Ozawa Nobuki 尾澤伸樹

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OZAW Nobuki 尾澤伸樹

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Researcher Number	60437366
Other IDs
Affiliation (Current)	2025: 東北大学, 未来科学技術共同研究センター, 特任准教授
Affiliation (based on the past Project Information) *help	2021 – 2023: 東北大学, 未来科学技術共同研究センター, 特任准教授 2020 – 2021: 東北大学, 未来科学技術共同研究センター, 准教授 2015 – 2019: 東北大学, 金属材料研究所, 助教 2011 – 2014: 東北大学, 工学(系)研究科(研究院), 助教
Review Section/Research Field	Principal Investigator Design engineering/Machine functional elements/Tribology / Basic Section 26050:Material processing and microstructure control-related / Thin film/Surface and interfacial physical properties Except Principal Investigator Basic Section 27030:Catalyst and resource chemical process-related
Keywords	Principal Investigator 分子動力学法 / 化学機械研磨 / 反応力場 / マルチフィジックス現象 / ナノバブル / メカノケミカル反応 / 量子化学 / 第一原理計算 / 超精密加工 / マルチフィジックス … More / 圧壊 / 反応分子動力学法 / 精密加工 / ウルトラファインバブル / 計算科学 / シミュレーション / 難加工材料 / 量子分子動力学 / アルカリ形燃料電池 / 伝導プロセス / 表面反応 / アニオン / 高速化 / 計算科学シミュレーション … More Except Principal Investigator ゼオライト Less

Development of advanced zeolite catalysts based on retrosynthetic analysis
- Principal Investigator
  
  YOKOI TOSHIYUKI
- Project Period (FY)
  2021 – 2023
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Review Section
  
  Basic Section 27030:Catalyst and resource chemical process-related
- Research Institution
  Tokyo Institute of Technology
Development of Simulator for Super-Precision Machining by Nano-Bubbles based on Computational MethodPrincipal Investigator
- Principal Investigator
  
  Ozawa Nobuki
- Project Period (FY)
  2020 – 2022
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 26050:Material processing and microstructure control-related
- Research Institution
  Tohoku University
Development of Simulator for High Efficient Chemical Mechanical Polishing of Hard-to-Process Materials by Computational MethodPrincipal Investigator
- Principal Investigator
  
  Ozawa Nobuki
- Project Period (FY)
  2017 – 2019
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Design engineering/Machine functional elements/Tribology
- Research Institution
  Tohoku University
Theoretical Design of Slurry for Chemical Mechanical Polishing by Computational SimulationPrincipal Investigator
- Principal Investigator
  
  Nobuki Ozawa
- Project Period (FY)
  2014 – 2016
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Design engineering/Machine functional elements/Tribology
- Research Institution
  Tohoku University
Conduction Process of Anion in Alkaline Fuel Cell by Quantum Chemical Molecular Dynamics MethodPrincipal Investigator
- Principal Investigator
  
  OZAW Nobuki
- Project Period (FY)
  2011 – 2013
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Thin film/Surface and interfacial physical properties
- Research Institution
  Tohoku University

All 2021 2020 2019 2018 2017 2016 2015 2014 Other

All Journal Article Presentation Book

[Book] Physics of Surface, Interface and Cluster Catalysis2016
- Author(s)
  Hideaki Kasai, Mary Clare Sison Escano, Pedrag Lazic, Yuji Kunisada, Matthew T Darby, Simone Piccinin, Michail Stamataki, Nobuki Ozawa, Hiroshi Nakanishi
- Publisher
  IOP Publishing
- Data Source
  KAKENHI-PROJECT-26820029
[Journal Article] Cooperative Roles of Chemical Reactions and Mechanical Friction in Chemical Mechanical Polishing of Gallium Nitride Assisted by OH Radicals: Tight-Binding Quantum Chemical Molecular Dynamics Simulations2021
- Author(s)
  K. Kawaguchi, Y. Wang, J. Xu, Y. Ootani, Y. Higuchi, N. Ozawa, M. Kubo
- Journal Title
  
  Phys. Chem. Chem. Phys.
  
