YAMAMOTO HIROKI 山本洋揮

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YAMAMOTO Hiroki 山本洋揮

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Researcher Number	00516958
Other IDs
Affiliation (Current)	2025: 国立研究開発法人量子科学技術研究開発機構, 高崎量子技術基盤研究所量子機能創製研究センター, 主幹研究員
Affiliation (based on the past Project Information) *help	2025: 国立研究開発法人量子科学技術研究開発機構, 高崎量子技術基盤研究所量子機能創製研究センター, 主幹研究員 2022 – 2023: 国立研究開発法人量子科学技術研究開発機構, 高崎量子応用研究所量子機能創製研究センター, 主幹研究員 2021: 国立研究開発法人量子科学技術研究開発機構, その他部局等, 研究員 2021: 国立研究開発法人量子科学技術研究開発機構, 高崎量子応用研究所先端機能材料研究部, 主幹研究員 2018 – 2020: 国立研究開発法人量子科学技術研究開発機構, 高崎量子応用研究所先端機能材料研究部, 主幹研究員(定常) … More 2017: 国立研究開発法人量子科学技術研究開発機構, 高崎量子応用研究所先端機能材料研究部, 主任研究員(定常) 2011 – 2017: 大阪大学, 産業科学研究所, 助教 2010: 大阪大学, 産業科学研究所, 特任助教(常勤) 2008 – 2009: 大阪大学, 産業科学研究所, 特任助教 Less
Review Section/Research Field	Principal Investigator Basic Section 26050:Material processing and microstructure control-related / Material processing/treatments / Material processing/Microstructural control engineering / Quantum beam science Except Principal Investigator Nuclear engineering / Quantum beam science
Keywords	Principal Investigator ナノ材料 / 半導体微細化 / 材料・加工 / ナノ加工 / 半導体超微細化 / リソグラフィ / 材料加工・処理 / 量子ビーム / レジスト / 表面・界面物性 … More / 材料・加工処理 / ブロック共重合体 / レジスト材料 / 自己組織化 / 放射線 / 電子線リソグラフィ / 極端紫外光リソグラフィ / 電子・電気材料 … More Except Principal Investigator 放射線、X線、粒子線 / 計算物理 / シミュレーション工学 / 半導体超微細化 / 粒子線 / 放射線 / 放射線、Ｘ線、粒子線 / X 線 / 原子力エネルギー / 原子・分子物理 / X線 / ナノ空間 / 熱化過程 / 高分子科学 / 化学増幅レジスト / シミュレーション / フェムト秒パルスジオリシス / ナノテクノロジー / 量子ビーム / ナノ時空間反応 / フェムト秒パルスラジオリシス Less

Establishment of the Scientific Foundation for creation of fine fabrication materials and processes for single nanometer.Principal Investigator
- Principal Investigator
  
  山本洋揮
- Project Period (FY)
  2025 – 2027
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Review Section
  
  Basic Section 26050:Material processing and microstructure control-related
- Research Institution
  National Institutes for Quantum Science and Technology
EUVリソグラフィ×自己組織化による分子サイズに迫る超極微細加工技術の創製Principal Investigator
- Principal Investigator
  
  山本洋揮
- Project Period (FY)
  2022 – 2024
- Research Category
  
  Fund for the Promotion of Joint International Research (Fostering Joint International Research (A))
- Review Section
  
  Basic Section 26050:Material processing and microstructure control-related
- Research Institution
  National Institutes for Quantum Science and Technology
Creation of Metal Ultrafine Fabrication Materials and Processes for Realization of Direct LithographyPrincipal Investigator
- Principal Investigator
  
  YAMAMOTO HIROKI
- Project Period (FY)
  2020 – 2022
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Review Section
  
  Basic Section 26050:Material processing and microstructure control-related
- Research Institution
  National Institutes for Quantum Science and Technology
Development of fine wire for mass production to achieve the precision of less than 1 nmPrincipal Investigator
- Principal Investigator
  
  Yamamoto Hiroki
- Project Period (FY)
  2016 – 2019
- Research Category
  
  Grant-in-Aid for Challenging Exploratory Research
- Research Field
  
  Material processing/Microstructural control engineering
- Research Institution
  National Institutes for Quantum and Radiological Science and Technology
  Osaka University
Creation of Nanofabrication process for extreme quantum beam using organic-inorganice hybrid nanoparticlesPrincipal Investigator
- Principal Investigator
  
  YAMAMOTO HIROKI
- Project Period (FY)
  2014 – 2016
- Research Category
  
  Grant-in-Aid for Young Scientists (A)
- Research Field
  
  Quantum beam science
- Research Institution
  Osaka University
Study on nanochemistry in latest nanofabrication materials using quantum beams
- Principal Investigator
  
