UMENO Masataka 梅野正隆

… Alternative Names

UMENO MASATAKA 梅野正隆

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Researcher Number	50029071
Other IDs
Affiliation (based on the past Project Information) *help	2008 – 2010: Fukui University of Technology, 工学部, 教授 2005 – 2006: 福井工業大学, 工学部, 教授 1998 – 2001: Osaka Univ., Graduate School of Eng., Professor, 大学院・工学研究科, 教授 1991 – 1997: 大阪大学, 工学部, 教授 1986 – 1987: PROFESSOR, FACULTY OF ENGINEERING, OSAKA UNIVERSITY, 工学部, 教授 1986: Osaka University, Faculty of Engineering, 工学部, 教授 1985: 大阪大学, 工, 教授
Review Section/Research Field	Principal Investigator 表面界面物性 / Applied materials science/Crystal engineering / Applied materials science/Crystal engineering / 機械要素 Except Principal Investigator Applied materials
Keywords	Principal Investigator シリコン / silicon / SOI / X線回折 / トンネル効果 / MBE / 界面 / SiO_2 / oxidation / CTR scattering … More / X-ray diffraction / 極微細構造 / マイクロデバイス / CTR散乱 / RTO / NF_3 / 酸化膜 / 熱酸化 / 電界イオン顕微鏡 / エキソ電子放射 / Atomic Structure / Substrate / Interface / Surface / 高電圧印加方式 / 高電圧電界イオン顕微鏡 / 原子構造 / 母材 / 表面 / Thermal Oxidation / Buried Oxide / Silicon / LSI基板 / 結晶工学 / SIMOX / SOIウエーハ / SiGe / SOI(Silicon On Insulator) / x-ray diffraction / interface / thin film / 薄膜 / 酸化 / oxygen / XPS / beam oxidation / space environment / low temperature / atomic oxygen / 低地球軌道 / 表面反応 / 低温酸化 / ビーム酸化 / デバイスプロセス技術 / 宇宙環境 / 原子状酸素 / Microstructure / Microdevice / microstructure / microdevice / X線回析 / oxide layr / thermal oxidation / 界面準位 / 真性応力 / 酸酸化 / 逆格子マッピング / 放射光 / 酸化濃縮 / 歪シリコン / トポグラフィ / 歪シリコンウエーハ / 結晶評価 / タングステン / 表面欠陥 / 画像処理 / 電子放射像 / 仕事関数 / タングステンチップ / FSEE / エキソ電子 / 電界放射 … More Except Principal Investigator 結晶欠陥 / 半導体 / X線表面散乱 / 高分解能電顕 / 表面・界面構造 / 成長表面・界面 / 結晶成長 / Dislocations / Crystal Defects / Semiconductor / <II> - <VI> compounds / Gallium Arsenide / Germanium / Silicon / 不純物 / 転位 / II-VI化合物 / ガリウム砒素 / ゲルマニウム / シリコン / IIIーV族半導体 / IV族半導体 / 欠陥物性 / 位相シフト干渉法 / フィールド・イオン顕微鏡 / カソード・ルミネッセンス / FIM / エピタキシヤル成長 / RHEED / 半導体結晶表面 / 微斜面 / REM / 高分子板状結晶 / 多波干渉顕微鏡 / フィ-ルド・イオン顕微鏡 / カソ-ド・ルミネッセンス Less

Measurements of the strain in strained Si wafers by X-ray diffraction methodsPrincipal Investigator
- Principal Investigator
  
  UMENO Masataka
- Project Period (FY)
  2008 – 2010
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Applied materials science/Crystal engineering
- Research Institution
  Fukui University of Technology
Formation of Buried Oxide Layer in Epitaxial Silicon WafersPrincipal Investigator
- Principal Investigator
  
  UMENO Masataka
- Project Period (FY)
  2005 – 2006
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Applied materials science/Crystal engineering
- Research Institution
  Fukui University of Technology
X-ray Diffraction Study of the Formation Process of SiO_2/Si InterfacesPrincipal Investigator
- Principal Investigator
  
  UMENO Masataka
- Project Period (FY)
  1999 – 2001
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Applied materials science/Crystal engineering
- Research Institution
  Osaka University
Development of the quantitative characterization method for microstructures on semiconductor surfaces by using X-ray diffractionPrincipal Investigator
- Principal Investigator
  
  UMENO Masataka
- Project Period (FY)
  1997 – 1998
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  表面界面物性
- Research Institution
  Osaka University
Development of room-temperature oxidation method of Si due to pulsed hyperthermal atomic oxygen beamPrincipal Investigator
- Principal Investigator
  
