Harada Tetsuo 原田哲男

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HARADA Tetsuo 原田哲男

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Researcher Number	30451636
Other IDs
Affiliation (Current)	2023: 兵庫県立大学, 高度産業科学技術研究所, 准教授
Affiliation (based on the past Project Information) *help	2019 – 2021: 兵庫県立大学, 高度産業科学技術研究所, 准教授 2010 – 2017: 兵庫県立大学, 高度産業科学技術研究所, 助教 2012: 兵庫県立大学, 高度産業科学技術研究所, 助授 2008: University of Hyogo, 高度産業科学技術研究所, 助教 2007: Tohoku University, 多元物質科学研究所, 研究支援者
Review Section/Research Field	Principal Investigator Thin film/Surface and interfacial physical properties / Basic Section 80040:Quantum beam science-related Except Principal Investigator Electron device/Electronic equipment / Quantum beam science / Basic Section 30020:Optical engineering and photon science-related
Keywords	Principal Investigator 応用光学 / 干渉計測 / 超薄膜 / X線 / 超精密計測 / EUV / 高次高調波 / コヒーレンス / コヒーレント回折イメージング / フォトレジスト … More / 軟Ｘ線共鳴散乱 / 軟Ｘ線共鳴反射率 / EUVリソグラフィー / 軟Ｘ線 / 共鳴軟Ｘ線散乱 / 共鳴軟Ｘ線反射率 / 軟Ｘ線CMOSカメラ … More Except Principal Investigator 極端紫外線リソグラフィ / レジスト / 半導体微細加工 / 感度 / EUVリソグラフィ / 微細プロセス技術 / 干渉露光 / 化学増幅系 / line edge roughness / 半導体 / 微細加工技術 / レジス / 干渉霞光 / EUVレジスト / 解像度 / LWR / アウトガス / 軟X線光電子分光 / 非化学増幅系レジスト / 化学増幅系レジスト / 金属レジスト / 高感度 / 軟Ｘ線吸収分光 / 光学定数 / 透過率 / 吸収係数 / フォトレジスト / 極端紫外線 / フィルター / 多層膜 / 反射率 / フォトダイオード / PMMA / 軟Ｘ線 / 軟X線 / 偏光 / 軟X線光学定数 / 多層膜ミラー / 超深度イメージング / ポリマーブレンド / 極紫外 Less

EUV Wavefront Synthesizer for Real-Time and Extended Depth-of-Focus Imaging
- Principal Investigator
  
  Toyoda Mitsunori
- Project Period (FY)
  2019 – 2021
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 30020:Optical engineering and photon science-related
- Research Institution
  Tokyo Polytechnic University
Spatial Distribution Analysis of Photo Resist Using Resonant Soft X-ray Reflectmetry and Scattering methodsPrincipal Investigator
- Principal Investigator
  
  Harada Tetsuo
- Project Period (FY)
  2019 – 2021
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 80040:Quantum beam science-related
- Research Institution
  University of Hyogo
Precise measurement of optical constants of thin films in soft X-ray region
- Principal Investigator
  
  Kinoshita Hiroo
- Project Period (FY)
  2015 – 2017
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Quantum beam science
- Research Institution
  University of Hyogo
Development of 1X nm EUV Resist with high sensitivity and Low LWR
- Principal Investigator
  
  Watanabe Takeo
- Project Period (FY)
  2013 – 2015
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Electron device/Electronic equipment
- Research Institution
  University of Hyogo
Resist pattern replication using EUV interference lithography for 20 nm and below
- Principal Investigator
  
  WATANABE Takeo
- Project Period (FY)
  2010 – 2012
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Electron device/Electronic equipment
- Research Institution
  University of Hyogo
Development of coherence diffraction imaging for high-harmonic-generation EUV sourcePrincipal Investigator
- Principal Investigator
  
  HARADA Tetsuo
- Project Period (FY)
  2010 – 2011
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Thin film/Surface and interfacial physical properties
- Research Institution
  University of Hyogo
Development of a new type common path interferometer for soft X-ray using a grazing angle beam splitter of a free standing membranePrincipal Investigator
- Principal Investigator
  
  HARADA Tetsuo
- Project Period (FY)
  2007 – 2008
- Research Category
  
  Grant-in-Aid for Young Scientists (Start-up)
- Research Field
  
  Thin film/Surface and interfacial physical properties
- Research Institution
  University of Hyogo
  Tohoku University

All 2021 2020 2019 2017 2016 2015 2014 2013 2012 2011 2010 2009 Other

All Journal Article Presentation

[Journal Article] Development of a high-power EUV irradiation tool in a hydrogen atmosphere2021
- Author(s)
  Harada Tetsuo、Yamakawa Shinji、Toyoda Mitsunori、Watanabe Takeo
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 60 Pages: 087005-087005
- DOI
  10.35848/1347-4065/ac15ef
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19K05314
[Journal Article] Fundamental research activities on EUV lithography at NewSUBARU synchrotron light facility2021
- Author(s)
  Watanabe Takeo、Harada T.、Yamakawa S.
- Journal Title
  
  SPIE Proc.
  
