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Setsuhara Yuichi  節原 裕一

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… Alternative Names

SETSUHARA Yuichi  節原 裕一

SETSUHARA Setsuhara  節原 裕一

節原 祐一  セツハラ ユウイチ

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Researcher Number 80236108
Other IDs
External Links
Affiliation (Current) 2025: 大阪大学, 接合科学研究所, 教授
Affiliation (based on the past Project Information) *help 2021 – 2024: 大阪大学, 接合科学研究所, 教授
2011 – 2019: 大阪大学, 接合科学研究所, 教授
2009: Osaka University, 接合科学研究科, 教授
2008: 大阪大学, 接合科学研究所接合科学研究所, 教授
2004 – 2008: Osaka University, Joining and Welding Research Institute, Professor, 接合科学研究所, 教授 … More
2001 – 2003: 京都大学, 大学院・工学研究科, 助教授
2001 – 2003: 京都大学, 工学研究科, 助教授
1996 – 2000: Joining and Welding Research Institute, Osaka University, 接合科学研究所, 助手
1995: 大阪大学, 溶接工学研究所, 助手
1992: Welding Research Institute, Osaka University Research Associate, 溶接工学研究所, 助手
1991: 大阪大学, 溶接・工学研究所, 助手 Less
Review Section/Research Field
Principal Investigator
Material processing/treatments / プラズマ理工学 / Composite materials/Surface and interface engineering / Science and Engineering / Basic Section 26050:Material processing and microstructure control-related / Material processing/treatments / Science and Engineering / Plasma science / 表面界面物性
Except Principal Investigator
Material processing/treatments … More / プラズマ理工学 / Aerospace engineering / Material processing/Microstructural control engineering / 溶接工学 / Science and Engineering / Material processing/treatments / Science and Engineering Less
Keywords
Principal Investigator
プラズマ加工 / フォノン励起 / 酸化物半導体 / 内部アンテナ / 誘導結合プラズマ / 低温プロセス / 反応性プラズマ / 超短パルスレーザー照射 / 半導体活性化プロセス / ナノ表面改質 … More / 大容積プラズマ / 低インダクタンス / 反応性高密度プラズマ / 活性化反応場 / プラズマ制御 / plasma surface process / non-equilibrium process / ultra-short pulse laser / phonon excitation / ultra-shallow junction / ミリ波照射 / 非平衡プラズマ照射 / プラズマ処理 / 非平衡プロセス / 超短パルスレーザー / 半導体極浅接合 / plasma-based ion implantation / large-volume plasma source / low inductance antenna / internal antenna / inductively coupled plasmas / プラズマイオン注入プロセス / Superhard nitride / Reactive high-density plasma / Highly reactive field / Helicon plasma / 超硬質窒化物 / ヘリコン波プラズマ / 高速製膜 / 反応性制御 / 反応性プラズマPVD製膜プロセス / 低侵襲治療 / 生体分子 / 医療・福祉 / プラズマ生成・制御 / プラズマ医療 / 無機/有機積層 / 無機/有機界面 / 無機/有機積層 / 無機/有機界面 / 低温形成 / 半導体薄膜 / 反応性製膜 / 低損傷プロセス / フナノン励紀 / 高周波プラズマ / 粒子改質 / 液中プラズマ / 内部アンテナ型誘導結合プラズマ / 製膜プロセス / 酸化物ナノ粒子 / ナノコンポジット / コヒーレントフォノン / 活性化 / 極浅半導体接合 / 立方晶窒化ホウ素 / 窒化炭素 / 超硬質薄膜 / 金属原子混合プラズマ / ヘリコン波励起プラズマ … More
Except Principal Investigator
PVD / 高密度プラズマ / イオンビーム / TiSiN / TiCuN / high density plasma / 超硬質薄膜 / cBN / Ion Beam / アルミナ / プラズマ医療科学 / プラズマ / MEMS / 半導体マイクロ波素子 / マイクロ波励起プラズマ / プラズマスラスター / プラズマ遺伝子導入 / プラズマ遺伝子注入 / プラズマ止血 / プラズマがん治療 / 透明導電膜 / 大気圧非平衡プラズマ / ミストCVD / 酸化亜鉛 / Chemical Vapor Deposition / Etching / High-Density Plasma / Feature Profile Evolution / Surface Reaction / Particle Transport / Microstructure / Plasma Processing / 化学気相堆積 / エッチング / 加工形状進展 / 表面反応過程 / 粒子輸送過程 / 超微細構造 / プラズマプロセス / ion bombardment / inductively coupled plsasma / nanocomposite film / スパッタリング / 窒化物薄膜 / ナノコンポジット / イオン照射 / 誘導結合型プラズマ / ナノコンポジット薄膜 / selective heating / sintering aids / aluminum nitride / silicon nitride / nitride / sintering / millimeter-wave / 誘電特性 / 選択加熱 / 助剤 / 窒化アルミ / 窒化珪素 / 窒化物 / 焼結 / ミリ波 / Kapton / Polyimide / Thermal Control Material / Ion Sheath / Plasma Contactor / Electric Charging / Simulation Experiment / Space Environment / 相似則 / ポリイミドフィルム / 太陽電池パネル / 酸素プラズマ / 宇宙材料 / シミュレーション実験 / カプトン / ポリイミド / 熱制御材料 / イオンシース / プラズマ中和器 / 帯電 / シュミレーション実験 / 宇宙環境 / carbon nitride film / helicon wave / thin film / super-hard material / 真空アークプラズマ / ヘリコン波励起プラズマ / カーボン薄膜 / 真空アーク / 薄膜合成 / 窒化炭素薄膜 / ヘリコン波 / 薄膜 / Functional Gdadient / Adhesion / Intrefacial Control / Ion Beam Assisted Deposition / 傾斜機能 / 密着性 / 界面制御 / イオンビーム支援蒸着 / Functional Gradation / Materials Hybridization / Heterogeneous Materials Joining / Ceramics Sintering / Functional Materials / Electromagnetic Energy / 傾斜構造化 / 複合化 / 異材接合 / セラミックス焼結 / 機能材料 / 電磁エネルギー / Ion-Induced Crystallization / Alumina / Titania / Oxide / Surface Modification / Dynamic Mixing / 酸化チタン / イオンビ-ムスパッタリング / 酸化物薄膜 / イオンビ-ム / ルチル構造 / イオン誘起結晶化 / チタニア / 酸化物 / 表面改質 / ダイナミックミキシング / プラズマ診断 / ラジカル計測 / がん細胞 / バイオ / 医療 / 大気圧プラズマ / システムバイオロジー / ラジカル / 安全安心 / がん治療 / 再生医療 / 遺伝子導入 / 止血 / 医工連携 / 活性酸素種 / 人工脂質二重膜 / 創傷治癒 / 抗腫瘍効果 / プラズマ活性点滴 / プラズマ活性培養液 / プラズマ医療 / 非鉄材料 / 組織 / 接合機構 / 環境 / 鉄 / ハイブリッド / ツール / 摩擦攪拌接合 / 超音速流れ / 軸対称表面波励起プラズマ / マイクロノズル / マイクロプラズマ / 超小型プラズマスラスター / 超小型電気推進 / 表面波励起プラズマ / 電気推進 Less
  • Research Projects

    (30 results)
  • Research Products

    (311 results)
  • Co-Researchers

    (44 People)
  •  高密度プラズマ支援製膜によるナノ構造制御次世代酸化物半導体薄膜低温形成法の創成Principal Investigator

    • Principal Investigator
      節原 裕一
    • Project Period (FY)
      2021 – 2024
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Review Section
      Basic Section 26050:Material processing and microstructure control-related
    • Research Institution
      Osaka University
  •  Plasma Science Innovation

    • Principal Investigator
      堀 勝
    • Project Period (FY)
      2017
    • Research Category
      Grant-in-Aid for Scientific Research on Innovative Areas (Research in a proposed research area)
    • Research Institution
      Nagoya University
  •  Development of advanced reactive plasma-enhanced processes for low-temperature large-area formation of next-generation oxide semiconductor devicesPrincipal Investigator

    • Principal Investigator
      Setsuhara Yuichi
    • Project Period (FY)
      2016 – 2019
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Composite materials/Surface and interface engineering
    • Research Institution
      Osaka University
  •  Development of novel atomic-layer-deposition plasma PVD processes for efficient and high-rate reactive film-formation processesPrincipal Investigator

    • Principal Investigator
      Setsuhara Yuichi
    • Project Period (FY)
      2014 – 2015
    • Research Category
      Grant-in-Aid for Challenging Exploratory Research
    • Research Field
      Composite materials/Surface and interface engineering
    • Research Institution
      Osaka University
  •  Development of deposition technology of surface nano-structure-controlled ZnO thin films using atmospheric pressure non-equilibrium plasma

    • Principal Investigator
      Takenaka Kosuke
    • Project Period (FY)
      2014 – 2016
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      Material processing/Microstructural control engineering
    • Research Institution
      Osaka University
  •  Plasma Medical Science Innovation

    • Principal Investigator
      HORI Masaru
    • Project Period (FY)
      2012 – 2016
    • Research Category
      Grant-in-Aid for Scientific Research on Innovative Areas (Research in a proposed research area)
    • Review Section
      Science and Engineering
    • Research Institution
      Nagoya University
  •  Development of novel plasma sources for plasma medicine through advanced spatio-temporal control of atmospheric-pressure dischargePrincipal Investigator

    • Principal Investigator
      Setsuhara Yuichi
    • Project Period (FY)
      2012 – 2016
    • Research Category
      Grant-in-Aid for Scientific Research on Innovative Areas (Research in a proposed research area)
    • Review Section
      Science and Engineering
    • Research Institution
      Osaka University
  •  Development of novel plasma-enhanced processes for low-temperature formation of high quality oxide semiconductor filmsPrincipal Investigator

    • Principal Investigator
      SETSUHARA Yuichi
    • Project Period (FY)
      2011 – 2013
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Material processing/treatments
    • Research Institution
      Osaka University
  •  Development of novel function-controlled inorganic/organic layer-formationtechnology through integrated reaction studies on plasma interactions withnanolayers at surface and interfacePrincipal Investigator

    • Principal Investigator
      SETSUHARA Yuichi
    • Project Period (FY)
      2011 – 2012
    • Research Category
      Grant-in-Aid for Challenging Exploratory Research
    • Research Field
      Material processing/treatments
    • Research Institution
      Osaka University
  •  超短パルスレーザー誘起断熱励起過程による次世代半導体ナノ表面の非熱的改質プロセスPrincipal Investigator

    • Principal Investigator
      節原 裕一
    • Project Period (FY)
      2008 – 2009
    • Research Category
      Grant-in-Aid for Scientific Research on Priority Areas
    • Review Section
      Science and Engineering
    • Research Institution
      Osaka University
  •  フォノン励起型非熱的ナノ表面改質による次世代半導体活性化プロセスの開発Principal Investigator

    • Principal Investigator
      節原 裕一
    • Project Period (FY)
      2007
    • Research Category
      Grant-in-Aid for Scientific Research on Priority Areas
    • Review Section
      Science and Engineering
    • Research Institution
      Osaka University
  •  高周波誘導結合による新しい液中プラズマ生成法の開発と粒子処理プロセスの開拓Principal Investigator

    • Principal Investigator
      節原 裕一
    • Project Period (FY)
      2007 – 2008
    • Research Category
      Grant-in-Aid for Exploratory Research
    • Research Field
      Plasma science
    • Research Institution
      Osaka University
  •  Development of hybrid friction stir welding for ferrous-materials by using composite tool with low environmental influence and its joining mechanism

    • Principal Investigator
      NAKATA Kazuhiro
    • Project Period (FY)
      2005 – 2008
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Research Field
      Material processing/treatments
    • Research Institution
      Osaka University
  •  マイクロプラズマスラスターの研究開発

    • Principal Investigator
      斧 高一
    • Project Period (FY)
      2004 – 2005
    • Research Category
      Grant-in-Aid for Scientific Research on Priority Areas
    • Review Section
      Science and Engineering
    • Research Institution
      Kyoto University
  •  気相成長ナノ粒子直接照射による酸化物ナノコンポジット機能材の低温高速成膜法の開発Principal Investigator

    • Principal Investigator
      節原 裕一
    • Project Period (FY)
      2004 – 2006
    • Research Category
      Grant-in-Aid for Exploratory Research
    • Research Field
      Material processing/treatments
    • Research Institution
      Osaka University
  •  Mechanism Investigations and Control of Phonon-Excitation Anneal Process for Ultra-Shallow Junction FormationPrincipal Investigator

    • Principal Investigator
      SETSUHARA Yuichi
    • Project Period (FY)
      2003 – 2005
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Material processing/treatments
    • Research Institution
      Osaka University
      Kyoto University
  •  コヒーレントフォノン励起による極浅半導体接合の低温活性化に関する基礎研究Principal Investigator

    • Principal Investigator
      節原 裕一
    • Project Period (FY)
      2002 – 2003
    • Research Category
      Grant-in-Aid for Exploratory Research
    • Research Field
      表面界面物性
    • Research Institution
      Kyoto University
  •  表面波励起プラズマを用いた超小型プラズマスラスターの研究開発

    • Principal Investigator
      ONO Kouichi
    • Project Period (FY)
      2002 – 2004
    • Research Category
      Grant-in-Aid for Exploratory Research
    • Research Field
      Aerospace engineering
    • Research Institution
      Kyoto University
  •  A Study of the Particle Transport and Surface Reactions in Microstructures on Substrates during Plasma Processing

    • Principal Investigator
      ONO Kouichi
    • Project Period (FY)
      2002 – 2004
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      プラズマ理工学
    • Research Institution
      Kyoto University
  •  Synthesis of Super-Hard Nano-Composite Films by High Density Plsama Sputtering

    • Principal Investigator
      SHOJI Miyake
    • Project Period (FY)
      2001 – 2003
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Research Field
      Material processing/treatments
    • Research Institution
      Osaka University
  •  Development of Plasma Technologies for Advanced Plasma-Based Ion Implantation Processes Using Internal-Antenna-Driven Large-Volume RF Plasma SourcesPrincipal Investigator

    • Principal Investigator
      SETSUHARA Yuichi
    • Project Period (FY)
      2001 – 2003
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Material processing/treatments
    • Research Institution
      KYOTO UNIVERSITY
  •  低インダクタンス型マルチ線状内部アンテナを用いた大容積RFプラズマ源の開発Principal Investigator

    • Principal Investigator
      節原 裕一
    • Project Period (FY)
      2000 – 2001
    • Research Category
      Grant-in-Aid for Encouragement of Young Scientists (A)
    • Research Field
      プラズマ理工学
    • Research Institution
      Kyoto University
      Osaka University
  •  Development of sintering and joining processes of high performance ceramics for next generation by using high power millimeter-wave radiation

    • Principal Investigator
      MIYAKE Shoji
    • Project Period (FY)
      1998 – 2000
    • Research Category
      Grant-in-Aid for Scientific Research (B).
    • Research Field
      Material processing/treatments
    • Research Institution
      Osaka University
  •  Development of highly reactive high-density plasma sputtering process with excitation of helicon wave for synthesis of superhard nitride filmsPrincipal Investigator

    • Principal Investigator
      SETSUHARA Yuichi
    • Project Period (FY)
      1998 – 1999
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      プラズマ理工学
    • Research Institution
      Osaka University
  •  ヘリコン波励起型反応性高密度金属原子混合プラズマの開発と超硬質薄膜合成への応用Principal Investigator

    • Principal Investigator
      節原 裕一
    • Project Period (FY)
      1997 – 1998
    • Research Category
      Grant-in-Aid for Encouragement of Young Scientists (A)
    • Research Field
      プラズマ理工学
    • Research Institution
      Osaka University
  •  Preparation of Super-Hard Nitride Thin Films for Next Generation by High Density Plasma PVD

    • Principal Investigator
      MIYAKE Shoji
    • Project Period (FY)
      1997 – 1999
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      プラズマ理工学
    • Research Institution
      Osaka University
  •  Research and Development of Ground Simulation Methods for Spacecraft Environment, and Degradation Experiments of Spacecraft Materials

    • Principal Investigator
      TAHARA Hirokazu
    • Project Period (FY)
      1997 – 1999
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Aerospace engineering
    • Research Institution
      Osaka University
  •  Functional Materials Processing by Electromagnetic Heating

    • Principal Investigator
      MIYAKE Shoji
    • Project Period (FY)
      1995 – 1996
    • Research Category
      Grant-in-Aid for international Scientific Research
    • Research Institution
      Joining and Welding Research Institute
  •  Formation of Functionally Gradient cBN Films Using Ion Beam

    • Principal Investigator
      MIYAKE Shoji
    • Project Period (FY)
      1995 – 1996
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Research Field
      Material processing/treatments
    • Research Institution
      Osaka University
  •  Study on Functional Surface Modification by Ion Dynamic Mixing Method

    • Principal Investigator
      MIYAKE Shoji
    • Project Period (FY)
      1991 – 1992
    • Research Category
      Grant-in-Aid for General Scientific Research (B)
    • Research Field
      溶接工学
    • Research Institution
      Osaka university

All 2024 2023 2022 2021 2020 2019 2018 2017 2016 2015 2014 2013 2012 2011 2009 2008 2007 2006 2005 2004 2003 2002 Other

All Journal Article Presentation Patent

  • [Journal Article] Stability and gap states of amorphous In-Ga-Zn-Ox thin film transistors: Impact of sputtering configuration and post-annealing on device performance2024

    • Author(s)
      Takenaka Kosuke、Nunomura Shota、Hayashi Yuji、Komatsu Hibiki、Toko Susumu、Tampo Hitoshi、Setsuhara Yuichi
    • Journal Title

