Mitani Yuichiro 三谷祐一郎

Researcher Number	60732641
Other IDs
Affiliation (Current)	2026: 東京都市大学, 理工学部, 教授 2026: 株式会社東芝総合研究所(先端デバイスR&Dセンター、AIデジタルR&Dセンター、マテリアルズ&フロン, その他部局等, その他
Affiliation (based on the past Project Information) *help	2022 – 2024: 東京都市大学, 理工学部, 教授
Review Section/Research Field	Principal Investigator Basic Section 26040:Structural materials and functional materials-related
Keywords	Principal Investigator シリコン窒化薄膜 / 信頼性 / エネルギー準位 / ナノ欠陥 / 水素 / シリコン窒化膜

Research Projects
(1 results)
Research Products
(13 results)

Controls of nano defects in Silicon nitride films by using atomic hydrogen treatmentPrincipal Investigator
- Principal Investigator
  
  Mitani Yuichiro
- Project Period (FY)
  2022 – 2024
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 26040:Structural materials and functional materials-related
- Research Institution
  Tokyo City University

All 2025 2024 2023 2022

All Journal Article Presentation

[Journal Article] Evaluation of the effect of hydrogen plasma treatment on the chemical bonding state and distribution of hydrogen in silicon nitride films by angle-resolved hard X-ray photoelectron spectroscopy2025
- Author(s)
  Kirihara Yoshiharu、Omata Haruto、Yasui Akira、Nakagawa Kiyokazu、Mitani Yuichiro、Nohira Hiroshi
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 64 Issue: 1 Pages: 01SP29-01SP29
- DOI
  10.35848/1347-4065/ada9f7
- Data Source
  KAKENHI-PROJECT-22K04743
[Journal Article] Impact of hydrogen plasma treatment on fluorine-contained silicon nitride films2024
- Author(s)
  Kobayashi Takumi、Omata Haruto、Nakagawa Kiyokazu、Mitani Yuichiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 63 Issue: 4 Pages: 04SP47-04SP47
- DOI
  10.35848/1347-4065/ad355f
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-22K04743
[Journal Article] 三次元フラッシュメモリ技術とニューラルネットワーク応用2024
- Author(s)
  三谷祐一郎
- Journal Title
  
  電子情報通信学会誌
  
  Volume: 107 Pages: 296-303
- Data Source
  KAKENHI-PROJECT-22K04743
[Journal Article] Fabrication of metal/oxide/fluorographene/oxide/silicon capacitors and their charge trapping properties2023
- Author(s)
  Kawashima Rino、Nohira Hiroshi、Ishikawa Ryousuke、Mitani Yuichiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 62 Issue: SG Pages: SG1035-SG1035
- DOI
  10.35848/1347-4065/acbeb9
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-22K04743
[Presentation] AR-HAXPES Evaluation of the Effect of Hydrogen Plasma Treatment on the Chemical Bonding State and Distribution of Hydrogen in SiN Films2024
- Author(s)
  Yoshiharu Kirihara, Haruto Omata, Akira Yasui, Kiyokazu Nakagawa, Yuichiro Mitani, Hiroshi Nohira
- Organizer
  2024 International Conference on Solid State Devices and Materials (SSDM2024)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-22K04743
[Presentation] 水素プラズマ処理によるALD-SiO2膜中トラップエネルギー準位の深化2024
- Author(s)
  藤田雄輝, 中川清和, 三谷祐一郎
- Organizer
  第29回電子デバイス界面テクノロジー研究会
- Data Source
  KAKENHI-PROJECT-22K04743
[Presentation] SiN膜に含まれる水素の化学結合状態と分布に与える水素プラズマ処理の影響のAR-HAXPES評価2024
- Author(s)
  桐原芳治, 小俣晴人, 保井晃, 中川清和, 三谷祐一郎, 野平博司
- Organizer
  第29回電子デバイス界面テクノロジー研究会
- Data Source
  KAKENHI-PROJECT-22K04743
[Presentation] 大容量フラッシュメモリ技術とその応用2024
- Author(s)
  三谷祐一郎
- Organizer
  第71回応用物理学会春季学術講演会
- Invited
- Data Source
  KAKENHI-PROJECT-22K04743
[Presentation] Depassivation of Fluorine in Silicon Nitride Films by Hydrogen Radical Treatment2023
- Author(s)
  Takumi Kobayashi, Haruto Omata, Kiyokazu Nakagawa, Yuichiro Mitani
- Organizer
  International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES - SCIENCE AND TECHNOLOGY
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-22K04743
[Presentation] 水素ラジカルを用いたシリコン窒化膜中水素量の制御2023
- Author(s)
  小俣晴人, 中川清和, 三谷祐一郎
- Organizer
  第28回電子デバイス界面テクノロジー研究会
- Data Source
  KAKENHI-PROJECT-22K04743
[Presentation] Study on Fluorographene Charge Trapping layer for Nonvolatile Memory Applications2022
- Author(s)
  Yuichiro Mitani, R. Kawashima, R. Ishikawa, H. Nohira
- Organizer
  The 2022 International Meeting for Future of Electron Devices, Kansai
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-22K04743
[Presentation] Carrier trapping characteristics of fluorographene for nonvolatile memory applications2022
- Author(s)
  Rino Kawashima, Hiroshi Nohira, Ryousuke Ishikawa, Yuichiro Mitani
- Organizer
  35th International Microprocesses and Nanotechnology Conference (MNC 2022)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-22K04743
[Presentation] フッ化グラフェンを用いた不揮発性メモリの電荷捕獲特性2022
- Author(s)
  川島理乃, 野平博司, 石川亮佑, 三谷祐一郎
- Organizer
  第83回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-22K04743