  Volume: 11908 Pages: 1190807-1190807
- DOI
  10.1117/12.2600896
- Data Source
  KAKENHI-PROJECT-19K12644
[Journal Article] Fundamental Evaluation of Resist on EUV Lithography at NewSUBARU Synchrotron Light Facility2021
- Author(s)
  Watanabe Takeo、Harada Tetsuo、Yamakawa Shinji
- Journal Title
  
  Journal of Photopolymer Science and Technology
  
  Volume: 34 Issue: 1 Pages: 49-53
- DOI
  10.2494/photopolymer.34.49
- NAID
  130008119687
- ISSN
  0914-9244, 1349-6336
- Language
  English
- Data Source
  KAKENHI-PROJECT-19K12644
[Journal Article] Removal of Surface Contamination by Atomic Hydrogen Annealing2020
- Author(s)
  Heya Akira、Harada Tetsuo、Niibe Masahito、Sumitomo Koji、Watanabe Takeo
- Journal Title
  
  Journal of Photopolymer Science and Technology
  
  Volume: 33 Issue: 4 Pages: 419-426
- DOI
  10.2494/photopolymer.33.419
- NAID
  130007867645
- ISSN
  0914-9244, 1349-6336
- Language
  English
- Data Source
  KAKENHI-PROJECT-19K12644
[Journal Article] Analysis of Chemical Contents Spatial Distribution in EUV Resist Using Resonant Soft X-ray Scattering Method2020
- Author(s)
  Tanaka Jun、Ishiguro Takuma、Harada Tetsuo、Watanabe Takeo
- Journal Title
  
  Journal of Photopolymer Science and Technology
  
  Volume: 33 Issue: 5 Pages: 491-498
- DOI
  10.2494/photopolymer.33.491
- NAID
  130007867617
- ISSN
  0914-9244, 1349-6336
- Language
  English
- Data Source
  KAKENHI-PROJECT-19K12644
[Journal Article] Resonant Soft X-ray Reflectivity for the Chemical Analysis in Thickness Direction of EUV Resist2019
- Author(s)
  Ishiguro Takuma、Tanaka Jun、Harada Tetsuo、Watanabe Takeo
- Journal Title
  
  Journal of Photopolymer Science and Technology
  
  Volume: 32 Issue: 2 Pages: 333-337
- DOI
  10.2494/photopolymer.32.333
- NAID
  130007744336
- ISSN
  0914-9244, 1349-6336
- Language
  English
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-19K12644
[Journal Article] Resonant Soft X-ray Scattering for the Stochastic Origin Analysis in EUV Resist2019
- Author(s)
  Tanaka Jun、Ishiguro Takuma、Harada Tetsuo、Watanabe Takeo
- Journal Title
  
  Journal of Photopolymer Science and Technology
  
  Volume: 32 Issue: 2 Pages: 327-331
- DOI
  10.2494/photopolymer.32.327
- NAID
  130007744334
- ISSN
  0914-9244, 1349-6336
- Language
  English
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-19K12644
[Journal Article] Energy- and spatial-resolved detection using a backside-illuminated CMOS sensor in the soft X-ray region2019
- Author(s)
  Harada Tetsuo、Teranishi Nobukazu、Watanabe Takeo、Zhou Quan、Yang Xiao、Bogaerts Jan、Wang Xinyang
- Journal Title
  
  Applied Physics Express
  
  Volume: 12 Issue: 8 Pages: 082012-082012
- DOI
  10.7567/1882-0786/ab32d2
- NAID
  210000156726
- ISSN
  1882-0778, 1882-0786
- Peer Reviewed / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K12644
[Journal Article] High-exposure-durability, high-quantum-efficiency (>90%) backside-illuminated soft-X-ray CMOS sensor2019
- Author(s)
  Harada Tetsuo、Teranishi Nobukazu、Watanabe Takeo、Zhou Quan、Bogaerts Jan、Wang Xinyang
- Journal Title
  
  Applied Physics Express
  
  Volume: 13 Issue: 1 Pages: 016502-016502
- DOI
  10.7567/1882-0786/ab5b5e
- NAID
  210000157655
- ISSN
  1882-0778, 1882-0786
- Peer Reviewed / Open Access / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K12644
[Journal Article] Absorption Coefficient Measurement Advanced Method of EUV Resist by Direct-Resist Coating on a Photodiode2017
- Author(s)
  S. Niihara, D. Mamezaki, M. Watanabe, T. Harada, and T. Watanabe
- Journal Title
  
  Journal of Photopolymer Science and Technology
  
  Volume: 30 Issue: 1 Pages: 87-92
- DOI
  10.2494/photopolymer.30.87
- NAID
  130005950331
- ISSN
  0914-9244, 1349-6336
- Language
  English
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-15H03592
[Journal Article] Actual defect observation results of an extreme ultraviolet blank mask by coherent diffraction imaging2016
- Author(s)
  Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita
- Journal Title
  
  Appl. Phys. Express
  
  Volume: 9 Pages: 35202-35202
- NAID
  210000137831
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-15H03592
[Journal Article] Phase Imaging Results of Phase Defect Using Micro Coherent EUV Scatterometry Microscope2016
- Author(s)
  Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita
- Journal Title
  
  J. Micro-Nanolith. Mem
  
  Volume: 15 Pages: 21007-21007
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-15H03592
[Journal Article] Development of a reflectometer for a large EUV mirror in NewSUBARU2015
- Author(s)
  Haruki Iguchi, Hiraku Hashimoto, Masaki Kuki, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  Proc. SPIE
  
