SASAKI Katsutaka 佐々木克孝

… Alternative Names

佐々木克孝ササキカツタカ

佐々木克考ササキカツタカ

Less

Researcher Number	80091552
Other IDs
External Links
Affiliation (based on the past Project Information) *help	2006 – 2008: 北見工業大学, 工学部, 教授 1998 – 2004: 北見工業大学, 工学部, 教授 1994 – 1995: 北見工業大学, 工学部, 教授 1990: 北見工業大学, 工学部, 教授 1987 – 1989: 北見工業大学, 工学部, 助教授
Review Section/Research Field	Principal Investigator Electronic materials/Electric materials / 電子材料工学 Except Principal Investigator Electronic materials/Electric materials / Electronic materials/Electric materials / Material processing/treatments
Keywords	Principal Investigator 耐熱性 / 薄膜キャパシタ / 界面反応 / 拡散バリヤ / 漏れ電流特性 / 陽極酸化膜キャパシタ / 低損失特性 / 高誘電率化 / 陽極酸化膜 / メタライゼ-ション技術 … More / アルミニウム金属間化合物 / Auger electron spectroscopy / Interface reaction / Interdiffusion / Diffusion barrier / Intermetallic compound film / 表面のキャラクタリゼーション / 結晶構造 / 金属関化合物膜 / SiLSI薄膜技術 / キャラクタリゼーション / オージェ電子分光分析 / VLSI薄膜技術 / 相互拡散 / 金属間化合物膜 / high heat - proof capacitor / high permittivity / Poole-Frenkl conduction / Schottky effect / thin film capacitor / Ta - Zr anodized capacitor / Zr anodized film / Hf anodized film / Ta-Zr合金膜 / 電気伝導機構 / 高耐熱キャパシタ / Poole-Frenkel伝導 / Schottky伝導 / Ta-Zr合金陽極酸化膜 / Zr陽極酸化膜 / Hf陽極酸化膜 / low loss property / high permitivity / heat-proof property / Al_3Ta compound / Al_3Zr compound / Al_3Hf compound / anodized film / high reliable capacitor / アルミ-遷移金属の金属間化合物 / 低損失化 / 周波数特性 / 酸化膜厚の薄層化 / 容量低減の抑制 / Al_3Ta金属間化合物 / Al_3Zr金属間化合物 / Al_3Hf金属間化合物 / 高信頼性薄膜キャパシタ / Reduction of oxide thickness / tan delta / Heat-proof property / Anodized capacitor / Ta_2N compound film / 漏れ電流 / 誘電損 / 陽極酸化 / 窒化タンタル化合物膜 / 薄膜コンデンサ / tanδ / Ta_2N化合物膜 / SiーLSIコンタクト構造 / シリコンLSIコンタクト構造 … More Except Principal Investigator RuO_2 / reactive sputtering / 反応性スパッタリング / electrochromic / solid-electrolyte / NiOOH thin film / hydrated Ta_2O_5 thin film / スーパーキャパシタ / 電気化学 / 固体電解質薄膜 / 水酸化物 / 水和酸化物 / Ta_2O_5固体電解質 / エレクトロクロミック / 固体電解質 / NiOOH薄膜 / 水和Ta_2O_5薄膜 / Ta_2O_5 / DRAM capacitor / surfactant / sputtering / surface roughness / c-axis single oriented / Ru thin film / 表面および界面の平坦性 / Ta_2O_5薄模 / Ta_2O_5薄膜 / DRAMキャパシタ / サーファクタント / スパッタリング / 表面粗さ / c軸単配向 / Ru薄膜 / semiconductor / thermal decomposition / capacitor electrode / metallic conduction / conducting oxide thin film / 熱分解 / 半導体 / 熱的分解 / キャパシタ電極 / 金属伝導 / 導電性酸化物薄膜 / 材料加工・処理 / 電子・電気材料 / 表面・界面物性 / 原子間力顕微鏡 / 角度分解光電子分光 / 電極 / 銀薄膜 / 電気抵抗 / 自己組織化 / 表面・界面 / 金属物性 Less

