki
- Journal Title
  
  Japanese journal of applied physics (JJAP).
  
  Volume: in press
- NAID
  210000148115
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-15H03903
[Journal Article] In situ measurement method for film thickness using transparency resin sheet with low refractive index under wet condition on chemical mechanical polishing2017
- Author(s)
  Takahiro Oniki, Panart Khajornrungruang, Keisuke Suzuki
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 7S
- NAID
  210000148115
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-16K06015
[Journal Article] Analytical on mixed colloidal silica particle in slurry of sapphire Chemical Mechanical Polishing2017
- Author(s)
  Natthaphon Bun-Athuek, Yutaka Yoshimoto, Koya Sakai, Panart Khajornrungruang, and Keisuke Suzuki
- Journal Title
  
  The 9th International Conference on Leading Edge Manufacturing in 21st Century (LEM21)
  
  Volume: ０ Pages: 173-173
- NAID
  130006744679
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-15H03903
[Journal Article] Nanoparticle Application of Polyhydroxylated Fullerene (Fullerenol) on Post Cleaning Process of Copper Wafer2017
- Author(s)
  Yueh-Hsun Tsai, Keisuke Suzuki,Chao-Chung Chen,Panart Khajornrungruang
- Journal Title
  
  WCMNM2017
  
  Volume: - Pages: 95-98
- NAID
  130006043939
- Peer Reviewed / Acknowledgement Compliant / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15H03903
[Journal Article] Study on effect of the surface variation of colloidal silica abrasive during chemical mechanical polishing of sapphire2017
- Author(s)
  Natthaphon Bun-Athuek, Yutaka Yoshimoto, Koya Sakai, Panart Khajornrungruang, and Keisuke Suzuki
- Journal Title
  
  Japanese journal of applied physics (JJAP).
  
  Volume: in press
- NAID
  210000148099
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-15H03903
[Journal Article] Study on effect of the surface variation of colloidal silica abrasive during chemical mechanical polishing of sapphire2017
- Author(s)
  Natthaphon Bun-Athuek, Yutaka Yoshimoto, Koya Sakai, Panart Khajornrungruang, and Keisuke Suzuki
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 56
- NAID
  210000148099
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-15H03903
[Journal Article] In-situ measurement method of the film thickness using transparency micro-patterned pad with low refractive index under the wet condition2016
- Author(s)
  Takahiro Oniki, Panart Khajornrungruang, and Keisuke Suzuki
- Journal Title
  
  ADMETA 2016
  
  Volume: -
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-15H03903
[Journal Article] Study on Dynamic Observation of sub-50 nm sized particles in Water Using Evanescent Field with a Compact and Mobile Apparatus2014
- Author(s)
  Khajornrungruang, P.; Dean, P. J.; Babu, S. V.
- Journal Title
  
  Proceedings of Annual Meeting of the American Society for Precision Engineering, ISBN: 978-1-887706-66-7
  
