MURATA Junji 村田順二

… Alternative Names

Murata Junji 村田順二

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Researcher Number	70531474
Other IDs
Affiliation (Current)	2026: 立命館大学, 理工学部, 教授
Affiliation (based on the past Project Information) *help	2026: 立命館大学, 理工学部, 教授 2023 – 2024: 立命館大学, 理工学部, 教授 2019 – 2022: 立命館大学, 理工学部, 准教授 2016 – 2017: 近畿大学, 理工学部, 准教授 2014 – 2015: 近畿大学, 理工学部, 講師 … More 2012 – 2013: 立命館大学, 理工学部, 助教 2010: Ritsumeikan University, 理工学部, 助教 2009: Osaka University, 工学研究科, リサーチアシスタント Less
Review Section/Research Field	Principal Investigator Production engineering/Processing studies / Medium-sized Section 18:Mechanics of materials, production engineering, design engineering, and related fields / Basic Section 18020:Manufacturing and production engineering-related
Keywords	Principal Investigator 固体電解質 / 陽極酸化 / 研磨加工 / 研磨 / 窒化ガリウム / 電解酸化 / 電気化学機械研磨 / 高分子電解質 / エッチング / 精密研磨 … More / 砥粒 / パワー半導体 / 炭化ケイ素 / SiC / 表面改質 / アノード溶解 / 電気化学反応 / リソグラフィ / パターニング / ポリシング / 微細加工 / ワイドギャップ半導体 / 光ファイバ / 光照射援用加工 / スライシング / 半導体 / 切断 / 太陽電池 / 切断加工 / 発光特性 / 平坦化 / 触媒 / 酸・塩基触媒 / 光電気化学反応 / 固体酸・塩基触媒 / 光電気化学プロセス / 平坦化加工 / 固体酸触媒 / 光電気化学 Less

固体界面電気化学反応の解明によるナノ加工基盤の構築とフレキシブル素子応用Principal Investigator
- Principal Investigator
  
  村田順二
- Project Period (FY)
  2026 – 2028
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Review Section
  
  Medium-sized Section 18:Mechanics of materials, production engineering, design engineering, and related fields
- Research Institution
  Ritsumeikan University
固体電解質を用いた環境調和型電気化学機械研磨のメカニズム解明と技術体系の構築Principal Investigator
- Principal Investigator
  
  村田順二
- Project Period (FY)
  2024 – 2025
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Review Section
  
  Basic Section 18020:Manufacturing and production engineering-related
- Research Institution
  Ritsumeikan University
固体電解質のイオン輸送を用いた環境調和型電気化学表面プロセスの開発Principal Investigator
- Principal Investigator
  
  村田順二
- Project Period (FY)
  2023 – 2025
- Research Category
  
  Grant-in-Aid for Challenging Research (Exploratory)
- Review Section
  
  Medium-sized Section 18:Mechanics of materials, production engineering, design engineering, and related fields
- Research Institution
  Ritsumeikan University
Development of electrochemical dry polishing method for GaN surface using solid polymer electrolytePrincipal Investigator
- Principal Investigator
  
  Murata Junji
- Project Period (FY)
  2019 – 2022
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 18020:Manufacturing and production engineering-related
- Research Institution
  Ritsumeikan University
Development of chemical slicing method for Photovaltaic materials with low ker-loss and thin wafer thicknessPrincipal Investigator
- Principal Investigator
  
  Murata Junji
- Project Period (FY)
  2015 – 2017
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Kindai University
Development of polishing method for next-generation opt-electronic materials producing atomically-smooth surfacesPrincipal Investigator
- Principal Investigator
  
  MURATA Junji
- Project Period (FY)
  2012 – 2014
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Kinki University
  Ritsumeikan University
Development of a novel planarization method for gallium nitride surface using photo-electrochemical treatment.Principal Investigator
- Principal Investigator
  
  MURATA Junji
- Project Period (FY)
  2009 – 2010
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Ritsumeikan University
  Osaka University

[Book] 生産加工入門2014
- Author(s)
  谷泰弘、村田順二
- Total Pages
  191
- Publisher
  数理工学社
- Data Source
  KAKENHI-PROJECT-24760110
[Journal Article] Soft Copper Nanoimprinting via Solid-State Electrochemical Etching for Flexible Optoelectronics2025
- Author(s)
  Atsuki Tsuji, Taizo Kobayashi, Junji Murata
- Journal Title
  
  ACS Applied Materials & Interfaces
  
  Volume: 17 Issue: 14 Pages: 21929-21939
- DOI
  10.1021/acsami.4c20732
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-23K17725, KAKENHI-PROJECT-24KJ2153
[Journal Article] Ultrafast Solid‐State Electrochemical Imprinting Utilizing Polymer Electrolyte Membrane Stamps for Static/Dynamic Structural Coloration and Letter Encryption2024
- Author(s)
  Yamazaki Katsuma, Tsuji Atsuki, Takizawa Masaru, Murata Junji
- Journal Title
  