  Volume: 9658 Pages: 965819-965819
- Open Access
- Data Source
  KAKENHI-PROJECT-15H03592
[Journal Article] Development of Transmission Grating for EUV Interference Lithography of 1X nm HP2015
- Author(s)
  Tsubasa Fukui, Hirohito Tanino, Yuki Fukuda, Takeo Watanabe, Hiroo Kinoshita and Tetsuo Harada
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 28 Pages: 525-529
- NAID
  130005101110
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Phase Imaging Results of Phase Defect Using Micro Coherent EUV Scatterometry Microscope2015
- Author(s)
  Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita
- Journal Title
  
  Proc. SPIE
  
  Volume: 9635
- Open Access
- Data Source
  KAKENHI-PROJECT-15H03592
[Journal Article] Development of High=Reflective W/Si-multilayer Diffraction Grating for the Analysis of Fluorine Materials2015
- Author(s)
  Makaski Kuki, Tomoyuki Uemura, Masato Yamaguchi, Testuo Harada, Takeo Watanabe, Yasuji Muramatsu and Hiroo Kinoshita
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 28 Pages: 530-536
- NAID
  130005101111
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Development of element technologies for EUVL2015
- Author(s)
  Hiroo Kinoshita, Takeo Watanabe and Tetsuo Harada
- Journal Title
  
  Adv. Opt. Techn
  
  Volume: 4(4) Pages: 319-331
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-15H03592
[Journal Article] (169)EUV Resist Chemical Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity　Achievement2014
- Author(s)
  Kazuya Emura, Takeo Watanabe, Masato Yamaguchi, Hirohito Tanino,Tsubasa Fukui, Daiju Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 27 Pages: 631-638
- Peer Reviewed / Acknowledgement Compliant / Open Access
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] EUV Resist Chemical Reaction Analysis using SR2013
- Author(s)
  Takeo Watanabe, Kazuya Emura, Daiji Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada and Hiroo Kinoshita
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 26 Pages: 635-642
- NAID
  130004465045
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Comparison of Resist Family Outgassing Characterization between EUV and EB2013
- Author(s)
  Isamu Takagi, Toshiya Takahashi, Norihiko Sugie, Kazuhiro Katayam, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichiro Inoue, Takeo Watanabe, Tetsuo Harada and Hiroo Kinoshita
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 26 Pages: 673-678
- NAID
  130004465050
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Development of Tool for Contamination Layer Thickness Measurement Using High Power Extreme Ultraviolet Light and in Situ Ellipsometer2013
- Author(s)
  Takeo Watanabe, Yukiko Kikuchi, Toshiya Takahashi, Kazuhiro Katayama, Isamu Takagi, Norihiko Sugie, Hiroyuki Tanaka, Eishi Shiobara, Soichi Inoue, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 52 Issue: 5R Pages: 056701-056701
- DOI
  10.7567/jjap.52.056701
- NAID
  210000142182
- ISSN
  0021-4922, 1347-4065
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25289106
[Journal Article] Comparison of Resist Outgassing Characterization between High Power EUV and EB2012
- Author(s)
  Norihiko Sugie, Toshiya Takahashi, Kazuhiro Katayama, Isamu Takagi, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 25 Pages: 617-624
- NAID
  130004833488
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Development of standalone coherent EUV scatterometry microscope with high-harmonic-generation EUV source2012
- Author(s)
  T.Harada, M.Nakasuji, Y.Nagata, T.Watanabe, H.Kinoshita
- Journal Title
  
  Proc.SPIE
  
  Volume: (Accepted)
- Data Source
  KAKENHI-PROJECT-22760029
[Journal Article] EUV リソグラフィ研究開発センターにおけるリソグラフィ開発2012
- Author(s)
  渡邊健夫、原田哲男、木下博雄
- Journal Title
  
  クリーンテクノロジー
  
  Volume: 22 Pages: 1-5
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet Mask Inspection and Metrology2012
- Author(s)
  Masato Nakasuji, Akifumi Tokimasa, Tetsuo Harada, Yutaka Nagata, Takeo Watanabe, Katsumi Midorikawa, Hiroo Kinoshita
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 52(in press)
- NAID
  210000140707
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22760029
[Journal Article] Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet2012
- Author(s)
  M.Nakasuji, A.Tokimasak, T.Harada, Y.Nagata, T.Watanabe, K.Midorikawa, H.Kinoshita
- Journal Title
  
  Jpn.J.Appl.Phys.
  
  Volume: (Accepted)
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22760029
[Journal Article] Chemical Reaction Analysis of EUV CA Resist using SR Absorption Spectroscopy2012
- Author(s)
  Takeo Watanabe, Yuichi Haruyama, Daiju Shiono, Kazuya Emura, Takuro Urayama, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 25 Pages: 569-574
- NAID
  130004833480
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU2011
- Author(s)
  Tetsuo Harada, Masato Nakasuji, Masaki Tada, Yutaka Nagata, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 50 Issue: 6S Pages: 06GB03-06GB03
- DOI
  10.1143/jjap.50.06gb03
- NAID
  210000070654
- ISSN
  0021-4922, 1347-4065
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22760029
[Journal Article] Imaging of EUV-Mask Patterns using the Coherent Scatterometry Microscope based on a Coherent Diffraction Imaging2011
- Author(s)
  Tetsuo Harada, Masato Nakasuji, Teruhiko, Kimura, Takeo Watanabe, Hiroo Kinoshita, Yutaka Nagata
- Journal Title
  