  Volume: 23 Issue: 7 Pages: 4075-4084
- DOI
  10.1039/d0cp05826b
- Peer Reviewed / Open Access / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K05380, KAKENHI-PROJECT-20K05147, KAKENHI-PROJECT-19H00734
[Journal Article] Atom-by-Atom and Sheet-by-Sheet Chemical Mechanical Polishing of Diamond Assisted by OH Radicals: A Tight-Binding Quantum Chemical Molecular Dynamics Simulation Study2021
- Author(s)
  Kawaguchi Kentaro、Wang Yang、Xu Jingxiang、Ootani Yusuke、Higuchi Yuji、Ozawa Nobuki、Kubo Momoji
- Journal Title
  
  ACS Applied Materials & Interfaces
  
  Volume: 13 Issue: 34 Pages: 41231-41237
- DOI
  10.1021/acsami.1c09468
- Peer Reviewed / Open Access / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19H00734, KAKENHI-PROJECT-20K05147
[Journal Article] ウルトラファインバブルを活用した化学機械研磨プロセスの反応分子動力学シミュレーション2021
- Author(s)
  尾澤伸樹，木村颯太，久保百司
- Journal Title
  
  Journal of the Japan Society for Abrasive Technology
  
  Volume: 65 Pages: 463-466
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20K05147
[Journal Article] Atomistic Mechanisms of Chemical Mechanical Polishing of a Cu Surface in Aqueous H2O2: Tight-Binding Quantum Chemical Molecular Dynamics Simulations2016
- Author(s)
  Kentaro Kawaguchi, Hiroshi Ito, Takuya Kuwahara, Yuji Higuchi, Nobuki Ozawa, and Momoji Kubo
- Journal Title
  
