Yamakawa Shinji 山川進二

Researcher Number	90876252
Other IDs
Affiliation (Current)	2025: 兵庫県立大学, 高度産業科学技術研究所, 准教授
Affiliation (based on the past Project Information) *help	2021 – 2023: 兵庫県立大学, 高度産業科学技術研究所, 助教
Review Section/Research Field	Principal Investigator Basic Section 21060:Electron device and electronic equipment-related
Keywords	Principal Investigator LWR / 軟X線 / 半導体微細加工 / XANES / 接触角測定 / 高分子合成 / 現像速度 / EUVフラッド露光 / EUV干渉露光 / 線幅ばらつき / 軟X線共鳴散乱 / フォトレジスト / EUVリソグラフィ

Research Projects
(1 results)
Research Products
(30 results)

The relationship between the chemical composition distribution in resist thin films and the pattern linewidth roughnessPrincipal Investigator
- Principal Investigator
  
  Yamakawa Shinji
- Project Period (FY)
  2021 – 2023
- Research Category
  
  Grant-in-Aid for Early-Career Scientists
- Review Section
  
  Basic Section 21060:Electron device and electronic equipment-related
- Research Institution
  University of Hyogo

All 2024 2023 2022 2021

All Journal Article Presentation

[Journal Article] The x-ray absorption spectroscopy analysis of the negative-tone PAG bound resist2023
- Author(s)
  Yamakawa Shinji、Harada Tetsuo、Watanabe Takeo
- Journal Title
  
