SHIKAMA Tomokazu 鹿間共一

Researcher Number	70206069
Other IDs
Affiliation (based on the past Project Information) *help	2016 – 2018: 香川高等専門学校, 電気情報工学科, 教授 2005: Takamatu national college of technology, Department of Electrical and computer engineering, Professor, 電気情報工学科, 教授 2004: 高松工業高等専門学校, 電気情報工学科, 助教授
Review Section/Research Field	Principal Investigator Electronic materials/Electric materials Except Principal Investigator Science education
Keywords	Principal Investigator grain size / zinc oxide / atmospheric pressure cold plasma / 結晶粒径 / 酸化亜鉛 / 大気圧低温プラズマ Except Principal Investigator 電子デバイス・機器 / リソグラフィー / バイポーラトランジスタ / MOS FET … More / pn接合 / Sol Gel / 教育 / 簡素化 / 集積回路 / ｐｎ接合 / Sol-Geｌ / デバイス / プロセス / リソグラフィ / 工学教育 / p-n接合 / 熱拡散 / Sol-Gel Less

A nanotechnology platform established in average science laboratories
- Principal Investigator
  
  Nagaoka Shiro
- Project Period (FY)
  2016 – 2018
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Science education
- Research Institution
  Kagawa National College of Technology
Effect of deposition rate on ZnO films made by an atmospheric pressure cold plasma generatorPrincipal Investigator
- Principal Investigator
  
  SHIKAMA Tomokazu
- Project Period (FY)
  2004 – 2005
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Takamatu national college of technology

All 2019 2018 2017 2016

All Journal Article Presentation

[Journal Article] Removal of Polymers for KrF and ArF Photoresist Using Hydrogen Radicals Containing a Small Amount of Oxidizing Radicals2018
- Author(s)
  M. Yamamoto, T. Taki, T. Sunada, T. Shikama, S. Nagaoka, H. Umemoto　and H. Horibe
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 31(3) Pages: 419-424
- NAID
  130007481491
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K00992
[Journal Article] Proposal for Reducing Pattern Position Alignment Error of A Simplified Photo Lithography Method for Education2018
- Author(s)
  S. Nagaoka, M. Yamamoto, T. Tsuji, K. Matsuda, T. Shimizu, R. W. Johnston, T. Shikama, F. Shimokawa and H. Horibe
- Journal Title
  
  The Proceedings of 12th Internationa Symposium on Advances in Technology Education
  
  Volume: 1 Pages: 512-517
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K00992
[Journal Article] Pressure Dependence of Photoresist Removal Rate Using Hydrogen Radicals2017
- Author(s)
  M. Yamamoto, T. Shiroi, S. Nagaoka, T. Shikama, H. Umemoto, K. Ohdaira, T. Nishiyama and H. Horibe
- Journal Title
  
  . Photopolym. Sci. Technol.
  
  Volume: 30(3) Pages: 297-301
- NAID
  130005950262
- Peer Reviewed / Open Access / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K00992
[Journal Article] Fundamental Study of the Simplified Micro Diffusion Bipolar Transistor as the Educational Resource2017
- Author(s)
  S. Nagaoka, M. Yamamoto, T. Tsuji, T. Shimizu, R. W. Johnston, H. Horibe, F. Shimokawa,T. Shikama and M. Rusop
- Journal Title
  
  Transactions of ISATE 2017 The 11th International Symposium on Advances in Technology Education
  
  Volume: 1 Pages: 275-279
- Peer Reviewed / Open Access / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K00992
[Journal Article] A feasibility study of the selective and simultaneous thermal impurity diffusion process on the silicon substrate2016
- Author(s)
  西園寺嶺，長岡史郎，辻琢人，山本雅史，R.W.Johnston,清水共，鹿間共一
- Journal Title
  
  The Proceeding of the 6th International Symposium on Technology for Sustainability (ISTS2016) & 2nd International Students Seminar on Leadership and Networking (ISSLN 2016)
  
  Volume: - Pages: 166-171
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-16K00992
[Journal Article] A proposal of the Simplified IC Fab Establishied in the Average Science Laboratory for Cultivating Scientific Mind2016
- Author(s)
  長岡史郎，辻琢人，山本雅史，R.W.Johnston，清水共，鹿間共一
- Journal Title
  
  The Transactons of ISATE2016, The 10th International Symposium on Advances in Technology Education
  
  Volume: - Pages: 13-16
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-16K00992
[Journal Article] A Study of the Simplified IC FAB for the Science and Technical Education2016
- Author(s)
  高垣信巨，長岡史郎，辻琢人，山本雅史，R.W.Johnston,清水共，鹿間共一
- Journal Title
  
  The Proceeding of the 6th International Symposium on Technology for Sustainability (ISTS2016) & 2nd International Students Seminar on Leadership and Networking (ISSLN 2016)
  