  J.Vac.Sci.Technol.B
  
  Volume: 29
- DOI
  10.1116/1.3657525
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22760029
[Journal Article] EUV Interference Lithography for 1X nm2011
- Author(s)
  Takuro Urayama, Takeo Watanabe, Yuya Yamaguchi, Naohiro Matsuda, Yasuyuki Fukushima, Takafumi Iguchi, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 23 Pages: 681-686
- NAID
  130004833387
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Development of interference lithography for 22 nm node and below2011
- Author(s)
  Yasuyuki Fukushima, Yuya Yamaguchi, Takafumi Iguchi, Takuro Urayama, Tetsuo Harada, Takeo Watanabe and Hiroo Kinoshita
- Journal Title
  
  Microelectric Engineering
  
  Volume: 88 Pages: 1944-1947
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] elationships between EUV resist outgassing and contamination deposition at Selete2011
- Author(s)
  Hiroaki Oizumi, Kazuyuki Matsumaro, Satoshi Nomura, Julius Joseph Santillan, Toshiro Itani, Takeo Watanabe, Naohiro Matsuda, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  Proc. SPIE
  
  Volume: 7969
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] The coherent EUV scatterometry microscope for actinic mask inspection and metrology2011
- Author(s)
  Tetsuo Harada, Masato Nakasuji, Teruhiko Kimura, Yutaka Nagata, Takeo Watanabe, Hiroo Kinoshita
- Journal Title
  
  Proc.SPIE
  
  Volume: 8081
- DOI
  10.1117/12.896576
- Data Source
  KAKENHI-PROJECT-22760029
[Journal Article] Transmission Grating Fabrication for Replicating Resist Patterns of 20 nm and Below2011
- Author(s)
  Yuya Yamaguchi, Yasuyuki Fukushima, Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 50
- NAID
  210000070661
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] In-situ Contamination Thickness Measurement by Novel Resist Evaluation System at NewSUBARU2011
- Author(s)
  Naohiro Matsuda, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita, Hiroaki Oizumi, and Toshiro Itani
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 50
- NAID
  210000070653
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] EUV interference lithography for 22 nm node and below2010
- Author(s)
  Yasuyuki Fukushima, Yuya Yamaguchi, Teruhiko Kimura, Takafumi Iguchi, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 23 Pages: 673-680
- NAID
  130004464851
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Fabrication process of EUV -IL transmission grating2010
- Author(s)
  Yuya Yamaguchi, Yakusyuki Fukushima, Takafumi Iguchi, Hiroo Kinoshita, Tetsuo Harada, and Takeo Watanabe
- Journal Title
  