      Thin Solid Films

      Volume: 790 Pages: 140203-140203

    • DOI

      10.1016/j.tsf.2024.140203

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23K03374, KAKENHI-PROJECT-23K21051
  • [Journal Article] Plasma processing technique by combination of plasma-assisted reactive sputtering and plasma annealing for uniform electrical characteristics of InGaZnO thin film transistors formed on large-area substrates2023

    • Author(s)
      Takenaka Kosuke、Yoshitani Tomoki、Endo Masashi、Hirayama Hiroyuki、Toko Susumu、Uchida Giichiro、Ebe Akinori、Setsuhara Yuichi
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 62 Issue: SI Pages: SI1005-SI1005

    • DOI

      10.35848/1347-4065/acbd56

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Journal Article] Analysis of oxygen-based species introduced during plasma assisted reactive processing of a-IGZO films2023

    • Author(s)
      Takenaka Kosuke、Hirayama Hiroyuki、Endo Masashi、Toko Susumu、Uchida Giichiro、Ebe Akinori、Setsuhara Yuichi
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 62 Issue: SL Pages: SL1018-SL1018

    • DOI

      10.35848/1347-4065/acdb7e

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Journal Article] Analysis of residual oxygen during a-IGZO thin film formation by plasma-assisted reactive sputtering using a stable isotope2023

    • Author(s)
      Takenaka Kosuke、Endo Masashi、Hirayama Hiroyuki、Toko Susumu、Uchida Giichiro、Ebe Akinori、Setsuhara Yuichi
    • Journal Title

      Vacuum

      Volume: 215 Pages: 112227-112227

    • DOI

      10.1016/j.vacuum.2023.112227

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Journal Article] Effects of post-deposition plasma treatments on stability of amorphous InGaZnOx thin-film transistors prepared with plasma-assisted reactive magnetron sputtering2019

    • Author(s)
      Kosuke Takenaka, Masashi Endo, Giichiro Uchida, Yuichi Setsuhara
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 58 Issue: SA Pages: SAAC03-SAAC03

    • DOI

      10.7567/1347-4065/aaec18

    • NAID

      210000135226

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Journal Article] Influence of sputtered atom flux on the electrical properties of a-IGZO films deposited by plasma-enhanced reactive sputtering2019

    • Author(s)
      Kosuke Takenaka, Masashi Endo, Giichiro Uchida, Akinori Ebe, Yuichi Setsuhara
    • Journal Title

      Journal of Alloys and Compounds

      Volume: 772 Pages: 642-649

    • DOI

      10.1016/j.jallcom.2018.09.143

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Journal Article] Low-temperature formation of high-mobility a-InGaZnOx films using plasma-enhanced reactive processes2019

    • Author(s)
      Takenaka Kosuke、Endo Masashi、Hirayama Hiroyuki、Uchida Giichiro、Ebe Akinori、Setsuhara Yuichi
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 58 Issue: 9 Pages: 090605-090605

    • DOI

      10.7567/1347-4065/ab219c

    • NAID

      210000156015

    • Peer Reviewed / Open Access
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Journal Article] Selective production of ROS and RNS in the plasma treated water by using nonthermal low- and high-frequency plasma jets2018

    • Author(s)
      Giichiro Uchida, Kosuke Takenaka, Keigo Takeda, Kenji Ishikawa, Masaru Hori, Yuichi Setsuhara
    • Journal Title

      Jpn J Appl Phys

      Volume: 57 Issue: 1 Pages: 0102B4-0102B4

    • DOI

      10.7567/jjap.57.0102b4

    • Peer Reviewed / Open Access
    • Data Source
      KAKENHI-WRAPUP-17H06075, KAKENHI-PROJECT-17H02805
  • [Journal Article] Fabrication of high-performance InGaZnOx thin film transistors based on control of oxidation using a low-temperature plasma2018

    • Author(s)
      Takenaka Kosuke、Endo Masashi、Uchida Giichiro、Setsuhara Yuichi
    • Journal Title

      Applied Physics Letters

      Volume: 112 Issue: 15 Pages: 152103-152103

    • DOI

      10.1063/1.5011268

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Journal Article] Low-temperature formation of c-axis-oriented aluminum nitride thin films by plasma-assisted reactive pulsed-DC magnetron sputtering2017

    • Author(s)
      Takenaka Kosuke、Satake Yoshikatsu、Uchida Giichiro、Setsuhara Yuichi
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 57 Issue: 1S Pages: 01AD06-01AD06

    • DOI

      10.7567/jjap.57.01ad06

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Journal Article] Process controllability of inductively coupled plasma-enhanced reactive sputter deposition for the fabrication of a-InGaZnOx channel TFTs2016

    • Author(s)
      K. Takenaka, K. Nakata, H. Otani, S. Osaki, G. Uchida, Y. Setsuhara
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 55 Issue: 1S Pages: 01AA18-01AA18

    • DOI

      10.7567/jjap.55.01aa18

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-26630335
  • [Journal Article] Effects of working pressure on the physical properties of a-InGaZnOx films formed using inductively-coupled plasma-enhanced reactive sputtering deposition2016

    • Author(s)
      Kosuke Takenaka, Keitaro Nakata, Giichiro Uchida, Yuichi Setsuhara, Akinori Ebe
    • Journal Title

      EEE Transactions on Plasma Science

      Volume: 44 Issue: 12 Pages: 3099-3106

    • DOI

      10.1109/tps.2016.2593458

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Journal Article] Effects of nonthermal plasma jet irradiation on the selective production of H2O2 and NO2- in liquid water2016

    • Author(s)
      G. Uchida, A. Nakajima, T. Ito, K. Takenaka, T. Kawasaki, K. Koga, M. Shiratani, Y. Setsuhara
    • Journal Title

      Journal of Applied Physics

      Volume: 120 Issue: 20 Pages: 203302-203302

    • DOI

      10.1063/1.4968568

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-24108003, KAKENHI-PLANNED-24108009, KAKENHI-PROJECT-16H03895, KAKENHI-PROJECT-25820113
  • [Journal Article] Control of reactive oxygen and nitrogen species production in liquid by nonthermal plasma jet with controlled surrounding gas2016

    • Author(s)
      T. Ito, G. Uchida, A. Nakajima, K. Takenaka, Y. Setsuhara
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 56 Issue: 1S Pages: 01AC06-01AC06

    • DOI

      10.7567/jjap.56.01ac06

    • NAID

      210000147376

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Low-temperature atmospheric-pressure plasma sources for plasma medicine2016

    • Author(s)
      Y. Setsuhara
    • Journal Title

      Archives of Biochemistry and Biophysics

      Volume: 605 Pages: 3-10

    • DOI

      10.1016/j.abb.2016.04.009

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Influence of voltage pulse width on the discharge characteristics in an atmospheric dielectric-barrier-discharge plasma jet2016

    • Author(s)
      Giichiro Uchida, Kosuke Takenaka, Yuichi Setsuhara
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 55 Issue: 1S Pages: 01AH03-01AH03

    • DOI

      10.7567/jjap.55.01ah03

    • NAID

      210000146000

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Low-temperature formation of amorphous InGaZnOx films with inductively coupled plasma-enhanced reactive sputter deposition2015

    • Author(s)
      Kosuke Takenaka, Ken Cho, Yasufumi Ohchi, Hirofumi Otani, Giichiro Uchida, Yuichi Setsuhara
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 54 Issue: 6S2 Pages: 06GC02-06GC02

    • DOI

      10.7567/jjap.54.06gc02

    • NAID

      210000145321

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-26630335
  • [Journal Article] Atmospheric-Pressure Gas-Breakdown Characteristics with a Radio-Frequency Voltage2015

    • Author(s)
      G. Uchida, K. Takenaka, A. Miyazaki and Y. Setsuhara
    • Journal Title

      J. Nanosci. Nanotechnol.

      Volume: 15 Issue: 3 Pages: 2192-2196

    • DOI

      10.1166/jnn.2015.10233

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Low-temperature formation of a-IGZO films with inductively coupled plasma-enhanced reactive sputter deposition2015

    • Author(s)
      Kosuke Takenaka, Ken Cho, Yasufumi Ohchi, Hirofumi Otani, Giichiro Uchida and Yuichi Setsuhara
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 印刷中

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-26630335
  • [Journal Article] Atmospheric-Pressure Plasma Interaction with Soft Materials as Fundamental Processes in Plasma Medicine2015

    • Author(s)
      K. Takenaka, A. Miyazaki, G. Uchida and Y. Setsuhara
    • Journal Title

      J. Nanosci. Nanotechnol.

      Volume: 15 Issue: 3 Pages: 2115-2119

    • DOI

      10.1166/jnn.2015.10229

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Influence of He Gas Flow Rate on Optical Emission Characteristics in Atmospheric-Dielectric Plasma Jet2015

    • Author(s)
      G. Uchida, K. Takenaka, K. Kawabata and Y. Setsuhara
    • Journal Title

      IEEE Trans. Plasma Sci.

      Volume: 43 Issue: 3 Pages: 734-744

    • DOI

      10.1109/tps.2014.2387064

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Dynamic Properties of Helium Atmospheric Dielectric-Barrier-Discharge Plasma Jet2015

    • Author(s)
      G. Uchida, K. Takenaka, A. Miyazaki, K. Kawabata and Y. Setsuhara
    • Journal Title

      J. Nanosci. Nanotechnol.

      Volume: 15 Issue: 3 Pages: 2324-2329

    • DOI

      10.1166/jnn.2015.10232

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Gas Flow Rate Dependence of the Discharge Characteristics of a Plasma Jet Impinging Onto the Liquid Surface2015

    • Author(s)
      Giichiro Uchida, Atsushi Nakajima, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yuichi Setsuhara
    • Journal Title

      IEEE Transactions on Plasma Science

      Volume: 43 Issue: 12 Pages: 4081-4087

    • DOI

      10.1109/tps.2015.2488619

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-24108003, KAKENHI-PLANNED-24108009, KAKENHI-PROJECT-24340143
  • [Journal Article] Plasma Interaction with Organic Molecules in Liquid as Fundamental Processes in Plasma Medicine2015

    • Author(s)
      K. Takenaka, A. Miyazaki, H. Abe, G. Uchida and Y. Setsuhara
    • Journal Title

      J. Nanosci. Nanotechnol.

      Volume: 15 Issue: 3 Pages: 2120-2124

    • DOI

      10.1166/jnn.2015.10230

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Analysis of Dynamic Discharge Characteristics of Plasma Jet Based on Voltage and Current Measurements Using a Metal Plate2015

    • Author(s)
      Yuichi Setsuhara, Giichiro Uchida, Kazufumi Kawabata, Atsushi Nakajima, Kosuke Takenaka
    • Journal Title

      IEEE Transactions on Plasma Science

      Volume: 43 Issue: 11 Pages: 3821-3826

    • DOI

      10.1109/tps.2015.2482998

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Effects of gas flow on oxidation reaction in liquid induced by He/O2 plasma-jet irradiation2015

    • Author(s)
      A. Nakajima, G. Uchida, T. Kawasaki, K. Koga, T. Sarinont, T. Amano, K. Takenaka, M. Shiratani, and Y. Setsuhara
    • Journal Title

      Journal of Applied Physics

      Volume: 118 Issue: 4 Pages: 043301-043301

    • DOI

      10.1063/1.4927217

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-25820113, KAKENHI-PLANNED-24108003, KAKENHI-PLANNED-24108009
  • [Journal Article] Effects of discharge voltage waveform on the discharge characteristics in a helium atmospheric plasma jet2015

    • Author(s)
      G. Uchida, K. Takenaka, Y. Setsuhara
    • Journal Title

      Journal of Applied Physics

      Volume: 117 Issue: 15 Pages: 1533011-6

    • DOI

      10.1063/1.4918546

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Investigation of Plasma-Organic Materials Interaction in Aqueous Solution with Atmospheric Pressure Plasmas2014

    • Author(s)
      Kosuke Takenaka, Atsushi Miyazaki and Yuichi Setsuhara
    • Journal Title

      Journal of Physics: Conference Series

      Volume: 未定

    • Peer Reviewed
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] プラズマを用いたソフトマテリアルプロセス技術の展開 ~低温・低ダメージの材料プロセスからプラズマ医療~2014

    • Author(s)
      節原 裕一
    • Journal Title

      スマートプロセス学会誌

      Volume: 3 Pages: 15-21

    • NAID

      130004972746

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Journal Article] Effect of Driving Voltage Frequency on the Discharge Characteristics in Atmospheric Dielectric-Barrier-Discharge Plasma Jet2014

    • Author(s)
      G. Uchida, K. Takenaka, K. Kawabata, A. Miyazaki and Y. Setsuhara
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 53 Issue: 11S Pages: 11RA08-11RA08

    • DOI

      10.7567/jjap.53.11ra08

    • NAID

      210000144622

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Molecular-Structure Variation of Organic Materials Irradiated with Atmospheric Pressure Plasma2014

    • Author(s)
      K. Takenaka, A. Miyazaki and Y. Setsuhara
    • Journal Title

      J. Phys. : Conf. Ser.

      Volume: 518 Pages: 12018-12018

    • DOI

      10.1088/1742-6596/518/1/012018

    • Peer Reviewed / Acknowledgement Compliant / Open Access
    • Data Source
      KAKENHI-PLANNED-24108003, KAKENHI-PROJECT-26420738
  • [Journal Article] Investigation of Plasma-Organic Materials Interaction in Aqueous Solution with Atmospheric Pressure Plasmas2014

    • Author(s)
      K. Takenaka, A. Miyazaki and Y. Setsuhara
    • Journal Title

      J. Phys. : Conf. Ser.

      Volume: 518 Pages: 12019-12019

    • DOI

      10.1088/1742-6596/518/1/012019

    • Peer Reviewed / Acknowledgement Compliant / Open Access
    • Data Source
      KAKENHI-PLANNED-24108003, KAKENHI-PROJECT-26420738
  • [Journal Article] プラズマを用いたソフトマテリアルプロセス技術の展開 ~低温・低ダメージの材料プロセスからプラズマ医療~2014

    • Author(s)
      節原 裕一
    • Journal Title

      スマートプロセス学会誌

      Volume: 3 Pages: 15-21

    • NAID

      130004972746

    • Peer Reviewed
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Molecular-Structure Variation of Organic Materials Irradiated with Atmospheric Pressure Plasma2014

    • Author(s)
      Kosuke Takenaka, Atsushi Miyazaki and Yuichi Setsuhara
    • Journal Title

      Journal of Physics: Conference Series

      Volume: 未定

    • Peer Reviewed
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Molecular-structure variation of biomolecules irradiated with atmospheric-pressure plasma through plasma/liquid interface2014

    • Author(s)
      K. Takenaka, A. Miyazaki, K. Kawabata, G. Uchida and Y. Setsuhara
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 54 Issue: 1S Pages: 01AF04-01AF04

    • DOI

      10.7567/jjap.54.01af04

    • NAID

      210000144756

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity- Controlled Deposition of Microcrystalline Silicon Thin Films2013

    • Author(s)
      Kosuke Takenaka, Yuichi Setsuhara and Akinori Ebe
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 52 Issue: 11S Pages: 11NB05-11NB05

    • DOI

      10.7567/jjap.52.11nb05

    • NAID

      210000143099

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Journal Article] Investigations on Plasma-Biomolecules Interactions as Fundamental Process for Plasma Medicine2013

    • Author(s)
      K. Takenaka, K. Cho, Y. Setsuhara, M. Shiratani, M. Sekine and M. Hori
    • Journal Title

      Journal of Physics: Conference Series

      Volume: 掲載確定

    • Peer Reviewed
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Plasma interaction with Zn nano layer on organic materials for analysis of early stage of inorganic/organic hybrid multi-layer formation2013

    • Author(s)
      Ken Cho, Kosuke Takenaka, Yuichi Setsuhara
    • Journal Title

      Surface and Coatings Technology

      Volume: 228 Pages: S271-S275

    • DOI

      10.1016/j.surfcoat.2012.05.126

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23360325, KAKENHI-PROJECT-23656465
  • [Journal Article] プラズマとソフトマテリアルとの相互作用 -低ダメージの表面プロセスからプラズマ医療にわたる基礎過程-2013

    • Author(s)
      節原 裕一
    • Journal Title

      表面技術

      Volume: 64 Pages: 628-633

    • NAID

      130004704921

    • Peer Reviewed
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Journal Article] Plasma Interactions with Organic Materials in Liquid through Plasma/Liquid Interface2013

    • Author(s)
      Kosuke Takenaka, and Yuichi Setsuhara
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 52 Issue: 11S Pages: 11NE04-11NE04

    • DOI

      10.7567/jjap.52.11ne04

    • NAID

      210000143115

    • Peer Reviewed
    • Data Source
      KAKENHI-ORGANIZER-24108001, KAKENHI-PLANNED-24108003, KAKENHI-PROJECT-24760597
  • [Journal Article] Plasma Interactions with Amino Acid (L-Alanine) as a Basis of Fundamental Processes in Plasma Medicine2013

    • Author(s)
      Y. Setsuhara, K. Cho, M. Shiratani, M. Sekine and M. Hori
    • Journal Title

      Current Applied Physics

      Volume: 13 Pages: S59-S63

    • DOI

      10.1016/j.cap.2013.01.030

    • Peer Reviewed
    • Data Source
      KAKENHI-ORGANIZER-24108001, KAKENHI-PLANNED-24108003
  • [Journal Article] Plasma Interactions with Biological Molecules in Aqueous Solution2013

    • Author(s)
      Yuichi Setsuhara, Atsushi Miyazaki, Kosuke Takenaka, and Masaru Hori
    • Journal Title

      MRS Proc.