  Small Methods
  
  Volume: In press Issue: 12 Pages: 2301787-2301787
- DOI
  10.1002/smtd.202301787
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-23K17725, KAKENHI-PROJECT-23K26015
[Journal Article] Sustainable Electrochemical Mechanical Polishing (ECMP) for 4H-SiC wafer using chemical-free polishing slurry with hydrocarbon-based solid polymer electrolyte2024
- Author(s)
  Naoki Inada, Masaru Takizawa, Mariko Adachi, Junji Murata
- Journal Title
  
  Applied Surface Science
  
  Volume: 664 Pages: 160241-160241
- DOI
  10.1016/j.apsusc.2024.160241
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-23K26015
[Journal Article] Cu Direct Nanopatterning Using Solid‐State Electrochemical Dissolution at the Anode/Polymer Electrolyte Membrane Interface2024
- Author(s)
  Tsuji Atsuki, Morimoto Eita, Takizawa Masaru, Murata Junji
- Journal Title
  
  Advanced Materials Interfaces
  
  Volume: 11 Issue: 9
- DOI
  10.1002/admi.202300896
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-23K17725
[Journal Article] Solid-state electrochemical oxidation with polyelectrolyte membrane stamps for micro-/nanoscale pattern formation on Au surfaces2024
- Author(s)
  Tatsuya Fujii, Atsuki Tsuji, Masaru Takizawa, Junji Murata
- Journal Title
  
  Nanoscale
  
  Volume: 16 Issue: 40 Pages: 18811-18823
- DOI
  10.1039/d4nr02978j
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-23K17725, KAKENHI-PROJECT-24KJ2153
[Journal Article] Environment-friendly electrochemical mechanical polishing using solid polymer electrolyte/CeO2 composite pad for highly efficient finishing of 4H-SiC (0001) surface2023
- Author(s)
  Murata Junji, Hayama Kenshin, Takizawa Masaru
- Journal Title
  
  Applied Surface Science
  
  Volume: 625 Pages: 157190-157190
- DOI
  10.1016/j.apsusc.2023.157190
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-19K04117, KAKENHI-PROJECT-23K26015
[Journal Article] Direct micropatterning on a titanium surface through electrochemical imprint lithography with a polymer electrolyte membrane stamp2022
- Author(s)
  Jia Pengfei、Umezaki Ryohei、Murata Junji
- Journal Title
  
  Microelectronic Engineering
  
  Volume: 257 Pages: 111752-111752
- DOI
  10.1016/j.mee.2022.111752
- Data Source
  KAKENHI-PROJECT-19K04117
[Journal Article] Improvement in the polishing characteristics of titanium-based materials using electrochemical mechanical polishing2022
- Author(s)
  Tsuji Atsuki, Jia Pengfei, Takizawa Masaru, Murata Junji
- Journal Title
  
  Surfaces and Interfaces
  
  Volume: 35 Pages: 102490-102490
- DOI
  10.1016/j.surfin.2022.102490
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19K04117
[Journal Article] High-efficiency wafer-scale finishing of 4H-SiC (0001) surface using chemical-free electrochemical mechanical method with a solid polymer electrolyte2021
- Author(s)
  Zulkifle Che Nor Syahirah Binti Che、Hayama Kenshin、Murata Junji
- Journal Title
  
  Diamond and Related Materials
  
  Volume: 120 Pages: 108700-108700
- DOI
  10.1016/j.diamond.2021.108700
- Data Source
  KAKENHI-PROJECT-19K04117
[Journal Article] Electrochemical imprint lithography on Si surface using a patterned polymer electrolyte membrane2021
- Author(s)
  Umezaki Ryohei、Murata Junji
- Journal Title
  
  Materials Chemistry and Physics
  
  Volume: 259 Pages: 124081-124081
- DOI
  10.1016/j.matchemphys.2020.124081
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19K04117
[Journal Article] Investigation of Electrolytic Condition on Abrasive-Free Electrochemical Mechanical Polishing of 4H-SiC Using Ce Thin Film2020
- Author(s)
  Murata Junji、Nagatomo Daiki
- Journal Title
  
  ECS Journal of Solid State Science and Technology
  
  Volume: 9 Issue: 3 Pages: 034002-034002
- DOI
  10.1149/2162-8777/ab7672
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19K04117
[Journal Article] ウェットエッチングを利用したSiの砥粒フリースライシング2018
- Author(s)
  村田順二
- Journal Title
  
  光アライアンス
  
  Volume: 5
- NAID
  130006063847
- Data Source
  KAKENHI-PROJECT-15K05736
[Journal Article] Polishing-pad-free electrochemical mechanical polishing of single-crystalline SiC surfaces using polyurethane-CeO2 core-shell particles2017
- Author(s)
  J. Murata, K. Yodogawa and K. Ban
- Journal Title
  
  International Journal of Machine Tools and Manufacture
  
  Volume: 114 Pages: 1-7
- DOI
  10.1016/j.ijmachtools.2016.11.007
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-15K05736
[Journal Article] Novel Abrasive-Free Slicing Method for Si Using Wet Chemical Etching2017
- Author(s)
  MURATA Junji
- Journal Title
  
