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TAJIMA Satomi  田嶋 聡美

Researcher Number 50537941
Other IDs
  • ORCIDhttps://orcid.org/0000-0002-9044-6967
Affiliation (based on the past Project Information) *help 2013 – 2015: 名古屋大学, 工学(系)研究科(研究院), 准教授
2011: 東京大学, 大学院・工学研究科, 特任研究員
2010 – 2011: 東京大学, 大学院・工学系研究科, 特任研究員
Review Section/Research Field
Principal Investigator
Plasma electronics / Applied physics, general
Keywords
Principal Investigator
nmスケール / ゲート周辺 / プラズマダメージ除去 / 温度管理 / 吸着分子 / 副生成物制御 / 密度汎関数法 / 表面反応 / 半導体加工 / 低速エッチング … More / ケミカルドライエッチング / MEMS / 表面改質 / 生体模倣材料 / CVD / 大気圧プラズマ / ガスセンサー / PECVD / 国際研究者交流 スロベニア / センサー / 炭化水素 / 表面電位 / ばらつき制御 / PECVD / カーボン膜 / 吸着 / 安定駆動 / 電子エネルギー / 小型 / プラズマへの液体導入 / 高精度化 / Heプラズマ / プラズマレスエッチング / 局所はっ水化 / パルス駆動 / μTAS / 血漿分離 / ストリーマー / ジェット進展 / パルス変調 / マイクロプラズマ Less
  • Research Projects

    (3 results)
  • Research Products

    (76 results)
  • Co-Researchers

    (5 People)
  •  ゲート周辺ダメージ層除去プラズマレス低速平滑エッチング技術開発とメカニズム解明Principal Investigator

    • Principal Investigator
      田嶋 聡美
    • Project Period (FY)
      2014 – 2015
    • Research Category
      Grant-in-Aid for Young Scientists (A)
    • Research Field
      Plasma electronics
    • Research Institution
      Nagoya University
  •  Development of the miniaturized hydrocarbon sensor using the nanocarbon multilayersPrincipal Investigator

    • Principal Investigator
      TAJIMA Satomi
    • Project Period (FY)
      2013 – 2014
    • Research Category
      Grant-in-Aid for Challenging Exploratory Research
    • Research Field
      Plasma electronics
    • Research Institution
      Nagoya University
  •  Development of a small-scale heavy metal detection system using pulse-modulated inductively coupled He microplasma combined with micro total analysis systemPrincipal Investigator

    • Principal Investigator
      TAJIMA Satomi
    • Project Period (FY)
      2010 – 2011
    • Research Category
      Grant-in-Aid for Young Scientists (B)
    • Research Field
      Applied physics, general
    • Research Institution
      The University of Tokyo

All 2016 2015 2014 2013 2012 2011 2010 Other

All Journal Article Presentation Book Patent

  • [Book] エレクトロニクス実装学会誌 19 (2) ISSN1343-96772016

    • Author(s)
      田嶋聡美
    • Total Pages
      9
    • Publisher
      一般社団法人 エレクトロニクス実装学会
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Book] 日本真空学会SP部会 薄膜・機能材料を用いたアクアイノベーション ~成膜,微細加工技術から分析・応用まで~2015

    • Author(s)
      田嶋聡美
    • Total Pages
      9
    • Publisher
      一般社団法人 日本真空学会
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Book] 超精密加工専門委員会 会誌『超精密 Vol.21』2015

    • Author(s)
      田嶋聡美
    • Total Pages
      6
    • Publisher
      公益社団法人 精密工学会
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Journal Article] High sensitivity of carbon nanowalls based sensor for detection of organic vapours2015

    • Author(s)
      P. Slobodian, U. Cvelbar, P. Riha, R. Olejnik, J. Martyas, G. Filpic, H. Watanabe, H. J. Cho, S. Tajima, H. Kondo, M. Sekine and M. Hori
    • Journal Title

