Suzuki Kenta 鈴木健太

Researcher Number	60709509
Other IDs	https://orcid.org/0000-0003-4354-908X
Affiliation (Current)	2024: 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 主任研究員
Affiliation (based on the past Project Information) *help	2017 – 2024: 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 主任研究員 2016: 国立研究開発法人産業技術総合研究所, 集積マイクロシステム研究センター, 研究員
Review Section/Research Field	Principal Investigator Basic Section 18020:Manufacturing and production engineering-related / Production engineering/Processing studies Except Principal Investigator Production engineering/Processing studies / Basic Section 18020:Manufacturing and production engineering-related / Basic Section 30020:Optical engineering and photon science-related
Keywords	Principal Investigator 飽和蒸気圧 / リソグラフィ / 凝縮性ガス / ナノインプリント / ナノパターン / 充填 / 光ナノインプリント / 微小液滴 / スループット / NIL … More / デバイス設計・製造プロセス / マイクロ・ナノデバイス / バブル欠陥 / ハイドロフルオロオレフィン … More Except Principal Investigator 射出成型 / 光学デバイス / 自己柱状成膜 / 成膜 / ナノ構造体 / ナノホトニクス / 成形加工 / ナノインプリント / ナノ印刷プロセス / 積層化金属ナノ構造 / 積層構造 / ナノ印刷 / メタマテリアル / 金属ナノ構造 / 光アイソレータ / ナノマイクロ加工 / モールド設計技術 / 凝縮性ガス / 残膜均一化 / モールド設計 / ナノインプリントリソグラフィ / デバイス設計・製造プロセス / 電子・電気材料 / マイクロ・ナノデバイス / 封止 / 平滑化 / 気密封止 / 表面平滑化 / ＭＥＭＳ / 微細加工 / MEMS / 実装 / マイクロデバイス / 常温接合 Less

ナノ成形構造体と自己組織化成膜技術の融合によるナノ構造体形状制御に関する研究
- Principal Investigator
  
  栗原一真
- Project Period (FY)
  2022 – 2024
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Review Section
  
  Basic Section 18020:Manufacturing and production engineering-related
- Research Institution
  National Institute of Advanced Industrial Science and Technology
積層化金属ナノ構造を利用した極薄光アイソレータの研究開発
- Principal Investigator
  
  穂苅遼平
- Project Period (FY)
  2021 – 2023
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Review Section
  
  Basic Section 30020:Optical engineering and photon science-related
- Research Institution
  National Institute of Advanced Industrial Science and Technology
Research on ultra-high-speed UV nanoimprint using mixed condensable gas and droplet dispensingPrincipal Investigator
- Principal Investigator
  
  Kenta Suzuki
- Project Period (FY)
  2019 – 2021
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Review Section
  
  Basic Section 18020:Manufacturing and production engineering-related
- Research Institution
  National Institute of Advanced Industrial Science and Technology
Development of UV nanoimprint process in mixed condensable gasPrincipal Investigator
- Principal Investigator
  
  Suzuki Kenta
- Project Period (FY)
  2017 – 2018
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  National Institute of Advanced Industrial Science and Technology
Room temperature metal bonding for highly hermetic sealing of microdevice
- Principal Investigator
  
  Kurashima Yuichi
- Project Period (FY)
  2016 – 2018
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  National Institute of Advanced Industrial Science and Technology
A study on process and mold design to obtain quick bubble removal and residual layer uniformity on whole imprinting area
- Principal Investigator
  
  Youn Sung-Won
- Project Period (FY)
  2016 – 2018
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  National Institute of Advanced Industrial Science and Technology

All 2022 2021 2020 2019 2018 2017

All Journal Article Presentation

[Journal Article] Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene2022
- Author(s)
  Kenta Suzuki, Tatsuya Okawa, and Sung-Won Youn
- Journal Title
  
  JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
  
  Volume: 35
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19H02046
[Journal Article] Mold Design and Process for Application of Nanoimprint Lithography to Interconnections2019
- Author(s)
  尹成圓、鈴木健太、廣島洋
- Journal Title
  
  Journal of The Japan Institute of Electronics Packaging
  
  Volume: 22 Issue: 2 Pages: 158-163
- DOI
  10.5104/jiep.22.158
- NAID
  130007606390
- ISSN
  1343-9677, 1884-121X
- Year and Date
  2019-03-01
- Language
  Japanese
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035, KAKENHI-PROJECT-19H02046
[Journal Article] Fabrication of high-aspect-ratio micropatterns in soluble block-copolymer polyimides by a UV-assisted thermal imprint process2019
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Takagi Hideki、Hiroshima Hiroshi、Kinoshita Yoshinori、Hayashi Katsuhiro
- Journal Title
  