  J. Photopolymer Sci. Technol.
  
  Volume: 23 Pages: 681-386
- NAID
  130004464852
- URL
  http://www.photoplolymer.org
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Journal Article] Development of Extreme Ulytaviolet Interference Lithography System2010
- Author(s)
  Y. Fukushima, Naqoki. Sakagami, Teruhiko Kimura, Yoshito Kamaji, Takafumi Iguchi, Y. Yamaguchi, Masaki Tada, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 49
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] 軟X線共鳴散乱法を用いたフォトレジスト評価手法の検討2020
- Author(s)
  田中淳、石黒巧真、原田哲男、渡邊健夫
- Organizer
  第33回日本放射光学会年会
- Data Source
  KAKENHI-PROJECT-19K12644
[Presentation] 軟Ｘ線領域において量子効率90%以上の性能を有する背面照射型CMOSイメージセンサの開発2020
- Author(s)
  原田哲男, 寺西信一, 渡邊健夫, Quan Zhou, Jan Bogaerts, and Xinyang Wang
- Organizer
  第33回日本放射光学会年会
- Data Source
  KAKENHI-PROJECT-19K12644
[Presentation] 軟Ｘ線共鳴反射率（・散乱）法によるフォトレジスト研究2020
- Author(s)
  原田哲男
- Organizer
  東北大学多元物質科学研究所高分子・ハイブリッド材料研究センター 2020 PHyM シンポジウム
- Invited
- Data Source
  KAKENHI-PROJECT-19K12644
[Presentation] Removal of Surface Contamination by Atomic Hydrogen Annealing2020
- Author(s)
  Heya Akira、Harada Tetsuo、Niibe Masahito、Sumitomo Koji、Watanabe Takeo
- Organizer
  The 37th International Conference of Photopolymer Science and Technology
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K12644
[Presentation] 軟Ｘ線共鳴散乱・反射率法による有機材料の構造解析2020
- Author(s)
  原田哲男、山川進二、渡邊健夫
- Organizer
  SPring-8産業利用報告会
- Invited
- Data Source
  KAKENHI-PROJECT-19K12644
[Presentation] 軟Ｘ線共鳴反射率法による単層レジストプロセス用フォトレジストの相分離構造評価2020
- Author(s)
  石黒巧真、田中淳、原田哲男、渡邊健夫
- Organizer
  第33回日本放射光学会年会
- Data Source
  KAKENHI-PROJECT-19K12644
[Presentation] Analysis of Chemical Contents Spatial Distribution in EUV Resist Using Resonant Soft X-ray Scattering Method2020
- Author(s)
  Tanaka Jun、Ishiguro Takuma、Harada Tetsuo、Watanabe Takeo
- Organizer
  The 37th International Conference of Photopolymer Science and Technology
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K12644
[Presentation] Resonant Soft X-ray Reflectivity for the Chemical Analysis in Thickness Direction of EUV Resist2019
- Author(s)
  6.Takuma Ishiguro, Jun Tanaka, Tetsuo Harada, and Takeo Watanabe
- Organizer
  ICPST36
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K12644
[Presentation] Resonant Soft X-ray Scattering for the Stochastic Origin Analysis in EUV Resist2019
- Author(s)
  7.Jun Tanaka, Takuma Ishiguro, Tetsuo Harada, and Takeo Watanabe
- Organizer
  ICPST36
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K12644
[Presentation] 大型反射率計によるEUV集光ミラーの評価2017
- Author(s)
  井口晴貴、橋本拓、原田哲男、渡邊健夫
- Organizer
  放射光学会年会
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] EUV反射率計用のワイドバンド多層膜偏光子の開発2017
- Author(s)
  渡辺雅紀、井口晴貴、原田哲男、渡邊健夫
- Organizer
  第30回日本放射光学会年会・放射光科学合同シンポジウム
- Place of Presentation
  神戸
- Year and Date
  2017-01-08
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] EUV反射率計用のMo/Siワイドバンド多層膜偏光子の開発,2017
- Author(s)
  渡辺雅紀、井口晴貴、原田哲男、渡邊健夫
- Organizer
  第64回応用物理学会春季学術講演会
- Place of Presentation
  横浜
- Year and Date
  2017-03-14
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] EUV反射率計用のMo/Siワイドバンド多層膜偏光子の開発,2017
- Author(s)
  渡辺雅紀、井口晴貴、原田哲男、渡邊健夫
- Organizer
  先端技術セミナー
- Place of Presentation
  姫路
- Year and Date
  2017-03-03
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] EUV反射率計用の垂直偏光制御機構の開発2017
- Author(s)
  原田哲男、井口晴貴、渡辺雅紀、渡邊健夫
- Organizer
  第30回日本放射光学会年会・放射光科学合同シンポジウム
- Place of Presentation
  神戸
- Year and Date
  2017-01-08
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] Absorption Coefficient Measurement Advanced Method of EUV Resist by Direct-Resist Coating on a Photodiode2017
- Author(s)
  Shota Niihara, Daiki Mamezaki, Masanori Watanabe, Tetsuo Harada, and Takeo Watanabe
- Organizer
  The 34th International Conference of Photopolymer Science and Technology (ICPST-34)
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] EUV反射率計用のワイドバンド多層膜偏光子の開発2017
- Author(s)
  渡辺雅紀、井口晴貴、原田哲男、渡邊健夫
- Organizer
  放射光学会年会
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] フォトダイオード直接塗布法による EUVレジストの高精度な吸収係数測定法2017
- Author(s)
  新原章汰、豆﨑大輝、渡辺雅紀、原田哲男、渡邊健夫
- Organizer
  第78回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] EUV反射率計用の垂直偏光制御機構の開発2017
- Author(s)
  原田哲男、井口晴貴、渡辺雅紀、渡邊健夫
- Organizer
  放射光学会年会
- Data Source
  KAKENHI-PROJECT-15H03592
[Presentation] Development of Transmission Grating for EUV Interference Lithography of 1X nm HP2015
- Author(s)
  Tsubasa Fukui, Hirohito Tanino, Yuki Fukuda, Takeo Watanabe, Hiroo Kinoshita and Tetsuo Harada
- Organizer
  The 32nd International Conference of Photopolymer Science and Technology
- Place of Presentation
  幕張メッセ（千葉県千葉市美浜区）
- Year and Date
  2015-06-24
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 1X nm HPレジスト評価用EUV二光束干渉露光系の透過型回折格子の製作2015
- Author(s)
  福田裕貴、福井　翼、谷野寛仁、九鬼真輝、渡邊健夫、木下博雄、原田哲男
- Organizer
  NGLワークショップ2015
- Place of Presentation
  東京工業大学蔵前館（東京都目黒区）
- Year and Date
  2015-07-06
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 12.5 nm HPレジスト評価用EUV二光束干渉露光系の透過型回折格子の製作2015
- Author(s)
  福田裕貴, 福井翼、谷野寛仁, 原田哲男, 渡邊健夫
- Organizer
  第76回応用物理学会学術講演会
- Place of Presentation
  名古屋国際会議場（愛知県名古屋市熱田区）
- Year and Date
  2015-09-13
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 軟Ｘ線吸収分光法を用いたEUV用PHS系化学増幅系レジストの反応解析2015
- Author(s)
  山口都太、石井暁大、渡邊健夫、九鬼正樹、原田哲男
- Organizer
  第１回放射光産業利用支援講座
- Place of Presentation
  姫路駅前じばさんびる（兵庫県姫路市）
- Year and Date
  2015-10-16
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Development of High=Reflective W/Si-multilayer Diffraction Grating for the Analysis of Fluorine Materials2015
- Author(s)
  Makaski Kuki, Tomoyuki Uemura, Masato Yamaguchi, Testuo Harada, Takeo Watanabe, Yasuji Muramatsu and Hiroo Kinoshita
- Organizer