      RSC Advances

      Volume: 5 Issue: 110 Pages: 90515-90520

    • DOI

      10.1039/c5ra12000d

    • Peer Reviewed / Acknowledgement Compliant / Open Access / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Journal Article] Evaluation of the difference in the ratecoefficients of NOx(X = 1 or 2) + F2 -> F + FNOx by thestereochemical arrangement using the density functional theory2015

    • Author(s)
      Satomi Tajima, Toshio Hayashi, and Masaru Hori
    • Journal Title

      J. Phys. Chem. A

      Volume: 119 Issue: 8 Pages: 1381-1387

    • DOI

      10.1021/jp510886b

    • Peer Reviewed / Acknowledgement Compliant / Open Access
    • Data Source
      KAKENHI-PROJECT-25600123, KAKENHI-PROJECT-26706022
  • [Journal Article] Formation of Nanoporous Features, Flat Surfaces, or Crystallographically Oriented Etched Profiles by the Si Chemical Dry Etching Using the Reaction of F2 + NOー>F + FNO at an Elevated Temperature2013

    • Author(s)
      S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, and M. Hori
    • Journal Title

      J. Phys. Chem. C

      Volume: 117 Issue: 40 Pages: 20810-20818

    • DOI

      10.1021/jp4084794

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Journal Article] On/off pulse modulation of atmospheric-pressure helium/argon inductively coupled plasma mcrojet for plasma processing of polymers2010

    • Author(s)
      S.Tajima S.Tsuchiya, M.Matsumori, S.Nakatsuka, T.Ichiki
    • Journal Title

      J.Photopolym.Sci.Technol.

      Volume: 23 Pages: 555-560

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Journal Article] Optical and electrical characterization of pulse-modulated argon atmospheric-pressure inductively coupled microplasma jets2010

    • Author(s)
      S.Tajima, M.Matsumori, S.Nakatsuka, S.Tsuchiya, T.Ichiki
    • Journal Title

      J.Appl.Phys

      Volume: 108

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Journal Article] Optical and electrical characterization of pulse-modulated argon atmospheric-pressure inductively coupled microplasma jets2010

    • Author(s)
      S. Tajima, M. Matsumori, S. Nakatsuka, S. Tsuchiya, and T. Ichiki
    • Journal Title

      J. Appl. Phys

      Volume: 108 Pages: 833021-5

    • Data Source
      KAKENHI-PROJECT-22760051
  • [Journal Article] On/off pulse modulation of atmospheric-pressure helium/argon inductively coupled plasma mcrojet for plasma processing of polymers2010

    • Author(s)
      S. Tajima, S. Tsuchiya, M. Matsumori, S. Nakatsuka, and T. Ichiki
    • Journal Title

      J. Photopolym. Sci. Technol

      Volume: 23 Pages: 555-560

    • Data Source
      KAKENHI-PROJECT-22760051
  • [Journal Article] Generation dynamics of an argon atmospheric-pressure inductively coupled plasma microjet evaluated by spectroscopic measurement techniques in review

    • Author(s)
      Satomi Tajima, Keiichiro Urabe, Dae-Sung Lee, Kunihide Tachibana, and Takanori Ichiki
    • Journal Title

      Satomi Tajima, Keiichiro Urabe, Dae-Sung Lee, Kunihide Tachibana, and Takanori Ichiki

    • Data Source
      KAKENHI-PROJECT-22760051
  • [Patent] Low-speed etching technique and etching equipment using F2 and NO2 gases2015

    • Inventor(s)
      田嶋聡美、林俊雄、堀勝
    • Industrial Property Rights Holder
      田嶋聡美、林俊雄、堀勝
    • Industrial Property Rights Type
      特許
    • Industrial Property Number
      2015-030105
    • Filing Date
      2015-02-25
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Patent] Low-speed etching technique and etching equipment using F2 and NO2 gases2015

    • Inventor(s)
      S. Tajima, T. Hayashi, M. Hori
    • Industrial Property Rights Holder
      S. Tajima, T. Hayashi, M. Hori
    • Industrial Property Rights Type
      特許
    • Industrial Property Number
      2015-030105
    • Filing Date
      2015-02-25
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Effects of fluorine termination on nanostructures and electrical properties of carbon nanowalls2016