  Journal of the Japan Society for Precision Engineering
  
  Volume: 83 Issue: 9 Pages: 837-840
- DOI
  10.2493/jjspe.83.837
- NAID
  130006063847
- ISSN
  0912-0289, 1882-675X
- Language
  Japanese
- Data Source
  KAKENHI-PROJECT-15K05736
[Journal Article] Photo-electrochemical etching of free-standing GaN wafer surfaces grown by hydride vapor phase epitaxy2015
- Author(s)
  Junji Murata, Shun Sadakuni
- Journal Title
  
  Electrochimica Acta
  
  Volume: 掲載決定 Pages: 89-95
- DOI
  10.1016/j.electacta.2015.04.166
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-24760110
[Journal Article] Enhancement of photoluminescence efficiency from GaN(0001) by surface treatments2014
- Author(s)
  Azusa N. Hattori et al.
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 53 Issue: 2 Pages: 0210011-5
- DOI
  10.7567/jjap.53.021001
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24656101, KAKENHI-PROJECT-24686020, KAKENHI-PROJECT-24760110
[Journal Article] Bias-assisted photochemical planarization of GaN (0001) substrate with damage layer2013
- Author(s)
  定國峻
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: VOL.. 52 Issue: 3R Pages: 365041-365044
- DOI
  10.7567/jjap.52.036504
- NAID
  40019617091
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-11J00707, KAKENHI-PROJECT-24760110
[Journal Article] Structural and chemical characteristics of atomically smooth GaN surfaces prepared by abrasive-free polishing with Pt catalyst2012
- Author(s)
  Junji Murata, Shun Sadakuni, Takeshi Okamoto, Azusa N. Hattori, Keita Yagi, Yasuhisa Sano, Kenta Arima, Kazuto Yamauchi
- Journal Title
  
  Journal of Crystal Growth
  
  Volume: 349 Issue: 1 Pages: 83-88
- DOI
  10.1016/j.jcrysgro.2012.04.007
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24760110
[Journal Article] Influence of gallium additives on surface roughness for photoelectrochemical planarization of GaN2011
- Author(s)
  Shun Sadakuni, Junji Murata, et.al
- Journal Title
  
  Physica status solidi (C)
  
  Volume: (印刷中(掲載確定))
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21760099
[Journal Article] Efficient Wet Etching of GaN (0001) Substrate with Subsurface Damage Layer2011
- Author(s)
  Shun Sadakuni, Junji Murata, et.al
- Journal Title
  
  Journal of Nanoscience and Nanotechnology
  
  Volume: 11 Pages: 2979-2982
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21760099
[Journal Article] fficient wet etching of GaN (0001) substrate with subsurface damage layer2011
- Author(s)
  S.Sadakuni, J.Murata, K.Yagi, Y.Sano, K.Arima, A.N.Hattori, T.Okamoto, K.Yamauchi
- Journal Title
  
  Journal of Nanoscience and Nanotechnology 11
  
  Pages: 2979-2982
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21760099
[Journal Article] Influence of gallium additives on surface roughness for photoelectrochemical planarization of GaN2011
- Author(s)
  S.Sadakuni, J.Murata, K.Yagi, Y.Sano, K.Arima, T.Okamoto, K.Yamauchi
- Journal Title
  
  Physica Status Solidi (C) (印刷中)
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21760099
[Journal Article] Improved Optical and Electrical Characteristics of Free-standing GaN substrates by Chemical Polishing Utilizing Photo-Electrochemical Method2011
- Author(s)
  J.Murata, Y.Shirasawa, Y.Sano, S.Sadakuni, K.Yagi, T.Okamoto, A.N. Hattori, K.Arima, K.Yamauchi
- Journal Title
  
  Journal of Nanoscience and Nanotechnology 11
  
  Pages: 2882-2885
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21760099
[Journal Article] Improved Optical and Electrical Characteristics of Free-Standing GaN Substrates by Chemical Polishing Utilizing Photo-Electrochemical Method2011
- Author(s)
  Junji Murata, Yuki Shirasawa, et.al
- Journal Title
  
  Journal of Nanoscience and Nanotechnology
  
  Volume: 11 Pages: 2882-2885
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21760099
[Journal Article] Influence of the UV Light Intensity on the Photoelectrochemical Planarization technique for Gallium Nitride2010
- Author(s)
  S.Sadakuni, J.Murata, K.Yagi, Y.Sano, K.Arima, A.N.Hattori, T.Okamoto, K.Yamauchi
- Journal Title
  
  Materials Science Forum 645-648
  
  Pages: 795-798
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21760099
[Journal Article] Planarization of GaN (0001) Surface by Photo-Electrochemical Method with Solid Acidic or Basic Catalys2010
- Author(s)
  J.Murata, S.Sadakuni, K.Yagi, Y.Sano, T.Okamoto, K.Arima, A.N.Hattori, H.Mimura, K.Yamauchi
- Journal Title
  
  Japanese Journal of Applied Physics 48
  
  Pages: 12100101-12100104
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21760099
[Journal Article] Reduction of surface roughness of 4H-SiC by catalyst-referred etching2010
- Author(s)
  T.Okamoto, Y.Sano, H.Hara, T.Hatayama, K.Arima, K.Yagi, J.Murata, S.Sadakuni, K.Tachibana, Y.Shirasawa, H.Mimura, T.Fuyuki, K.Yamauchi
- Journal Title
  