  UMENO Masataka
- Project Period (FY)
  1997 – 1998
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Applied materials science/Crystal engineering
- Research Institution
  Osaka University
電界刺激エキソ電子放射(FSEE)に関する研究Principal Investigator
- Principal Investigator
  
  梅野正隆
- Project Period (FY)
  1995
- Research Category
  
  Grant-in-Aid for Scientific Research on Priority Areas
- Research Institution
  Osaka University
Control of electric charge at the interface in the RTO and low temperature oxidation of SOIPrincipal Investigator
- Principal Investigator
  
  UMENO Masataka
- Project Period (FY)
  1995 – 1996
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  表面界面物性
- Research Institution
  Osaka University
Development of quantitative characterization method of microstructures by X-ray scatteringPrincipal Investigator
- Principal Investigator
  
  UMENO Masataka
- Project Period (FY)
  1995 – 1996
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  表面界面物性
- Research Institution
  Osaka University
電界刺激エキソ電子放射(FSEE)の研究Principal Investigator
- Principal Investigator
  
  梅野正隆
- Project Period (FY)
  1994
- Research Category
  
  Grant-in-Aid for Scientific Research on Priority Areas
- Research Institution
  Osaka University
電界刺激エキソ電子放射(FSEE)の研究Principal Investigator
- Principal Investigator
  
  梅野正隆
- Project Period (FY)
  1993
- Research Category
  
  Grant-in-Aid for Scientific Research on Priority Areas
- Research Institution
  Osaka University
原子レベルでの結晶成長機構(成長表面と界面構造)
- Principal Investigator
  
  原田仁平
- Project Period (FY)
  1991
- Research Category
  
  Grant-in-Aid for Scientific Research on Priority Areas
- Research Institution
  Nagoya University
原子レベルでの結晶成長機構(成長表面と界面構造)
- Principal Investigator
  
  原田仁平
- Project Period (FY)
  1991 – 1993
- Research Category
  
  Grant-in-Aid for Scientific Research on Priority Areas
- Research Institution
  Nagoya University
半導体の結晶欠陥物性の制御とその応用
- Principal Investigator
  
  SUMINO KOJI
- Project Period (FY)
  1987
- Research Category
  
  Grant-in-Aid for Co-operative Research (B)
- Research Field
  
  Applied materials
- Research Institution
  Tohoku University
PHYSICS OF CRYSTAL DEFECTS IN SEMICONDUCTORS
- Principal Investigator
  
  SUMINO KOJI
- Project Period (FY)
  1985 – 1986
- Research Category
  
  Grant-in-Aid for Co-operative Research (A)
- Research Field
  
  Applied materials
- Research Institution
  TOHOKU UNIVERSITY
Development of High Voltage Field Ion Microscope for the Studies of Surface, Interface, and Substrate of MaterialsPrincipal Investigator
- Principal Investigator
  
  UMENO Masataka
- Project Period (FY)
  1985 – 1986
- Research Category
  
  Grant-in-Aid for Developmental Scientific Research
- Research Field
  
  機械要素
- Research Institution
  Osaka University

All 2010 2009 2008 2006 2005

All Journal Article Presentation

[Journal Article] Thermal Stability and Electron Irradiation Damage of Ordered Structure in the Thermal Oxide Layer on Si2010
- Author(s)
  T.Shimura, D.Shimokawa, T.Inoue, T.Hosoi, H.Watanabe, O.Sakata, M.Umeno
- Journal Title
  
  J.Electrochem.Soc. 157
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560017
[Journal Article] Characterization of Strained Si Wafers by Synchrotron X-ray Microbeam and Topography2008
- Author(s)
  T. Shimura, M. Umeno, 他
- Journal Title
  
  J. of Mat. Sci. : Materials in Electronics 19, Sup-plement 1
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560017
[Journal Article] Characterization of Strained Si Wafers by X-ray Diffraction Techniques2008
- Author(s)
  T.Shimura, K.Kawamura, M.Asakawa, H.Watanabe, K.Yasutake, A.Ogura, K.Fukuda, O.Sakata, S.Kimura, T.Edo, S.Iida, M.Umeno
- Journal Title
  
  J.Mat.Sci.Materials in Electronics 19 Suppl.1
  
  Pages: 189-193
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560017
[Journal Article] Investigation of Structural Defects in strained Si Wafers by Synchrotron X-ray Topography2008
- Author(s)
  T. Shimura, M. Umeno, 他
- Journal Title
  
