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TOYABE Toru  鳥谷部 達

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TOYABE Tohru  鳥谷部 達

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Researcher Number 20266993
Other IDs
Affiliation (based on the past Project Information) *help 2006 – 2008: 東洋大学, 工学部, 教授
2002 – 2004: 東洋大学, 工学部, 教授
1996 – 1998: 東洋大学, 工学部, 教授
Review Section/Research Field
Principal Investigator
電子デバイス・機器工学
Except Principal Investigator
Inorganic materials/Physical properties / 電子デバイス・機器工学 / Structural/Functional materials
Keywords
Principal Investigator
SOIMOSFET / Field Dependent Mobility / Schroedinger Equation / Simulation / Quantum Effect / Fully Inverted Type / シュレーデインガー方程式 / 電界依存移動度 / シュレーディンガー方程式 / シミュレーション … More / 量子効果 / 完全反転型 / Critical charge / Random structure / Modeling / Circuit / Device / Coulomb blockade / 臨界電荷 / ランダム構造 / モデリング / 回路 / デバイス / クーロンブロッケード … More
Except Principal Investigator
SOI MOSFET / InSb / InAs / SIMOX基板 / hot luminescence / quantum dot / nanowires / luminescence spectroscopy / hot carrier / narrow-gap semiconductor / 微小ギャップ半導 / 量子細線 / 近接場ナノフォトニクス / ホットルミネッセンス / 量子ドット / ナノ細線 / 蛍光分光 / ホットキャリヤー / 微小ギャップ半導体 / short signal delay / high packing density / low power supply / top Si layer / threshold voltage / fully inverted / トップシリコン層 / 電子ビーム蒸着装置 / 完全反転臨界膜厚 / 高相互コンダクタンス / 低サブスレッショルド係数 / 低闘値電圧 / 完全反転型SOI MOSFET / シリコン超薄膜 / 伝達コンダクタンス特性 / サブヌレッショルド特性 / 臨界膜厚 / 2次元電子状態 / 高速デバイス / 短チャネル効果 / 低消費電力 / 上部Si層 / 閾値電圧 / 完全反転型 / サブスレッドショルド係数 / SOQ MOSFET / キャリア捕獲中心 / BOX(Buried Oxide) / SOQ基板 / SOI基板 / SOQ / SOI / MOSFET / 新機能材料 Less
  • Research Projects

    (5 results)
  • Research Products

    (22 results)
  • Co-Researchers

    (6 People)
  •  Exploration of feasible applications of SOQ wafers to various fields

    • Principal Investigator
      HANAJIRI Tatsuro
    • Project Period (FY)
      2006 – 2008
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      Structural/Functional materials
    • Research Institution
      Toyo University
  •  Spatial and temporal spectroscopy of the luminescence generated by hot carriers in narrow-gap-semiconductor quantum dots

    • Principal Investigator
      WADA Noboru
    • Project Period (FY)
      2002 – 2004
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Inorganic materials/Physical properties
    • Research Institution
      Toyo University
  •  Quantum Mechanical Simulation of Ultra Thin SOIMOSFETsPrincipal Investigator

    • Principal Investigator
      TOYABE Toru
    • Project Period (FY)
      2002 – 2003
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      電子デバイス・機器工学
    • Research Institution
      Toyo University
  •  A Study on fully inverted SIMOX MOSFETs

    • Principal Investigator
      SUGANO Takuo
    • Project Period (FY)
      1997 – 1998
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      電子デバイス・機器工学
    • Research Institution
      Toyo University
  •  Modeling of Coulomb blockade devices and circuits with random structuresPrincipal Investigator

    • Principal Investigator
      TOYABE Toru
    • Project Period (FY)
      1996 – 1997
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      電子デバイス・機器工学
    • Research Institution
      Toyo University

All 2009 2008 2007 2006

All Journal Article Presentation

  • [Journal Article] "Characterization of distribution of trap states in silicon-on-insulator layers by front-gate characteristics in n-channel SOI MOSFETs2008

    • Author(s)
      K.KAJIWARA, Y.NAKAJIMA, T. HANAJIRI, T.TOYABE, and T.SUGANO
    • Journal Title

      IEEE trans. Electron Devices 55

      Pages: 1702-1707

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Journal Article] Drive current enhancement in silicon on quartz MOSFETs2008

