• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Youn Sung-Won  Youn SungーWon

ORCIDConnect your ORCID iD *help
Researcher Number 80510065
Affiliation (Current) 2025: 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 主任研究員
Affiliation (based on the past Project Information) *help 2017 – 2021: 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 主任研究員
2016: 国立研究開発法人産業技術総合研究所, 集積マイクロシステム研究センター, 主任研究員
Review Section/Research Field
Principal Investigator
Production engineering/Processing studies
Except Principal Investigator
Basic Section 18020:Manufacturing and production engineering-related
Keywords
Principal Investigator
ナノマイクロ加工 / モールド設計技術 / 凝縮性ガス / 残膜均一化 / モールド設計 / ナノインプリントリソグラフィ
Except Principal Investigator
飽和蒸気圧 / ナノパターン / 充填 / 光ナノインプリント … More / リソグラフィ / 微小液滴 / 凝縮性ガス / スループット / NIL / ナノインプリント Less
  • Research Projects

    (2 results)
  • Research Products

    (24 results)
  • Co-Researchers

    (2 People)
  •  Research on ultra-high-speed UV nanoimprint using mixed condensable gas and droplet dispensing

    • Principal Investigator
      Kenta Suzuki
    • Project Period (FY)
      2019 – 2021
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Review Section
      Basic Section 18020:Manufacturing and production engineering-related
    • Research Institution
      National Institute of Advanced Industrial Science and Technology
  •  A study on process and mold design to obtain quick bubble removal and residual layer uniformity on whole imprinting areaPrincipal Investigator

    • Principal Investigator
      Youn Sung-Won
    • Project Period (FY)
      2016 – 2018
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      Production engineering/Processing studies
    • Research Institution
      National Institute of Advanced Industrial Science and Technology

All 2022 2019 2018 2017 2016

All Journal Article Presentation

  • [Journal Article] Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene2022

    • Author(s)
      Kenta Suzuki, Tatsuya Okawa, and Sung-Won Youn
    • Journal Title

      JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

      Volume: 35

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H02046
  • [Journal Article] Mold Design and Process for Application of Nanoimprint Lithography to Interconnections2019

    • Author(s)
      尹 成圓、鈴木 健太、廣島 洋
    • Journal Title

      Journal of The Japan Institute of Electronics Packaging

      Volume: 22 Issue: 2 Pages: 158-163

    • DOI

      10.5104/jiep.22.158

    • NAID

      130007606390

    • ISSN
      1343-9677, 1884-121X
    • Year and Date
      2019-03-01
    • Language
      Japanese
    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16K06035, KAKENHI-PROJECT-19H02046
  • [Journal Article] Fabrication of high-aspect-ratio micropatterns in soluble block-copolymer polyimides by a UV-assisted thermal imprint process2019

    • Author(s)
      Youn Sung-Won、Suzuki Kenta、Takagi Hideki、Hiroshima Hiroshi、Kinoshita Yoshinori、Hayashi Katsuhiro
    • Journal Title

      Journal of Mechanical Science and Technology

      Volume: 33 Issue: 8 Pages: 3755-3760

    • DOI

      10.1007/s12206-019-0718-y

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H02046
  • [Journal Article] Fabrication of High-Aspect-Ratio Micropatterns in Soluble Block-Copolymer Polyimides by an UV-assisted Thermal Imprint Process2019

    • Author(s)
      Sung-Won Youn, Kenta Suzuki, Takagi Hideki, Hiroshi Hiroshima, Yoshinori Kinoshita, Katsuhiro Hayashi
    • Journal Title

      Journal of Mechanical Science and Technology

      Volume: 印刷中

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Journal Article] Solubility Property of Condensable Gases of Trans-1-Chloro-3,3,3-Trifluoropropene and Trans-1,3,3,3-Tetrafluoropropene in UV Nanoimprint2019

    • Author(s)
      Suzuki Kenta、Youn Sung-Won、Hiroshima Hiroshi
    • Journal Title

      J. Photopol. Sci. Technol.

      Volume: 32 Issue: 1 Pages: 123-130

    • DOI

      10.2494/photopolymer.32.123

    • NAID

      130007744312

    • ISSN
      0914-9244, 1349-6336
    • Year and Date
      2019-06-24
    • Language
      English
    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H02046
  • [Journal Article] Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography2018

    • Author(s)
      Sung-Won Youn, Kenta Suzuki, Hiroshi Hiroshima
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 57 Issue: 6S1 Pages: 06HG03-06HG03

    • DOI

      10.7567/jjap.57.06hg03

    • NAID

      210000149171

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16K06035, KAKENHI-PROJECT-17K14575
  • [Journal Article] Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere2018

    • Author(s)
      Kenta Suzuki, Sung-Won Youn, Hiroshi Hiroshima
    • Journal Title

      Journal of Photopolymer Science and Technology

      Volume: 31 Pages: 295-300

    • NAID

      130007481515

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Journal Article] Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography2018

    • Author(s)
      Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 印刷中

    • NAID

      210000149171

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Journal Article] Automated Pattern Modification Method to Equalize Residual Layer Thickness in Nanoimprint Lithography2017

    • Author(s)
      Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
    • Journal Title

