Onaya Takashi 女屋崇

… Alternative Names

女屋崇オナヤタカシ

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Researcher Number	40933370
Other IDs	https://orcid.org/0000-0002-2710-8623
Affiliation (Current)	2026: 国立研究開発法人物質・材料研究機構, ナノアーキテクトニクス材料研究センター, 研究員
Affiliation (based on the past Project Information) *help	2026: 国立研究開発法人物質・材料研究機構, ナノアーキテクトニクス材料研究センター, 研究員 2024: 東京大学, 大学院新領域創成科学研究科, 助教
Review Section/Research Field	Principal Investigator Basic Section 21050:Electric and electronic materials-related
Keywords	Principal Investigator 原子層堆積法 / ハフニア系強誘電体 / 結晶構造制御 / 信頼性 / ヘテロ界面 / 酸化物半導体 / 界面設計 / ナノ薄膜

Research Projects
(2 results)
Research Products
(14 results)

Enhancement of Memory Endurance in Ferroelectric Hafnia-Based Thin Films using Atomic-Layer-Designed Heterointerface Modification LayersPrincipal Investigator
- Principal Investigator
  
  女屋崇
- Project Period (FY)
  2026 – 2027
- Research Category
  
  Grant-in-Aid for Early-Career Scientists
- Review Section
  
  Basic Section 21050:Electric and electronic materials-related
- Research Institution
  National Institute for Materials Science
Clarification of guidelines for atomic scale control of interface reactions between hafnia-based ferroelectric thin films and electrodesPrincipal Investigator
- Principal Investigator
  
  女屋崇
- Project Period (FY)
  2024 – 2025
- Research Category
  
  Grant-in-Aid for Early-Career Scientists
- Review Section
  
  Basic Section 21050:Electric and electronic materials-related
- Research Institution
  The University of Tokyo

All 2025 2024

All Journal Article Presentation

[Journal Article] (Invited) Role of Oxidant Gas for Atomic Layer Deposition of HfxZr1-XO2 Thin Films on Ferroelectricity of Metal-Ferroelectric-Metal Capacitors2024
- Author(s)
  Onaya Takashi、Kita Koji
- Journal Title
  
  ECS Transactions
  
  Volume: 113 Issue: 2 Pages: 51-59
- DOI
  10.1149/11302.0051ecst
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24K17304
[Presentation] HfO2/ZrO2ナノラミネート薄膜の結晶化過程におけるZrO2最表面層の重要な役割2025
- Author(s)
  高久理名, 女屋崇, 喜多浩之
- Organizer
  第72回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-24K17304
[Presentation] Impurity reduction in atomic-layer-deposited Hf0.5Zr0.5O2 thin films using H2O2 as an oxidant to enhance the crystallization at low temperature2025
- Author(s)
  Haoming Che, Takashi Onaya, Masaki Ishii, Hiroshi Taka, Koji Kita
- Organizer
  第72回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-24K17304
[Presentation] ALD酸化剤へのH2O2の適用によるHf0.5Zr0.5O2薄膜の低温結晶化の促進2025
- Author(s)
  車浩銘, 女屋崇, 石井政輝, 髙洋志, 喜多浩之
- Organizer
  電子デバイス界面テクノロジー研究会－材料・プロセス・デバイス特性の物理－ (第30回研究会)
- Data Source
  KAKENHI-PROJECT-24K17304
[Presentation] 原子層堆積法を用いた薄膜・界面設計によるHfO2系強誘電体材料の結晶構造制御2025
- Author(s)
  女屋崇
- Organizer
  第72回応用物理学会春季学術講演会
- Invited
- Data Source
  KAKENHI-PROJECT-24K17304
[Presentation] Design of Ferroelectric HfxZr1－xO2 Thin Films by Atomic Layer Deposition2024
- Author(s)
  Takashi Onaya and Koji Kita
- Organizer
  1st Asia-Pacific Atomic Layer Deposition Conference (AP-ALD 2024)
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-24K17304
[Presentation] HfO2系強誘電体薄膜/電極の界面設計による結晶構造制御2024
- Author(s)
  女屋崇
- Organizer
  Controlled growth and characterization研究会 2024-II
- Invited
- Data Source
  KAKENHI-PROJECT-24K17304
[Presentation] Understanding of oxidant gas effect on crystal structure and ferroelectricity of atomic layer deposited HfxZr1－xO2 thin films using synchrotron X-ray analysis2024
- Author(s)
  Takashi Onaya and Koji Kita
- Organizer
  37th International Microprocesses and Nanotechnology Conference (MNC 2024)
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-24K17304
[Presentation] Enhancement of Ferroelectric Phase Formation of HfO2/ZrO2 Nanolaminate Films by Tuning HfO2 and ZrO2 Thicknesses Using Atomic Layer Deposition2024
- Author(s)
  Takashi Onaya, Yasuhiro Sakuragawa, and Koji Kita
- Organizer
  AVS 24th International Conference on Atomic Layer Deposition (ALD 2024)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-24K17304
[Presentation] Low-temperature crystallization of Hf0.5Zr0.5O2 thin films fabricated using H2O2 as the ALD oxidant2024
- Author(s)
  Haoming Che, Takashi Onaya, Masaki Ishii, Hiroshi Taka, and Koji Kita
- Organizer
  1st Asia-Pacific Atomic Layer Deposition Conference (AP-ALD 2024)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-24K17304
[Presentation] Role of Oxidant Gas for Atomic Layer Deposition of HfxZr1－xO2 Thin Films on Ferroelectricity of Metal-Ferroelectric-Metal Capacitors2024
- Author(s)
  Takashi Onaya and Koji Kita
- Organizer
  245th ECS Meeting
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-24K17304
[Presentation] HfO2/ZrO2界面がHfO2/ZrO2ナノラミネート薄膜の強誘電相出現に与える影響の考察2024
- Author(s)
  女屋崇, 櫻川裕大, 高久理名, 喜多浩之
- Organizer
  第85回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-24K17304
[Presentation] Effect of One ZrO2/HfO2 Thickness of ZrO2/HfO2 (Zr/Hf=1/1) Laminate on Characteristics for Non-volatile DRAM2024
- Author(s)
  Tomomi Sawada, Toshihide Nabatame, Takashi Onaya, Hiromi Miura, Manami Miyamoto, and Kazuhito Tsukagoshi
- Organizer
  AVS 24th International Conference on Atomic Layer Deposition (ALD 2024)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-24K17304
[Presentation] Design of Interface Formation Process of Ferroelectric-HfxZr1－xO2/TiN Interface for Metal-Ferroelectric-Metal Capacitors with High Fatigue Resistance2024
- Author(s)
  Takashi Onaya and Koji Kita
- Organizer
  Global Conference on Innovation Materials 2024 (GCIM 2024)
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-24K17304