  Kozawa Takahiro
- Project Period (FY)
  2013 – 2017
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Quantum beam science
- Research Institution
  Osaka University
Creation and Control of Metal Nano-structure Using Combination of Top-down and Bottom up NanofabricationPrincipal Investigator
- Principal Investigator
  
  YAMAMOTO HIROKI
- Project Period (FY)
  2012 – 2014
- Research Category
  
  Grant-in-Aid for Challenging Exploratory Research
- Research Field
  
  Material processing/treatments
- Research Institution
  Osaka University
Study on nanoscale chemical reactions and reaction sites using quantum beams
- Principal Investigator
  
  KOZAWA Takahiro
- Project Period (FY)
  2010 – 2012
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Nuclear engineering
- Research Institution
  Osaka University
Study on the expanse of thermalized electrons in condensed matters
- Principal Investigator
  
  KOZAWA Takahiro
- Project Period (FY)
  2009 – 2011
- Research Category
  
  Grant-in-Aid for Challenging Exploratory Research
- Research Field
  
  Nuclear engineering
- Research Institution
  Osaka University
Educaiton and Control of Nano-topography Mechanism in Ultrafine FabricationPrincipal Investigator
- Principal Investigator
  
  YAMAMOTO Hiroki
- Project Period (FY)
  2009 – 2011
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Material processing/treatments
- Research Institution
  Osaka University
Femtosecond Pulse Radiolysis Study on Nanoscale Time Space Reaction Process
- Principal Investigator
  
  TAGAWA Seiichi
- Project Period (FY)
  2005 – 2008
- Research Category
  
  Grant-in-Aid for Scientific Research (S)
- Research Field
  
  Nuclear engineering
- Research Institution
  Osaka University

[Journal Article] A study on the resist performance of inorganic-organic resist materials for EUV and electron-beam lithography2024
- Author(s)
  Yamamoto Hiroki、Ito Yuko Tsutsui、Okamoto Kazumasa、Shimoda Shuhei、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 63 Issue: 4 Pages: 04SP87-04SP87
- DOI
  10.35848/1347-4065/ad38c5
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20H02489
[Journal Article] Competitive coexistence of ferromagnetism and metal insulator transition of VO2 nanoparticles2024
- Author(s)
  Hatano Tsuyoshi、Fukawa Akihiro、Yamamoto Hiroki、Akiba Keiichirou、Demura Satoshi、Takase Kouichi
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 63 Issue: 4 Pages: 04SP07-04SP07
- DOI
  10.35848/1347-4065/ad2d04
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20H02489
[Journal Article] Study on irradiation effects by femtosecond-pulsed extreme ultraviolet in resist materials2023
- Author(s)
  Yuji Hosaka, Hiroki Yamamoto, Masahiko Ishino, Thanh-Hung Dinh, Masaharu Nishikino, Yasunari Maekawa
- Journal Title
  
  Proc. of SPIE
  
  Volume: 12498 Pages: 100-100
- DOI
  10.1117/12.2670220
- NAID
  130008119663
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21KK0262
[Journal Article] Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials2021
- Author(s)
  Hosaka Yuji、Yamamoto Hiroki、Ishino Masahiko、Dinh Thanh-Hung、Nishikino Masaharu、Kon Akira、Owada Shigeki、Inubushi Yuichi、Kubota Yuya、Maekawa Yasunari
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 34 Issue: 1 Pages: 95-98
- DOI
  10.2494/photopolymer.34.95
- NAID
  130008119663
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2021-06-11
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20H02489, KAKENHI-PROJECT-21H03750
[Journal Article] Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments2020
- Author(s)
  Yamamoto Hiroki、Dawson Guy、Kozawa Takahiro、Robinson Alex P. G.
- Journal Title
  
  Quantum Beam Science
  
  Volume: 4 Issue: 2 Pages: 1-10
- DOI
  10.3390/qubs4020019
- Peer Reviewed / Open Access / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K14439, KAKENHI-PROJECT-18H03895, KAKENHI-PROJECT-20H02489
[Journal Article] Sensitizers in extreme ultraviolet chemically amplified resist: mechanism of sensitivity improvement2018
- Author(s)
  Yannick Vesters Jing Jiang, Hiroki Yamamoto Danilo De Simone Takahiro Kozawa Stefan De Gendt Geert Vandenberghe
- Journal Title
  