    • Author(s)
      H. Cho, S. Tajima, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hiramatsu, M. Hori
    • Organizer
      8th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials / 9th International Conference on Plasma-Nano Technology & Science, Nagoya University
    • Place of Presentation
      名古屋大学, 愛知県名古屋市
    • Year and Date
      2016-03-06
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Ar/NO/F2ガスを用いたカーボンナノウォールの化学終端処理が表面微細構造および電気的特性に及ぼす効果2015

    • Author(s)
      趙 亨峻, 田嶋聡美, 竹田圭吾, 近藤博基, 石川健治, 関根誠, 平松美根男, 堀勝
    • Organizer
      第76回応用物理学会秋季学術講演会
    • Place of Presentation
      名古屋国際会議場, 愛知県名古屋市
    • Year and Date
      2015-09-13
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Chemical dry etching of Si using F2 and NO2 gases at elevated temperature2015

    • Author(s)
      S. Tajima, H. Hayashi, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      7th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/8th International Conference on Plasma-Nano Technology & Science (ISPlasma2015/IC-PLANTS2015)
    • Place of Presentation
      名古屋大学
    • Year and Date
      2015-03-30
    • Invited
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] Chemical dry etching for solar cell patterning2015

    • Author(s)
      S. Tajima
    • Organizer
      Workshop on Nanomaterials for Energy Applications
    • Place of Presentation
      AIST Tsukuba Central 2, 茨城県つくば市
    • Year and Date
      2015-09-29
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Effects of Fluorine Termination of Carbon Nanowall Edges onTheir Electrical Properties by Ar/NO/F2 Mixture Gas Treatments2015

    • Author(s)
      H. J. Cho, S. Tajima, K. Takeda, H. Kondo, K. Ishikawa, M. Sekine, M. Hiramatsu, M. Hori
    • Organizer
      9th International Conference on Reactive Plasmas/68rd Gaseous Electronics Conference/33th Symposium on Plasma Processing, (ICRP-9/GEC-68/SPP-33)
    • Place of Presentation
      Hawaii Convention Center, Honolulu, HI, USA
    • Year and Date
      2015-10-12
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] F2+NOx→F+FNOxを用いたSi系材料ケミカルドライエッチングにおける大気中水分のエッチングレートへの寄与2015

    • Author(s)
      田嶋聡美
    • Organizer
      日本真空学会スパッタリング及びプラズマプロセス技術部会(SP部会)第143回定例研究会
    • Place of Presentation
      信州大学, 長野県長野市
    • Year and Date
      2015-06-03
    • Invited
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Change in optical properties by texturing Si compounds by F2 and NOx gases2015

    • Author(s)
      S. Tajima, T. Hayashi, M. Sasaki, K. Yamakawa, K. Ishikawa, M. Sekine, M. Hori
    • Organizer
      Japan Society of Applied Physics (JSAP)-Optical Society of America (OSA) Joint Symposia 2015
    • Place of Presentation
      名古屋国際会議場, 愛知県名古屋市
    • Year and Date
      2015-09-13
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Modification of chemical bonding structures and electrical properties of carbon nanowalls by Ar/F2 post-treatments2015

    • Author(s)
      H. J. Cho, S. Tajima, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Mineo Hiramatsu and Masaru Hori
    • Organizer
      The 10th Anniversary Asian-European International Conference on Plasma Surface Engineering (AEPSE2015)
    • Place of Presentation
      Ramada Plaza Jeju, Jeju Island, Korea
    • Year and Date
      2015-09-20
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] プラズマを用いた樹脂表面改質と薄膜との密着性改善2015

    • Author(s)
      田嶋聡美
    • Organizer
      株式会社昭和真空相模原工場 若手技術者勉強会
    • Place of Presentation
      株式会社昭和真空相模原工場, 神奈川県相模原市
    • Year and Date
      2015-07-03
    • Invited
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] プラズマを利用した金属とプラスチックの結合2015

