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YAMAMOTO HIROKI  山本 洋揮

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YAMAMOTO Hiroki  山本 洋揮

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Researcher Number 00516958
Other IDs
Affiliation (Current) 2025: 国立研究開発法人量子科学技術研究開発機構, 高崎量子技術基盤研究所 量子機能創製研究センター, 主幹研究員
Affiliation (based on the past Project Information) *help 2025: 国立研究開発法人量子科学技術研究開発機構, 高崎量子技術基盤研究所 量子機能創製研究センター, 主幹研究員
2022 – 2023: 国立研究開発法人量子科学技術研究開発機構, 高崎量子応用研究所 量子機能創製研究センター, 主幹研究員
2021: 国立研究開発法人量子科学技術研究開発機構, その他部局等, 研究員
2021: 国立研究開発法人量子科学技術研究開発機構, 高崎量子応用研究所 先端機能材料研究部, 主幹研究員
2018 – 2020: 国立研究開発法人量子科学技術研究開発機構, 高崎量子応用研究所 先端機能材料研究部, 主幹研究員(定常) … More
2017: 国立研究開発法人量子科学技術研究開発機構, 高崎量子応用研究所 先端機能材料研究部, 主任研究員(定常)
2011 – 2017: 大阪大学, 産業科学研究所, 助教
2010: 大阪大学, 産業科学研究所, 特任助教(常勤)
2008 – 2009: 大阪大学, 産業科学研究所, 特任助教 Less
Review Section/Research Field
Principal Investigator
Basic Section 26050:Material processing and microstructure control-related / Material processing/treatments / Material processing/Microstructural control engineering / Quantum beam science
Except Principal Investigator
Nuclear engineering / Quantum beam science
Keywords
Principal Investigator
ナノ材料 / 半導体微細化 / 材料・加工 / 半導体超微細化 / リソグラフィ / ナノ加工 / 材料加工・処理 / 量子ビーム / レジスト / 表面・界面物性 … More / 材料・加工処理 / レジスト材料 / 自己組織化 / 放射線 / 電子線リソグラフィ / 極端紫外光リソグラフィ / 電子・電気材料 … More
Except Principal Investigator
放射線、X線、粒子線 / 計算物理 / シミュレーション工学 / 半導体超微細化 / 粒子線 / 放射線 / 放射線、X線、粒子線 / X 線 / 原子力エネルギー / 原子・分子物理 / X線 / ナノ空間 / 熱化過程 / 高分子科学 / 化学増幅レジスト / シミュレーション / フェムト秒パルスジオリシス / ナノテクノロジー / 量子ビーム / ナノ時空間反応 / フェムト秒パルスラジオリシス Less
  • Research Projects

    (11 results)
  • Research Products

    (126 results)
  • Co-Researchers

    (10 People)
  •  シングルナノ微細加工材料・プロセス創成のための学術基盤の確立Principal Investigator

    • Principal Investigator
      山本 洋揮
    • Project Period (FY)
      2025 – 2027
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Review Section
      Basic Section 26050:Material processing and microstructure control-related
    • Research Institution
      National Institutes for Quantum Science and Technology
  •  EUVリソグラフィ×自己組織化による分子サイズに迫る超極微細加工技術の創製Principal Investigator

    • Principal Investigator
      山本 洋揮
    • Project Period (FY)
      2022 – 2024
    • Research Category
      Fund for the Promotion of Joint International Research (Fostering Joint International Research (A))
    • Review Section
      Basic Section 26050:Material processing and microstructure control-related
    • Research Institution
      National Institutes for Quantum Science and Technology
  •  Creation of Metal Ultrafine Fabrication Materials and Processes for Realization of Direct LithographyPrincipal Investigator

    • Principal Investigator
      YAMAMOTO HIROKI
    • Project Period (FY)
      2020 – 2022
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Review Section
      Basic Section 26050:Material processing and microstructure control-related
    • Research Institution
      National Institutes for Quantum Science and Technology
  •  Development of fine wire for mass production to achieve the precision of less than 1 nmPrincipal Investigator

    • Principal Investigator
      Yamamoto Hiroki
    • Project Period (FY)
      2016 – 2019
    • Research Category
      Grant-in-Aid for Challenging Exploratory Research
    • Research Field
      Material processing/Microstructural control engineering
    • Research Institution
      National Institutes for Quantum and Radiological Science and Technology
      Osaka University
  •  Creation of Nanofabrication process for extreme quantum beam using organic-inorganice hybrid nanoparticlesPrincipal Investigator

    • Principal Investigator
      YAMAMOTO HIROKI
    • Project Period (FY)
      2014 – 2016
    • Research Category
      Grant-in-Aid for Young Scientists (A)
    • Research Field
      Quantum beam science
    • Research Institution
      Osaka University
  •  Study on nanochemistry in latest nanofabrication materials using quantum beams

    • Principal Investigator
      Kozawa Takahiro
    • Project Period (FY)
      2013 – 2017
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Research Field
      Quantum beam science
    • Research Institution
      Osaka University
  •  Creation and Control of Metal Nano-structure Using Combination of Top-down and Bottom up NanofabricationPrincipal Investigator

    • Principal Investigator
      YAMAMOTO HIROKI
    • Project Period (FY)
      2012 – 2014
    • Research Category
      Grant-in-Aid for Challenging Exploratory Research
    • Research Field
      Material processing/treatments
    • Research Institution
      Osaka University
  •  Study on nanoscale chemical reactions and reaction sites using quantum beams

    • Principal Investigator
      KOZAWA Takahiro
    • Project Period (FY)
      2010 – 2012
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Research Field
      Nuclear engineering
    • Research Institution
      Osaka University
  •  Study on the expanse of thermalized electrons in condensed matters

    • Principal Investigator
      KOZAWA Takahiro
    • Project Period (FY)
      2009 – 2011
    • Research Category
      Grant-in-Aid for Challenging Exploratory Research
    • Research Field
      Nuclear engineering
    • Research Institution
      Osaka University
  •  Educaiton and Control of Nano-topography Mechanism in Ultrafine FabricationPrincipal Investigator

    • Principal Investigator
      YAMAMOTO Hiroki
    • Project Period (FY)
      2009 – 2011
    • Research Category
      Grant-in-Aid for Young Scientists (B)
    • Research Field
      Material processing/treatments
    • Research Institution
      Osaka University
  •  Femtosecond Pulse Radiolysis Study on Nanoscale Time Space Reaction Process

    • Principal Investigator
      TAGAWA Seiichi
    • Project Period (FY)
      2005 – 2008
    • Research Category
      Grant-in-Aid for Scientific Research (S)
    • Research Field
      Nuclear engineering
    • Research Institution
      Osaka University

All 2024 2023 2022 2021 2020 2019 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 2008 2007 2006 2005 Other

All Journal Article Presentation Patent

  • [Journal Article] A study on the resist performance of inorganic-organic resist materials for EUV and electron-beam lithography2024