  Volume: 29 Pages: 73-77
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-25870514
[Patent] 研磨剤2011
- Inventor(s)
  鈴木恵友,木村景一,カチョーンルンルアンパナート,齊藤貴志,是澤龍哉
- Industrial Property Rights Holder
  国立大学法人九州工業大学
- Industrial Property Rights Type
  特許
- Filing Date
  2011-05-26
- Overseas
- Data Source
  KAKENHI-PROJECT-23560129
[Presentation] FDTD法によるガラス表面近傍における移動ナノ粒子の光散乱特性解析2019
- Author(s)
  ○平佳那子， ◎カチョーンルンルアンパナート，鈴木恵介，荒牧弘親
- Organizer
  2019年度精密工学会第26回学生会員卒業研究発表講演会
- Data Source
  KAKENHI-PROJECT-16K06015
[Presentation] The Performance Evaluation of Developed Apparatus for Observing the Nanoparticles Phenomena During CMP Process by Applying Evanescent Field2019
- Author(s)
  PERMPATDECHAKUL THITIPAT, Khajornrungruang Panart, Suzuki Keisuke, Blattler Aran, Kanako Taira
- Organizer
  日本機械学会九州支部第72期総会・講演会
- Data Source
  KAKENHI-PROJECT-16K06015
[Presentation] Study on On-Machine Visualization of Surface Processing Phenomena in Nanoscale -5th report: Investigation on 3D Motion of Standard Particle-2019
- Author(s)
  ブラドラー・アラン、カチョーンルンルアン・パナート、鈴木恵友、パームパッデーチャークン・ティティパット
- Organizer
  2019年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-16K06015
[Presentation] High Speed Three-dimensional Tracking of Individual Polystyrene Standard Nanoparticle in Multi-wavelength Evanescent Fields2019
- Author(s)
  Aran Blattler, Panart Khajornrungruang, Keisuke Suzuki
- Organizer
  International Symposium on Measurement Technology and Intelligent Instruments （受理された）
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06015
[Presentation] ナノ粒子の三次元挙動が見れる携帯型全反射顕微鏡法および装置2018
- Author(s)
  カチョーンルンルアンパナート
- Organizer
  JST 九州工業大学新技術説明会
- Invited
- Data Source
  KAKENHI-PROJECT-16K06015
[Presentation] ナノスケールにおける加工現象可視化に関する研究第 4 報:縦分解能の検討2018
- Author(s)
  白川裕晃，ブラッドラーアラン，カチョーンルンルアンパナート，鈴木恵友, 竹元亨
- Organizer
  2018 年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-16K06015
[Presentation] Proposal of Optical Measurement Method for 3D Single Nanoparticle Position Near a Surface2018
- Author(s)
  Panart Khajornrungruang, Hiroaki Shirakawa, Keisuke Suzuki, Koya Sakai
- Organizer
  21 st International Symposium on Chemical-Mechanical Planarization
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06015
[Presentation] Development of in-situ observation apparatus for investigating the nanoparticles phenomenon on surface in CMP using evanescent field2018
- Author(s)
  PERMPATDECHAKUL THITIPAT, ,KHAJORNRUNGRUANG PANART, KEISUKE SUZUKI, YUTAKA TERAYAMA
- Organizer
  精密工学会九州支部北九州地方講演会
- Data Source
  KAKENHI-PROJECT-16K06015
[Presentation] ナノスケール被加工表面上におけるナノ粒子の三次元挙動観測法に関する研究2018
- Author(s)
  カチョーンルンルアンパナート、白川裕晃，ブラッドラーアラン，竹元亨，鈴木恵友
- Organizer
  精密工学会切削加工専門委員会・知的ナノ計測専門委員会合同ワークショップ
- Data Source
  KAKENHI-PROJECT-16K06015
[Presentation] Optimization of mixed colloidal silica and fullerenol slurry in chemical mechanical polishing of sapphire2017
- Author(s)
  atthaphon Bun-Athuek, Panart Khajornrungruang, Wataru Murakawa, Tokihito Satou, and Keisuke Suzuki
- Organizer
  JSME Conference
- Place of Presentation
  佐賀大学
- Data Source
  KAKENHI-PROJECT-15H03903
[Presentation] 低屈折率の透明樹脂パッドを用いたCMPにおけるモニタリング技術に関する研究2017
- Author(s)
  鬼木喬玄，鈴木恵友，カチョーンルンルアンパナート
- Organizer
  精密工学会
- Place of Presentation
  慶応大学
- Data Source