  The 32nd International Conference of Photopolymer Science and Technology
- Place of Presentation
  幕張メッセ（千葉県千葉市美浜区）
- Year and Date
  2015-06-24
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Contribution of EUV resist components to the noncleanable contaminations2014
- Author(s)
  Eishi Shiobara, Toshiya Takahashi, Norihiko Sugie, Yukiko Kikuchi, Isamu Takagi, Kazuhiro Katayama, Hiroyuki Tanaka, Soichi Inoue, Tetsuro Harada, Takeo Watanabe, and Hiroo Kinoshita
- Organizer
  SPIE Advanced Lithography 2014
- Place of Presentation
  San Jose, California, USA
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Chemical Reaction Analysis by SR Absorption Spectroscopy to Increase the Acid Generation Efficiency of EUV CA Resist2013
- Author(s)
  Takeo Watanabe, Kazuya Emura, Daiju Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  2013 Internationa Symposium on Extreme Ultraviolet Lithography
- Place of Presentation
  富山国際会議場（富山県富山市））
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Recent Activities of the Actinic Mask Inspection using the EUV Microscope at Center for EUVL2013
- Author(s)
  Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  2013 International Workshop on EUV Lithography
- Place of Presentation
  Maui, Hawaii, USA
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Resist outgassing characterization of PAG-blended and PAG-bound systems2013
- Author(s)
  Kazuhiro Katayama, Toshiya Takahashi, Norihiko Sugie, Isamu Takagi, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita
- Organizer
  2013 Internationa Symposium on Extreme Ultraviolet Lithography
- Place of Presentation
  富山国際会議場（富山県富山市）
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] EUV Resist Chemical Reaction Analysis using SR2013
- Author(s)
  Takeo Watanabe, Kazuya Emura, Daiji Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada and Hiroo Kinoshita
- Organizer
  The 30th International Conference of Photopolymer Science and Technology
- Place of Presentation
  千葉大学西千葉キャンパス（千葉県千葉市稲毛区）
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Comparison of Resist Family Outgassing Characterization2013
- Author(s)
  Isamu Takagi, Toshiya Takahashi, Kazuhiro Katayama, Norihiko Sugie, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  The 30th International Conference of Photopolymer Science and Technology
- Place of Presentation
  千葉大学西千葉キャンパス（千葉県千葉市稲毛区）
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Study of the relation between Resist components and outgassing contamination species2013
- Author(s)
  Yukiko Kikuchi, Toshiya Takahashi, Norihiko Sugie, Isamu Takagi, Kazuhiro Katayama, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshit
- Organizer
  2013 Internationa Symposium on Extreme Ultraviolet Lithography
- Place of Presentation
  富山国際会議場（富山県富山市）
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] Recent Activities of the EUV Resist Research and Development at Center for EUVL2013
- Author(s)
  Takeo Watanabe, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  2013 International Workshop on EUV Lithography
- Place of Presentation
  Maui, Hawaii, USA
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] EUVL 研究開発センターにおけるEUV レジストの開発(基調講演)、アドバンスト・テクノロジー・プログラム(ATP)、新材料開発最前線、微細パターン化技術2012
- Author(s)
  渡邊健夫、原田哲男、木下博雄
- Organizer
  日本化学会第93春季年会(2013)
- Place of Presentation
  立命館大学びわこ・くさつキャンパス
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUVマスク検査のための高次高調波コヒーレントスキャトロメトリー顕微鏡の開発2012
- Author(s)
  中筋正人, 原田哲男, 永田豊, 時政明史, 渡邊健夫, 緑川克美, 木下博雄
- Organizer
  第25回放射光学会年会放射光科学合同シンポジウム
- Place of Presentation
  鳥栖市(佐賀県)
- Year and Date
  2012-01-09
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] Recent Activities on EUVL in NewSUBARU (Invited talk)2012
- Author(s)
  Hiroo Kinoshia, Takeo Watanabe, and Tetsuo Harada
- Organizer
  24th Microprocesses and Nanotechnology Conference
- Place of Presentation
  Kobe Meriken Park Oriental Hotel, Kobe, Hyogo, Japan
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] Contamination Evaluation Tool by an In-situ Spectroscopic Ellipsometer with an Exposure of High Power EUV (Invited talk)2012
- Author(s)
  Takeo Watanabe, Masaki Tada, Yukiko Kikuchi, Toshiya Takahashi, Kazuhiro Katayama, Norihiko Sugie, Isamu Takagi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  Technical Working Group of EUV Resist Outgassing
- Place of Presentation
  Brussels Convention Center, Brussels, Belgium
- Year and Date
  2012-09-30
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] EUVマスク検査のための高次高調波コヒーレントスキャトロメトリー顕微鏡の開発2012
- Author(s)
  中筋正人, 時政明史, 原田哲男, 永田豊, 渡邊健夫, 緑川克美, 木下博雄
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  早稲田大学(東京都)
- Year and Date
  2012-03-18
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] Development of Standalone Coherent EUV Scatterometry Microscope with High-Harmonic-Generation EUV Source2012
- Author(s)
  Tetsuo Harada, Masato Nakasuji, Takeo Watanabe, Hiroo Kinoshita
- Organizer
  Photo Mask Japan 2012
- Place of Presentation
  (Yokohama, Japan)(招待講演)
- Year and Date
  2012-04-19
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] 極端紫外線リソグラフィ技術開発の現状と今後の展望(招待講演)2012
- Author(s)
  渡邊健夫、原田哲男、木下博雄
- Organizer
  リソグラフィセミナー(I)、セミフォーラムジャパン2012
- Place of Presentation
  グランキューブ大阪(大阪市)
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] コヒーレントスキャトロメトリー顕微鏡によるEUVマスク上のプログラム欠陥観察結果2011
- Author(s)
  中筋正人, 木村瑛彦, 多田将樹, 原田哲男, 渡邊健夫, 木下博雄
- Organizer
  第58回応用物理学関係連合講演会
- Place of Presentation
  (講演予稿集のみ)
- Year and Date
  2011-03-24
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] コヒーレントスキャトロメトリー顕微鏡によるタイコグラフィーでのEUVマスクパタン増再生2011
- Author(s)
  原田哲男, 中筋正人, 木村瑛彦, 渡邊健夫, 木下博雄
- Organizer
  第24回日本放射光学会年会・放射光科学合同シンポジウム
- Place of Presentation
  つくば国際会議場
- Year and Date
  2011-01-09