  J. Micro/Nanolith. MEMS. MOEMS
  
  Volume: 17 Issue: 04 Pages: 1-1
- DOI
  10.1117/1.jmm.17.4.043506
- Peer Reviewed / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K14439, KAKENHI-PROJECT-18H03895
[Journal Article] Role of Metal Sensitizers for Sensitivity Improvement in EUV Chemically Amplified Resist2018
- Author(s)
  Hiroki Yamamoto, Yannick Vesters Jing Jiang Danilo De Simone Geert Vandenberghe
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 31 Issue: 6 Pages: 747-751
- DOI
  10.2494/photopolymer.31.747
- NAID
  130007603657
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2018-12-15
- Language
  English
- Peer Reviewed / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K14439
[Journal Article] Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties by means of Extreme Ultraviolet Irradiation2017
- Author(s)
  H. Yamamoto, H. Kudo, and T. Kozawa
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 30 Pages: 627-631
- NAID
  130006309146
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Dynamics of Radical Ions of Hydroxyhexafluoroisopropyl-Substituted Benzenes2017
- Author(s)
  K. Okamoto, N. Nomura, R. Fujiyoshi, K. Umegaki, H. Yamamoto, K. Kobayashi, and T. Kozawa
- Journal Title
  
  J. Phys. Chem. A
  
  Volume: 121 Issue: 49 Pages: 9458-9465
- DOI
  10.1021/acs.jpca.7b09842
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036, KAKENHI-PROJECT-15K06662
[Journal Article] Synthesis and Property of Tellurium-Containing Polymer for Extreme Ultraviolet Resist Material2017
- Author(s)
  M. Fukunaga, H. Yamamoto, T. Kozawa, T. Watanabe, and H. Kudo
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 30 Pages: 103-107
- NAID
  130005950306
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties by means of Extreme Ultraviolet Irradiation2017
- Author(s)
  H. Yamamoto, H. Kudo, and T. Kozawa
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 30 Issue: 6 Pages: 627-631
- DOI
  10.2494/photopolymer.30.627
- NAID
  130006309146
- ISSN
  0914-9244, 1349-6336
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K14439
[Journal Article] Synthesis of Metal Nanoparticles and Patterning in Polymeric Films Induced by Electron Nanobeam2017
- Author(s)
  Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Muneyuki Naito, Jean-Louis. Marignier, Mehran Mostafavi, and Jacqueline Belloni
- Journal Title
  
  J. Phys. Chem. C
  
  Volume: 121 Issue: 9 Pages: 5335-5340
- DOI
  10.1021/acs.jpcc.6b12543
- Peer Reviewed / Acknowledgement Compliant / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26706027, KAKENHI-PROJECT-16K14439, KAKENHI-PROJECT-26390058
[Journal Article] Dynamics of radical cations of poly(4-hydroxystyrene) in the presence and absence of triphenylsulfonium triflate as determined by pulse radiolysis of its highly concentrated solution2016
- Author(s)
  K. Okamoto, T. Ishida, H. Yamamoto, T. Kozawa, R. Fujiyoshi, and K. Umegaki
- Journal Title
  
  Chem. Phys. Lett.
  
  Volume: 657 Pages: 44-48
- DOI
  10.1016/j.cplett.2016.05.058
- NAID
  120006488393
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036, KAKENHI-PROJECT-15K06662
[Journal Article] Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography2016
- Author(s)
  H. Yamamoto, S. Tagawa, T. Kozawa, H. Kudo, and K. Okamoto
- Journal Title
  
  J. Vac. Sci. Technol. B
  
  Volume: 34 Issue: 4 Pages: 041606-041606
- DOI
  10.1116/1.4953068
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036, KAKENHI-PROJECT-26706027
[Journal Article] Controlled Array of Gold Nanoparticles by Combination of Nano Imprint and Self-assembly2016
- Author(s)
  Hiroki Yamamoto, Akira Ohnuma, Bunsho Ohtani, Takahiro Kozawa
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 29 Issue: 5 Pages: 765-768
- DOI
  10.2494/photopolymer.29.765
- NAID
  130005261829
- ISSN
  0914-9244, 1349-6336
- Language
  English
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-26706027
[Journal Article] Synthesis and Resist Properties of Calixarene Polymers with Pendant Haloalkyl Groups2016
- Author(s)
  H. Kudo, H. Ogawa, H. Yamamoto, and T. Kozawa
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 29 Pages: 495-500
- NAID
  130005256573
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Study on Dissolution Behavior of Poly(4-hydroxystyrene) as Model Polymer of Chemically Amplified Resists for Extreme Ultraviolet Lithography2015
- Author(s)
  M. Mitsuyasu, H. Yamamoto, and T. Kozawa
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 28 Pages: 119-124
- NAID
  130005090251
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Study on Dissolution Behavior of Poly(4-hydroxystyrene) as Model Polymer of Chemically Amplified Resists for Extreme Ultraviolet Lithography2015
- Author(s)
  Masaki Mitsuyasu, Hiroki Yamamoto, Takahiro Kozawa
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 28 Issue: 1 Pages: 119-124
- DOI
  10.2494/photopolymer.28.119
- NAID
  130005090251
- ISSN
  0914-9244, 1349-6336
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-26706027
[Journal Article] High-aspect-ratio patterning by ClF3-Ar neutral cluster etching2015
- Author(s)
  Hiroki Yamamoto, Toshio Sekib, Jiro Matsuoc,　Kunihiko Koiked,　Takahiro Kozawa
- Journal Title
  