    • Author(s)
      田嶋聡美
    • Organizer
      一般社団法人 日本塑性加工学会  プラスチックプロセス分科会 第87回研究会
    • Place of Presentation
      山形大学東京サテライト, 東京都港区
    • Year and Date
      2015-12-04
    • Invited
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] プラズマプロセス後の表面の様子を調べよう2015

    • Author(s)
      田嶋聡美
    • Organizer
      第九回 先端プラズマ技術研究会(社会貢献・中小企業向け)
    • Place of Presentation
      名古屋大学, 愛知県名古屋市
    • Year and Date
      2015-11-20
    • Invited
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Chemical dry etching of Si using F2 and NO2 gases at elevated temperature2015

    • Author(s)
      S. Tajima, H. Hayashi, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      7th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/8th International Conference on Plasma-Nano Technology & Science (ISPlasma2015/IC-PLANTS2015)
    • Place of Presentation
      名古屋大学
    • Year and Date
      2015-03-30
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] プラズマを用いた異種材料の表面改質と接着前処理のノウハウ2015

    • Author(s)
      田嶋聡美
    • Organizer
      株式会社神戸製鋼所 金属樹脂接合勉強会
    • Place of Presentation
      名古屋大学, 愛知県名古屋市
    • Year and Date
      2015-04-23
    • Invited
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] 密度汎関数法による低速ケミカルドライエッチング反応時の表面反応モデリング2015

    • Author(s)
      田嶋聡美, 林俊雄, 佐々木実, 山川晃司, 石川健治, 関根誠, 堀勝
    • Organizer
      第25回日本MRS年次大会
    • Place of Presentation
      横浜市開港記念会館, 神奈川県横浜市
    • Year and Date
      2015-12-08
    • Invited
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Surface reaction during the slow Si etching using F2 and NO22015

    • Author(s)
      S. Tajima, H. Hayashi, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      The 62nd Japan Society of Applied Physics (JSAP) Spring Meeting
    • Place of Presentation
      東海大学
    • Year and Date
      2015-03-12
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] The challenges and issues of plasma-assisted adhesion improvement2015

    • Author(s)
      S. Tajima
    • Organizer
      68th Advisory Committee on Ultra Precision Workshop
    • Place of Presentation
      メルパルク大阪
    • Year and Date
      2015-01-23
    • Invited
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] Surface reaction during the slow Si etching using F2 and NO22015

    • Author(s)
      S. Tajima, H. Hayashi, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      The 62nd Japan Society of Applied Physics (JSAP) Spring Meeting
    • Place of Presentation
      東海大学
    • Year and Date
      2015-03-12
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] 東海地区の自動車・航空宇宙・ヘルスケア産業界が寄せるプラズマ加工と表面モデリングのニーズ2015

    • Author(s)
      田嶋聡美
    • Organizer
      一般社団法人 応用物理学会  九州支部特別講演
    • Place of Presentation
      九州大学伊都キャンパス, 福岡県福岡市
    • Year and Date
      2015-11-24
    • Invited
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] 電気自動車・スマホの心臓部のものづくりを分子レベルで考えよう2015

    • Author(s)
      田嶋聡美
    • Organizer
      平成27年度あいち理数教育推進事業「知の探究講座」(社会貢献・高校生向け)
    • Place of Presentation
      名古屋大学, 愛知県名古屋市
    • Year and Date
      2015-07-23
    • Invited
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Difference in chemical dry etching of Si related materials using NO and NO22015

    • Author(s)
      S. Tajima, H. Hayashi, M. Hori
    • Organizer
      The 20th Workshop on Advanced Plasma Processes and Diagnostics & The 7th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials
    • Place of Presentation
      北海道大学
    • Year and Date
      2015-01-28
    • Invited
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] 密度汎関数法によるケミカルドライエッチングの気相,表面反応モデ ルの構築と課題と東海地区の自動車・航空宇宙・ヘルスケア産業会が寄せるプラズマ加工のニーズ2015

