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NOZAKI Mikito  野崎 幹人

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Nozaki Mikito  野崎 幹人

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Researcher Number 90646217
Other IDs
Affiliation (Current) 2025: 大阪大学, 大学院工学研究科, 技術職員
Affiliation (based on the past Project Information) *help 2022: 大阪大学, 大学院工学研究科, 技術専門職員
2022: 大阪大学, 大学院工学研究科, 技術職員
2019 – 2021: 大阪大学, 工学研究科, 技術職員
Review Section/Research Field
Principal Investigator
Basic Section 21050:Electric and electronic materials-related
Keywords
Principal Investigator
酸窒化膜 / HEMT / MOS / 放射光光電子分光分析 / 2次元電子ガス / AlGaN / ゲート絶縁膜 / MOS界面 / 窒化ガリウム
  • Research Projects

    (1 results)
  • Research Products

    (5 results)
  • Co-Researchers

    (1 People)
  •  Multilayer composite gate dielectrics for fabricating high-performance GaN-MOS devicesPrincipal Investigator

    • Principal Investigator
      Nozaki Mikito
    • Project Period (FY)
      2019 – 2022
    • Research Category
      Grant-in-Aid for Early-Career Scientists
    • Review Section
      Basic Section 21050:Electric and electronic materials-related
    • Research Institution
      Osaka University

All 2020 2019

All Journal Article Presentation

  • [Journal Article] Evaluation and mitigation of reactive ion etching-induced damage in AlGaN/GaN MOS structures fabricated by low-power inductively coupled plasma2020

    • Author(s)
      M. Nozaki, D. Terashima, A. Yoshigoe, T. Hosoi, T. Shimura, H. Watanabe
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 59 Issue: SM Pages: SMMA07-SMMA07

    • DOI

      10.35848/1347-4065/ab8f0e

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-20K05338, KAKENHI-PROJECT-19K15027
  • [Presentation] Gate Stack Technology for Advanced GaN-based MOS Devices2020

    • Author(s)
      Heiji Watanabe, Takuji Hosoi, Mikito Nozaki, Hidetoshi Mizobata, Takayoshi Shimura
    • Organizer
      2020 International Conference on Solid State Devices and Materials
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19K15027
  • [Presentation] Evaluation of Reactive Ion Etching-induced Damage on 2DEG at AlGaN/GaN Interface2019

    • Author(s)
      Mikio Nozaki, Daiki Terashima, Akitaka Yoshigoe, Takuji Hosoi, Takayoshi Shimura, Heiji Watanabe
    • Organizer
      IWDTF 2019
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19K15027
  • [Presentation] AlGaN/GaNヘテロ構造の低バイアス電力ICPエッチングによる低損傷加工2019

    • Author(s)
      野崎幹人,寺島大貴,吉越章隆,細井卓治,志村考功,渡部平司
    • Organizer
      先進パワー半導体分科会第6回講演会
    • Data Source
      KAKENHI-PROJECT-19K15027
  • [Presentation] ICPエッチングがAlGaN/GaN界面の2DEGに与える影響の評価2019

    • Author(s)
      野崎 幹人, 寺島 大貴, 吉越 章隆, 細井 卓治, 志村 考功, 渡部 平司
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19K15027
  • 1.  吉越 章隆
    # of Collaborated Projects: 0 results
    # of Collaborated Products: 1 results

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