Onaya Takashi 女屋 崇

女屋 崇 オナヤ タカシ

Research Projects

Research Products

Enhancement of Memory Endurance in Ferroelectric Hafnia-Based Thin Films using Atomic-Layer-Designed Heterointerface Modification LayersPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

Clarification of guidelines for atomic scale control of interface reactions between hafnia-based ferroelectric thin films and electrodesPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

[Journal Article] (Invited) Role of Oxidant Gas for Atomic Layer Deposition of HfxZr1-XO2 Thin Films on Ferroelectricity of Metal-Ferroelectric-Metal Capacitors2024

Author(s)

Journal Title

DOI

Data Source

[Presentation] HfO2/ZrO2ナノラミネート薄膜の結晶化過程におけるZrO2最表面層の重要な役割2025

Author(s)

Organizer

Data Source

[Presentation] Impurity reduction in atomic-layer-deposited Hf0.5Zr0.5O2 thin films using H2O2 as an oxidant to enhance the crystallization at low temperature2025

Author(s)

Organizer

Data Source

[Presentation] ALD酸化剤へのH2O2の適用によるHf0.5Zr0.5O2薄膜の低温結晶化の促進2025

Author(s)

Organizer

Data Source

[Presentation] 原子層堆積法を用いた薄膜・界面設計によるHfO2系強誘電体材料の結晶構造制御2025

Author(s)

Organizer

Data Source

[Presentation] Design of Ferroelectric HfxZr1－xO2 Thin Films by Atomic Layer Deposition2024

Author(s)

Organizer

Data Source

[Presentation] HfO2系強誘電体薄膜/電極の界面設計による結晶構造制御2024

Author(s)

Organizer

Data Source

[Presentation] Understanding of oxidant gas effect on crystal structure and ferroelectricity of atomic layer deposited HfxZr1－xO2 thin films using synchrotron X-ray analysis2024

Author(s)

Organizer

Data Source

[Presentation] Enhancement of Ferroelectric Phase Formation of HfO2/ZrO2 Nanolaminate Films by Tuning HfO2 and ZrO2 Thicknesses Using Atomic Layer Deposition2024

Author(s)

Organizer

Data Source

[Presentation] Low-temperature crystallization of Hf0.5Zr0.5O2 thin films fabricated using H2O2 as the ALD oxidant2024

Author(s)

Organizer

Data Source

[Presentation] Role of Oxidant Gas for Atomic Layer Deposition of HfxZr1－xO2 Thin Films on Ferroelectricity of Metal-Ferroelectric-Metal Capacitors2024

Author(s)

Organizer

Data Source

[Presentation] HfO2/ZrO2界面がHfO2/ZrO2ナノラミネート薄膜の強誘電相出現に与える影響の考察2024

Author(s)

Organizer

Data Source

[Presentation] Effect of One ZrO2/HfO2 Thickness of ZrO2/HfO2 (Zr/Hf=1/1) Laminate on Characteristics for Non-volatile DRAM2024

Author(s)

Organizer

Data Source

[Presentation] Design of Interface Formation Process of Ferroelectric-HfxZr1－xO2/TiN Interface for Metal-Ferroelectric-Metal Capacitors with High Fatigue Resistance2024

Author(s)

Organizer

Data Source

Onaya Takashi 女屋崇

女屋崇オナヤタカシ