  Journal of Mechanical Science and Technology
  
  Volume: 33 Issue: 8 Pages: 3755-3760
- DOI
  10.1007/s12206-019-0718-y
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19H02046
[Journal Article] Fabrication of High-Aspect-Ratio Micropatterns in Soluble Block-Copolymer Polyimides by an UV-assisted Thermal Imprint Process2019
- Author(s)
  Sung-Won Youn, Kenta Suzuki, Takagi Hideki, Hiroshi Hiroshima, Yoshinori Kinoshita, Katsuhiro Hayashi
- Journal Title
  
  Journal of Mechanical Science and Technology
  
  Volume: 印刷中
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035
[Journal Article] Solubility Property of Condensable Gases of Trans-1-Chloro-3,3,3-Trifluoropropene and Trans-1,3,3,3-Tetrafluoropropene in UV Nanoimprint2019
- Author(s)
  Suzuki Kenta、Youn Sung-Won、Hiroshima Hiroshi
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 32 Issue: 1 Pages: 123-130
- DOI
  10.2494/photopolymer.32.123
- NAID
  130007744312
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2019-06-24
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19H02046
[Journal Article] Pt Nanogap Electrode Fabrication by Two-Layer Lift-Off UV-NIL and Nanowire Breakdown2018
- Author(s)
  Kyouhei Hashiguchi, Kenta Suzuki, Hiroshi Hiroshima, Yasuhisa Naitoh, Hiroshi Suga
- Journal Title
  
  IEEE Transactions on Nanotechnology
  
  Volume: 17 Issue: 6 Pages: 1094-1097
- DOI
  10.1109/tnano.2018.2844125
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035, KAKENHI-PROJECT-17K14575, KAKENHI-PROJECT-17K14100
[Journal Article] Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography2018
- Author(s)
  Sung-Won Youn, Kenta Suzuki, Hiroshi Hiroshima
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 57 Issue: 6S1 Pages: 06HG03-06HG03
- DOI
  10.7567/jjap.57.06hg03
- NAID
  210000149171
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035, KAKENHI-PROJECT-17K14575
[Journal Article] Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere2018
- Author(s)
  Kenta Suzuki, Sung-Won Youn, Hiroshi Hiroshima
- Journal Title
  
  Journal of Photopolymer Science and Technology
  
  Volume: 31 Pages: 295-300
- NAID
  130007481515
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035
[Journal Article] Evaluation of Nanoimprinting Multilayer Lift-off Process using Spin-on-glass for Nanogap Electrode Array2018
- Author(s)
  Kyohei Hashiguchi, Kenta Suzuki, Hiroshi Hiroshima, Yasuhisa Naitoh, Hiroshi Suga
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 31 Issue: 2 Pages: 277-282
- DOI
  10.2494/photopolymer.31.277
- NAID
  130007481513
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2018-06-25
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035, KAKENHI-PROJECT-17K14575, KAKENHI-PROJECT-17K14100
[Journal Article] Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere2018
- Author(s)
  Suzuki Kenta、Youn Sung-Won、Hiroshima Hiroshi
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 31 Issue: 2 Pages: 295-300
- DOI
  10.2494/photopolymer.31.295
- NAID
  130007481515
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2018-06-25
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17K14575
[Journal Article] Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography2018
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 印刷中
- NAID
  210000149171
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035
[Journal Article] Study on granularity design of capacity-equalized mold for nanoimprint lithography2017
- Author(s)
  尹成圓、鈴木健太、廣島洋
- Journal Title
  
  Proceedings of JSPE Semestrial Meeting
  
  Volume: 2017A Issue: 0 Pages: 331-332
- DOI
  10.11522/pscjspe.2017A.0_331
- NAID
  130006434329
- Language
  Japanese
- Data Source
  KAKENHI-PROJECT-16K06035
[Journal Article] Automated Pattern Modification Method to Equalize Residual Layer Thickness in Nanoimprint Lithography2017
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Journal Title
  
  Conference Proceedings of NNT2017
  
  Volume: 1 Pages: 53-54
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035
[Journal Article] Basic Verification of Automated Design Method of Capacity-equalized Mold for Nanoimprint Lithography2017
- Author(s)
  Sung-Won Youn (尹成圓), Kenta Suzuki, and Hiroshi Hiroshima
- Journal Title
  