  ACS Applied Materials & Interfaces
  
  Volume: - Issue: 18 Pages: 11830-11841
- DOI
  10.1021/acsami.5b11910
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-26820029, KAKENHI-PROJECT-26249011, KAKENHI-PROJECT-15J02619
[Presentation] 反応分子動力学法に基づくウルトラファインバブルが窒化物半導体基板の CMPプロセスに与える影響の検討2021
- Author(s)
  尾澤伸樹，久保百司
- Organizer
  2021年度精密工学会春季大会
- Data Source
  KAKENHI-PROJECT-20K05147
[Presentation] ウルトラファインバブルの圧壊による窒化物半導体基板の酸化促進プロセス：反応力場分子動力学シミュレーション2020
- Author(s)
  尾澤伸樹，木村颯太，久保百司
- Organizer
  2020年度秋季大会
- Data Source
  KAKENHI-PROJECT-20K05147
[Presentation] 複数のナノバブルを用いたAlN基板の化学機械研磨における大規模分子動力学シミュレーション2019
- Author(s)
  木村颯太, 王楊, 宮崎成正, 大谷優介, 尾澤伸樹, 久保百司
- Organizer
  精密工学会2019年度秋季大会
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] Chemical Mechanical Polishing Process with Nanobubbles of Nitride Semiconductor Substrate: Molecular2019
- Author(s)
  Sota Kimura, Narumasa Miyazaki, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
- Organizer
  ITC2019
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] Nanobubble Collapse Simulation for Efficient Chemical Mechanical Polishing of Aluminum Nitride by Molecular2019
- Author(s)
  Sota Kimura, Narumasa Miyazaki, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
- Organizer
  Tribochemistry
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] Large-scale Molecular Dynamics Simulations on Chemical Mechanical Polishing Process of AlN Substrate with Nanobubbles2019
- Author(s)
  Sota Kimura, Wang Yang, Narumasa Miyazaki, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
- Organizer
  WINDS2019
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] Molecular Dynamics Simulations on Chemical Mechanical Polishing Process of Nitride Substrate with Nanobubble2019
- Author(s)
  Souta Kimura, Narumasa Miyazaki, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
- Organizer
  ICACC19
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] 反応力場分子動力学シミュレーションによる窒化物半導体基板のナノバブルを用いた化学機械研磨プロセスの検討2019
- Author(s)
  木村颯太, 宮崎成正, 大谷優介, 尾澤伸樹, 久保百司
- Organizer
  2019年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] 化学機械研磨プロセスにおけるマルチフィジックス現象の計算科学シミュレーションによる解明2018
- Author(s)
  尾澤伸樹, 久保百司
- Organizer
  第28回格子欠陥フォーラム
- Invited
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] Effects of Nanobubble Collapse on Precision Polishing : Molecular Dynamics Study2018
- Author(s)
  Yoshimasa Aoyama, Jingxiang Xu, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
- Organizer
  42nd International Conference and Expo on Advanced Ceramics and Composites
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] Molecular Dynamics Investigation for Chemical Effects of Nanobubble Collapse on Precision Polishing2018
- Author(s)
  Yoshimasa Aoyama, Jingxiang Xu, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
- Organizer
  Pacsurf2018
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] ナノバブル圧壊時に生じるジェット流が半導体基板研磨に及ぼす影響の分子動力学シミュレーション2018
- Author(s)
  青山義昌，許競翔，大谷優介，尾澤伸樹，久保百司
- Organizer
  2018年度精密工学会春季大会
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] Effects of Shockwave-Induced Nanobubble Collapse on Precision Polishing : Molecular Dynamics Study2018
- Author(s)
  Yoshimasa Aoyama, Jingxiang Xu, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
- Organizer
  the 9th Multiscale Materials Modeling
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] 計算科学手法を用いた窒化物半導体基板の化学機械研磨プロセスの検討2018
- Author(s)
  木村颯太, 青山義昌, 宮崎成正, 大谷優介, 尾澤伸樹, 久保百司
- Organizer
  トライボロジー会議2018秋
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] ナノバブルが半導体基板の精密研磨に与える影響：ナノバブル圧壊プロセスの分子動力学シミュレーション2017
- Author(s)
  青山義昌，許競翔，大谷優介，尾澤伸樹，久保百司
- Organizer
  トライボロジー会議2017秋
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] 計算科学手法を用いた GaN CMP における砥粒-基板間の化学反応機構の検討2017
- Author(s)
  五十嵐拓也, 河口健太郎, 大谷優介, 樋口祐次, 尾澤伸樹, 久保百司
- Organizer
  精密工学会2017年度春季大会
- Place of Presentation
  慶応義塾大学、横浜
- Year and Date
  2017-03-13
- Data Source
  KAKENHI-PROJECT-26820029
[Presentation] First-principles Calculations of High Efficiency Abrasive Grain for GaN Chemical Mechanical Polishing2017
- Author(s)
  Takuya Igarashi, Kentaro Kawaguchi, Yusuke Ootani, Takeshi Nishimatsu, Yuji Higuchi, Nobuki Ozawa, and Momoji Kubo
