Sato Masaru 佐藤勝

Researcher Number	10636682
Affiliation (Current)	2022: 北見工業大学, 工学部, 准教授
Affiliation (based on the past Project Information) *help	2019 – 2021: 北見工業大学, 工学部, 准教授 2015 – 2018: 北見工業大学, 工学部, 助教
Review Section/Research Field	Principal Investigator Electronic materials/Electric materials Except Principal Investigator Basic Section 21050:Electric and electronic materials-related / Electronic materials/Electric materials
Keywords	Principal Investigator 3次元集積回路 / シリコン貫通ビア / 拡散バリヤ / 絶縁バリヤ / TiNx膜 / ZrNx膜 / HfNx膜 / 表面・界面物性 / ナノ材料 / 誘電体物性 … More Except Principal Investigator … More

極薄バリヤの構造解析における革新的解明とCu配線の配向制御
- Principal Investigator
  
  武山眞弓
- Project Period (FY)
  2021 – 2023
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 21050:Electric and electronic materials-related
- Research Institution
  Kitami Institute of Technology
Orientation control applicable Cu interconnect on the cutting edge of 3D devices and 3D-LSI
- Principal Investigator
  
  Takeyama Mayumi B.
- Project Period (FY)
  2018 – 2020
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 21050:Electric and electronic materials-related
- Research Institution
  Kitami Institute of Technology
Development of new barrier material of interfacial-layer-free for ultrafine TSVPrincipal Investigator
- Principal Investigator
  
  Sato Masaru
- Project Period (FY)
  2017 – 2019
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Kitami Institute of Technology
Low temperature deposition of barrierless insulating film applicable to 3D and 2.5 D-IC
- Principal Investigator
  
  Takeyama Mayumi B.
- Project Period (FY)
  2015 – 2017
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Kitami Institute of Technology

All 2021 2020 2019 2018 2017 2016 2015

All Journal Article Presentation

[Journal Article] Structural analysis of TaWN ternary alloy film applicable to Cu orientation control2021
- Author(s)
  M. B. Takeyama, M. Yasuda, and M. Sato
- Journal Title
  
  J. J. A. P.
  
  Volume: 60
- DOI
  10.35848/1347-4065/abebbd
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18K04223
[Journal Article] XRD and EBSD analysis of Cu film on randomly oriented ZrN x film as the underlying materials2020
- Author(s)
  Sato Masaru、Yasuda Mitsunobu、Takeyama Mayumi B.
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 59
- DOI
  10.35848/1347-4065/ab7f57
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17K06337
[Journal Article] Relationship between TiN films with different orientations and their barrier properties2018
- Author(s)
  Masaru Sato and Mayumi B. Takeyama
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 57
- NAID
  210000149379
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17K06337
[Journal Article] Relationship between TiN films with different orientations and their barrier properties2018
- Author(s)
  Masaru Sato and Mayumi B. Takeyama
- Journal Title
  