    • Author(s)
      Yamamoto Hiroki、Ito Yuko Tsutsui、Okamoto Kazumasa、Shimoda Shuhei、Kozawa Takahiro
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 63 Issue: 4 Pages: 04SP87-04SP87

    • DOI

      10.35848/1347-4065/ad38c5

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-20H02489
  • [Journal Article] Competitive coexistence of ferromagnetism and metal insulator transition of VO2 nanoparticles2024

    • Author(s)
      Hatano Tsuyoshi、Fukawa Akihiro、Yamamoto Hiroki、Akiba Keiichirou、Demura Satoshi、Takase Kouichi
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 63 Issue: 4 Pages: 04SP07-04SP07

    • DOI

      10.35848/1347-4065/ad2d04

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-20H02489
  • [Journal Article] Study on irradiation effects by femtosecond-pulsed extreme ultraviolet in resist materials2023

    • Author(s)
      Yuji Hosaka, Hiroki Yamamoto, Masahiko Ishino, Thanh-Hung Dinh, Masaharu Nishikino, Yasunari Maekawa
    • Journal Title

      Proc. of SPIE

      Volume: 12498 Pages: 100-100

    • DOI

      10.1117/12.2670220

    • NAID

      130008119663

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21KK0262
  • [Journal Article] Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials2021

    • Author(s)
      Hosaka Yuji、Yamamoto Hiroki、Ishino Masahiko、Dinh Thanh-Hung、Nishikino Masaharu、Kon Akira、Owada Shigeki、Inubushi Yuichi、Kubota Yuya、Maekawa Yasunari
    • Journal Title

      J. Photopol. Sci. Technol.

      Volume: 34 Issue: 1 Pages: 95-98

    • DOI

      10.2494/photopolymer.34.95

    • NAID

      130008119663

    • ISSN
      0914-9244, 1349-6336
    • Year and Date
      2021-06-11
    • Language
      English
    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-20H02489, KAKENHI-PROJECT-21H03750
  • [Journal Article] Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments2020

    • Author(s)
      Yamamoto Hiroki、Dawson Guy、Kozawa Takahiro、Robinson Alex P. G.
    • Journal Title

      Quantum Beam Science

      Volume: 4 Issue: 2 Pages: 1-10

    • DOI

      10.3390/qubs4020019

    • Peer Reviewed / Open Access / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K14439, KAKENHI-PROJECT-18H03895, KAKENHI-PROJECT-20H02489
  • [Journal Article] Sensitizers in extreme ultraviolet chemically amplified resist: mechanism of sensitivity improvement2018

    • Author(s)
      Yannick Vesters Jing Jiang, Hiroki Yamamoto Danilo De Simone Takahiro Kozawa Stefan De Gendt Geert Vandenberghe
    • Journal Title

      J. Micro/Nanolith. MEMS. MOEMS

      Volume: 17 Issue: 04 Pages: 1-1

    • DOI

      10.1117/1.jmm.17.4.043506

    • Peer Reviewed / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K14439, KAKENHI-PROJECT-18H03895
  • [Journal Article] Role of Metal Sensitizers for Sensitivity Improvement in EUV Chemically Amplified Resist2018

    • Author(s)
      Hiroki Yamamoto, Yannick Vesters Jing Jiang Danilo De Simone Geert Vandenberghe
    • Journal Title

      J. Photopol. Sci. Technol.

      Volume: 31 Issue: 6 Pages: 747-751

    • DOI

      10.2494/photopolymer.31.747

    • NAID

      130007603657

    • ISSN
      0914-9244, 1349-6336
    • Year and Date
      2018-12-15
    • Language
      English
    • Peer Reviewed / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Journal Article] Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties by means of Extreme Ultraviolet Irradiation2017

    • Author(s)
      H. Yamamoto, H. Kudo, and T. Kozawa
    • Journal Title

      J. Photopolym. Sci. Technol.

      Volume: 30 Pages: 627-631

    • NAID

      130006309146

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-25246036
  • [Journal Article] Dynamics of Radical Ions of Hydroxyhexafluoroisopropyl-Substituted Benzenes2017

    • Author(s)
      K. Okamoto, N. Nomura, R. Fujiyoshi, K. Umegaki, H. Yamamoto, K. Kobayashi, and T. Kozawa
    • Journal Title

      J. Phys. Chem. A

      Volume: 121 Issue: 49 Pages: 9458-9465

    • DOI

      10.1021/acs.jpca.7b09842

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-25246036, KAKENHI-PROJECT-15K06662
  • [Journal Article] Synthesis and Property of Tellurium-Containing Polymer for Extreme Ultraviolet Resist Material2017

    • Author(s)
      M. Fukunaga, H. Yamamoto, T. Kozawa, T. Watanabe, and H. Kudo
    • Journal Title

      J. Photopolym. Sci. Technol.

      Volume: 30 Pages: 103-107

    • NAID

      130005950306

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-25246036
  • [Journal Article] Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties by means of Extreme Ultraviolet Irradiation2017

    • Author(s)
      H. Yamamoto, H. Kudo, and T. Kozawa
    • Journal Title

      J. Photopol. Sci. Technol.

      Volume: 30 Issue: 6 Pages: 627-631

    • DOI

      10.2494/photopolymer.30.627

    • NAID

      130006309146

    • ISSN
      0914-9244, 1349-6336
    • Language
      English
    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Journal Article] Synthesis of Metal Nanoparticles and Patterning in Polymeric Films Induced by Electron Nanobeam2017

    • Author(s)
      Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Muneyuki Naito, Jean-Louis. Marignier, Mehran Mostafavi, and Jacqueline Belloni
    • Journal Title

      J. Phys. Chem. C

      Volume: 121 Issue: 9 Pages: 5335-5340

    • DOI

      10.1021/acs.jpcc.6b12543

    • Peer Reviewed / Acknowledgement Compliant / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706027, KAKENHI-PROJECT-16K14439, KAKENHI-PROJECT-26390058
  • [Journal Article] Dynamics of radical cations of poly(4-hydroxystyrene) in the presence and absence of triphenylsulfonium triflate as determined by pulse radiolysis of its highly concentrated solution2016

    • Author(s)
      K. Okamoto, T. Ishida, H. Yamamoto, T. Kozawa, R. Fujiyoshi, and K. Umegaki
    • Journal Title

      Chem. Phys. Lett.