    • Author(s)
      Y. NAKAJIMA, K. SASAKI, T. HANAJIRI, T. TOYABE, T. SUGANO
    • Journal Title

      IEEE Electron Device Lett. 29

      Pages: 944-945

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Journal Article] Characterization of distribution of trap states in silicon-on-insulator layers by front-gate characteristics in n-channel SOI MOSFETs2008

    • Author(s)
      K. KAJIWARA, Y. NAKAJIMA, T. HANAJIRI. T. TOYABE, T. SUGANO
    • Journal Title

      IEEE trans. Electron Devices 55

      Pages: 1702-1707

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Journal Article] Drive current enhancement in silicon on quartz MOSFETs2008

    • Author(s)
      Y. NAKAJIMA, K. SASAKI, T. HANAJIRI, T. TOYABE, and T. SUGANO
    • Journal Title

      IEEE Electron Device Lett., 29

      Pages: 944-945

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Journal Article] SOI基盤における表面再結合速度の工学的測定による評価 (2)2007

    • Author(s)
      宮澤吉康, 中島義賢, 花尻達郎, 小室修二, 鳥谷部達
    • Journal Title

      応用物理学関係連合講演会講演予稿集 54

      Pages: 825-825

    • Data Source
      KAKENHI-PROJECT-18560679
  • [Journal Article] 空乏型SOI MOSFETの有用性(2)2006

    • Author(s)
      宮沢健司, 宮澤吉康, 中島義賢, 花尻達郎, 鳥谷部達
    • Journal Title

      応用物理学会学術講演会講演予稿集 67

      Pages: 798-798

    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] Suppression of DIBL in deca-nano SOI MOSFETs by controlling permittivity and thickness of BOX layers2009

    • Author(s)
      S. ABE, Y. MIYAZAWA, Y. NAKAJIMA, T. HANAJIRI, T. TOYABE, and T. SUGANO
    • Organizer
      Proc. of 10th International Conference on Ultimate Integration of Silicon
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] Suppression of DIBL in deca-nano SOI MOSFETs by controlling permittivity and thickness of BOX layers2009

    • Author(s)
      S. ABE, Y. MIYAZAWA, Y. NAKAJIMA, T. HANAJIRI, T. TOYABE, T. SUGANO
    • Organizer
      Proc. of 10th International Conference on Ultimate Integration of Silicon
    • Place of Presentation
      Aahen, Germany
    • Year and Date
      2009-03-18
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] Discussion of origins of high-density trap states in SIMOX wafers2009

    • Author(s)
      Y. NAKAJIMA, T. TODA, T. HANAJIRI, T. TOYABE, and T. SUGANO
    • Organizer
      Proc. of 10th International Conference on Ultimate Integration of Silicon
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] ゲート酸化膜のトラップがSOIMOSFETトンネル電流に与える影響の評価2009

    • Author(s)
      戸田貴大, 中島義賢, 花尻達郎, 鳥谷部達, 菅野卓雄
    • Organizer
      第56回応用物理学関係連合講演会
    • Place of Presentation
      筑波大学
    • Year and Date
      2009-03-30
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] Improvement of performance of Drain-Source-On-Insulator MOSFETs by using heavily doped-Si region between local BOX regions2009

    • Author(s)
      T. YAMADA, Y.MIYAZAWA, Y. NAKAJIMA, T. HANAJIRI, T. TOYABE, and T. SUGANO
    • Organizer
      Proc. of 10th International Conference on Ultimate Integration of Silicon
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] Discussion of origins of high-density trap states in SIMOX wafers2009

    • Author(s)
      Y. NAKAJIMA, T. TODA, T. HANAJIRI, T. TOYABE, T. SUGANO
    • Organizer
      Proc. of 10th International Conference on Ultimate Integration of Silicon
    • Place of Presentation
      Aahen, Germany
    • Year and Date
      2009-03-18
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] Improvement of performance of Drain-Source-On-Insulator MOSFETs by using heavily doped-Si region between local BOX regions2009

    • Author(s)
      T. YAMADA, Y. MIYAZAWA, Y. NAKAJIMA, T. HANAJIRI, T. TOYABE, T. SUGANO
    • Organizer
      Proc. of 10th International Conference on Ultimate Integration of Silicon
    • Place of Presentation
      Aahen, Germany
    • Year and Date
      2009-03-18
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] BOX比誘電率およびBOX膜厚制御によるDIBLの抑制効果2008