  Microelectronic Engineering
  
  Volume: 141 Pages: 145-149
- DOI
  10.1016/j.mee.2015.03.006
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-24656447, KAKENHI-PROJECT-26706027
[Journal Article] Position Control of Metal Nanoparticles by Self-Assembly2014
- Author(s)
  Hiroki Yamamoto, Akira Ohnuma, Bunsho Ohtani, Takahiro Kozawa
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 27 Issue: 2 Pages: 243-247
- DOI
  10.2494/photopolymer.27.243
- NAID
  130004678348
- ISSN
  0914-9244, 1349-6336
- Language
  English
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-24656447
[Journal Article] Controlled arrangement of nanoparticles capped with protecting ligand on Au nanopatterns2014
- Author(s)
  Hiroki Yamamotoa,Akira Ohnumab,Bunsho Ohtanib,Takahiro Kozawa
- Journal Title
  
  Microelectronic Engineering
  
  Volume: 121 Pages: 108-112
- DOI
  10.1016/j.mee.2014.02.028
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-24656447
[Journal Article] Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography2014
- Author(s)
  Y. Komuro, H. Yamamoto, K. Kobayashi, Y. Utsumi, K. Ohomori, and T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 53 Issue: 11 Pages: 116503-116503
- DOI
  10.7567/jjap.53.116503
- NAID
  210000144600
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Controlled Array of Silver Nanoparticles on Nanopatterns2013
- Author(s)
  H. Yamamoto, A. Ohnuma, B. Ohtani, T. Kozawa
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 26 Pages: 495-499
- NAID
  130004833524
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24656447
[Journal Article] Deprotonation of poly(4-hydroxystyrene) intermediates: pulse radiolysis study of EUV and electron beam resist2013
- Author(s)
  Kazumasa Okamoto, Tyo Matsuda, Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Ryoko Fujiyoshi, and Takashi Sumiyoshi
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 52 Issue: 6S Pages: 06GC04-06GC04
- DOI
  10.7567/jjap.52.06gc04
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24561037, KAKENHI-PROJECT-25246036, KAKENHI-PROJECT-25630424
[Journal Article] Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in ExtremeUltraviolet Lithography2013
- Author(s)
  Y. Komuro, H. Yamamoto, Y. Utsumi, K. Ohomori, and T. Kozawa
- Journal Title
  
  Appl. Phys. Express
  
  Volume: 6巻 Issue: 1 Pages: 14001-14001
- DOI
  10.7567/apex.6.014001
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Formation of nanoscale reaction field using combination of top-down and bottom-up nanofabricaiton2013
- Author(s)
  H. Yamamoto, A. Ohnuma, B. Ohtani, T. Kozawa
- Journal Title
  
  Microelectron. Eng.
  
  Volume: 110 Pages: 369-373
- DOI
  10.1016/j.mee.2013.02.066
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24656447
[Journal Article] Radiation-induced synthesis of metal nanoparticles in ethers THF and PGMEA2013
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa, M. NaitoJ.-L. Marignier, M. Mostafavi, and J. Belloni
- Journal Title
  
  Radiat. Phys. Chem.
  
  Volume: 91 Pages: 148-155
- DOI
  10.1016/j.radphyschem.2013.05.019
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24656447
[Journal Article] Location Control of Nanoparticles Using Combination of Top-down and Bottom-up Nano-fabrication2012
- Author(s)
  H. Yamamoto、A. Ohnuma、T. Kozawa, and B. Ohtani
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 25 Pages: 449-453
- NAID
  40019347341
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24656447
[Journal Article] Geminate Charge Recombination in Liquid Alkane with Concentrated CCl4 : Effects of CCl4 Radical Anion and Narrowing of Initial Distribution of Cl-2011
- Author(s)
  A.Saeki, N.Yamamoto, Y.Yoshida, T.Kozawa
- Journal Title
  