      Volume: 1598

    • DOI

      10.1557/opl.2013.1155

    • Peer Reviewed
    • Data Source
      KAKENHI-PLANNED-24108002, KAKENHI-PLANNED-24108003
  • [Journal Article] Investigations on Plasma-Biomolecules Interactions as Fundamental Process for Plasma Medicine2013

    • Author(s)
      Kosuke Takenaka, Ken Cho, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori
    • Journal Title

      Journal of Physics: Conference Series

      Volume: 441 Pages: 012001-012001

    • DOI

      10.1088/1742-6596/441/1/012001

    • Peer Reviewed
    • Data Source
      KAKENHI-ORGANIZER-24108001, KAKENHI-PLANNED-24108002
  • [Journal Article] Effects of Irradiation with Ions and Photons in Ultraviolet-Vacuum Ultraviolet Regions on Nano-Surface Properties of Polymers Exposed to Plasmas2012

    • Author(s)
      Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 51 Issue: 1S Pages: 01AJ02-01AJ02

    • DOI

      10.1143/jjap.51.01aj02

    • NAID

      210000140089

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23360325, KAKENHI-PROJECT-23656465
  • [Journal Article] Investigation of chemical bonding states at interface of Zn/organic materials for analysis of early stage of inorganic/organic hybrid multi-layer formation2012

    • Author(s)
      Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Masaharu Shiratani, Makoto Sekine, Masaru Hori
    • Journal Title

      Thin Solid Films

      Volume: 523 Pages: 15-19

    • DOI

      10.1016/j.tsf.2012.05.061

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23360325, KAKENHI-PROJECT-23656465
  • [Journal Article] フレキシブルデバイス創製に向けたプラズマ-ソフトマテリアル相互作用の解析2011

    • Author(s)
      趙 研, 節原 裕一, 竹中 弘祐, 白谷 正治, 関根 誠, 堀 勝
    • Journal Title

      高温学会誌

      Volume: 37 Pages: 289-297

    • NAID

      10030167027

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Journal Article] フレキシブルデバイス創製に向けたプラズマーソフトマテリアル相互作用の解析2011

    • Author(s)
      趙研, 節原裕一, 竹中弘祐, 白谷正治, 関根誠, 堀勝
    • Journal Title

      高温学会誌

      Volume: 37 Pages: 289-297

    • NAID

      10030167027

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Journal Article] Low-Temperature and Nano-Suiface Modification of Materials with Low-Damage Plasma and Photon-Induced Phonon Excitation Processes2007

    • Author(s)
      Y., Setsuhara
    • Journal Title

      The international workshop on advanced thin films and surface technology, Changwon, Korea., Novemver 13, 2007

      Pages: 3-3

    • Data Source
      KAKENHI-PROJECT-19026009
  • [Journal Article] Designing of Meters-Scale Ultra-Large Area RF Plasma Sources Sustained with Multiple Low-Inductance-Antenna Modules2007

    • Author(s)
      Y.Setsuhara
    • Journal Title

      Proc. 24th Symp. on Plasma Processing, Osaka, Japan, 2007.1.29-31

      Pages: 61-62

    • Data Source
      KAKENHI-PROJECT-16656226
  • [Journal Article] Low-Damage Plasma and Photon-Induced Processes for Low-Temperature and Nano-Surface Modification of Materials2007

    • Author(s)
      Y., Setsuhara
    • Journal Title

      Trans-Pacific Workshop on Flexible Electronics, Dallas, USA, December 3, 2007.

      Pages: 16-16

    • Data Source
      KAKENHI-PROJECT-19026009
  • [Journal Article] Phase Structure Control of Yttrium Iron Garnet Nanoparticle Films Using Inductively-Coupled High-Pressure RF Plasmas2007

    • Author(s)
      Y.Setsuhara
    • Journal Title

      Proc. 24th Symp. on Plasma Processing, Osaka, Japan, 2007.1.29-31

      Pages: 111-112

    • Data Source
      KAKENHI-PROJECT-16656226
  • [Journal Article] Development of Internal-Antenna-Driven RF Plasma Sources for Ultra-Large-Area Deposition of Carbon-Related Films2006

    • Author(s)
      Y.Setsuhara
    • Journal Title

      11th International Conferences on Modern Materials and Technologies, Acireale, Sicily, Italy, 2006.6.4-9, (2006) (INVITED)

      Pages: 179-180

    • Data Source
      KAKENHI-PROJECT-16656226
  • [Journal Article] Properties of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Modules2006

    • Author(s)
      K.Takenaka, Y.Setsuhara, K.Nishisaka, A.Ebe, S.Sugiura, K.Takahashi, K.Ono
    • Journal Title

      Proc.6th International Conf. on Reactive Plasmas and 23rd Symp. on Plasma Processing, Matsushima, Japan, Jan.24-27

      Pages: 183-184

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] Development of Meters-Scale Large-Area RF Plasma Sources with Control Capabilities of Power deposition Profiles2006

    • Author(s)
      Y.Setsuhara
    • Journal Title

      Proc.6^<th> International Conf.on Reactive Plasmas and 23^<nd> Symp.on Plasma Processing, Matsushima, Japan, Jan.24-27,(2006)

      Pages: 179-180

    • Data Source
      KAKENHI-PROJECT-16656226
  • [Journal Article] Microwave-sustained miniature plasmas for an ultra small thruster2006

    • Author(s)
      Y.Takao, K.Ono, K.Takahashi, Y.Setsuhara
    • Journal Title

      Thin Solid Films (in press)

    • NAID

      120005553870

    • Data Source
      KAKENHI-PROJECT-16040211
  • [Journal Article] Technologies for next-generation shallow junction formation2005

    • Author(s)
      Y.Setsuhara
    • Journal Title

      Research Report for Feasibility of Applications in Optical Technologies - Femtosecond Laser Processing Technologies - (Optoelectronic Industry And Technology Development Association)

      Pages: 63-89

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] Nonequilibrium Activation of Boron-Implanted Ultra-Shallow Junctions By Femtosecond-Laser Induced Phonon Excitation Process2005

    • Author(s)
      Y.Setsuhara
    • Journal Title

      4th International Conference on Silicon Epitaxy and Hetereostructures (ICSI-4), Awaji, Japan, May 23-26, (2005)

      Pages: 306-307

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] 次世代メートルサイズ大面積プロセス用プラズマ源2005

    • Author(s)
      節原裕一
    • Journal Title

      プラズマ・核融合学会誌 81・2

      Pages: 85-93

    • NAID

      110003827774

    • Data Source
      KAKENHI-PROJECT-16656226
  • [Journal Article] メートルサイズの大面積プロセスに向けたプラズマ技術2005

    • Author(s)
      節原裕一
    • Journal Title

      表面技術 56・5

      Pages: 268-275

    • NAID

      10015665593

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] Meter-scale Large-Area Plasma Sources for Next-Generation Processes2005

    • Author(s)
      Y.Setsuhara
    • Journal Title

      J.Plasma and Fusion Research 81(2)

      Pages: 85-93

    • NAID

      110003827774

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] メートルサイズの大面積プロセスに向けたプラズマ技術2005

    • Author(s)
      節原裕一
    • Journal Title

      表面技術 56・5

      Pages: 268-275

    • NAID

      10015665593

    • Data Source
      KAKENHI-PROJECT-16656226
  • [Journal Article] Microwave-sustained miniature plasmas for an ultra small thruster2005

    • Author(s)
      Y.Takao, K.Ono, K.Takahashi, Y.Setsuhara
    • Journal Title

      Thin Solid Films (in press)

    • NAID

      120005553870

    • Data Source
      KAKENHI-PROJECT-14655364
  • [Journal Article] Nonequilibrium Activation of Boron-Implanted Ultra-Shallow Junctions By Femtosecond-Laser Induced Phonon Excitation Process2005

    • Author(s)
      Y.Setsuhara, M.Hashida, M.Fujita
    • Journal Title

      4th International Conference on Silicon Epitaxy and Heterostructures (ICSI-4), Awaji, Japan, May 23-26

      Pages: 306-307

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] 次世代メートルサイズ大面積プロセス用プラズマ源2005

    • Author(s)
      節原裕一
    • Journal Title

      プラズマ・核融合学会誌 81・2

      Pages: 85-93

    • NAID

      110003827774

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] 次世代半導体接合形成2005

    • Author(s)
      節原裕一
    • Journal Title

      光技術応用システムのフィージビリティー調査報告書-フェムト秒加工技術-(財団法人光産業技術振興協会)

      Pages: 63-89

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] Microwave-sustained miniature plasmas for an ultra small thruster2005

    • Author(s)
      Y.Takao, K.Ono, K.Takahashi, Y.Setsuhara
    • Journal Title

      Thin Solid Films (in press)

    • NAID

      120005553870

    • Data Source
      KAKENHI-PROJECT-16040211
  • [Journal Article] Plasma Technologies for Meters-scale Large-Area Processes2005

    • Author(s)
      Y.Setsuhara, A.Ebe
    • Journal Title

      J.Surface Finishing Society of Japan 56(5)

      Pages: 268-275

    • NAID

      10015665593

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] Optical emission spectroscopy of a microwave-excited plasma source for very small propulsion2004

    • Author(s)
      Y.Takao, K.Ono, K.Takahashi, Y.Setsuhara
    • Journal Title

      Bulletin of the American Physical Society Vol.49,No.5

      Pages: 40-40

    • Data Source
      KAKENHI-PROJECT-14655364
  • [Journal Article] Low-Temperature Activation of Ion Implanted Nano-Scale Dopant Layer for Ultra-Shallow Semiconductor Junction Formation by Nonequilibrium Phonon Excitation Processes2004

    • Author(s)
      Y.Setsuhara, M.Hashida, M.Fujita, K.Takahashi, K.Ono
    • Journal Title

      Ninth International Conference on Plasma Surface Engineering (Garmisch-Partenkirchen, Germany, September 13-17)

      Pages: 372-372

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] Formation of Ultra-Shallow Junctions by Laser-Induced Nonequillibrium Modification Process of Surface Nano Layers2004

    • Author(s)
      Y.Setsuhara
    • Journal Title

      Proc.7th China-Japan Symposium on Thin Films (Chengdu, China, September 20-22, 2004)

      Pages: 23-24

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] Standing-Wave-Free Large-Area Inductively Coupled Plasmas with Multiple Low-Inductance Antenna Modules -Novel Plasma Technologies toward Meters-Scale FPD Processing-2004

    • Author(s)
      Y.Setsuhara, A.Ebe
    • Journal Title

      Proc.The International Union of Material Research Society -International Conference in Asian 2004 (IUMRS-ICA-2004), Hsinchu, Taiwan, November 16-18, (2004) (CDROM)

      Pages: 1-12

    • Data Source
      KAKENHI-PROJECT-16656226
  • [Journal Article] Formation of Ultra-Shallow Junctions by Laser-Induced Nonequilibrium Modification Process of Surface Nano Layers2004

    • Author(s)
      Y.Setsuhara, M.Hashida, M.Fujita
    • Journal Title

      Proc.7th China-Japan Symposium on Thin Films, Chengdu Sichuan, China, September 20-22

      Pages: 23-24

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] Standing-Wave-Free Large-Area Inductively Coupled Plasmas with Multiple Low-Inductance Antenna Modules - Novel Plasma Technologies toward Meters-Scale FPD Processing -2004

    • Author(s)
      Y.Setsuhara, A.Ebe
    • Journal Title

      Proc.The International Union of Material Research Society - International Conference in Asian 2004 (IUMRS-ICA-2004),Hsinchu, Taiwan, November 16-18,(2004) (CDROM)

      Pages: 1-12

    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] 誘導結合型フルオロカーボンプラズマを用いた高誘電率HfO_2薄膜のエッチング2004

    • Author(s)
      高橋和生, 斧 高一, 節原裕一
    • Journal Title

      表面技術 Vol.55 No.12

      Pages: 793-799

    • NAID

      10014096314

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-14380209
  • [Journal Article] Standing-Wave-Free Large-Area Inductively Coupled Plasmas with Multiple Low-Inductance Antenna Modules - Novel Plasma Technologies toward Meters-Scale FPD Processing -2004

    • Author(s)
      Y.Setsuhara
    • Journal Title

      Proc.The International Union of Material Research Society - International Conference in Asia 2004 (IUMRS-ICA-2004), Hsinchu, Taiwan, November 16-18, (2004) (CDROM)

      Pages: 1-12

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] Low-Temperature Activation of Ion Implanted Nano-Scale Dopant Layer for Ultra-Shallow Semiconductor Junction Formation by Nonequillibrium Phonon Exitation Processes2004

    • Author(s)
      Y.Setsuhara, M.Hashida, M.Fujita, K.Takahashi, K.Ono
    • Journal Title

      Ninth International conference on Plasma Surface Engineering(Garmisch-Partenkirchen, Germany, September 13-17,2004)

      Pages: 372-372

    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] Formation of Ultra-Shallow Junctions by Laser-Induced Nonequillibrium Modification Process of Surface Nano Layers2004

    • Author(s)
      Y.Setsuhara, M.Hashida, M.Fujita
    • Journal Title

      Proc.7th China-Japan Symposium on Thin Films(Chengdu, China, September 20-22,2004)

      Pages: 23-24

    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] Standing-Wave-Free Large-Area Inductively Coupled Plasmas with Multiple Low-Inductance Antenna Modules2004

    • Author(s)
      Y.Setsuhara, A.Ebe
    • Journal Title

      Proc. The International Union of Material Research Society - International Conference in Asian 2004 (IUMRS-ICA-2004), Hsinchu, Taiwan, November 16-18 (CD-ROM)

      Pages: 1-12

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] Etching of High Dielectric Constant HfO_2 Thin Films in Inductively Coupled Fluorocarbon Plasmas2004

    • Author(s)
      K.Takahashi, K.Ono, Y.Setsuhara
    • Journal Title

      J.Surface Finishing Soc.Jpn.[in Japanese] Vol.55, No.12

      Pages: 793-799

    • NAID

      10014096314

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-14380209
  • [Journal Article] Optical emission spectroscopy of a microwave-excited plasma source for very small propulsion2004

    • Author(s)
      Y.Takao, K.Ono, K.Takahashi, Y.Setsuhara
    • Journal Title

      Bulletin of the American Physical Society Vol.49,No.5

      Pages: 40-40

    • Data Source
      KAKENHI-PROJECT-16040211
  • [Journal Article] Low-Temperature Activation of Ion Implanted Nano-Scale Dopant Layer for Ultra-Shallow Semiconductor Junction Formation by Nonequillibrium Phonon Excitation Processes2004

    • Author(s)
      Y.Setsuhara
    • Journal Title

      Ninth International Conference on Plasma Surface Engineering (Garmisch-Partenkirchen, Germany, September 13-17, 2004)

      Pages: 372-372

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] PHOTON-INDUCED PHONON EXCITATION PROCESS AS NONEQUILLIBRIUM SUBSURACE MODIFICATION OF ION-IMPLANTED NANO-SCALE LAYER FOR ULTRA-SHALLOW JUNCTION FORMATION2003

    • Author(s)
      Y.Setsuhara
    • Journal Title

      4th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2003), Jeju, Korea, September 28-October 3

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] Photon-Induced Phonon Excitation Process As Nonequilibrium SUBSURFACE MODIFICATION OF ION-IMPLANTED NANO-SCALE LAYER FOR ULTRA-SHALLOW JUNCTION FORMATION2003

    • Author(s)
      Y.Setsuhara
    • Journal Title

      4th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2003), Jeju, Korea, September 28-October 3

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] NONEQUILIBRIUM FORMATION OF NANOSCALE ULTRA-SHALLOW JUNCTIONS BY COHERENT PHONON EXCITATION PROCESS2003

    • Author(s)
      Y.Setsuhara, M.Hashida, M.Fuita, S.Adachi, B.Mizuno, K.Takahashi, K.Nogi, K.Ono
    • Journal Title

      International Conference on the Characterization and Control of Interfaces for High Quality Advanced Materials, Kurashiki, Japan, September 24-27

      Pages: 91-91

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] NONEQUILLIBRIUM FORMATION OF NANOSCALE ULTRA-SHALLOW JUNCTIONS BY COHERENT PHONON EXCITATION PROCESS2003

    • Author(s)
      Y.Setsuhara
    • Journal Title

      International Conference on the Characterization and Control of Interfaces for High Qulity Advanced Materials, Kurashiki, Japan, September 24-27

      Pages: 91-91

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-15360388
  • [Journal Article] Profile Simulation Model for Nanometer-Scale Control of Critical Dimensions and Etched Profiles2002

    • Author(s)
      A.Sano, K.Ono, K.Takahashi, Y.Setsuhara
    • Journal Title

      Proc.2nd International Symposium on Dry Process, DPS-2004, Tokyo, Japan 2002

      Pages: 177-182

    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-14380209
  • [Journal Article] Profile Simulation Model for Nanometer-Scale Control of Critical Dimensions and Etched Profiles2002

    • Author(s)
      A.Sano, K.Ono, K.Takahashi, Y.Setsuhara
    • Journal Title

      Proc.2nd International Symposium on Dry Process, DPS-2004, Tokyo (IEEJ, Tokyo, 2002)

      Pages: 177-182

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-14380209
  • [Patent] プラズマ発生装置及びこれを用いたプラズマ生成方法2017

    • Inventor(s)
      節原裕一,内田儀一郎,竹中弘祐
    • Industrial Property Rights Holder
      大阪大学
    • Industrial Property Rights Type
      特許
    • Industrial Property Number
      2017-068320
    • Filing Date
      2017-03-30
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] プラズマ支援反応性パルスDCスパッタリングを用いたa-IGZO薄膜の特性制御2024

    • Author(s)
      竹中 弘祐, 上田 拓海, 都甲 将, 江部 明憲, 節原 裕一
    • Organizer
      2024年第71回応用物理学会春季学術講演会,東京都市大学世田谷キャンパス&オンライン,(2024.03.22-2024.03.25)
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] プラズマ支援反応性スパッタリングによるアモルファス酸化ガリウム薄膜形成2023