  Volume: - Pages: 161-165
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] ffect of Oxygen Addition on Rate of Photoresist Removal Using Hydrogen Radicals Produced by a Tungsten Hot-Wire Catalyst2019
- Author(s)
  M. Yamamoto, T. Shiroi, T. Shikama, S. Nagaoka, H.Umemoto, and H. Horibe
- Organizer
  The 10th International Conference on Nanoscience and Nanotechnology 2019 (NANO-SciTech 2019)
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] Photoresist Removal Using Hydrogen Radicals Produced by Tantalum Hot- Wire Catalyst2018
- Author(s)
  M. Yamamoto, T. Shiroi, T. Shikama, S. Nagaoka, and H. Horibe
- Organizer
  9th International Conference on Nanoscience and Nanotechnology 2018, (Nano-SciTech2018)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] 酸素を微量添加した水素ラジカルを用いたKrF/ArFレジスト用ベースポリマーの除去2018
- Author(s)
  1)山本雅史，砂田拓人，滝智洋，鹿間共一，長岡史郎，梅本宏信，堀邊英夫
- Organizer
  第35回国際フォトポリマーコンファレンス（千葉）
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] A Proposal of Totally Simplified Educational Semiconductor Device Fabrication Process under Normal Air Environment2018
- Author(s)
  S.Nagaoka,M.Yamamoto,T.Tsuji,T.Shimizu,R.W.Johnston, T. Shikama, and H.Horibe
- Organizer
  9th International Conference on Nanoscience and Nanotechnology 2018, (Nano-SciTech2018)
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] Product of the Decomposition in Photoresist Removal using Hydrogen Radicals2018
- Author(s)
  M. Yamamoto, H. Umemoto, S. Nagaoka, T. Shikama, and H. Horibe
- Organizer
  The 14th Eco-Energy and Materials Science and Engineering Symposium (EMSES 2018)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] Products Of The Decomposition In Photoresist Removal Using Hydrogen Radicals2018
- Author(s)
  M.Yamamoto, H.Umemoto, S.Nagaoka, T.Shikama and H.Horibe
- Organizer
  The 14th Eco-Energy and Materials Science and Engineering Symposium
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] Flow Rate Dependence of Resist Removal Rate Using Hydrogen Radicals2018
- Author(s)
  T. Shiroi, M. Yamamoto, T. Shikama, S. Nagaoka, and H. Horibe
- Organizer
  9th International Conference on Nanoscience and Nanotechnology 2018, (Nano-SciTech2018)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] 水素ラジカルを用いたレジスト除去における除去速度の圧力依存性2017
- Author(s)
  城井智弘，山本雅史，長岡史郎，鹿間共一，梅本宏信，大平圭介，西山聖，堀邊英夫
- Organizer
  第64回応用物理学会春季学術講演会（東京）
- Place of Presentation
  パシフィコ横浜，神奈川県
- Year and Date
  2017-03-14
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] A p-n Junction Study for nMOS FET Fabrication using Alignment-less Lithography2017
- Author(s)
  高垣信巨，長岡史郎，辻琢人，山本雅史，R.W.Johnston,清水共，鹿間共一
- Organizer
  NANO-SciTech2017, International Conference on Nanoscience & Nanotechnology 2017
- Place of Presentation
  Institute of Business Excellence (IBE), Universiti Teknologi MARA (UiTM),Malaysia
- Year and Date
  2017-02-24
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] A Boron Selective Thermal Impurity Diffusion Method that Support a Simplified pMOS FET Fabrication Process2017
- Author(s)
  西園寺嶺，長岡史郎，辻琢人，山本雅史，R.W.Johnston,清水共，鹿間共一
- Organizer
  NANO-SciTech2017, International Conference on Nanoscience & Nanotechnology 2017
- Place of Presentation
  Institute of Business Excellence (IBE), Universiti Teknologi MARA (UiTM),Malaysia
- Year and Date
  2017-02-24
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] Measurement of Rate of Photoresist Removal by Hydrogen Radicals using Thin Film Interference2017
- Author(s)
  山本雅史，長岡史郎，鹿間共一，堀邊英夫，清水共
- Organizer
  NANO-SciTech2017, International Conference on Nanoscience & Nanotechnology 2017
- Place of Presentation
  Institute of Business Excellence (IBE), Universiti Teknologi MARA (UiTM), Malaysia
- Year and Date
  2017-02-24
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] 水素ラジカルを用いたレジスト除去における酸素添加の効果2016
- Author(s)
  山本雅史,梅本宏信,大平圭介,鹿間恭一,長岡史郎,西山聖,堀邊英夫
- Organizer
  2016年度応用物理学会中四国支部若手半導体研究会
- Place of Presentation
  加計学園前島研修所, 岡山県
- Year and Date
  2016-07-29
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] A Study of the Simplified IC FAB for the Science and Technical Education2016
- Author(s)
  高垣信巨，長岡史郎，辻琢人，山本雅史，R.W.Johnston,清水共，鹿間共一
- Organizer
  the 6th International Symposium on Technology for Sustainability (ISTS2016) & 2nd International Students Seminar on Leadership and Networking (ISSLN 2016)
- Place of Presentation
  Vocational College Universitas Gadjah MADA, Indonesia
- Year and Date
  2016-10-04
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] A feasibility study of the selective and simultaneous thermal impurity diffusion process on the silicon substrate2016
- Author(s)
  西園寺嶺，長岡史郎，辻琢人，山本雅史，R.W.Johnston,清水共，鹿間共一
- Organizer
  The 6th International Symposium on Technology for Sustainability (ISTS2016) & 2nd International Students Seminar on Leadership and Networking (ISSLN 2016)
- Place of Presentation
  Vocational College Universitas Gadjah MADA, Indonesia
- Year and Date
  2016-10-04
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K00992
[Presentation] A proposal of the Simplified IC Fab Establishied in the Average Science Laboratory for Cultivating Scientific Mind2016
- Author(s)
  長岡史郎，辻琢人，鹿間共一，山本雅史，R.W.Johnsotn，清水共
- Organizer
  The 10th International Symposium on Advances in Technology Education
- Place of Presentation
  School of Engineering, TOHOKU University, Miyagi Japan
- Year and Date
  2016-09-13
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K00992