    • Author(s)
      田嶋聡美
    • Organizer
      半導体プロセス表面反応講習会
    • Place of Presentation
      株式会社日立ハイテクノロジーズ, 山口県下松市
    • Year and Date
      2015-08-27
    • Invited
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Modeling molecules responsible for the sidewall protection during the chemical dry etching of silicon related materials using F2 + NOx -> F + FNOx2015

    • Author(s)
      S. Tajima, T. Hayashi, K. Yamakawa, M. Sasaki, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      Hawaii Convention Center, Honolulu, HI, USA
    • Place of Presentation
      Hawaii Convention Center, Honolulu, HI, USA
    • Year and Date
      2015-10-12
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] The challenges and issues of plasma-assisted adhesion improvement2015

    • Author(s)
      S. Tajima
    • Organizer
      68th Expert Committee on Ultra Precision Workshop
    • Place of Presentation
      メルパルク大阪
    • Year and Date
      2015-01-23
    • Invited
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] A vibrational infrared thermal detector released by plasmaless Si etching process2015

    • Author(s)
      J. -H. Jeong, S. Kumagai, S. Tajima, T. Hayashi, K. Yamakawa, M. Sasaki
    • Organizer
      7th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/8th International Conference on Plasma-Nano Technology & Science (ISPlasma2015/IC-PLANTS2015)
    • Place of Presentation
      名古屋大学
    • Year and Date
      2015-03-28
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Anisotropic chemical dry silicon wafer etching using F2 + NO -> F + FNO reaction2014

    • Author(s)
      S. Tajima, T. Hayashi, K. Yamakawa, M. Sasaki, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      36th International Symposium on Dry Process
    • Place of Presentation
      Pacifico Yokohama, 横浜市
    • Year and Date
      2014-11-28
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Chemical Dry Etching of the Si Sacrificial Layer in MEMS Devices2014

    • Author(s)
      S. Tajima, T. Hayashi, M. Sasaki
    • Organizer
      International Nanotechnology Exhibition & Conference (nano tech 2014)
    • Place of Presentation
      Tokyo Big Sight, Tokyo, Japan
    • Invited
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] The change in growth, differentiation, and adhesion characteristics of plasma-treated A549 and Saos-2 cells2014

    • Author(s)
      S. Tajima
    • Organizer
      Central Japan Medical and Bio seeds research academia-industry matching workshop
    • Place of Presentation
      ウインク愛知、名古屋市
    • Year and Date
      2014-12-10
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] How to design a chamber for material processing?2014

    • Author(s)
      S. Tajima
    • Organizer
      Female junior and high school students science and technology major promotion seminar
    • Place of Presentation
      名古屋大学
    • Year and Date
      2014-08-06
    • Invited
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Intoroduction of the plasma material surface treatment2014

    • Author(s)
      S. Tajima
    • Organizer
      Sumitomo Seika Chemicals, Co., Ltd. Beppu Factory Workshop
    • Place of Presentation
      住友精化株式会社 別府工場
    • Year and Date
      2014-11-05
    • Invited
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] Intoroduction of the plasma material surface treatment2014

    • Author(s)
      S. Tajima
    • Organizer
      Sumitomo Seika Chemicals, Co., Ltd., Beppu Factory workshop
    • Place of Presentation
      住友精化株式会社、別府工場
    • Year and Date
      2014-11-05
    • Invited
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Analysis of F loss during the chemical dry etching of Si using NO and F2 gases (II)2014

    • Author(s)
      S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, M. Sasaki, K. Yamakawa, and M. Hori
    • Organizer
      The 75th Japan Society of Applied Physics (JSAP) Autumn Meeting
    • Place of Presentation
      北海道大学
    • Year and Date
      2014-09-19
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] Designing the material process chamber2014

    • Author(s)
      S. Tajima
    • Organizer
      Female junior and high school students science and technology major promotion seminar
    • Place of Presentation
      名古屋大学
    • Year and Date
      2014-08-06
    • Invited
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] Anisotropic chemical dry silicon wafer etching using F2 + NO  F + FNO reaction2014