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] コヒーレントスキャトロメトリー顕微鏡によるEUVマスク検査2011
- Author(s)
  原田哲男, 中筋正人, 渡邊健夫, 永田豊, 木下博雄
- Organizer
  第11回X線結像光学シンポジウム
- Place of Presentation
  東北大学(宮城県)(招待講演)
- Year and Date
  2011-11-04
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] EUV リソグラフィ-研究開発センターにおけるリソグラフィー開発(招待講演)、アドバンスト・テクノロジー・プログラム(ATP)2011
- Author(s)
  渡邊健夫、原田哲男、木下博雄
- Organizer
  次世代リソグラフィ、日本化学会第91 春季年会
- Place of Presentation
  神奈川大学(神奈川)
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] タイコグラフィーにおける像再生条件の最適化2011
- Author(s)
  木村瑛彦, 中筋正人, 原田哲男, 渡邊健夫, 木下博雄
- Organizer
  第24回日本放射光学会年会・放射光科学合同シンポジウム
- Place of Presentation
  つくば国際会議場
- Year and Date
  2011-01-10
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet2011
- Author(s)
  M.Nakasuji, A.Tokimasak, T.Harada, Y.Nagata, T.Watanabe, K.Midorikawa, H.Kinoshita
- Organizer
  MNC2011
- Place of Presentation
  Kyoto (Japan)
- Year and Date
  2011-10-26
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] EUV Interference Lithography for 1X nm2011
- Author(s)
  Takuro Urayama, Takeo Watanabe, Yuya Yamaguchi, Naohiro Matsuda, Yasuyuki Fukushima, Takafumi Iguchi, Tetsuo Harada, and Hiroo Kinoshita
- Organizer
  The 28th International Conference ofPhotopolymer Science and Technology
- Place of Presentation
  Chiba Univ., Japan
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] Imaging of EUV-Mask Patterns using the Coherent Scatterometry Microscope based on a Coherent Diffraction Imaging2011
- Author(s)
  T.Harada, M.Nakasuji, T.Kimura, T.Watanabe, H.Kinoshita, Y.Nagata
- Organizer
  55^<th> EIPBN
- Place of Presentation
  Las Vegas (USA)
- Year and Date
  2011-05-31
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] コヒーレントスキャトロメトリー顕微鏡によるCD評価2011
- Author(s)
  中筋正人, 多田将樹, 原田哲男, 渡邊健夫,木下博雄
- Organizer
  第24回日本放射光学会年会・放射光科学合同シンポジウム
- Place of Presentation
  つくば国際会議場
- Year and Date
  2011-01-10
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] コヒーレントスキャトロメトリー顕微鏡によるEUVマスク検査2011
- Author(s)
  原田哲男, 中筋正人, 渡邊健夫, 永田豊, 木下博雄
- Organizer
  第11回X線結像光学シンポジウム
- Place of Presentation
  (東北大学)(招待講演)
- Year and Date
  2011-11-04
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] EUV Interference Lithography for 1X nm2011
- Author(s)
  Takeo Watanabe, Yuya Yamaguchi, Takuro Urayama, Naohiro Matsuda, Tetsu Harada and Hiroo Kinosita
- Organizer
  2011 International Workshop on EUV Lithography
- Place of Presentation
  Makena Beach and Golf Resort, Maui, Hawaii, USA
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] X線回折顕微法によるEUVマスク像再生アルゴリズムの検討2010
- Author(s)
  木村瑛彦, 原田哲男, 渡邊健夫, 木下博雄
- Organizer
  2010年度精密工学会秋季大会学術講演会
- Place of Presentation
  名古屋大学
- Year and Date
  2010-09-27
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] Fabrication process of EUV-IL transmission grating2010
- Author(s)
  Yuya Yamaguchi, Yakusyuki Fukushima, Takafumi Iguchi, Hiroo Kinoshita, Tetsuo Harada, and Takeo Watanabe
- Organizer
  The 27th International Conference of Photopolymer Science and Technology
- Place of Presentation
  Chiba Univ., Japan
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] コヒーレントスキャトロメトリー顕微鏡によるEUVマスク上のプログラム欠陥観察結果2010
- Author(s)
  中筋正人, 多田将樹, 原田哲男, 渡邊健夫, 木下博雄
- Organizer
  第71回応用物理学会学術講演会
- Place of Presentation
  長崎大学
- Year and Date
  2010-09-14
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] コヒーレントスキャトロメトリー顕微鏡によるCD評価2010
- Author(s)
  原田哲男, 中筋正人, 多田将樹, 渡邊健夫, 木下博雄
- Organizer
  第71回応用物理学会学術講演会
- Place of Presentation
  長崎大学
- Year and Date
  2010-09-14
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] Critical Dimension Evaluation of an EUV Mask utilizing the Coherent EUV Scatterometry Microscope2010
- Author(s)
  Tetsuo Harada, Masato Nakasuji, Masaki Tada, Takeo Watanabe, Hiroo Kinoshita
- Organizer
  MNC2010
- Place of Presentation
  小倉
- Year and Date
  2010-11-10
- Data Source
  KAKENHI-PROJECT-22760029
[Presentation] EUV interference lithography for 22 nm node and below2010
- Author(s)
  Yasuyuki Fukushima, Yuya Yamaguchi, Teruhiko Kimura, Takafumi Iguchi, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
- Organizer
  The 27th International Conference of Photopolymer Science and Technology
- Place of Presentation
  Chiba Univ., Japan
- Data Source
  KAKENHI-PROJECT-22360146
[Presentation] 新型軟X線用コモンパス干渉計の開発2009
- Author(s)
  原田哲男
- Organizer
  第56回応用物理学関係連合講演会
- Place of Presentation
  筑波大学
- Year and Date
  2009-03-30
- Data Source
  KAKENHI-PROJECT-19860006
[Presentation] 非化学増幅系EUVレジストの低温現像による解像性能向上
- Author(s)
  山口太都，江村和也，福井翼，谷野寛仁，原田哲男，渡邊健夫，木下博雄，星野亮一
- Organizer
  NGLワークショップ2014
- Place of Presentation
  東京工業大学蔵前ホール　東京都目黒区大岡山２丁目１２－１
- Year and Date
  2014-07-17 – 2014-07-18
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 10 nm 級 EUV 干渉露光用透過型回折格子の製作
- Author(s)
  福井　翼，谷野寛仁，福田裕貴，原田哲男，渡邊健夫，木下博雄
- Organizer
  第75回応用物理学会学術講演会
- Place of Presentation
  北海道大学札幌キャンパス　北海道札幌市北区北８条西５丁目
- Year and Date
  2014-09-17 – 2014-09-20
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] EUV Resist Chemical Reaction Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity Achievement
- Author(s)
  Kazuya Emura, Takeo Watanabe, Daiju Shiono, Masato Yamaguchi, Hirohito Tanino, TsubasaFukui, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada,and Hiroo Kinoshita
- Organizer
  The 31st International Conference of Photopolymer Science and Technology
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2014-07-08 – 2014-07-11
- Data Source
  KAKENHI-PROJECT-25289106
[Presentation] 脱保護反応に起因した膜減量評価による化学増幅系EUV用レジストの反応解析
- Author(s)
  江村和也，渡邊健夫，山口太都，谷野寛仁，福井翼，塩野大寿，春山雄一，村松康司，大森克実，佐藤和史，原田哲男，木下博雄
- Organizer
  NGLワークショップ2014
- Place of Presentation
  東京工業大学蔵前ホール　東京都目黒区大岡山２丁目１２－１
- Year and Date
  2014-07-17 – 2014-07-18
- Data Source
  KAKENHI-PROJECT-25289106