  Materials Science Forum 645-648
  
  Pages: 775-778
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21760099
[Journal Article] Planarization of GaN(0001) Surfaces by Photo-Electrochemical Method with Solid Acidic or Basic Catalyst2009
- Author(s)
  J.Murata, S.Sadakuni, K.Yagi, Y.Sano, T.Okamoto, K.Arima, A.N.Hattori, H.Mimura, K.Yamauchi
- Journal Title
  
  Japanese Journal of Applied Physics 48
- NAID
  40016890466
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21760099
[Patent] 研磨用パッド、および導電性半導体基板の製造方法2021
- Inventor(s)
  村田順二ほか
- Industrial Property Rights Holder
  サイオクス
- Industrial Property Rights Type
  特許
- Industrial Property Number
  2021-022970
- Filing Date
  2021
- Data Source
  KAKENHI-PROJECT-19K04117
[Patent] 研磨用パッド、導電性半導体基板の製造方法および研磨方法2021
- Inventor(s)
  村田順二、巴山顕真、堀切文正
- Industrial Property Rights Holder
  株式会社サイオクス
- Industrial Property Rights Type
  特許
- Industrial Property Number
  2021-133059
- Filing Date
  2021
- Data Source
  KAKENHI-PROJECT-19K04117
[Patent] 研磨用パッド、および導電性半導体基板の製造方法2020
- Inventor(s)
  村田順二ほか
- Industrial Property Rights Holder
  （株）サイオクス
- Industrial Property Rights Type
  特許
- Industrial Property Number
  2020-025916
- Filing Date
  2020
- Data Source
  KAKENHI-PROJECT-19K04117
[Patent] 研磨具及び研磨装置2013
- Inventor(s)
  佐野泰久、山内和人、村田順二、岡本武志、定國峻、八木圭太
- Industrial Property Rights Holder
  大阪大学、荏原製作所
- Industrial Property Rights Type
  特許
- Filing Date
  2013-10-16
- Acquisition Date
  2015-01-23
- Data Source
  KAKENHI-PROJECT-24760110
[Patent] 研磨方法及び研磨装置2009
- Inventor(s)
  佐野泰久, 山内和人, 村田順二, 定國峻, 八木圭太
- Industrial Property Rights Holder
  大阪大学, 荏原製作所
- Patent Publication Number
  2010-251699
- Filing Date
  2009-12-15
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] PEM/電極間イオン輸送によるCuマイクロ・ナノ構造形成とその応用2025
- Author(s)
  辻淳喜，村田順二，西邨功祐，阪僚太
- Organizer
  電気化学会第92回大会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 還元型固相電解プロセスによるITO膜のパターニング2025
- Author(s)
  早川晋平，箱崎大志，辻淳喜，村田順二
- Organizer
  2025年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] Cu箔の深掘り・貫通加工に適した固相陽極溶解条件の探索2025
- Author(s)
  西邨功祐，辻淳喜，村田順二
- Organizer
  2025年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 固相陽極溶解を利用したAgエッチングによる微細パターン形成とその応用2025
- Author(s)
  箱崎大志，藤井達也，辻淳喜，村田順二
- Organizer
  2025年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 金属/固体電解質界面の電解反応メカニズムの探索と鉄系材料の微細加工への応用2025
- Author(s)
  橋本佳奈，辻淳喜，村田順二
- Organizer
  2025年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 環境調和型ECMPによるSiCの高効率研磨?表面粗さ低減のための加工条件の探索?2025
- Author(s)
  巳波福也，美濃羽正士，村田順二
- Organizer
  2025年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-23K26015
[Presentation] PEM/Ag界面での陽極溶解を利用したマイクロ・ナノパターン形成とSERS基板への応用2025
- Author(s)
  藤井達也，辻淳喜，箱崎大志，村田順二
- Organizer
  電気化学会第92回大会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 高分子電解質を用いた固相電解酸化によるTi表面の改質2024
- Author(s)
  早川晋平，村田順二
- Organizer
  2024年度砥粒加工学会学術講演会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 固相電解酸化によるフッ素化合物の分解と微小液滴アレイへの応用2024
- Author(s)
  植村采奈，山﨑克真，村田順二
- Organizer
  2024年度精密工学会秋季大会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] Electrochemical Mechanical Polishing of SiC Wafer Using Solid Polymer Electrolyte2024
- Author(s)
  Junji Murata
- Organizer
  nternational Conference on Compound Semiconductor Manufacturing Technology (CSMANTECH2024)
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-23K26015
[Presentation] 固体電解質膜/Cu界面の固相陽極溶解を利用した微細パターンの形成2024
- Author(s)
  辻淳喜、村田順二
- Organizer
  電気化学会第91回大会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 固体高分子電解質膜/陽極界面の固相陽極溶解を利用した鉄系材料の微細パターン形成2024
- Author(s)
  橋本佳奈，辻淳喜，村田順二
- Organizer
  2024年度砥粒加工学会学術講演会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] Solid-State Electrochemical Oxide Pattern Formation on Au Surface Utilizing Polyelectrolyete Membrane Stamps2024
- Author(s)
  Tatsuya Fujii, Atsuki Tsuji, Junji Murata
- Organizer
  Pacific Rim Meeting on Electrochemical and Solid State Society(PRiME 2024)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] Cu Nano-imprinting with a Polymer Electrolyte Membrane Stamp at Room Temperature for Flexible Device Fabrication,2024
- Author(s)
  Atsuki Tsuj, Junji Murata
- Organizer
  The 31st International Display Workshops (IDW ‘24)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 固体高分子電解質を利用したSiC の電解酸化援用研磨における砥粒の最適2024
- Author(s)
  巳波福也，美濃羽正士，村田順二
- Organizer
  2024年度砥粒加工学会学術講演会
- Data Source
  KAKENHI-PROJECT-23K26015
[Presentation] 高分子電解質膜を用いた固相電気分解によるAuのマイクロ酸化膜パターン形成2024
- Author(s)
  藤井達也，辻淳喜，村田順二
- Organizer
  2024年度砥粒加工学会学術講演会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 固体高分子電解質を利用したSiCの電解酸化援用研磨における最適な砥粒の検討2024