  J.Phys.Chem.A
  
  Volume: 115 Issue: 36 Pages: 10166-10173
- DOI
  10.1021/jp205989r
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20686064, KAKENHI-PROJECT-21656238
[Journal Article] Dissolution Kinetics in Chemically Amplified EUV Resist2011
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa T. Ando, K. Ohmori, M. Sato, and J. Onodera
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 24 Issue: 4 Pages: 405-410
- DOI
  10.2494/photopolymer.24.405
- NAID
  130004464914
- ISSN
  0914-9244, 1349-6336
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21760584
[Journal Article] Characterization of EUV irradiati on effects on Polystyrene Derivatives Studied by X-ray Photoelectron Spectroscopy(XPS) and Ultraviolet Photoelectron Spectroscopy(UPS)2011
- Author(s)
  H. Yamamoto, T. Kozawa, and S. Tagawa
- Journal Title
  
  Proceeding of SPIE Advances in Resist Materials and Processing Tehcnology XXVII
  
  Volume: 7972 Pages: 79721I-79721I
- DOI
  10.1117/12.879303
- Data Source
  KAKENHI-PROJECT-21760584
[Journal Article] Negative Chemically Amplified Molecular Resist Based on Novel Fullerene Derivative for Nanolithography2010
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa, T. Ando, K. Ohmori, M. Sato, and J. Onodera
- Journal Title
  
  Proceeding of SPIE Advances in Resist Materials and Processing Tehcnology XXVII
  
  Volume: 7639 Pages: 76390U-76390U
- DOI
  10.1117/12.846391
- Data Source
  KAKENHI-PROJECT-21760584
[Journal Article] Radiation Chemistry of Fluoronbphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists2010
- Author(s)
  S.Ikeda, K.Okamoto, H.Yamamoto, A.Saeki, S.Tagawa, T.Kozawa
- Journal Title
  
  Jpn.J.Appl.Phys.
  
  Volume: 49 Pages: 96504-96504
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Radiation Chemistry of Fluoronaphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists2010
- Author(s)
  S. Ikeda, K. Okamoto, H. Yamamoto, A. Saeki, S. Tagawa, T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 49巻 Issue: 9R Pages: 96504-96504
- DOI
  10.1143/jjap.49.096504
- NAID
  40017294753
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Negative Chemically Amplified Molecular Resist Based on Novel Fullerene Derivative for Nanolithography2010
- Author(s)
  H.Yamamoto, T.Kozawa, S.Tagawa, T.Ando, K.Ohmori, M.Sato, J.Onodera
- Journal Title
  
  Proceeding of SPIE Advances in Resist Materials and Processing Technology XXV II
  
  Volume: 7639
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21760584
[Journal Article] Reactivity of Haloge nated Resist Polymer with Low-Energy Electrons2009
- Author(s)
  H.Yamamoto, T.Kozawa, A.Saeki, S.Tagawa, T.Mimura, H.Yukawa, J.Onodera
- Journal Title
  
  Jpn.J.Appl.Phys. 48
  
  Pages: 6-9
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Reactivity of Halogenated Resist Polymer with Low-Energy Electrons2009
- Author(s)
  H. Yamamoto, T. Kozawa, A. Saeki, S. Tagawa, T. Mimura, H. Yukawa, and J. Onodera
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 48巻 Issue: 6S Pages: 06FC09-06FC09
- DOI
  10.1143/jjap.48.06fc09
- NAID
  210000066909
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography2008
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa, H. Yukawa, M. Sato, J. Onodera
- Journal Title
  
  Appl. Phys. Express 1
  
  Pages: 47001-47001
- NAID
  10025080127
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Polymer structure dependence of acid generation in chemically amplified extreme ultraviolet resists2007
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, M. J. Leeson
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 46
- NAID
  10018868104
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness2007
- Author(s)
  H. Yamamoto, T. Kozawa, A. Saeki, K. Okamoto, S. Tagawa, K. Ohmori, M. Sato, and H. Komano,
- Journal Title
  
  Jpn. J. Appl. Phys. 46
  
  Pages: 6187-6190
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer2007
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa, K. Ohmori, M. Sato, and H. Komano,
- Journal Title
  
  Jpn. J. Appl. Phys. 46
- NAID
  40015511976
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Dependence of Acid Yield on Chemically Amplified Electron Beam Resist Thickness2006
- Author(s)
  T.Shigaki, K.Okamoto, T.Kozawa, H.Yamamoto, S.Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys. 45
  
  Pages: 5445-5449
- NAID
  10017998648
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist2006
- Author(s)
  T. Shigaki, K. Okamoto, T. Kozawa, H. Yamamoto, S. Tagawa, T. Kai, T. Shimokawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 45 Pages: 5735-5737
- NAID
  10017999650
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Effects of Low Energy Electrons on Pattern Formation in Chemically Amplified Resist2006
- Author(s)
  T.Kozawa, H.Yamamoto, A.Saeki, S.Tagawa
- Journal Title
  