1. WATANABE Takeo (70285336)

# of Collaborated Projects: 4 results

# of Collaborated Products: 55 results
2. KINOSHITA Hiroo (50285334)

# of Collaborated Projects: 3 results

# of Collaborated Products: 43 results
3. MURAMATSU Yasuji (50343918)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
4. Toyoda Mitsunori (40375168)

# of Collaborated Projects: 1 results

# of Collaborated Products: 1 results
5. SHIONO Daiju

# of Collaborated Projects: 1 results

# of Collaborated Products: 1 results
6. MUTO Masao

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
7. TSUNO Katsushige

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results

Harada Tetsuo 原田 哲男

HARADA Tetsuo 原田 哲男

Research Projects

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Co-Researchers

EUV Wavefront Synthesizer for Real-Time and Extended Depth-of-Focus Imaging

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Spatial Distribution Analysis of Photo Resist Using Resonant Soft X-ray Reflectmetry and Scattering methodsPrincipal Investigator

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Precise measurement of optical constants of thin films in soft X-ray region

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Development of 1X nm EUV Resist with high sensitivity and Low LWR

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Resist pattern replication using EUV interference lithography for 20 nm and below

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Development of coherence diffraction imaging for high-harmonic-generation EUV sourcePrincipal Investigator

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Development of a new type common path interferometer for soft X-ray using a grazing angle beam splitter of a free standing membranePrincipal Investigator

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[Journal Article] Development of a high-power EUV irradiation tool in a hydrogen atmosphere2021

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[Journal Article] Fundamental research activities on EUV lithography at NewSUBARU synchrotron light facility2021

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[Journal Article] Fundamental Evaluation of Resist on EUV Lithography at NewSUBARU Synchrotron Light Facility2021

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[Journal Article] Removal of Surface Contamination by Atomic Hydrogen Annealing2020

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[Journal Article] Analysis of Chemical Contents Spatial Distribution in EUV Resist Using Resonant Soft X-ray Scattering Method2020

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Harada Tetsuo 原田哲男

HARADA Tetsuo 原田哲男

[Journal Article] High-exposure-durability, high-quantum-efficiency (>90%) backside-illuminated soft-X-ray CMOS sensor2019