    • Author(s)
      竹中 弘祐、小松 響、藤村 知輝、都甲 将、井手 啓介、江部 明憲、神谷 利夫、節原 裕一
    • Organizer
      2023年第70回応用物理学会春季学術講演会,上智大学四谷キャンパス+オンライン,(2023.03.15-2023.03.18)
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] Reactivity-Control Plasma Processes for Low-Temperature Formation of High-Quality Oxide Thin-Film Transistors2023

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
    • Organizer
      International Conference on PROCESSING & MANUFACTURING OF ADVANCED MATERIALS, (THERMEC‘2023),VIENNA, AUSTRIA,(2023.07.03-2023.07.07)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] Development of Plasma Assisted Reactive Process for Uniform Formation of High Mobility Oxide Semiconductor Thin Film Transistors over Large Areas2023

    • Author(s)
      Kosuke Takenaka, Tomoki Yoshitani, Susumu Toko, Giichiro Uchida, Akinori Ebe, Yuichi Setsuhara
    • Organizer
      7th International Conference on Advances in Functional Materials (AFM2022),Centennial Hall of Kyushu University. Kyushu, Japan,(2023.01.09-2023.01.12)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] Formation of Ga-based amorphous oxide thin film transistors using plasma-assisted reactive processes2023

    • Author(s)
      Kosuke Takenaka, Hibiki Komatsu, Susumu Toko, Akinori Ebe, Yuichi Setsuhara
    • Organizer
      25th International Symposium on Plasma Chemistry(ISPC25),Miyako Messe、Kyoto, Japan,(2023.05.21-2023.05.26)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] Fabrication of amorphous gallium oxide thin film transistors by plasma-assisted reactive processes2023

    • Author(s)
      K. Takenaka, T. Komatsu, S. Toko, Y. Setsuhara
    • Organizer
      The 44th International Symposium on Dry Process (DPS2023),Winc Aichi, Nagoya, Japan,(2023.11.21-2023.11.22)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] Reactive Plasma Processes for Low-Temperature Formation of High-Mobility IGZO Thin-Film Transistors2022

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Hiroyuki Hirayama, Giichiro Uchida, Akinori Ebe
    • Organizer
      Annual Meeting, Center For Plasma and Thin Film Technologies (CPTFT), Ming Chi University of Technology, online,(2022.06.17)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] 高移動度IGZO薄膜トランジスタの大面積均一形成に向けたプラズマ支援反応性プロセスの開発2022

    • Author(s)
      竹中 弘祐、吉谷 友希、都甲 将、内田 儀一郎、江部 明憲、節原 裕一
    • Organizer
      2022年第69回応用物理学会春季学術講演会,ハイブリッド開催(青山学院大学相模原キャンパス+オンライン),(2022.03.22-2022.03.26)
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] Development of Plasma Processing Technology for Low-temperature Formation of High Quality Functional Thin Films2022

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Susumu Toko, Keisuke Ide, Toshio Kamiya
    • Organizer
      The 2nd International Symposium on Design & Engineering by Joint Inverse Innovation for Materials Architecture (DEJI2MA-2) ,Senri Life Science Center, Osaka, Japan,(2022.10.25-2022.10.26)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] Low-temperature formation of functional oxide materials with plasma-assisted reactive processes2022

    • Author(s)
      K. Takenaka, S. Toko, Y. Setsuhara
    • Organizer
      第32回日本MRS年次大会 (MRS-J2021), 産業貿易センター(横浜, (2022.12.05)
    • Invited
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] 反応性プラズマプロセスによる酸化物半導体薄膜形成2022

    • Author(s)
      竹中 弘祐、都甲 将、節原 裕一
    • Organizer
      2021 (令和3)年度第3回溶接協会表面改質技術研究委員会,Web会議,(2022.02.21)
    • Invited
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] プラズマ支援反応プロセスで作成されたIGZO薄膜トランジスタの特性評価2022

    • Author(s)
      林 祐仁、小松 響、都甲 将、竹中 弘祐、江部 明憲、節原 裕一
    • Organizer
      The 39th Symposium on Plasma Processing/The 34th Symposium on Plasma Science for Materials (SPP-39/SPSM34),Web会議,(2022.01.24-2022.01.26)
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] Development of Plasma-Assisted Reactive Process for Large-Area Uniform Formation of High Mobility IGZO Thin-Film Transistors2022

    • Author(s)
      K. Takenaka, T. Yoshitani, G. Uchida, A. Ebe, Y. Setsuhara
    • Organizer
      The 43rd International Symposium on Dry Process (DPS2022),Osaka International Convention Center, (Osaka, Japan) & Online,(2022.11.24-2022.11.25)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] 反応性プラズマプロセスを用いた高性能IGZO薄膜トランジスタの低温形成2022

    • Author(s)
      竹中 弘祐、林 祐仁、都甲 将、江部 明憲、節原 裕一
    • Organizer
      2022年第83回応用物理学会秋季学術講演会,東北大学川内キャンパス&ハイブリッド開催,(2022.09.20-2022.09.23)
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] Low-Temperature Formation of High-Mobility IGZO Thin Films Transistors Fabricated with Plasma-Assisted Reactive Processes2022

    • Author(s)
      Yuichi Setsuhara, Hibiki Komatsu, Susumu Toko, Kosuke Takenaka, Akinori Ebe
    • Organizer
      11th International Conference on Reactive Plasmas (ICRP-11)/2022 Gaseous Electronics Conference (GEC 2022),Sendai International Center, Sendai, Japan ,(2022.10.03-2022.10.07)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] Plasma-assisted reactive processes for low-temperature formation of functional materials2021

    • Author(s)
      Kosuke Takenaka, Yuji Hayashi, Hibiki Komatsu, Susumu Toko, Giichiro Uchida, Akinori Ebe, Yuichi Setsuhara
    • Organizer
      5th Asia Pacific Conference on Plasma Physics (AAPPS-DPP2021), Remote e-conference,(2021.09.26-2021.10.01)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] Effect of process conditions on characteristics of InGaZnO thin-film transistors fabricated with plasma-assisted reactive process2021

    • Author(s)
      K. Takenaka, H. Hirayama, Y. Hayashi, H. Komatsu, G. Uchida, A. Ebe, Y. Setsuhara
    • Organizer
      The 42nd International Symposium on Dry Process (DPS2021),Web会議,(2021.11.18-2021.11.19)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] 反応性プラズマプロセスを用いた高移動度IGZO薄膜トランジスタの低温形成(IV)2021

    • Author(s)
      竹中 弘祐、平山 裕之、藤村 知輝、林 祐仁、内田 儀一郎、江部 明憲、節原 裕一
    • Organizer
      2021年第82回応用物理学会秋季学術講演会,Web会議,(2021.09.10-2021.09.13)
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] Plasma-Enhanced Reactive Processes for Low-Temperature Fabrication of High-Mobility Oxide Thin Film Transistors2021

    • Author(s)
      Kosuke Takenaka, Yuji Hayashi, Hibiki Komatsu, Susumu Toko, Giichiro Uchida, Akinori Ebe, Yuichi Setsuhara
    • Organizer
      INTERFINISH2020 20th World Congress, Web会議,(2021.09.06-2021.09.08)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23K21051
  • [Presentation] 反応性プラズマプロセスを用いた高移動度IGZO薄膜トランジスタの低温形成(II)2020

    • Author(s)
      節原 裕一、竹中 弘祐、平山 裕之、内田 儀一郎、江部 明憲
    • Organizer
      第67回応用物理学会春季学術講演会, 東京 (2020.03.12-2020.03.15)
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Effects of post-processing temperature on performance of IGZO TFTs fabricated with plasma-enhanced reactive processes2020

    • Author(s)
      Kosuke Takenaka, Masashi Endo, Tomoki Yoshitani, Hiroyuki Hirayama, Giichiro Uchida, Akinori Ebe, Yuichi Setsuhara
    • Organizer
      12th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2020) / (IC-PLANTS 2020), Nagoya, Japan (2020.03.08-2020.03.11)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] 反応性プラズマプロセスを用いた高移動度IGZO薄膜トランジスタの低温形成2019

    • Author(s)
      節原 裕一、竹中 弘祐、平山 裕之、遠藤 雅、内田 儀一郎、江部 明憲
    • Organizer
      第80回応用物理学会秋季学術講演会,北海道大学,(2019.09.18-2019.09.21)
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Low-temperature Formation of High-Mobility In GaZnOx Thin-Film Transistors by Plasma-Enhanced Reactive Processes2019

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Masashi Endo, Giichiro Uchida
    • Organizer
      7th Global Nanotechnology Congress and Expo, Kuala Lumpur, Malaysia (2019.12.02-2019.12.04)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] ICP-Enhanced Reactive Plasma Processes for Low-Temperature Formation of High-Mobility Oxide Semiconductor TFT2019

    • Author(s)
      Yuichi Setsuhara, Masashi Endo, Tomoki Yoshitani, Kosuke Takenaka, Giichiro Uchida, Akinori Ebe
    • Organizer
      The 5th Asian Workshop on Applied Plasma Science and Engineering 2019 (APSE2019),University of Malaya, Kuala Lumpur, Malaysia,(2019.01.28-2019.01.29)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Functional thin film deposition using plasma-assisted reactive process2019

    • Author(s)
      Kosuke Takenaka, Hiroyuki Hirayama, Yuichi Setsuhara, Keisuke Ide, Toshio Kamiya
    • Organizer
      International Symposium on Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development Satellite (iLIM-s), Nagoya, Japan (2019.11.01-2019.11.03)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Plasma-Enhanced Reactivity-Control Processes for Low-Temperature Formation of High-Mobility IGZO Thin-Film Transistors2019

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Hiroyuki Hirayama, Giichiro Uchida, Akinori Ebe
    • Organizer
      12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019), Jeju, Korea (2019.09.01-2019.09.05)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Plasma-assisted Reactive Process for Fabrication of High Mobility IGZO Thin Film Transistor at Low-Temperature2019

    • Author(s)
      Kosuke Takenaka, Hiroyuki Hirayama, Giichiro Uchida, Akinori Ebe, Yuichi Setsuhara
    • Organizer
      Materials Research Meeting 2019,Yokohama, Japan,(2019.12.10-2019.12.14)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Low-temperature formation of high-mobility InGaZnOx thin film transistor by ICP-enhanced reactive plasma processes2019

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Masashi Endo, Tomoki Yoshitani, Giichiro Uchida, Akinori Ebe
    • Organizer
      The 15th International Symposium on Sputtering and Plasma Processes (ISSP2019), Kanazawa, Japan (2019.06.11-2019.06.14)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Development of low-temperature plasma process for formation of functional thin films2019

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Hiroyuki Hirayama, Keisuke Ide, Toshio Kamiya
    • Organizer
      4th International Symposium on Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development (iLIM-4), Sendai, Japan (2019.10.03-2019.10.04)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Formation of amorphous oxide thin films using plasma-assisted reactive sputter deposition2019

    • Author(s)
      Hiroyuki Hirayama, Kosuke Takenaka, Yuichi Setsuhara
    • Organizer
      International Symposium on Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development Satellite (iLIM-s),Nagoya, Japan,(2019.11.01-2019.11.03)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Plasma-assisted reactive processes for low-temperature fabrication of high-mobility InGaZnOx TFTs2019

    • Author(s)
      Yuichi Setsuhara, Masashi Endo, Horoyuki Hirayama, Tomoki Yoshitani, Kosuke Takenaka, Giichiro Uchida, Akinori Ebe
    • Organizer
      XXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and 10th International Conference on Reactive Plasmas (ICRP-10), Sapporo, Hokkaido, Japan (2019.07.14-2019.07.19)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Reactive plasma processes for formation of high-mobility IGZO thin-film transistors2019

    • Author(s)
      Yuichi Setsuhara1, Kosuke Takenaka, Masashi Endo, Giichiro Uchida and Akinori Ebe
    • Organizer
      21st International Conference on Advanced Energy Materials and Research, Zurich, Switzerland (2019.07.11-2019.07.12)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Gate-bias instability of post-deposition plasma treated amorphous InGaZnOx thin-film transistors prepared with plasma-assisted reactive magnetron sputtering2018

    • Author(s)
      Kosuke Takenaka, Yuichi Setsuhara, Masashi Endo, Giichiro Uchida
    • Organizer
      40th International Symposium on Dry Process (DPS2018),Nagoya University, Nagoya,(2018.11.13-2018.11.15)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] 反応性プラズマプロセスを用いた機能性薄膜合成2018

    • Author(s)
      竹中 弘祐, 内田 儀一郎, 節原 裕一
    • Organizer
      日本溶接協会平成30年度第2回(通算88回) 表面改質技術研究委員会,神奈川,(2018.10.10)
    • Invited
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] ICP-Assisted Reactive Sputter Deposition and Plasma-Enhanced Annealing Processes for Low-Temperature Formation of High-Mobility In-Ga-Zn-O Thin-Film Transistors2018

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Masashi Endo, Giichiro Uchida, Akinori Ebe
    • Organizer
      16th International Conference on Plasma Surface Engineering,Congress Center, Garmisch-Partenkirchen, Germany,(2018.09.17-2018.09.21)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Low-Temperature Formation of High-Mobility IGZO Thin Film Transistor by Advanced Reactive Sputter Deposition Enhanced with ICP2018

    • Author(s)
      Yuichi Setsuhara, Masashi Endo, Kosuke Takenaka, Giichiro Uchida, Akinori Ebe
    • Organizer
      International Conference on Processing & Manufacturing of Advanced Materials Processing, Fabrication, Properties, Applications (THERMEC’2018),Paris, France,(2018.07.09-2018.07.13)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Plasma-Enhanced Reactive Processes for Low-Temperature Formation of High-Mobility IGZO Thin Film Transistor and Functional Films for Solar Cells2018

    • Author(s)
      Yuichi Setsuhara, Masashi Endo, Kosuke Takenaka, Giichiro Uchida, Akinori Ebe
    • Organizer
      5th Japan-Korea Joint Symposium on Advanced Solar Cells 2018 and 2nd International Symposium on Energy Research and Application,Sungkyunkwan University, Swuon, South Korea,(2018.02.05-2018.02.06)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] プラズマアシスト反応性プロセスを用いた低温での高移動度薄膜トランジスタの作製2018

    • Author(s)
      竹中 弘祐, 節原 裕一, 内田 儀一郎, 井手 啓介, 神谷 利夫
    • Organizer
      第2回酸化物半導体討論会/学際・国際的高度人材育成ライフイノベーションマテリアル創製共同研究プロジェクト分科会/第76回フロンティア材料研究所講演会,神奈川,(2018.10.26)
    • Invited
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] プラズマ支援反応性プロセスを用いた高移動度IGZO薄膜の低温形成2018

    • Author(s)
      節原 裕一、遠藤 雅、竹中 弘祐、内田 儀一郎、江部 明憲
    • Organizer
      第65回応用物理学会春季学術講演会,東京,(2018.03.18-2018.03.21)
    • Invited
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] 低ダメージ大面積プロセス対応プラズマ生成・制御技術の開発2018

    • Author(s)
      節原 裕一
    • Organizer
      2018年度フロンティア材料研究所学術賞受賞記念講演会・若手教員講演会,東京,(2018.09.04)
    • Invited
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Formation of Functional Thin Films at Low Temperature using Plasma-assisted Reactive Processes2018

    • Author(s)
      竹中 弘祐, 節原 Kosuke Takenaka, Masashi Endo, Tomoki Yoshitani, Hiroyuki Hirayama, Giichiro Uchida, Akinori Ebe, Yuichi Setsuhara裕一, 内田 儀一郎, 井手 啓介, 神谷 利夫
    • Organizer
      第28回日本MRS年次大会,西日本総合展示場 他,(2018.12.18-2018.12.20)
    • Invited
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Functional Thin Film Deposition by Advanced Plasma Assisted CVD & PVD Process2017

    • Author(s)
      Kosuke Takenaka, Masashi Endo, Giichiro Uchida, Y. Setsuhara
    • Organizer
      International union of materials research societies-The 15th International conference of advanced materials,Kyoto, Japan,(2017.08.27-2017.09.01)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Characterization of atmospheric-pressure plasma jets and interaction with liquid for control of reactive species in plasma-activated aqueous solutions2017

    • Author(s)
      Y. Setsuhara, G. Uchida, T. Ito, J. Ikeda, Y. Mino, K. Takenaka
    • Organizer
      International Conference on Plasma Medical Science Innovation (ICPMSI) 2017
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2017-02-27
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Advanced ICP-Enhanced Plasma Systems for Meters-Scale Large-Area Processes2017

    • Author(s)
      Akinori Ebe, Kazuaki Nishisaka, Kazuto Okazaki, Atsushi Osawa, Kosuke Takenaka, Yuichi Setsuhara
    • Organizer
      The 11th Asian-European International Conference on Plasma Surface Engineering,Jeju, Korea,(2017.09.11-2017.09.15)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] プラズマ支援反応性スパッタ製膜を用いた高移動度IGZO薄膜トランジスタの形成(II)2017

    • Author(s)
      節原 裕一、遠藤 雅、竹中 弘祐、内田 儀一郎、江部 明憲
    • Organizer
      第78回応用物理学会秋季学術講演会 ,福岡,(2017.09.05-2017.09.08)
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Low-Temperature Formation of High-Mobility IGZO Thin Film Transistors Using ICP-Enhanced Reactive Plasma Processes2017

    • Author(s)
      Yuichi Setsuhara, Masashi Endo, Kosuke Takenaka, Giichiro Uchida, Akinori Ebe
    • Organizer
      39th International Symposium on Dry Process (DPS2017),Tokyo, Japan,(2017.11.16-2017.11.17)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Advanced Plasma Processing for Formation of Functional Thin Films2017

