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KUBOTA Tomohiro  久保田 智広

ORCIDConnect your ORCID iD *help
Researcher Number 70322683
Affiliation (based on the past Project Information) *help 2015 – 2016: 東北大学, 流体科学研究所, 准教授
2011 – 2013: 東北大学, 流体科学研究所, 准教授
2009: 東北大, 流体科学研究所, 助教
2007 – 2008: Tohoku University, 流体科学研究所, 助教
2005 – 2006: Tohoku University, Institute of Fluid Science, Research Associate, 流体科学研究所, 助手
Review Section/Research Field
Principal Investigator
Applied physics, general / Plasma electronics / Electronic materials/Electric materials
Except Principal Investigator
Thin film/Surface and interfacial physical properties / Applied physics, general
Keywords
Principal Investigator
中性粒子ビーム / 第一原理計算 / 量子井戸 / バイオナノプロセス / 原子間力顕微鏡 / 量子ドット / ナノディスク / 結合次数解析 / 活性化エネルギー / 酸性度 … More / 密度汎関数法 / プラズマ・ビーム誘起錯体反応 / 第一原理理論計算 / 鉄 / 遷移金属錯体 / 遷移金属エッチング / 塩素 / 紫外光スペクトル / オージェ遷移 / 共鳴遷移 / 欠陥生成 / ワイヤレス測定 / イオンシース / 紫外光照射損傷 / オンウェハモニタリング / エッチング形状予測 / X線光電子分光法 / 積層ナノディスク / 導電性探針(プローブ) / 原子間力顕微鏡(AFM) / ケルビン力顕微鏡(KFM) / クーロン階段 / 自然酸化膜 / 電気特性 … More
Except Principal Investigator
エッチング / 中性粒子ビーム / nanocolumn / fin-type vertical MOSFET / low-k film / gate electrode etching / silicon oxynitride / negative ion / etching / neutral beam / 薄膜形成 / シリコン酸窒膜 / ナノ加工 / 半導体デバイス / エッチングダメージ / 起立ゲート型トランジスタ / 高誘電率膜 / 有機分子デバイス / カーボンナノチューブ / 表面改質 / ナノカラム / フィン型MOSFET / 低誘電率絶縁膜 / ゲート電極加工 / シリコン酸窒化膜 / 負イオン / マイクロマシンプローブ / Bow-tieアンテナ型 / 表面プラズモン / Bow-tieアンテナ / 近接場光 / Pbセンター / 低ダメージエッチング / フェリチン / 量子ドット Less
  • Research Projects

    (6 results)
  • Research Products

    (82 results)
  • Co-Researchers

    (5 People)
  •  遷移金属の新しい低温化学反応エッチングメカニズムの提案Principal Investigator

    • Principal Investigator
      久保田 智広
    • Project Period (FY)
      2015 – 2016
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      Plasma electronics
    • Research Institution
      Tohoku University
  •  Modeling of plasma process surface reaction mechanism using energy-controllable particle beamsPrincipal Investigator

    • Principal Investigator
      KUBOTA Tomohiro
    • Project Period (FY)
      2011 – 2013
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Applied physics, general
    • Research Institution
      Tohoku University
  •  単電子デバイスのための積層量子ナノディスク構造の精密作製と量子特性制御Principal Investigator

    • Principal Investigator
      久保田 智広
    • Project Period (FY)
      2008
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      Electronic materials/Electric materials
    • Research Institution
      Tohoku University
  •  単一サブ10nm微細構造のためのマルチ同時解析装置の開発Principal Investigator

    • Principal Investigator
      久保田 智広
    • Project Period (FY)
      2006 – 2007
    • Research Category
      Grant-in-Aid for Young Scientists (B)
    • Research Field
      Applied physics, general
    • Research Institution
      Tohoku University
  •  サブ10nm量子ドットの超解像近接場分光

    • Principal Investigator
      SAMUKAWA Seiji
    • Project Period (FY)
      2004 – 2005
    • Research Category
      Grant-in-Aid for Exploratory Research
    • Research Field
      Applied physics, general
    • Research Institution
      Tohoku University
  •  Nanometer-scale processing and creation of novel functional materials using low energy high flux neutral beams

    • Principal Investigator
      SAMUKAWA Seiji
    • Project Period (FY)
      2003 – 2005
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Thin film/Surface and interfacial physical properties
    • Research Institution
      Tohoku University

All 2016 2015 2014 2013 2012 2011 2008 2007 2006 2005 2004 Other

All Journal Article Presentation

  • [Journal Article] Proposal of High Current Gain Vibrating-Body Field-Effect Transistor2013