    • Author(s)
      S. Tajima, T. Hayashi, K. Yamakawa, M. Sasaki, K. Ishikawa, M. Sekine, M. Hori
    • Organizer
      36th International Symposium on Dry Process
    • Place of Presentation
      PACIFICO Convention Plaza、横浜市
    • Year and Date
      2014-11-28
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] Analysis of F loss during the chemical dry etching of Si using NO and F2 gases (II)2014

    • Author(s)
      S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, M. Sasaki, K. Yamakawa, and M. Hori
    • Organizer
      The 75th Japan Society of Applied Physics (JSAP) Autumn Meeting
    • Place of Presentation
      北海道大学
    • Year and Date
      2014-09-19
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Modification of A549 mitochondria activity, cell shape, and cell cytoskeleton by an atomic oxygen radical source2013

    • Author(s)
      Satomi Tajima, Kenji Ishikawa, Keigo Takeda, and Masaru Hori
    • Organizer
      The 2013 JSAP-MRS symposia
    • Place of Presentation
      Doshisha University, Kyotanabe Campus, Kyotanabe, Kyoto, Japan
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] Fabricating the smooth chemically dry etched Si surface for MEMS devices2013

    • Author(s)
      S. Tajima, T. Hayashi, Minoru Sasaki, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      The 35th International Symposium on Dry Process (DPS2013)
    • Place of Presentation
      Ramada Plaza Jeju Hotel, Jeju Island, Korea
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] Effect of neutral species generated by the micro hollow-cathode discharge radical source on the modification of A549 cell viability2013

    • Author(s)
      S. Tajima, M. Hori
    • Organizer
      The 9th Asian-European International Conference on Plasma Surface Engineering (AEPSE2013)
    • Place of Presentation
      Ramada Plaza Jeju Hotel, Jeju Island, Korea
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] Si chemical dry etching in NOx (x=1 or 2) / F2 gas mixture at an elevated temperature (II)2013

    • Author(s)
      S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      第74回応用物理学会秋季学術講演会
    • Place of Presentation
      Doshisha University, Kyotanabe Campus, Kyotanabe, Kyoto, Japan
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] Indirect plasma treatment of SAOS-2 and NHDF cells by surface dielectric barrier discharge2013

    • Author(s)
      S. Tajima, R. Gristina, P. Ambrico, D. Pignatelli, K. Masur, K.-D. Weltmann, T. von Woedtke, H. Toyoda, M. Hori, P. Favia
    • Organizer
      The 21st International Symposium on Plasma Chemistry
    • Place of Presentation
      Cairns, QLD, Australia
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] 名古屋大学におけるプラズマの研究動向と最新のトピックス2013

    • Author(s)
      S. Tajima
    • Organizer
      平成25年度第1回かがわ健康関連製品開発地域技術討論会
    • Place of Presentation
      香川大学
    • Invited
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] Si chemical dry etching using the reaction of NO and F22013

    • Author(s)
      S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, and M. Hori
    • Organizer
      17th Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics
    • Place of Presentation
      SKKU, Suon, Korea
    • Invited
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] Development of a Si dry chemical etching technique using NO/F_2 gas mixtures without using plasmas2012

    • Author(s)
      S.Tajima, K.Ishikawa, T.Hayashi, M.Hori
    • Organizer
      The 5^<th> International Conference on Plasma-Nano technology & Science
    • Place of Presentation
      犬山国際観光センター(愛知県)
    • Year and Date
      2012-03-10
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] Development of a plasma-less Si chemical dry etching method2012

    • Author(s)
      S. Tajima, K. Ishikawa, T. Hayashi, and M. Hori
    • Organizer
      59th Spring meeting of the Japan Society of Applied Physics
    • Place of Presentation
      早稲田大学(東京都)
    • Year and Date
      2012-03-17
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] Development of a Si dry chemical etching technique using NO/F_2 gas mixtures without using plasmas2012