    • Author(s)
      阿部俊平、宮澤吉康、中島義賢、花尻達郎、鳥谷部達、菅野卓雄
    • Organizer
      第69回応用物理学会学術講演会予稿集
    • Place of Presentation
      中部大学
    • Year and Date
      2008-09-03
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] 選択的BOXを有するSOI MOSFETの有用性2008

    • Author(s)
      前川貴信、山田辰哉、宮澤吉康、中島義賢、花尻達郎、鳥谷部達、菅野卓雄
    • Organizer
      第54回応用物理学関係連合講演会講演予稿集
    • Place of Presentation
      日本大学理工学部
    • Year and Date
      2008-03-29
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] 局所BOX間高不純物ドーピングによるDSOI MOSFETの特性改善2008

    • Author(s)
      山田辰哉、宮澤吉康、中島義賢、花尻達郎、鳥谷部達、菅野卓雄
    • Organizer
      第69回応用物理学会学術講演会予稿集
    • Place of Presentation
      中部大学
    • Year and Date
      2008-09-03
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] SOI 基板における表面再結合速度の光学的測定による評価(2)2007

    • Author(s)
      宮澤吉康、中島義賢、花尻達郎、小室修二、鳥谷部達
    • Organizer
      第54回応用物理学関係連合講演会講演予稿集
    • Place of Presentation
      青山学院大学
    • Year and Date
      2007-03-28
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] Advantages of Depletion Type SOI MOSFETs", Abst. of symposium E (Nanodevices and Nanofabrication), 4th Int.2007

    • Author(s)
      K. MIYAZAWA, Y. MIYAZAWA, Y.NAKAJIMA, T.HANAJIRI and T.TOYABE
    • Organizer
      Conf. on Materials for Advanced Technologies 2007
    • Place of Presentation
      Convention Center, Singapore
    • Year and Date
      2007-03-03
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] "Advantages of Depletion Type SOI MOSFETs"2007

    • Author(s)
      K. MIYAZAWA, Y. MIYAZAWA, Y. NAKAJIMA, T. HANAJIRI and T. TOYABE
    • Organizer
      4th Int. Conf. on Materials for Advanced Technologies 2007
    • Place of Presentation
      Convention Center, Singapore
    • Year and Date
      2007-07-03
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] "Qantitative Estimation of Surface Recombination Velocity of SOI wafers by PL Decay Method2007

    • Author(s)
      Y.MIYAZAWA, Y.NAKAJIMA,T.HANAJIRI, S.KOMURO and T.TOYABE
    • Organizer
      Abst. of symposium E (Nanodevices and Nanofabrication), 4th Int. Conf
    • Place of Presentation
      Convention Center, Singapore
    • Year and Date
      2007-03-03
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] "Qantitative Estimation of Surface Recombination Velocity of SOI wafers by PL Decay Method"2007

    • Author(s)
      Y. MIYAZAWA, Y. NAKAJIMA, T. HANAJIRI, S. KOMURO and T. TOYABE
    • Organizer
      Abst. of symposium E(Nanodevices and Nanofabrication), 4th Int. Conf. on Materials for Advanced Technologies
    • Place of Presentation
      Convention Center, Singapore
    • Year and Date
      2007-07-03
    • Data Source
      KAKENHI-PROJECT-18560679
  • [Presentation] 空乏型SOI MOSFET の有用性(2)2006

    • Author(s)
      宮沢健司、宮澤吉康、中島義賢、花尻達郎、鳥谷部達
    • Organizer
      第67回応用物理学会学術講演会 講演予稿集
    • Place of Presentation
      立命館大学
    • Year and Date
      2006-08-31
    • Data Source
      KAKENHI-PROJECT-18560679
  • 1.  HANAJIRI Tatsuro (30266994)
    # of Collaborated Projects: 4 results
    # of Collaborated Products: 22 results
  • 2.  KASHIWAGI Kunihiro (30058094)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 3.  MORIKAWA Takitaro (80191013)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 4.  SUGANO Takuo (50010707)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 5.  WADA Noboru (40256772)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 6.  ISHIBASI Kouji (30211048)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results

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