Mitani Yuichiro 三谷 祐一郎

Research Projects

Research Products

Controls of nano defects in Silicon nitride films by using atomic hydrogen treatmentPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

[Journal Article] Evaluation of the effect of hydrogen plasma treatment on the chemical bonding state and distribution of hydrogen in silicon nitride films by angle-resolved hard X-ray photoelectron spectroscopy2025

Author(s)

Journal Title

DOI

Data Source

[Journal Article] Impact of hydrogen plasma treatment on fluorine-contained silicon nitride films2024

Author(s)

Journal Title

DOI

Data Source

[Journal Article] 三次元フラッシュメモリ技術とニューラルネットワーク応用2024

Author(s)

Journal Title

Data Source

[Journal Article] Fabrication of metal/oxide/fluorographene/oxide/silicon capacitors and their charge trapping properties2023

Author(s)

Journal Title

DOI

Data Source

[Presentation] AR-HAXPES Evaluation of the Effect of Hydrogen Plasma Treatment on the Chemical Bonding State and Distribution of Hydrogen in SiN Films2024

Author(s)

Organizer

Data Source

[Presentation] 水素プラズマ処理によるALD-SiO2膜中トラップエネルギー準位の深化2024

Author(s)

Organizer

Data Source

[Presentation] SiN膜に含まれる水素の化学結合状態と分布に与える水素プラズマ処理の影響のAR-HAXPES評価2024

Author(s)

Organizer

Data Source

[Presentation] 大容量フラッシュメモリ技術とその応用2024

Author(s)

Organizer

Data Source

[Presentation] Depassivation of Fluorine in Silicon Nitride Films by Hydrogen Radical Treatment2023

Author(s)

Organizer

Data Source

[Presentation] 水素ラジカルを用いたシリコン窒化膜中水素量の制御2023

Author(s)

Organizer

Data Source

[Presentation] Study on Fluorographene Charge Trapping layer for Nonvolatile Memory Applications2022

Author(s)

Organizer

Data Source

[Presentation] Carrier trapping characteristics of fluorographene for nonvolatile memory applications2022

Author(s)

Organizer

Data Source

[Presentation] フッ化グラフェンを用いた不揮発性メモリの電荷捕獲特性2022

Author(s)

Organizer

Data Source

Mitani Yuichiro 三谷祐一郎