      Volume: 657 Pages: 44-48

    • DOI

      10.1016/j.cplett.2016.05.058

    • NAID

      120006488393

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-25246036, KAKENHI-PROJECT-15K06662
  • [Journal Article] Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography2016

    • Author(s)
      H. Yamamoto, S. Tagawa, T. Kozawa, H. Kudo, and K. Okamoto
    • Journal Title

      J. Vac. Sci. Technol. B

      Volume: 34 Issue: 4 Pages: 041606-041606

    • DOI

      10.1116/1.4953068

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-25246036, KAKENHI-PROJECT-26706027
  • [Journal Article] Controlled Array of Gold Nanoparticles by Combination of Nano Imprint and Self-assembly2016

    • Author(s)
      Hiroki Yamamoto, Akira Ohnuma, Bunsho Ohtani, Takahiro Kozawa
    • Journal Title

      J. Photopol. Sci. Technol.

      Volume: 29 Issue: 5 Pages: 765-768

    • DOI

      10.2494/photopolymer.29.765

    • NAID

      130005261829

    • ISSN
      0914-9244, 1349-6336
    • Language
      English
    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Journal Article] Synthesis and Resist Properties of Calixarene Polymers with Pendant Haloalkyl Groups2016

    • Author(s)
      H. Kudo, H. Ogawa, H. Yamamoto, and T. Kozawa
    • Journal Title

      J. Photopolym. Sci. Technol.

      Volume: 29 Pages: 495-500

    • NAID

      130005256573

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-25246036
  • [Journal Article] Study on Dissolution Behavior of Poly(4-hydroxystyrene) as Model Polymer of Chemically Amplified Resists for Extreme Ultraviolet Lithography2015

    • Author(s)
      M. Mitsuyasu, H. Yamamoto, and T. Kozawa
    • Journal Title

      J. Photopolym. Sci. Technol.

      Volume: 28 Pages: 119-124

    • NAID

      130005090251

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-25246036
  • [Journal Article] Study on Dissolution Behavior of Poly(4-hydroxystyrene) as Model Polymer of Chemically Amplified Resists for Extreme Ultraviolet Lithography2015

    • Author(s)
      Masaki Mitsuyasu, Hiroki Yamamoto, Takahiro Kozawa
    • Journal Title

      J. Photopol. Sci. Technol.

      Volume: 28 Issue: 1 Pages: 119-124

    • DOI

      10.2494/photopolymer.28.119

    • NAID

      130005090251

    • ISSN
      0914-9244, 1349-6336
    • Language
      English
    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Journal Article] High-aspect-ratio patterning by ClF3-Ar neutral cluster etching2015

    • Author(s)
      Hiroki Yamamoto, Toshio Sekib, Jiro Matsuoc, Kunihiko Koiked, Takahiro Kozawa
    • Journal Title

      Microelectronic Engineering

      Volume: 141 Pages: 145-149

    • DOI

      10.1016/j.mee.2015.03.006

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-24656447, KAKENHI-PROJECT-26706027
  • [Journal Article] Position Control of Metal Nanoparticles by Self-Assembly2014

    • Author(s)
      Hiroki Yamamoto, Akira Ohnuma, Bunsho Ohtani, Takahiro Kozawa
    • Journal Title

      J. Photopol. Sci. Technol.

      Volume: 27 Issue: 2 Pages: 243-247

    • DOI

      10.2494/photopolymer.27.243

    • NAID

      130004678348

    • ISSN
      0914-9244, 1349-6336
    • Language
      English
    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-24656447
  • [Journal Article] Controlled arrangement of nanoparticles capped with protecting ligand on Au nanopatterns2014

    • Author(s)
      Hiroki Yamamotoa,Akira Ohnumab,Bunsho Ohtanib,Takahiro Kozawa
    • Journal Title

      Microelectronic Engineering

      Volume: 121 Pages: 108-112

    • DOI

      10.1016/j.mee.2014.02.028

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-24656447
  • [Journal Article] Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography2014

    • Author(s)
      Y. Komuro, H. Yamamoto, K. Kobayashi, Y. Utsumi, K. Ohomori, and T. Kozawa
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 53 Issue: 11 Pages: 116503-116503

    • DOI

      10.7567/jjap.53.116503

    • NAID

      210000144600

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-25246036
  • [Journal Article] Controlled Array of Silver Nanoparticles on Nanopatterns2013

    • Author(s)
      H. Yamamoto, A. Ohnuma, B. Ohtani, T. Kozawa
    • Journal Title

      J. Photopolym. Sci. Technol.

      Volume: 26 Pages: 495-499

    • NAID

      130004833524

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-24656447
  • [Journal Article] Deprotonation of poly(4-hydroxystyrene) intermediates: pulse radiolysis study of EUV and electron beam resist2013

    • Author(s)
      Kazumasa Okamoto, Tyo Matsuda, Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Ryoko Fujiyoshi, and Takashi Sumiyoshi
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 52 Issue: 6S Pages: 06GC04-06GC04

    • DOI

      10.7567/jjap.52.06gc04

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-24561037, KAKENHI-PROJECT-25246036, KAKENHI-PROJECT-25630424
  • [Journal Article] Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in ExtremeUltraviolet Lithography2013

    • Author(s)
      Y. Komuro, H. Yamamoto, Y. Utsumi, K. Ohomori, and T. Kozawa
    • Journal Title

      Appl. Phys. Express

      Volume: 6巻 Issue: 1 Pages: 14001-14001

    • DOI

      10.7567/apex.6.014001

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22246128
  • [Journal Article] Formation of nanoscale reaction field using combination of top-down and bottom-up nanofabricaiton2013

    • Author(s)
      H. Yamamoto, A. Ohnuma, B. Ohtani, T. Kozawa
    • Journal Title

      Microelectron. Eng.

      Volume: 110 Pages: 369-373

    • DOI

      10.1016/j.mee.2013.02.066

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-24656447
  • [Journal Article] Radiation-induced synthesis of metal nanoparticles in ethers THF and PGMEA2013

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa, M. NaitoJ.-L. Marignier, M. Mostafavi, and J. Belloni
    • Journal Title

      Radiat. Phys. Chem.

      Volume: 91 Pages: 148-155

    • DOI

      10.1016/j.radphyschem.2013.05.019

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-24656447
  • [Journal Article] Location Control of Nanoparticles Using Combination of Top-down and Bottom-up Nano-fabrication2012

    • Author(s)
      H. Yamamoto、A. Ohnuma、T. Kozawa, and B. Ohtani
    • Journal Title

      J. Photopolym. Sci. Technol.

      Volume: 25 Pages: 449-453

    • NAID

      40019347341

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-24656447
  • [Journal Article] Geminate Charge Recombination in Liquid Alkane with Concentrated CCl4 : Effects of CCl4 Radical Anion and Narrowing of Initial Distribution of Cl-2011

    • Author(s)
      A.Saeki, N.Yamamoto, Y.Yoshida, T.Kozawa
    • Journal Title

      J.Phys.Chem.A

      Volume: 115 Issue: 36 Pages: 10166-10173

    • DOI

      10.1021/jp205989r

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-20686064, KAKENHI-PROJECT-21656238
  • [Journal Article] Dissolution Kinetics in Chemically Amplified EUV Resist2011