  J. Jpn. Appl. Phys
  
  Volume: 57
- NAID
  210000149379
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-15K05975
[Journal Article] Growth of 〈111〉-oriented Cu layer on thin TaWN films2017
- Author(s)
  Mayumi B. Takeyama and Masaru Sato
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 56 Issue: 7S2 Pages: 07KC03-07KC03
- DOI
  10.7567/jjap.56.07kc03
- NAID
  210000148102
- ISSN
  0021-4922, 1347-4065
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-15K05975
[Journal Article] Room-temperature deposition of HfN<i><sub>x</sub></i>barrier by radical-assisted surface reaction for through-silicon-via in three-dimensional LSI2016
- Author(s)
  M. Sato, M. B. Takeyama, A. Noya
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 55 Issue: 2S Pages: 02BC21-02BC21
- DOI
  10.7567/jjap.55.02bc21
- NAID
  210000146090
- ISSN
  0021-4922, 1347-4065
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-15K05975
[Journal Article] Low-temperature-deposited insulating films of silicon nitride by reactive sputtering and plasma-enhanced CVD: Comparison of characteristics2016
- Author(s)
  Masaru Sato, Mayumi B. Takeyama, Yoshihiro Nakata, Yasushi Kobayashi, Tomoji Nakamura, and Atsushi Noya
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 55
- NAID
  210000146285
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-15K05975
[Journal Article] Low-temperature-deposited insulating films of silicon nitride by reactive sputtering and plasma-enhanced CVD: Comparison of characteristics2016
- Author(s)
  M. Sato, M. B. Takeyama, Y. Nakata, Y. Kobayashi, T. Nakamura, A. Noya
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 55
- NAID
  210000146285
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] Barrier Properties of thin TaWN films in Cu(111)/TaWN/Si systems2020
- Author(s)
  M. B. Takeyama, M. Sato, and M. Yasuda
- Organizer
  The 2020 International Conference on Solid StateDevices and Materials (SSDM2020)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K04223
[Presentation] ZrN 膜上に成膜したCu(111)優先配向2020
- Author(s)
  佐藤　勝、安田　光伸、武山　真弓
- Organizer
  電子情報通信学会総合大会
- Data Source
  KAKENHI-PROJECT-17K06337
[Presentation] Cu(111)高配向制御が可能な極薄TaWNバリヤの構造解析2020
- Author(s)
  武山真弓，佐藤　勝，安田光伸
- Organizer
  応用物理学会秋季大会
- Data Source
  KAKENHI-PROJECT-18K04223
[Presentation] Cu(111)配向制御のための極薄バリヤの構造評価2020
- Author(s)
  武山真弓，佐藤　勝，安田光伸
- Organizer
  電子情報通信学会ソサイエティ大会
- Data Source
  KAKENHI-PROJECT-18K04223
[Presentation] 極薄バリヤ上のCu(111)配向メカニズム2020
- Author(s)
  武山真弓，安田光伸，佐藤勝
- Organizer
  電子情報通信学会　電子部品材料研究会(CPM)
- Data Source
  KAKENHI-PROJECT-18K04223
[Presentation] RFスパッタ法によって室温成膜されたZrNx 膜の特性2019
- Author(s)
  佐藤　勝、武山　真弓
- Organizer
  電子情報通信学会電子部品・材料研究会
- Data Source
  KAKENHI-PROJECT-17K06337
[Presentation] RFスパッタ法によるTi 膜の低温作製2019
- Author(s)
  佐藤　勝、武山　真弓
- Organizer
  電子情報通信学会ソサイエティ大会
- Data Source
  KAKENHI-PROJECT-17K06337
[Presentation] 反応性スパッタ法によって得られたZrN 膜上のCu(111)高配向化2019
- Author(s)
  佐藤　勝、武山　真弓
- Organizer
  電子情報通信学会電子部品・材料研究会
- Data Source
  KAKENHI-PROJECT-17K06337
[Presentation] Properties of barrierless Cu/ZrNx/Si structure deposited at room temperature2019
- Author(s)
  Masaru Sato and Mayumi B. Takeyama
- Organizer
  2019 International Conference on Solid State Devices and Materials
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06337
[Presentation] Cu(111) preferential orientation on ZrNx films2019
- Author(s)
  Masaru Sato and Mayumi B. Takeyama
- Organizer
  Advanced Metallization Conference 2019
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06337
[Presentation] 低温作製されたTiNx膜の特性2018
- Author(s)
  佐藤勝、武山真弓
- Organizer
  電子情報通信学会総合大会
- Data Source
  KAKENHI-PROJECT-17K06337
[Presentation] 反応性スパッタ法によるTiNx膜の低温作2017
- Author(s)
  佐藤勝、武山真弓
- Organizer
  電子情報通信学会電子部品・材料研究会
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] 低温作製されたTiNx 膜の特性2017
- Author(s)
  佐藤勝、武山真弓
- Organizer
  電子情報通信学会総合大会
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] Characterization of TiHfN ternary alloy films as a new barrier2017
- Author(s)
  Mayumi B. Takeyama and Masaru Sato
- Organizer
  2017 International Conference on Solid State Devices and Materials
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] 組成の違いによるTiHfN合金膜のキャラクタリゼーション2017
- Author(s)
  佐藤勝、武山真弓
- Organizer
  電気学会会　電子・情報・システム部門大会
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] Relation between TiN films with different texture and its barrier properties2017
- Author(s)
  Masaru Sato and Mayumi B. Takeyama
- Organizer
  Advanced Metallization Conference 2017: 27th Asian Session
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] 反応性スパッタ法によるTiNx膜の低温作製2017
- Author(s)
  佐藤勝、武山真弓
- Organizer
  電子情報通信学会電子部品・材料研究会
- Data Source
  KAKENHI-PROJECT-17K06337
[Presentation] 組成の違いによるTiHfN合金膜のキャラクタリゼーション2017
- Author(s)
  佐藤勝、武山真弓
- Organizer
  電気学会電子・情報・システム部門大会
- Data Source
  KAKENHI-PROJECT-17K06337
[Presentation] Relation between TiN films with different texture and its barrier properties2017