自己集合単分子膜を利用した銀薄膜の安定化
- Principal Investigator
  
  KAWAMURA Midori
- Project Period (FY)
  2007 – 2008
- Research Category
  
  Grant-in-Aid for Exploratory Research
- Research Field
  
  Material processing/treatments
- Research Institution
  Kitami Institute of Technology
Preparation of electrochemically active hydrate and hydroxide thin films by sputtering
- Principal Investigator
  
  ABE Yoshio
- Project Period (FY)
  2006 – 2007
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Kitami Institute of Technology
Structure control of sputter deposited noble metal thin films using surfactant
- Principal Investigator
  
  ABE Yoshio
- Project Period (FY)
  2003 – 2004
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Kitami Institute of Technology
Preparation of Ta Solid Solution Anodized Capacitor and Evaluation of its ReliabilityPrincipal Investigator
- Principal Investigator
  
  SASAKI Katutaka
- Project Period (FY)
  2001 – 2002
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Kitami Institute of Technology
Preparation and characterization of reactively sputtered conducting Rh oxide thin films
- Principal Investigator
  
  ABE Yoshio
- Project Period (FY)
  1999 – 2000
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Kitami Institute of Technology
Realization of High-Reliable Thin Film Capacitor by Anodizing A1- Transition Metal Intermetallic CompoundsPrincipal Investigator
- Principal Investigator
  
  SASAKI Katsutaka
- Project Period (FY)
  1998 – 2000
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Kitami Institute of Technology
Preparation of Heat-proof Thin Film Capacitor by Using Ta_2N Anodized FilmPrincipal Investigator
- Principal Investigator
  
  SASAKI Katsutaka
- Project Period (FY)
  1994 – 1995
- Research Category
  
  Grant-in-Aid for Developmental Scientific Research (B)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Kitami Institute of Technology
超LSIメタライゼ-ション技術へのアルミニウム金属間化合物膜の適用に関する研究Principal Investigator
- Principal Investigator
  
  佐々木克孝
- Project Period (FY)
  1990
- Research Category
  
  Grant-in-Aid for Scientific Research on Priority Areas
- Research Institution
  Kitami Institute of Technology
超LSIメタライゼ-ション技術へのアルミニウム金属間化合物膜の適用に関する研究Principal Investigator
- Principal Investigator
  
  佐々木克考
- Project Period (FY)
  1989
- Research Category
  
  Grant-in-Aid for Scientific Research on Priority Areas
- Research Institution
  Kitami Institute of Technology
Preparation of Refractory Intermetallic Compound Film and It's Application to Electronic MaterialsPrincipal Investigator
- Principal Investigator
  
  SASAKI Katsutaka
- Project Period (FY)
  1987 – 1988
- Research Category
  
  Grant-in-Aid for General Scientific Research (C)
- Research Field
  
  電子材料工学
- Research Institution
  Kitami Institute of Technology

All 2008 2007 2005 2004 Other

All Journal Article Presentation

[Journal Article] Ion conducting Properties of Hydrogen-Containing Ta_2O_5 Thin Films Prepared by Reactive Sputtering2008
- Author(s)
  Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, H. Itoh
- Journal Title
  
  Vacuum (掲載决定)
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18560297
[Journal Article] Ion conducting Properties of Hydrogen-Containing Ta_2O_5 Thin Films Prepared by Reactive Sputtering2008
- Author(s)
  Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, H. Itoh
- Journal Title
  
  Vacuum (掲載決定)
- Description
  「研究成果報告書概要(和文)」より
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18560297
[Journal Article] Preparation of Hydrogen-Containing Ta_2O_5 Thin Films by Reactive Sputtering Using O_2+H_2O Mixed Gas2007
- Author(s)
  Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, H. Itoh
- Journal Title
  
  Japanese Journal of Applied Physics 46
  
  Pages: 777-779
- NAID
  10018545797
- Description
  「研究成果報告書概要(和文)」より
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18560297
[Journal Article] Preparation of Hydrogen-Containing Ta_2O_5 Thin Films by Reactive Sputtering Using O_2+H_2O Mixed Gas2007
- Author(s)
  Y.Abe, N.Itadani, M.Kawamura, K.Sasaki, H.Itoh
- Journal Title
  