    • Author(s)
      S. Tajima, K. Ishikawa, T. Hayashi, and M. Hori
    • Organizer
      The 5th International Conference on Plasma-Nanotechnology & Science
    • Place of Presentation
      犬山国際観光センター(愛知県)
    • Year and Date
      2012-03-10
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] Development of a plasma-less Si chemical dry etching method2012

    • Author(s)
      S.Tajima, K.Ishikawa, T.Hayashi, M.Hori
    • Organizer
      59^<th> Spring meeting of the Japan Society of Applied Physics
    • Place of Presentation
      早稲田大学(東京都)
    • Year and Date
      2012-03-17
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] High-speed plasma enhanced chemical vapor deposition of flurocarbon film by atmosphereic-pressure inductively coupled plasma microjet2011

    • Author(s)
      S. Tajima, S. Tsuchiya, and T. Ichiki
    • Organizer
      The 28th International Conference of Photopolymer Science and Technology
    • Place of Presentation
      千葉大学(千葉県)
    • Year and Date
      2011-06-23
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] Stable sample introduction to the pulse-modulated atmospheric-pressure inductively coupled plasma microjet atomic emission spectrometry2011

    • Author(s)
      T. Nomura, S. Tsuchiya, S. Tajima, and T. Ichiki
    • Organizer
      第58回春季応用物理学会
    • Place of Presentation
      神奈川工科大学(神奈川県)
    • Year and Date
      2011-03-26
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] Optical observation of the atmospheric-pressure inductively coupled plasma jet propagation dynamics2011

    • Author(s)
      S. Tajima, and T. Ichiki
    • Organizer
      第58回春季応用物理学会
    • Place of Presentation
      神奈川工科大学(神奈川県)
    • Year and Date
      2011-03-24
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] Fast separation of blood cells by a T-shape microfluidic device2011

    • Author(s)
      S. Tajima and T. Ichiki
    • Organizer
      The 21st MRS-Japan Academic Symposium
    • Place of Presentation
      横浜情報文化センター(神奈川県)
    • Year and Date
      2011-12-19
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] Fast separation of blood cells by a T-shape microfluidic device2011

    • Author(s)
      S.Tajima, T.Ichiki
    • Organizer
      The 21st MRS-Japan Academic Syrmposium
    • Place of Presentation
      横浜情報文化センター(神奈川県)
    • Year and Date
      2011-12-19
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] High-speed deposition of fluorocarbon films by C_4F_8/H_2/Ar atmospheric-pressure inductively coupled plasma2011

    • Author(s)
      S. Tajima and T. Ichiki
    • Organizer
      The 33rd International Symposium on Dry Process
    • Place of Presentation
      日京都ガーデンパレスホテル(京都府)
    • Year and Date
      2011-11-10
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] Spatiotemporal distributions of excited state Ar atoms and N2 molecules in a pulse-modulated Ar atmospheric-pressure inductively coupled plasma microjet2011

    • Author(s)
      S. Tajima and T. Ichiki
    • Organizer
      The 24th Symposium on Plasma Science for Materials(SPSM-24)
    • Place of Presentation
      大阪大学(大阪府)
    • Year and Date
      2011-07-19
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] High-speed plasma enhanced chemical vapor deposition of flurocarbon film by atmosphereic-pressure inductively coupledplasma microjet2011

    • Author(s)
      S.Tajima, S.Tsuchiya, T.Ichiki
    • Organizer
      The 28^<th> International Conference of Photopolymer Science and Technology
    • Place of Presentation
      千葉大学(千葉県)
    • Year and Date
      2011-06-23
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] High-speed deposition of fluorocarbon films by C_4F_8/H_2/Ar atmospheric-pressure inductively coupled plasma2011

    • Author(s)
      S.Tajima, T.Ichiki
    • Organizer
      The 33rd International Symposium on Dry Process
    • Place of Presentation
      京都ガーデンパレスホテル(京都府)
    • Year and Date
      2011-11-10
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] On/off pulse modulation of atmospheric-pressure helium/argon inductively coupled plasma microjet for plasma processing of polymers2010