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa T. Ando, K. Ohmori, M. Sato, and J. Onodera
    • Journal Title

      J. Photopol. Sci. Technol.

      Volume: 24 Issue: 4 Pages: 405-410

    • DOI

      10.2494/photopolymer.24.405

    • NAID

      130004464914

    • ISSN
      0914-9244, 1349-6336
    • Language
      English
    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21760584
  • [Journal Article] Characterization of EUV irradiati on effects on Polystyrene Derivatives Studied by X-ray Photoelectron Spectroscopy(XPS) and Ultraviolet Photoelectron Spectroscopy(UPS)2011

    • Author(s)
      H. Yamamoto, T. Kozawa, and S. Tagawa
    • Journal Title

      Proceeding of SPIE Advances in Resist Materials and Processing Tehcnology XXVII

      Volume: 7972 Pages: 79721I-79721I

    • DOI

      10.1117/12.879303

    • Data Source
      KAKENHI-PROJECT-21760584
  • [Journal Article] Negative Chemically Amplified Molecular Resist Based on Novel Fullerene Derivative for Nanolithography2010

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa, T. Ando, K. Ohmori, M. Sato, and J. Onodera
    • Journal Title

      Proceeding of SPIE Advances in Resist Materials and Processing Tehcnology XXVII

      Volume: 7639 Pages: 76390U-76390U

    • DOI

      10.1117/12.846391

    • Data Source
      KAKENHI-PROJECT-21760584
  • [Journal Article] Radiation Chemistry of Fluoronbphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists2010

    • Author(s)
      S.Ikeda, K.Okamoto, H.Yamamoto, A.Saeki, S.Tagawa, T.Kozawa
    • Journal Title

      Jpn.J.Appl.Phys.

      Volume: 49 Pages: 96504-96504

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21656238
  • [Journal Article] Radiation Chemistry of Fluoronaphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists2010

    • Author(s)
      S. Ikeda, K. Okamoto, H. Yamamoto, A. Saeki, S. Tagawa, T. Kozawa
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 49巻 Issue: 9R Pages: 96504-96504

    • DOI

      10.1143/jjap.49.096504

    • NAID

      40017294753

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21656238
  • [Journal Article] Negative Chemically Amplified Molecular Resist Based on Novel Fullerene Derivative for Nanolithography2010

    • Author(s)
      H.Yamamoto, T.Kozawa, S.Tagawa, T.Ando, K.Ohmori, M.Sato, J.Onodera
    • Journal Title

      Proceeding of SPIE Advances in Resist Materials and Processing Technology XXV II

      Volume: 7639

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21760584
  • [Journal Article] Reactivity of Haloge nated Resist Polymer with Low-Energy Electrons2009

    • Author(s)
      H.Yamamoto, T.Kozawa, A.Saeki, S.Tagawa, T.Mimura, H.Yukawa, J.Onodera
    • Journal Title

      Jpn.J.Appl.Phys. 48

      Pages: 6-9

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21656238
  • [Journal Article] Reactivity of Halogenated Resist Polymer with Low-Energy Electrons2009

    • Author(s)
      H. Yamamoto, T. Kozawa, A. Saeki, S. Tagawa, T. Mimura, H. Yukawa, and J. Onodera
    • Journal Title

      Jpn. J. Appl. Phys

      Volume: 48巻 Issue: 6S Pages: 06FC09-06FC09

    • DOI

      10.1143/jjap.48.06fc09

    • NAID

      210000066909

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21656238
  • [Journal Article] Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography2008

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa, H. Yukawa, M. Sato, J. Onodera
    • Journal Title

      Appl. Phys. Express 1

      Pages: 47001-47001

    • NAID

      10025080127

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Journal Article] Polymer structure dependence of acid generation in chemically amplified extreme ultraviolet resists2007

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, M. J. Leeson
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 46

    • NAID

      10018868104

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Journal Article] Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness2007

    • Author(s)
      H. Yamamoto, T. Kozawa, A. Saeki, K. Okamoto, S. Tagawa, K. Ohmori, M. Sato, and H. Komano,
    • Journal Title

      Jpn. J. Appl. Phys. 46

      Pages: 6187-6190

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Journal Article] Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer2007

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa, K. Ohmori, M. Sato, and H. Komano,
    • Journal Title

      Jpn. J. Appl. Phys. 46

    • NAID

      40015511976

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Journal Article] Dependence of Acid Yield on Chemically Amplified Electron Beam Resist Thickness2006

    • Author(s)
      T.Shigaki, K.Okamoto, T.Kozawa, H.Yamamoto, S.Tagawa
    • Journal Title

      Jpn. J. Appl. Phys. 45

      Pages: 5445-5449

    • NAID

      10017998648

    • Data Source
      KAKENHI-PROJECT-17106014
  • [Journal Article] Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist2006

    • Author(s)
      T. Shigaki, K. Okamoto, T. Kozawa, H. Yamamoto, S. Tagawa, T. Kai, T. Shimokawa
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 45 Pages: 5735-5737

    • NAID

      10017999650

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Journal Article] Effects of Low Energy Electrons on Pattern Formation in Chemically Amplified Resist2006

    • Author(s)
      T.Kozawa, H.Yamamoto, A.Saeki, S.Tagawa
    • Journal Title

      J. Photopolym. Sci. Technol. 19

      Pages: 361-366

    • NAID

      130004833103

    • Data Source
      KAKENHI-PROJECT-17106014
  • [Journal Article] Reaction mechanism of fluorinated chemically amplified resists2006

    • Author(s)
      H. Yamamoto, T. Kozawa, K. Okamoto, A. Saeki, S. Tagawa, T. Ando, M. Sato, H. Komano
    • Journal Title

      J. Vac. Sci. Technol. B

      Volume: 24 Pages: 1833-1836

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Journal Article] Reaction Mechanisms of Brominated Chemically Amplified Resists2005

    • Author(s)
      H. Yamamoto, T. Kozawa, A. Nakano, S. Tagawa, T. Ando, M. Sato, H. Komano
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 44

    • NAID

      10016590890

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Journal Article] Resist Thickness Effect on Acid Concentration Generated in Poly(4-hydroxystyrene) Film upon Exposure to 75 keV Electron Beam2005

    • Author(s)
      T.Shigaki, K.Okamoto, T.Kozawa, H.Yamamoto, S.Tagawa
    • Journal Title

      Jpn.J.Appl.Phys. 44

    • NAID

      10016856520

    • Data Source
      KAKENHI-PROJECT-17106014
  • [Journal Article] Dependence of Acid Yield on Acid Generator in Chemically Amplified Resist for Post-Optical Lithography2005

    • Author(s)
      A. Nakano, K. Okamoto, Y. Yamamoto, T. Kozawa, S. Tagawa, T. Kai, H. Nemoto
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 44 Pages: 5832-5835

    • NAID

      10016678348

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Journal Article] Study on acid generation from polymer2005

