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西川 英一  ニシカワ エイイチ

ORCIDConnect your ORCID iD *help
Researcher Number 80277277
Affiliation (based on the past Project Information) *help 1998: 東京理科大学, 工学部, 講師
1997 – 1998: 東京理科大学, 工学部, 助手
Review Section/Research Field
Except Principal Investigator
Material processing/treatments
Keywords
Except Principal Investigator
Penning Discharge Micro-Sputtering / Continuous formation / micro Processing / Miri Processing / Thin Film Formation / Micro Etching / Micro Sputtering / 対摩耗性 / 付着力 / 窒化物薄膜 … More / 炭化物薄膜 / ミクロン加工 / マイクロスパッタリング / ペニング放電マイクロスパッタリング / 連続加工 / ミクロ加工 / ミリ加工 / 薄膜形成 / エッチング / マイクロスパックリング Less
  • Research Projects

    (1 results)
  • Co-Researchers

    (1 People)
  •  Basic Research on the Continuous Film Formation by Using Discharge Micro-Sputtering

    • Principal Investigator
      NAKAYAMA Toshio
    • Project Period (FY)
      1997 – 1998
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      Material processing/treatments
    • Research Institution
      Science University of Tokyo in YAMAGUCHI
  • 1.  NAKAYAMA Toshio (40084397)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results

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