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中村 初央  ナカムラ ハツオ

ORCIDConnect your ORCID iD *help
Researcher Number 80076843
Other IDs
Affiliation (based on the past Project Information) *help 1995: 大阪電気通信大学, 工学部, 教授
Review Section/Research Field
Principal Investigator
表面界面物性
Keywords
Principal Investigator
高融点物質 / 遷移金属 / 化学結合状態 / 非破壊分析 / シリコン / 電子状態密度 / 価電子帯 / X線分光
  • Research Projects

    (1 results)
  •  軟X線分光法による金属・シリサイド薄膜の表面層・界面の研究Principal Investigator

    • Principal Investigator
      中村 初央
    • Project Period (FY)
      1995
    • Research Category
      Grant-in-Aid for General Scientific Research (C)
    • Research Field
      表面界面物性
    • Research Institution
      Osaka Electro-Communication University

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