    • Author(s)
      S.Ueki, Y.Nishimori, K.Miwa, S.Nakagawa, H.Imamoto, T.Kubota, M.Sugiyama, S.Samukawa, and G.Hashiguchi
    • Journal Title

      IEEJ Transactions on Sensors and Micromachines

      Volume: 133 Issue: 11 Pages: 332-336

    • DOI

      10.1541/ieejsmas.133.332

    • NAID

      130003382688

    • ISSN
      1341-8939, 1347-5525
    • Language
      Japanese
    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Journal Article] Energy-loss Mechanism of Single-crystal Silicon Microcantilever due to Surface Defects G.erated during Plasma Processing2013

    • Author(s)
      A.Wada, Y.Yanagisawa, B.Altansukh, T.Kubota, T.Ono, S.Yamasaki, and S.Samukawa
    • Journal Title

      J. Micromech. Microeng.

      Volume: Vol.23 Issue: 6 Pages: 065020-065020

    • DOI

      10.1088/0960-1317/23/6/065020

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Journal Article] Prediction of etching-shape anomaly due to distortion of ion sheath around a large-scale three-dimensional structure by means of on-wafer monitoring technique and computer simulation2013

    • Author(s)
      T.Kubota, H.Ohtake, R.Araki, Y.Yanagisawa, T.Iwasaki, K.Ono, K.Miwa, and S.Samukawa
    • Journal Title

      J. Phys. D: Appl. Phys.

      Volume: Vol.46 Issue: 41 Pages: 415203-415203

    • DOI

      10.1088/0022-3727/46/41/415203

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Journal Article] Highly Selective Silicon Nitride Etching to Si and SiO_2 for Gate Sidewall Spacer Using CF_3I/O_2/H_2 Neutral Beam2013

    • Author(s)
      D.Nakayama, A.Wada, T.Kubota, R.Bruce, R.M.Martin, M.Haass, N.Fuller, and S.Samukawa
    • Journal Title

      Phys. D: Appl. Phys.

      Volume: Vol.46 Issue: 20 Pages: 205203-205203

    • DOI

      10.1088/0022-3727/46/20/205203

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Journal Article] Low-damage silicon etching using a neutral beam2013

    • Author(s)
      K.Miwa, Y.Nishimori, S.Ueki, M.Sugiyama, T.Kubota, and S.Samukawa
    • Journal Title

      J. Vac. Sci. Technol. B

      Volume: Vol.31 Issue: 5

    • DOI

      10.1116/1.4819973

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Journal Article] Numerical study on electron transfer mechanism by collision of ions at graphite surface in highly efficient neutral beam generation2012

    • Author(s)
      T.Kubota, N.Watanabe, S.Ohtsuka, T.Iwasaki, K.Ono, Y.Iriye, and S.Samukawa
    • Journal Title

      J. Physics D : Appl. Phys.

      Volume: Vol.45 Issue: 9 Pages: 095202-095202

    • DOI

      10.1088/0022-3727/45/9/095202

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Journal Article] Coulomb-staircase observed in silicon-nanodisk structures fabricated by low-energy chlorine neutral beams2007

    • Author(s)
      Tomohiro Kubota
    • Journal Title

      Journal of Applied Physics 101

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-18760049
  • [Journal Article] Low-damage fabrication of high aspect nanocolumns by using neutral beams and ferritin-iron-core mask2007

    • Author(s)
      Tomohiro Kubota
    • Journal Title

      Journal of Vacuum Science and Technology B 25

      Pages: 760-766

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-18760049
  • [Journal Article] Charging and Coulomb staircase effects in silicon nanodisk structures fabricated by defect-free Cl neutral beam etching process2006

    • Author(s)
      Tomohiro Kubota
    • Journal Title

      Applied Physics Letters 89・23

      Pages: 233127-233127

    • Data Source
      KAKENHI-PROJECT-18760049
  • [Journal Article] Study of neutral-beam etching conditions for the fabrication of 7-nm-diameter nanocolumn structures using ferritin iron-core masks2005

    • Author(s)
      Tomohiro Kubota
    • Journal Title

      Journal of Vacuum Science and Technology B23(2)

      Pages: 534-539

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15360016
  • [Journal Article] Study of neutral-beam etching conditions for the fabrication of 7-nm-diameter nanocolumn structures using ferritin iron-core masks2005

