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SUZUKI Eisuke  鈴木 英佐

ORCIDConnect your ORCID iD *help
Researcher Number 60113007
External Links
Affiliation (based on the past Project Information) *help 2005: 東京工芸大学, 情報処理教育研究センター, 助教授
2001 – 2005: 東京工芸大学, 工学部, 助教授
1998 – 1999: 東京工芸大学, 工学部, 助教授
1995: Tokyo Institute of Polytechnics, Faculty of Engineering, Associate professor, 工学部, 助教授
1995: 東京工芸大学, 情報処理教育研究センター, 助教授
1989 – 1994: 東京工芸大学, 工学部, 講師
Review Section/Research Field
Except Principal Investigator
Electronic materials/Electric materials / 電子材料工学 / Electronic materials/Electric materials / 電力工学・電気機器工学
Keywords
Except Principal Investigator
スパッタ / 対向ターゲット式スパッタ / Facing target sputtering / 軟磁性薄膜 / 窒化鉄薄膜 / プラズマ源 / 低温成膜 / 液体窒素温度堆積 / 低電圧スパッタ / バリウムフェライト薄膜 … More / 高飽和磁化 / Soft magnetic thin films / 薄膜ヘッド / スパッタ形プラズマ源 / 対向ターゲット式スパッタ法 / イオンビームデポジッション / 薄膜 / 対向タ-ゲット式スパッタ / イオンビ-ムデポジッション / 対向タ-ゲット式スパッタ法 / surface smoothness / Stress free / plastic substrate / dual sputtering / damage-less deposition / low temperature deposition / Transparent conductive film / ITO / 高速成膜 / 低ダメージ / スパッタ法 / デュアルスパッタ / 自己陰影効果 / 液体窒素温度成膜 / 低ダメージスパッタ / Zn添加 / ITO薄膜 / 表面平滑性 / 応力フリー / プラスチック基板 / 対向ターゲット式スパ多 / デュアルスパッタ法 / 低ダメージスパッタ法 / 透明導電膜 / Pulse sputtering / Low voltage sputtering / Permalloy under layer / Fe film / Fe-Co film / Low temperature deposition / Fe-Co合金 / 純鉄膜 / パルスプラズマ / パーマロイト不地膜 / Fe-Co薄膜 / Fe薄膜 / パルススパッタ / 高飽和磁化軟磁性薄膜 / sputter beam deposition / Deposition at liquid nitrogen temperature / low voltage sputtering / microstructure of film / BaM film / supptered thin films / 低エネルギースパッタ / 液体窒素温度堆積法 / スパッタビーム堆積法 / 微細構造制御 / スパッタ膜 / hexagonal ferrite / ZnO under layr / magnetic recording medium / facing target sputtering / alternate periodic layr deposition method / barium ferrite thin film / 磁気的相互作用 / ZnO薄膜 / 原子層成長 / 垂直磁気記録 / 微粒子化 / スパッタリング / 磁気記録媒体 / バリウムフェライト / Complex Transfer Function / Detection Method of frequency / Stability of System Voltage / Harmonics Suppression / Voltage Drop Compensation / Series Active Filter / Active Reactance / Active Capacitance / FACTS / 電圧降下補償システム / 電源電圧安定化システム / アクティブフィルタ / 高周波抑制 / 複素伝達関数 / 電源周波数検出法 / 系統電圧安定度 / 高調波抑制 / 電圧降下補償 / 直列アクティブフィルタ / アクティブリアクタンス / アクティブキャパシタンス / THIN FILM HEAD / HIGH SATURATION MAGNETIZATION / SOFT MAGNETIC THIN FILM / ION BEAM DEPOSITION / SPUTTERING / PLASMA SOURCE / IRON NITRIDE FILM / 磁気ヘッド材料 / Sputtering type plasma source / Ion beam deposition / Iron nitride thin film / 多層膜 / プラズマ / 軟磁性膜 / Oxide Superconducting thin Film / Co-Cr thin Film / Iron Nitride thin Film / Metal Ion Source / Ion Beam Deposition / Facing Targets Sputtering / Plasma Source / Sputtering Type Ion Source / イオン源 / 酸化物超伝導体 / ビ-ム・プラズマ相互作用 / 酸化物高温超伝導体 / 高速スパッタ / 酸化物超伝導体薄膜 / CoーCr薄膜 / 金属イオン / スパッタ形イオン源 Less
  • Research Projects

