WATANABE Takeo 渡邊健夫

… Alternative Names

渡邊健夫ワタナベタケオ

渡辺健夫ワタナベタケオ

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Researcher Number	70285336
Other IDs
External Links
Affiliation (Current)	2025: 兵庫県立大学, 高度産業科学技術研究所, 特任教授
Affiliation (based on the past Project Information) *help	2014 – 2017: 兵庫県立大学, 高度産業科学技術研究所, 教授 2010 – 2013: 兵庫県立大学, 高度産業科学技術研究所, 准教授 2004 – 2005: 兵庫県立大学, 高度産業科学技術研究所, 助手 2003: 姫路工業大学, 高度産業科学技術研究所, 助手 2001: 姫路工業大学, 高度産業化学技術研究所, 助教授 1999 – 2001: 姫路工業大学, 高度産業科学技術研究所, 助手
Review Section/Research Field	Principal Investigator Electron device/Electronic equipment Except Principal Investigator Quantum beam science / Applied optics/Quantum optical engineering / Applied optics/Quantum optical engineering
Keywords	Principal Investigator EUVリソグラフィ / 感度 / 半導体微細加工 / レジスト / 極端紫外線リソグラフィ / 軟Ｘ線吸収分光 / 高感度 / 金属レジスト / 化学増幅系レジスト / 非化学増幅系レジスト … More / 軟X線光電子分光 / アウトガス / LWR / 解像度 / EUVレジスト / 干渉霞光 / レジス / 微細加工技術 / 半導体 / line edge roughness / 化学増幅系 / 干渉露光 / 微細プロセス技術 … More Except Principal Investigator 多層膜 / 軟X線 / 軟X線光学定数 / 偏光 / 軟Ｘ線 / PMMA / フォトダイオード / 反射率 / フィルター / 極端紫外線 / フォトレジスト / 吸収係数 / 透過率 / 光学定数 / Multilayer coating / Mirau Interferometer / Phase defect / Defect Inspection / EUV Lithography / Extreme Ultraviolet / X-ray microscope / ミラウ干渉計 / EUVリソグラフィー / 軟X線位相差顕微鏡 / ミラウ干渉 / 位相欠陥 / 欠陥検査 / EUVリソグラフィ / X線顕微鏡 / Wavefront error / Point Diffraction Interferometer / Lithography / Multilayer / Thin Film / Aspherical / Optical Element / Soft X-Rays / 表面粗さ / 内部応力 / X線 / 波面収差 / 点回折干渉法 / リソグラフィ / 薄膜 / 非球面 / 光学素子 Less

Precise measurement of optical constants of thin films in soft X-ray region
- Principal Investigator
  
  Kinoshita Hiroo
- Project Period (FY)
  2015 – 2017
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Quantum beam science
- Research Institution
  University of Hyogo
Development of 1X nm EUV Resist with high sensitivity and Low LWRPrincipal Investigator
- Principal Investigator
  
  Watanabe Takeo
- Project Period (FY)
  2013 – 2015
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Electron device/Electronic equipment
- Research Institution
  University of Hyogo
Resist pattern replication using EUV interference lithography for 20 nm and belowPrincipal Investigator
- Principal Investigator
  
  WATANABE Takeo
- Project Period (FY)
  2010 – 2012
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Electron device/Electronic equipment
- Research Institution
  University of Hyogo
Observation of surface nano- structure using EUV phase shift microscope
- Principal Investigator
  
  KINOSHITA Hiroo
- Project Period (FY)
  2003 – 2005
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Applied optics/Quantum optical engineering
- Research Institution
  Laboratory of Advanced Science and Technology for Industry, University of Hyougo
  Himeji Institute of Technology
Fabrication of aspherical surfaces for soft X-Ray optical elements by means of Deposition techniques
- Principal Investigator
  
  NIIBE Masahito
- Project Period (FY)
  1999 – 2001
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Applied optics/Quantum optical engineering
- Research Institution
  Himeji Institute of Technology

[Book] フォトポリマー懇話会、ニュースレター2015
- Author(s)
  渡邊健夫、共著
- Total Pages
  8
- Publisher
  フォトポリマー懇話会
- Data Source
  KAKENHI-PROJECT-25289106
[Book] レジストプロセスの最適化テクニック2011
- Author(s)
  渡邊健夫, 他
- Publisher
  情報機構
- Data Source
  KAKENHI-PROJECT-22360146
[Book] レジストプロセスの最適化テクニック、～微細化・トラブル解消のための工程別対策および材料技術～2011
- Author(s)
  渡邊健夫
- Total Pages
  557
- Publisher
  情報機構
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Absorption Coefficient Measurement Advanced Method of EUV Resist by Direct-Resist Coating on a Photodiode2017
- Author(s)
  S. Niihara, D. Mamezaki, M. Watanabe, T. Harada, and T. Watanabe
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 30 Issue: 1 Pages: 87-92
- DOI
  10.2494/photopolymer.30.87
- NAID
  130005950331
- ISSN
  0914-9244, 1349-6336
- Language
  English
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-15H03592
[Journal Article] Development of a reflectometer for a large EUV mirror in NewSUBARU2015
- Author(s)
  Haruki Iguchi, Hiraku Hashimoto, Masaki Kuki, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  Proc. SPIE
  
  Volume: 9658 Pages: 965819-965819
- Open Access
- Data Source
  KAKENHI-PROJECT-15H03592
[Journal Article] Development of Transmission Grating for EUV Interference Lithography of 1X nm HP2015
- Author(s)
  Tsubasa Fukui, Hirohito Tanino, Yuki Fukuda, Takeo Watanabe, Hiroo Kinoshita and Tetsuo Harada
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 28 Pages: 525-529
- NAID
  130005101110
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Development of High=Reflective W/Si-multilayer Diffraction Grating for the Analysis of Fluorine Materials2015
- Author(s)
  Makaski Kuki, Tomoyuki Uemura, Masato Yamaguchi, Testuo Harada, Takeo Watanabe, Yasuji Muramatsu and Hiroo Kinoshita
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 28 Pages: 530-536
- NAID
  130005101111
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Development of element technologies for EUVL2015
- Author(s)
  Hiroo Kinoshita, Takeo Watanabe and Tetsuo Harada
- Journal Title
  