    • Author(s)
      H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
    • Journal Title

      J. Vac. Sci. Technol. B

      Volume: 23 Pages: 2728-2732

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Journal Article] Proton and anion distribution and line edge roughness of chemically amplified electron beam resist2005

    • Author(s)
      T. Kozawa, H. Yamamoto, A. Saeki, and S. Tagawa
    • Journal Title

      J. Vac. Sci. Technol B23

      Pages: 2716-2720

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Journal Article] Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography2005

    • Author(s)
      H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 44 Pages: 5836-5838

    • NAID

      10016678367

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Journal Article] Proton and anion distribution and line edge roughness of chemically amplified electron beam resist2005

    • Author(s)
      T.Kozawa, H., Yamamoto, A.Saeki, S.Tagawa
    • Journal Title

      J.Vac.Sci.Technol. B23

      Pages: 2716-2720

    • Data Source
      KAKENHI-PROJECT-17106014
  • [Patent] レジスト材料、レジストパターンの製造方法、及び レジストパターン2022

    • Inventor(s)
      吉村公男、山本洋揮、出崎亮、古澤孝弘、前川康成、他3名
    • Industrial Property Rights Holder
      量子科学技術研究開発機構
    • Industrial Property Rights Type
      特許
    • Filing Date
      2022
    • Data Source
      KAKENHI-PROJECT-20H02489
  • [Presentation] Study on Resist Performance of Inorganic-Organic Resist Materials for EUV and EB Lithography2024

    • Author(s)
      Hiroki Yamamoto, Yuko Tsutsui Ito, Kazumasa Okamoto and Takahiro Kozawa
    • Organizer
      SPIE Advanced Lithography + Patterning 2024
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20H02489
  • [Presentation] レジスト材料における超短パルスEUV照射効果に関する研究2023

    • Author(s)
      山本洋揮,保坂勇志,石野雅彦,ヂンタンフン,古澤 孝弘,前川康成
    • Organizer
      第72回高分子討論会
    • Invited
    • Data Source
      KAKENHI-PROJECT-20H02489
  • [Presentation] フォトリソグラフィと電子線リソグラフィのメタルレジストの リソグラフィ特性における基礎研究2023

    • Author(s)
      山本 洋揮,古澤孝弘
    • Organizer
      第84回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-20H02489
  • [Presentation] Study on Resist Performance of Inorganic-Organic Resist Materials for EUV and EB Lithography2023

    • Author(s)
      Hiroki Yamamoto, Yuko Tsutsui Ito, Kazumasa Okamoto and Takahiro Kozawa
    • Organizer
      36th International Microprocesses and Nanotechnology Conference (MNC 2023)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20H02489
  • [Presentation] メタルレジストのレジスト性能に関する研究2023

    • Author(s)
      山本洋揮,岡本一将,古澤孝弘,前川康成
    • Organizer
      第66回放射線化学討論会
    • Data Source
      KAKENHI-PROJECT-20H02489
  • [Presentation] Recent Research activity for EUV Lithography at QST2022

    • Author(s)
      Hiroki Yamamoto, Yuji Hosaka, Kimio Yoshimura, Masahiko Ishino, Thanh-Hung Dinh, Masaharu Nishikino, and Yasunari Maekawa
    • Organizer
      RadTech Asia 2022
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-21KK0262
  • [Presentation] 極端紫外光(EUV)リソグラフィ用のマスク作製2022

    • Author(s)
      山本 洋揮,古澤孝弘
    • Organizer
      第83回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-21KK0262
  • [Presentation] Recent Research activity for EUV Lithography at QST2022

    • Author(s)
      Hiroki Yamamoto, Yuji Hosaka, Kimio Yoshimura, Masahiko Ishino, Thanh-Hung Dinh, Masaharu Nishikino, and Yasunari Maekawa
    • Organizer
      The 39th International Conference of Photopolymer Science and Technology
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-21KK0262
  • [Presentation] 金ナノパターン上のジチオールで修飾した金属ナノ粒子の配列制御2021

    • Author(s)
      山本洋揮
    • Organizer
      第68回 応用物理学春季学術講演会
    • Data Source
      KAKENHI-PROJECT-20H02489
  • [Presentation] 最先端量子ビームによる次世代リソグラフィ材料・プロセスの開発2021

    • Author(s)
      山本洋揮
    • Organizer
      第18回放射線プロセスシンポジウム
    • Invited
    • Data Source
      KAKENHI-PROJECT-20H02489
  • [Presentation] Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials2021

    • Author(s)
      Hiroki Yamamoto、Yuji Hosaka、Ishino Masahiko、Dinh Thanh-Hung、Nishikino Masaharu、Kon Akira、Owada Shigeki、Inubushi Yuichi、Kubota Yuya、Maekawa Yasunari
    • Organizer
      The 38th International Conference of Photopolymer Science and Technology, Online meeting
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20H02489
  • [Presentation] 電子線によるポリマー膜中の金属ナノ粒子の生成およびパターニングに関する研究2020

    • Author(s)
      山本 洋揮
    • Organizer
      第69回高分子学会年次大会
    • Data Source
      KAKENHI-PROJECT-20H02489
  • [Presentation] 電子ビーム照射による有機・無機ハイブリッド微細パターンの直接形成2020

    • Author(s)
      山本洋揮
    • Organizer
      第69回高分子討論会
    • Invited
    • Data Source
      KAKENHI-PROJECT-20H02489
  • [Presentation] 電子線誘起による高分子薄膜における金属ナノ粒子の合成と パターニングに関する研究2019

    • Author(s)
      山本 洋揮、古澤孝弘、 田川精一、マリグリナージャンルイ 、モスタファビメラン、ジャックリンベローニ
    • Organizer
      第66回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Presentation] 自己組織化単分子膜の極性変化を用いたポリスチレン-ポリメチルメタクリレート ブロック共重合体のラメラ配向2019

    • Author(s)
      山本 洋揮
    • Organizer
      第68回高分子討論会
    • Invited
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Presentation] 電子線誘起による自己組織化単分子膜の極性変化を用いた ブロック共重合体のラメラ方向制御2019

    • Author(s)
      山本 洋揮
    • Organizer
      第68回高分子学会年次大会
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Presentation] 放射線化学によるポリマーフィルムへの金属ナノパターン形成2018

    • Author(s)
      山本洋揮
    • Organizer
      第61回放射線化学討論会
    • Invited
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Presentation] 電子線誘起による高分子薄膜における金属ナノ粒子の合成とパター ニングに関する研究2018

    • Author(s)
      山本 洋揮、古澤孝弘、 田川精一、マリグリナージャンルイ 、モスタファビメラン、ジャックリンベローニ
    • Organizer
      次世代リソグラフィワークショップ2018
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Presentation] Role of Metal Sensitizers for Sensitivity Improvement in EUV Chemically Amplified Resist2018