- Author(s)
  Masaru Sato and Mayumi B. Takeyama
- Organizer
  Advanced Metallization Conference 2017: 27th Asian Session
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06337
[Presentation] Characterization of TiHfN ternary alloy films as a new barrier2017
- Author(s)
  Mayumi B. Takeyama and Masaru Sato
- Organizer
  2017 International Conference on Solid State Devices and Materials
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K06337
[Presentation] 低温SiNx膜における表面ラジカル処理の効果2016
- Author(s)
  武山真弓、佐藤勝
- Organizer
  Cat-CVD研究会
- Place of Presentation
  北見工業大学（北海道北見市）
- Year and Date
  2016-07-08
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] Barrierproperties of TiHfN ternary alloy films against Cu diffusion in Cu/Si contact system2016
- Author(s)
  M. Sato, E. Aoyagi, and M. B. Takeyama
- Organizer
  Advanced Metallization Conference 2016: 26th Asian Session
- Place of Presentation
  東京大学（東京都）
- Year and Date
  2016-10-20
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] 薄いHfNx膜上のCu(111)面高配向成長2016
- Author(s)
  佐藤勝、青柳英二、武山真弓
- Organizer
  電子情報通信学会電子部品・材料研究会
- Place of Presentation
  愛媛大学（愛媛県松山市）
- Year and Date
  2016-07-22
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] The effect of the HfNx barrier thickness on the Cu grain orientation control2016
- Author(s)
  M. Sato, E. Aoyagi, and M. B. Takeyam
- Organizer
  2016 International Conference on Solid State Devices and Materials
- Place of Presentation
  Tsukuba International Congress Center(茨城県つくば市）
- Year and Date
  2016-09-26
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] 低温作製されたSiNx膜の安定性2016
- Author(s)
  武山真弓、佐藤勝
- Organizer
  電子情報通信学会電子部品・材料研究会
- Place of Presentation
  愛媛大学（愛媛県松山市）
- Year and Date
  2016-07-22
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] ナノ結晶HfNx膜上のCu膜の組織観察2016
- Author(s)
  佐藤　勝、武山真弓、青柳英二、野矢　厚
- Organizer
  電子情報通信学会総合大会
- Place of Presentation
  福岡県福岡市
- Year and Date
  2016-03-15
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] Cuプラグに適用可能なTiHfN合金膜のバリヤ特性2016
- Author(s)
  佐藤勝、青柳英二、野矢厚、武山真弓
- Organizer
  電子情報通信学会電子部品・材料研究会
- Place of Presentation
  金沢工業大学（石川県野々市市）
- Year and Date
  2016-11-18
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] 低温作製された窒化物薄膜の特性2016
- Author(s)
  武山真弓、佐藤　勝、小林靖志、中田義弘、中村友二、野矢　厚
- Organizer
  電子情報通信学会シリコン材料・デバイス研究会
- Place of Presentation
  東京都
- Year and Date
  2016-01-22
- Invited
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] ラジカル処理によって得られた薄いHfNx膜のバリヤ特性2016
- Author(s)
  佐藤勝、武山真弓
- Organizer
  Cat-CVD研究会
- Place of Presentation
  北見工業大学（北海道北見市）
- Year and Date
  2016-07-08
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] ラジカル処理を用いた低温TiNx膜の特性評価2016
- Author(s)
  佐藤　勝、武山真弓、野矢　厚
- Organizer
  電子情報通信学会シリコン材料・デバイス研究会
- Place of Presentation
  東京都
- Year and Date
  2016-01-22
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] 絶縁バリアとしてのSiNx膜の低温作製2015
- Author(s)
  武山真弓、佐藤　勝、小林靖志、中田義弘、中村友二、野矢　厚
- Organizer
  電子情報通信学会電子部品・材料研究会
- Place of Presentation
  青森県弘前市
- Year and Date
  2015-08-10
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] ラジカル処理によるHfNx膜の室温作製2015
- Author(s)
  佐藤　勝、武山真弓、野矢　厚
- Organizer
  電気・情報関係学会北海道支部連合大会
- Place of Presentation
  北海道北見市
- Year and Date
  2015-11-07
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] ラジカルを用いた表面窒化反応によるHfNx膜の低温作製2015
- Author(s)
  佐藤　勝、武山真弓、野矢　厚
- Organizer
  Cat-CVD研究会
- Place of Presentation
  愛知県名古屋市
- Year and Date
  2015-07-03
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] ラジカル反応を用いたHfNx膜の低温作製2015
- Author(s)
  佐藤　勝、武山真弓、野矢　厚
- Organizer
  電子情報通信学会電子部品・材料研究会
- Place of Presentation
  青森県弘前市
- Year and Date
  2015-08-10
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] 室温成膜したSiNx膜の特性評価2015
- Author(s)
  佐藤　勝、武山真弓、小林靖志、中田義弘、中村友二、野矢　厚
- Organizer
  電子情報通信学会電子部品・材料研究会
- Place of Presentation
  新潟県長岡市
- Year and Date
  2015-11-06
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] ラジカル窒化による遷移金属窒化物の有用性2015
- Author(s)
  武山真弓、佐藤　勝、青柳英二、野矢　厚
- Organizer
  電子情報通信学会電子部品・材料研究会
- Place of Presentation
  新潟県長岡市
- Year and Date
  2015-11-06
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] 室温堆積によるSiNx膜の特性評価2015
- Author(s)
  武山真弓、佐藤　勝、小林靖志、中田義弘、中村友二、野矢　厚
- Organizer
  Cat-CVD研究会
- Place of Presentation
  愛知県名古屋市
- Year and Date
  2015-07-03
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] Preparation of high performance SiNx films deposited by reactive sputtering and PECVD at low temperatures2015
- Author(s)
  M. Sato, M. B. Takeyama, Y. Nakata, Y. Kobayashi, t. Nakamura, A. Noya
- Organizer
  2015 International Conference on Solid State Devices and Materials
- Place of Presentation
  北海道札幌市
- Year and Date
  2015-09-27
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K05975
[Presentation] 窒化物薄膜の微細構造制御とラジカルを用いた低温での成膜方法2015
- Author(s)
  武山真弓、佐藤　勝、野矢　厚
- Organizer
  化学工学会
- Place of Presentation
  北海道札幌市
- Year and Date
  2015-09-09
- Invited
- Data Source
  KAKENHI-PROJECT-15K05975