  Adv. Opt. Techn
  
  Volume: 4(4) Pages: 319-331
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-15H03592
[Journal Article] (169)EUV Resist Chemical Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity　Achievement2014
- Author(s)
  Kazuya Emura, Takeo Watanabe, Masato Yamaguchi, Hirohito Tanino,Tsubasa Fukui, Daiju Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 27 Pages: 631-638
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Study of Acid Diffusion Behaviors of PAG by Using Top Coat Method for EUVL2014
- Author(s)
  Atsushi Sekiguchi, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 27 Pages: 623-629
- NAID
  130004691094
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] EUV Resist Chemical Reaction Analysis using SR2013
- Author(s)
  Takeo Watanabe, Kazuya Emura, Daiji Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada and Hiroo Kinoshita
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 26 Pages: 635-642
- NAID
  130004465045
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Comparison of Resist Family Outgassing Characterization between EUV and EB2013
- Author(s)
  Isamu Takagi, Toshiya Takahashi, Norihiko Sugie, Kazuhiro Katayam, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichiro Inoue, Takeo Watanabe, Tetsuo Harada and Hiroo Kinoshita
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 26 Pages: 673-678
- NAID
  130004465050
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Development of Tool for Contamination Layer Thickness Measurement Using High Power Extreme Ultraviolet Light and in Situ Ellipsometer2013
- Author(s)
  Takeo Watanabe, Yukiko Kikuchi, Toshiya Takahashi, Kazuhiro Katayama, Isamu Takagi, Norihiko Sugie, Hiroyuki Tanaka, Eishi Shiobara, Soichi Inoue, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 52 Issue: 5R Pages: 056701-056701
- DOI
  10.7567/jjap.52.056701
- NAID
  210000142182
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Comparison of Resist Outgassing Characterization between High Power EUV and EB2012
- Author(s)
  Norihiko Sugie, Toshiya Takahashi, Kazuhiro Katayama, Isamu Takagi, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 25 Pages: 617-624
- NAID
  130004833488
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Chemical Reaction Analysis of EUV CA Resist using SR Absorption Spectroscopy2012
- Author(s)
  Takeo Watanabe
- Journal Title
  
  J. Photopolymer Sci. Technol
  
  Volume: 25 Pages: 569-574
- NAID
  130004833480
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Extreme Ultraviolet (EUV)-Resist Material Based on Noria (Water Wheel-like Macrocycle) Derivatives with Pendant Alkoxyl and Adamantyl Ester Groups2012
- Author(s)
  Hiroto Kudo, Nobumitsu Niina, Tomoharu Sato, Hiroaki Oizumi, Toshiro Itani, Takuro Miura, Takeo Watanabe and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 25 Pages: 587-592
- NAID
  130004833483
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] EUV リソグラフィ研究開発センターにおけるリソグラフィ開発2012
- Author(s)
  渡邊健夫、原田哲男、木下博雄
- Journal Title
  
  クリーンテクノロジー
  
  Volume: 22 Pages: 1-5
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Chemical Reaction Analysis of EUV CA Resist using SR Absorption Spectroscopy2012
- Author(s)
  Takeo Watanabe, Yuichi Haruyama, Daiju Shiono, Kazuya Emura, Takuro Urayama, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 25 Pages: 569-574
- NAID
  130004833480
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] EUV Interference Lithography for 1X nm2011
- Author(s)
  Takuro Urayama, Takeo Watanabe, Yuya Yamaguchi, Naohiro Matsuda, Yasuyuki Fukushima, Takafumi Iguchi, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 23 Pages: 681-686
- NAID
  130004833387
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Development of interference lithography for 22 nm node and below2011
- Author(s)
  Yasuyuki Fukushima, Yuya Yamaguchi, Takafumi Iguchi, Takuro Urayama, Tetsuo Harada, Takeo Watanabe and Hiroo Kinoshita
- Journal Title
  
  Microelectric Engineering
  
  Volume: 88 Pages: 1944-1947
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] elationships between EUV resist outgassing and contamination deposition at Selete2011
- Author(s)
  Hiroaki Oizumi, Kazuyuki Matsumaro, Satoshi Nomura, Julius Joseph Santillan, Toshiro Itani, Takeo Watanabe, Naohiro Matsuda, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  Proc. SPIE
  
  Volume: 7969
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Transmission Grating Fabrication for Replicating Resist Patterns of 20 nm and Below2011
- Author(s)
  Yuya Yamaguchi, Yasuyuki Fukushima, Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 50
- NAID
  210000070661
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] In-situ Contamination Thickness Measurement by Novel Resist Evaluation System at NewSUBARU2011
- Author(s)
  Naohiro Matsuda, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita, Hiroaki Oizumi, and Toshiro Itani
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 50
- NAID
  210000070653
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] EUVレジスト材料開発の現状と将来展望について、先端リソグラフィの展望2010
- Author(s)
  渡邊健夫、木下博雄
- Journal Title
  
  第19回光反応・電子用材料研究会講座講演予稿集、高分子学会
  
  Pages: 14-17
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Fundamental Decomposition Analysis of Chemically Amplified Molecular Resist for below 22 nm Resolution2010
- Author(s)
  aiju Shiono, Hideo Hada, Kazufumi Sato, Yasuyuki Fukushima, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 23 Pages: 649-656
- NAID
  130004464848
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] EUV interference lithography for 22 nm node and below2010
- Author(s)
  Yasuyuki Fukushima, Yuya Yamaguchi, Teruhiko Kimura, Takafumi Iguchi, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 23 Pages: 673-680
- NAID
  130004464851
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Decomposition and Roughness Analysis of Chemically Amplified Molecular Resist for Reducing LWR2010
- Author(s)
  Daiju Shiono, Hideo Hada, Kazufumi Sato, Yasuyuki Fukushima, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 49
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Fabrication process of EUV -IL transmission grating2010
- Author(s)
  Yuya Yamaguchi, Yakusyuki Fukushima, Takafumi Iguchi, Hiroo Kinoshita, Tetsuo Harada, and Takeo Watanabe
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 23 Pages: 681-386
- NAID
  130004464852
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Development of Extreme Ulytaviolet Interference Lithography System2010
- Author(s)
  Y. Fukushima, Naqoki. Sakagami, Teruhiko Kimura, Yoshito Kamaji, Takafumi Iguchi, Y. Yamaguchi, Masaki Tada, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 49
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Phase defect observation using an EUV microscope2008
- Author(s)
  K.Hamamoto, Y.Tanaka, N.Sakaya, T.shoki, T.Watanabe, H.Kinoshita
- Journal Title
  