    • Author(s)
      Hiroki Yamamoto, Yannick Vesters Jing Jiang Danilo De Simone Geert Vandenberghe
    • Organizer
      The 35th International Conference of Photopolymer Science and Technology
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Presentation] Synthesis of Metal Nanoparticle and Patterning in Polymeric Films Induced by Electron Beam2018

    • Author(s)
      Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Jean-Louis Marignier, Mehran Mostafavi, and Jacqueline Belloni
    • Organizer
      SPIE Advanced Lithography 2018
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Presentation] Lamellar orientation of block copolymer using polarity switch of Nitrophenyl self-assembled monolayer (SAM) induced by electron beam2017

    • Author(s)
      Hiroki Yamamoto, Guy Dawson, Takahiro Kozawa, Alex P. G. Robinson
    • Organizer
      SPIE Advanced Lithography 2017
    • Place of Presentation
      California, USA
    • Year and Date
      2017-02-26
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Presentation] Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties by means of Extreme Ultraviolet Irradiation2017

    • Author(s)
      Hiroki Yamamoto, Hiroto Kudo, and Takahiro Kozawa
    • Organizer
      The 34th International Conference of Photopolymer Science and Technology
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Presentation] Nanofabrication method for two dimensional controlled array of core-shell nanoparticles in large scale fabrication by using self-assembled Au@SiO2 nanoparticle in solvent intaerface2017

    • Author(s)
      H.Yamamoto, A. Lehoux, B. Ohtani, T. Kozawa
    • Organizer
      The 43rd International Conference on Micro and Nanoengineering
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Presentation] トップダウン・ボトムアップ技術の融合による金属ナノ粒子の位置制御2017

    • Author(s)
      山本洋揮、大沼明、大谷文章、古澤孝弘
    • Organizer
      第78回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Presentation] Synthesis of Metal Nanoparticles and Patterning in Polymeric Films Induced by Electron Nanobeam2017

    • Author(s)
      Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Jean-Louis Marignier, Mehran Mostafavi, and Jacqueline Belloni
    • Organizer
      The 30th Miller Conference on Radiation Chemistry
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Presentation] アセタール基で保護したノーリア誘導体に基づいたレジスト材料の電子線照射に対する応答性の系統的な研究2016

    • Author(s)
      山本洋揮, 工藤宏人, 古澤孝弘
    • Organizer
      第77回応用物理学会秋季学術講演会
    • Place of Presentation
      新潟県新潟市
    • Year and Date
      2016-09-13
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Presentation] Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties for EUV lithography with Various2016

    • Author(s)
      Hiroki Yamamoto, Hiroto Kudo, Takahiro Kozawa
    • Organizer
      2016 International Symposium on Extreme Ultraviolet Lithography
    • Place of Presentation
      Hiroshima, Japan
    • Year and Date
      2016-10-24
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Presentation] Selective Immobilization of Metal Nanoparticles Using Self-assembly Techniques2016

    • Author(s)
      Hiroki Yamamoto, Akira Ohnuma, Bunsho Ohtani, Takahiro Kozawa
    • Organizer
      42nd Micro and Nano Engineering
    • Place of Presentation
      Vienna, Austria
    • Year and Date
      2016-09-19
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Presentation] Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties for EUV lithography2016

    • Author(s)
      Hiroki Yamamoto, Hiroto Kudo, and Takahiro kozawa
    • Organizer
      2016 International Symposium on Extreme Ultraviolet Lithography
    • Place of Presentation
      Hiroshima, Japan
    • Year and Date
      2016-10-24
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Presentation] Molecular Resist Materials for Extreme Ultraviolet Lithography2016

    • Author(s)
      Hiroki Yamamoto, Hiroto Kudo, and Takahiro Kozawa
    • Organizer
      2016 International Workshop on EUV Lithography
    • Place of Presentation
      California, USA
    • Year and Date
      2016-06-13
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Presentation] Controlled Array of Gold Nanoparticles by Combination of Nano Imprint and Self-assembly2016

    • Author(s)
      Hiroki Yamamoto, Akira Ohnuma, Bunsho Ohtani, Takahiro Kozawa
    • Organizer
      The 33th International Conference of Photopolymer Science and Technology
    • Place of Presentation
      Chiba, Japan
    • Year and Date
      2016-06-22
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Presentation] Synthesis and Resist Properties of Calixarene Polymers with Pendant Haloalkyl Groups2016

    • Author(s)
      H. Kudo, H. Ogawa, H. Yamamoto, and T. Kozawa
    • Organizer
      The 33rd International Conference of Photopolymer Science and Technology
    • Place of Presentation
      Chiba, Japan
    • Year and Date
      2016-06-22
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-25246036
  • [Presentation] Molecular Resist Materials for Extreme Ultraviolet Lithography2016

    • Author(s)
      H. Yamamoto, H. Kudo, and T. Kozawa
    • Organizer
      2016 International Workshop on EUV Lithography
    • Place of Presentation
      CA, USA
    • Year and Date
      2016-06-13
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-25246036
  • [Presentation] Fabrication of High Aspect Ratio Nanostructure by Using ClF3-Ar Neutral Cluster Etching2016

    • Author(s)
      Hiroki Yamamoto, Toshio Seki, Jiro Matsuo, Kunihiko Koike, Takahiro Kozawa
    • Organizer
      38th International Symposium on Dry Process
    • Place of Presentation
      Hokkaido, Japan
    • Year and Date
      2016-11-21
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16K14439
  • [Presentation] Radiation-induced synthesis of metal nanoparticles in ethers THF and PGMEA2015

    • Author(s)
      Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa,Jean-Louis Marignier,Mehran Mostafavi,Jacqueline Belloni
    • Organizer
      Pacifichem 2015
    • Place of Presentation
      ハワイ (アメリカ)
    • Year and Date
      2015-12-15
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Presentation] Study on Fusion between Electron Beam Lithography and Self-assembly for Advanced Patterning2015

    • Author(s)
      Hiroki Yamamoto, Takahiro Kozawa
    • Organizer
      15th International Congress of Radiation Research
    • Place of Presentation
      国立京都国際会館 (京都府 京都市)
    • Year and Date
      2015-05-25
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Presentation] Study on Dissolution Behavior of Poly(4-hydroxystyrene) as model Polymer of Chemically Amplified Resists for Extreme Ultraviolet Lithography2015

    • Author(s)
      Masaki Mitsuyasu, Hiroki Yamamoto, Takahiro Kozawa
    • Organizer
      The 32nd International Conference of Photopolymer Science and Technology
    • Place of Presentation
      幕張メッセ (千葉県 千葉市)
    • Year and Date
      2015-06-24
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Presentation] Dissolution Dynamics of Chemically Amplified Resists for Extreme Ultraviolet Lithography Studied by Quartz Crystal Microbalance2015

