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SUZUKI Toshimasa  鈴木 敏正

ORCIDConnect your ORCID iD *help
Researcher Number 30129142
Other IDs
External Links
Affiliation (based on the past Project Information) *help 1998 – 1999: 日本工業大学, 工学部, 教授
1992: Nippon Institute of Technology, Faculty of Engineering, Professor, 工学部, 助教授
1991 – 1992: 日本工業大学, 工学部, 助教授
Review Section/Research Field
Principal Investigator
Applied materials science/Crystal engineering / 電子材料工学
Keywords
Principal Investigator
Growth Mechanism / 成長メカニズム / 酸化物高温超伝導体 / Atomic Force Microscope / Sputtering Method / Ultrasmooth Substrate / Oxide High-Temperature Superconductors / 超平坦基板 / 原子間力顕微鏡 / スパッタリング法 … More / 超平坦基盤 / Scanning Tunneling Microscope(STM) / DC-SQUID / Josephson Junction / Critical Current / Thin Film / Oxide High-Temperature Superconductor / dcーSQUID / 微細加工 / 走査トンネル顕微鏡(STM) / dc-SQUID / ジョセフソン接合 / 臨界電流 / 薄膜 Less
  • Research Projects

    (2 results)
  •  Growth of High-Temperature Oxide Superconductor Thin Films on Ultrasmooth Substrates and Elucidation of Their Growth Mechanism.Principal Investigator

    • Principal Investigator
      SUZUKI Toshimasa
    • Project Period (FY)
      1998 – 1999
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      Applied materials science/Crystal engineering
    • Research Institution
      Nippon Institute of Technology
  •  Realization of Josephson junctions with electrically controlled critical current and its application to dc-SQUIDs.Principal Investigator

    • Principal Investigator
      SUZUKI Toshimasa
    • Project Period (FY)
      1991 – 1992
    • Research Category
      Grant-in-Aid for General Scientific Research (C)
    • Research Field
      電子材料工学
    • Research Institution
      Nippon Institute of Technology

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