  SPIE
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Reducing off Hyderocarbon Contaminations for EUVL2005
- Author(s)
  Y.Tanaka, K.Hamamoto, T.watanabe, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys 44, 7B
  
  Pages: 5547-5551
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Actinic Mask Inspection Using an EUV Microscope -Preparation of a Mirau Interferometer for Phase-defect Detection-2005
- Author(s)
  K.Hamamoto, Y.Tanaka, H.Kawashima, S.Y.Lee, N.Hosokawa, N.Sakaya, M.Hosoya, T.Shoki, T.Watanabe, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys. 44
  
  Pages: 5474-5478
- NAID
  10016677217
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Outgassing Characteristics of Low-Molecular-Weight Resist for EUVL2005
- Author(s)
  H.Hada, T.Hirayama, D.Shino, T.Watanabe, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys 44, 7B
  
  Pages: 5824-5828
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Novel Resist Evaluation System for EUV Resist2005
- Author(s)
  T.Watanabe, H.Kinoshita, N.Sakaya, T.Shoki, S.Y.Lee
- Journal Title
  
  Jpn.J.Appl.Phys. 44
  
  Pages: 5556-5559
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Reducing off Hydrocarbon Contaminants for EUVL2005
- Author(s)
  Y.Tanaka, K.Hamamoto, H.Tsubakino, T.Watanabe, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys. 44
  
  Pages: 5547-5551
- NAID
  10016677385
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Development of Beam Splitter Using Multilayer Membrane for Extreme Ultraviolet Phase-Shift Microscopes2005
- Author(s)
  N.Hosokawa, T.Watanabe, N.Sakaya, T.Shoki, K.Hamamoto, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys. 44
  
  Pages: 5540-5543
- NAID
  10016677365
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Cleaning of extreme ultraviolet lithography optics and masks using 13.5 nm and 172 nm radiation2005
- Author(s)
  K.Hamamoto, Y.Tanaka, T.Watanabe, N.Sakaya, M.Hosoya, T.Shoki, H.Hada, N.Hishinuma, H.Sugahara, H.Kinoshita
- Journal Title
  
  J.Vac.Sci.Technol. B23
  
  Pages: 247-251
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] 光ファイバーを用いた点回折干渉計に関する研究(第2報) コヒーレント長が測定精度に及ぼす影響2005
- Author(s)
  格内敏, 木下博雄, 渡邊健夫, 坂本亨
- Journal Title
  
  精密工学会誌第71巻第8号
  
  Pages: 1031-1035
- NAID
  10016679113
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Mask Defect Inspection using EUV Microscope2005
- Author(s)
  K.Hamamoto, Y.Tanaka, S.Y.Lee, N.Hosokawa, N.Sakaya, M.Hosoya, T.Shoki, T.Watanabe, H.Kinoshita
- Journal Title
  
  J.Vac.Sci.Technol. 23,6B
  
  Pages: 2852-2855
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Development of Beam Splitter Using Multilayer Membrane For Extreme Ultraviolet Ohase-shift Microscopes2005
- Author(s)
  N.Hosokawa, K.Hamamoto, Y.Tanaka, T.Watanabe, N.Sakaya, M.Hosoya, T.Shoki, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys 44, 7B
  
  Pages: 5540-5543
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Novel resist evaluation system for EUV resist2005
- Author(s)
  T.Watanabe, H.Kinoshita, N.Sakaya, T.Shoki, S.Y.Lee
- Journal Title
  
  Jpn.J.Appl.Phys 44, 7B
  
  Pages: 5556-5559
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Actinic Mask Inspection Using an EUV Microscope2005
- Author(s)
  K.Hamamoto, Y.Tanaka, T.Watanabe, N.Sakaya, M.Hosoya, T.Shoki, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys 44, 7B
  
  Pages: 5474-5478
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] マグネシウムおよびマグネシウム合金のガス放出特性2005
- Author(s)
  田中弓弦, 木下博雄, 渡邊健夫, 劉莉, 椿野晴繁
- Journal Title
  
  軽金属 55-9
  
  Pages: 412-413
- NAID
  130004481784
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] 光ファイバーを用いた点回折干渉計に関する研究2005
- Author(s)
  格内敏, 木下博雄, 渡邊健夫, 坂本亨
- Journal Title
  
  精密工学会誌 71-8
  
  Pages: 1031-1035
- NAID
  110001373589
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] マグネシウムおよびマグネシウム合金のガス放出特性2005
- Author(s)
  田中弓弦, 木下博雄, 渡邊健夫, 劉莉, 椿野晴繁
- Journal Title
  
  軽金属 55,9
  
  Pages: 412-413
- NAID
  130004481784
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Cleaning of extreme ultraviolet lithography optics and masks using 13.5 nm and 172 nm radiation2005
- Author(s)
  K.Hamamoto, Y.Tanaka, T.Watanabe, N.Sakaya, M.Hosoya, T.Shoki, H.Hada, N.Hishinuma, H.Sugahara, H.Kinoshita
- Journal Title
  
  J.Vac.Sci.Technol. B23-1
  
  Pages: 247-251
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Development of fast photospeed chemically amplified resist in EUVL2005
- Author(s)
  T.Watanabe, H.Kinoshita, N.Sakaya, T.Shoki, S.Y.Lee
- Journal Title
  
  Jpn.J.Appl.Phys 44, 7B
  
  Pages: 5866-5870
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Mask Defect Inspection using EUV Microscope2005
- Author(s)
  K.Hamamoto, Y.Tanaka, S.Y.Lee, T.Watanabe, H.Kinoshita
- Journal Title
  
  J.Vac.Sci.Technol 23-6
  
  Pages: 2852-2855
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Reducing off Hyderocarbon Contaminations for EUVL2005
- Author(s)
  Y.Tanaka, K.Hamamoto, T.Watanabe, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys 44, 7B
  
  Pages: 5547-5551
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography,2005
- Author(s)
  H.Hideo, T.Hirayama, D.Shiono, J.Onodera, T.Watanabe, S.Y.Lee, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys. 44
  
