TSUTSUMI Takayoshi 堤隆嘉

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Tsutsumi Takayoshi 堤隆嘉

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Researcher Number	50756137
Other IDs
Affiliation (Current)	2025: 名古屋大学, 低温プラズマ科学研究センター, 准教授
Affiliation (based on the past Project Information) *help	2023: 名古屋大学, 低温プラズマ科学研究センター, 講師 2018 – 2022: 名古屋大学, 低温プラズマ科学研究センター, 助教
Review Section/Research Field	Principal Investigator Basic Section 14030:Applied plasma science-related Except Principal Investigator Basic Section 14030:Applied plasma science-related / Basic Section 30010:Crystal engineering-related
Keywords	Principal Investigator プラズマエッチング / 活性種輸送 / 半導体製造プロセス / 高アスペクト比 / 高アスペクト / 輸送機構 / 半導体 / グリーンプロセス / 欠陥生成 / プラズマ … More / ラジカル吸着分布 / ダングリングボンド密度 / ラジカル吸着 / 半導体プロセス / 原子層エッチング / イオン誘起ダメージ … More Except Principal Investigator プラズマ / 電子衝突解離 / 電子衝突反応 / エッチング / コインシデンス分光 / シリコン酸化膜 / ハイドロフロオロカーボン / プラズマエッチング / in-situ観察 / 高移動度チャネル / InN / その場観察 / 窒化インジウム / モザイシティ / 高In組成 / プラズマ支援 / 分子線エピタキシー / InGaN / ラジカル Less

グリーンプラズマエッチングに向けた高アスペクト比孔内の活性種輸送特性の実験的解明Principal Investigator
- Principal Investigator
  
  堤隆嘉
- Project Period (FY)
  2023 – 2025
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 14030:Applied plasma science-related
- Research Institution
  Nagoya University
Innovation in atomically controlled engineering of plasma etching technology with builiding a collaborative environment for theory, computation, and measurement
- Principal Investigator
  
  Sekine Makoto
- Project Period (FY)
  2021 – 2023
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Review Section
  
  Basic Section 14030:Applied plasma science-related
- Research Institution
  Nagoya University
Elucidation of plasma-induced defect generation mechanism during atomic layer etchingPrincipal Investigator
- Principal Investigator
  
  Tsutsumi Takayoshi
- Project Period (FY)
  2020 – 2022
- Research Category
  
  Grant-in-Aid for Early-Career Scientists
- Review Section
  
  Basic Section 14030:Applied plasma science-related
- Research Institution
  Nagoya University
Study on initial growth mechanism of InN under high density radial irradiation for high carrier mobility channel
- Principal Investigator
  
  KONDO HIROKI
- Project Period (FY)
  2018 – 2020
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Review Section
  
  Basic Section 30010:Crystal engineering-related
- Research Institution
  Nagoya University

All 2024 2023 2022 2021 2020 2019 2018

All Journal Article Presentation

[Journal Article] <i>In situ</i> atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching2024
- Author(s)
  Tsutsumi Takayoshi、Asano Atsuki、Kondo Hiroki、Ishikawa Kenji、Sekine Makoto、Hori Masaru
- Journal Title
  
  Journal of Vacuum Science & Technology A
  
  Volume: 42 Issue: 3 Pages: 032603-032603
- DOI
  10.1116/6.0003432
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21H01073
[Journal Article] Bias-supply timing tailored to the aspect ratio dependence of silicon trench etching in Ar plasma with alternately injected C4F8 and SF62023
- Author(s)
  Yoshie Taito、Ishikawa Kenji、Nguyen Thi-Thuy-Nga、Hsiao Shih-Nan、Tsutsumi Takayoshi、Sekine Makoto、Hori Masaru
- Journal Title
  
  Applied Surface Science
  
  Volume: 638 Pages: 157981-157981
- DOI
  10.1016/j.apsusc.2023.157981
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-23K03367, KAKENHI-PROJECT-21H04451, KAKENHI-PROJECT-21H01073
[Journal Article] Manipulation of etch selectivity of silicon nitride over silicon dioxide to a-carbon by controlling substrate temperature with a CF4/H2 plasma2023
- Author(s)
  Hsiao Shih-Nan、Britun Nikolay、Nguyen Thi-Thuy-Nga、Tsutsumi Takayoshi、Ishikawa Kenji、Sekine Makoto、Hori Masaru
- Journal Title
  
  Vacuum
  
  Volume: 210 Pages: 111863-111863
- DOI
  10.1016/j.vacuum.2023.111863
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21H04451, KAKENHI-PROJECT-21H01073
[Journal Article] Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process2022
- Author(s)
  Sahu Bibhuti Bhusan、Nakane Kazuya、Ishikawa Kenji、Sekine Makoto、Tsutsumi Takayoshi、Gohira Taku、Ohya Yoshinobu、Ohno Noriyasu、Hori Masaru
- Journal Title
  