- Author(s)
  巳波福也，美濃羽正士，村田順二
- Organizer
  2024年度精密工学会関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-23K26015
[Presentation] Fabrication of functional microstructures on Cu surface using solid-state anodic dissolution at the polymer electrolyte membrane/Cu interface2024
- Author(s)
  Atsuki Tsuj, Junji Murata
- Organizer
  The 20th International Conference on Precision Engineering(ICPE2024)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 炭化水素系高分子電解質を用いたECMPによるSiCの研磨特性2024
- Author(s)
  青木優大，稲田直樹，村田順二
- Organizer
  2024年度精密工学会関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-23K26015
[Presentation] 高分子電解質を用いた固相電解加工によるCu段差解消性能の評価2024
- Author(s)
  中谷有志、辻淳喜、村田順二
- Organizer
  2024年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-23K26015
[Presentation] 高分子電解質を用いた固相電解加工によるCu段差解消性能の評価2024
- Author(s)
  中谷有志、辻淳喜、村田順二
- Organizer
  2024年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 固体電解質膜 /Cu界面の固相陽極溶解による微細パターニングの高精度化のための加工条件の最適化2024
- Author(s)
  辻淳喜，村田順二
- Organizer
  2024年度精密工学会秋季大会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] Improving Patterning Resolution Via Solid-State Anodic Dissolution at the Polymer Electrolyte Membrane/Cu Interface Under Optimal Electrolytic Conditions2024
- Author(s)
  Atsuki Tsuji, Junji Murata
- Organizer
  Pacific Rim Meeting on Electrochemical and Solid State Society(PRiME 2024)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 高分子電解質を用いた半固定砥粒パッドによる SiC の ECMP 特性2023
- Author(s)
  稲田直希，村田順二
- Organizer
  精密工学会関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-19K04117
[Presentation] 固体電解質のイオン輸送を用いたCuの全固相電気化学パターニングにおける加工条件の影響2023
- Author(s)
  辻淳喜、村田順二
- Organizer
  精密工学会・2023年度精密工学会秋季大会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 高分子電解質膜を用いた電気化学的表面処理による微小液滴作製2023
- Author(s)
  植村采奈、小川優姫菜、村田順二
- Organizer
  精密工学会関西支部・ 2023年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 高分子電解質膜を用いた電気化学インプリントの開発―アルカリエッチングの併用による微細構造制御―2023
- Author(s)
  山﨑克真、村田順二
- Organizer
  精密工学会関西支部・ 2023年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 電解酸化を援用した触媒基準エッチングの基礎検討2023
- Author(s)
  巳波福也、村田順二
- Organizer
  精密工学会関西支部・ 2023年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-23K26015
[Presentation] 固体電解質膜を用いた電気化学インプリントにおけるパターン精度の向上2023
- Author(s)
  山﨑克真、辻淳喜、村田順二
- Organizer
  精密工学会・2023年度精密工学会秋季大会
- Data Source
  KAKENHI-PROJECT-23K26015
[Presentation] 高分子電解質膜を用いた電気化学的表面処理による微小液滴作製2023
- Author(s)
  植村采奈、小川優姫菜、村田順二
- Organizer
  精密工学会関西支部・ 2023年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-23K26015
[Presentation] 高分子電解質膜を用いた電気化学的表面処理による濡れ性コントラストの作製2023
- Author(s)
  植村采奈、小川優姫菜、村田順二
- Organizer
  精密工学会・2023年度精密工学会秋季大会
- Data Source
  KAKENHI-PROJECT-23K26015
[Presentation] Direct micropatterning of Cu using polymer electrolyte membrane stamp2023
- Author(s)
  A. Tsuji, J. Murata
- Organizer
  InternationalConference on Precision Engineering and Sustainable Manufacturing（PRESM）2023
- Data Source
  KAKENHI-PROJECT-23K26015
[Presentation] 高分子電解質のイオン輸送を利用したダマシン配線の形成2023
- Author(s)
  中谷有志、村田順二
- Organizer
  精密工学会関西支部・ 2023年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 電解酸化を援用した触媒基準エッチングの基礎検討2023
- Author(s)
  巳波福也、村田順二
- Organizer
  精密工学会関西支部・ 2023年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 高分子電解質のイオン輸送を利用したダマシン配線の形成2023
- Author(s)
  中谷有志、村田順二
- Organizer
  精密工学会関西支部・ 2023年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-23K26015
[Presentation] 固体電解質膜を用いた電気化学インプリントにおけるパターン精度の向上2023
- Author(s)
  山﨑克真、辻淳喜、村田順二
- Organizer
  精密工学会・2023年度精密工学会秋季大会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 固体電解質のイオン輸送を利用したCuエッチングによる微細パターニング2023
- Author(s)
  辻淳喜、村田順二
- Organizer
  精密工学会関西支部・ 2023年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 高分子電解質膜を用いた電気化学的表面処理による濡れ性コントラストの作製2023
- Author(s)
  植村采奈、小川優姫菜、村田順二
- Organizer
  精密工学会・2023年度精密工学会秋季大会
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] 高分子電解質膜を用いた電気化学インプリントの開発―アルカリエッチングの併用による微細構造制御―2023
- Author(s)
  山﨑克真、村田順二
- Organizer
  精密工学会関西支部・ 2023年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-23K26015
[Presentation] Direct micropatterning of Cu using polymer electrolyte membrane stamp2023
- Author(s)
  A. Tsuji, J. Murata
- Organizer
  InternationalConference on Precision Engineering and Sustainable Manufacturing（PRESM）2023
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-23K17725
[Presentation] Electrochemical mechanical polishing using solid polymer electrolyte2022
- Author(s)
  Junji Murata, Kenshin Hayama, Atsuki Tsuji
- Organizer