  Pages: 5824-5828
- NAID
  10016678315
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Development of Fast Photospeed Chemically Amplified Resist in EUV Lithography,2005
- Author(s)
  T.Watanabe, H.Hada, S.Y.Lee, H.Kinoshita, K.Hamamoto, H.Komano
- Journal Title
  
  Jpn.J.Appl.Phys. 44
  
  Pages: 5866-5870
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Actinic mask metrology for extreme ultraviolet lithography2004
- Author(s)
  H.Kinoshita, T.Haga, K.Hamamoto, S.Takada, N.Kazui, S.Kakunai, H.Tsubakino, T.Shoki, M.Endo, T.Watanabe
- Journal Title
  
  J.Vac.Sci.Technol. B22(1)
  
  Pages: 264-267
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Mitigation of Low Outgassing and Small Line Edge roughness for EUVL Resist2004
- Author(s)
  T.Watanabe, H.Kinoshita, K.Hamamoto, H.Hada, H.Komano
- Journal Title
  
  J.Photopolym.Sci.Technol. 17,3
  
  Pages: 361-366
- NAID
  40006276558
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Mitigation of Low Outgassing and Small Line Edge Roughness for EUVL Resist2004
- Author(s)
  T.Watanabe, H.Kinoshita, K.Hamamoto, H.Hada, H.Komano
- Journal Title
  
  J.Photopolym.Sci.Technol. 17
  
  Pages: 361-366
- NAID
  40006276558
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Mitigation of Low Outgassing and Small Line Edge Roughness for EUVL Resist2004
- Author(s)
  T.Watanabe, H.Kinoshita, K.Hamamoto, H.Hada, H.Komano
- Journal Title
  
  J.Photopolym.Sci.Technol. 17,3
  
  Pages: 361-366
- NAID
  40006276558
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Resist Outgassing Characteristics in EUVL2004
- Author(s)
  F.Watanabe, K.Hamamoto, H.Kinoshita, H.hada, H.Komano
- Journal Title
  
  Jpn.J.Appl.Phys 43
  
  Pages: 3713-3717
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Outgassing Characteristics of Structural Materials and the Removal of Contaminants from EUVL Masks using 172-nm Radiation2004
- Author(s)
  K.Hamamoto, Y.Tanaka, T.Watanabe, N.Sakaya, M.Hosoya, T.Shoki, H.Sugahara, N.Hishinuma, H.Hada, H.Kinoshita
- Journal Title
  
  J.Photopolym.Sci.Technol. 17
  
  Pages: 367-372
- NAID
  130004464356
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Resist Outgassing Charateristics in EUVL2004
- Author(s)
  T.Watanabe, K.Hamamoto, H.Kinoshita, H.hada, H.Komano
- Journal Title
  
  Jpn.J.Appl.Phys 43
  
  Pages: 3713-3717
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Resist Outgassing Characteristics in Extreme Ultraviolet Lithography,2004
- Author(s)
  T.Watanabe, K.Hamamoto, H.Kinoshita, H.Hada, H.Komano
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 3713-3717
- NAID
  10013275620
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Actinic Mask Inspection Using EUV Microscope2004
- Author(s)
  H.Kinoshita, T.Haga, K.Hamamoto, S.Takada, N.Kazui, S.Kakunai, H.Tsubakino, T.Shoki, M.Endo, T.Watanabe
- Journal Title
  
  J.Vac.Sci.Technol. B22
  
  Pages: 264-267
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Outgassing Characteristics of Structural Materials and the Removal of Contaminants from EUVL Masks using 172-nm Radiation2004
- Author(s)
  K.Hamamoto, Y.Tanaka, T.Watanabe, N.Sakaya, M.Hosoya, T.Shoki, H.Sugahara, N.Hishinuma, H.Hada, H.Kinoshita
- Journal Title
  
  J.Photopolym.Sci.Technol. 17,3
  
  Pages: 367-372
- NAID
  130004464356
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] 光ファイバーを用いた点回折干渉計に関する研究2003
- Author(s)
  格内敏, 木下博雄, 渡邊健夫, 坂本亨
- Journal Title
  
  精密工学会誌第69巻第8号
  
  Pages: 1170-1175
- NAID
  110001373589
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] 光ファイバーを用いた点回折干渉計に関する研究2003
- Author(s)
  格内敏, 木下博雄, 渡邊健夫, 坂本亨
- Journal Title
  
  精密工学会誌 69,8
  
  Pages: 1170-1175
- NAID
  110001373589
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Investigation of Contamination Removal from Finished EUVL Mask2003
- Author(s)
  K.Hamamoto, S.Takada, T.Watanabe, N.Sakaya, T.Shoki, M.Hosoya, H.Kinoshita
- Journal Title
  
  J.Photopolym.Sci.Technol. 16,3
  
  Pages: 395-400
- NAID
  130004464266
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Pattern Inspection of EUV Mask using a EUV Microscope2003
- Author(s)
  T.Watanabe, T.Haga, T.Shoki, K.Hamamoto, S.Takada, N.Kazui, S.Kakunai, H.Tsubakino, H.Kinoshita
- Journal Title
  
  Proc.SPIE 5130
  
  Pages: 1005-1013
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Pattern Inspection of EUV Mask Using a EUV Microscope2003
- Author(s)
  T.Watanabe, T.Haga, T.Shoki, K.Hamamoto, S.Takada, N.Kazui, S.Kakunai, H.Tsubakino, H.Kinoshita
- Journal Title
  
  Proc.SPIE 5130
  
  Pages: 1005-1013
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Evaluation of Finished EUVL Mask using a Mirau Intergerometric Microscope2003
- Author(s)
  T.Haga, H.Kinoshita, K.Hamamoto, S.Takada, N.Kazui, S.Kakunai, H.Tsubakino, T.Watanabe
- Journal Title
  
  Jpn.J.Appl.Phys. 42
  
  Pages: 3771-3775
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Journal Article] Evaluation of Finished EUVL Mask using a Mirau Intergerometric Microscope2003
- Author(s)
  T.Haga, H.Kinoshita, K.Hamamoto, S.Takada, N.Kazui, S.Kakunai, H.Tsubakino, T.Watanabe
- Journal Title
  