    • Author(s)
      M. Mitsuyasu, H. Yamamoto, and T. Kozawa
    • Organizer
      2015 International Workshop on EUV Lithography
    • Place of Presentation
      米国ハワイ
    • Year and Date
      2015-07-15
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-25246036
  • [Presentation] 微細加工技術による金属ナノ粒子の位置制御2015

    • Author(s)
      山本洋揮
    • Organizer
      先端放射線化学シンポジウム
    • Place of Presentation
      浜名湖 かんざんじ荘 (静岡県 浜松市)
    • Year and Date
      2015-09-29
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Presentation] Study on Resist Performance of Chemically Amplified Molecular Resist based on Noria Derivative and Calixarene Derivative for EUV lithography2015

    • Author(s)
      Hiroki Yamamoto, Hiroto Kudo, Takahiro Kozawa
    • Organizer
      2015 International EUVL Symposium
    • Place of Presentation
      マーストリヒト (オランダ)
    • Year and Date
      2015-10-05
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Presentation] Acid Generation Mechanism in Solid Poly(4-hydroxystyrene) upon Exposure to Electron Beam2013

    • Author(s)
      H. Yamamoto, K. Okamoto, T. Kozawa
    • Organizer
      26th International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      Hokkaido, Japan,
    • Data Source
      KAKENHI-PROJECT-24656447
  • [Presentation] Controlled Array of Silver Nanoparticles on Nanopatterns2013

    • Author(s)
      H. Yamamoto, A. Ohnuma, B. Ohtani, T. Kozawa
    • Organizer
      30th International Conference of Photopolymer Science and Tecnology Conference
    • Place of Presentation
      Chiba, Japan
    • Data Source
      KAKENHI-PROJECT-24656447
  • [Presentation] Controlled arrangement of nanoparticles capped with protecting ligand2013

    • Author(s)
      H. Yamamoto, A. Ohnuma, B. Ohtani, T. Kozawa
    • Organizer
      The 39th International Conference on Micro and Nano Engineering
    • Place of Presentation
      London, England
    • Data Source
      KAKENHI-PROJECT-24656447
  • [Presentation] Formation of Nano Reaction Field Using Combination of Top-down and Bottom-up Nanofabricaiton2012

    • Author(s)
      H. Yamamoto、A. Ohnuma、B. Ohtani and T. Kozawa
    • Organizer
      38th International Micro & Nano Engineering Conference (MNE 2012)
    • Place of Presentation
      Toulouse、France
    • Data Source
      KAKENHI-PROJECT-24656447
  • [Presentation] Position Control of Gold Nano-particles by Fine Fabrication Technology of Topdown-Bottom-up2012

    • Author(s)
      H. Yamamoto、A. Ohnuma、T. Kozawa, and B. Ohtani
    • Organizer
      29th International Conference of Photopolymer Science and Technology
    • Place of Presentation
      Chiba, Japan
    • Data Source
      KAKENHI-PROJECT-24656447
  • [Presentation] Dissolution Kinetics and Deprotection Reaction in Chemi cally Amplified Resistsupon Exposure to Extreme Ultraviolet Radiation2011

    • Author(s)
      Hiroki Yamamoto
    • Organizer
      The 12th Pacific Polymer Conference
    • Place of Presentation
      Jeju・Korea
    • Year and Date
      2011-11-14
    • Data Source
      KAKENHI-PROJECT-21760584
  • [Presentation] EUV化学増幅レジストの現像解析2011

    • Author(s)
      山本洋揮
    • Organizer
      2011年秋季第72回応用物理学会学術講演会
    • Place of Presentation
      山形大学(山形市)
    • Year and Date
      2011-08-30
    • Data Source
      KAKENHI-PROJECT-21760584
  • [Presentation] EUV化学増幅レジストの現像解析2011

    • Author(s)
      山本洋揮
    • Organizer
      International Conference of Photopolymer Sciecne and Technology (ICPST-28)
    • Place of Presentation
      千葉市千葉大学
    • Year and Date
      2011-06-24
    • Data Source
      KAKENHI-PROJECT-21760584
  • [Presentation] Disolution Kinetics and Deprotection Reaction in Chemically Amplified EUV Resists2011

    • Author(s)
      Hiroki Yamamoto
    • Organizer
      2011 International Symposium on Extreme Ultraviolet Lithography
    • Place of Presentation
      Miami Florida USA
    • Year and Date
      2011-10-17
    • Data Source
      KAKENHI-PROJECT-21760584
  • [Presentation] Disolution Kinetics and Deprotection Reaction in Chemically Amplified EUV Resists2011

    • Author(s)
      Hiroki Yamamoto
    • Organizer
      2011 International Symposium on Extreme Ultraviolet Lithography
    • Place of Presentation
      Miami Florida・USA
    • Year and Date
      2011-10-17
    • Data Source
      KAKENHI-PROJECT-21760584
  • [Presentation] Dissolution Kinetics and Deprotection Reaction in Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation2011

    • Author(s)
      Hiroki Yamamoto
    • Organizer
      The 12th Pacific Polymer Conference
    • Place of Presentation
      Jeju Korea
    • Year and Date
      2011-11-14
    • Data Source
      KAKENHI-PROJECT-21760584
  • [Presentation] EUV化学増幅レジストの現像解析2011

    • Author(s)
      山本洋揮
    • Organizer
      2011年秋季第72回応用物理学会学術講演会
    • Place of Presentation
      山形市山形大学
    • Year and Date
      2011-08-30
    • Data Source
      KAKENHI-PROJECT-21760584
  • [Presentation] EUV化学増幅レジストの現像解析2011

    • Author(s)
      山本洋揮
    • Organizer
      International Conference of Photopolymer Sciecne and Technology
    • Place of Presentation
      千葉大学(千葉市)
    • Year and Date
      2011-06-24
    • Data Source
      KAKENHI-PROJECT-21760584
  • [Presentation] ナノリソグラフィ用新規フラーレン誘導体に基づいたネガ型化学増幅型分子レジスト2010

    • Author(s)
      山本洋揮
    • Organizer
      第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学 文教キャンパス
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-21760584
  • [Presentation] ナノリソグラフィ用新規フラーレン誘導体に基づいたネガ型化学増幅型分子レジスト2010

    • Author(s)
      山本洋揮
    • Organizer
      第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学文教キャンパス(長崎市)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-21760584
  • [Presentation] 化学増幅型EUVレジストにおける脱保護反応2009

    • Author(s)
      山本洋揮
    • Organizer
      放射線化学討論会
    • Place of Presentation
      福井工業大学(福井県)
    • Year and Date
      2009-09-26
    • Data Source
      KAKENHI-PROJECT-21760584
  • [Presentation] 化学増幅型EUVレジストにおける脱保護反応2009

    • Author(s)
      山本洋揮
    • Organizer
      第52回放射線化学討論会
    • Place of Presentation
      福井工業大学福井大学(福井市)
    • Year and Date
      2009-09-26
    • Data Source
      KAKENHI-PROJECT-21760584
  • [Presentation] Study on Reactivity of Halogenated Resist Polymer with Low-Energy Electrons2008