  KAKENHI-PROJECT-15H03903
[Presentation] Nanoparticle Application of Polyhydroxylated Fullerene (Fullerenol) on Post Cleaning Process of Copper Wafer2017
- Author(s)
  Yueh-Hsun Tsai, Keisuke Suzuki,Chao-Chung Chen,Panart Khajornrungruang
- Organizer
  JSPE2017(Spring)
- Place of Presentation
  慶応大学
- Data Source
  KAKENHI-PROJECT-15H03903
[Presentation] ナノスケールにおける加工現象可視化に関する研究第 3 報:散乱光強度評価2017
- Author(s)
  白川裕晃, カチョーンルンルアンパナート, 鈴木恵友
- Organizer
  2017 年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-16K06015
[Presentation] 多波長エバネッセント光を用いた実時間三次元計測法に関する研究-試料作製および検証手法の検討-2017
- Author(s)
  ○竹元亨、◎カチョーンルンルアンパナート
- Organizer
  2017年度精密工学会九州支部第18回学生研究発表会
- Data Source
  KAKENHI-PROJECT-16K06015
[Presentation] Investigation on 3D Position of Individual Nanoparticle in Multi Wavelength Evanescent Field2017
- Author(s)
  Aran Blatter, 白川裕晃、カチョーンルンルアンパナート、鈴木恵友、竹元亨
- Organizer
  2017年度精密工学会九州支部熊本地方講演会
- Data Source
  KAKENHI-PROJECT-16K06015
[Presentation] Proposal of Individual Sub 100 nm Nano-Particle 3D-Tracking Method in Multi Wavelength Evanescent Fields2017
- Author(s)
  Panart Khajornrungruang, Hiroaki Shirakawa, Keisuke Suzuki, and Ryo Takemoto
- Organizer
  Advanced Metallization Conference 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06015
[Presentation] 二波長エバネッセント光を用いた実時間三次元計測法に関する研究（ナノ粒子の散乱光強度検出装置の設計）2016
- Author(s)
  白川裕晃，カチョーンルンルアンパナート，鈴木恵友
- Organizer
  2016年度精密工学会九州支部北九州地方講演会
- Place of Presentation
  北九州工業高等専門学校（福岡県北九州市）
- Year and Date
  2016-12-10
- Data Source
  KAKENHI-PROJECT-16K06015
[Presentation] エバネッセント光を用いたナノ微粒子観察によるポリシング加工の現象解析2015
- Author(s)
  今井祐太，鈴木恵友，カチョーンルンルアン　パナート
- Organizer
  日本機械学会九州支部第68期総会・講演会
- Place of Presentation
  福岡大学，福岡県
- Year and Date
  2015-03-13
- Data Source
  KAKENHI-PROJECT-25870514
[Presentation] Study on sub 50 nm sized particle dynamic observation in water using evanescent field with mobile apparatus2014
- Author(s)
  Panart Khajornrungruang, Patrick J. Dean, S. V. Babu
- Organizer
  29th Annual Meeting of the American Society for Precision Engineering
- Place of Presentation
  Boston, Massachusetts USA
- Data Source
  KAKENHI-PROJECT-25870514
[Presentation] Nano-sized Particles Detection and Analysis in Solution using Evanescent Field2013
- Author(s)
  Panart Khajornrungruang, Sevim Korkmas, S. V. Babu
- Organizer
  18th International Symposium on Chemical-Mechanical Planarization
- Place of Presentation
  Lake Placid, NY
- Data Source
  KAKENHI-PROJECT-25870514
[Presentation] 水酸化フラーレンを利用したサファイアCMP高効率研磨手法に関する研究2013
- Author(s)
  河北誠也，山城天心，木村景一，カチョーンルンルアンパナート，鈴木恵友
- Organizer
  2013年度精密工学会春季大会
- Place of Presentation
  東京工業大学大岡山キャンパス
- Data Source
  KAKENHI-PROJECT-23560129
[Presentation] Effect of Fullerenol as Fine Particles in Sapphire CMP Slurry2011
- Author(s)
  Takashi Saito, Keisuke Suzuki, Panart Khajornrungruang, Tatsuya Korezawa, and Keiichi Kimura
- Organizer
  2011 International Conference on Planarization/CMP Technology (2011 ICPT)
- Place of Presentation
  COEX Soul
- Data Source
  KAKENHI-PROJECT-23560129
[Presentation] Study on Sapphire CMP Slurry using Water-soluble Fullerenol as Fine Particles2011
- Author(s)
  Keisuke Suzuki,Takashi Saito, Erika Karasudani, Tatsuya Korezawa, Panart Khajornrungruang
