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In-situ Measurements of Cluster Volume Fraction in Silicon Thin Films Using Quartz Crystal Microbalances

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Abstract

We have carried out in-situ measurements of cluster volume fraction in silicon films during deposition by using quartz crystal microbalances (QCM’s) together with a cluster-eliminating filter. The cluster volume fraction in films is deduced from in-situ measurements of film deposition rates with and without silicon clusters using QCM’s. The results show that the higher deposition rate leads to the higher volume fraction of clusters.

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Acknowledgments

This work was partly supported by NEDO and PVTEC.

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Kim, Y., Hatozaki, K., Hashimoto, Y. et al. In-situ Measurements of Cluster Volume Fraction in Silicon Thin Films Using Quartz Crystal Microbalances. MRS Online Proceedings Library 1426, 307–311 (2012). https://doi.org/10.1557/opl.2012.839

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  • DOI: https://doi.org/10.1557/opl.2012.839

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