Abstract
We have carried out in-situ measurements of cluster volume fraction in silicon films during deposition by using quartz crystal microbalances (QCM’s) together with a cluster-eliminating filter. The cluster volume fraction in films is deduced from in-situ measurements of film deposition rates with and without silicon clusters using QCM’s. The results show that the higher deposition rate leads to the higher volume fraction of clusters.
References
A. Shah, P. Torres, R. Tscharner, N. Wyrsch, and H. Keppner, Scince 285 (1999) 692.
B. Rech and H. Wagner, Appl. Phys. A 69 (1999) 155.
R.W. Collins and A.S. Ferlauto, Curr. Opin. Solid State Mater. Sci. 6 (2002) 425.
A. Matsuda, Jpn. J. Appl. Phys. 43 (2004) 7909.
M. Konagai, Jpn. J. Appl. Phys. 50 (2011) 030001.
H. Keppner, J. Meier, P. Torres, D. Fischer, and A. Shah, Appl. Phys. A 69 (1999) 169.
K. Yamamoto, M. Yoshimi, Y. Tawada, Y. Okamoto, and A. Nakajima, J. Non-Cryst. Solids 266 (2000) 1082.
J. Meier, J. Spitznagel, U. Kroll, C. Bucher, S. Faÿ, and T. Moriarty, A. Shah, Thin Solid Films 451(2004) 518.
G. Ganguly and A. Matsuda. Phys. Rev. B. 47 (1993) 3661.
M. Shiratani, S. Maeda, K. Koga and Y. Watanabe, Jpn. Appl. Phys. 39 (2000) 287.
P. Boeuf, Ph. Belenguer, and T. Hbid, Plasma Sources Sci. Technol. 3 (1994) 407.
J. Perrin, C. Bohm, R. Etemadi and A. Llore, Plasma Sources Sci. Technol. 3 (1994) 252.
E. Amanatides, D. Mataras, and D. E. Rapakoulias, J. Appl. Phys. 90 (2001) 5799.
A. G. Kazanskii, E. I. Terukov, P. A. Forsh and J. P. Kleider, semiconductor 44 (2010) 494.
J.Y.W. Seto, J. Appl. Phys. 46 (1975) 5247.
H.P. Peters, Z. Physik. B 34 (1979) 399.
N. Beck, J. Meier, J. Fric, Z. Remes, A. Poruba, R. Fluckiger, J. Pohl, A. Shah, M. Vanecek, J. Non-Cryst.Solids 198 (1996) 903.
P. Hapke, F. Finger, R. Carius, H. Wagner, K. Prasad, R. Fluckiger, J. Non-Cryst. Solids 164 (1993) 981.
K. Koga, N. Kaguchi, M. Shiratani and Y. Watanabe, J. Vac. Sci. Technol. A 22 (2004) 1536.
K. Koga, T. Inoue, K. Bando, S. Iwashita, M. Shiratani, and Y. Watanabe, Jpn. J. Appl. Phys. 44 (2005) L1430.
W. M. Nakamura, H. Matsuzaki, H. Sato, Y. Kawashima, K. Koga, and M. Shiratani, Surf. Coat. Technol. 205 (2010) S241.
K. Koga, N. Kaguchi, K. Bando and M. Shiratani, Rev. Sci. Instrum. 76 (2005) 113501.
G. Sauerbrey, Z. Phys. 155 (1959) 206.
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This work was partly supported by NEDO and PVTEC.
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Kim, Y., Hatozaki, K., Hashimoto, Y. et al. In-situ Measurements of Cluster Volume Fraction in Silicon Thin Films Using Quartz Crystal Microbalances. MRS Online Proceedings Library 1426, 307–311 (2012). https://doi.org/10.1557/opl.2012.839
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DOI: https://doi.org/10.1557/opl.2012.839