  Physical Chemistry Chemical Physics
  
  Volume: 24 Issue: 22 Pages: 13883-13896
- DOI
  10.1039/d2cp00289b
- Peer Reviewed / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Journal Article] Area-selective plasma-enhanced atomic layer etching (PE-ALE) of silicon dioxide using a silane coupling agent2022
- Author(s)
  Osonio Airah P.、Tsutsumi Takayoshi、Oda Yoshinari、Mukherjee Bablu、Borude Ranjit、Kobayashi Nobuyoshi、Hori Masaru
- Journal Title
  
  Journal of Vacuum Science & Technology A
  
  Volume: 40 Issue: 6 Pages: 062601-062601
- DOI
  10.1116/6.0002044
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20K14453
[Journal Article] Low‐temperature reduction of SnO 2 by floating wire‐assisted medium‐pressure H2/Ar plasma2022
- Author(s)
  Nguyen Thi‐Thuy‐Nga、Sasaki Minoru、Hsiao Shih‐Nan、Tsutsumi Takayoshi、Ishikawa Kenji、Hori Masaru
- Journal Title
  
  Plasma Processes and Polymers
  
  Volume: 19 Issue: 6 Pages: 2100209-2100209
- DOI
  10.1002/ppap.202100209
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21H01073
[Journal Article] Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis2022
- Author(s)
  Kurokawa Jumpei、Kondo Hiroki、Tsutsumi Takayoshi、Ishikawa Kenji、Sekine Makoto、Hori Masaru
- Journal Title
  
  Vacuum
  
  Volume: 205 Pages: 111351-111351
- DOI
  10.1016/j.vacuum.2022.111351
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21H01073, KAKENHI-PROJECT-20K14453
[Journal Article] Nitrogen Atom Density Measurements in NAGDIS-T Using Vacuum Ultraviolet Absorption Spectroscopy2022
- Author(s)
  Ryosuke Nishio, Shin Kajita, Hirohiko Tanaka, Koji Asaoka, Takayoshi Tsutsumi, Masaru Hori, Noriyasu Ohno
- Journal Title
  
  Plasma and Fusion Research
  
  Volume: 17 Issue: 0 Pages: 1201004-1201004
- DOI
  10.1585/pfr.17.1201004
- NAID
  130008144833
- ISSN
  1880-6821
- Year and Date
  2022-01-21
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21H01073, KAKENHI-PROJECT-20K20909, KAKENHI-PROJECT-20H00138
[Journal Article] Reaction Mechanism and Selectivity Control of Si Compound ALE Based on Plasma Modification and F-Radical Exposure2021
- Author(s)
  R H J Vervuurt, B Mukherjee, K Nakane, T Tsutsumi, M Hori, N Kobayashi
- Journal Title
  
  Langmuir
  
  Volume: 37 Issue: 43 Pages: 12663-12672
- DOI
  10.1021/acs.langmuir.1c02036
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21H01073
[Journal Article] 窒化物半導体プラズマエッチングにおける原子層反応制御と低ダメージプロセス2021
- Author(s)
  堤隆嘉，石川健治，近藤博基，関根誠，堀勝
- Journal Title
  
  プラズマ核融合学会誌
  
  Volume: 97 Pages: 517-521
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21H01073
[Journal Article] On the Etching Mechanism of Highly Hydrogenated SiN Films by CF4/D2 Plasma: Comparison with CF4/H22021
- Author(s)
  Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
- Journal Title
  
  Coatings
  
  Volume: 11 Issue: 12 Pages: 1535-1535
- DOI
  10.3390/coatings11121535
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-21H01073
[Journal Article] 窒化物半導体プラズマエッチングにおける原子層反応制御と低ダメージプロセス2021
- Author(s)
  堤　隆嘉、石川　健治、近藤　博基、関根　誠、堀　勝
- Journal Title
  
  プラズマ・核融合学会誌
  
  Volume: 97 Pages: 517-521
- Data Source
  KAKENHI-PROJECT-20K14453
[Journal Article] Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H2 plasma at different substrate temperatures2021
- Author(s)
  Shih‐Nan Hsiao, Nikolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
- Journal Title
  
  Plasma Processes and Polymers
  
  Volume: 18 Issue: 11 Pages: 2100078-2100078
- DOI
  10.1002/ppap.202100078
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21H01073, KAKENHI-PROJECT-20K14453
[Journal Article] Reaction science of layer-by-layer thinning of graphene with oxygen neutrals at room temperature2020
- Author(s)
  Sugiura Hirotsugu、Kondo Hiroki、Higuchi Kimitaka、Arai Shigeo、Hamaji Ryo、Tsutsumi Takayoshi、Ishikawa Kenji、Hori Masaru
- Journal Title
  
  Carbon
  
  Volume: 170 Pages: 93-99
- DOI
  10.1016/j.carbon.2020.07.052
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20K14453
[Journal Article] In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicals2020
- Author(s)
  Hasegawa Masaki、Tsutsumi Takayoshi、Tanide Atsushi、Nakamura Shohei、Kondo Hiroki、Ishikawa Kenji、Sekine Makoto、Hori Masaru
- Journal Title
  
