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Onaya Takashi  女屋 崇

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女屋 崇  オナヤ タカシ

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Researcher Number 40933370
Other IDs
Affiliation (Current) 2026: 国立研究開発法人物質・材料研究機構, ナノアーキテクトニクス材料研究センター, 研究員
Affiliation (based on the past Project Information) *help 2026: 国立研究開発法人物質・材料研究機構, ナノアーキテクトニクス材料研究センター, 研究員
2024: 東京大学, 大学院新領域創成科学研究科, 助教
Review Section/Research Field
Principal Investigator
Basic Section 21050:Electric and electronic materials-related
Keywords
Principal Investigator
酸化物半導体 / 界面設計 / ナノ薄膜 / 原子層堆積法 / ハフニア系強誘電体
  • Research Projects

    (2 results)
  • Research Products

    (14 results)
  •  原子層設計したヘテロ界面修飾層によるハフニア系強誘電体薄膜のメモリ機能超耐久化Principal Investigator

    • Principal Investigator
      女屋 崇
    • Project Period (FY)
      2026 – 2027
    • Research Category
      Grant-in-Aid for Early-Career Scientists
    • Review Section
      Basic Section 21050:Electric and electronic materials-related
    • Research Institution
      National Institute for Materials Science
  •  Clarification of guidelines for atomic scale control of interface reactions between hafnia-based ferroelectric thin films and electrodesPrincipal Investigator

    • Principal Investigator
      女屋 崇
    • Project Period (FY)
      2024 – 2025
    • Research Category
      Grant-in-Aid for Early-Career Scientists
    • Review Section
      Basic Section 21050:Electric and electronic materials-related
    • Research Institution
      The University of Tokyo

All 2025 2024

All Journal Article Presentation

  • [Journal Article] (Invited) Role of Oxidant Gas for Atomic Layer Deposition of HfxZr1-XO2 Thin Films on Ferroelectricity of Metal-Ferroelectric-Metal Capacitors2024

    • Author(s)
      Onaya Takashi、Kita Koji
    • Journal Title

      ECS Transactions

      Volume: 113 Issue: 2 Pages: 51-59

    • DOI

      10.1149/11302.0051ecst

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-24K17304
  • [Presentation] HfO2/ZrO2ナノラミネート薄膜の結晶化過程におけるZrO2最表面層の重要な役割2025

    • Author(s)
      高久 理名, 女屋 崇, 喜多 浩之
    • Organizer
      第72回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-24K17304
  • [Presentation] Impurity reduction in atomic-layer-deposited Hf0.5Zr0.5O2 thin films using H2O2 as an oxidant to enhance the crystallization at low temperature2025

    • Author(s)
      Haoming Che, Takashi Onaya, Masaki Ishii, Hiroshi Taka, Koji Kita
    • Organizer
      第72回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-24K17304
  • [Presentation] ALD酸化剤へのH2O2の適用によるHf0.5Zr0.5O2薄膜の低温結晶化の促進2025

    • Author(s)
      車 浩銘, 女屋 崇, 石井 政輝, 髙 洋志, 喜多 浩之
    • Organizer
      電子デバイス界面テクノロジー研究会 -材料・プロセス・デバイス特性の物理- (第30回研究会)
    • Data Source
      KAKENHI-PROJECT-24K17304
  • [Presentation] 原子層堆積法を用いた薄膜・界面設計によるHfO2系強誘電体材料の結晶構造制御2025

    • Author(s)
      女屋 崇
    • Organizer
      第72回応用物理学会春季学術講演会
    • Invited
    • Data Source
      KAKENHI-PROJECT-24K17304
  • [Presentation] Design of Ferroelectric HfxZr1-xO2 Thin Films by Atomic Layer Deposition2024

    • Author(s)
      Takashi Onaya and Koji Kita
    • Organizer
      1st Asia-Pacific Atomic Layer Deposition Conference (AP-ALD 2024)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-24K17304
  • [Presentation] HfO2系強誘電体薄膜/電極の界面設計による結晶構造制御2024

    • Author(s)
      女屋 崇
    • Organizer
      Controlled growth and characterization研究会 2024-II
    • Invited
    • Data Source
      KAKENHI-PROJECT-24K17304
  • [Presentation] Understanding of oxidant gas effect on crystal structure and ferroelectricity of atomic layer deposited HfxZr1-xO2 thin films using synchrotron X-ray analysis2024

    • Author(s)
      Takashi Onaya and Koji Kita
    • Organizer
      37th International Microprocesses and Nanotechnology Conference (MNC 2024)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-24K17304
  • [Presentation] Enhancement of Ferroelectric Phase Formation of HfO2/ZrO2 Nanolaminate Films by Tuning HfO2 and ZrO2 Thicknesses Using Atomic Layer Deposition2024

    • Author(s)
      Takashi Onaya, Yasuhiro Sakuragawa, and Koji Kita
    • Organizer
      AVS 24th International Conference on Atomic Layer Deposition (ALD 2024)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-24K17304
  • [Presentation] Low-temperature crystallization of Hf0.5Zr0.5O2 thin films fabricated using H2O2 as the ALD oxidant2024

    • Author(s)
      Haoming Che, Takashi Onaya, Masaki Ishii, Hiroshi Taka, and Koji Kita
    • Organizer
      1st Asia-Pacific Atomic Layer Deposition Conference (AP-ALD 2024)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-24K17304
  • [Presentation] Role of Oxidant Gas for Atomic Layer Deposition of HfxZr1-xO2 Thin Films on Ferroelectricity of Metal-Ferroelectric-Metal Capacitors2024

    • Author(s)
      Takashi Onaya and Koji Kita
    • Organizer
      245th ECS Meeting
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-24K17304
  • [Presentation] HfO2/ZrO2界面がHfO2/ZrO2ナノラミネート薄膜の強誘電相出現に与える影響の考察2024

    • Author(s)
      女屋 崇, 櫻川 裕大, 高久 理名, 喜多 浩之
    • Organizer
      第85回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-24K17304
  • [Presentation] Effect of One ZrO2/HfO2 Thickness of ZrO2/HfO2 (Zr/Hf=1/1) Laminate on Characteristics for Non-volatile DRAM2024

    • Author(s)
      Tomomi Sawada, Toshihide Nabatame, Takashi Onaya, Hiromi Miura, Manami Miyamoto, and Kazuhito Tsukagoshi
    • Organizer
      AVS 24th International Conference on Atomic Layer Deposition (ALD 2024)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-24K17304
  • [Presentation] Design of Interface Formation Process of Ferroelectric-HfxZr1-xO2/TiN Interface for Metal-Ferroelectric-Metal Capacitors with High Fatigue Resistance2024

    • Author(s)
      Takashi Onaya and Koji Kita
    • Organizer
      Global Conference on Innovation Materials 2024 (GCIM 2024)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-24K17304

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