  Proceedings of SPIE
  
  Volume: 12750 Pages: 60-60
- DOI
  10.1117/12.2687118
- Data Source
  KAKENHI-PROJECT-21K14212
[Journal Article] Present Status of EUV Interference Lithography at NewSUBARU2023
- Author(s)
  Imai Rikuya、Yamakawa Shinji、Harada Tetsuo、Watanabe Takeo
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 36 Issue: 1 Pages: 53-59
- DOI
  10.2494/photopolymer.36.53
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2023-06-15
- Language
  English
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-21K14212
[Journal Article] Spatial Distribution Analysis of Polymers in Resist Thin Film by Reflection-mode Resonant Soft X-ray Scattering2023
- Author(s)
  Nakamoto Atsunori、Yamakawa Shinji、Harada Tetsuo、Watanabe Takeo
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 36 Issue: 1 Pages: 41-45
- DOI
  10.2494/photopolymer.36.41
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2023-06-15
- Language
  English
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-21K14212
[Journal Article] Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARU2023
- Author(s)
  Yamakawa Shinji、Harada Tetsuo、Nakanishi Koji、Watanabe Takeo
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 36 Issue: 1 Pages: 47-52
- DOI
  10.2494/photopolymer.36.47
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2023-06-15
- Language
  English
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-21K14212
[Journal Article] Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope2023
- Author(s)
  Iguchi Shuhei、Harada Tetsuo、Yamakawa Shinji、Watanabe Takeo、Motokawa Takeharu
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 36 Issue: 1 Pages: 25-30
- DOI
  10.2494/photopolymer.36.25
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2023-06-15
- Language
  English
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-21K14212
[Journal Article] Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist2022
- Author(s)
  Nakamoto Atsunori、Yamakawa Shinji、Harada Tetsuo、Watanabe Takeo
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 35 Issue: 1 Pages: 61-65
- DOI
  10.2494/photopolymer.35.61
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2022-12-16
- Language
  English
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-21K14212
[Journal Article] Affinity Analysis of Photoacid Generator in the Thin Film of Chemical Amplification Resist by Contact Angle Measurement2021
- Author(s)
  Yamakawa Shinji、Yamamoto Ako、Yasui Seiji、Watanabe Takeo、Harada Tetsuo
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 34 Issue: 1 Pages: 111-115
- DOI
  10.2494/photopolymer.34.111
- NAID
  130008119653
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2021-06-11
- Language
  English
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] 軟X 線反射型共鳴散乱法によるEUV レジスト薄膜中の構成物の空間分布評価2024
- Author(s)
  中本敦啓、山川進二、原田哲男、渡邊健夫
- Organizer
  ニュースバルシンポジウム2024
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] レジスト材料の空間分布測定を目的とした反射型拡大投影軟X 線顕微鏡の開発2024
- Author(s)
  井口脩平、原田哲男、山川進二、渡邊健夫
- Organizer
  ニュースバルシンポジウム2024
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] 光電子顕微鏡を用いたレジスト薄膜表面の化学組成分布の観察2024
- Author(s)
  笹倉司、山川進二、原田哲男、渡邊健夫
- Organizer
  ニュースバルシンポジウム2024
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope2023
- Author(s)
  Iguchi Shuhei、Harada Tetsuo、Yamakawa Shinji、Watanabe Takeo、Motokawa Takeharu
- Organizer
  The 40th International Conference of Photopolymer Science and Technology
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] Evaluation of the Chemical Component Distribution in Resist Thin Film by Grazing Incidence Resonant Soft X-ray Scattering2023
- Author(s)
  Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe
- Organizer
  The 13th SPSJ International Polymer Conference
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] Analysis of the Chemical Component Distribution in EUV Resist Thin Films by Soft X-Ray2023
- Author(s)
  Shinji Yamakawa, Atsunori Nakamoto, Shuhei Iguchi, Tsukasa Sasakura, Tetsuo Harada, Takeo Watanabe
- Organizer
  The 13th SPSJ International Polymer Conference
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARU2023
- Author(s)
  Yamakawa Shinji、Harada Tetsuo、Nakanishi Koji、Watanabe Takeo
- Organizer
  The 40th International Conference of Photopolymer Science and Technology
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] Chemical Imaging of Resist Thin-Film Surface using PEEM at NewSUBARU2023
- Author(s)
  Tsukasa Sasakura, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe
- Organizer
  NGL Workshop 2023
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] 軟X線反射型共鳴散乱法を用いたレジスト薄膜中における化学組成の空間分布評価2023
- Author(s)
  中本敦啓、山川進二、原田哲男、渡邊健夫
- Organizer
  ニュースバルシンポジウム2023
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] EUV干渉露光系の高度化の検討2023
- Author(s)
  今井陸陽、山川進二、原田哲男、渡邊健夫
- Organizer
  ニュースバルシンポジウム2023
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] Investigation of the Chemical Imaging of Resist Thin Films by Photoemission Electron Microscopy at NewSUBARU2023
- Author(s)
  Tsukasa Sasakura, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe
- Organizer
  The 13th SPSJ International Polymer Conference
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope2023
- Author(s)
  Iguchi Shuhei、Yamakawa Shinji、Harada Tetsuo、Watanabe Takeo
- Organizer
  NGL Workshop 2023
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] The x-ray absorption spectroscopy analysis of the negative-tone PAG bound resist2023
- Author(s)
  Yamakawa Shinji、Harada Tetsuo、Watanabe Takeo
- Organizer
  International Conference on Extreme Ultraviolet Lithography 2023
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] Spatial Distribution Evaluation of EUV Resist Using Reflection-type Projection Soft X-Ray Microscope2023
- Author(s)
  Shuhei Iguchi, Tetsuo Harada, Shinji Yamakawa, Takeo Watanabe
- Organizer
  The 13th SPSJ International Polymer Conference
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] Present Status of EUV Interference Lithography at NewSUBARU2023
- Author(s)
  Imai Rikuya、Yamakawa Shinji、Harada Tetsuo、Watanabe Takeo
- Organizer
  The 40th International Conference of Photopolymer Science and Technology
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] Spatial Distribution Analysis of Polymers in Resist Thin Film by Reflection-mode Resonant Soft X-ray Scattering2023
- Author(s)
  Nakamoto Atsunori、Yamakawa Shinji、Harada Tetsuo、Watanabe Takeo
- Organizer
  The 40th International Conference of Photopolymer Science and Technology
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] 斜入射軟X線共鳴散乱を用いたレジスト薄膜中の化学構成材の空間分布測定2022
- Author(s)
  中本敦啓、山川進二、原田哲男、渡邊健夫
- Organizer
  第71回高分子討論会
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] レジスト薄膜中の空間分布測定用軟X線反射型共鳴散乱法の検討2022
- Author(s)
  中本敦啓、山川進二、原田哲男、渡邊健夫
- Organizer
  NGLワークショップ2022
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist2022
- Author(s)
  Nakamoto Atsunori、Yamakawa Shinji、Harada Tetsuo、Watanabe Takeo
- Organizer
  The 39th International Conference of Photopolymer Science and Technology
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] レジスト薄膜中の空間分布測定を目的とした軟X線反射型共鳴散乱の検討2022
- Author(s)
  中本敦啓、山川進二、原田哲男、渡邊健夫
- Organizer
  第58回X線分析討論会
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] Affinity Analysis of Photoacid Generator in the Thin Film of Chemical Amplification Resist by Contact Angle Measurement2021
- Author(s)
  Shinji Yamakawa, Ako Yamamoto, Seiji Yasui, Takeo Watanabe, Tetsuo Harada
- Organizer
  The 38th International Conference of Photopolymer Science and Technology
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] 化学増幅型レジスト薄膜における光酸発生剤の組成分布およびレジスト特性評価2021
- Author(s)
  山川進二、原田哲男、渡邊健夫
- Organizer
  第70回高分子討論会
- Data Source
  KAKENHI-PROJECT-21K14212
[Presentation] 化学増幅レジスト薄膜中の化学構成物の空間分布解析絵の検討2021
- Author(s)
  山川進二、原田哲男、渡邊健夫
- Organizer
  NGLワークショップ2021
- Data Source
  KAKENHI-PROJECT-21K14212