1. SUZAKI Yoshifumi (60206456)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
2. KOINUMA Hideomi (70011187)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
3. Nagaoka Shiro (30300635)

# of Collaborated Projects: 1 results

# of Collaborated Products: 22 results
4. 堀邊英夫 (00372243)

# of Collaborated Projects: 1 results

# of Collaborated Products: 14 results
5. 下川房男 (90580598)

# of Collaborated Projects: 1 results

# of Collaborated Products: 2 results
6. 山本雅史 (60733821)

# of Collaborated Projects: 1 results

# of Collaborated Products: 22 results
7. 清水共 (40455168)

# of Collaborated Projects: 1 results

# of Collaborated Products: 9 results
8. JOHNSTON ROBERT (60743698)

# of Collaborated Projects: 1 results

# of Collaborated Products: 10 results

SHIKAMA Tomokazu 鹿間 共一

Research Projects

Research Products

Co-Researchers

A nanotechnology platform established in average science laboratories

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Effect of deposition rate on ZnO films made by an atmospheric pressure cold plasma generatorPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

[Journal Article] Removal of Polymers for KrF and ArF Photoresist Using Hydrogen Radicals Containing a Small Amount of Oxidizing Radicals2018

Author(s)

Journal Title

NAID

Data Source

[Journal Article] Proposal for Reducing Pattern Position Alignment Error of A Simplified Photo Lithography Method for Education2018

Author(s)

Journal Title

Data Source

[Journal Article] Pressure Dependence of Photoresist Removal Rate Using Hydrogen Radicals2017

Author(s)

Journal Title

NAID

Data Source

[Journal Article] Fundamental Study of the Simplified Micro Diffusion Bipolar Transistor as the Educational Resource2017

Author(s)

Journal Title

Data Source

[Journal Article] A feasibility study of the selective and simultaneous thermal impurity diffusion process on the silicon substrate2016

Author(s)

Journal Title

Data Source

[Journal Article] A proposal of the Simplified IC Fab Establishied in the Average Science Laboratory for Cultivating Scientific Mind2016

Author(s)

Journal Title

Data Source

[Journal Article] A Study of the Simplified IC FAB for the Science and Technical Education2016

Author(s)

Journal Title

Data Source

[Presentation] ffect of Oxygen Addition on Rate of Photoresist Removal Using Hydrogen Radicals Produced by a Tungsten Hot-Wire Catalyst2019

Author(s)

Organizer

Data Source

[Presentation] Photoresist Removal Using Hydrogen Radicals Produced by Tantalum Hot- Wire Catalyst2018

Author(s)

Organizer

Data Source

[Presentation] 酸素を微量添加した水素ラジカルを用いたKrF/ArFレジスト用ベースポリマーの除去2018

Author(s)

Organizer

Data Source

[Presentation] A Proposal of Totally Simplified Educational Semiconductor Device Fabrication Process under Normal Air Environment2018

Author(s)

Organizer

Data Source

[Presentation] Product of the Decomposition in Photoresist Removal using Hydrogen Radicals2018

Author(s)

Organizer

Data Source

[Presentation] Products Of The Decomposition In Photoresist Removal Using Hydrogen Radicals2018

Author(s)

Organizer

Data Source

[Presentation] Flow Rate Dependence of Resist Removal Rate Using Hydrogen Radicals2018

Author(s)

Organizer

Data Source

[Presentation] 水素ラジカルを用いたレジスト除去における除去速度の圧力依存性2017

Author(s)

Organizer

Place of Presentation

Year and Date

Data Source

SHIKAMA Tomokazu 鹿間共一