    • Author(s)
      久保田智広
    • Journal Title

      Journal of Vacuum Science and Technology B23・2

      Pages: 534-539

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-15360016
  • [Journal Article] A 7-nm nanocolumn structure fabricated by using a ferritin iron-core mask and low-energy Cl neutral beams2004

    • Author(s)
      Tomohiro Kubota
    • Journal Title

      Applied Physics Letters 84(9)

      Pages: 1555-1557

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15360016
  • [Journal Article] A 7-nm nanocolumn structure fabricated by using a ferritin iron-core mask and low-energy Cl neutral beams2004

    • Author(s)
      久保田智広
    • Journal Title

      Applied Physics Letters 84・9

      Pages: 1555-1557

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-15360016
  • [Presentation] 中性粒子ビーム励起錯体反応による遷移金属エッチングメカニズムのTight-binding量子分子動力学法を用いた検討2016

    • Author(s)
      久保田智広, 伊藤寿, 久保百司, 寒川誠二
    • Organizer
      第63回 応用物理学会春季学術講演会
    • Place of Presentation
      東京工業大学大岡山キャンパス(東京都目黒区)
    • Year and Date
      2016-03-19
    • Data Source
      KAKENHI-PROJECT-15K04712
  • [Presentation] Transition Metal Complex Reaction Etching with Neutral Beam and Its Mechanism Investigated by First-Principles Calculation2016

    • Author(s)
      Tomohiro Kubota, Yoshiyuki Kikuchi, and Seiji Samukawa
    • Organizer
      IEEE 16th International Conference on Nanotechnology
    • Place of Presentation
      Sendai International Center (宮城県仙台市)
    • Year and Date
      2016-08-22
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-15K04712
  • [Presentation] 中性粒子ビーム励起錯体反応を用いた遷移金属エッチングにおける吸着分子の影響2016

    • Author(s)
      久保田智広、菊地良幸、伊藤寿、久保百司、寒川誠二
    • Organizer
      第63回 応用物理学会春季学術講演会
    • Place of Presentation
      東京工業大学大岡山キャンパス(東京都目黒区)
    • Year and Date
      2016-03-21
    • Data Source
      KAKENHI-PROJECT-15K04712
  • [Presentation] 中性粒子ビーム励起錯体反応を用いたCoFeBエッチング2016

    • Author(s)
      久保田 智広、美山 遼、菊地 良幸、寒川 誠二
    • Organizer
      第77回応用物理学会秋季学術講演会
    • Place of Presentation
      朱鷺メッセ (新潟県新潟市)
    • Year and Date
      2016-09-13
    • Data Source
      KAKENHI-PROJECT-15K04712
  • [Presentation] 中性粒子ビーム励起錯体反応を用いた Taエッチングのメカニズム2016

    • Author(s)
      久保田智広、久保百司、寒川誠二
    • Organizer
      第77回応用物理学会秋季学術講演会
    • Place of Presentation
      朱鷺メッセ (新潟県新潟市)
    • Year and Date
      2016-09-13
    • Data Source
      KAKENHI-PROJECT-15K04712
  • [Presentation] First-Principles Theoretical Investigation on Mechanism of New Transition Metal Etching Process using Oxygen and argon Neutral Beams and Ethanol Gas2015

    • Author(s)
      Tomohiro Kubota, Yoshiyuki Kikuchi, and Seiji Samukawa
    • Organizer
      American Vacuum Society 62nd International Symposium & Exhibition
    • Place of Presentation
      San Jose (USA)
    • Year and Date
      2015-10-20
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-15K04712
  • [Presentation] Transition Metal Complex Reaction Etching for MRAM Applications using Neutral Beam and Its Mechanism Investigated by First-Principles Calculation2015

    • Author(s)
      Tomohiro Kubota, Yoshiyuki Kikuchi, Toshihisa Nozawa, and Seiji Samukawa
    • Organizer
      2015 International Conference on Solid State Devices and Materials
    • Place of Presentation
      札幌コンベンションセンター(北海道札幌市)
    • Year and Date
      2015-09-29
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-15K04712
  • [Presentation] 酸素中性粒子ビームによる酸化及び錯体反応を用いた遷移金属エッチングメカニズム(3)2015

    • Author(s)
      久保田智広, 菊地良幸, 野沢俊久, 伊藤寿, 久保百司, 寒川誠二
    • Organizer
      第72回 応用物理学会秋季学術講演会
    • Place of Presentation
      名古屋国際会議場(愛知県名古屋市)
    • Year and Date
      2015-09-15
    • Data Source
      KAKENHI-PROJECT-15K04712
  • [Presentation] A new metallic complex reaction etching for MRAM materials by a low-temperature neutral beam process2015