  Jpn.J.Appl.Phys 42、6
  
  Pages: 3771-3775
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] ナノ平滑性とエッチング耐性を有するフォトレジストポリマー2006
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2006-066513
- Filing Date
  2006
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 光学素子及び光学素子製造方法2005
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2005-360553
- Filing Date
  2005
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 極端紫外線顕微鏡及び検査方法2005
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2005-246736
- Filing Date
  2005
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] カリックスレゾルシナレン化合物並びにそれからなるEUV及び電子線レジスト2005
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Filing Date
  2005
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 極端紫外線顕微鏡及び検査方法2005
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2005-246736
- Filing Date
  2005
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] ナノ平滑性とエッチング耐性を有するフォトレジストポリマー2005
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2005-234801
- Filing Date
  2005
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 電子線又はEUV用レジスト組成物2004
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2004-044737
- Filing Date
  2004
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 電子線又はEUV用レジスト組成物及びレジストパタン形成方法2004
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2004-262488
- Filing Date
  2004
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 電子線又はEUV用レジスト組成物2004
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2004-044737
- Filing Date
  2004
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 電子線又はEUV用レジスト組成物2004
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2004-100206
- Filing Date
  2004
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 電子線又はEUV用レジスト組成物2003
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2003-371111
- Filing Date
  2003-10-30
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Patent] 電子線又はEUV用レジスト組成物2003
- Inventor(s)
  木下博雄, 渡邊健夫
- Industrial Property Rights Holder
  木下博雄, 渡邊健夫
- Industrial Property Number
  2003-362223
- Filing Date
  2003-10-22
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206010
[Presentation] 大型反射率計によるEUV集光ミラーの評価2017
- Author(s)
  井口晴貴、橋本拓、原田哲男、渡邊健夫
- Organizer
  放射光学会年会
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] EUV反射率計用のワイドバンド多層膜偏光子の開発2017
- Author(s)
  渡辺雅紀、井口晴貴、原田哲男、渡邊健夫
- Organizer
  第30回日本放射光学会年会・放射光科学合同シンポジウム
- Place of Presentation
  神戸
- Year and Date
  2017-01-08
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] EUV反射率計用のMo/Siワイドバンド多層膜偏光子の開発,2017
- Author(s)
  渡辺雅紀、井口晴貴、原田哲男、渡邊健夫
- Organizer
  第64回応用物理学会春季学術講演会
- Place of Presentation
  横浜
- Year and Date
  2017-03-14
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] EUV反射率計用のMo/Siワイドバンド多層膜偏光子の開発,2017
- Author(s)
  渡辺雅紀、井口晴貴、原田哲男、渡邊健夫
- Organizer
  先端技術セミナー
- Place of Presentation
  姫路
- Year and Date
  2017-03-03
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] EUV反射率計用の垂直偏光制御機構の開発2017
- Author(s)
  原田哲男、井口晴貴、渡辺雅紀、渡邊健夫
- Organizer
  第30回日本放射光学会年会・放射光科学合同シンポジウム
- Place of Presentation
  神戸
- Year and Date
  2017-01-08
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] Absorption Coefficient Measurement Advanced Method of EUV Resist by Direct-Resist Coating on a Photodiode2017
- Author(s)
  Shota Niihara, Daiki Mamezaki, Masanori Watanabe, Tetsuo Harada, and Takeo Watanabe
- Organizer
  The 34th International Conference of Photopolymer Science and Technology (ICPST-34)
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] EUV反射率計用のワイドバンド多層膜偏光子の開発2017
- Author(s)
  渡辺雅紀、井口晴貴、原田哲男、渡邊健夫
- Organizer
  放射光学会年会
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] フォトダイオード直接塗布法による EUVレジストの高精度な吸収係数測定法2017
- Author(s)
  新原章汰、豆﨑大輝、渡辺雅紀、原田哲男、渡邊健夫
- Organizer
  第78回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] EUV反射率計用の垂直偏光制御機構の開発2017
- Author(s)
  原田哲男、井口晴貴、渡辺雅紀、渡邊健夫
- Organizer
  放射光学会年会
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] 兵庫県立大学におけるEUVレジスト評価系の開発2016
- Author(s)
  渡邊健夫
- Organizer
  第25回光反応･電子用材料研究会講座
- Place of Presentation
  東京理科大学森戸記念館（東京都新宿区）
- Year and Date
  2016-01-20
- Invited
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 微細加工用レジストの基本知識と活用法2016
- Author(s)
  渡邊健夫
- Organizer
  情報機構セミナー
- Place of Presentation
  大田区産業プラザ(東京都大田区南蒲田)
- Year and Date
  2016-10-19
- Invited
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 軟Ｘ線吸収分光法を用いたEUV用PHS系化学増幅系レジストの反応解析2015
- Author(s)
  渡邊健夫
- Organizer
  第12回SPring-8産業利用報告会
- Place of Presentation
  川崎市産業振興会館(神奈川県川崎市)
- Year and Date
  2015-09-03
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Development of Transmission Grating for EUV Interference Lithography of 1X nm HP2015
- Author(s)
  Tsubasa Fukui, Hirohito Tanino, Yuki Fukuda, Takeo Watanabe, Hiroo Kinoshita and Tetsuo Harada
- Organizer
  The 32nd International Conference of Photopolymer Science and Technology
- Place of Presentation
  幕張メッセ（千葉県千葉市美浜区）
- Year and Date
  2015-06-24
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 1X nm HPレジスト評価用EUV二光束干渉露光系の透過型回折格子の製作2015
- Author(s)
  福田裕貴、福井　翼、谷野寛仁、九鬼真輝、渡邊健夫、木下博雄、原田哲男
- Organizer
  NGLワークショップ2015
- Place of Presentation
  東京工業大学蔵前館（東京都目黒区）
- Year and Date
  2015-07-06
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 12.5 nm HPレジスト評価用EUV二光束干渉露光系の透過型回折格子の製作2015
- Author(s)
  福田裕貴, 福井翼、谷野寛仁, 原田哲男, 渡邊健夫
- Organizer
  第76回応用物理学会学術講演会
- Place of Presentation
  名古屋国際会議場（愛知県名古屋市熱田区）
- Year and Date
  2015-09-13
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Soft X-ray Absorption Spectroscopy using SR for EUV Resist Chemical Reaction Analysis2015
- Author(s)
  Takeo Watanabe
- Organizer
  TWG EUV Ressit Workshop
- Place of Presentation
  Maastricht, Netherland
- Year and Date
  2015-10-04
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 軟Ｘ線吸収分光法を用いたEUV用PHS系化学増幅系レジストの反応解析2015
- Author(s)
  山口都太、石井暁大、渡邊健夫、九鬼正樹、原田哲男
- Organizer
  第１回放射光産業利用支援講座
- Place of Presentation
  姫路駅前じばさんびる（兵庫県姫路市）
- Year and Date
  2015-10-16
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 「計算」と「光」を融合した理論的分子設計が実現する近未来ものづくりプロセス、我が国の未来を拓く地域の実現に関する調査研究2015
- Author(s)
  畑　豊、渡邊健夫、横山和司、鶴田　宏
- Organizer
  第12回SPring-8産業利用報告会
- Place of Presentation
  川崎市産業振興会館(神奈川県川崎市)
- Year and Date
  2015-09-03
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 微細加工用レジスト2015
- Author(s)
  渡邊健夫
- Organizer
  フォトポリマー講習会
- Place of Presentation
  東京理科大学森戸記念館（東京都新宿区）
- Year and Date
  2015-08-19
- Invited
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Development of High=Reflective W/Si-multilayer Diffraction Grating for the Analysis of Fluorine Materials2015
- Author(s)
  Makaski Kuki, Tomoyuki Uemura, Masato Yamaguchi, Testuo Harada, Takeo Watanabe, Yasuji Muramatsu and Hiroo Kinoshita
- Organizer
  The 32nd International Conference of Photopolymer Science and Technology
- Place of Presentation
  幕張メッセ（千葉県千葉市美浜区）
- Year and Date
  2015-06-24
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] ニュースバルに於けるEUVレジスト用評価系の開発2015
- Author(s)
  渡邊健夫