- Organizer
  41st International Conference and Expo on Advanced Ceramics and Composites
- Place of Presentation
  Hilton Daytona Beach Resort and Ocean Center, Daytona Beach, Florida, USA
- Year and Date
  2017-01-22
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26820029
[Presentation] Computational Analysis of Chemical Mechanical Polishing Process for GaN Substrate with Step Structure2017
- Author(s)
  Takuya Igarashi, Jingxiang Xu, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
- Organizer
  WINDS17
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] Polishing Simulation of Gallium Nitride Substrate Assisted by Chemical Reactions with Hydroxyl Radicals2017
- Author(s)
  Kentaro Kawaguchi, Yusuke Ootani, Takeshi Nishimatsu, Yuji Higuchi, Nobuki Ozawa, and Momoji Kubo
- Organizer
  41st International Conference and Expo on Advanced Ceramics and Composites
- Place of Presentation
  Hilton Daytona Beach Resort and Ocean Center, Daytona Beach, Florida, USA
- Year and Date
  2017-01-22
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26820029
[Presentation] 計算科学シミュレーションによる化学機械研磨プロセスにおけるマルチフィジックス現象の解明2017
- Author(s)
  尾澤伸樹, 河口健太郎, 久保百司
- Organizer
  精密工学会2017年度秋季大会
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] ステップを有するGaN基板モデルを用いた化学機械研磨プロセスの計算化学的検討2017
- Author(s)
  五十嵐拓也, 大谷優介, 尾澤伸樹, 久保百司
- Organizer
  精密工学会2017年度秋季大会
- Data Source
  KAKENHI-PROJECT-17K06110
[Presentation] 量子分子動力学シミュレーションによる単結晶ダイヤモンド基板研磨プロセスの検討2016
- Author(s)
  河口健太郎、樋口祐次、尾澤伸樹、久保百司
- Organizer
  2016年度精密工学会春季大会学術講演会
- Place of Presentation
  東京理科大学野田キャンパス、千葉
- Year and Date
  2016-03-15
- Data Source
  KAKENHI-PROJECT-26820029
[Presentation] 計算科学手法を用いたGaN CMPにおいて高い化学反応活性を有する研磨砥粒の検討2016
- Author(s)
  五十嵐拓也, 河口健太郎, 大谷優介, 西松毅, 樋口祐次, 尾澤伸樹, 久保百司
- Organizer
  2016年度精密工学会秋季大会学術講演会
- Place of Presentation
  茨城大学、水戸
- Year and Date
  2016-09-06
- Data Source
  KAKENHI-PROJECT-26820029
[Presentation] 量子化学計算を用いたGaNCMPにおけるOH ラジカルの量が化学反応および研磨プロセスに及ぼす影響の解明2015
- Author(s)
  河口健太郎、樋口祐次、尾澤伸樹、久保百司
- Organizer
  2015年度精密工学会秋季大会学術講演会
- Place of Presentation
  東北大学、川内北キャンパス
- Year and Date
  2015-09-04
- Data Source
  KAKENHI-PROJECT-26820029
[Presentation] Chemical Reactions at Friction Interface during Chemical Mechanical Polishing of Gallium Nitride Assisted by OH Radicals2015
- Author(s)
  Kentaro Kawaguchi, Yuji Higuchi, Nobuki Ozawa, and Momoji Kubo
- Organizer
  51st Symposium on Theoretical Chemisty
- Place of Presentation
  University of Potsdam, Potsdam, Germany
- Year and Date
  2015-09-20
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26820029
[Presentation] Atomic-Scale Removal Mechanisms during Chemical Mechanical Polishing of Gallium Nitride Assisted by OH Radicals: Computational Chemistry Approach2015
- Author(s)
  Kentaro Kawaguchi, Yuji Higuchi, Nobuki Ozawa, and Momoji Kubo
- Organizer
  1st European Conference on Physical and Theoretical Chemistry
- Place of Presentation
  Monastero dei Benedettini University of Catania, Catania, Italy
- Year and Date
  2015-09-14
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26820029
[Presentation] 計算科学によるナノ合金触媒と燃料電池システムの設計2014
- Author(s)
  尾澤伸樹
- Organizer
  第2回グリーンマテリアル研究会
- Place of Presentation
  東北大学青葉山キャンパス
- Year and Date
  2014-01-09
- Data Source
  KAKENHI-PROJECT-23760023
[Presentation] Chemical Mechanical Properties of Perovskite Oxide Abrasive Grain: First-Principles Approach
- Author(s)
  Nobuki Ozawa, Yuji Higuchi, Momoji Kubo
- Organizer
  International conference on Planarization/CMP Technology 2014
- Place of Presentation
  Kobe International Conference Center, Kobe, Japan
- Year and Date
  2014-11-19 – 2014-11-21
- Data Source
  KAKENHI-PROJECT-26820029
[Presentation] 分子動力学法による使用済みガラス研磨用セリア砥粒の再生シミュレーション
- Author(s)
  尾澤伸樹、周康、河口健太郎、樋口祐次、久保百司
- Organizer
  精密工学会2015年度春季大会
- Place of Presentation
  東洋大学白川キャンパス、東京
- Year and Date
  2015-03-17 – 2015-03-19
- Data Source
  KAKENHI-PROJECT-26820029
[Presentation] 計算科学シミュレーションによるシリを用いたα-Al2O3基板の化学機械研磨プロセスの検討カ砥粒
- Author(s)
  尾澤伸樹、會澤豪大、河口健太郎、樋口祐次、久保百司
- Organizer
  精密工学会2014年度秋季大会
- Place of Presentation
  鳥取大学鳥取キャンパス、鳥取
- Year and Date
  2014-09-16 – 2014-09-18
- Data Source
  KAKENHI-PROJECT-26820029