  Journal of Vacuum Science & Technology A
  
  Volume: 38 Issue: 4 Pages: 042602-042602
- DOI
  10.1116/6.0000124
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20K14453, KAKENHI-PROJECT-18H01890
[Presentation] Transient behavior of cycle process in Ar plasma with alternately injected C4F8 and SF62023
- Author(s)
  Taito Yoshie, Kenji Ishikawa, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Takayoshi Tsutsumi, Makoto Sekine, and Masaru Hori
- Organizer
  13th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2023), 2023/11/5-8, Busan, Korea
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Self-limited fluorination of electron-beam-irradiated GaN surface2023
- Author(s)
  Yusuke Izumi, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori
- Organizer
  ISPlasma2023 / IC-PLANTS2023
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] A comparative study on the CF4/H2 and HF/H2 plasmas for etching of highly hydrogenated SiN films2023
- Author(s)
  Shih-Nan Hsiao, Nikolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
- Organizer
  25th International Symposium on Plasma Chemistry (ISPC25), 2023/5/21-26, Kyoto, Japan
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Plasma-based pseudo-wet mechanism for cryogenic SiO2 etching using hydrogen-contained fluorocarbon gases with an in-situ surface analysis2023
- Author(s)
  Shih-Nan Hsiao, Makoto Sekine, Takayoshi Tsutsumi, Kenji Ishikawa, Manabu Iwata, Maju Tomura, Yuki Iijima, Taku Gohira, Keiichi Matsushima, Yoshinobu Ohya, Masaru Hori
- Organizer
  The 76th Annual Gaseous Electronics Conference (GEC76), 2023/10/9-13, Michigan, USA
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Etch selectivities of SiO2 and SiN against a-C films using CF4/H2 plasma at low temperature2023
- Author(s)
  Y. Imai, S-N. Hsiao, M. Sekine, K. Ishikawa, T. Tsutsumi, M. Iwata, M. Tomura,Y. Iijima, K. Matsushima and M. Hori
- Organizer
  The 44th International Symposium on Dry Process (DPS2023), 2023/11/21-22, Nagoya, Japan
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] 容量結合型パルスプラズマにおける負イオンの電極材料依存性2023
- Author(s)
  都地一輝、堤隆嘉、蕭世男、関根誠、石川健治、堀勝
- Organizer
  第84回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-23K03367
[Presentation] Study on plasma process using adsorbed C7F14 as an etchant2023
- Author(s)
  Kohei Masuda,Makoto Sekine, Kenji Ishikawa, Shih-Nan Hsiao,Takayoshi Tsutsumi,Hiroki Kondo, and Masaru Hori
- Organizer
  ISPlasma2023 / IC-PLANTS2023
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Control of etching profile by bias supply timing in cyclic process using C4F8/SF6 gas modulated plasma2023
- Author(s)
  T. Yoshie, K. Ishikawa, T. Tsutsumi, M. Sekine, M. Hori
- Organizer
  The 44th International Symposium on Dry Process
- Data Source
  KAKENHI-PROJECT-23K03367
[Presentation] Compositions of Ions Related with Electrode Materials in Pulsed Plasma for High-Aspect-Ratio Hole Etching2023
- Author(s)
  K. Toji, T. Tsutsumi, S-N. Hsiao, M. Sekine, M. Hori, K. Ishikawa
- Organizer
  The 44th International Symposium on Dry Process
- Data Source
  KAKENHI-PROJECT-23K03367
[Presentation] A pseudo-wet cryogenic plasma etching of SiO2 investigated with in-situ surface monitoring2023
- Author(s)
  S-N Hsiao, M. Sekine, K. Ishikawa, T.Tsutsumi, and M. Hori Y Iijima, R. Suda, Y. Kihara
- Organizer
  The 44th International Symposium on Dry Process (DPS2023), 2023/11/21-22, Nagoya, Japan
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Electron-Beam-Assisted Self-limiting fluorination of GaN surface using XeF2 for Atomic Layer Etching2023
- Author(s)
  Y. Izumi, T. Tsutsumi, H Kondo, M. Sekine, M. Hori, and K. Ishikawa
- Organizer
  The 44th International Symposium on Dry Process (DPS2023), 2023/11/21-22, Nagoya, Japan
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Characterization of plasmas and polymerized hydrofluorocarbon films in capacitively coupled CF4/H2 plasmas2023
- Author(s)
  Yusuke Imai, Shih-Nan Hsiao, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
- Organizer
  ISPlasma2023 / IC-PLANTS2023
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Etching Selectivities of SiO2 and SiN Against a-C Films Using CF4/H2 with a Pseudo-Wet Plasma Etching Mechanism2023
- Author(s)
  Yusuke Imai, S. Hsiao, M. Sekine, T. Tsutsumi, K. Ishikawa, M. Iwata, M. Tamura, Y. Iijima, T. Gohira, K. Matsushima, Y. Ohya, M. Hori,
- Organizer
  AVS 69th International Symposium and Exhibition (AVS 69), 2023/11/5-10, Portland, USA
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Self-Limited Fluorination of Electron Beam-Irradiated GaN Surface2023
- Author(s)
  Yusuke Izumi, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine and Masaru Hori
- Organizer
  ISPlasma2023/IC-PLANTS2023
