Youn Sung-Won ＹｏｕｎＳｕｎｇーＷｏｎ

Researcher Number	80510065
Affiliation (Current)	2025: 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 主任研究員
Affiliation (based on the past Project Information) *help	2017 – 2021: 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 主任研究員 2016: 国立研究開発法人産業技術総合研究所, 集積マイクロシステム研究センター, 主任研究員
Review Section/Research Field	Principal Investigator Production engineering/Processing studies Except Principal Investigator Basic Section 18020:Manufacturing and production engineering-related
Keywords	Principal Investigator ナノマイクロ加工 / モールド設計技術 / 凝縮性ガス / 残膜均一化 / モールド設計 / ナノインプリントリソグラフィ Except Principal Investigator 飽和蒸気圧 / ナノパターン / 充填 / 光ナノインプリント … More / リソグラフィ / 微小液滴 / 凝縮性ガス / スループット / NIL / ナノインプリント Less

Research on ultra-high-speed UV nanoimprint using mixed condensable gas and droplet dispensing
- Principal Investigator
  
  Kenta Suzuki
- Project Period (FY)
  2019 – 2021
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Review Section
  
  Basic Section 18020:Manufacturing and production engineering-related
- Research Institution
  National Institute of Advanced Industrial Science and Technology
A study on process and mold design to obtain quick bubble removal and residual layer uniformity on whole imprinting areaPrincipal Investigator
- Principal Investigator
  
  Youn Sung-Won
- Project Period (FY)
  2016 – 2018
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  National Institute of Advanced Industrial Science and Technology

All 2022 2019 2018 2017 2016

All Journal Article Presentation

[Journal Article] Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene2022
- Author(s)
  Kenta Suzuki, Tatsuya Okawa, and Sung-Won Youn
- Journal Title
  
  JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
  
  Volume: 35
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19H02046
[Journal Article] Mold Design and Process for Application of Nanoimprint Lithography to Interconnections2019
- Author(s)
  尹成圓、鈴木健太、廣島洋
- Journal Title
  
  Journal of The Japan Institute of Electronics Packaging
  
  Volume: 22 Issue: 2 Pages: 158-163
- DOI
  10.5104/jiep.22.158
- NAID
  130007606390
- ISSN
  1343-9677, 1884-121X
- Year and Date
  2019-03-01
- Language
  Japanese
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035, KAKENHI-PROJECT-19H02046
[Journal Article] Fabrication of high-aspect-ratio micropatterns in soluble block-copolymer polyimides by a UV-assisted thermal imprint process2019
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Takagi Hideki、Hiroshima Hiroshi、Kinoshita Yoshinori、Hayashi Katsuhiro
- Journal Title
  
  Journal of Mechanical Science and Technology
  
  Volume: 33 Issue: 8 Pages: 3755-3760
- DOI
  10.1007/s12206-019-0718-y
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19H02046
[Journal Article] Fabrication of High-Aspect-Ratio Micropatterns in Soluble Block-Copolymer Polyimides by an UV-assisted Thermal Imprint Process2019
- Author(s)
  Sung-Won Youn, Kenta Suzuki, Takagi Hideki, Hiroshi Hiroshima, Yoshinori Kinoshita, Katsuhiro Hayashi
- Journal Title
  
  Journal of Mechanical Science and Technology
  
  Volume: 印刷中
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035
[Journal Article] Solubility Property of Condensable Gases of Trans-1-Chloro-3,3,3-Trifluoropropene and Trans-1,3,3,3-Tetrafluoropropene in UV Nanoimprint2019
- Author(s)
  Suzuki Kenta、Youn Sung-Won、Hiroshima Hiroshi
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 32 Issue: 1 Pages: 123-130
- DOI
  10.2494/photopolymer.32.123
- NAID
  130007744312
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2019-06-24
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19H02046
[Journal Article] Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography2018
- Author(s)
  Sung-Won Youn, Kenta Suzuki, Hiroshi Hiroshima
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 57 Issue: 6S1 Pages: 06HG03-06HG03
- DOI
  10.7567/jjap.57.06hg03
- NAID
  210000149171
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035, KAKENHI-PROJECT-17K14575
[Journal Article] Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere2018
- Author(s)
  Kenta Suzuki, Sung-Won Youn, Hiroshi Hiroshima
- Journal Title
  
  Journal of Photopolymer Science and Technology
  
  Volume: 31 Pages: 295-300
- NAID
  130007481515
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035
[Journal Article] Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography2018
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 印刷中
- NAID
  210000149171
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035
[Journal Article] Automated Pattern Modification Method to Equalize Residual Layer Thickness in Nanoimprint Lithography2017
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Journal Title
  
  Conference Proceedings of NNT2017
  
  Volume: 1 Pages: 53-54
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035
[Journal Article] Basic Verification of Automated Design Method of Capacity-equalized Mold for Nanoimprint Lithography2017
- Author(s)
  Sung-Won Youn (尹成圓), Kenta Suzuki, and Hiroshi Hiroshima
- Journal Title
  
  Journal of Nanoscience and Nanotechnology
  
  Volume: 印刷中
- Peer Reviewed / Acknowledgement Compliant / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Journal Article] Basic Verification of Method for Automated Design of Capacity-Equalized Mold for Nanoimprint Lithography2017
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Journal Title
  
  Journal of Nanoscience and Nanotechnology
  
  Volume: 17 Issue: 11 Pages: 8475-8479
- DOI
  10.1166/jnn.2017.15153
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06035
[Journal Article] Fabrication of a Holographic Pattern by UV-NIL Using PFP Gas2017
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Journal Title
  