    • Author(s)
      K. Takenaka, G. Uchida, K. Ide, T. Kamiya, Y. Setsuhara
    • Organizer
      2nd Int. Symp. on Creation of Life Innovation Materials for Interdisciplinary and International Researcher Development (iLIM-2),Nagoya, Japan ,(2017.09.29-2017.10.02)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] (特別講演)大気圧プラズマの現状と将来展望2017

    • Author(s)
      節原裕一
    • Organizer
      日本学術振興会プラズマ材料科学第153委員会プラズマ材料科学スクール
    • Place of Presentation
      東京
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Formation of High-mobility IGZO Thin Film Transistors Using ICP-enhanced Reactive Sputter Deposition2017

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Masashi Endo, Giichiro Uchida, Akinori Ebe
    • Organizer
      第34回プラズマプロセシング研究会(SPP34), 第29回プラズマ材料科学シンポジウム(SPSM29)
    • Place of Presentation
      札幌
    • Year and Date
      2017-01-16
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] ICP-Enhanced Reactive Sputter Deposition for Low-Temperature Formation of High-Mobility IGZO Thin Films Transistor2017

    • Author(s)
      Yuichi Setsuhara, Masashi Endo, Kosuke Takenaka, Giichiro Uchida, Akinori Ebe
    • Organizer
      The 22nd Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics and The 9th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials
    • Place of Presentation
      Suwon,Korea,
    • Year and Date
      2017-04-05
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] ICP-Enhanced Reactive Sputter Deposition for Low-Temperature Formation of High-Mobility IGZO Thin Films Transistor2017

    • Author(s)
      Yuichi Setsuhara, Masashi Endo, Kosuke Takenaka, Giichiro Uchida, Akinori Ebe
    • Organizer
      The 22nd Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics and The 9th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials,Suwon,Korea,(2017.04.05-2017.04.07)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Low-Temperature Formation of High-Mobility IGZO Thin Film Transistors for Flexible Electrinics with ICP-Enhanced Reactive Plasma Processes2017

    • Author(s)
      Kosuke Takenaka, Yuichi Setsuhara, Masashi Endo, Giichiro Uchida, Akinori Ebe
    • Organizer
      The 11th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2017),Jeju, Korea,(2017.09.11-2017.09.15)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Low-Temperature Formation of High-Mobility IGZO Thin Film Transistor by Advanced Reactive Sputter Deposition Enhanced with ICP2017

    • Author(s)
      Yuichi Setsuhara, Masashi Endo, Kosuke Takenaka, Giichiro Uchida, Akinori Ebe
    • Organizer
      Frontiers in Materials Processing Applications, Research and Technology,Bordeaux, France,(2017.07.09-2017.07.12)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Plasma-Liquid Interactions with Atmospheric-Pressure Plasma Jets for Controlling Reactive Species in Plasma-Activated Aqueous Solutions2017

    • Author(s)
      Y. Setsuhara, G. Uchida, T. Ito, J. Ikeda, Y. Mino, K. Takenaka
    • Organizer
      The 3rd International Workshop on Advanced Plasma Technology and Applications
    • Place of Presentation
      Hochiminh, Vietnam
    • Year and Date
      2017-01-11
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] プラズマ支援反応性スパッタ製膜を用いた高移動度IGZO薄膜トランジスタの形成2017

    • Author(s)
      節原 裕一, 遠藤 雅, 竹中 弘祐, 内田 儀一郎, 江部 明憲
    • Organizer
      第64回応用物理学会春季学術講演会
    • Place of Presentation
      横浜
    • Year and Date
      2017-03-14
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] SPATIO‐TEMPORAL BEHAVIORS OF ATMOSPHERIC‐PRESSURE PLASMA JETS FOR INVESTIGATION OF REACTIVE‐SPECIES PRODUCTION IN LIQUID2016

    • Author(s)
      Y. Setsuhara, A. Nakajima, G. Uchida, T. Ito, K. Takenaka, J. Ikeda
    • Organizer
      43rd IEEE International Conference on Plasma Science
    • Place of Presentation
      Banff, Alberta, Canada
    • Year and Date
      2016-06-19
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26420738
  • [Presentation] プラズマ支援反応性スパッタリングを用いたアモルファスIGZO薄膜トランジスタの低温形成2016

    • Author(s)
      節原 裕一, 中田 慶太郎, 佐竹 義且, 竹中 弘祐, 内田 儀一郎, 江部 明憲
    • Organizer
      第63回応用物理学会春季学術講演会
    • Place of Presentation
      東京
    • Year and Date
      2016-03-19
    • Data Source
      KAKENHI-PROJECT-26630335
  • [Presentation] Combinatorial characterization of a-IGZO film properties deposited with ICP-enhanced reactive sputtering2016

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Giichiro Uchida, Akinori Ebe
    • Organizer
      38th International Symposium on Dry Process (DPS2016)
    • Place of Presentation
      Sapporo, Japan
    • Year and Date
      2016-11-21
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] Control of ROS and RNS productions in liquid in atmospheric pressure plasma-jet system2016

    • Author(s)
      Giichiro Uchida, Taiki Ito, Kosuke Takenaka, Junichiro Ikeda, Yuichi Setsuhara
    • Organizer
      69th Annual Gaseous Electronics Conference
    • Place of Presentation
      Bochum, Germany
    • Year and Date
      2016-10-10
    • Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] 高密度プラズマの基礎から応用まで2016

    • Author(s)
      節原 裕一
    • Organizer
      日本学術振興会 透明酸化物光・電子材料第166委員会 第72回研究会
    • Place of Presentation
      東京
    • Invited
    • Data Source
      KAKENHI-PROJECT-16H04509
  • [Presentation] 周辺雰囲気ガス制御型プラズマジェット照射による溶液中活性酸素・窒素種生成2016

    • Author(s)
      内田 儀一郎, 中島 厚, 伊藤 泰喜, 竹中 弘祐, 節原 裕一
    • Organizer
      第63回応用物理学会春季学術講演会
    • Place of Presentation
      東京
    • Year and Date
      2016-03-19
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Effects of surrounding gas flow on ROS and RNS productions in non-thermal plasma-jet system2016

    • Author(s)
      Y. Setsuhara, G. Uchida, T. Ito, A. Nakajima, K. Takenaka, J. Ikeda
    • Organizer
      6th International Conference on Plasma Medicine (ICPM-6)
    • Place of Presentation
      Bratislava, Slovakia
    • Year and Date
      2016-09-04
    • Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Spatio-temporal behaviors of atmospheric-pressure dielectric barrier discharge plasma jets for reactive interactions with materials2016

    • Author(s)
      Yuichi Setsuhara, G. Uchida, A. Nakajima, K. Kawabata, K. Takenaka
    • Organizer
      International Conference on Processing & Manufacturing of Advanced Materials Processing, Fabrication, Properties, Applications (THERMEC’2016)
    • Place of Presentation
      Graz, Austria
    • Year and Date
      2016-05-29
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26420738
  • [Presentation] Dynamical Behaviors and Plasma-Liquid Interactions of Atmospheric-Pressure Dielectric-Barrier-Discharge Plasma Jets2016

    • Author(s)
      Y. Setsuhara, G. Uchida, A. Nakajima, T. Ito, K. Takenaka
    • Organizer
      The 2nd Asian International Workshop on Advanced Plasma Technology and Applications Major Topics: Plasma Technology for Agriculture, Bio and Medicine
    • Place of Presentation
      Chiang Mai, Thailand
    • Year and Date
      2016-02-23
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Effects of plasma-jet irradiation on the surface of liquid and its effects on ROS and RNS generations in bulk solution2016

    • Author(s)
      G. Uchida, T. Ito, K. Takenaka, J. Ikeda, Y. Setsuhara
    • Organizer
      26th Annual meeting of MRS-Japan 2016
    • Place of Presentation
      Yokohama, Japan
    • Year and Date
      2016-12-19
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Spatio-temporal Behaviors of Atmospheric-pressure Dielectric Barrier Discharge Plasma Jets for Reactive Interactions with Materials2016

    • Author(s)
      Y. Setsuhara, G. Uchida, A. Nakajima, T. Ito, K. Takenaka
    • Organizer
      9th International Conference on Processing & Manufacturing of Advanced Materials (THERMEC'2016)
    • Place of Presentation
      Graz, Austria
    • Year and Date
      2016-05-29
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Effects of plasma-irradiation distance on ROS and RNS productions in liquid2016

    • Author(s)
      G. Uchida, A. Nakajima, T. Ito, K. Takenaka, T. Kawasaki, K. Koga, M. Shiratani, Y. Setsuhara
    • Organizer
      6th International Conference on Plasma Medicine (ICPM-6)
    • Place of Presentation
      Bratislava, Slovakia
    • Year and Date
      2016-09-04
    • Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Electrical discharge characteristics of atmospheric plasma jets2016

    • Author(s)
      Giichiro Uchida, Atsushi Nakajima, Kosuke Takenaka, Yuichi Setsuhara
    • Organizer
      8th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2016)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2016-03-06
    • Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Spatio‐temporal behaviors of atmospheric‐pressure plasma jets for investigation of reactive‐species production in liquid2016

    • Author(s)
      Y. Setsuhara, A. Nakajima, G. Uchida, T. Ito, K. Takenaka, J. Ikeda
    • Organizer
      43rd IEEE International Conference on Plasma Science (ICOPS 2016)
    • Place of Presentation
      Banff, Canada
    • Year and Date
      2016-06-19
    • Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Dynamical-Behavior Characterization of Atmospheric-Pressure Dielectric-Barrier-Discharge Plasma Jets for Control of Reactive Oxygen and Nitrogen Species in Liquid2016

    • Author(s)
      Yuichi Setsuhara, Giichiro Uchida, Atsushi Nakajima, Taiki Ito, Kosuke Takenaka
    • Organizer
      15th International Conference on Plasma Surface Engineering
    • Place of Presentation
      Garmisch-Partenkirchen, Germany
    • Year and Date
      2016-09-12
    • Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Plasma-Assisted Mist CVD for Formation of Textured ZnO Films : Effect of Mists on Surface Structure of ZnO Films2015

    • Author(s)
      Kosuke Takenaka, Giichiro Uchida and Yuichi Setsuhara
    • Organizer
      9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9) /28th Symposium on Plasma Science for Materials (SPSM-28)
    • Place of Presentation
      Nagasaki University, Nagasaki, Japan
    • Year and Date
      2015-12-12
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26420738
  • [Presentation] Control of discharge characteristics of a plasma jet by ambient gas-flow conditions2015

    • Author(s)
      Giichiro Uchida, Atsushi Nakajima, Kosuke Takenaka, Yuichi Setsuhara
    • Organizer
      第25回日本MRS年次大会
    • Place of Presentation
      横浜
    • Year and Date
      2015-12-08
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] プラズマ医療装置に求められている要素と世界動向2015

    • Author(s)
      節原 裕一, 内田 儀一郎, 竹中 弘祐, 竹田 圭吾, 石川 健治, 堀 勝
    • Organizer
      第76回応用物理学会学術講演会
    • Place of Presentation
      名古屋
    • Year and Date
      2015-09-13
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Atmospheric-Pressure-Plasma Assisted Mist CVD of Zinc Oxide Films2015

    • Author(s)
      Kosuke Takenaka, Giichiro Uchida, and Yuichi Setsuhara
    • Organizer
      The 10th Anniversary Asian-European International Conference on Plasma Surface Engineering (AEPSE 2015)
    • Place of Presentation
      Ramada Plaza Jeju Hotel, Jeju Island, Korea
    • Year and Date
      2015-09-20
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26420738
  • [Presentation] プラズマ支援ミスト化学気相堆積におけるミストが製膜形状に与える影響2015

    • Author(s)
      竹中 弘祐,内田 儀一郎, 節原 裕一
    • Organizer
      第76回応用物理学会学術講演会
    • Place of Presentation
      名古屋国際会議場
    • Year and Date
      2015-09-13
    • Data Source
      KAKENHI-PROJECT-26420738
  • [Presentation] Effects of plasma-irradiation distance on oxidation reaction in liquid induced by He/O2 plasma-jet irradiation2015

    • Author(s)
      Atsushi Nakajima, Giichiro Uchida, Toshiyuki Kawasaki, Kazunori Koga, Kosuke Takenaka, Masaharu Shiratani, Yuichi Setsuhara
    • Organizer
      第25回日本MRS年次大会
    • Place of Presentation
      横浜
    • Year and Date
      2015-12-08
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Discharge characteristics in atmospheric plasma jets produced in various gas flow patterns2015

    • Author(s)
      Yuichi Setsuhara, Giichiro Uchida, Atsushi Nakajima, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani
    • Organizer
      9th International Conference on Reactive Plasmas (ICRP-9) / 33rd Symposium on Plasma Processing (SPP-33) / 68th Gaseous Electronics Conference (GEC-68)
    • Place of Presentation
      Hawaii, USA
    • Year and Date
      2015-10-12
    • Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] ICP-Enhanced Reactivity-Controlled Sputter Deposition of a-IGZO Films for Thin Film Transistor Applications2015

    • Author(s)
      Yuichi Setsuhara, Keitaro Nakata, Kosuke Takenaka, Giichiro Uchida, Akinori Ebe
    • Organizer
      9th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-9) /28th Symposium on Plasma Science for Materials (SPSM-28)
    • Place of Presentation
      Nagasaki, Japan
    • Year and Date
      2015-12-12
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26630335
  • [Presentation] プラズマ支援反応性スパッタ製膜プロセスによるIGZO薄膜デバイス低温形成2015

    • Author(s)
      節原 裕一, 陶山 悠太郎, 中田 慶太郎, 竹中 弘祐, 内田 儀一郎, 江部 明憲
    • Organizer
      第27回酸化物半導体討論会
    • Place of Presentation
      東京
    • Year and Date
      2015-05-18
    • Invited
    • Data Source
      KAKENHI-PROJECT-26630335
  • [Presentation] 液面に入射するプラズマジェットの放電特性2015

    • Author(s)
      内田 儀一郎, 中島 厚, 竹中 弘祐, 古閑 一憲, 白谷 正治, 節原 裕一
    • Organizer
      第76回応用物理学会学術講演会
    • Place of Presentation
      名古屋
    • Year and Date
      2015-09-13
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] 大気圧He/O2プラズマジェット照射による液中活性酸素種生成に及ぼすガス流パターンの効果2015

    • Author(s)
      中島 厚, 内田 儀一郎, 川崎 敏之, 古閑 一憲, Thapanut Sarinont, 天野 孝昭, 竹中 弘祐, 白谷 正治, 節原 裕一
    • Organizer
      第76回応用物理学会学術講演会
    • Place of Presentation
      名古屋
    • Year and Date
      2015-09-13
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Dynamical Characterizations of Atmospheric-Pressure Plasma Jets as Evaluation Protocols for Plasma Medicine2015

    • Author(s)
      Yuichi Setsuhara, Giichiro Uchida,, Kazufumi Kawabata Atsushi Nakajima, Kosuke Takenaka
    • Organizer
      The 21st Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics & The Workshop for NU-SKKU Joint Institute for Plasma-Nano Material
    • Place of Presentation
      Yangyang, Korea
    • Year and Date
      2015-10-03
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Effect of Mists on Surface Structure of ZnO Films Deposited with Plasma-Assisted Mist CVD2015

    • Author(s)
      Kosuke Takenaka, Giichiro Uchida, and Yuichi Setsuhara
    • Organizer
      第25回日本MRS年次大会
    • Place of Presentation
      横浜開港記念会館 他
    • Year and Date
      2015-12-08
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26420738
  • [Presentation] Gas flow rate dependence of the production of reactive oxygen species in liquid by a plasma-jet irradiation2015

    • Author(s)
      Giichiro Uchida, Atsushi Nakajima, Toshiyuki Kawasaki, Kazunori Koga, Kosuke Takenaka, Masaharu Shiratani, Yuichi Setsuhara
    • Organizer
      9th International Conference on Reactive Plasmas (ICRP-9) / 33rd Symposium on Plasma Processing (SPP-33) / 68th Gaseous Electronics Conference (GEC-68)
    • Place of Presentation
      Hawaii, USA
    • Year and Date
      2015-10-12
    • Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Low-Temperature Growth of Zinc Oxide Films by Atmospheric-Pressure Plasma-Assisted Mist CVD2015

    • Author(s)
      Kosuke Takenaka, Giichiro Uchida, Yuichi Setsuhara
    • Organizer
      The 5th International Conference on Characterization and Control of Interfaces for High Quality Advanced Materials (ICCCI 2015)
    • Place of Presentation
      Kurashiki Royal Art Hotel, Kurashiki, Japan
    • Year and Date
      2015-07-07
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26420738
  • [Presentation] Discharge characteristics of a helium atmospheric plasma jet impinging onto the liquid surface2015

    • Author(s)
      Giichiro Uchida, Atsushi Nakajima, Kosuke Takenaka, Yuichi Setsuhara, Kazunori Koga, Masaharu Shiratani
    • Organizer
      The 10th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2015)
    • Place of Presentation
      Jeju, Korea
    • Year and Date
      2015-09-20
    • Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Low-Temperature Formation of a-IGZO TFTs with ICP-Enhanced Reactivity-Controlled Sputter Deposition2015

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Keitaro Nakata, Giichiro Uchida, Akinori Ebe
    • Organizer
      The 10th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2015)
    • Place of Presentation
      Jeju, Korea
    • Year and Date
      2015-09-20
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26630335
  • [Presentation] Plasma-Assisted Mist Chemical Vapor Deposition of Zinc Oxide Films for Flexible Electronics2015

    • Author(s)
      Kosuke Takenaka, Giichiro Uchida, Yuichi Setsuhara
    • Organizer
      9th International Conference on Reactive Plasmas (ICRP-9) / 33rd Symposium on Plasma Processing (SPP-33) / 68th Gaseous Electronics Conference (GEC-68)
    • Place of Presentation
      Hawaii Convention Center, Hawaii, USA
    • Year and Date
      2015-10-12
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26420738
  • [Presentation] プラズマ医療装置に求められている要素と世界動向2015