    (8 results)
  • Co-Researchers

    (7 People)
  •  Development of high rate sputtering system for the deposition of transparent conductive thin films with low resistivity and high adhesion on plastic film substrate.

    • Principal Investigator
      HOSHI Yoichi
    • Project Period (FY)
      2004 – 2005
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      Electronic materials/Electric materials
    • Research Institution
      Tokyo Polytechnic University
  •  Development of soft magnetic thin films with large saturation magnetization for magnetic recording head by sputter-deposition at liquid nitrogen temperature

    • Principal Investigator
      HOSHI Yoichi
    • Project Period (FY)
      2001 – 2003
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      Electronic materials/Electric materials
    • Research Institution
      Tokyo Polytechnic University
  •  Development of sputter deposition method to control microstructure of thin film magnetic recording media with ultra high density.

    • Principal Investigator
      HOSHI Yoichi
    • Project Period (FY)
      1998 – 1999
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      Electronic materials/Electric materials
    • Research Institution
      Tokyo Institute of Polytechnics
  •  RESEARCH ON SERIES ACTIVE CAPACITANCE TO POWER SYSTEMS

    • Principal Investigator
      NABAE Akira
    • Project Period (FY)
      1994 – 1995
    • Research Category
      Grant-in-Aid for General Scientific Research (C)
    • Research Field
      電力工学・電気機器工学
    • Research Institution
      TOKYO INSTITUTE OF POLYTECHNICS
  •  Development of hightly oriented and low noise barium ferrite thin film media for high density magnetic recording

    • Principal Investigator
      HOSHI Yoichi
    • Project Period (FY)
      1994 – 1995
    • Research Category
      Grant-in-Aid for General Scientific Research (C)
    • Research Field
      Electronic materials/Electric materials
    • Research Institution
      Tokyo Institute of Polytechnics
  •  Deposition of Iron Nitride Films with Large Saturation Magnetization by Using a Sputtering Type Plasma Source.

    • Principal Investigator
      HOSHI Yoichi
    • Project Period (FY)
      1992 – 1993
    • Research Category
      Grant-in-Aid for General Scientific Research (C)
    • Research Field
      電子材料工学
    • Research Institution
      TOKYO INSTITUTE OF POLYTECHNICS
  •  Deposition of Iron Nitride Soft Magnetic Thin Films with Giant Saturation Magnetization by Sputtering type Plasma Source

    • Principal Investigator
      HOSHI Yoichi
    • Project Period (FY)
      1990 – 1991
    • Research Category
      Grant-in-Aid for General Scientific Research (C)
    • Research Field
      電子材料工学
    • Research Institution
      Tokyo Institute of Polytechnics
  •  Development of Sputtering Type Large Current Ion Source and its Application for the Synthesis of Superconducting Oxide thin Films.

    • Principal Investigator
      HOSHI Yoichi
    • Project Period (FY)
      1989 – 1990
    • Research Category
      Grant-in-Aid for Developmental Scientific Research
    • Research Field
      電子材料工学
    • Research Institution
      Tokyo Institute of Polytechnics
  • 1.  HOSHI Yoichi (20108228)
    # of Collaborated Projects: 7 results
    # of Collaborated Products: 0 results
  • 2.  SHIMIZU Hidehiko (00313502)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 0 results
  • 3.  NABAE Akira (10115115)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 4.  NAKANO Hirotami (90257329)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 5.  CAO Liyu (10281453)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 6.  MATSUI Mikihiko (30143689)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 7.  HIRATA Toyoaki
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results

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