- Organizer
  2011 International Conference on Planarization/CMP Technology (2011 ICPT)
- Place of Presentation
  COEX Soul
- Data Source
  KAKENHI-PROJECT-23560129
[Presentation] Performance of Water-soluble Fullerenol as Novel Functional Fine Particles for Sapphire CMP2011
- Author(s)
  Keisuke Suzuki,Takashi Saitou,Tatsuya Korezawa, Panart Khajornrungruang and Keiichi Kimura
- Organizer
  Advanced Metallization Conference 2011 21th Asian Session (ADMETA 2011)
- Place of Presentation
  Japan, Tokyo
- Data Source
  KAKENHI-PROJECT-23560129
[Presentation] 紫外線レーザ照射による金属の部分的析出及びエッチングに関する研究2010
- Author(s)
  神崎政人, 木村景一, パナートカチョーンルンルアン
- Organizer
  日本機械学会九州支部第41回学生員卒業研究発表講演会
- Place of Presentation
  宮崎
- Year and Date
  2010-03-09
- Data Source
  KAKENHI-PROJECT-20760086
[Presentation] 紫外線レーザ照射による金属の部分的析出及びエッチングに関する研究2010
- Author(s)
  神崎政人, 木村景一, パナートカチョーンルンルアン
- Organizer
  日本機械学会九州支部第4 1回学生員卒業研究発表講演会
- Place of Presentation
  宮崎
- Data Source
  KAKENHI-PROJECT-20760086
[Presentation] 紫外光照射Cu-CMPに関する研究-紫外光照射によってCuウェーハ表面に起こる諸現象の観察と考察-2009
- Author(s)
  ムラリラオアパラサミ, 李木宣孝, 木村景一, カチョーンルンルアンパナート
- Organizer
  2009年度精密工学会春季大会学術講演会講演論文集
- Place of Presentation
  東京
- Data Source
  KAKENHI-PROJECT-20760086
[Presentation] Cu-CMP assisted with Ultra Violet light i r r a d i a t i o n d i r e c t l y t o w a f e r s u r f a c e2009
- Author(s)
  Panart Khajornrungruang, Keiichi Kimura, Nobutaka Sumomogi
- Organizer
  2 0 0 9 I n t e r n a t i o n a l Conference on Planarization/CMP Technology
- Place of Presentation
  Fukuoka, Japan
- Data Source
  KAKENHI-PROJECT-20760086
[Presentation] Cu-CMP assisted with Ultra Violet light irradiation directly to wafersurface2009
- Author(s)
  Panart Khajornrungruang, Keiichi Kimura, Nobutaka Sumomogi
- Organizer
  2009 International Conference on Planarization/CMP Technology
- Place of Presentation
  Fukuoka, 日本
- Year and Date
  2009-11-21
- Data Source
  KAKENHI-PROJECT-20760086
[Presentation] 紫外光照射Cu・CMPに関する研究-紫外光照射によってCuウェーバ表面に起こる諸現象の観察と考察-2009
- Author(s)
  ムラリラオアパラサミ, 李木宣孝, 木村景一, カチョーンルンルアンパナート
- Organizer
  2009年度精密工学会春季大会学術講演会講演論文集
- Place of Presentation
  東京
- Year and Date
  2009-03-11
- Data Source
  KAKENHI-PROJECT-20760086
[Presentation] Cu-CMP with Ultraviolet light irradiation in deionized water2008
- Author(s)
  Panart Khajornrungruang, Keiichi Kimura, Nobutaka Sumomogi
- Organizer
  2008 International Conference on Planarization/CMP Technology
- Place of Presentation
  Hsinchu, Taiwan
- Data Source
  KAKENHI-PROJECT-20760086
[Presentation] Cu-CMP with Ultraviolet light irradiation in deionized water2008
- Author(s)
  Panart Khajornrungruang, Keiichi Kimura, Nobutaka Sumomoai
- Organizer
  2008, International Conference on Planarization/CMP Technology
- Place of Presentation
  Hsinchu, 台湾
- Year and Date
  2008-10-10
- Data Source
  KAKENHI-PROJECT-20760086
[Presentation] Study on Dynamic Observation of sub-50 nm sized particles in Water Using Evanescent Field with a Compact and Mobile Apparatus（口頭）
- Author(s)
  Panart Khajornrungruang, Patrick J. Dean, S. V. Babu
- Organizer
  the 29th ASPE Annual Meeting
- Place of Presentation
  Boston, Nassachusetts, USA
- Year and Date
  2014-11-09 – 2014-11-14
- Data Source
  KAKENHI-PROJECT-25870514