    • Author(s)
      Tomohiro Kubota and Seiji Samukawa
    • Organizer
      Plasma Etch and Strip in Microtechnology 2015
    • Place of Presentation
      Leuven (Belgium)
    • Year and Date
      2015-04-27
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-15K04712
  • [Presentation] オンウェハモニタリングによるプラズマエッチング形状異常予測2014

    • Author(s)
      久保田智広,佐藤充男,岩崎拓也,小野耕平,寒川誠二
    • Organizer
      第61回応用物理学会春季学術講演会
    • Place of Presentation
      相模原
    • Year and Date
      2014-03-19
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Feature Profile Evolution in Plasma Processing using On-wafer Monitoring System2014

    • Author(s)
      T.Kubota and S.Samukawa
    • Organizer
      8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing
    • Place of Presentation
      福岡
    • Year and Date
      2014-02-05
    • Invited
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 第一原理電子状態計算による中性粒子ビーム生成メカニズムの解析VII2013

    • Author(s)
      渡辺尚貴,大塚晋吾,岩崎拓也,小野耕平,入江康郎,植木真治,額賀理,杉山正和,久保田智広,寒川誠二
    • Organizer
      第60回応用物理学会春季学術講演会
    • Place of Presentation
      厚木
    • Year and Date
      2013-03-28
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] オンウェハモニタリングによるプラズマプロセスダメージ・形状予測2013

    • Author(s)
      久保田智広,佐藤充男,岩崎拓也,小野耕平,寒川誠二
    • Organizer
      第60回応用物理学会春季学術講演会
    • Place of Presentation
      厚木
    • Year and Date
      2013-03-27
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームエッチングの加工形状シミュレーション(4)2013

    • Author(s)
      望月俊輔,渡辺尚貴,大塚晋吾,岩崎拓也,小野耕平,入江康郎,三輪和弘,久保田智広,杉山正和,寒川誠二
    • Organizer
      第60回応用物理学会春季学術講演会
    • Place of Presentation
      厚木
    • Year and Date
      2013-03-28
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Core Technology Consortium for Advanced Energy Devices2013

    • Author(s)
      S.Samukawa and T.Kubota
    • Organizer
      10th International Conference on Flow Dynamics
    • Place of Presentation
      仙台
    • Year and Date
      2013-11-26
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] オンウェハモニタリングによるプラズマエッチング形状予測2013

    • Author(s)
      久保田智広,佐藤充男,岩崎拓也,小野耕平,寒川誠二
    • Organizer
      第74回応用物理学会秋季学術講演会
    • Place of Presentation
      京田辺
    • Year and Date
      2013-09-18
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Feature profile evolution in plasma processing using on-wafer monitoring system2013

    • Author(s)
      T.Kubota, M.Sato, T.Iwasaki, K.Ono, and S.Samukawa
    • Organizer
      AVS 60th International Symposium & Exhibition
    • Place of Presentation
      アメリカ・Long Beach
    • Year and Date
      2013-10-31
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームによるシリコンエッチング(7)2013

    • Author(s)
      久保田智広,三輪和弘,バトナサン・アルタンスック,大塚晋吾,渡辺尚貴,岩崎拓也,入江康郎,小野耕平,杉山正和,寒川誠二
    • Organizer
      第60回応用物理学会春季学術講演会
    • Place of Presentation
      厚木
    • Year and Date
      2013-03-28
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] On-wafer monitoring technique for highly efficient fabrication process of nano energy devices2013

    • Author(s)
      T.Kubota and S.Samukawa
    • Organizer
      10th International Conference on Flow Dynamics
    • Place of Presentation
      仙台
    • Year and Date
      2013-11-26
    • Invited
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームエッチングプロセスの総合的シミュレーション2013

    • Author(s)
      渡辺尚貴,大塚晋吾,岩崎拓也,小野耕平,入江康郎,望月俊輔,久保田智広,寒川誠二
    • Organizer
      第74回応用物理学会秋季学術講演会
    • Place of Presentation
      京田辺
    • Year and Date
      2013-09-18
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームエッチングモデルと加工形状解析(3)2013

    • Author(s)
      大塚晋吾,渡辺尚貴,岩崎拓也,小野耕平,入江康郎,望月俊輔,三輪和弘,杉山正和,久保田智広,寒川誠二
    • Organizer
      第60回応用物理学会春季学術講演会
    • Place of Presentation
      厚木
    • Year and Date
      2013-03-28
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Numerical simulation of total processes of neutral beam etching from G.eration of neutral beam by collision of ions against graphite sidewall to 3-dimensional etching profile2013

    • Author(s)
      N.Watanabe, S.Ohtsuka, S.Mochizuki, T.Kubota, T.Iwasaki, Y.Iriye, K.Ono, and S.Samukawa
    • Organizer
      AVS 60th International Symposium & Exhibition
    • Place of Presentation
      アメリカ・Long Beach
    • Year and Date
      2013-10-31
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームによるシリコンエッチング(5)2012

    • Author(s)
      久保田智広,三輪和弘,大塚晋吾,渡辺尚貴,岩崎拓也,小野耕平,杉山正和,寒川誠二
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      東京
    • Year and Date
      2012-03-17
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームエッチングモデルと加工形状解析2012

    • Author(s)
      大塚晋吾,渡辺尚貴,岩崎拓也,小野耕平,入江康郎,望月俊輔,杉山正和,久保田智広,寒川誠二
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      東京
    • Year and Date
      2012-03-17
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 3-Dimensional and Defect-free Etching by Neutral Beam for MEMS Applications2012

    • Author(s)
      T.Kubota, A.Wada, Y.Yanagisawa, B.Altansukh, K.Miwa, T.Ono, and S.Samukawa
    • Organizer
      2012 International Conference on Solid State Devices and Materials
    • Place of Presentation
      京都
    • Year and Date
      2012-09-25
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] オンウエハーモニタリングとシミュレーションの融合によるプラズマプロセス中の表面イオンシース形状と入射イオン軌道予測2012

    • Author(s)
      荒木良亮,久保田智広,岩崎拓也,小野耕平,寒川誠二
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      東京
    • Year and Date
      2012-03-17
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームエッチングの加工形状シミュレーション(3)2012

    • Author(s)
      望月俊輔,渡辺尚貴,大塚晋吾,岩崎拓也,小野耕平,入江康郎,三輪和弘,久保田智広,杉山正和,寒川誠二
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      松山
    • Year and Date
      2012-09-13
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームエッチングモデルと加工形状解析(2)2012

    • Author(s)
      大塚晋吾,渡辺尚貴,岩崎拓也,小野耕平,入江康郎,望月俊輔,杉山正和,久保田智広,寒川誠二
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      松山
    • Year and Date
      2012-09-13
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Numerical study on electron transfer mechanism by collision of ions at graphite surface in highly-efficient neutral beam Generation2012

    • Author(s)
      N.Watanabe, T.Kubota, and S.Samukawa
    • Organizer
      The 8th EU-Japan Joint Symposium on Plasma Processing
    • Place of Presentation
      奈良
    • Year and Date
      2012-01-17
    • Invited
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームエッチングの加工形状シミュレーション(2)2012

    • Author(s)
      望月俊輔,大塚晋吾,渡辺尚貴,岩崎拓也,小野耕平,入江康郎,久保田智広,杉山正和,寒川誠二
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      東京
    • Year and Date
      2012-03-17
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームエッチングモデルと加工形状解析2012

    • Author(s)
      大塚晋吾,渡辺尚貴,岩崎拓也,小野耕平,入江康郎,望月俊輔,杉山正和,久保田智広,寒川誠二
    • Organizer
      第29回「センサ・マイクロマシンと応用システム」シンポジウム
    • Place of Presentation
      北九州
    • Year and Date
      2012-10-23
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Prediction of ion sheath shape and ion trajectory during plasma etching processing using on-wafer monitoring technique and simulation2012

    • Author(s)
      R.Araki, T.Kubota, and S.Samukawa
    • Organizer
      The 8th EU-Japan Joint Symposium on Plasma Processing
    • Place of Presentation
      奈良
    • Year and Date
      2012-01-16
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Theoretical calculation of neutralization efficiency of positive and negative chlorine ions with consideration of excited states2012

    • Author(s)
      S.Ohtsuka, N.Watanabe, T.Kubota, T.Iwasaki, Y.Iriye, K.Ono, and S.Samukawa
    • Organizer
      AVS 59th International Symposium and Exhibition
    • Place of Presentation
      アメリカ・Tampa
    • Year and Date
      2012-11-01
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームによるシリコンエッチング(6)2012

    • Author(s)
      久保田智広,三輪和弘,バトナサン・アルタンスック,大塚晋吾,渡辺尚貴,岩崎拓也,小野耕平,杉山正和,寒川誠二
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      松山
    • Year and Date
      2012-09-13
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Feature Profile Evolution in Plasma Processing Using Wireless On-Wafer Monitoring System2012

    • Author(s)
      T.Kubota and S.Samukawa
    • Organizer
      Ninth International Conference on Flow Dynamics
    • Place of Presentation
      仙台
    • Year and Date
      2012-09-19
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 形状シミュレーションによる塩素中性粒子ビームエッチングの加工形状の検討2012

    • Author(s)
      望月俊輔,大塚晋吾,渡辺尚貴,岩崎拓也,小野耕平,入江康郎,三輪和弘,久保田智広,杉山正和,寒川誠二
    • Organizer
      第29回「センサ・マイクロマシンと応用システム」シンポジウム
    • Place of Presentation
      北九州
    • Year and Date
      2012-10-23
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビーム生成におけるアパーチャ構造とエッチング特性解析2011

    • Author(s)
      大塚晋吾,渡辺尚貴,岩崎拓也,小野耕平,入江康郎,植木真治,額賀理,杉山正和,久保田智広,寒川誠二
    • Organizer
      第72回応用物理学会学術講演会
    • Place of Presentation
      山形
    • Year and Date
      2011-08-31
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Damage-free silicon etching using large diameter neutral beam source2011

    • Author(s)
      久保田智広
    • Organizer
      International Conference on Electronics Packaging
    • Place of Presentation
      奈良
    • Year and Date
      2011-04-14
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Energy and Angular Distribution Analysis for Neutral Beam and Application for Etching Simulation2011

    • Author(s)
      S.Ohtsuka, N.Watanabe, T.Iwasaki, K.Ono, Y.Iriye, Osamu Nukaga, S.Ueki, T.Kubota, M.Sugiyama, and S.Samukawa
    • Organizer
      AVS 58th International Symposium & Exhibition
    • Place of Presentation
      アメリカ・Nashville
    • Year and Date
      2011-11-03
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームによるシリコンエッチング(4)2011

    • Author(s)
      久保田智広,大塚晋吾,渡辺尚貴,岩崎拓也,小野耕平,入江康郎,杉山正和,大竹浩人,寒川誠二
    • Organizer
      第72回応用物理学会学術講演会
    • Place of Presentation
      山形
    • Year and Date
      2011-08-31
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] High-aspect-ratio silicon etching using large-diameter neutral beam source2011

    • Author(s)
      T.Kubota, N.Watanabe, S.Ohtsuka, K.Ono, H.Ohtake, S.Ueki, Y.Nishimori, G.Hashiguchi, and S.Samukawa
    • Organizer
      AVS 58th International Symposium & Exhibition
    • Place of Presentation
      アメリカ・Nashville
    • Year and Date
      2011-11-03
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] オンウエハーモニタリングとシミュレーションの融合による立体形状エッチングにおけるシース形状およびイオン軌道予測2011

    • Author(s)
      荒木良亮,久保田智広,三輪和弘,岩崎拓也,小野耕平,寒川誠二
    • Organizer
      第72回応用物理学会学術講演会
    • Place of Presentation
      山形
    • Year and Date
      2011-08-31
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームによるエッチングの加工形状シミュレーション2011

    • Author(s)
      望月俊輔,久保田智広,大塚晋吾,小野耕平,岩崎拓也,渡辺尚貴,入江康郎,杉山正和,寒川誠二
    • Organizer
      第72回応用物理学会学術講演会
    • Place of Presentation
      山形
    • Year and Date
      2011-08-31
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 第一原理電子状態計算による中性粒子ビーム生成メカニズムの解析V2011

    • Author(s)
      渡辺尚貴,大塚晋吾,岩崎拓也,小野耕平,入江康郎,植木真治,額賀理,杉山正和,久保田智広,寒川誠二
    • Organizer
      第72回応用物理学会学術講演会
    • Place of Presentation
      山形
    • Year and Date
      2011-08-31
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Silicon etching using large-diameter neutral beam source2011

    • Author(s)
      久保田智広
    • Organizer
      The 3rd International Conference on Microelectronics and Plasma Technology
    • Place of Presentation
      大連、中国
    • Year and Date
      2011-07-05
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] High-aspect-ratio silicon etching using large-diameter neutral beam source2011

    • Author(s)
      久保田智広
    • Organizer
      American Vacuum Society 58th International Symposium & Exhibition
    • Place of Presentation
      Nashville、米国
    • Year and Date
      2011-11-03
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Theoretical analysis of electron transfer during the process of neutral beam G.eration2011

    • Author(s)
      N.Watanabe, S.Ohtsuka, T.Iwasaki, K.Ono, Yasuro Iriye, S.Ueki, Osamu Nukaga, T.Kubota, M.Sugiyama, and S.Samukawa
    • Organizer
      AVS 58th International Symposium & Exhibition
    • Place of Presentation
      アメリカ・Nashville
    • Year and Date
      2011-11-03
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 第一原理電子状態計算による中性粒子ビーム生成メカニズムの解析2011

    • Author(s)
      渡辺尚貴, 大塚晋吾, 岩崎拓也, 小野耕平,入江康郎, 額賀理, 植木真治, 杉山正和,久保田智広, 寒川誠二
    • Organizer
      第28回「センサ・マイクロマシンと応用システム」シンポジウム
    • Place of Presentation
      東京
    • Year and Date
      2011-09-26
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビーム生成におけるアパーチャ構造とエッチング特性解析2011

    • Author(s)
      大塚晋吾, 渡辺尚貴, 岩崎拓也, 小野耕平,入江康郎, 額賀理, 植木真治, 杉山正和,久保田智広, 寒川誠二
    • Organizer
      第28回「センサ・マイクロマシンと応用システム」シンポジウム
    • Place of Presentation
      東京
    • Year and Date
      2011-09-27
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Fabrication of Diameter- And Thickness-Controlled Nanodisk by using Defect-Free Neutral Beam And Its Quantum Effect2008

    • Author(s)
      久保田智広
    • Organizer
      8th International Symposium on Advanced Fluid Information and Transdiscinlinary Fluid Integration
    • Place of Presentation
      東北大学
    • Year and Date
      2008-12-20
    • Data Source
      KAKENHI-PROJECT-20560288
  • [Presentation] Coulomb-staircase Effect in Silicon-nanodisk Structures Fabricated Using Damage-free Cl Neutral Beam Etching2007

    • Author(s)
      Tomohiro Kubota
    • Organizer
      The 2007 Silicon Nanoelectronics Workshop
    • Place of Presentation
      リーガロイヤルホテル京都(京都府京都市)
    • Year and Date
      2007-06-10
    • Data Source
      KAKENHI-PROJECT-18760049
  • [Presentation] Fabrication of defect-free and diameter-controlled silicon nanodisks for future quantum devices by using neutral beam etching2007

    • Author(s)
      Tomohiro Kubota
    • Organizer
      American Vacuum Society 54th International Symposium and Exhibition
    • Place of Presentation
      Washington State Conventi on Center(米国シアトル)
    • Year and Date
      2007-10-17
    • Data Source
      KAKENHI-PROJECT-18760049
  • [Presentation] Feature Profile Evolution in Plasma Processing using On-wafer Monitoring System

    • Author(s)
      Tomohiro Kubota and Seiji Samukawa
    • Organizer
      8th International Conference on Reactive Plasmas and 31st Symposium on Plasma Processing
    • Place of Presentation
      Fukuoka Convention Center
    • Invited
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Fabrication and evaluation of silicon micromechanical resonator using neutral beam etching technology

    • Author(s)
      Nguyen Van Toan, Tomohiro Kubota, Halubai Sekhar, Seiji Samukawa, and Takahito Ono
    • Organizer
      The 9th International Conference on Nano/Micro Engineered and Molecular Systems
    • Place of Presentation
      Hyatt Regency Waikiki,アメリカ
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] On-wafer monitoring technique for highly efficient fabrication process of nano energy devices

    • Author(s)
      Tomohiro Kubota and Seiji Samukawa
    • Organizer
      10th International Conference on Flow Dynamics
    • Place of Presentation
      Sendai International Center
    • Invited
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームによるシリコンエッチング(6)

    • Author(s)
      久保田智広
    • Organizer
      第73回 応用物理学会学術講演会
    • Place of Presentation
      松山
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Silicon micromechanical resonator with high quality factor fabricated by damage-free neutral beametching process

    • Author(s)
      Halubai Sekhar,久保田智広,Van Toan Nguyen,小野崇人,寒川誠二
    • Organizer
      第61回 応用物理学会春季学術講演会
    • Place of Presentation
      青山学院大学相模原キャンパス
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Damage-free AlGaN/GaN Recess-Gate Etching using Cl2 Neutral Beam

    • Author(s)
      Halubai Sekhar ,久保田智広,岡田 健,太田実雄,藤岡 洋,寒川誠二
    • Organizer
      第61回 応用物理学会春季学術講演会
    • Place of Presentation
      青山学院大学相模原キャンパス
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] オンウェハモニタリングによるプラズマエッチング形状異常予測

    • Author(s)
      久保田智広,佐藤充男,岩崎拓也,小野耕平,寒川誠二
    • Organizer
      第61回 応用物理学会春季学術講演会
    • Place of Presentation
      青山学院大学相模原キャンパス
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 3-Dimensional and Defect-free Etching by Neutral Beam for MEMS Applications

    • Author(s)
      久保田智広
    • Organizer
      2012 International Conference on Solid State Devices and Materials
    • Place of Presentation
      京都
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Numerical simulation of total processes of neutral beam etching from generation of neutral beam by collision of ions against graphite sidewall to 3-dimensional etching profile

    • Author(s)
      Naoki Watanabe, Shingo Ohtsuka, Shunsuke Mochizuki, Tomohiro Kubota, Takuya Iwasaki, Yasuroh Iriye, Kohei Ono, and Seiji Samukawa
    • Organizer
      AVS 60th International Symposium & Exhibition
    • Place of Presentation
      Long Beach Convention Center,アメリカ
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 塩素中性粒子ビームを用いた窒化物薄膜のエッチング特性

    • Author(s)
      太田実雄,Halubai Sekhar,久保田智広,岡田 健,寒川誠二,藤岡 洋
    • Organizer
      第61回 応用物理学会春季学術講演会
    • Place of Presentation
      青山学院大学相模原キャンパス
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] アンペロメトリックバイオイメージングプラットフォーム「バイオLSI」

    • Author(s)
      井上 久美、松平 昌昭、伊野 浩介、中野 将識、菅野 佑介、須田 篤史、國方 亮太、吉田 慎哉、早坂 丈、菊地 良幸、Xijiang Chang、久保田 智広、珠玖 仁、田中 秀治、寒川 誠二、末永 智一
    • Organizer
      第74回分析化学討論会
    • Place of Presentation
      日本大学工学部
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームによるシリコンエッチング(7)

    • Author(s)
      久保田智広
    • Organizer
      第60回 応用物理学会春季学術講演会
    • Place of Presentation
      厚木
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] オンウェハモニタリングによるプラズマエッチング形状予測

    • Author(s)
      久保田智広,佐藤充男, 岩崎拓也,小野耕平,寒川誠二
    • Organizer
      第74回応用物理学会秋季学術講演会
    • Place of Presentation
      同志社大学京田辺キャンパス
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Damage-free AlGaN/GaN Recess-Gate Etching using Cl2 Neutral Beam for High-Performance HEMTs

    • Author(s)
      Halubai Sekhar, Tomohiro Kubota, Takeru Okada, Yosuke Tamura, ChangYong Lee, Jitsuo Ohta, Hiroshi Fujioka, and Seiji Samukawa
    • Organizer
      The 3rd International Symposiumon Next-Generation Electronics
    • Place of Presentation
      Chang Gung University,台湾
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] オンウェハモニタリングによるプラズマプロセスダメージ・形状予測

    • Author(s)
      久保田智広
    • Organizer
      第60回 応用物理学会春季学術講演会
    • Place of Presentation
      厚木
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] Feature profile evolution in plasma processing using on-wafer monitoring system

    • Author(s)
      Tomohiro Kubota, Michio Sato, Takuya Iwasaki, Kohei Ono, and Seiji Samukawa
    • Organizer
      AVS 60th International Symposium & Exhibition
    • Place of Presentation
      Long Beach Convention Center,アメリカ
    • Data Source
      KAKENHI-PROJECT-23360040
  • [Presentation] 中性粒子ビームエッチングプロセスの総合的シミュレーション

    • Author(s)
      渡辺尚貴,大塚晋吾,岩崎拓也,小野耕平,入江康郎,望月俊輔,久保田智広,寒川誠二
    • Organizer
      第74回応用物理学会秋季学術講演会
    • Place of Presentation
      同志社大学京田辺キャンパス
    • Data Source
      KAKENHI-PROJECT-23360040
  • 1.  SAMUKAWA Seiji (30323108)
    # of Collaborated Projects: 5 results
    # of Collaborated Products: 64 results
  • 2.  HANE Kazuhiro (50164893)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 0 results
  • 3.  ONO Takahito (90282095)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 0 results
  • 4.  熊谷 慎也 (70333888)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 0 results
  • 5.  KONDO Michio (30195911)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results

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