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] Positive and negative ion behaviors in DC-imposed Ar/SF6 pulsed plasma2023
- Author(s)
  Kazuki Toji, Takayoshi Tsutsumi, Kenji Ishikawa, S-N. Hsaio, Makoto Sekine, and Masaru Hori
- Organizer
  ISPlasma2023 / IC-PLANTS2023
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Control of etching profile by bias supply timing in cyclic process using C4F8/SF6 gas modulated plasma2023
- Author(s)
  T. Yoshie, K. Ishikawa, T. Tsutsumi, M. Sekine, and M. Hori
- Organizer
  The 44th International Symposium on Dry Process (DPS2023), 2023/11/21-22, Nagoya, Japan
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Global and local contribution analysis of process parameters in Plasma enhanced chemical vapor deposition of amorphous carbon har2023
- Author(s)
  Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
- Organizer
  The 4th International Conference on Data Driven Plasma Sciences ( ICDDPS-4 ), 2023/4/16-21, Okinawa, Japan
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Compositions of Ions Related with Electrode Materials in Pulsed Plasma for High-Aspect-Ratio Hole Etching2023
- Author(s)
  K. Toji, T. Tsutsumi, S-N. Hsiao, M. Sekine, M. Hori, and K. Ishikawa
- Organizer
  The 44th International Symposium on Dry Process (DPS2023), 2023/11/21-22, Nagoya, Japan
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] A pseudo-wet plasma etching mechanism for SiO2 at cryogenic temperature using hydrogen fluoride gas with in-situ surface monitoring2023
- Author(s)
  Shih-Nan Hsiao, Makoto Sekine, Yuki Iijima, Ryutaro Suda, Yoshinobu Ohya, Yoshihide Kihara, Takayoshi Tsutsumi, Kenji Ishikawa, Masaru Hori
- Organizer
  AVS 69th International Symposium and Exhibition (AVS 69), 2023/11/5-10, Portland, USA
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Contribution analysis of process parameters in plasma-enhanced chemical vapor deposition of amorphous carbon2023
- Author(s)
  Yusuke Ando, Jumpei Kurokawa, Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine and Masaru Hori
- Organizer
  ISPlasma2023 / IC-PLANTS2023
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] パルスプラズマにおける負イオンエネルギー分布の時間分解測定2023
- Author(s)
  都地一輝, 堤隆嘉, 蕭世男, 関根誠, 堀勝, 石川健治
- Organizer
  第71回応用物理学会春期学術講演会
- Data Source
  KAKENHI-PROJECT-23K03367
[Presentation] Positive and Negative Ion Behaviors in DC-Imposed Ar/SF6 Pulsed Plasma2023
- Author(s)
  Kazuki Toji, Takayoshi Tsutsumi, Kenji Ishikawa, Shih-Nan Hsiao, Makoto Sekine and Masaru Hori
- Organizer
  ISPlasma2023/IC-PLANTS2023
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] C2F6/H2混合ガスを用いてラジカル注入型プラズマ励起化学気相堆積法により成長させたカーボンナノウォールのモフォロジー制御2022
- Author(s)
  橋本拓海、近藤博基、石川健治、堤隆嘉、関根誠、平松美根男、堀勝
- Organizer
  The 39th Symposium on plasma processing / 34th Symposium on Plasma Science for Materials (SPP39/SPSM34)
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Langmuir probe and Laser Photodetachment Study of Afterglow Phase in Dual RF Frequency Pulsed Plasma Etching Processes Operated with Synchronized DC Bias2022
- Author(s)
  Makoto Sekine, Bibhuti B Sahu, Shogo Hattori, Takayoshi Tsutsumi, Nikolay Britun, Kenji Ishikawa, Hirohiko Tanaka, Taku Gohira, Noriyasu Ohno, and Masaru Hori
- Organizer
  11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] C3H6/H2プラズマを用いた水素化アモルファスカーボン成膜における成膜前駆体と膜特性の相関関係2022
- Author(s)
  黒川純平、光成正、近藤博基、堤隆嘉、関根誠、石川健治、堀勝
- Organizer
  第69回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Topographically-selective Atomic Layer Etching of SiO2 using fluorine-containing plasma2022
- Author(s)
  Airah P Osonio, Takayoshi Tsutsumi, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, and Masaru Hori
- Organizer
  11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Isotropic Plasma-enhanced Atomic Layer Etching of SiO2 using F radicals and Ar plasma2022
- Author(s)
  A.Osonio, T.Tsutsumi, B.Mukherjee, R.Borude, N.Kobayashi, M.Hori
- Organizer
  43rd International Symposium on Dry Process Symposium (DPS 2022)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Time-resolved measurement of ion energy distribution in pulsed Ar/SF6 plasma2022
- Author(s)
  Kazuki TOJI, Kenji ISHIKAWA, Takayoshi TSUTSUMI, Shih nan HSIAO, Makoto SEKINE, Masaru HORI
- Organizer
  第32回日本MRS年次大会
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] Study of etching process using CHF3 gas condensed layer in cryogenic region2022
- Author(s)
  Kuangda Sun, Chieh-Ju Liao, Shih-Nan Hsiao, Makoto Sekine, Toshiyuki Sasaki, Chihiro Abe, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
- Organizer
  1st International Workshop on Plasma Cryogenic Etching Processes (PlaCEP2022)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Manipulation of etch selectivity of silicon nitride over silicon dioxide by controlling substrate temperature with a CF4/H2 plasma2022
- Author(s)
  Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
- Organizer
  14th International Symposium on Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials / 15th International Conference on Plasma Nanotechnology and Science
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] Ion Induced Damage in Plasma Enhanced Atomic Layer Etching Processing2022
- Author(s)
  Takayoshi TSUTSUMI, Hiroki KONDO, Kenji ISHIKAWA, Makoto SEKINE, Masaru HORI
- Organizer
  32nd Anuual Meeting on Material Researh Society of Japan (MRS-J)
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Ion Induced Damage in Plasma Enhanced Atomic Layer Etching Processing2022
- Author(s)
  Takayoshi TSUTSUMI, Hiroki KONDO, Kenji ISHIKAWA, Makoto SEKINE, Masaru HORI
- Organizer
  第32回日本MRS年次大会
- Invited
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] C4F8/SF6ガス変調サイクルにおいてバイアス印加位相がエッチング形状に及ぼす影響2022
- Author(s)
  吉江泰斗、堤隆嘉、石川健治、近藤博基、関根誠、堀勝
- Organizer
  第69回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] 窒化ガリウムの基板昇温時サイクルエッチング特性2022
- Author(s)
  南吏玖、中村昭平、谷出敦、石川健治、堤隆嘉、近藤博基、関根誠、堀勝
- Organizer
  第69回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Time-resolved measurement of ion energy distribution in pulsed Ar/SF6 plasma2022
- Author(s)
  Kazuki TOJI, Kenji ISHIKAWA, Takayoshi TSUTSUMI, Shih nan HSIAO, Makoto SEKINE, Masaru HORI
- Organizer
  32nd Anuual Meeting on Material Researh Society of Japan (MRS-J)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Isotropic Plasma-enhanced Atomic Layer Etching of SiO2 using F radicals and Ar plasma2022
- Author(s)
  A. Osonio, T. Tsutsumi, B. Mukherjee, R. Borude, N. Kobayashi, and M. Hori
- Organizer
  The 43rd International Symposium on Dry Process
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] Nanoscale Dry Processes for Controlling Atomic Layer Reactions and Fabrication of High-Aspect-Ratio Features2022
- Author(s)
  Kenji Ishikawa, Thi-Thuy-Nga Nguye, Takayoshi Tsutsumi, S-N Hsaio, Makoto Sekine, and Masaru Hori
- Organizer
  Korean International Semiconductor Conference on Manufacturing Technology 2022 (KISM 2022)
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Deposition mechanism of hydrogenated amorphous carbon film by C3H6/H2 mixture gas plasma2022
- Author(s)
  Hiroki Kondo, Jumpei Kurokawa, Takayoshi Tsutsumi, Makoto Sekine, Kenji Ishikawa, and Masaru Hori
- Organizer
  11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Synthesis, Functionalization, and Three-Dimensional Structuring of Carbon Nanomaterials By Gas-Liquid Interface Plasma2022
- Author(s)
  H. Kondo, T. Tsutsumi, K. Ishikawa, M. Sekine, and M. Hori
- Organizer
  242nd ECS Meeting
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Interfacial reaction of gas-liquid plasma in the synthesis of functional carbon nanomaterials2022
- Author(s)
  Hiroki Kondo, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
- Organizer
  5th International Union of Material Research Societies, International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM 2022)
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Nanostructure Control and Modification of Poly(styrene-b-2-vinylpyridine) Block Copolymer in H2/N2 Plasma Process2022
- Author(s)
  Ma. shanlene Dela Cruz DELA VEGA, Ayane KITAHARA, Thi-thuy-nga NGUYEN, Takayoshi TSUTSUMI, Atsushi TAKANO, Yushu MATSUSHITA, Masaru HORI
- Organizer
  5th International Union of Material Research Societies, International Conference of Young Researchers on Advanced Materials (IUMRS-ICYRAM 2022)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Highly efficient exosome capture by carbon nanowalls template2022
- Author(s)
  Takumi Hashimoto, Hiroki Kondo, Hiromasa Tanaka, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Takao Yasui, Yoshinobu Baba, Mineo Hiramatsu, and Masaru Hori
- Organizer
  11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] In situ monitoring hydrogen fluoride molecular density and its effects on etch selectivity of SiN over SiO2 films with hydrogen-contained fluorocarbon down-flow plasmas2022
- Author(s)
  Shih-Nan Hsiao, Nicolay Britun, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
- Organizer
  22ND INTERNATIONAL VACUUM CONGRESS IVC-22
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Area-Selective Atomic Layer Etching of SiO2 Using Silane Coupling Agent2022
- Author(s)
  A. Osonio, Takayoshi Tsutsumi, Nagoya B. Mukherjee, R. Borude, N. Kobayashi, M. Hori
- Organizer
  22nd Atomic layer deposition and 9th atomic layer etching workshop (ALD/ALE Workshop)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Plasma diagnostics and characteristics of hydrofluorocarbon films in capacitively coupled CF4/H2 plasmas2022
- Author(s)
  Shih-Nan Hsiao, Yusuke Imai, Nicolay Britun, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
- Organizer