  J. Photopolym. Sci. Technol. 19
  
  Pages: 361-366
- NAID
  130004833103
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Reaction mechanism of fluorinated chemically amplified resists2006
- Author(s)
  H. Yamamoto, T. Kozawa, K. Okamoto, A. Saeki, S. Tagawa, T. Ando, M. Sato, H. Komano
- Journal Title
  
  J. Vac. Sci. Technol. B
  
  Volume: 24 Pages: 1833-1836
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Reaction Mechanisms of Brominated Chemically Amplified Resists2005
- Author(s)
  H. Yamamoto, T. Kozawa, A. Nakano, S. Tagawa, T. Ando, M. Sato, H. Komano
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 44
- NAID
  10016590890
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Resist Thickness Effect on Acid Concentration Generated in Poly(4-hydroxystyrene) Film upon Exposure to 75 keV Electron Beam2005
- Author(s)
  T.Shigaki, K.Okamoto, T.Kozawa, H.Yamamoto, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 44
- NAID
  10016856520
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Dependence of Acid Yield on Acid Generator in Chemically Amplified Resist for Post-Optical Lithography2005
- Author(s)
  A. Nakano, K. Okamoto, Y. Yamamoto, T. Kozawa, S. Tagawa, T. Kai, H. Nemoto
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 44 Pages: 5832-5835
- NAID
  10016678348
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Study on acid generation from polymer2005
- Author(s)
  H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
- Journal Title
  
  J. Vac. Sci. Technol. B
  
  Volume: 23 Pages: 2728-2732
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Proton and anion distribution and line edge roughness of chemically amplified electron beam resist2005
- Author(s)
  T. Kozawa, H. Yamamoto, A. Saeki, and S. Tagawa
- Journal Title
  
  J. Vac. Sci. Technol B23
  
  Pages: 2716-2720
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography2005
- Author(s)
  H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 44 Pages: 5836-5838
- NAID
  10016678367
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Proton and anion distribution and line edge roughness of chemically amplified electron beam resist2005
- Author(s)
  T.Kozawa, H., Yamamoto, A.Saeki, S.Tagawa
- Journal Title
  