- Organizer
  第60回UV/EB研究会
- Place of Presentation
  大阪住友クラブ（大阪府大阪市西区）
- Year and Date
  2015-09-18
- Invited
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Fabrication of transmission grating of EUV interference lithography for 1X nm hp EUV resist evaluation2015
- Author(s)
  Takeo Watanabe
- Organizer
  EUV International Sympoisum 2015
- Place of Presentation
  Maastricht, Netherland
- Year and Date
  2015-10-06
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Contribution of EUV resist components to the noncleanable contaminations2014
- Author(s)
  Eishi Shiobara, Toshiya Takahashi, Norihiko Sugie, Yukiko Kikuchi, Isamu Takagi, Kazuhiro Katayama, Hiroyuki Tanaka, Soichi Inoue, Tetsuro Harada, Takeo Watanabe, and Hiroo Kinoshita
- Organizer
  SPIE Advanced Lithography 2014
- Place of Presentation
  San Jose, California, USA
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] EUVL Activities in Japan2013
- Author(s)
  Takeo Watanabe
- Organizer
  2013 International Workshop on EUV Lithography
- Place of Presentation
  Maui, Hawaii, USA
- Invited
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Chemical Reaction Analysis by SR Absorption Spectroscopy to Increase the Acid Generation Efficiency of EUV CA Resist2013
- Author(s)
  Takeo Watanabe, Kazuya Emura, Daiju Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  2013 Internationa Symposium on Extreme Ultraviolet Lithography
- Place of Presentation
  富山国際会議場（富山県富山市））
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Development of the EUV Resist at Center for EUVL2013
- Author(s)
  Takeo Watanabe
- Organizer
  The 3rd Sino-Japan Symposium on Information and Electronic Materials
- Place of Presentation
  Shanhai, China
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Development of the EUV Resist at Center for EUVL2013
- Author(s)
  Takeo Watanabe
- Organizer
  he 3rd Sino-Japan Symposium on Information and Electronic Materials
- Place of Presentation
  Beijing, China
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Recent Activities of the Actinic Mask Inspection using the EUV Microscope at Center for EUVL2013
- Author(s)
  Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  2013 International Workshop on EUV Lithography
- Place of Presentation
  Maui, Hawaii, USA
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Resist outgassing characterization of PAG-blended and PAG-bound systems2013
- Author(s)
  Kazuhiro Katayama, Toshiya Takahashi, Norihiko Sugie, Isamu Takagi, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita
- Organizer
  2013 Internationa Symposium on Extreme Ultraviolet Lithography
- Place of Presentation
  富山国際会議場（富山県富山市）
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] EUV Resist Chemical Reaction Analysis using SR2013
- Author(s)
  Takeo Watanabe, Kazuya Emura, Daiji Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada and Hiroo Kinoshita
- Organizer
  The 30th International Conference of Photopolymer Science and Technology
- Place of Presentation
  千葉大学西千葉キャンパス（千葉県千葉市稲毛区）
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Comparison of Resist Family Outgassing Characterization2013
- Author(s)
  Isamu Takagi, Toshiya Takahashi, Kazuhiro Katayama, Norihiko Sugie, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  The 30th International Conference of Photopolymer Science and Technology
- Place of Presentation
  千葉大学西千葉キャンパス（千葉県千葉市稲毛区）
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Study of the relation between Resist components and outgassing contamination species2013
- Author(s)
  Yukiko Kikuchi, Toshiya Takahashi, Norihiko Sugie, Isamu Takagi, Kazuhiro Katayama, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshit
- Organizer
  2013 Internationa Symposium on Extreme Ultraviolet Lithography
- Place of Presentation
  富山国際会議場（富山県富山市）
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Recent Activities of the EUV Resist Research and Development at Center for EUVL2013
- Author(s)
  Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  2013 International Workshop on EUV Lithography
- Place of Presentation
  Maui, Hawaii, USA
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] EUVL 研究開発センターにおけるEUV レジストの開発(基調講演)、アドバンスト・テクノロジー・プログラム(ATP)、新材料開発最前線、微細パターン化技術2012
- Author(s)
  渡邊健夫、原田哲男、木下博雄
- Organizer
  日本化学会第93春季年会(2013)
- Place of Presentation
  立命館大学びわこ・くさつキャンパス
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] Recent Activities on EUVL in NewSUBARU (Invited talk)2012
- Author(s)
  Hiroo Kinoshia, Takeo Watanabe, and Tetsuo Harada
- Organizer
  24th Microprocesses and Nanotechnology Conference
- Place of Presentation
  Kobe Meriken Park Oriental Hotel, Kobe, Hyogo, Japan
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] Contamination Evaluation Tool by an In-situ Spectroscopic Ellipsometer with an Exposure of High Power EUV (Invited talk)2012
- Author(s)
  Takeo Watanabe, Masaki Tada, Yukiko Kikuchi, Toshiya Takahashi, Kazuhiro Katayama, Norihiko Sugie, Isamu Takagi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  Technical Working Group of EUV Resist Outgassing
- Place of Presentation
  Brussels Convention Center, Brussels, Belgium
- Year and Date
  2012-09-30
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] レジストへのEUV光照射によるin-situカーボン膜厚測定2012
- Author(s)
  渡邊健夫, 他
- Organizer
  第25回日本放射光学会年会・放射光科学合同シンポジウム
- Place of Presentation
  鳥栖市民文化会館・中央公民館(佐賀県鳥栖市)
- Year and Date
  2012-01-09
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] 極端紫外線リソグラフィ技術開発の現状と今後の展望(招待講演)2012
- Author(s)
  渡邊健夫、原田哲男、木下博雄
- Organizer
  リソグラフィセミナー(I)、セミフォーラムジャパン2012
- Place of Presentation
  グランキューブ大阪(大阪市)
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUV Interference Lithography for 1Xnm2011
- Author(s)
  Takeo Watanabe, et al
- Organizer
  2011 International Workshop on EUV Lithography
- Place of Presentation
  Maui, Hawaii, USA
- Year and Date
  2011-06-15
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUVL toward 16 nm and below (Invited), Interational Panel Symposium2011
- Author(s)
  Takeo Watanabe
- Organizer
  The 28th International Conference of Photopolymer Science and Technology
- Place of Presentation
  Chiba Univ., Japan
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUV リソグラフィ-研究開発センターにおけるリソグラフィー開発(招待講演)、アドバンスト・テクノロジー・プログラム(ATP)2011
- Author(s)
  渡邊健夫、原田哲男、木下博雄
- Organizer
  次世代リソグラフィ、日本化学会第91 春季年会
- Place of Presentation
  神奈川大学(神奈川)
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUVL研究開発センターにおける研究開発(招待講演) 、微細化ブレイクセミナー(I)2011
- Author(s)
  渡邊健夫
- Organizer
  セミフォーラムジャパン2011
- Place of Presentation
  グランキューブ大阪(大阪市)
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUV R&D Status in Japan2011
- Author(s)
  Takeo Watanabe, et al
- Organizer
  2011 International Workshop on EUV Lithography
- Place of Presentation
  Maui, Hawaii, USA(Invited)
- Year and Date
  2011-06-16
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUVL研究開発センターにおける研究開発2011
- Author(s)
  渡邊健夫
- Organizer