    • Author(s)
      H. Yamamoto, T. Kozawa, A. Saeki, S. Tagawa, T. Mimura, H. Yukawa, and J. Onodera
    • Organizer
      21st International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      Fukuoka, Japan
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Presentation] Acid generation mechanism in anion bound chemically amplified resists used for extreme-ultraviolet lithography

    • Author(s)
      Y. Komuro, H. Yamamoto, K. Kobayashi, K. Ohomori, and T. Kozawa
    • Organizer
      SPIE Advanced Lithography
    • Place of Presentation
      San Jose, California, USA
    • Year and Date
      2015-02-22 – 2015-02-26
    • Data Source
      KAKENHI-PROJECT-25246036
  • [Presentation] Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa, K. Ohmori, M. Sato, H. Komano
    • Organizer
      SPIE Advanced Microlithography
    • Place of Presentation
      San Jose, California, USA
    • Year and Date
      2007-02-25 – 2007-03-02
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Presentation] Effects of low-molecular weight resist components on dissolution behavior of chemically-amplified resists for extreme ultraviolet lithography studied by quartz crystal microbalance

    • Author(s)
      M. Masaki, H. Yamamoto, and T. Kozawa
    • Organizer
      SPIE Advanced Lithography
    • Place of Presentation
      San Jose, California, USA
    • Year and Date
      2015-02-22 – 2015-02-26
    • Data Source
      KAKENHI-PROJECT-25246036
  • [Presentation] Fundamental Study on Dissolution Behavior of Chemically Amplified Resist for EUV Lithography

    • Author(s)
      M. Mitsuyasu, H. Yamamoto and T. Kozawa
    • Organizer
      Photomask Japan 2014
    • Place of Presentation
      Yokohama, Kanagawa, Japan
    • Year and Date
      2014-04-15 – 2014-04-16
    • Data Source
      KAKENHI-PROJECT-25246036
  • [Presentation] Difference between initial distributions of proton and counter anion in chemically amplified electron-beam resist

    • Author(s)
      T. Kozawa, H. Yamamoto, A. Saeki and S. Tagawa
    • Organizer
      31st Int. Symp. Microlithography
    • Place of Presentation
      San Jose, California, USA
    • Year and Date
      2006-02-19 – 2006-02-24
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Presentation] Study on Dissolution Behavior of Chemically Amplified Resists for Extreme Ultraviolet Lithography

    • Author(s)
      M. Mitsuyasu, H. Yamamoto and T. Kozawa
    • Organizer
      27th International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      Fukuoka, Japan
    • Year and Date
      2014-11-04 – 2014-11-07
    • Data Source
      KAKENHI-PROJECT-25246036
  • [Presentation] 環状オリゴマーに基づいた化学増幅型分子レジストのレジスト性能評価に関する研究

    • Author(s)
      山本 洋揮
    • Organizer
      第75回応用物理学会秋季学術講演会
    • Place of Presentation
      北海道大学
    • Year and Date
      2014-09-17 – 2014-09-20
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Presentation] Position Control of Metal Nano Particle by Self Assembly

    • Author(s)
      山本 洋揮
    • Organizer
      31st International Conference of Photopolymer Science and Technology (ICPST-31) 
    • Place of Presentation
      千葉大学
    • Year and Date
      2014-07-08 – 2014-07-11
    • Data Source
      KAKENHI-PROJECT-24656447
  • [Presentation] Radiation-induced Synthesis of Metal Nanoparticles in Ethers THF and PGMEA

    • Author(s)
      山本 洋揮
    • Organizer
      The 5th Asia Pacific Symposium on Radiation Chemistry
    • Place of Presentation
      東京大学
    • Year and Date
      2014-09-08 – 2014-09-11
    • Data Source
      KAKENHI-PROJECT-24656447
  • [Presentation] Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness

    • Author(s)
      H. Yamamoto, T. Kozawa, A. Saeki, K. Okamoto, S. Tagawa, K. Ohmori, M. Sato, H. Komano
    • Organizer
      Int. Microprocesses and Nanotechnology Conf.
    • Place of Presentation
      Kamakura, Japan
    • Year and Date
      2006-10-25 – 2006-10-27
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Presentation] Radiation-induced Synthesis of Metal Nanoparticles in Ethers THF and PGMEA

    • Author(s)
      山本 洋揮
    • Organizer
      The 5th Asia Pacific Symposium on Radiation Chemistry
    • Place of Presentation
      東京大学弥生講堂
    • Year and Date
      2014-09-08 – 2014-09-11
    • Data Source
      KAKENHI-PROJECT-26706027
  • [Presentation] Effect of Fluorine Atom on Acid Generation in Chemically Amplified EUV Resist

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa, H. Yukawa, M. Sato, J. Onodera
    • Organizer
      Microprocess and Nanotechnology Conference
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2007-11-05 – 2007-11-08
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Presentation] Effect of Fluorine Atom on Acid Generation in Chemically Amplified EUV Resist

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa H. Yukawa, M. Sato, H. Komano
    • Organizer
      2007 International EUVL Symposium
    • Place of Presentation
      Sapporo, Japan
    • Year and Date
      2007-10-28 – 2007-10-31
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Presentation] The reaction mechanism of poly[4-hydroxystyrene-co-4-(1, 1, 1, 3, 3, 3-hexafluoro-2- hydroxypropyl)-styrene]

    • Author(s)
      H. Yamamoto, T. Kozawa, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
    • Organizer
      31st Int. Symp. Microlithography
    • Place of Presentation
      San Jose, California, USA
    • Year and Date
      2006-02-19 – 2006-02-24
    • Data Source
      KAKENHI-PROJECT-17106014
  • [Presentation] High-aspect-ratio patterning by ClF3-Ar neutral cluster etching

    • Author(s)
      山本 洋揮
    • Organizer
      40th Micro nad Nano Engineering 2014
    • Place of Presentation
      ローザンヌ スイス
    • Year and Date
      2014-09-22 – 2014-09-26
    • Data Source
      KAKENHI-PROJECT-24656447
  • 1.  KOZAWA Takahiro (20251374)
    # of Collaborated Projects: 4 results
    # of Collaborated Products: 42 results
  • 2.  KOBAYASHI Kazuo (30116032)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 3 results
  • 3.  TAGAWA Seiichi (80011203)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 22 results
  • 4.  SEKI Shuhei (30273709)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 5.  SAEKI Akinori (10362625)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 9 results
  • 6.  OKAMOTO Kazumasa (10437353)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 11 results
  • 7.  YANG Jinfeng (90362631)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 8.  室屋 裕佐 (40334320)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 9.  Belloni J.
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 2 results
  • 10.  Robinson A. P. G.
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 1 results

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