  International Symposium on Semiconductor Manufacturing (ISSM 2022)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Transient Behaviors of Gaseous and Surface Reactions in a Cycle of Passivation and Etch Steps Using Ar-Based C4F8 and SF6 Plasma2022
- Author(s)
  Kenji Ishikawa, Taito Yoshie, Takayoshi Tsutsumi, Hiroki Kondo, Makoto Sekine, and Masaru Hori
- Organizer
  2022 MRS Spring Meeting & Exhibit
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition2022
- Author(s)
  Hiroki Kondo, Jumpei Kurokawa, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, and Masaru Hori
- Organizer
  22ND INTERNATIONAL VACUUM CONGRESS IVC-22
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Topographically-selective atomic layer etching of SiO2 using fluorine-containing plasma2022
- Author(s)
  Airah Osonio, Takayoshi Tsutsumi, Bablu Mukherjee, Ranjit Borude, Nobuyoshi Kobayashi, and Masaru Hori
- Organizer
  11th International Conference on Reactive Plasmas/2022 Gaseous Electronics Conference
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] Achieving selective etching of SiN and SiO2 over amorphous carbon during CF4/H2 by controlling substrate temperature2022
- Author(s)
  Shih-Nan Hsiao, Thi-Thuy-Nga Nguyen, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
- Organizer
  11th ICRP/ 2022 GEC/ 40th SPP-40/ 35th SPSM35
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] 原子層エッチングの反応素過程とその設計、制御2021
- Author(s)
  石川健治, Nguyen Thi-Thuy-Nga, 堤隆嘉, 蕭世男, 近藤博基, 関根誠, 堀勝
- Organizer
  第82回秋季応用物理学会
- Invited
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Initial growth kinetics of hydrogenated amorphous carbon films observed by real-time ellipsometry2021
- Author(s)
  Jumpei Kurokawa, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi,Makoto Sekine and Masaru Hori
- Organizer
  ISPlasma2021/IC-PLANTS2021
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] C3H6 / H2プラズマを用いたアモルファスカーボン成膜において水素ガス流量比が膜特性に与える影響2021
- Author(s)
  黒川純平, 光成正, 堤隆嘉, 近藤博基, 関根誠, 石川健治, 堀勝
- Organizer
  第82回秋季応用物理学会
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] 塩素吸着による窒化ガリウム原子層エッチングの表面反応の理想と現実2021
- Author(s)
  堤隆嘉, 長谷川将希, 中村昭平, 谷出敦，近藤博基, 関根誠, 石川健治, 堀勝
- Organizer
  第227回　シリコンテクノロジー分科会　研究集会
- Invited
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] Optical transmission of carbon nanowalls from ultra-violet region to infra-red region2021
- Author(s)
  Shintaro Iba, Hiroki Kondo, Kenji Ishikawa, Takayoshi Tsutsumi, Makoto Sekine, Mineo Hiramatsu, and Masaru Hori
- Organizer
  Material Research Meeting (MRM 2020)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Ar/C4F8/SF6を用いたガス変調サイクルプロセスにおける活性種の挙動2021
- Author(s)
  吉江泰斗, 堤隆嘉, 石川健治, 堀勝
- Organizer
  第82回秋季応用物理学会
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Control of Interface Layers for Selective Atomic Layer Etching2021
- Author(s)
  Takayoshi Tsutsumi, R. Vervuurt, N. Kobayashi, and Masaru Hori
- Organizer
  67th AVS International Symposium and Exhibition
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] Random forest model for property control of plasma deposited hydrogenated amorphous carbon films2021
- Author(s)
  Junpei Kurokawa, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, and Masaru Hori
- Organizer
  42nd International Symposium on Dry Process (DPS)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] リモート酸素ラジカルによるグラフェンのエッチング反応の分析2021
- Author(s)
  胡留剛、堤隆嘉、蕭世男、近藤博基、石川健治、関根誠、堀勝
- Organizer
  2021年第68回応用理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] 窒化ガリウムのプラズマエッチング中その場分光エリプソメトリー観測2021
- Author(s)
  南吏玖, 石川健治, 堤隆嘉, 近藤博基, 関根誠, 小田修, 堀勝
- Organizer
  第82回秋季応用物理学会
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] Quantitative analyses of graphene layer etching using oxygen radicals generated in remote plasma for realization of atomic layer etching2021
- Author(s)
  Liugang Hu, Takayoshi Tsutsumi, Thi-Thuy-Nga Nguyen, Shih-Nan Hsiao, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
- Organizer
  ISPlasma2021/IC-PLANTS2021
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] Random forest model for property control of plasma2021
- Author(s)
  J. Kurokawa, T. Tsutsumi, K. Ishikawa, H. Kondo, M. Sekine, and M. Hori
- Organizer
  The 42nd International Symposium on Dry Process (DPS2021)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] 窒化ガリウムのプラズマエッチング中その場分光エリプソメトリー観測2021
- Author(s)
  南吏玖、石川健治、堤隆嘉、近藤博基、関根誠、小田修、堀勝
- Organizer
  第82回　応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] Behavior of Hydrogen Atom in Atmospheric Pressure Micro-Hollow Cathode Discharge2021
- Author(s)
  Keigo Takeda, Takayoshi Tsutsumi, Mineo Hiramatsu, Masaru Hori
- Organizer
  12th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] Transient effects in cyclic processes on fabrications of high-aspect-ratio trenches2021
- Author(s)