  The 19th International Conference on Precision Engineering
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04117
[Presentation] 高分子電解質を用いた電気化学的インプリントリソグラフィ技術の開発2021
- Author(s)
  梅崎凌平，土田ひなの，村田順二
- Organizer
  2021年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-19K04117
[Presentation] 高分子電解質を用いたTiの電気化学的表面改質2021
- Author(s)
  JIA Pengfei，梅崎凌平，村田順二
- Organizer
  2021年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-19K04117
[Presentation] 高分子電解質を用いた電解援用研磨法の開発～難加工金属の平滑化への適用～2021
- Author(s)
  辻淳喜，JIA Pengfei，村田順二
- Organizer
  2021年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-19K04117
[Presentation] 固体高分子電解質を含浸させた半固定砥粒工具によるSiCのECMP 特性2021
- Author(s)
  巴山顕真，稲田直希，村田順二
- Organizer
  2021年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-19K04117
[Presentation] 天然由来結合剤を用いた酸化セリウム固定砥粒パッドによるガラス研磨特性2021
- Author(s)
  村田順二，石丸太一，山﨑小有里
- Organizer
  2021年度砥粒加工学会学術講演会
- Data Source
  KAKENHI-PROJECT-19K04117
[Presentation] 高分子電解質を用いたワイドギャップ半導体の高能率電解複合研磨2021
- Author(s)
  巴山顕真，チェノルシャヒラビンティチェズルキフリ，村田順二
- Organizer
  2021年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-19K04117
[Presentation] 高分子電解質を用いた半導体の電解援用微細パターニング2020
- Author(s)
  梅﨑凌平、村田順二
- Organizer
  2020年度精密工学会春季大会学術講演会学生会員卒研発表講演会
- Data Source
  KAKENHI-PROJECT-19K04117
[Presentation] Microstructure fabrication method using a novel electrolyte-free electrochemical treatment with patterned polymer electrolyte membranes2020
- Author(s)
  Ryohei Umezaki, Junji Murata
- Organizer
  International Conference on Precision Engineering 2020 (ICPE2020)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04117
[Presentation] 固体高分子電解質を用いたGaNの電解アシスト複合研磨法の開発2020
- Author(s)
  西口嘉人、村田順二
- Organizer
  2020年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-19K04117
[Presentation] Liquid-electrolyte-free electrochemical surface finishing of GaN surface using a solid polymer electrolyte2020
- Author(s)
  Junji Murata, Yoshito Nishiguchi
- Organizer
  International Conference on Precision Engineering 2020 (ICPE2020)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19K04117
[Presentation] 光ファイバ/電極アレイを利用した光電気化学的切断法の開発2017
- Author(s)
  村田順二、船田光祐
- Organizer
  精密工学会2017年度春季大会
- Place of Presentation
  慶應大学
- Data Source
  KAKENHI-PROJECT-15K05736
[Presentation] A Feasibility Study of a Chemical Slicing Method for Semiconductor Wafers Using Photoelectrochemical Etching with2017
- Author(s)
  Junji Murata, Kousuke Funada
- Organizer
  International symposium in advances of abrasive technology 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K05736
[Presentation] コアシェル構造粒子を用いたSiC基板の電解複合CMP技術の開発2016
- Author(s)
  村田順二、淀川恒史
- Organizer
  電気化学会第83回大会
- Place of Presentation
  大阪大学
- Year and Date
  2016-03-29
- Data Source
  KAKENHI-PROJECT-15K05736
[Presentation] 化学エッチングを利用した半導体結晶の切断技術2016
- Author(s)
  村田順二
- Organizer
  日本学術振興会結晶加工と評価技術第１４５委員会
- Place of Presentation
  明治大学
- Invited
- Data Source
  KAKENHI-PROJECT-15K05736
[Presentation] Improvement of the Removal Rate of Planarization Technique for GaN by Applying Bias2010
- Author(s)
  S.Sadakuni, J.Murata, K.Yagi, Y.Sano, K.Arima, T.Okamoto, K.Tachibana, K.Yamauchi
- Organizer
  3rd International Symposium on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪大学(大阪)
- Year and Date
  2010-11-24
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] Improvement of the Removal Rate of Planarization Technique for GaN by Applying Bias2010
- Author(s)
  Shun Sadakuni, Junji Murata, et.al
- Organizer
  Third International Symposium on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪大学(大阪)
- Year and Date
  2010-11-24
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] Abrasive-free planarization of GaN using photoelectrochemical reaction2010
- Author(s)
  Shun Sadakuni, Junji Murata, et.al
- Organizer
  International Workshop on Nitride Semiconductors (IWN2010)
- Place of Presentation
  Tampa, Florida, USA
- Year and Date
  2010-09-22
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] 化学エッチングを用いたGaN基板の高能率平坦化加工2010
- Author(s)
  定国峻, 村田順二, 八木圭太, 佐野泰久, 有馬健太, 岡本武志, 橘一真, 山内和人
- Organizer
  2010年度秋季第71回応用物理学会学術講演会
- Place of Presentation
  長崎大学(長崎)
- Year and Date
  2010-09-14
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] Abrasive-free planarization of GaN using photo electrochemical reaction2010
- Author(s)
  S.Sadakuni, J.Murata, K.Yagi, K.Arima, Y.Sano, T.Okamoto, K.Tachibana, K.Yamauchi
- Organizer
  International Workshop on Nitride Semiconductors (IWN2010)
- Place of Presentation
  Tampa, USA.
- Year and Date
  2010-09-22
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] 化学エッチングを用いたGaN基板の高能率平坦化加工2010