    • Author(s)
      S. Tajima, S. Tsuchiya, M. Matsumori, S. Nakatsuka, and T. Ichiki
    • Organizer
      The 27th International conference of photopolymer science and technology(ICPST-27)
    • Place of Presentation
      千葉大学(千葉県)
    • Year and Date
      2010-06-24
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] Generation of pulse-modulated He and He/Ar atmospheric-pressure inductively coupled microjets2010

    • Author(s)
      S. Tajima, S. Tsuchiya, T. Numura, M. Matsumori, S. Nakatsuka, and T. Ichiki
    • Organizer
      第70回秋季応用物理学会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] Dynamic observation of the pulse-modulated atmospheric-pressure ICP microjets2010

    • Author(s)
      S.Tajima, T.Ichiki
    • Organizer
      20th Materials Research Society (MRS)-Japan Academic Symposium
    • Place of Presentation
      開港記念館(神奈川県)
    • Year and Date
      2010-12-21
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] Dynamic observation of the pulse-modulated atmospheric-pressure ICP microjets2010

    • Author(s)
      S. Tajima, and T. Ichiki
    • Organizer
      20th Materials Research Society(MRS)-Japan Academic Symposium
    • Place of Presentation
      開港記念館(神奈川県)
    • Year and Date
      2010-12-21
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] On/off pulse modulation of atmospheric-pressure helium/argon inductively coupled plasma microjet for plasma processing of polymers2010

    • Author(s)
      S.Tajima, S.Tsuchiya, M.Matsumori, S.Nakatsuka, T.Ichiki
    • Organizer
      The 27th International conference of photopolymer science and technology (ICPST-27)
    • Place of Presentation
      千葉大学(千葉県)
    • Year and Date
      2010-06-24
    • Data Source
      KAKENHI-PROJECT-22760051
  • [Presentation] Development of a atmospheric-pressure plasma chemical vapor deposition system for the reduction of the process variability

    • Author(s)
      S. Tajima, K. Yamada, K. Nanki, T. Nakajima, H. Yasuda, H. Kurita, K. Takashima, and A. Mizuno
    • Organizer
      Symposium for the promotion of the female science and engineering researcher
    • Place of Presentation
      豊橋技術科学大学
    • Year and Date
      2015-03-10 – 2015-03-15
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] The reaction between the etched product and the Si (100) surface during the chemical dry etching in F2 and NO gases

    • Author(s)
      S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, M. Sasaki, K. Yamakawa, and M. Hori
    • Organizer
      Gorden Research Conference Plasma Processing Science
    • Place of Presentation
      Bryant Univ., Smithfield, RI, USA
    • Year and Date
      2014-07-27 – 2014-07-30
    • Data Source
      KAKENHI-PROJECT-25600123
  • [Presentation] The reaction between the etched product and the Si (100) surface during the chemical dry etching in F2 and NO gases

    • Author(s)
      S. Tajima, T. Hayashi, K. Ishikawa, M. Sekine, M. Sasaki, K. Yamakawa, and M. Hori
    • Organizer
      Gorden Research Conference Plasma Processing Science
    • Place of Presentation
      Bryant Univ., Smithfield, RI, USA
    • Year and Date
      2014-07-27 – 2014-07-30
    • Data Source
      KAKENHI-PROJECT-26706022
  • [Presentation] Difference in chemical dry etching of Si related materials using NO and NO2

    • Author(s)
      S. Tajima, H. Hayashi, and M. Hori
    • Organizer
      The 20th Workshop on Advanced Plasma Processes and Diagnostics & The 7th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials
    • Place of Presentation
      北海道大学
    • Year and Date
      2015-01-27 – 2015-01-28
    • Invited
    • Data Source
      KAKENHI-PROJECT-25600123
  • 1.  近藤 博基 (50345930)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 2.  CVELVAR Uros
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 3.  SLOBODIAN Petr
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 4.  FAVIA Pietro
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 1 results
  • 5.  GRISTINA Roberto
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 1 results

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