      Conference Proceedings of NNT2017

      Volume: 1 Pages: 53-54

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Journal Article] Basic Verification of Automated Design Method of Capacity-equalized Mold for Nanoimprint Lithography2017

    • Author(s)
      Sung-Won Youn (尹成圓), Kenta Suzuki, and Hiroshi Hiroshima
    • Journal Title

      Journal of Nanoscience and Nanotechnology

      Volume: 印刷中

    • Peer Reviewed / Acknowledgement Compliant / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Journal Article] Basic Verification of Method for Automated Design of Capacity-Equalized Mold for Nanoimprint Lithography2017

    • Author(s)
      Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
    • Journal Title

      Journal of Nanoscience and Nanotechnology

      Volume: 17 Issue: 11 Pages: 8475-8479

    • DOI

      10.1166/jnn.2017.15153

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Journal Article] Fabrication of a Holographic Pattern by UV-NIL Using PFP Gas2017

    • Author(s)
      Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
    • Journal Title

      Program book of the 8th Japan-China-Korea MEMS/NEMS 2017

      Volume: 1 Pages: 28-29

    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Presentation] Filling Behavior and Mold Release Force in UV Nanoimprinting Using PDMS Mold in Different Atmosphere2018

    • Author(s)
      Kenta Suzuki, Sung-Won Youn, and Hiroshi Hiroshima
    • Organizer
      The 35th International Conference of Photopolymer Science and Technology
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Presentation] Fabrication of High Aspect Ratio Micropatterns in Soluble Block-copolymer Polyimide by UV-assisted Thermal Imprint Process2018

    • Author(s)
      Sung-Won Youn, Kenta Suzuki, and Hiroshi Hiroshima
    • Organizer
      The 1st Emerging Technologies in Mechanical Engineering (ETME 2018)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Presentation] Fabrication of wafer-level mold for nanoimprint lithography using STAMP program and self-alignment etching process2018

    • Author(s)
      Sung-Won Youn, Kenta Suzuki, and Hiroshi Hiroshima
    • Organizer
      International Symposium on Precision and Engineering and Sustainable Manufacturing
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Presentation] Control of pattern capacity in nanoimprint mold by adding 2D/2.5D patterns to obtain uniform residual layer2018

    • Author(s)
      Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
    • Organizer
      The 5th International Conference & Exhibition for Nanotechnology (NANOPIA2018)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Presentation] Fabrication of Flexible Replica Mold with 2D and 2.5D Structures Designed by STAMP Program2018

    • Author(s)
      Sung-Won Youn, Kenta Suzuki, and Hiroshi Hiroshima
    • Organizer
      9th Japan-China-Korea Joint Conf. on MEMS/NEMS
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Presentation] Fabrication of a Holographic Pattern by UV-NIL Using PFP Gas2017

    • Author(s)
      Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
    • Organizer
      8th Japan-China-Korea MEMS/NEMS 2017
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Presentation] Automated Pattern Modification Method to Equalize Residual Layer Thickness in Nanoimprint Lithography2017

    • Author(s)
      Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
    • Organizer
      The 16th International Conference on Nanoimprint and Nanoprint Technology (NNT2017)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Presentation] Chip-scale pattern modification method for equalizing residual layer thickness in nanoimprint lithography2017

    • Author(s)
      Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
    • Organizer
      30st International Microprocesses and Nanotechnology Conferences
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Presentation] A Mold Pattern Design Method for Wafer-level Nanoimprint Lithography2017

    • Author(s)
      Youn Sung-Won、Suzuki Kenta、Hiroshima Hiroshi
    • Organizer
      1st International Workshop on MEMS and Sensor System 2017
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Presentation] Mold Pattern Design for Control of Residual Layer Uniformity in Nanoimprint Lithography2016

    • Author(s)
      Sung-Won Youn (尹成圓)
    • Organizer
      The 7th Japan-China-Korea Joint Conference on MEMS/NEMS 2016
    • Place of Presentation
      Sapporo Education and Culture Hall, Hokkaido, Japan
    • Year and Date
      2016-09-21
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Presentation] Prototype of Complementary Pattern Generator for Control of Residual Layer Uniformity in Nanoimprint Lithography2016

    • Author(s)
      Sung-Won Youn (尹成圓)
    • Organizer
      29th International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      ANA Crowne Plaza Kyoto, Kyoto, Japan
    • Year and Date
      2016-11-08
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K06035
  • [Presentation] Basic Verification of Automated Design Method of Capacity-equalized Mold for Nanoimprint Lithography2016

    • Author(s)
      Sung-Won Youn (尹成圓)
    • Organizer
      International Conference Electronic Materials and Nanotechnology for Green Environment 2016 (ENGE 2016)
    • Place of Presentation
      Ramada Plaza Jeju Hotel, Jeju, Korea
    • Year and Date
      2016-11-06
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K06035
  • 1.  Kenta Suzuki (60709509)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 19 results
  • 2.  Hiroshima Hiroshi
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 17 results

URL: 

Are you sure that you want to link your ORCID iD to your KAKEN Researcher profile?
* This action can be performed only by the researcher himself/herself who is listed on the KAKEN Researcher’s page. Are you sure that this KAKEN Researcher’s page is your page?

この研究者とORCID iDの連携を行いますか?
※ この処理は、研究者本人だけが実行できます。

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi