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TAKEHIRO Shinobu  竹廣 忍

ORCIDConnect your ORCID iD *help
Researcher Number 70344736
Affiliation (based on the past Project Information) *help 2003 – 2005: 東北大学, 電気通信研究所, 助手
Review Section/Research Field
Except Principal Investigator
Applied materials science/Crystal engineering / Electronic materials/Electric materials
Keywords
Except Principal Investigator
group-IV semiconductor / SiGeC / エピタキシャル成長 / CVD / IV族半導体 / resonant tunneling / quantum effect / electronic-band modulation / atomic-layer control / 局所歪 … More / 量子トンネル構造 / 共鳴トンネル / 量子効果 / 電子帯変調 / 原子層制御 / 3-dimensional structure / epitaxial growth / chemical vapor deposition / artificial crystal / atomic layer growth / heterostructure / MBE / 立体加工 / 人工結晶 / 原子層積層 / ヘテロ構造 Less
  • Research Projects

    (2 results)
  • Research Products

    (3 results)
  • Co-Researchers

    (3 People)
  •  Electronicband modulation and formation of quantum tunneling structures by atomic-layer control of group-IV semiconductors

    • Principal Investigator
      SAKURABA Masao
    • Project Period (FY)
      2004 – 2006
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Applied materials science/Crystal engineering
    • Research Institution
      Tohoku University
  •  Creation of Artificial Crystal with Atomically-Controlled Group-IV Semiconductor Heterostructures

    • Principal Investigator
      MUROTA Junichi
    • Project Period (FY)
      2003 – 2005
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Research Field
      Electronic materials/Electric materials
    • Research Institution
      Tohoku University

All 2005 2004

All Journal Article

  • [Journal Article] Sidewall Protection by Nitrogen, Oxygen in Poly-Si_<1-x>Ge_x Anisotropic Etching Using Cl_2/N_2/O_2 Plasma2005

    • Author(s)
      H.-S.Cho, S.Takehiro, M.Sakuraba, J.Murota
    • Journal Title

      Mat.Sci.Semiconductor Processing Vol.8

      Pages: 239-243

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15206031
  • [Journal Article] Relationship between Impurity (B or P), Carrier Concentration in SiGe(C) Epitaxial Film Produced by Thermal Treatment2004

    • Author(s)
      J.Noh, S.Takehiro, M.Sakuraba, J.Murota
    • Journal Title

      Appl.Surf.Sci. Vol.224

      Pages: 77-81

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15206031
  • [Journal Article] Fabrication of 0.12-μm pMOSFETs on High Ge Fraction Si/Si_<1-x>Ge_x/Si(100) heterostructure with Ultrashallow Source/Drain Formed using B-Doped SiGe CVD2004

    • Author(s)
      D.Lee, S.Takehiro, M.Sakuraba, J.Murota, T.Tsuchiya
    • Journal Title

      Appl.Surf.Sci. Vol.224

      Pages: 254-259

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15206031
  • 1.  MUROTA Junichi (70182144)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 3 results
  • 2.  SAKURABA Masao (30271993)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 0 results
  • 3.  櫻場 政夫
    # of Collaborated Projects: 0 results
    # of Collaborated Products: 3 results

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