  J.Vac.Sci.Technol. B23
  
  Pages: 2716-2720
- Data Source
  KAKENHI-PROJECT-17106014
[Patent] レジスト材料、レジストパターンの製造方法、及び　レジストパターン2022
- Inventor(s)
  吉村公男、山本洋揮、出崎亮、古澤孝弘、前川康成、他3名
- Industrial Property Rights Holder
  量子科学技術研究開発機構
- Industrial Property Rights Type
  特許
- Filing Date
  2022
- Data Source
  KAKENHI-PROJECT-20H02489
[Presentation] Study on Resist Performance of Inorganic-Organic Resist Materials for EUV and EB Lithography2024
- Author(s)
  Hiroki Yamamoto, Yuko Tsutsui Ito, Kazumasa Okamoto and Takahiro Kozawa
- Organizer
  SPIE Advanced Lithography + Patterning 2024
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20H02489
[Presentation] レジスト材料における超短パルスEUV照射効果に関する研究2023
- Author(s)
  山本洋揮，保坂勇志，石野雅彦，ヂンタンフン，古澤孝弘，前川康成
- Organizer
  第72回高分子討論会
- Invited
- Data Source
  KAKENHI-PROJECT-20H02489
[Presentation] フォトリソグラフィと電子線リソグラフィのメタルレジストのリソグラフィ特性における基礎研究2023
- Author(s)
  山本洋揮，古澤孝弘
- Organizer
  第84回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-20H02489
[Presentation] Study on Resist Performance of Inorganic-Organic Resist Materials for EUV and EB Lithography2023
- Author(s)
  Hiroki Yamamoto, Yuko Tsutsui Ito, Kazumasa Okamoto and Takahiro Kozawa
- Organizer
  36th International Microprocesses and Nanotechnology Conference (MNC 2023)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20H02489
[Presentation] メタルレジストのレジスト性能に関する研究2023
- Author(s)
  山本洋揮，岡本一将，古澤孝弘，前川康成
- Organizer
  第66回放射線化学討論会
- Data Source
  KAKENHI-PROJECT-20H02489
[Presentation] Recent Research activity for EUV Lithography at QST2022
- Author(s)
  Hiroki Yamamoto, Yuji Hosaka, Kimio Yoshimura, Masahiko Ishino, Thanh-Hung Dinh, Masaharu Nishikino, and Yasunari Maekawa
- Organizer
  RadTech Asia 2022
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21KK0262
[Presentation] 極端紫外光（EUV）リソグラフィ用のマスク作製2022
- Author(s)
  山本洋揮，古澤孝弘
- Organizer
  第83回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-21KK0262
[Presentation] Recent Research activity for EUV Lithography at QST2022
- Author(s)
  Hiroki Yamamoto, Yuji Hosaka, Kimio Yoshimura, Masahiko Ishino, Thanh-Hung Dinh, Masaharu Nishikino, and Yasunari Maekawa
- Organizer
  The 39th International Conference of Photopolymer Science and Technology
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21KK0262
[Presentation] 金ナノパターン上のジチオールで修飾した金属ナノ粒子の配列制御2021
- Author(s)
  山本洋揮
- Organizer
  第68回応用物理学春季学術講演会
- Data Source
  KAKENHI-PROJECT-20H02489
[Presentation] 最先端量子ビームによる次世代リソグラフィ材料・プロセスの開発2021
- Author(s)
  山本洋揮
- Organizer
  第18回放射線プロセスシンポジウム
- Invited
- Data Source
  KAKENHI-PROJECT-20H02489
[Presentation] Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials2021
- Author(s)
  Hiroki Yamamoto、Yuji Hosaka、Ishino Masahiko、Dinh Thanh-Hung、Nishikino Masaharu、Kon Akira、Owada Shigeki、Inubushi Yuichi、Kubota Yuya、Maekawa Yasunari
- Organizer
  The 38th International Conference of Photopolymer Science and Technology, Online meeting
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20H02489
[Presentation] 電子線によるポリマー膜中の金属ナノ粒子の生成およびパターニングに関する研究2020
- Author(s)
  山本洋揮
- Organizer
  第69回高分子学会年次大会
- Data Source
  KAKENHI-PROJECT-20H02489
[Presentation] 電子ビーム照射による有機・無機ハイブリッド微細パターンの直接形成2020
- Author(s)
  山本洋揮
- Organizer
  第69回高分子討論会
- Invited
- Data Source
  KAKENHI-PROJECT-20H02489
[Presentation] 電子線誘起による高分子薄膜における金属ナノ粒子の合成とパターニングに関する研究2019
- Author(s)
  山本　洋揮、古澤孝弘、田川精一、マリグリナージャンルイ、モスタファビメラン、ジャックリンベローニ
- Organizer
  第66回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-16K14439
[Presentation] 自己組織化単分子膜の極性変化を用いたポリスチレン-ポリメチルメタクリレートブロック共重合体のラメラ配向2019
- Author(s)
  山本洋揮
- Organizer
  第68回高分子討論会
- Invited
- Data Source
  KAKENHI-PROJECT-16K14439
[Presentation] 電子線誘起による自己組織化単分子膜の極性変化を用いたブロック共重合体のラメラ方向制御2019
- Author(s)
  山本洋揮
- Organizer
  第68回高分子学会年次大会
- Data Source
  KAKENHI-PROJECT-16K14439
[Presentation] 放射線化学によるポリマーフィルムへの金属ナノパターン形成2018
- Author(s)
  山本洋揮
- Organizer
  第61回放射線化学討論会
- Invited
- Data Source
  KAKENHI-PROJECT-16K14439
[Presentation] 電子線誘起による高分子薄膜における金属ナノ粒子の合成とパターニングに関する研究2018
- Author(s)
  山本　洋揮、古澤孝弘、田川精一、マリグリナージャンルイ、モスタファビメラン、ジャックリンベローニ
- Organizer
  次世代リソグラフィワークショップ2018
- Data Source
  KAKENHI-PROJECT-16K14439
[Presentation] Role of Metal Sensitizers for Sensitivity Improvement in EUV Chemically Amplified Resist2018
- Author(s)
  Hiroki Yamamoto, Yannick Vesters Jing Jiang Danilo De Simone Geert Vandenberghe
- Organizer
  The 35th International Conference of Photopolymer Science and Technology
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K14439
[Presentation] Synthesis of Metal Nanoparticle and Patterning in Polymeric Films Induced by Electron Beam2018
- Author(s)
  Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Jean-Louis Marignier, Mehran Mostafavi, and Jacqueline Belloni
