Kasashima Yuji 笠嶋悠司

Researcher Number	40581202
Affiliation (Current)	2026: 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 主任研究員
Affiliation (based on the past Project Information) *help	2017 – 2018: 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 主任研究員 2015 – 2016: 国立研究開発法人産業技術総合研究所, 製造技術研究部門, 主任研究員 2014: 独立行政法人産業技術総合研究所, 製造技術研究部門, 主任研究員
Review Section/Research Field	Principal Investigator Plasma science / Plasma electronics
Keywords	Principal Investigator 微粒子 / パーティクル / プラズマエッチング / プラズマ・核融合 / プラズマ加工 / エッチング / インピーダンス / プラズマインピーダンス / 電場応力 / 剥離パーティクル

Research Projects
(2 results)
Research Products
(18 results)

monitoring of change in plasma impedance caused by particlePrincipal Investigator
- Principal Investigator
  
  Kasashima Yuji
- Project Period (FY)
  2016 – 2018
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Plasma science
- Research Institution
  National Institute of Advanced Industrial Science and Technology
Investigation of the mechanism of flaked particle generated in plasma etchingPrincipal Investigator
- Principal Investigator
  
  Kasashima Yuji
- Project Period (FY)
  2014 – 2015
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Plasma electronics
- Research Institution
  National Institute of Advanced Industrial Science and Technology

All 2018 2016 2015 2014

All Journal Article Presentation

[Journal Article] Easy-to-use detection method for micro-arc discharge in plasma etching equipment by measuring current flowing to ground2018
- Author(s)
  Kasashima Yuji
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 57 Issue: 9 Pages: 098002-098002
- DOI
  10.7567/jjap.57.098002
- NAID
  210000149648
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K21676
[Journal Article] Development of monitoring method for deposited film causing particles in mass-production plasma etching process using a load impedance monitoring system2016
- Author(s)
  Yuji Kasashima, Fumihiko Uesugi
- Journal Title
  
  Proceedings of International Symposium on Semiconductor Manufacturing 2016
  
  Volume: －
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-16K21676
[Journal Article] Increase in Size of Flaked Particles Suddenly Generated by Impulsive Force in Mass-production Plasma Etching Equipment2016
- Author(s)
  Yuji Kasashima, Fumihiko Uesugi
- Journal Title
  
  Journal of the Vacuum Society of Japan
  
  Volume: 59 Issue: 12 Pages: 360-363
- DOI
  10.3131/jvsj2.59.360
- NAID
  130005435563
- ISSN
  1882-2398, 1882-4749
- Language
  English
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-16K21676
[Journal Article] Instantaneous generation of many flaked particles caused by micro-arc discharge and detection method using load impedance monitoring system2015
- Author(s)
  Yuji Kasashima, Taisei Motomura, Fumihiko Uesugi
- Journal Title
  
  Proceedings of eMDC symposium & ISSM 2015
  
  Volume: -
- Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-26870903
[Journal Article] Many flaked particles generated by electric field stress working as an impulsive force in mass-production plasma etching equipment2015
- Author(s)
  Yuji Kasashima, Fumihiko Uesugi
- Journal Title
  