  セミフォーラムジャパン2011
- Place of Presentation
  グランキューブ大阪(大阪市北区)(招待講演)
- Year and Date
  2011-05-31
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUVL toward 16nm and below2011
- Author(s)
  Takeo Watanabe
- Organizer
  The 28^<th> International Conference of Photopolymer Science and Technology
- Place of Presentation
  千葉大学(千葉市稲毛区)(Invited)
- Year and Date
  2011-06-22
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUVリソグラフィ-研究開発センターにおけるリソグラフィー開発2011
- Author(s)
  渡邊健夫
- Organizer
  日本化学会第91春季年会
- Place of Presentation
  神奈川工科大学
- Year and Date
  2011-03-24
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUVレジストの開発～20nm以下のパターン形成をめざして～ (招待講演)2011
- Author(s)
  渡邊健夫
- Organizer
  第3回リソグラフィ次世代技術調査専門委員会
- Place of Presentation
  日本交通協会特別談話室、東京
- Year and Date
  2011-09-16
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUV Interference Lithography for 1X nm2011
- Author(s)
  Takuro Urayama, Takeo Watanabe, Yuya Yamaguchi, Naohiro Matsuda, Yasuyuki Fukushima, Takafumi Iguchi, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  The 28th International Conference ofPhotopolymer Science and Technology
- Place of Presentation
  Chiba Univ., Japan
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUV Interference Lithography for 1X nm2011
- Author(s)
  Takeo Watanabe, Yuya Yamaguchi, Takuro Urayama, Naohiro Matsuda, Tetsu Harada and Hiroo Kinosita
- Organizer
  2011 International Workshop on EUV Lithography
- Place of Presentation
  Makena Beach and Golf Resort, Maui, Hawaii, USA
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] Fabrication process of EUV-IL transmission grating2010
- Author(s)
  Yuya Yamaguchi, Yakusyuki Fukushima, Takafumi Iguchi, Hiroo Kinoshita, Tetsuo Harada, and Takeo Watanabe
- Organizer
  The 27th International Conference of Photopolymer Science and Technology
- Place of Presentation
  Chiba Univ., Japan
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUV interference lithography for 22 nm node and below2010
- Author(s)
  Yasuyuki Fukushima, Yuya Yamaguchi, Teruhiko Kimura, Takafumi Iguchi, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
- Organizer
  The 27th International Conference of Photopolymer Science and Technology
- Place of Presentation
  Chiba Univ., Japan
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] Development of the Novel Evaluation Tool with an In-situ Ellipsometer for the Thickness Measurement of the Contamination Originated by the High Power EUV Irradiation on EUV Resist
- Author(s)
  Takeo Watanabe
- Organizer
  2012 International Workshop on EUV Lithography
- Place of Presentation
  Maui Sheraton Beach and Resort (Hawaii, USA)
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] 非化学増幅系EUVレジストの低温現像による解像性能向上
- Author(s)
  山口太都，江村和也，福井翼，谷野寛仁，原田哲男，渡邊健夫，木下博雄，星野亮一
- Organizer
  NGLワークショップ2014
- Place of Presentation
  東京工業大学蔵前ホール　東京都目黒区大岡山２丁目１２－１
- Year and Date
  2014-07-17 – 2014-07-18
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] (136)Study of Acid Diffusion Behaves Form PAG by Using Top Coat Method for EUVL
- Author(s)
  Atsushi Sekiguchi, Takeo Watanabe, and Hiroo Kinoshita
- Organizer
  The 31st International Conference of Photopolymer Science and Technology
- Place of Presentation
  千葉大学けやき会館　千葉県千葉市稲毛区弥生町1－33
- Year and Date
  2014-07-08 – 2014-07-11
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 10 nm 級 EUV 干渉露光用透過型回折格子の製作
- Author(s)
  福井　翼，谷野寛仁，福田裕貴，原田哲男，渡邊健夫，木下博雄
- Organizer
  第75回応用物理学会学術講演会
- Place of Presentation
  北海道大学札幌キャンパス　北海道札幌市北区北８条西５丁目
- Year and Date
  2014-09-17 – 2014-09-20
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] EUVL 研究開発センターにおけるEUV レジストの開発(基調講演)
- Author(s)
  渡邊健夫
- Organizer
  アドバンスト・テクノロジー・プログラム(ATP)、新材料開発最前線
- Place of Presentation
  立命館大学びわこ・くさつキャンパス（滋賀県草津市）
- Invited
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] 1Xnm級EUVレジストの開発〜精密な光反応制御への挑戦〜
- Author(s)
  渡邊健夫
- Organizer
  兵庫県立大学シンポジウム
- Place of Presentation
  イーグレ姫路（兵庫県姫路市）
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] The Mitigation of EUV Resist for the High Sensitivity and the Effect of Acid Diffusion for LWR on the basis of the Chemical Reaction Analysis
- Author(s)
  Takeo Watanabe
- Organizer
  2012 EUVL International Symposium
- Place of Presentation
  Brussels Convention Center (Brussels, Belgium)
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUV Resist Chemical Reaction Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity Achievement
- Author(s)
  Kazuya Emura, Takeo Watanabe, Daiju Shiono, Masato Yamaguchi, Hirohito Tanino, TsubasaFukui, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada,and Hiroo Kinoshita
- Organizer
  The 31st International Conference of Photopolymer Science and Technology
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2014-07-08 – 2014-07-11
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 脱保護反応に起因した膜減量評価による化学増幅系EUV用レジストの反応解析
- Author(s)
  江村和也，渡邊健夫，山口太都，谷野寛仁，福井翼，塩野大寿，春山雄一，村松康司，大森克実，佐藤和史，原田哲男，木下博雄
- Organizer
  NGLワークショップ2014
- Place of Presentation
  東京工業大学蔵前ホール　東京都目黒区大岡山２丁目１２－１
- Year and Date
  2014-07-17 – 2014-07-18
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] The Analytical Mitigation of EUV Resist for the High Sensitivity and the Low LWR using SR Absorption Spectroscopy
- Author(s)
  Takeo Watanabe
- Organizer
  24th Microprocesses and Nanotechnology Conference
- Place of Presentation
  Kobe Merikepark Oriental Hotel (Kobe, Hyogo)
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUV resist research at the Center for EUVL
- Author(s)
  Takeo Watanabe
- Organizer
  International Advanced Nanopatterning Materials and Processes Workshop 2012
- Place of Presentation
  Waseda Univ. Int. Conference Center (Tokyo)
- Invited
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] Contamination Evaluation Tool by an In-situ Spectroscopic Ellipsometer with an Exposure of High Power EUV (Invited)
- Author(s)
  Takeo Watanabe
- Organizer
  Technical Working Group of EUV Resist Outgassing, IEUVI
- Place of Presentation
  Brussels Convention Center (Brussels, Belgium)
- Invited
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUVレジストの高感度化について
- Author(s)
  渡邊健夫
- Organizer
  2013年第60回応用物理学会春季学術講演会
- Place of Presentation
  神奈川工科大（神奈川県厚木市）
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] 極端紫外線リソグラフィ技術開発の現状と今後の展望(招待講演)
- Author(s)
  渡邊健夫
- Organizer
  セミフォーラムジャパン2012、リソグラフィセミナー(I)
- Place of Presentation
  グランキューブ大阪（大阪市）
- Invited
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] Chemical Reaction Analysis based on the SR Absorption Spectroscopy for the High Sensitive EUV Resist
- Author(s)
  Takeo Watanabe
- Organizer
  2012 International Workshop on EUV Lithography
- Place of Presentation
  Maui Sheraton Beach and Resort (Hawaii, USA
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] 吸収分光法を用いたEUVレジストの反応解析例
- Author(s)
  渡邊健夫
- Organizer
  EUV産業利用報告会
- Place of Presentation
  じばさんビル3F, 兵庫県立大学産学連携機構会議室（兵庫県姫路市）
- Invited
- Data Source
  KAKENHI-PROJECT-22360146