  Journal of Nanoscience and Nanotechnology
  
  Volume: 印刷中
- Peer Reviewed / Acknowledgement Compliant / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Journal Article] Basic Verification of Method for Automated Design of Capacity-Equalized Mold for Nanoimprint Lithography2017
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Journal Title
  
  Journal of Nanoscience and Nanotechnology
  
  Volume: 17 Issue: 11 Pages: 8475-8479
- DOI
  10.1166/jnn.2017.15153
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035
[Journal Article] Fabrication of a Holographic Pattern by UV-NIL Using PFP Gas2017
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Journal Title
  
  Program book of the 8th Japan-China-Korea MEMS/NEMS 2017
  
  Volume: 1 Pages: 28-29
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] 混合凝縮性ガス下での光ナノインプリントにおける光硬化性樹脂の微小液滴の充填評価2021
- Author(s)
  大川達也、鈴木健太、今井　郷充
- Organizer
  2021年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-19H02046
[Presentation] 産総研における光ナノインプリントステッパー技術2021
- Author(s)
  鈴木健太
- Organizer
  第9回マイクロ・ナノ加工研究会公開講演会
- Invited
- Data Source
  KAKENHI-PROJECT-19H02046
[Presentation] ウェハレベルナノインプリント技術の応用展開に向けた充填挙動の制御や大面積モールド作製に関する研究2020
- Author(s)
  尹成圓、鈴木健太、廣島洋
- Organizer
  荷電粒子ビームの工業への応用第132委員会
- Data Source
  KAKENHI-PROJECT-19H02046
[Presentation] Approach of fine resist filling technologies for UV-NIL at AIST2019
- Author(s)
  尹成圓、鈴木健太、廣島洋
- Organizer
  NNT 2019, the 18th International Conference on Nanoimprint and Nanoprint Technologies
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19H02046
[Presentation] 混合凝縮性ガスを用いたUVナノインプリントリソグラフィ2019
- Author(s)
  鈴木健太、尹成圓、廣島洋
- Organizer
  NGL ワークショップ（ワークショップ NGL2019）
- Invited
- Data Source
  KAKENHI-PROJECT-19H02046
[Presentation] Solubility Property of Condensable Gases of Trans-1-Chloro-3,3,3-Trifluoropropene and Trans-1,3,3,3-Tetrafluoropropene in UV Nanoimprint2019
- Author(s)
  鈴木健太、尹成圓、廣島洋
- Organizer
  The 36th International Conference of Photopolymer Science and Technology
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19H02046
[Presentation] 混合凝縮性ガスを導入する光ナノインプリントによる線幅20nm以下のパターニング技術の開発2019
- Author(s)
  鈴木健太
- Organizer
  第10回集積化MEMS技術研究ワークショップ
- Invited
- Data Source
  KAKENHI-PROJECT-19H02046
[Presentation] 凝縮性ガス下でのナノインプリントにおけるモールド全域の樹脂の充填観察2019
- Author(s)
  鈴木健太、尹成圓
- Organizer
  ２０１９年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-19H02046
[Presentation] Fabrication of High Aspect Ratio Micropatterns in Soluble Block-copolymer Polyimide by UV-assisted Thermal Imprint Process2018
- Author(s)
  Sung-Won Youn, Kenta Suzuki, and Hiroshi Hiroshima
- Organizer
  The 1st Emerging Technologies in Mechanical Engineering (ETME 2018)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K14575
[Presentation] Fabrication of Radio-frequency Identification Antenna Patterns on an IC Chip by Ultraviolet Nanoimprint Lithography2018
- Author(s)
  鈴木健太,倉島優一,尹成圓,高木秀樹,廣島洋,大島清志,小林英樹
- Organizer
  31st International Microprocesses and Nanotechnology Conference (MNC 2018)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K14575
[Presentation] PDMSレプリカモールドを使用したUVナノインプリントのパターン欠陥と離型力の評価2018
- Author(s)
  鈴木健太、尹成園、廣島洋
- Organizer
  第32回エレクトロニクス実装学会春季講演大会
- Data Source
  KAKENHI-PROJECT-17K14575
[Presentation] Evaluation of Nanoimprinting Multilayer Lift-off Process using Spin-on-glass for Nanogap Electrode Array2018
- Author(s)
  Kyohei Hashiguchi, Kenta Suzuki, Hiroshi Hiroshima, Yasuhisa Naitoh, and Hiroshi Suga
- Organizer
  The 35th International Conference of Photopolymer Science and Technology
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K14575
[Presentation] Control of pattern capacity in nanoimprint mold by adding 2D/2.5D patterns to obtain uniform residual layer2018
- Author(s)
  Sung-Won Youn, Kenta Suzuki, and Hiroshi Hiroshima
- Organizer
  The 5th International Conference & Exhibition (NANOPIA2018)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K14575
[Presentation] IoTを支える微細配線製造技術2018
- Author(s)
  鈴木健太
- Organizer
  MEMSセンシング&ネットワークシステム展 2018特別シンポジウム　光×製造×IoT　未来技術セミナー
- Invited
- Data Source
  KAKENHI-PROJECT-17K14575
[Presentation] Design and Fabrication of Mold for Wafer-level Nanoimprint Lithography2018
- Author(s)
  尹成圓, 鈴木健太, 廣島洋
- Organizer
  韓国機械技術研究院（KIMM）招待セミナー
- Invited
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere2018
- Author(s)
  Kenta Suzuki, Sung-Won Youn, and Hiroshi Hiroshima
- Organizer
  The 35th International Conference of Photopolymer Science and Technology
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere2018
- Author(s)
  Kenta Suzuki, Sung-Won Youn, and Hiroshi Hiroshima
- Organizer
  The 35th International Conference of Photopolymer Science and Technology
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K14575