  Proceedings of ICRP-9/SPP-33/GEC-68
  
  Volume: -
- Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-26870903
[Journal Article] Impulsive force phenomenon of electric field stress causing serious particle contamination in plasma etching equipment2014
- Author(s)
  Yuji Kasashima, Fumihiko Uesugi
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 53 Issue: 11 Pages: 110308-110308
- DOI
  10.7567/jjap.53.110308
- NAID
  210000144551
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-26870903
[Presentation] 半導体量産装置用プラズマプロセスモニタリング手法の開発2018
- Author(s)
  笠嶋悠司
- Organizer
  最先端プラズマプロセスワークショップ
- Data Source
  KAKENHI-PROJECT-16K21676
[Presentation] プラズマエッチングプロセスにおけるパーティクル検出手法の開発2018
- Author(s)
  笠嶋悠司
- Organizer
  一般社団法人エレクトロニクス実装学会官能検査システム化研究会第10回公開研究会
- Data Source
  KAKENHI-PROJECT-16K21676
[Presentation] 負荷インピーダンス測定手法によるプラズマエッチングチャンバー内壁の監視2016
- Author(s)
  笠嶋悠司、上杉文彦
- Organizer
  第63回応用物理学会春季学術講演会
- Place of Presentation
  東工大大岡山キャンパス（東京都目黒区）
- Year and Date
  2016-03-19
- Data Source
  KAKENHI-PROJECT-26870903
[Presentation] プラズマエッチング装置におけるチャンバー内壁上の堆積膜の監視2016
- Author(s)
  笠嶋悠司、上杉文彦
- Organizer
  第77回応用物理学会秋季学術講演会
- Place of Presentation
  朱鷺メッセ（新潟県新潟市）
- Year and Date
  2016-09-15
- Data Source
  KAKENHI-PROJECT-16K21676
[Presentation] Development of monitoring method for deposited film causing particles in mass-production plasma etching process using a load impedance monitoring system2016
- Author(s)
  笠嶋悠司、上杉文彦
- Organizer
  International Symposium on Semiconductor Manufacturing (ISSM) 2016
- Place of Presentation
  KFC Hall（東京都墨田区）
- Year and Date
  2016-12-13
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K21676
[Presentation] Many flaked particles generated by electric field stress working as an impulsive force i n mass-production plasma etching equipment2015
- Author(s)
  笠嶋悠司、上杉文彦
- Organizer
  GEC68/ICRP9/SPP33
- Place of Presentation
  Hawaii Convention Center（ハワイ、アメリカ）
- Year and Date
  2015-10-13
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26870903
[Presentation] 負荷インピーダンス測定システムによるプラズマエッチング中の異常放電の検出2015
- Author(s)
  笠嶋悠司、上杉文彦
- Organizer
  第76回応用物理学会秋季学術講演会
- Place of Presentation
  名古屋国際会議場（愛知県名古屋市）
- Year and Date
  2015-09-15
- Data Source
  KAKENHI-PROJECT-26870903
[Presentation] プラズマエッチング中の剥離パーティクルの突発的多量発生2015
- Author(s)
  笠嶋悠司, 本村大成, 上杉文彦
- Organizer
  第62回応用物理学会春季学術講演会
- Place of Presentation
  東海大学湘南キャンパス（平塚市）
- Year and Date
  2015-03-14
- Data Source
  KAKENHI-PROJECT-26870903
[Presentation] Instantaneous generation of many flaked particles caused by micro-arc discharge and detection method using load impedance2015
- Author(s)
  笠嶋悠司、上杉文彦
- Organizer
  ISSM戦略フォーラム
- Place of Presentation
  東京ビッグサイト（東京都江東区）
- Year and Date
  2015-12-16
- Data Source
  KAKENHI-PROJECT-26870903
[Presentation] Instantaneous generation of many flaked particles caused by micro-arc discharge and detection method using load impedance2015
- Author(s)
  笠嶋悠司、本村大成、上杉文彦
- Organizer
  e-Manufacturing Design Collaboration Symposium 2015
- Place of Presentation
  Taipei World Trade Center（台湾）
- Year and Date
  2015-09-03
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26870903
[Presentation] Instantaneous generation of many flaked particles in mass-production plasma etching equi pment2015
- Author(s)
  笠嶋悠司、本村大成、上杉文彦
- Organizer
  AVS62nd
- Place of Presentation
  San Jose Convention Center（カリフォルニア、アメリカ）
- Year and Date
  2015-10-22
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26870903
[Presentation] 量産用プラズマエッチング装置における異常放電による剥離パーティクルの多量発生2014
- Author(s)
  笠嶋悠司, 本村大成, 上杉文彦
- Organizer
  第75 回応用物理学会秋季学術講演会
- Place of Presentation
  北海道大学札幌キャンパス（札幌市）
- Year and Date
  2014-09-19
- Data Source
  KAKENHI-PROJECT-26870903

Kasashima Yuji 笠嶋 悠司

Research Projects

Research Products

monitoring of change in plasma impedance caused by particlePrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Investigation of the mechanism of flaked particle generated in plasma etchingPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

[Journal Article] Easy-to-use detection method for micro-arc discharge in plasma etching equipment by measuring current flowing to ground2018

Author(s)

Journal Title

DOI

NAID

Data Source

[Journal Article] Development of monitoring method for deposited film causing particles in mass-production plasma etching process using a load impedance monitoring system2016

Author(s)

Journal Title

Data Source

[Journal Article] Increase in Size of Flaked Particles Suddenly Generated by Impulsive Force in Mass-production Plasma Etching Equipment2016

Author(s)

Journal Title

DOI

NAID

ISSN

Language

Data Source

[Journal Article] Instantaneous generation of many flaked particles caused by micro-arc discharge and detection method using load impedance monitoring system2015

Author(s)

Journal Title

Data Source

[Journal Article] Many flaked particles generated by electric field stress working as an impulsive force in mass-production plasma etching equipment2015

Author(s)

Journal Title

Data Source

[Journal Article] Impulsive force phenomenon of electric field stress causing serious particle contamination in plasma etching equipment2014

Author(s)

Journal Title

DOI

NAID

Data Source

[Presentation] 半導体量産装置用プラズマプロセスモニタリング手法の開発2018

Author(s)

Organizer

Data Source

[Presentation] プラズマエッチングプロセスにおけるパーティクル検出手法の開発2018

Author(s)

Organizer

Data Source

[Presentation] 負荷インピーダンス測定手法によるプラ ズマエッチングチャンバー内壁の監視2016

Author(s)

Organizer

Place of Presentation

Year and Date

Data Source

[Presentation] プラズマエッチング装置における チャンバー内壁上の堆積膜の監視2016

Author(s)

Organizer

Place of Presentation

Year and Date

Data Source

[Presentation] Development of monitoring method for deposited film causing particles in mass-production plasma etching process using a load impedance monitoring system2016

Author(s)

Organizer

Place of Presentation

Year and Date

Data Source

[Presentation] Many flaked particles generated by electric field stress working as an impulsive force i n mass-production plasma etching equipment2015

Author(s)

Organizer

Place of Presentation

Year and Date

Data Source

[Presentation] 負荷インピーダンス測定システムによる プラズマエッチング中の異常放電の検出2015

Kasashima Yuji 笠嶋悠司

[Presentation] 負荷インピーダンス測定手法によるプラズマエッチングチャンバー内壁の監視2016

[Presentation] プラズマエッチング装置におけるチャンバー内壁上の堆積膜の監視2016

[Presentation] 負荷インピーダンス測定システムによるプラズマエッチング中の異常放電の検出2015