  Japanese Journal of Applied Physics 46・2
  
  Pages: 777-779
- NAID
  10018545797
- Data Source
  KAKENHI-PROJECT-18560297
[Journal Article] Preparation of hydrogen-containing Ta_2O_5 thin films by reactive sputtering using 0_2+H_2O mixed gas2007
- Author(s)
  Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, H. Itoh
- Journal Title
  
  Japanese Journal of Applied Physics vol.46
  
  Pages: 777-779
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Journal Article] Oxidation and Morphology Change of Ru Films Caused by Sputter Deposition of Ta_2O_5 Films2005
- Author(s)
  Y.Abe, M.Kawamura, K.Sasaki
- Journal Title
  
  Japanese Journal of Applied Physics (印刷中)
- NAID
  10015470926
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560268
[Journal Article] Improvement of the Crystal Orientation and Surface Roughness of Ru Thin Films by Introducing Oxygen during Sputtering2004
- Author(s)
  Y.Abe, S.Shinkai, K.Sasaki, J.Yan, K.Maekawa
- Journal Title
  
  Japanese Journal of Applied Physics Vol43, No.1
  
  Pages: 277-280
- NAID
  10011949443
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560268
[Journal Article] Improvement of the Crystal Orientation and Surface Roughness of Ru Thin Films by Introducing Oxygen During Sputtering2004
- Author(s)
  Y.Abe, S.Shinkai, K.Sasaki, J.Yah, K.Maekawa
- Journal Title
  
  Japanese Journal of Applied Physics Vol.43, No.1
  
  Pages: 277-280
- NAID
  10011949443
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560268
[Journal Article] Oxidation and Morphology Change of Ru Films Caused by Sputter Deposition of Ta_2O_5 Films
- Author(s)
  Y.Abe, M.Kawamura, K.Sasaki
- Journal Title
  
  Japanese Journal of Applied Physics (in print)
- NAID
  10015470926
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560268
[Journal Article] Ion conducting properties of hydrogen-containing Ta_2O_5 thin films prepared by reactive sputtering
- Author(s)
  Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, H. Itoh
- Journal Title
  