Yamakawa Shinji 山川 進二

Research Projects

Research Products

The relationship between the chemical composition distribution in resist thin films and the pattern linewidth roughnessPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

[Journal Article] The x-ray absorption spectroscopy analysis of the negative-tone PAG bound resist2023

Author(s)

Journal Title

DOI

Data Source

[Journal Article] Present Status of EUV Interference Lithography at NewSUBARU2023

Author(s)

Journal Title

DOI

ISSN

Year and Date

Language

Data Source

[Journal Article] Spatial Distribution Analysis of Polymers in Resist Thin Film by Reflection-mode Resonant Soft X-ray Scattering2023

Author(s)

Journal Title

DOI

ISSN

Year and Date

Language

Data Source

[Journal Article] Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARU2023

Author(s)

Journal Title

DOI

ISSN

Year and Date

Language

Data Source

[Journal Article] Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope2023

Author(s)

Journal Title

DOI

ISSN

Year and Date

Language

Data Source

[Journal Article] Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist2022

Author(s)

Journal Title

DOI

ISSN

Year and Date

Language

Data Source

[Journal Article] Affinity Analysis of Photoacid Generator in the Thin Film of Chemical Amplification Resist by Contact Angle Measurement2021

Author(s)

Journal Title

DOI

NAID

ISSN

Year and Date

Language

Data Source

[Presentation] 軟X 線反射型共鳴散乱法によるEUV レジスト薄膜中の構成物の空間分布評価2024

Author(s)

Organizer

Data Source

[Presentation] レジスト材料の空間分布測定を目的とした反射型拡大投影軟X 線顕微鏡の開発2024

Author(s)

Organizer

Data Source

[Presentation] 光電子顕微鏡を用いたレジスト薄膜表面の化学組成分布の観察2024

Author(s)

Organizer

Data Source

[Presentation] Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope2023

Author(s)

Organizer

Data Source

[Presentation] Evaluation of the Chemical Component Distribution in Resist Thin Film by Grazing Incidence Resonant Soft X-ray Scattering2023

Yamakawa Shinji 山川進二