- Author(s)
  定国峻, 村田順二, 八木圭太, 佐野泰久, 有馬健太, 岡本武志, 橘一真, 山内
- Organizer
  2010年度秋季第71回応用物理学会学術講演会
- Place of Presentation
  長崎大学
- Year and Date
  2010-09-15
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] GaN結晶表面加工技術の新展開(招待講演)2009
- Author(s)
  山内和人, 佐野泰久, 村田順二, 定国峻
- Organizer
  第70回応用物理学会学術講演会
- Place of Presentation
  富山大学
- Year and Date
  2009-09-09
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] 光電気化学プロセス及び固体酸触媒を用いたGaN基板平坦化技術の開発2009
- Author(s)
  定国峻, 村田順二, 八木圭太, 佐野泰久, 有馬健太, 岡本武志, 三村秀和, 山内和人
- Organizer
  2009年度精密工学会秋季大会
- Place of Presentation
  神戸大学
- Year and Date
  2009-09-10
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] 加工変質層を含むGaN基板の高能率平坦化加工2009
- Author(s)
  定国峻, 村田順二, 八木圭太, 佐野泰久, 有馬健太, 岡本武志, 三村秀和, 山内和人
- Organizer
  第18回SiC及び関連ワイドギャップ半導体研究会
- Place of Presentation
  神戸国際会議場
- Year and Date
  2009-12-17
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] Planarization of GaN using photoelectrochemical process and solid catalyst2009
- Author(s)
  S.Sadakuni, J.Murata, K.Yagi, T.Okamoto, K.Arima, H.Mimura, K.Yamauchi
- Organizer
  International Conference on Silicon Carbide and Related Materials 2009
- Place of Presentation
  Nurmberg, Germany.
- Year and Date
  2009-10-11
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] 光電気化学プロセス及び固体酸触媒を用いたGaN基板平坦化技術の開発2009
- Author(s)
  定国峻, 村田順二, 八木圭太, 佐野泰久, 有馬健太, 岡本武志, 三村秀和, 山内和人
- Organizer
  2009年度精密工学会秋季大会
- Place of Presentation
  神戸大学(兵庫)
- Year and Date
  2009-09-10
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] Planarization of GaN Surface using Photo-electrochemical process and solid acid catalyst2009
- Author(s)
  S.Sadakuni, J.Murata, K.Yagi, K.Arima, Y.Sano, T.Okamoto, H.Mimura, K.Yamauchi
- Organizer
  International Conference of Asian Society for Precision Engineering and Nanotechnology 2009
- Place of Presentation
  Kokura, Japan
- Year and Date
  2009-11-11
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] Improvement of Schottky Diode Propertied on GaN (0001) Surface Using Damage-free Planarization2009
- Author(s)
  J.Murata, Y.Shirasawa, Y.Sano, S.Sadakuni, K.Yagi, T.Okamoto, K.Yamauchi
- Organizer
  2nd International Symposium on Atomically Controlled Fabrication Technology
- Place of Presentation
  Osaka, Japan
- Year and Date
  2009-11-25
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] Development of Planarization Method for Gallium Nitride Using Photoel ectrochemical Process2009
- Author(s)
  S.Sadakuni, J.Murata, K.Yagi, Y.Sano, K.Arima, A.Hattori, T.Okamoto, H.Mimura, K.Yamauchi
- Organizer
  2nd International Symposium on Atomically Controlled Fabrication Technology
- Place of Presentation
  Osaka, Japan
- Year and Date
  2009-11-25
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] Planarization of GaN Surface using Photo-electro Chemical Process and Solid Acid Catalyst2009
- Author(s)
  S.Sadakuni, J.Murata, K.Yagi, K.Arima, Y.Sano, T.Okamoto, H.Mimura, K.Yamauchi
- Organizer
  3rd International Conference of Asian Society for Precision Engineering and Nanotechnology
- Place of Presentation
  小倉ステーションホテル(福岡)
- Year and Date
  2009-11-11
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] Improvement of Schottky Diode Properties on GaN(0001) Surface Using Damage-free Planarization2009
- Author(s)
  J.Murata, Y.Shirasawa, Y.Sano, S.Sadakuni, K.Yagi, T.Okamoto, K.Yamauchi
- Organizer
  2nd International Symposium on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪大学(大阪)
- Year and Date
  2009-11-25
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] Planarization of GaN using photoelectrochemical process and solid catalyst2009
- Author(s)
  S.Sadakuni, J.Murata, K.Yagi, K.Arima Y.Sano, T.Okamoto, H.Mimura, K.Yamauchi
- Organizer
  International Conference on Silicon Carbide and Related Materials 2009
- Place of Presentation
  Nurmberg, Germany
- Year and Date
  2009-10-13
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] Development of planarization method for gallium nitride using photo electrochemical process2009
- Author(s)
  S.Sadakuni, J.Murata, K.Yagi, Y.Sano, K.Arima, A.Hattori, T.Okamoto, H.Mimura, K.Yamauchi
- Organizer
  2nd International Symposium on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪大学(大阪)
- Year and Date
  2009-11-25
- Data Source
  KAKENHI-PROJECT-21760099
[Presentation] GaN結晶表面加工技術の新展開2009
- Author(s)
  山内和人, 佐野泰久, 村田順二, 定国峻
- Organizer
  第70回応用物理学会学術講演会
- Place of Presentation
  富山大学(冨山)(招待講演)
- Year and Date
  2009-09-08
- Data Source
  KAKENHI-PROJECT-21760099