1. Takeyama Mayumi B. (80236512)

# of Collaborated Projects: 4 results

# of Collaborated Products: 0 results
2. 野矢厚 (60133807)

# of Collaborated Projects: 1 results

# of Collaborated Products: 16 results
3. 武山真弓

# of Collaborated Projects: 0 results

# of Collaborated Products: 46 results

Sato Masaru 佐藤 勝

Research Projects

Research Products

Co-Researchers

極薄バリヤの構造解析における革新的解明とCu配線の配向制御

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

Orientation control applicable Cu interconnect on the cutting edge of 3D devices and 3D-LSI

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

Development of new barrier material of interfacial-layer-free for ultrafine TSVPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Low temperature deposition of barrierless insulating film applicable to 3D and 2.5 D-IC

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

[Journal Article] Structural analysis of TaWN ternary alloy film applicable to Cu orientation control2021

Author(s)

Journal Title

DOI

Data Source

[Journal Article] XRD and EBSD analysis of Cu film on randomly oriented ZrN x film as the underlying materials2020

Author(s)

Journal Title

DOI

Data Source

[Journal Article] Relationship between TiN films with different orientations and their barrier properties2018

Author(s)

Journal Title

NAID

Data Source

[Journal Article] Relationship between TiN films with different orientations and their barrier properties2018

Author(s)

Journal Title

NAID

Data Source

[Journal Article] Growth of 〈111〉-oriented Cu layer on thin TaWN films2017

Author(s)

Journal Title

DOI

NAID

ISSN

Data Source

[Journal Article] Room-temperature deposition of HfN<i><sub>x</sub></i>barrier by radical-assisted surface reaction for through-silicon-via in three-dimensional LSI2016

Author(s)

Journal Title

DOI

NAID

ISSN

Data Source

[Journal Article] Low-temperature-deposited insulating films of silicon nitride by reactive sputtering and plasma-enhanced CVD: Comparison of characteristics2016

Author(s)

Journal Title

NAID

Data Source

[Journal Article] Low-temperature-deposited insulating films of silicon nitride by reactive sputtering and plasma-enhanced CVD: Comparison of characteristics2016

Author(s)

Journal Title

NAID

Data Source

[Presentation] Barrier Properties of thin TaWN films in Cu(111)/TaWN/Si systems2020

Author(s)

Organizer

Data Source

[Presentation] ZrN 膜上に成膜したCu(111)優先配向2020

Author(s)

Organizer

Data Source

Sato Masaru 佐藤勝