[Presentation] ナノインプリントリソグラフィ用パターン補正プログラム2018
- Author(s)
  尹成圓, 鈴木健太, 廣島洋
- Organizer
  次世代リソグラフィワークショップNGL2018
- Invited
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Fabrication of High Aspect Ratio Micropatterns in Soluble Block-copolymer Polyimide by UV-assisted Thermal Imprint Process2018
- Author(s)
  Sung-Won Youn, Kenta Suzuki, and Hiroshi Hiroshima
- Organizer
  The 1st Emerging Technologies in Mechanical Engineering (ETME 2018)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] UVナノインプリント法を用いた集光ミラー付きポリマー光導波路の開発2018
- Author(s)
  鈴木健太,天野建,乗木暁博
- Organizer
  第２１回電子デバイス実装研究委員会
- Invited
- Data Source
  KAKENHI-PROJECT-17K14575
[Presentation] 光ナノインプリント樹脂への凝縮性ガスの溶解性の評価2018
- Author(s)
  鈴木健太, 尹成圓, 廣島洋
- Organizer
  エレクトロニクス実装学会春季講演大会
- Data Source
  KAKENHI-PROJECT-17K14575
[Presentation] 配線基板作製に向けたナノインプリントモールドパターンの補正およびその作製工程2018
- Author(s)
  Sung-Won Youn, Kenta Suzuki, and Hiroshi Hiroshima
- Organizer
  精密工学会2018年度秋季大会
- Data Source
  KAKENHI-PROJECT-17K14575
[Presentation] Fabrication of wafer-level mold for nanoimprint lithography using STAMP program and self-alignment etching process2018
- Author(s)
  Sung-Won Youn, Kenta Suzuki, and Hiroshi Hiroshima
- Organizer
  International Symposium on Precision and Engineering and Sustainable Manufacturing
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] 配線基板作製に向けたナノインプリントモールドパターンの補正およびその作製工程2018
- Author(s)
  尹成圓、鈴木健太、廣島洋
- Organizer
  日本精密工学会
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] ナノインプリントリソグラフィ用パターン補正プログラム2018
- Author(s)
  尹成圓, 鈴木健太, 廣島洋
- Organizer
  次世代リソグラフィワークショップNGL2018
- Invited
- Data Source
  KAKENHI-PROJECT-17K14575
[Presentation] Fabrication of Flexible Replica Mold with 2D and 2.5D Structures Designed by STAMP Program2018
- Author(s)
  Sung-Won Youn, Kenta Suzuki, and Hiroshi Hiroshima
- Organizer
  9th Japan-China-Korea Joint Conf. on MEMS/NEMS
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K14575
[Presentation] 光ナノインプリント樹脂への凝縮性ガスの溶解性の評価2018
- Author(s)
  鈴木健太, 尹成圓, 廣島洋
- Organizer
  エレクトロニクス実装学会春季講演大会
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Control of pattern capacity in nanoimprint mold by adding 2D/2.5D patterns to obtain uniform residual layer2018
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Organizer
  The 5th International Conference & Exhibition for Nanotechnology　(NANOPIA2018)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Fabrication of wafer-level mold for nanoimprint lithography using STAMP program and self-alignment etching process2018
- Author(s)
  Sung-Won Youn, Kenta Suzuki, and Hiroshi Hiroshima
- Organizer
  International Symposium on Precision and Engineering and Sustainable Manufacturing
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K14575
[Presentation] Fabrication of Radio-frequency Identification Antenna Patterns on an IC Chip by Ultraviolet Nanoimprint Lithography2018
- Author(s)
  鈴木健太,倉島優一,尹成圓,高木秀樹,廣島洋,大島清志,小林英樹
- Organizer
  31st International Microprocesses and Nanotechnology Conference (MNC 2018)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Fabrication of Flexible Replica Mold with 2D and 2.5D Structures Designed by STAMP Program2018
- Author(s)
  Sung-Won Youn, Kenta Suzuki, and Hiroshi Hiroshima
- Organizer
  9th Japan-China-Korea Joint Conf. on MEMS/NEMS
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] ナノインプリントリソグラフィ用容積均一化モールドの粒度設計に関する研究2017
- Author(s)
  尹成圓、鈴木健太、廣島洋
- Organizer
  2017日本精密工学会秋季大会
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Fabrication of a Holographic Pattern by UV-NIL Using PFP Gas2017
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Organizer
  8th Japan-China-Korea MEMS/NEMS 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Automated Pattern Modification Method to Equalize Residual Layer Thickness in Nanoimprint Lithography2017
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Organizer
  The 16th International Conference on Nanoimprint and Nanoprint Technology (NNT2017)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography2017
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Organizer
  30st International Microprocesses and Nanotechnology Conferences
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Filling behavior and mold release force in UV nanoimprinting using PDMS mold in different atmosphere2017
- Author(s)
  Kenta Suzuki, Sung-Won Youn, and Hiroshi Hiroshima
- Organizer
  12th IEEE Nanotechnology Materials and Devices Conference
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-17K14575
[Presentation] A Mold Pattern Design Method for Wafer-level Nanoimprint Lithography2017
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Organizer
  1st International Workshop on MEMS and Sensor System 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035