    • Author(s)
      節原裕一
    • Organizer
      第76回応用物理学会秋季学術講演会 分科企画シンポジウム「プラズマ医療科学の最前線」
    • Place of Presentation
      名古屋国際会議場
    • Year and Date
      2015-09-13
    • Invited
    • Data Source
      KAKENHI-ORGANIZER-24108001
  • [Presentation] Effects of discharge voltage waveform on discharge characteristics in a helium atmospheric plasma jet2015

    • Author(s)
      Giichiro Uchida, Kosuke Takenaka, Yuichi Setsuhara
    • Organizer
      The 10th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2015)
    • Place of Presentation
      Jeju, Korea
    • Year and Date
      2015-09-20
    • Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] 大気圧非平衡プラズマ照射による液中ラジカル生成の制御2015

    • Author(s)
      内田 儀一郎, 竹中 弘祐, 節原 裕一
    • Organizer
      応用物理学会九州支部 特別講演会
    • Place of Presentation
      福岡
    • Year and Date
      2015-04-27
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] プラズマ医療のための大気圧放電プラズマの時空間制御2015

    • Author(s)
      内田 儀一郎, 竹中 弘祐, 節原 裕一
    • Organizer
      新学術領域研究「プラズマ医療科学の創成」+「統合的神経機能の制御を標準とした糖鎖の作動原理解明」合同公開シンポジウム
    • Place of Presentation
      名古屋
    • Year and Date
      2015-08-05
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] 非平衡プラズマジェットの動的放電特性2015

    • Author(s)
      内田 儀一郎, 竹中 弘祐, 節原 裕一, 川崎 敏之, 古閑 一憲, 白谷 正治
    • Organizer
      第21回プラズマ新領域研究会「プラズマ流の可視化」
    • Place of Presentation
      大阪
    • Year and Date
      2015-10-03
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] ICP-Enhanced Sputter Deposition for Reactivity Control and Low-Temperature Formation of a-IGZO Films2015

    • Author(s)
      Yuichi Setsuhara, Keitaro Nakata, Yoshikatsu Satake, Kosuke Takenaka, Giichiro Uchida, Akinori Ebe
    • Organizer
      9th International Conference on Reactive Plasmas (ICRP-9) / 33rd Symposium on Plasma Processing (SPP-33) / 68th Gaseous Electronics Conference (GEC-68)
    • Place of Presentation
      Hawaii, USA
    • Year and Date
      2015-10-12
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26630335
  • [Presentation] Effects of gas-mixing structure on discharge properties of atmospheric-pressure plasma jet for plasma medicine2014

    • Author(s)
      Giichiro Uchida, Kosuke Takenaka, Atsushi Miyazaki, Kazufumi Kawabata, and Yuichi Setsuhara
    • Organizer
      6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2014)
    • Place of Presentation
      Nagoya, Japan
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] 高品質半導体薄膜作製のためのプラズマ支援反応性スパッタリングプロセスの高度制御性2014

    • Author(s)
      節原 裕一, 竹中 弘祐, 大崎 創一郎, 陶山 悠太郎, 大谷 浩史, 金井 厚毅, 江部 明憲
    • Organizer
      第61回応用物理学会春季学術講演会
    • Place of Presentation
      東京
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Dynamics and Reactive Particle Generation in Atmospheric-Pressure Discharge as a Basis for Plasma Medicine2014

    • Author(s)
      Y. Setsuhara, G. Uchida, K. Kawabata, A. Miyazaki, K. Takenaka, K. Takeda, K. Ishikawa, M. Hori
    • Organizer
      18th Korea - Japan Workshop on Advanced Plasma Processes and Diagnostics
    • Place of Presentation
      Fukuoka, Japan
    • Invited
    • Data Source
      KAKENHI-ORGANIZER-24108001
  • [Presentation] RF plasma sources for PECVD and soft-material processes2014

    • Author(s)
      Yuichi Setsuhara, Soichiro Osaki, Kosuke Takenaka and Akinori Ebe
    • Organizer
      The International Symposium on Plasma-Nano Materials and Processes
    • Place of Presentation
      Seoul, Korea
    • Invited
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] 低ダメージプロセスに向けたプラズマ技術-フレキシブルデバイスからプラズマ医療-2014

    • Author(s)
      節原 裕一, 竹中 弘祐, 内田 儀一郎
    • Organizer
      日本真空学会スパッタリングおよびプラズマプロセス技術部会(SP部会)第138回定例研究会
    • Place of Presentation
      大阪
    • Year and Date
      2014-06-02
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Discharge characteristics of plasma jet operated in gas-mixture system for plasma biomedicine2014

    • Author(s)
      Giichiro Uchida, Kosuke Takenaka, Atsushi Miyazaki, Kazufumi Kawabata, Yuichi Setsuhara
    • Organizer
      International workshop on control of fluctuation of plasma processes
    • Place of Presentation
      Fukuoka, Japan
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Plasma-Enhanced Reactivity- Controlled Sputter Deposition Process for Low-Temperature Formation of Semiconductor Films2014

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Hirofumi Ohtani, Atsuki Kanai, Soichiro Osaki
    • Organizer
      8th International Conference on Reactive Plasmas (ICRP- 8)/31st Symposium on Plasma Processing (SPP-31)
    • Place of Presentation
      Fukuoka, Japan
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Dynamics and Reactive Particle Generation in Atmospheric-Pressure Discharge as a Basis for Plasma Medicine2014

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      18th International workshop on Advanced Plasma Processing and Diagnostics
    • Place of Presentation
      Fukuoka, Japan
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Properties of ICP-Enhanced Reactive Sputter Discharge for Formation of Advanced Semiconductor Films2014

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Soichiro Osaki, Yutaro Suyama, Hirofumi Ohtani, Atsuki Kanai
    • Organizer
      6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2014) / 7th International Conference on Plasma Nano Technology & Science(IC-PLANTS 2014)
    • Place of Presentation
      Nagoya, Japan
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Plasma-Enhanced Reactivity-Controlled Sputter Deposition Process for Low-Temperature Formation of Semiconductor Films2014

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Hirofumi Ohtani, Atsuki Kanai, Soichiro Osaki
    • Organizer
      8th International Conference on Reactive Plasmas (ICRP-8)/31st Symposium on Plasma Processing (SPP-31)
    • Place of Presentation
      Fukuoka, Japan
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Discharge Characteristics of Plasma Jet Operated in Gas-Mixture System for Plasma Biomedicine2014

    • Author(s)
      Giichiro Uchida, Kosuke Takenaka, Atsushi Miyazaki, Kazufumi Kawabata, and Yuichi Setsuhara
    • Organizer
      8th International Conference on Reactive Plasmas (ICRP-8)/31st Symposium on Plasma Processing (SPP-31)
    • Place of Presentation
      Fukuoka, Japan
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Molecular Structural Change of Soft Materials via Irradiation with Atmospheric-Pressure Plasma Jet for Plasma Medicine2014

    • Author(s)
      Kosuke Takenaka, Atsushi Miyazaki, Kazufumi Kawabata, Giichiro Uchida, and Yuichi Setsuhara
    • Organizer
      6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2014)
    • Place of Presentation
      Nagoya, Japan
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Molecular-Structure Variation of Soft Material Irradiated with Atmospheric-Pressure Plasma Jet2014

    • Author(s)
      Kosuke Takenaka, Atsushi Miyazaki, Giichiro Uchida, and Yuichi Setsuhara
    • Organizer
      8th International Conference on Reactive Plasmas (ICRP-8)/31st Symposium on Plasma Processing (SPP-31)
    • Place of Presentation
      Fukuoka, Japan
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Spatial profiles of emission spectra from atmospheric-pressure plasma jet for plasma medicine2014

    • Author(s)
      Giichiro Uchida, Kosuke Takenaka, Atsushi Miyazaki, Kazufumi Kawabata, Yuichi Setsuhara and Masaru Hori
    • Organizer
      6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2014)
    • Place of Presentation
      Nagoya, Japan
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] 低ダメージプロセスに向けたプラズマ技術-フレキシブルデバイスからプラズマ医療-2014

    • Author(s)
      節原 裕一, 竹中 弘祐, 内田 儀一郎
    • Organizer
      日本真空学会スパッタリングおよびプラズマプロセス技術部会(SP部会)第138回定例研究会
    • Place of Presentation
      大阪
    • Year and Date
      2014-06-02
    • Invited
    • Data Source
      KAKENHI-PROJECT-26630335
  • [Presentation] Optical Emission Characteristics of Atmospheric-Pressure Plasma Jet for Plasma Biomedicine2014

    • Author(s)
      Giichiro Uchida, Kosuke Takenaka, Atsushi Miyazaki, Kazufumi Kawabata, Yuichi Setsuhara, and Masaru Hori
    • Organizer
      8th International Conference on Reactive Plasmas (ICRP-8)/31st Symposium on Plasma Processing (SPP-31)
    • Place of Presentation
      Fukuoka, Japan
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Properties of ICP-Enhanced Reactive Sputter Discharge for Formation of Advanced Semiconductor Films2014

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Soichiro Osaki, Yutaro Suyama, Hirofumi Ohtani, Atsuki Kanai
    • Organizer
      6th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2014)
    • Place of Presentation
      Nagoya, Japan
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Development of advanced ICP-enhanced reactive sputter deposition technologies for flexible devices2013

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      The workshop of the Joint Institute for Plasma Nano Materials (IPNM)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2013-10-23
    • Invited
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] DC-Voltage Gas-Breakdown Characteristics at Atmospheric Pressure for Plasma Medicine2013

    • Author(s)
      Giichiro Uchida, Kosuke Takenaka, Atsushi Miyazaki, and Yuichi Setsuhara
    • Organizer
      International Conference on Surface Engineering (ICSE 2013)
    • Place of Presentation
      Busan, Korea
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Designing Plasma-Enhanced Magnetron Sputtering with Low-Inductance Antenna Modules2013

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
    • Organizer
      The 6th International Conference on Plasma Nano Technology & Science(IC-PLANTS 2013)
    • Place of Presentation
      Gifu, Japan
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] 高品質半導体薄膜作製のためのプラズマ支援反応性スパッタリングプロセスの高度制御性2013

    • Author(s)
      節原裕一、竹中弘祐、大谷浩史、金井厚毅、江部明憲
    • Organizer
      第60回応用物理学関係連合講演会
    • Place of Presentation
      厚木
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Atmospheric-Pressure Plasma Interaction with Soft Materials as Fundamental Processes in Plasma Medicine2013

    • Author(s)
      Kosuke Takenaka , Atsushi Miyazaki, and Yuichi Setsuhara
    • Organizer
      International Conference on Surface Engineering (ICSE 2013)
    • Place of Presentation
      Busan, Korea
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] ソフトマテリアル-プラズマ相互作用と低ダメージプロセス(無機/有機積層デバイスからプラズマ医療)2013

    • Author(s)
      節原裕一
    • Organizer
      日本真空学会11月研究例会
    • Place of Presentation
      東京
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Plasma Interactions with Soft Materials in Air and Liquid2013

    • Author(s)
      Yuichi Setsuhara, Atsushi Miyazaki, Kosuke Takenaka, Hiroya Abe, Masaru Hori
    • Organizer
      3rd International Symposium for Plasma Biosciences (ISPB2013-3)
    • Place of Presentation
      Jeju, Korea
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] 医療プラズマ源の創成に向けたプラズマ-生体分子相互作用の究明と放電制御2013

    • Author(s)
      節原裕一
    • Organizer
      新学術領域研究「プラズマ医療科学の創成」第2回公開シンポジウム
    • Place of Presentation
      名古屋大学
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Low-Temperature Formation of Semiconductor Films via ICP-Enhanced Reactive Sputtering for Development of Advanced Flexible Devices2013

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Hirofimi Ohtani, Akinori Ebe
    • Organizer
      第30回プラズマプロセシング研究会
    • Place of Presentation
      浜松
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] Characterization of Atmospheric-Pressure Discharge and its Interaction with Soft Materials as a Basis for Plasma Medicine2013

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      International Conference on Surface Engineering (ICSE 2013)
    • Place of Presentation
      Busan, Korea
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Control Capability of ICP-Enhanced Reactive Sputtering System with Inner Type Low-Inductance Antenna Modules2013

    • Author(s)
      Yuichi Setsuhara, Soichiro Osaki, Hirofumi Otani, Atsuki Kanai, Kosuke Takenaka, Akinori Ebe
    • Organizer
      第23回日本MRS年次大会
    • Place of Presentation
      横浜
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] プラズマ医療の基礎過程としての気液界面を介したプラズマと液体中有機物との相互作用2013

    • Author(s)
      竹中弘祐、節原裕一
    • Organizer
      第60回応用物理学関係連合講演会
    • Place of Presentation
      厚木
    • Year and Date
      2013-03-27
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Degradation of methylene blue in aqueous solution via plasma exposure through gas/liquid interface2013

    • Author(s)
      Kosuke Takenaka, Atsushi Miyazaki, Yuichi Setsuhara
    • Organizer
      The 12th Asia Pacific Physics Conference (APPC12), The third Asia-Europe Physics Summit (ASEPS3)
    • Place of Presentation
      Chiba Japan
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Plasma-biomaterials interaction analysis as a basis of fundamental processes in plasma medicine2013

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
    • Place of Presentation
      名古屋大学東山キャンパス, 名古屋市
    • Year and Date
      2013-01-28
    • Data Source
      KAKENHI-ORGANIZER-24108001
  • [Presentation] Properties of Dielectric-Barrier-Discharge Plasma Jet for Plasma Medicine2013

    • Author(s)
      Giichiro Uchida, Kosuke Takenaka, Atsushi Miyazaki, and Yuichi Setsuhara
    • Organizer
      International Conference on Surface Engineering (ICSE 2013)
    • Place of Presentation
      Busan, Korea
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Plasma-Biomaterials Interaction Analysis as a Basis of Fundamental Processes in Plasma Medicine2013

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine. Masaru Hori
    • Organizer
      5th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2013)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2013-01-28
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] ICP-Enhanced Reactive Sputter Deposition Processes for Low-Temperature Formation of IGZO TFT2013

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
    • Organizer
      35th International Symposium on Dry Process (DPS2013)
    • Place of Presentation
      Jeju, Korea
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Characteristics of Atmospheric Pressure Discharge and Interactions with Soft Materials2013

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka
    • Organizer
      The 16th International Workshop on Advanced Plasma Processing and Diagnostics
    • Place of Presentation
      Okazaki, Japan
    • Year and Date
      2013-01-25
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] 高品質半導体薄膜作製のためのプラズマ支援反応性スパッタリングプロセスの高度制御2013

    • Author(s)
      節原 裕一, 竹中 弘祐, 大谷 浩史, 金井 厚毅, 大崎 創一郎, 江部 明憲
    • Organizer
      第74回応用物理学会学術講演会
    • Place of Presentation
      京都
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] ICP-Enhanced Reactivity-Controlled Sputter Deposition with New Type of Low-Inductance Antenna Modules for High-Rate and Large-Area Deposition of Functional Films2013

    • Author(s)
      Yuichi Setsuhara, Soichiro Osaki, Kosuke Takenaka, Akinori Ebe
    • Organizer
      The 9th Asian-European International Conference on Plasma Surface Engineering (AEPSE2013)
    • Place of Presentation
      Jeju, Korea
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Controllability of Plasma-Enhanced Reactive Sputter Deposition Process with ICPs Sustained by Multiple Inner Type Low-Inductance Antenna Modules2013

    • Author(s)
      Yuichi Setsuhara, Soishiro Osaki, Kosuke Takenaka, Akinori Ebe
    • Organizer
      第26回プラズマ材料科学シンポジウム(SPSM26)
    • Place of Presentation
      福岡
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Advanced reactive sputter deposition system enhanced with ICPs driven by new type of low- inductance antenna modules2013

    • Author(s)
      Yuichi Setsuhara, Soichiro Osaki, Kosuke Takenaka and Akinori Ebe
    • Organizer
      International Conference on Processing & Manufacturing of Advanced Materials (THERMEC'2013)
    • Place of Presentation
      Las Vegas, USA
    • Invited
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Plasma Interactions with Biological Molecules in Aqueous Solution2013

    • Author(s)
      Yuichi Setsuhara, Atsushi Miyazaki, Kosuke Takenaka and Masaru Hori
    • Organizer
      2013 JSAP-MRS Joint Symposia
    • Place of Presentation
      Kyoto, Japan
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Plasma Interactions with Organic Materials in Liquid as Fundamental Processes in Plasma Medicine2013

    • Author(s)
      Kosuke Takenaka, Hiroya Abe, Yuichi Setsuhara
    • Organizer
      第30回プラズマプロセシング研究会
    • Place of Presentation
      浜松
    • Year and Date
      2013-01-21
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Atmospheric-Pressure Gas-Breakdown Characteristics with RF and UHF Voltage for Plasma Medicine2013

    • Author(s)
      Giichiro Uchida, Atsushi Miyazaki, Kosuke Takenaka, and Yuichi Setsuhara,
    • Organizer
      International Conference on Surface Engineering (ICSE 2013)
    • Place of Presentation
      Busan, Korea
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Low-Temperature Formation of Semiconductor Films via ICP-Enhanced Reactive Sputtering for Development of Advanced Flexible Devices2013

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Hirofimi Ohtani, Akinori Ebe
    • Organizer
      第30回プラズマプロセシング研究会
    • Place of Presentation
      浜松
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] ICP-Enhanced Reactive Sputtering with Multiple Inner Type Low-Inductance Antenna Modules for Large-Area Formation of Thin Film Devices2013

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
    • Organizer
      5rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
    • Place of Presentation
      Nagoya, Japan
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Advanced reactive sputter deposition system enhanced with ICPs driven by new type of low-inductance antenna modules2013