  Taito Yoshie, Takayoshi Tsutsumi, Kenji Ishikawa, and Masaru Hori
- Organizer
  42nd International Symposium on Dry Process (DPS)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21H01073
[Presentation] 塩素吸着を用いた窒化ガリウムの原子層エッチングプロセス特性のArイオンエネルギー依存性2021
- Author(s)
  堤隆嘉、長谷川将希、中村昭平、谷出敦、近藤博基、関根誠、石川健治、堀勝
- Organizer
  2021年第68回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] 塩素吸着を用いた窒化ガリウムの原子層エッチングプロセス特性のArイオンエネルギー依存性2020
- Author(s)
  堤隆嘉、長谷川将希、中村昭平、谷出敦、近藤博基、関根誠、石川健治、堀勝
- Organizer
  2021年第68回応物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-18H01890
[Presentation] Analysis of Ion Energy Dependence of Depth Profile of GaN by In-situ Surface Analysis2020
- Author(s)
  Masaki Hasagawa, Takayoshi Tsutsumi, Atsushi Tanide, Shohei Nakamura, Hiroki Kondo, Kenji Ishikawa, Masaru Hori
- Organizer
  20th International Conference on Atomic Layer Deposition
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H01890
[Presentation] Analysis of Ion Energy Dependence of Depth Profile of GaN by In-situ Surface Analysis2020
- Author(s)
  Masaki Hasagawa, Takayoshi Tsutsumi, Atsushi Tanide, Shohei Nakamura, Hiroki Kondo, Kenji Ishikawa, Masaru Hori
- Organizer
  20th International Conference on Atomic Layer Deposition
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20K14453
[Presentation] Arイオン照射窒化ガリウム表面の塩素吸着層のイオンエネルギー依存性2020
- Author(s)
  長谷川将希, 堤隆嘉, 谷出敦, 近藤博基, 関根誠, 石川健治, 堀勝
- Organizer
  第67回応用物理学関係連合講演会
- Invited
- Data Source
  KAKENHI-PROJECT-18H01890
[Presentation] プラズマ支援原子層プロセスにおける表界面反応層制御・診断2019
- Author(s)
  堤隆嘉, 近藤博基, 石川健治, 関根誠, 堀勝
- Organizer
  第４回 Atomic Layer Process (ALP) Workshop
- Invited
- Data Source
  KAKENHI-PROJECT-18H01890
[Presentation] In-situ analysis of GaN surfaces irradiated by a Cl2 plasma for atomic layer etching2019
- Author(s)
  M. Hasegawa, K. Ishikawa, T. Tsutsumi, M. Sekine, H. Kondo, A. Tanide, M. Hori
- Organizer
  16th Akasaki Research Center Symposium
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H01890
[Presentation] In-situ surface analysis of Ga dangling sites and chlorination layers for determining atomic layer etching properties of GaN2019
- Author(s)
  Masaki Hasegawa, Takayoshi Tsutsumi, Atsushi Tanide, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, and Masaru Hori
- Organizer
  12th Asian-European International Conference on Plasma Surface Engineering (AEPSE)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H01890
[Presentation] Arイオン照射窒化ガリウム表面の塩素吸着層のイオンエネルギー依存性2019
- Author(s)
  長谷川将希, 堤隆嘉, 近藤博基, 関根誠, 石川健治, 堀勝
- Organizer
  第80回応用物理学会学術講演会
- Data Source
  KAKENHI-PROJECT-18H01890
[Presentation] Precisely wafer-temperature-controlled plasma etching and its application for nano-scale pattern fabrication of organic material2019
- Author(s)
  Makoto Sekine, Yusuke Fukunaga, Takayoshi Tsutsumi, Kenji Ishikawa, Hiroki Kondo, Masaru Hori
- Organizer
  24th International Symposium on Plasma Chemistry (ISPC24)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H01890
[Presentation] Chlorinated surface layer of GaN in quasi atomic layer etching of cyclic processes of chlorine adsorption and ion irradiation2019
- Author(s)
  Masaki Hasegawa, Takayoshi Tsutsumi, Atsushi Tanide, Hiroki Kondo, Makoto Sekine, Kenji Ishikawa, and Masaru Hori
- Organizer
  AVS 19th International Conference on Atomic Layer Deposition (ALD 2019)/6th International Atomic Layer Etching Workshop (ALE 2019)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H01890
[Presentation] In situ analysis of ion-irradiated and chlorinated GaN surface during cyclic etching processes2018
- Author(s)
  M. Hasegawa, T. Tsutsumi, A. Tanide, H. Kondo, M. Sekine, K. Ishikawa, M. Hori
- Organizer
  Dry Process Symposium
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H01890
[Presentation] Novel Epitaxial Growth Methods for Nitride Materials with Using Plasma Technology2018
- Author(s)
  Osamu Oda, Frank Wilson Amalraj, Naohiro Shimizu, Hiroki Kondo, Makoto Sekine, Yuri Tsutsumi, Kenji Ishikawa, H. Kano, Nobuyuki Ikarashi and Masaru Hori
- Organizer
  Energy Materials Nanotechnology
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H01890
[Presentation] In situ Quantitative Analysis of Chlorine Adsorption on Ion-irradiated GaN for Atomic Layer Etching2018
- Author(s)
  Masaki Hasegawa, Takayoshi Tsutsumi, Hiroki Kondo, Kenji Ishikawa, Masaru Hori
- Organizer
  5th ALE Workshop
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H01890
[Presentation] Novel Epitaxial Growth Methods for Nitride Materials with Using Plasma Technology2018
- Author(s)
  Osamu Oda, Frank Wilson Amalraj, Naohiro Shimizu, Hiroki Kondo, Makoto Sekine, Yuri Tsutsumi, Kenji Ishikawa, H. Kano, Nobuyuki Ikarashi and Masaru Hori
- Organizer
  International Meeting on Information Display
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H01890