  Vacuum (In press)
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] 水素添加Ta_2O_5スパッタ薄膜のイオン伝導性に対する膜中水素量の影響2008
- Author(s)
  彭〓、滝口康弘、阿部良夫、川村みどり、佐々木克孝、伊藤英信、鈴木勉
- Organizer
  第55回応用物理学関係連合講演会
- Place of Presentation
  船橋市
- Year and Date
  2008-03-29
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] Effects of substrate cooling on the ionic conductivity of Ta_2O_5 solid-electrolyte thin films prepared by reactive sputtering using H_2O gas2008
- Author(s)
  Y. Abe, F. Peng, Y. Takiguchi, M. Kawamura, K. Sasaki, H. Itoh, T. Suzuki
- Organizer
  The 213th Meeting of the Electrochemical Society
- Place of Presentation
  Phoenix (USA)
- Year and Date
  2008-05-20
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] 表界面層を導入した銀薄膜の熱的安定性2008
- Author(s)
  川村みどり、筆井晃正、阿部良夫、佐々木克孝
- Organizer
  日本化学会北海道支部夏季研究発表会
- Place of Presentation
  北見工業大学
- Year and Date
  2008-07-19
- Data Source
  KAKENHI-PROJECT-19656185
[Presentation] 銀薄膜の凝集抑制と表界面層の影響2008
- Author(s)
  川村、井波、阿部、佐々木
- Organizer
  (社)表面技術協会第117回講演大会
- Place of Presentation
  日本大学津田沼校舎
- Year and Date
  2008-03-14
- Data Source
  KAKENHI-PROJECT-19656185
[Presentation] Ion conducting properties of hydrogen-containing Ta_2O_5 thin films prepared by reactive sputtering2008
- Author(s)
  Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, H. Itoh
- Organizer
  The 9th International Symposium on Sputtering and Plasma Processes
- Place of Presentation
  Kanazawa
- Year and Date
  2008-06-07
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] Effects of substrate temperature on the ion-conducting properties of hydrogen-containing Ta_2O_5 thin films2008
- Author(s)
  Y. Takiguchi, F. Peng, Y. Abe, K. Sasaki, M. Kawamura, H. Itoh, T. Suzuki
- Organizer
  Hokkaido Branch Meeting of the Electrochemical Society of Japan, Japan Society of Corrosion Engineering, and the Surface Finishing Society of Japan
- Place of Presentation
  Sapporo
- Year and Date
  2008-01-30
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] Al/Ag/Al積層膜の耐熱性に対する膜厚依存性2008
- Author(s)
  福田、井波、川村、・阿部、佐々木
- Organizer
  2007年度応用物理学会北海道支部学術講演会
- Place of Presentation
  北海道大学学術交流会館
- Year and Date
  2008-01-11
- Data Source
  KAKENHI-PROJECT-19656185
[Presentation] 水素添加Ta_2O_5スパッタ薄膜のイオン伝導性に及ぼす基板温度の影響2008
- Author(s)
  滝口康弘、彭〓、阿部良夫、佐々木克孝、川村みどり、伊藤英信、鈴木勉
- Organizer
  三学協会北海道支部会
- Place of Presentation
  札幌市
- Year and Date
  2008-01-30
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] Effects of hydrogen content in Ta_2O_5 thin films on their ion conductivity2008
- Author(s)
  F. Peng, Y. Takiguchi, Y. Abe, M. Kawamura, K. Sasaki, H. Itoh, T. Suzuki
- Organizer
  The 55th Spring Meeting of the Japan Society of Applied Physics and Related Societies
- Place of Presentation
  Funabashi
- Year and Date
  2008-03-29
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] Ag薄膜/SiO_2層界面へのMPTMS-SAMの導入による密着性の向上2008
- Author(s)
  筆井晃正、川村みどり、阿部良夫、佐々木克孝
- Organizer
  応用物理学関係連合講演会
- Place of Presentation
  筑波大学
- Year and Date
  2008-03-31
- Data Source
  KAKENHI-PROJECT-19656185
[Presentation] Electrochromic devices based on nickel oxyhydroxide thin film2007
- Author(s)
  H. Ueta, Y. Abe, F. Peng, K. Kato, M. Kawamura, K. Sasaki, H. Itoh
- Organizer
  The 14th International Display Workshops
- Place of Presentation
  Sapporo
- Year and Date
  2007-12-05
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] Nickel oxyhydroxide thin films prepared by reactive sputtering using water vapor2007
- Author(s)
  H. Ueta, Y. Abe, M. Kawamura, K. Kato, K. Sasaki
- Organizer
  The 68 the Autumn Meeting of the Japan Society of Applied Physics
- Place of Presentation
  Sapporo
- Year and Date
  2007-09-07
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] 水蒸気を用いた反応性スパッタリングによるオキシ水酸化ニッケル薄膜の作製2007
- Author(s)
  上田英明、阿部良夫、川村みどり、加藤清彦、佐々木克孝
- Organizer
  第68回応用物理学会学術講演会
- Place of Presentation
  札幌市
- Year and Date
  2007-09-07
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] Electrochromic Devices Based on Nickel Oxyhydroxide Thin Film2007
- Author(s)
  H. Ueta, Y. Abe, F. Peng, K. Kato, M. Kawamura, K. Sasaki, H. Itoh
- Organizer
  The 14th International Display Workshops
- Place of Presentation
  札幌市
- Year and Date
  2007-12-05
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] Nickel Oxyhydroxide Thin Films Prepared by Reactive Sputtering UsingO_2+H_2O Mixed Gas2007
- Author(s)
  H. Ueta, Y. Abe, K. Kato, M. Kawamura, K. Sasaki, H. Itoh
- Organizer
  The 212th Meeting of the Electrochemical Society
- Place of Presentation
  アメリカ合衆国、ワシントン
- Year and Date
  2007-10-08
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] Ion conducting Properties of Hydrogen-Containing Ta_2O_5 Thin Films Prepared by Reactive Sputtering2007
- Author(s)
  Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, H. Itoh
- Organizer
  The 9th International Symposium on Sputtering and Plasma Processes
- Place of Presentation
  金沢市
- Year and Date
  2007-06-07
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] Effects of Substrate Temperature on Hydrogen Content of Ta_2O_5 Thin Films Prepared by Reactive Sputtering in an Atmosphere of Water Vapor2007
- Author(s)
  F. Peng Y. Abe, M. Kawamura, K. Sasaki, H. Itoh, T. Suzuki
- Organizer
  第68回応用物理学会学術講演会
- Place of Presentation
  札幌市
- Year and Date
  2007-09-07
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] Effects of substrate temperature on hydrogen content of Ta_2O_5 thin films prepared by reactive sputtering in an atmosphere of water vapor2007
- Author(s)
  F. Peng Y. Abe, M. Kawamura, K. Sasaki, H. Itoh, T. Suzuki
- Organizer
  The 68 the Autumn Meeting of the Japan Society of Applied Physics
- Place of Presentation
  Sapporo
- Year and Date
  2007-09-07
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] Nickel Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O_2+H_2O Mixed Gas2007
- Author(s)
  H. Ueta, Y. Abe, K. Kato, M. Kawamura, K. Sasaki, H. Itoh
- Organizer
  The 212th Meeting of The Electrochemical Society
- Place of Presentation
  アメリカ合衆国、ワシントン
- Year and Date
  2007-10-08
- Data Source
  KAKENHI-PROJECT-18560297
[Presentation] Nickel oxyhydroxide thin films prepared by reactive sputtering using O_2+H_2O mixed gas2007
- Author(s)
  H. Ueta, Y. Abe, K. Kato, M. Kawamura, K. Sasaki, H. Itoh
- Organizer
  The 212th Meeting of the Electrochemical Society
- Place of Presentation
  Washington DC (USA)
- Year and Date
  2007-10-08
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-18560297