  Proc. of The 5^<th> International Symposium on Advanced Science and Technology of silicon Materials
  
  Pages: 266-270
- Data Source
  KAKENHI-PROJECT-20560017
[Journal Article] White X-ray Topography of Lattice Undulation in Bonded Silicon-On-Insulator Wafers2006
- Author(s)
  K.Fukuda, T.Yoshida, T.Shimura, K.Yasutake, M.Umeno, S.Iida
- Journal Title
  
  Jpn.J.Appl.Phys. 45(9A)
  
  Pages: 6795-6799
- NAID
  10018245181
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-17560014
[Journal Article] Self-limiting oxidation of SiGe alloy on silicon-on-insulator wafers2006
- Author(s)
  T.Shimura, M.Shimizu, S.Horiuchi, H.Watanabe, Y.Yasutake, M.Umeno
- Journal Title
  
  Appl. Phys. Letters 89
- NAID
  120007183055
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-17560014
[Journal Article] Self-limiting oxidation of SiGe alloy on silicon-on-insulator wafers2006
- Author(s)
  T.Shimura, M.Shimizu, S.Horiuchi, H.Watanabe, Y.Yasutake, M.Umeno
- Journal Title
  
  Appl.Phys.Letters 89
- NAID
  120007183055
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-17560014
[Journal Article] White X-ray Topography of Lattice Undulation in Bonded Silicon-On-Insulator Wafers2006
- Author(s)
  K.Fukuda, T.Yoshida, T.Shimura, K.Yasutake, M.Umeno, S.Iida
- Journal Title
  
  Jpn. J. Appl. Phys. 45-9
  
  Pages: 6795-6799
- NAID
  10018245181
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-17560014
[Journal Article] Comparison of ordered structure in buried oxide layers in high-dose, low-dose, and internal-thermal-oxidation separation-by-implanted-oxygen wafers2005
- Author(s)
  Takayoshi Shimura, F.Kazunori, K.Yasutake, T.Hosoi, M.Umeno
- Journal Title
  
  Thin Solid Films vol.476-1
  
  Pages: 125-129
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-17560014
[Journal Article] Reactions and diffusion of atomic and molecular oxygen in the SiO_2 network2005
- Author(s)
  T.Tatsumura, T.Shimura, E.Mishima, K.Kawamura, D.Yamasaki, H.Yamamoto, T.Watanabe, M.Umeno, I.Ohdomari
- Journal Title
  
  Phys. Rev. B 72-4
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-17560014
[Journal Article] Ordered Structure in the Thermal Oxide Layer on Silicon Substrates2005
- Author(s)
  T.Shimura, E.Mishima, H.Watanabe, K.Yasutake, M.Umeno, K.Tatsumura, T.Watanabe, I.Ohdomari, K.Yamada, S.Kamiyama, Y.Akasaka, Y.Nara, K.Nakamura
- Journal Title
  
  ECS Transactions Vol.1 No1
  
  Pages: 39-48
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-17560014
[Journal Article] Ordered Structure in the Thermal Oxide Layer on Silicon Substrates2005
- Author(s)
  T.Shimura, E.Mishima, H.Watanabe, K.Yasutake, M.Umeno, K.Tatsumura, T.Watanabe, I.Ohdomari, K.Yamada, S.Kamiyama, Y.Akasaka, Y.Nara, K.Nakamura
- Journal Title
  
  ECS Transactions 1-1
  
  Pages: 39-48
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-17560014
[Journal Article] X-ray diffraction measurements of internal strain in Si nanowires fabricated using a self-limiting oxidation process2005
- Author(s)
  T.Shimura, K.Yasutake, M.Umeno, M.Nagase
- Journal Title
  
  Appl.Phys.Letters 86
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-17560014
[Journal Article] Ordered Structure in the Thermal Oxide Layer on Silicon Substrates2005
- Author(s)
  T.Shimura, E.Mishima, H.Watanabe, K.Yasutake, M.Umeno, K.Tatsumura, T.Watanabe, I.Ohdomari, K.Yamada, S.Kamiyama, Y.Akasaka, Y.Nara, K.Nakamura
- Journal Title
  
  ECS Transactions 1(1)
  
  Pages: 39-48
- Data Source
  KAKENHI-PROJECT-17560014
[Journal Article] X-ray diffraction measurements of internal strain in Si nanowires fabricated using a self-limiting oxidation process2005
- Author(s)
  T.Shimura, K.Yasutake, M.Umeno, M.Nagase
- Journal Title
  