1. Youn Sung-Won (80510065)

# of Collaborated Projects: 3 results

# of Collaborated Products: 30 results
2. 穂苅遼平 (20759998)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
3. 栗原一真 (90392612)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
4. Hiroshima Hiroshi

# of Collaborated Projects: 2 results

# of Collaborated Products: 36 results
5. Kurashima Yuichi (70408730)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
6. 高木秀樹 (00357344)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
7. 中野美紀 (20415722)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
8. Hashiguchi Kyouhei

# of Collaborated Projects: 1 results

# of Collaborated Products: 1 results
9. Suga Hiroshi

# of Collaborated Projects: 1 results

# of Collaborated Products: 1 results

Suzuki Kenta 鈴木 健太

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ナノ成形構造体と自己組織化成膜技術の融合によるナノ構造体形状制御に関する研究

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積層化金属ナノ構造を利用した極薄光アイソレータの研究開発

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Research on ultra-high-speed UV nanoimprint using mixed condensable gas and droplet dispensingPrincipal Investigator

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Development of UV nanoimprint process in mixed condensable gasPrincipal Investigator

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Room temperature metal bonding for highly hermetic sealing of microdevice

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A study on process and mold design to obtain quick bubble removal and residual layer uniformity on whole imprinting area

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[Journal Article] Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene2022

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[Journal Article] Mold Design and Process for Application of Nanoimprint Lithography to Interconnections2019

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[Journal Article] Fabrication of high-aspect-ratio micropatterns in soluble block-copolymer polyimides by a UV-assisted thermal imprint process2019

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[Journal Article] Fabrication of High-Aspect-Ratio Micropatterns in Soluble Block-Copolymer Polyimides by an UV-assisted Thermal Imprint Process2019

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[Journal Article] Solubility Property of Condensable Gases of Trans-1-Chloro-3,3,3-Trifluoropropene and Trans-1,3,3,3-Tetrafluoropropene in UV Nanoimprint2019

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[Journal Article] Pt Nanogap Electrode Fabrication by Two-Layer Lift-Off UV-NIL and Nanowire Breakdown2018

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[Journal Article] Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography2018

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Suzuki Kenta 鈴木健太