1. ABE Yoshio (20261399)

# of Collaborated Projects: 7 results

# of Collaborated Products: 30 results
2. KAWAMURA Midori (70261401)

# of Collaborated Projects: 5 results

# of Collaborated Products: 28 results
3. NOYA Atsushi (60133807)

# of Collaborated Projects: 4 results

# of Collaborated Products: 0 results
4. DOBASHI Tsuyoshi (50123956)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
5. YANAGISAWA Hideto (70158020)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
6. SHIROSHIGE Michihiro

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results

SASAKI Katsutaka 佐々木 克孝

佐々木 克孝 ササキ カツタカ

佐々木 克考 ササキ カツタカ

Research Projects

Research Products

Co-Researchers

自己集合単分子膜を利用した銀薄膜の安定化

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Preparation of electrochemically active hydrate and hydroxide thin films by sputtering

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Structure control of sputter deposited noble metal thin films using surfactant

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Preparation of Ta Solid Solution Anodized Capacitor and Evaluation of its ReliabilityPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Preparation and characterization of reactively sputtered conducting Rh oxide thin films

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Realization of High-Reliable Thin Film Capacitor by Anodizing A1- Transition Metal Intermetallic CompoundsPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Preparation of Heat-proof Thin Film Capacitor by Using Ta_2N Anodized FilmPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

超LSIメタライゼ-ション技術へのアルミニウム金属間化合物膜の適用に関する研究Principal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Institution

超LSIメタライゼ-ション技術へのアルミニウム金属間化合物膜の適用に関する研究Principal Investigator

Principal Investigator

Project Period (FY)

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Preparation of Refractory Intermetallic Compound Film and It's Application to Electronic MaterialsPrincipal Investigator

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[Journal Article] Ion conducting Properties of Hydrogen-Containing Ta_2O_5 Thin Films Prepared by Reactive Sputtering2008

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[Journal Article] Ion conducting Properties of Hydrogen-Containing Ta_2O_5 Thin Films Prepared by Reactive Sputtering2008

Author(s)

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Description

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[Journal Article] Preparation of Hydrogen-Containing Ta_2O_5 Thin Films by Reactive Sputtering Using O_2+H_2O Mixed Gas2007

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NAID

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[Journal Article] Preparation of Hydrogen-Containing Ta_2O_5 Thin Films by Reactive Sputtering Using O_2+H_2O Mixed Gas2007

SASAKI Katsutaka 佐々木克孝

佐々木克孝ササキカツタカ

佐々木克考ササキカツタカ