    • Author(s)
      Yuichi Setsuhara, Soichiro Osaki, Kosuke Takenaka, Akinori Ebe
    • Organizer
      International Conference on Processing & Manufacturing of Advanced Materials (THERMEC'2013)
    • Place of Presentation
      Las Vegas, USA
    • Invited
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Process Control Capabilities of ICP-Enhanced Sputter Discharge for Reactive Large-Area Deposition of Functional Films2012

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      The 15th Korea-Japan Workshop for Advanced Plasma Process and Diagnostics
    • Place of Presentation
      Seoul, Korea
    • Invited
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] Process Control Capabilities of ICP-Enhanced Sputter Discharge for Reactive Large-Area Deposition of Functional Films2012

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka and Akinori Ebe
    • Organizer
      The 15th Korea-Japan Workshop for Advanced Plasma Process and Diagnostics
    • Place of Presentation
      Seoul, Korea
    • Year and Date
      2012-06-08
    • Invited
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Low-Temperature and Low-Damage Plasma Processing of Inorganic/Organic Hybrid Materials for Development of Flexible Electronics2012

    • Author(s)
      Kosuke Takenaka, Yuichi Setsuhara
    • Organizer
      5th International Symposium on Advanced Materials Development and Integration of Novel Structural Metallic and Inorganic Materials
    • Place of Presentation
      Aichi, Japan
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] Process Control Capabilitiesof ICP-Enhanced Sputter Discharge for ReactiveLarge-Area Deposition of Functional Films2012

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      The15th Korea-Japan Workshop for AdvancedPlasma Process and Diagnostics
    • Place of Presentation
      Seoul, Korea
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] 高度時空間制御による生体適合放電生成の基盤確立と革新的医療プラズマ源の創成2012

    • Author(s)
      節原 裕一
    • Organizer
      新学術領域研究「プラズマ医療科学の創成」第1回公開シンポジウム
    • Place of Presentation
      東京
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Control Capabilities of Reactive Sputter Deposition Process via ICPs Driven by Low-Inductance Antenna for Large-Area Formation of Thin Film Devices2012

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
    • Organizer
      65th Annual Gaseous Electronics Conference
    • Place of Presentation
      Texas, USA
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] Process Control Capabilities Of Plasma-Enhanced Reactive Sputter Deposition With New Type Of Low-Inductance-Antenna Driven ICP For Large-Area Formation Of Semiconductor Films2012

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Hirofumi Ohtani, Akinori Ebe
    • Organizer
      Joint conference on the 11th Asia Pacific Conference on Plasma Science and Technology (11th APCPST-11) and 25th Symposium on Plasma Science for Materials (SPSM-25)
    • Place of Presentation
      Kyoto, Japa
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] プラズマ支援反応性スパッタリング法による透明アモルファス酸化物半導体薄膜トランジスタ低温形成技術の開発2012

    • Author(s)
      節原 裕一, 趙 研, 大地 康史, 竹中 弘祐, 江部 明憲
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      東京
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] Plasma-Enhanced Sputtering Assisted with ICP via New Type of Low-Inductance Antenna for Reactivity-Controlled and Low-Damage Formation of Semiconductor Films2012

    • Author(s)
      Yuichi Setsuhara, Yasufumi Ohchi, Ken Cho, Kosuke Takenaka, Akinori Ebe
    • Organizer
      13th International Conference on Plasma Surface Engineering
    • Place of Presentation
      Garmisch-Partenkirchen, Germany
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Plasma-Enhanced Reactive Sputter Deposition with Low-Inductance Antenna for Low-Temperature Fabrication of Flexible Photovoltaic Devices2012

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      The 6th International Conference on Technological Advances of Thin Films & Surface Coatings
    • Place of Presentation
      Singapore
    • Invited
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] プラズマ支援反応性スパッタリング法を用いた長尺基板対応大面積プラズマスパッタシステムの開発2012

    • Author(s)
      竹中弘祐, 節原裕一, 江部明憲
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      松山
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Radio Frequency Plasma Generation over Water Surface at Saturated Water Vapor Pressure2012

    • Author(s)
      Kosuke Takenaka, Yuichi Setsuhara
    • Organizer
      International Union of Materials Research Societies - International conference on Electronic Materials (IUMRS-ICEM2012)
    • Place of Presentation
      Yokohama, Japan
    • Year and Date
      2012-09-23
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Plasma-Enhanced Reactive Sputter Deposition with Low-Inductance Antenna for Low-Temperature Fabrication of Flexible Photovoltaic Devices2012

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      The 6th International Conference on Technological Advances of Thin Films & Surface Coatings
    • Place of Presentation
      Singapore
    • Invited
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Plasma-Enhanced ReactiveSputter Deposition with Low-Inductance Antennafor Low-Temperature Fabrication of FlexiblePhotovoltaic Devices2012

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      The 6th InternationalConference on Technological Advances of ThinFilms & Surface Coatings
    • Place of Presentation
      Singapore
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] nvestigations on Plasma-Biomolecules Interactions as Fundamental Process for Plasma Medicine2012

    • Author(s)
      K. Takenaka, K. Cho, Y. Setsuhara, M. Shiratani, M. Sekine and M. Hori
    • Organizer
      11th Asia Pacific Conference on Plasma Science and Technology (11th APCPST-11) and 25th Symposium on Plasma Science for Materials (SPSM-25)
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2012-10-02
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Process Control Capabilities of ICP-Enhanced Sputter Discharge for Reactive Large-Area Deposition of Functional Films2012

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
    • Organizer
      The 15th Korea-Japan Workshop for Advanced Plasma Process and Diagnostics
    • Place of Presentation
      Seoul, Korea(招待講演)
    • Year and Date
      2012-06-08
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Plasma-Enhanced Reactive Sputter Deposition with Low-Inductance Antenna for Low-Temperature Fabrication of Flexible Photovoltaic Devices2012

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      The 6th International Conference on Technological Advances of Thin Films & Surface Coatings
    • Place of Presentation
      Singapore(招待講演)
    • Year and Date
      2012-01-15
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Plasma-Assisted Sputtering with ICP Driven by Inner-Type Low-Inductance Antenna2012

    • Author(s)
      Yuichi Setsuhara, Ken Cho,Kosuke Takenaka, Akinori Ebe
    • Organizer
      4th International Symposi凵m on Advanced PlasmaScience and its Applications (ISPIasma 2012)
    • Place of Presentation
      Aichi, Japan
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Control Capabilities of Reactive Sputter Deposition Process via ICPs Driven by Low-Inductance Antenna for Large-Area Formation of Thin Film Devices2012

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
    • Organizer
      65th Annual Gaseous Electronics Conference
    • Place of Presentation
      Texas, USA
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] ICP-Assisted Reactive Sputter-Deposition with Inner-Type Low-Inductance Antenna (LIA)2012

    • Author(s)
      Y. Setsuhara, A. Ebe
    • Organizer
      The 14th International Workshop on Advanced Plasma Processing and Diagnostics(招待講演)
    • Place of Presentation
      Fukuoka, Japan
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] ICP-Enhanced Reactive Processes with Low-Inductance Antenna2012

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Ken Cho, Akinori Ebe
    • Organizer
      The 5th International Conference on Plasma Nano Technology & Science(IC-PLANTS 2012)
    • Place of Presentation
      Aichi, Japan
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Process Control Capabilities Of Plasma-Enhanced Reactive Sputter Deposition With New Type Of Low-Inductance-Antenna Driven ICP For Large-Area Formation Of Semiconductor Films2012

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Hirofumi Ohtani, Akinori Ebe
    • Organizer
      Joint conference on the 11th Asia Pacific Conference on Plasma Science and Technology (11th APCPST-11) and 25th Symposium on Plasma Science for Materials (SPSM-25)
    • Place of Presentation
      Kyoto, Japan
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] ICP-Assisted Reactive Sputter-Deposition with Inner-Type Low-Inductance Antenna (LIA)2012

    • Author(s)
      Yuichi Setsuhara, Akinori Ebe
    • Organizer
      The 14th International Workshop on Advanced Plasma Processing andDiagnostics, The 2nd Workshop for NU-SKKU Joint Institute for Plasma-NanoMaterials
    • Place of Presentation
      Fukuoka, Japan(招待講演)
    • Year and Date
      2012-01-08
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Plasma Interactions with Soft-Materials as a Basis of Fundamental Processes for Plasma Medicine2012

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine. Masaru Hori
    • Organizer
      The 2nd International Symposium for Plasma Biosciences
    • Place of Presentation
      Seoul, Korea
    • Year and Date
      2012-08-12
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Water Plasma Interactions in Solution2012

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka
    • Organizer
      First International Symposium on Advanced Water Science and Technology (ISAWST-1)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2012-11-11
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Plasma- Enhanced Sputtering Assisted with ICP via New Type of Low-Inductance Antenna for Reactivity-Controlled and Low-Damage Formation of Semiconductor Films2012

    • Author(s)
      Yuichi Setsuhara, Yasufumi Ohchi, Ken Cho, Kosuke Takenaka, Akinori Ebe
    • Organizer
      13th International Conference on Plasma Surface Engineering
    • Place of Presentation
      Garmisch-Partenkirchen, Germany
    • Year and Date
      2012-09-13
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Effect of Plasma Irradiation on Interfacial Nano Layers in Inorganic / Organic Hybrid Structures2012

    • Author(s)
      Kosuke Takenaka, Ken Cho, Yuichi Setsuhara
    • Organizer
      International Union of Materials Research Societies - International conference on Electronic Materials (IUMRS-ICEM2012)
    • Place of Presentation
      Yokohama, Japan
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] Plasma Interactions with Soft Materials as a Basis for Plasma Medicine2012

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Masaharu Shiratani, Makoto Sekine. Masaru Hori
    • Organizer
      International Workshop on Advanced Plasma Technology for Green Energy and Biomedical Applications (APT2012)
    • Place of Presentation
      Chiang Mai, Thailand,
    • Year and Date
      2012-08-24
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Development of ICP-Enhanced Reactive Sputtering System with Multiple Low-Inductance Antenna Modules for Large-Area Deposition of Silicon Films2012

    • Author(s)
      Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe
    • Organizer
      34th International symposium on Dry Process
    • Place of Presentation
      Tokyo, Japan
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Plasma-Assisted Sputtering with ICP Driven by Inner-Type Low-Inductance Antenna2012

    • Author(s)
      Y. Setsuhara, K. Cho, K. Takenaka, A. Ebe
    • Organizer
      4th International Symposium on Advanced Plasma Science and its Applications (ISPlasma 2012)
    • Place of Presentation
      愛知県春日井市
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] Yuichi Setsuhara, Yasufumi OhchiKen Cho, Kosuke Takenaka, Akinori EbePlasma-Enhanced Sputtering Assisted with ICP via New Type of Low-Induetance Antenna for Reactivity-Controlled and Low-Damage Formation of Semiconductor Films2012

    • Author(s)
      Yuichi Setsuhara, Yasufumi OhchiKen Cho, Kosuke Takenaka, Akinori Ebe
    • Organizer
      13th International Conference on Plasma Surface Engineering
    • Place of Presentation
      Garmisch-Partenkirchen, Germany
    • Year and Date
      2012-09-13
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] プラズマ支援反応性スパッタリング法による透明アモルファス酸化物半導体薄膜トランジスタ低温形成技術の開発2012

    • Author(s)
      節原 裕一, 趙 研, 大地 康史, 竹中弘祐, 江部 明憲
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      東京
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Plasma-Assisted Deposition of Functional Thin Films and Process Analyses for Development of Flexible Electronics2011

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      International Union of Materials Research Society (IUMRS)-lnternational Conference in Asia (ICA) 2011
    • Place of Presentation
      Taipei, Taiwan(招待講演)
    • Year and Date
      2011-09-20
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Development of Plasma-Enhanced Reactive Large-Area Processes2011

    • Author(s)
      Yuichi Setsuhara, Akinori Ebe
    • Organizer
      Advanced Plasma Technology for Green Energy and Biomedical Apllications
    • Place of Presentation
      Chiangmai, Thailand(招待講演)
    • Year and Date
      2011-08-12
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Development of Inner-Type ICPs for Reactive Large-Area Processes2011

    • Author(s)
      Yuichi Setsuhara, Akinori Ebe
    • Organizer
      The 13th International Workshop on Advanced Plasma Processing and Diagnostics
    • Place of Presentation
      Deajeon, Korea(招待講演)
    • Year and Date
      2011-07-22
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Development of ICP-assisted sputter process for large-area production of thin-film solar cells2011

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      2011 International Workshop on Environment and Resources
    • Place of Presentation
      New Taipei City, Taiwa(招待講演)
    • Year and Date
      2011-06-18
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Characterization of Inductively-Coupled RF Plasmas with Inner-Type Low-Inductance Antennas and Application to Plasma-Assisted Reactive Sputter Deposition2011

    • Author(s)
      Ken Cho, Yasufumi Ohchi, Kosuke Takenaka, Yuichi Setsuhara
    • Organizer
      第21回日本MRS学術シンポジウム
    • Place of Presentation
      横浜
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] 埋め込み型低インダクタンスアンテナを用いたプラズマ支援反応性スパッタリング法により作製したa-IGZO膜の特性評価2011

    • Author(s)
      大地康史, 趙研, 竹中弘祐, 節原裕一, 江部明憲
    • Organizer
      応用物理学会プラズマエレクトロニクス分科会20周年(研究会創設25周年)記念特別シンポジウム
    • Place of Presentation
      名古屋
    • Year and Date
      2011-10-22
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] 埋込型低インダクタンスアンテナによるプラズマ生成技術の開発と大面積・低ダメージ反応性プロセスへの応用2011

    • Author(s)
      節原裕一, 趙研, 竹中弘祐, 江部明憲
    • Organizer
      第72回応用物理学会学術講演会
    • Place of Presentation
      山形
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Plasma-Assisted Deposition of Functional Thin Films and Process Analyses for Development of Flexible Electronic2011

    • Author(s)
      Y. Setsuhara
    • Organizer
      IUMRS-ICA 2011 12th International Conference in Asia(招待講演)
    • Place of Presentation
      Taipei, Taiwan
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] Development of Plasma-Enhanced Reactive Large-Area Processes2011

    • Author(s)
      Y. Setsuhara, A. Ebe
    • Organizer
      Advanced Plasma Technology for Green Energy and Biomedical Apllications(招待講演)
    • Place of Presentation
      Chiangmai, Thailand
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] Development of Low-Damage Reactive Sputter Deposition Processes with Inner-Type Low Inductance Antenna2011

    • Author(s)
      Y. Setsuhara, K. Cho, K. Takenaka, A. Ebe
    • Organizer
      Plasma Conference 2011
    • Place of Presentation
      金沢
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] Plasma-Assisted Deposition of Functional Thin Films and Process Analyses for Development of Flexible Electronics2011

    • Author(s)
      Yuichi Setsuhara
    • Organizer
      International Union of Materials Research Society (IUMRS)- International Conference in Asia (ICA) 2011
    • Place of Presentation
      Taipei, Taiwan
    • Year and Date
      2011-09-20
    • Invited
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Investigation of plasma interactions with organic semiconductors for fabrication of flexible electronics devices2011

    • Author(s)
      K. Cho, K. Takenaka, Y. Setsuhara, M. Shiratani, M. Sekine and M. Hori
    • Organizer
      33rd International symposium on Dry Process
    • Place of Presentation
      京都
    • Data Source
      KAKENHI-PROJECT-23656465
  • [Presentation] Development of Low-Damage Reactive Sputter Deposition Processes with lnner-Type Low Inductance Antenna2011

    • Author(s)
      Yuichi Setsuhara, Ken Cho, Kosuke Takenaka, Akinori Ebe
    • Organizer
      Plasma Conference 2011
    • Place of Presentation
      Ishikawa, Japan
    • Data Source
      KAKENHI-PROJECT-23360325
  • [Presentation] Photon-Induced Phonon Excitation Process as Low-Temperature Nonequillibrium Nano-Surface Modification of Semiconductors2009

    • Author(s)
      Y.Setsuhara, M.Hashida
    • Organizer
      7th Asian-European Int.Conf.Plasma Surface Eng.(AEPSE 2009)
    • Place of Presentation
      Busan, Korea
    • Year and Date
      2009-09-21
    • Data Source
      KAKENHI-PROJECT-20035009
  • [Presentation] Optical Emission Analysis of Water Vapor Plasmas2008

    • Author(s)
      Shogo Kawajiri, Kosuke Takenaka, Yuichi Setsuhara
    • Organizer
      The IUMRS International Conference in Asia 2008, Nagoya, Japan, (2008.12.09-2008.12.13)
    • Place of Presentation
      名古屋
    • Year and Date
      2008-12-11
    • Data Source
      KAKENHI-PROJECT-19654090
  • [Presentation] Low-Temperature and Nano-Surface Modification of Materials with Low-Damage Plasma and Femtosecond Laser-Induced Processes2008

    • Author(s)
      Y. Setsuhara
    • Organizer
      Interfinish 2008 17th World Interfinish Congress and Exposition, Busan, Korea, June 16-19, 2008.(INVITED)
    • Place of Presentation
      Busan, Korea
    • Year and Date
      2008-06-16
    • Data Source
      KAKENHI-PROJECT-20035009
  • [Presentation] Low-Temperature and Nano-Surface Materials Modification with Low-Damage Plasma and Laser-Induced Phonon Excitation Processes2008

    • Author(s)
      Y, Setsuhara
    • Organizer
      6th International Workshop on Advanced Plasma Processing and Diagnostics & 3rd Plasma Application Monodzukuri, Nagoya, Japan, January 8-9, 2008.
    • Place of Presentation
      名古屋大学
    • Year and Date
      2008-01-09
    • Data Source
      KAKENHI-PROJECT-19026009
  • [Presentation] Spatial and Temporal Characteristics of Atmospheric-Pressure Plasma Jet