1. KINOSHITA Hiroo (50285334)

# of Collaborated Projects: 5 results

# of Collaborated Products: 85 results
2. HARADA Tetsuo (30451636)

# of Collaborated Projects: 3 results

# of Collaborated Products: 54 results
3. NIIBE Masahito (10271199)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
4. MURAMATSU Yasuji (50343918)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
5. KAKUNAI Satoshi (10101130)

# of Collaborated Projects: 1 results

# of Collaborated Products: 10 results
6. SHIONO Daiju

# of Collaborated Projects: 1 results

# of Collaborated Products: 3 results
7. MUTO Masao

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
8. TSUNO Katsushige

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results

WATANABE Takeo 渡邊 健夫

渡邊 健夫 ワタナベ タケオ

渡辺 健夫 ワタナベ タケオ

Research Projects

Research Products

Co-Researchers

Precise measurement of optical constants of thin films in soft X-ray region

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Development of 1X nm EUV Resist with high sensitivity and Low LWRPrincipal Investigator

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Resist pattern replication using EUV interference lithography for 20 nm and belowPrincipal Investigator

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Observation of surface nano- structure using EUV phase shift microscope

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Fabrication of aspherical surfaces for soft X-Ray optical elements by means of Deposition techniques

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[Book] フォトポリマー懇話会、ニュースレター2015

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[Book] レジストプロセスの最適化テクニック2011

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[Book] レジストプロセスの最適化テクニック、～微細化・トラブル解消のための工程別対策および材料技術～2011

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[Journal Article] Absorption Coefficient Measurement Advanced Method of EUV Resist by Direct-Resist Coating on a Photodiode2017

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[Journal Article] Development of a reflectometer for a large EUV mirror in NewSUBARU2015

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[Journal Article] (169)EUV Resist Chemical Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity　Achievement2014