1. KONDO HIROKI (50345930)

# of Collaborated Projects: 1 results

# of Collaborated Products: 13 results
2. Sekine Makoto (80437087)

# of Collaborated Projects: 1 results

# of Collaborated Products: 44 results
3. 小田修 (30588695)

# of Collaborated Projects: 1 results

# of Collaborated Products: 2 results
4. 石川健治 (60417384)

# of Collaborated Projects: 1 results

# of Collaborated Products: 49 results

TSUTSUMI Takayoshi 堤 隆嘉

Tsutsumi Takayoshi 堤 隆嘉

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グリーンプラズマエッチングに向けた高アスペクト比孔内の活性種輸送特性の実験的解明Principal Investigator

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Innovation in atomically controlled engineering of plasma etching technology with builiding a collaborative environment for theory, computation, and measurement

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Elucidation of plasma-induced defect generation mechanism during atomic layer etchingPrincipal Investigator

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Study on initial growth mechanism of InN under high density radial irradiation for high carrier mobility channel

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[Journal Article] <i>In situ</i> atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching2024

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[Journal Article] Bias-supply timing tailored to the aspect ratio dependence of silicon trench etching in Ar plasma with alternately injected C4F8 and SF62023

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[Journal Article] Manipulation of etch selectivity of silicon nitride over silicon dioxide to a-carbon by controlling substrate temperature with a CF4/H2 plasma2023

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[Journal Article] Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process2022

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[Journal Article] Area-selective plasma-enhanced atomic layer etching (PE-ALE) of silicon dioxide using a silane coupling agent2022

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[Journal Article] Low‐temperature reduction of SnO 2 by floating wire‐assisted medium‐pressure H2/Ar plasma2022

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[Journal Article] Effects of deposition precursors of hydrogenated amorphous carbon films on the plasma etching resistance based on mass spectrometer measurements and machine learning analysis2022

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[Journal Article] Nitrogen Atom Density Measurements in NAGDIS-T Using Vacuum Ultraviolet Absorption Spectroscopy2022

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[Journal Article] Reaction Mechanism and Selectivity Control of Si Compound ALE Based on Plasma Modification and F-Radical Exposure2021

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[Journal Article] 窒化物半導体プラズマエッチングにおける原子層反応制御と低ダメージプロセス2021

Author(s)

TSUTSUMI Takayoshi 堤隆嘉

Tsutsumi Takayoshi 堤隆嘉