1. YOKOI TOSHIYUKI (00401125)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
2. 中坂佑太 (30629548)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
3. 大谷優介

# of Collaborated Projects: 0 results

# of Collaborated Products: 1 results
4. 久保百司

# of Collaborated Projects: 0 results

# of Collaborated Products: 1 results

Ozawa Nobuki 尾澤 伸樹

OZAW Nobuki 尾澤 伸樹

Research Projects

Research Products

Co-Researchers

Development of advanced zeolite catalysts based on retrosynthetic analysis

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

Development of Simulator for Super-Precision Machining by Nano-Bubbles based on Computational MethodPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

Development of Simulator for High Efficient Chemical Mechanical Polishing of Hard-to-Process Materials by Computational MethodPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Theoretical Design of Slurry for Chemical Mechanical Polishing by Computational SimulationPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Conduction Process of Anion in Alkaline Fuel Cell by Quantum Chemical Molecular Dynamics MethodPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

[Book] Physics of Surface, Interface and Cluster Catalysis2016

Author(s)

Publisher

Data Source

[Journal Article] Cooperative Roles of Chemical Reactions and Mechanical Friction in Chemical Mechanical Polishing of Gallium Nitride Assisted by OH Radicals: Tight-Binding Quantum Chemical Molecular Dynamics Simulations2021

Author(s)

Journal Title

DOI

Data Source

[Journal Article] Atom-by-Atom and Sheet-by-Sheet Chemical Mechanical Polishing of Diamond Assisted by OH Radicals: A Tight-Binding Quantum Chemical Molecular Dynamics Simulation Study2021

Author(s)

Journal Title

DOI

Data Source

[Journal Article] ウルトラファインバブルを活用した化学機械研磨プロセスの 反応分子動力学シミュレーション2021

Author(s)

Journal Title

Data Source

[Journal Article] Atomistic Mechanisms of Chemical Mechanical Polishing of a Cu Surface in Aqueous H2O2: Tight-Binding Quantum Chemical Molecular Dynamics Simulations2016

Author(s)

Journal Title

DOI

Data Source

[Presentation] 反応分子動力学法に基づくウルトラファインバブルが窒化物半導体基板の CMPプロセスに与える影響の検討2021

Author(s)

Organizer

Data Source

[Presentation] ウルトラファインバブルの圧壊による窒化物半導体基板の酸化促進プロセス ：反応力場分子動力学シミュレーション2020

Author(s)

Organizer

Data Source

[Presentation] 複数のナノバブルを用いたAlN基板の 化学機械研磨における大規模分子動力学 シミュレーション2019

Author(s)

Organizer

Data Source

[Presentation] Chemical Mechanical Polishing Process with Nanobubbles of Nitride Semiconductor Substrate: Molecular2019

Author(s)

Organizer

Data Source

[Presentation] Nanobubble Collapse Simulation for Efficient Chemical Mechanical Polishing of Aluminum Nitride by Molecular2019

Author(s)

Organizer

Data Source

[Presentation] Large-scale Molecular Dynamics Simulations on Chemical Mechanical Polishing Process of AlN Substrate with Nanobubbles2019

Author(s)

Ozawa Nobuki 尾澤伸樹

OZAW Nobuki 尾澤伸樹

[Journal Article] ウルトラファインバブルを活用した化学機械研磨プロセスの反応分子動力学シミュレーション2021

[Presentation] ウルトラファインバブルの圧壊による窒化物半導体基板の酸化促進プロセス：反応力場分子動力学シミュレーション2020

[Presentation] 複数のナノバブルを用いたAlN基板の化学機械研磨における大規模分子動力学シミュレーション2019