1. SUZUKI Keisuke (50585156)

# of Collaborated Projects: 5 results

# of Collaborated Products: 31 results
2. KIMURA Keiichi (80380723)

# of Collaborated Projects: 2 results

# of Collaborated Products: 3 results
3. 伊藤高廣 (10367401)

# of Collaborated Projects: 2 results

# of Collaborated Products: 1 results
4. 安永卓生 (60251394)

# of Collaborated Projects: 2 results

# of Collaborated Products: 1 results
5. KANZAKI Masato

# of Collaborated Projects: 1 results

# of Collaborated Products: 2 results
6. SHIRAKAWA Hiroaki

# of Collaborated Projects: 1 results

# of Collaborated Products: 7 results
7. BLATLER Aran

# of Collaborated Projects: 1 results

# of Collaborated Products: 2 results
8. PERMPATDECHAKUL Thitipat

# of Collaborated Projects: 1 results

# of Collaborated Products: 4 results
9. BABU Suryadevara V.

# of Collaborated Projects: 1 results

# of Collaborated Products: 4 results

Khajorurungruang Panart カチョーンルンルアン パナート

KHAJORNRUNGRUNGANG Panart カチョーンルンルアン パナート

KHAJORNRUNGRUANG Panart カチョーンルンルアン パナート

Research Projects

Research Products

Co-Researchers

触媒活性型フラーレンナノ微粒子を用いた加工制御法に関する研究

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Study on 3 Dimension Trajectory and Size Measurment of Each Operating Particle in Nano-Scale Processing PhenomenaPrincipal Investigator

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Study on hybrid nano fine particles using fullerene hydroxide for hard to work materials

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On-Machine Polishing Phenomena Observation Apparatus Development and Its Phenomenon AnalysisPrincipal Investigator

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Study on nano machining technology using fullerenol molecules

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Study on electro plating and etching for metal interconnect in integrated circuit assisted with ArF excimer laserPrincipal Investigator

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[Journal Article] Study on Mechanism of High Material Removal in Sapphire-CMP with Sub-10nm Silica Particles using Evanescent Field Light2018

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[Journal Article] Effects of mixed ultrafine colloidal silica particles on chemical mechanical polishing of sapphire2018

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NAID

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[Journal Article] Study on Structure and Optimization of Hybrid Silica Particles on Chemical Mechanical Polishing of Sapphire2018

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[Journal Article] Evaluation Method of the Approach of Nanoparticles-to-Surface in Chemical Mechanical Polishing using Optical Evanescent Field2018

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[Journal Article] In situ measurement method for film thickness using transparency resin sheet with low refractive index under wet condition on chemical mechanical polishing2017

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[Journal Article] In situ measurement method for film thickness using transparency resin sheet with low refractive index under wet condition on chemical mechanical polishing2017

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NAID

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[Journal Article] Analytical on mixed colloidal silica particle in slurry of sapphire Chemical Mechanical Polishing2017

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NAID

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[Journal Article] Nanoparticle Application of Polyhydroxylated Fullerene (Fullerenol) on Post Cleaning Process of Copper Wafer2017

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NAID

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Khajorurungruang Panart カチョーンルンルアンパナート

KHAJORNRUNGRUNGANG Panart カチョーンルンルアンパナート

KHAJORNRUNGRUANG Panart カチョーンルンルアンパナート

[Presentation] FDTD法によるガラス表面近傍における移動ナノ粒子の光散乱特性解析2019

[Presentation] ナノスケールにおける加工現象可視化に関する研究第 4 報:縦分解能の検討2018