1. 滝沢優 (30516357)

# of Collaborated Projects: 1 results

# of Collaborated Products: 1 results
2. HATTORI Azusa

# of Collaborated Projects: 1 results

# of Collaborated Products: 1 results
3. 定國峻

# of Collaborated Projects: 0 results

# of Collaborated Products: 2 results

MURATA Junji 村田 順二

Murata Junji 村田 順二

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固体界面電気化学反応の解明によるナノ加工基盤の構築とフレキシブル素子応用Principal Investigator

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固体電解質を用いた環境調和型電気化学機械研磨のメカニズム解明と技術体系の構築Principal Investigator

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固体電解質のイオン輸送を用いた環境調和型電気化学表面プロセスの開発Principal Investigator

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Development of electrochemical dry polishing method for GaN surface using solid polymer electrolytePrincipal Investigator

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Development of chemical slicing method for Photovaltaic materials with low ker-loss and thin wafer thicknessPrincipal Investigator

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Development of polishing method for next-generation opt-electronic materials producing atomically-smooth surfacesPrincipal Investigator

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Development of a novel planarization method for gallium nitride surface using photo-electrochemical treatment.Principal Investigator

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[Book] 生産加工入門2014

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[Journal Article] Soft Copper Nanoimprinting via Solid-State Electrochemical Etching for Flexible Optoelectronics2025

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[Journal Article] Ultrafast Solid‐State Electrochemical Imprinting Utilizing Polymer Electrolyte Membrane Stamps for Static/Dynamic Structural Coloration and Letter Encryption2024

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[Journal Article] Sustainable Electrochemical Mechanical Polishing (ECMP) for 4H-SiC wafer using chemical-free polishing slurry with hydrocarbon-based solid polymer electrolyte2024

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[Journal Article] Cu Direct Nanopatterning Using Solid‐State Electrochemical Dissolution at the Anode/Polymer Electrolyte Membrane Interface2024

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[Journal Article] Solid-state electrochemical oxidation with polyelectrolyte membrane stamps for micro-/nanoscale pattern formation on Au surfaces2024

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[Journal Article] Environment-friendly electrochemical mechanical polishing using solid polymer electrolyte/CeO2 composite pad for highly efficient finishing of 4H-SiC (0001) surface2023

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MURATA Junji 村田順二

Murata Junji 村田順二