  Appl. Phys. Letters 86
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-17560014
[Journal Article] Comparison of ordered structure in buried oxide layers in high-dose, low-dose, and internal- thermal-oxidation separation-by-implanted-oxygen wafers2005
- Author(s)
  Takayoshi Shimura, F.Kazunori, K.Yasutake, T.Hosoi, M.Umeno
- Journal Title
  
  Thin Solid Films 476-1
  
  Pages: 125-129
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-17560014
[Journal Article] Comparison of ordered structure in buried oxide layers in high-dose, low-dose, and internal-thermal-oxidation separation-by-implanted-oxygen wafers2005
- Author(s)
  T.Shimura, K.Fukuda, K.Yasutake, T.Hosoi, M.Umeno
- Journal Title
  
  Thin Solid Films 476-1
  
  Pages: 125-129
- Data Source
  KAKENHI-PROJECT-17560014
[Journal Article] Reactions and diffusion of atomic and molecular oxygen in the SiO_2 network2005
- Author(s)
  T.Tatsumura, T.Shimura, E.Mishima, K.Kawamura, D.Yamasaki, H.Yamamoto, T.Watanabe, M.Umeno, I.Ohdomari
- Journal Title
  
  Phys.Rev.B 72(4)
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-17560014
[Presentation] Observation of Two-dimensional Distribution of Lattice Inclination and Strain in Strained Si Wafers by Synchrotron X-ray Topography2009
- Author(s)
  T.Shimura, M.Umeno, 他
- Organizer
  The 13^<th> International Conference on Defects-Recognition, Imaging and Physics in Semiconductors(DRIP XIII)
- Place of Presentation
  Wheeling, W.V., USA
- Year and Date
  2009-09-15
- Data Source
  KAKENHI-PROJECT-20560017

1. TAKAYOSHI Shimura (90252600)

# of Collaborated Projects: 7 results

# of Collaborated Products: 0 results
2. OHMAE Nobuo (60029345)

# of Collaborated Projects: 6 results

# of Collaborated Products: 0 results
3. TAGAWA Masahito (10216806)

# of Collaborated Projects: 5 results

# of Collaborated Products: 0 results
4. MASHIKO Youji

# of Collaborated Projects: 3 results

# of Collaborated Products: 0 results
5. SUMINO KOJI (50005849)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
6. YOSHIDA MASAYUKI (80038984)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
7. NANNICHI YASUO (10133026)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
8. MIKOSHIBA NOBUO (70006279)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
9. TAKEUCHI SHIN (60013512)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
10. 原田仁平 (80016071)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
11. 塚本勝男 (60125614)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
12. 北村雅夫 (70004489)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
13. 佐藤清隆 (80034479)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
14. 八木克道 (90016072)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
15. KOSHIKAWA Takanori (60098085)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
16. YOHJI Mashiko

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
17. 小山浩

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
18. 田畑則一

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
19. TABATA Norikazu

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
20. 志村孝功

# of Collaborated Projects: 0 results

# of Collaborated Products: 19 results

UMENO Masataka 梅野 正隆

UMENO MASATAKA 梅野 正隆

Research Projects

Research Products

Co-Researchers

Measurements of the strain in strained Si wafers by X-ray diffraction methodsPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Formation of Buried Oxide Layer in Epitaxial Silicon WafersPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

X-ray Diffraction Study of the Formation Process of SiO_2/Si InterfacesPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Development of the quantitative characterization method for microstructures on semiconductor surfaces by using X-ray diffractionPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Development of room-temperature oxidation method of Si due to pulsed hyperthermal atomic oxygen beamPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

電界刺激エキソ電子放射(FSEE)に関する研究Principal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Institution

Control of electric charge at the interface in the RTO and low temperature oxidation of SOIPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Development of quantitative characterization method of microstructures by X-ray scatteringPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

電界刺激エキソ電子放射(FSEE)の研究Principal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Institution

電界刺激エキソ電子放射(FSEE)の研究Principal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Institution

原子レベルでの結晶成長機構(成長表面と界面構造)

Principal Investigator

Project Period (FY)

Research Category

Research Institution

原子レベルでの結晶成長機構(成長表面と界面構造)

Principal Investigator

Project Period (FY)

Research Category

Research Institution

半導体の結晶欠陥物性の制御とその応用

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

PHYSICS OF CRYSTAL DEFECTS IN SEMICONDUCTORS

Principal Investigator

UMENO Masataka 梅野正隆

UMENO MASATAKA 梅野正隆