    • Author(s)
      G. Uchida, K. Kawabata, K. Takenaka and Y. Setsuhara
    • Organizer
      2014 MRS Fall Meeting & Exhibit
    • Place of Presentation
      Boston, USA
    • Year and Date
      2014-11-30 – 2014-12-05
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Discharge Characteristics and Dynamics of Atmospheric Pressure Plasmas for Plasma Medicine

    • Author(s)
      Y. Setsuhara, G. Uchida, K. Kawabata and K. Takenaka
    • Organizer
      19th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics
    • Place of Presentation
      Gunsan, Korea
    • Year and Date
      2014-06-07 – 2014-06-08
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Plasma Interactions with Organic Materials in Liquid through Gas/liquid Interface via Atmospheric-Pressure Plasma

    • Author(s)
      K. Takenaka, K. Kawabata, A. Nakajima, G. Uchida and Y. Setsuhara
    • Organizer
      7th Int. Symp. on Adv. Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2015)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2015-03-26 – 2015-03-30
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] ミストプラズマCVDを用いた透明導電酸化物薄膜の形成

    • Author(s)
      竹中 弘祐、節原 裕一
    • Organizer
      平成26年度 東北大学電気通信研究所共同プロジェクト研究会
    • Place of Presentation
      東北大学青葉台キャンパス
    • Year and Date
      2014-09-25 – 2014-09-26
    • Invited
    • Data Source
      KAKENHI-PROJECT-26420738
  • [Presentation] Dynamic Properties of Atmospheric Pressure Plasma Jet for Plasma Medicine

    • Author(s)
      K. Kawabata, G. Uchida, K. Takenaka and Y. Setsuhara
    • Organizer
      第24回日本MRS年次大会
    • Place of Presentation
      横浜
    • Year and Date
      2014-12-10 – 2014-12-12
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Plasma/biomolecules Interaction in Liquid as Fundamental Processes in Plasma Medicine

    • Author(s)
      K. Takenaka, K. Kawabata, A. Nakajima, G. Uchida and Y. Setsuhara
    • Organizer
      The 2nd Int. Workshop on Plasma for Cancer Treatment (IWPCT2015)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2015-03-16 – 2015-03-17
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Plasma Interactions with Biological Molecules in Atmospheric-Pressure Plasma Irradiation through Gas/Liquid Interface

    • Author(s)
      K. Takenaka, A. Miyazaki, K. Kawabata, G. Uchida and Y. Setsuhara
    • Organizer
      Int. Union of Materials Research Societies-The IUMRS Int. Conf. in Asia 2014
    • Place of Presentation
      Fukuoka, Japan
    • Year and Date
      2014-08-24 – 2014-08-30
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Discharge Characteristics of Atmospheric Pressure Plasma Jet Operated under Various Gas Conditions

    • Author(s)
      G. Uchida, K. Kawabata, K. Takenaka and Y. Setsuhara
    • Organizer
      第24回日本MRS年次大会
    • Place of Presentation
      横浜
    • Year and Date
      2014-12-10 – 2014-12-12
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Low-temperature Formation of a-IGZO Films with ICP-enhanced Reactive Sputter Deposition

    • Author(s)
      Y. Setsuhara, Y. Sutama, K. Nakata, K. Takenaka, G. Uchida and A. Ebe
    • Organizer
      7th Int. Symp. on Adv. Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2015) / 8th Int. Conf. on Plasma Nano Technology & Science(IC-PLANTS 2015)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2015-03-26 – 2015-03-30
    • Data Source
      KAKENHI-PROJECT-26630335
  • [Presentation] Plasma Interactions with Soft Materials in Air and Liquid

    • Author(s)
      Y. Setsuhara, A. Miyazaki, K. Takenaka, H. Abe and M. Hori
    • Organizer
      5th Int. Conf. on Plasma Medicine (ICPM5)
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2014-05-18 – 2014-05-23
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Deposition of Oxide Semiconductor Films via ICP-Enhanced Reactive Sputtering for Development of Advanced Flexible Devices

    • Author(s)
      Y. Setsuhara, G. Uchida, K. Takenaka, Y. Suyama, S. Osaki and A. Ebe
    • Organizer
      Plasma Conf. 2014
    • Place of Presentation
      新潟
    • Year and Date
      2014-11-18 – 2014-11-21
    • Data Source
      KAKENHI-PROJECT-26630335
  • [Presentation] Influence of Voltage Pulse Width on Discharge Characteristics in Dbd Plasma Jet

    • Author(s)
      G. Uchida, K. Kawabata, K. Takenaka and Y. Setsuhara
    • Organizer
      The 2nd Int. Workshop on Plasma for Cancer Treatment (IWPCT2015)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2015-03-16 – 2015-03-17
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Frequency Dependence of Atmospheric-Pressure Discharge Generation

    • Author(s)
      Y. Setsuhara, G. Uchida, K. Kawabata, K. Takenaka, K. Takeda, K. Ishikawa and M. Hori
    • Organizer
      2014 MRS Fall Meeting & Exhibit
    • Place of Presentation
      Boston, USA
    • Year and Date
      2014-11-30 – 2014-12-05
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Process Controllability of ICP-Enhanced Reactive Sputter Deposition for Low-Temperature Formation of IGZO TFT

    • Author(s)
      Y. Setsuhara, K. Takenaka, G. Uchida and A. Ebe
    • Organizer
      36th Int. Symp. on Dry Process (DPS2014)
    • Place of Presentation
      YOKOHAMA, Japan
    • Year and Date
      2014-11-27 – 2014-11-28
    • Data Source
      KAKENHI-PROJECT-26630335
  • [Presentation] Temporal Behavior of Reactive Particle Production in DBD Plasma Jet

    • Author(s)
      G. Uchida, K. Takenaka, K. Kawabata, A. Miyazaki, K. Takeda, K. Ishikawa, M. Hori and Y. Setsuhara
    • Organizer
      Int. Union of Materials Research Societies-The IUMRS Int. Conf. in Asia 2014
    • Place of Presentation
      Fukuoka, Japan
    • Year and Date
      2014-08-24 – 2014-08-30
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Deposition of zinc oxide films with atmospheric-pressure plasma-assisted mist CVD

    • Author(s)
      Kosuke Takenaka, Giichiro Uchida and Yuichi Setsuhara
    • Organizer
      ISPlasma 2015 / IC-PLANTS 2015
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2015-03-26 – 2015-03-31
    • Data Source
      KAKENHI-PROJECT-26420738
  • [Presentation] Formation of Zinc Oxide Films Deposited by Plasma-Assisted Mist CVD for Transparent Conducting Oxide Application

    • Author(s)
      Kosuke Takenaka, Giichiro Uchida and Yuichi Setsuhara
    • Organizer
      2015 Japan-Korea Joint Symposium on Advanced Solar Cells
    • Place of Presentation
      Fukuoka, Japan
    • Year and Date
      2015-01-09 – 2015-01-10
    • Invited
    • Data Source
      KAKENHI-PROJECT-26420738
  • [Presentation] RF plasma sources for PECVD and soft-material processes

    • Author(s)
      Y. Setsuhara, S. Osaki, K. Takenaka and A. Ebe
    • Organizer
      The International Symposium on Plasma-Nano Materials and Processes
    • Place of Presentation
      Seoul, Korea
    • Year and Date
      2014-04-01 – 2014-04-05
    • Invited
    • Data Source
      KAKENHI-PROJECT-26630335
  • [Presentation] Characteristics of Reactive Particle Production in Atmospheric Pressure DBD Plasma Jet

    • Author(s)
      G. Uchida, K. Takenaka, A. Miyazaki, K. Kawabata, Y. Setsuhara, K. Takeda, K. Ishikawa and M. Hori
    • Organizer
      5th Int. Conf. on Plasma Medicine (ICPM5)
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2014-05-18 – 2014-05-23
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] 大気圧高周波放電プラズマの動的特性

    • Author(s)
      内田 儀一郎, 竹中 弘祐, 川端 一史, 節原 裕一
    • Organizer
      第75回応用物理学会学術講演会
    • Place of Presentation
      札幌
    • Year and Date
      2014-09-17 – 2014-09-20
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Low-Temperature Formation of a-IGZO Films by ICP-Enhanced Reactive Sputter Deposition

    • Author(s)
      Y. Setsuhara, S. Osaki, Y. Suyama, K. Takenaka and G. Uchida
    • Organizer
      Int. Union of Materials Research Societies-The IUMRS Int. Conf. in Asia 2014
    • Place of Presentation
      Fukuoka, Japan
    • Year and Date
      2014-08-24 – 2014-08-30
    • Data Source
      KAKENHI-PROJECT-26630335
  • [Presentation] Effect of Plasma Excitation Frequency on the Discharge Characteristics of Atmospheric Plasma Jet

    • Author(s)
      G. Uchida, K. Kawabata, K. Takenaka, Y. Setsuhara, K. Takeda, K. Ishikawa and M. Hori
    • Organizer
      Plasma Conf. 2014
    • Place of Presentation
      新潟
    • Year and Date
      2014-11-18 – 2014-11-21
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Plasma Interactions with Mist in Atmospheric-Pressure Plasma Irradiation

    • Author(s)
      Kosuke Takenaka, Giichiro Uchida, and Yuichi Setsuhara
    • Organizer
      第24回日本MRS年次大会
    • Place of Presentation
      横浜開港記念会館 他
    • Year and Date
      2014-12-10 – 2014-12-12
    • Data Source
      KAKENHI-PROJECT-26420738
  • [Presentation] Deposition of Zinc Oxide Film Using Atmospheric-Pressure Non-Equilibrium Plasma

    • Author(s)
      Kosuke Takenaka, Giichiro Uchida, and Yuichi Setsuhara
    • Organizer
      The International Symposium on Visualization in Joining & Welding Science through Advanced Measurements and Simulation (Visual-JW 2014)
    • Place of Presentation
      Osaka, Japan
    • Year and Date
      2014-11-26 – 2014-11-28
    • Data Source
      KAKENHI-PROJECT-26420738
  • [Presentation] Discharge Characteristics of Atmospheric RF Plasma Jet

    • Author(s)
      G. Uchida, K. Takenaka, K. Kawabata, Y. Setsuhara, K. Takeda, K. Ishikawa and M. Hori
    • Organizer
      7th Int. Symp. on Adv. Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma 2015)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2015-03-26 – 2015-03-30
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] 気液界面を介した大気圧非平衡プラズマ照射が液体中のアミノ酸へ与える影響

    • Author(s)
      竹中 弘祐, 内田 儀一郎, 川端 一史, 中島 厚, 阿部 浩也, 節原 裕一
    • Organizer
      第62回応用物理学会春季学術講演会, (.3.11-14)
    • Place of Presentation
      神奈川
    • Year and Date
      2015-03-11 – 2015-03-14
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Discharge Characteristics and Interaction with Soft Materials in Vacuum, Air and Liquid

    • Author(s)
      Y. Setsuhara, G. Uchida, K. Kawabata, A. Miyazaki and K. Takenaka
    • Organizer
      14th Int. Conf. on Plasma Surface Engineering
    • Place of Presentation
      Garmisch-Partenkirchen, Germany
    • Year and Date
      2014-09-15 – 2014-09-19
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Spatio-temporal behaviors of atmospheric-pressure discharges

    • Author(s)
      Y. Setsuhara, G. Uchida, K. Kawabata, K. Takenaka, K. Takeda, K. Ishikawa and M. Hori
    • Organizer
      The 20th Workshop on Advanced Plasma Processes and Diagnostics
    • Place of Presentation
      Sapporo, Japan
    • Year and Date
      2015-01-27 – 2015-01-29
    • Invited
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] 大気圧プラズマ支援による酸化亜鉛薄膜の形成に向けたプラズマ/ミスト相互作用の解析

    • Author(s)
      竹中弘祐,内田儀一郎,節原裕一
    • Organizer
      第75回応用物理学会学術講演会
    • Place of Presentation
      北海道大学札幌キャンパス
    • Year and Date
      2014-09-17 – 2014-09-20
    • Data Source
      KAKENHI-PROJECT-26420738
  • [Presentation] Spatial and Temporal Properties of Atmospheric-Pressure Dbd Plasma Jet

    • Author(s)
      G. Uchida, K. Kawabata, K. Takenaka, Y. Setsuhara, K. Takeda, K. Ishikawa and M. Hori
    • Organizer
      The 2nd Int. Workshop on Plasma for Cancer Treatment (IWPCT2015)
    • Place of Presentation
      Nagoya, Japan
    • Year and Date
      2015-03-16 – 2015-03-17
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] 大気圧プラズマジェット放電特性に及ぼす放電電圧パルス幅の効果

    • Author(s)
      内田 儀一郎, 竹中 弘祐, 川端 一史, 節原 裕一
    • Organizer
      第62回応用物理学会春季学術講演会
    • Place of Presentation
      神奈川
    • Year and Date
      2015-03-11 – 2015-03-14
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] 気液界面を介した大気圧非平衡プラズマと生体分子との相互作用

    • Author(s)
      竹中 弘祐, 川端 一史, 宮崎 敦史, 阿部 浩也, 内田 儀一郎, 節原 裕一
    • Organizer
      第75回応用物理学会学術講演会
    • Place of Presentation
      札幌
    • Year and Date
      2014-09-17 – 2014-09-20
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Discharge Characteristics and Radical Generation in Dielectric Barrier Discharge

    • Author(s)
      G. Uchida, K. Takenaka, K. Kawabata, A. Miyazaki, Y. Setsuhara, K. Takeda, K. Ishikawa and M. Hori
    • Organizer
      14th Int. Conf. on Plasma Surface Engineering
    • Place of Presentation
      Garmisch-Partenkirchen, Germany
    • Year and Date
      2014-09-15 – 2014-09-19
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Discharge Properties and Radical-Generation Chracteristics in DBD Plasma Jet

    • Author(s)
      G. Uchida, K. Takenaka, K. Kawabata, A. Miyazaki, Y. Setsuhara, K. Takeda, K. Ishikawa and M. Hori
    • Organizer
      14th Int. Conf. on Plasma Surface Engineering,
    • Place of Presentation
      Garmisch-Partenkirchen, Germany
    • Year and Date
      2014-09-15 – 2014-09-19
    • Data Source
      KAKENHI-PLANNED-24108003
  • [Presentation] Interactions of Atmospheric Pressure Non-equilibrium-Plasma with Organic Materials through Gas/Liquid Interface

    • Author(s)
      K. Takenaka, A. Miyazaki, K. Kawabata, G. Uchida and Y. Setsuhara
    • Organizer
      5th Int. Conf. on Plasma Medicine (ICPM5)
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2014-05-18 – 2014-05-23
    • Data Source
      KAKENHI-PLANNED-24108003
  • 1.  MIYAKE Shoji (40029286)
    # of Collaborated Projects: 9 results
    # of Collaborated Products: 0 results
  • 2.  TAKAHASHI Kazuo (50335189)
    # of Collaborated Projects: 7 results
    # of Collaborated Products: 13 results
  • 3.  TAKENAKA Kosuke (60432423)
    # of Collaborated Projects: 6 results
    # of Collaborated Products: 168 results
  • 4.  ONO Kouichi (30311731)
    # of Collaborated Projects: 5 results
    # of Collaborated Products: 13 results
  • 5.  MAKINO Yukio (20089890)
    # of Collaborated Projects: 5 results
    # of Collaborated Products: 0 results
  • 6.  UCHIDA Giichiro (90422435)
    # of Collaborated Projects: 3 results
    # of Collaborated Products: 98 results
  • 7.  SHOJI Tatsuo (50115581)
    # of Collaborated Projects: 3 results
    # of Collaborated Products: 0 results
  • 8.  OGATA Kiyoshi
    # of Collaborated Projects: 3 results
    # of Collaborated Products: 0 results
  • 9.  KUMAGAI Masao
    # of Collaborated Projects: 3 results
    # of Collaborated Products: 0 results
  • 10.  TSUMURA Takuya (00283812)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 0 results
  • 11.  HORI Masaru (80242824)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 5 results
  • 12.  田中 昭代 (10136484)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 0 results
  • 13.  池原 譲 (10311440)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 0 results
  • 14.  NAKATA Kazuhiro (80112069)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 15.  SHIBAYANAGI Toshiya (10187411)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 16.  TANAKA Manabu (20243272)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 17.  FUJII Hidetoshi (00247230)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 18.  KANEKO Toshiro (30312599)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 19.  SHIMIZU Nobuyuki (70262128)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 20.  HIRATA Takamichi (80260420)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 2 results
  • 21.  ABE Hiroya (50346136)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 6 results
  • 22.  NAKA Masaaki (00005985)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 23.  MURAKAWA Hidekazu (60166270)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 24.  IKEUCHI Kenji (10030058)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 25.  TAHARA Hirokazu (20207210)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 26.  OMAE Nobuo (60029345)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 27.  TAGAWA Masahito (10216806)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 28.  YASUI Toshiaki (10263229)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 29.  FUJITA Masayuki (30260178)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 5 results
  • 30.  HASHIDA Masaki (50291034)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 6 results
  • 31.  藤山 寛 (20112310)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 32.  水野 彰 (20144199)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 33.  吉川 史隆 (40224985)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 34.  小野 亮 (90323443)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 35.  小田 哲治 (90107532)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 36.  SAMANDI Masoud
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 37.  DUNNE Druce
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 38.  KOHATA Mamoru
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 39.  SANO Saburou
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 40.  SAJI Tazaburou
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 41.  MASOUD Saman
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 42.  DRUCE Dunne
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 43.  布村 正太
    # of Collaborated Projects: 0 results
    # of Collaborated Products: 1 results
  • 44.  川崎 敏之
    # of Collaborated Projects: 0 results
    # of Collaborated Products: 1 results

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