  Program book of the 8th Japan-China-Korea MEMS/NEMS 2017
  
  Volume: 1 Pages: 28-29
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere2018
- Author(s)
  Kenta Suzuki, Sung-Won Youn, and Hiroshi Hiroshima
- Organizer
  The 35th International Conference of Photopolymer Science and Technology
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Fabrication of High Aspect Ratio Micropatterns in Soluble Block-copolymer Polyimide by UV-assisted Thermal Imprint Process2018
- Author(s)
  Sung-Won Youn, Kenta Suzuki, and Hiroshi Hiroshima
- Organizer
  The 1st Emerging Technologies in Mechanical Engineering (ETME 2018)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Fabrication of wafer-level mold for nanoimprint lithography using STAMP program and self-alignment etching process2018
- Author(s)
  Sung-Won Youn, Kenta Suzuki, and Hiroshi Hiroshima
- Organizer
  International Symposium on Precision and Engineering and Sustainable Manufacturing
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Control of pattern capacity in nanoimprint mold by adding 2D/2.5D patterns to obtain uniform residual layer2018
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Organizer
  The 5th International Conference & Exhibition for Nanotechnology　(NANOPIA2018)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Fabrication of Flexible Replica Mold with 2D and 2.5D Structures Designed by STAMP Program2018
- Author(s)
  Sung-Won Youn, Kenta Suzuki, and Hiroshi Hiroshima
- Organizer
  9th Japan-China-Korea Joint Conf. on MEMS/NEMS
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Fabrication of a Holographic Pattern by UV-NIL Using PFP Gas2017
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Organizer
  8th Japan-China-Korea MEMS/NEMS 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Automated Pattern Modification Method to Equalize Residual Layer Thickness in Nanoimprint Lithography2017
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Organizer
  The 16th International Conference on Nanoimprint and Nanoprint Technology (NNT2017)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography2017
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Organizer
  30st International Microprocesses and Nanotechnology Conferences
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] A Mold Pattern Design Method for Wafer-level Nanoimprint Lithography2017
- Author(s)
  Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
- Organizer
  1st International Workshop on MEMS and Sensor System 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Mold Pattern Design for Control of Residual Layer Uniformity in Nanoimprint Lithography2016
- Author(s)
  Sung-Won Youn (尹成圓)
- Organizer
  The 7th Japan-China-Korea Joint Conference on MEMS/NEMS 2016
- Place of Presentation
  Sapporo Education and Culture Hall, Hokkaido, Japan
- Year and Date
  2016-09-21
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Prototype of Complementary Pattern Generator for Control of Residual Layer Uniformity in Nanoimprint Lithography2016
- Author(s)
  Sung-Won Youn (尹成圓)
- Organizer
  29th International Microprocesses and Nanotechnology Conference
- Place of Presentation
  ANA Crowne Plaza Kyoto, Kyoto, Japan
- Year and Date
  2016-11-08
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035
[Presentation] Basic Verification of Automated Design Method of Capacity-equalized Mold for Nanoimprint Lithography2016
- Author(s)
  Sung-Won Youn (尹成圓)
- Organizer
  International Conference Electronic Materials and Nanotechnology for Green Environment 2016 (ENGE 2016)
- Place of Presentation
  Ramada Plaza Jeju Hotel, Jeju, Korea
- Year and Date
  2016-11-06
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06035

1. Kenta Suzuki (60709509)

# of Collaborated Projects: 2 results

# of Collaborated Products: 19 results
2. Hiroshima Hiroshi

# of Collaborated Projects: 1 results

# of Collaborated Products: 17 results

Youn Sung-Won Ｙｏｕｎ ＳｕｎｇーＷｏｎ

Research Projects

Research Products

Co-Researchers

Research on ultra-high-speed UV nanoimprint using mixed condensable gas and droplet dispensing

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

A study on process and mold design to obtain quick bubble removal and residual layer uniformity on whole imprinting areaPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

[Journal Article] Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene2022

Author(s)

Journal Title

Data Source

[Journal Article] Mold Design and Process for Application of Nanoimprint Lithography to Interconnections2019

Author(s)

Journal Title

DOI

NAID

ISSN

Year and Date

Language

Data Source

[Journal Article] Fabrication of high-aspect-ratio micropatterns in soluble block-copolymer polyimides by a UV-assisted thermal imprint process2019

Author(s)

Journal Title

DOI

Data Source

[Journal Article] Fabrication of High-Aspect-Ratio Micropatterns in Soluble Block-Copolymer Polyimides by an UV-assisted Thermal Imprint Process2019

Author(s)

Journal Title

Data Source

[Journal Article] Solubility Property of Condensable Gases of Trans-1-Chloro-3,3,3-Trifluoropropene and Trans-1,3,3,3-Tetrafluoropropene in UV Nanoimprint2019

Author(s)

Journal Title

DOI

NAID

ISSN

Year and Date

Language

Data Source

[Journal Article] Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography2018

Author(s)

Journal Title

DOI

NAID

Data Source

[Journal Article] Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere2018

Author(s)

Journal Title

NAID

Data Source

[Journal Article] Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography2018

Author(s)

Journal Title

NAID

Data Source

[Journal Article] Automated Pattern Modification Method to Equalize Residual Layer Thickness in Nanoimprint Lithography2017

Author(s)

Journal Title

Data Source

[Journal Article] Basic Verification of Automated Design Method of Capacity-equalized Mold for Nanoimprint Lithography2017

Author(s)

Journal Title

Data Source

[Journal Article] Basic Verification of Method for Automated Design of Capacity-Equalized Mold for Nanoimprint Lithography2017

Author(s)

Journal Title

DOI

Data Source

[Journal Article] Fabrication of a Holographic Pattern by UV-NIL Using PFP Gas2017

Author(s)

Journal Title

Data Source

Youn Sung-Won ＹｏｕｎＳｕｎｇーＷｏｎ