- Organizer
  SPIE Advanced Lithography 2018
- Data Source
  KAKENHI-PROJECT-16K14439
[Presentation] Lamellar orientation of block copolymer using polarity switch of Nitrophenyl self-assembled monolayer (SAM) induced by electron beam2017
- Author(s)
  Hiroki Yamamoto, Guy Dawson, Takahiro Kozawa, Alex P. G. Robinson
- Organizer
  SPIE Advanced Lithography 2017
- Place of Presentation
  California, USA
- Year and Date
  2017-02-26
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26706027
[Presentation] Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties by means of Extreme Ultraviolet Irradiation2017
- Author(s)
  Hiroki Yamamoto, Hiroto Kudo, and Takahiro Kozawa
- Organizer
  The 34th International Conference of Photopolymer Science and Technology
- Data Source
  KAKENHI-PROJECT-16K14439
[Presentation] Nanofabrication method for two dimensional controlled array of core-shell nanoparticles in large scale fabrication by using self-assembled Au@SiO2 nanoparticle in solvent intaerface2017
- Author(s)
  H.Yamamoto, A. Lehoux, B. Ohtani, T. Kozawa
- Organizer
  The 43rd International Conference on Micro and Nanoengineering
- Data Source
  KAKENHI-PROJECT-16K14439
[Presentation] トップダウン・ボトムアップ技術の融合による金属ナノ粒子の位置制御2017
- Author(s)
  山本洋揮、大沼明、大谷文章、古澤孝弘
- Organizer
  第78回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-16K14439
[Presentation] Synthesis of Metal Nanoparticles and Patterning in Polymeric Films Induced by Electron Nanobeam2017
- Author(s)
  Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Jean-Louis Marignier, Mehran Mostafavi, and Jacqueline Belloni
- Organizer
  The 30th Miller Conference on Radiation Chemistry
- Data Source
  KAKENHI-PROJECT-16K14439
[Presentation] アセタール基で保護したノーリア誘導体に基づいたレジスト材料の電子線照射に対する応答性の系統的な研究2016
- Author(s)
  山本洋揮, 工藤宏人, 古澤孝弘
- Organizer
  第77回応用物理学会秋季学術講演会
- Place of Presentation
  新潟県新潟市
- Year and Date
  2016-09-13
- Data Source
  KAKENHI-PROJECT-26706027
[Presentation] Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties for EUV lithography with Various2016
- Author(s)
  Hiroki Yamamoto, Hiroto Kudo, Takahiro Kozawa
- Organizer
  2016 International Symposium on Extreme Ultraviolet Lithography
- Place of Presentation
  Hiroshima, Japan
- Year and Date
  2016-10-24
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26706027
[Presentation] Selective Immobilization of Metal Nanoparticles Using Self-assembly Techniques2016
- Author(s)
  Hiroki Yamamoto, Akira Ohnuma, Bunsho Ohtani, Takahiro Kozawa
- Organizer
  42nd Micro and Nano Engineering
- Place of Presentation
  Vienna, Austria
- Year and Date
  2016-09-19
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26706027
[Presentation] Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties for EUV lithography2016
- Author(s)
  Hiroki Yamamoto, Hiroto Kudo, and Takahiro kozawa
- Organizer
  2016 International Symposium on Extreme Ultraviolet Lithography
- Place of Presentation
  Hiroshima, Japan
- Year and Date
  2016-10-24
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K14439
[Presentation] Molecular Resist Materials for Extreme Ultraviolet Lithography2016
- Author(s)
  Hiroki Yamamoto, Hiroto Kudo, and Takahiro Kozawa
- Organizer
  2016 International Workshop on EUV Lithography
- Place of Presentation
  California, USA
- Year and Date
  2016-06-13
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26706027
[Presentation] Controlled Array of Gold Nanoparticles by Combination of Nano Imprint and Self-assembly2016
- Author(s)
  Hiroki Yamamoto, Akira Ohnuma, Bunsho Ohtani, Takahiro Kozawa
- Organizer
  The 33th International Conference of Photopolymer Science and Technology
- Place of Presentation
  Chiba, Japan
- Year and Date
  2016-06-22
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26706027
[Presentation] Synthesis and Resist Properties of Calixarene Polymers with Pendant Haloalkyl Groups2016
- Author(s)
  H. Kudo, H. Ogawa, H. Yamamoto, and T. Kozawa
- Organizer
  The 33rd International Conference of Photopolymer Science and Technology
- Place of Presentation
  Chiba, Japan
- Year and Date
  2016-06-22
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Molecular Resist Materials for Extreme Ultraviolet Lithography2016
- Author(s)
  H. Yamamoto, H. Kudo, and T. Kozawa
- Organizer
  2016 International Workshop on EUV Lithography
- Place of Presentation
  CA, USA
- Year and Date
  2016-06-13
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Fabrication of High Aspect Ratio Nanostructure by Using ClF3-Ar Neutral Cluster Etching2016
- Author(s)
  Hiroki Yamamoto, Toshio Seki, Jiro Matsuo, Kunihiko Koike, Takahiro Kozawa
- Organizer
  38th International Symposium on Dry Process
- Place of Presentation
  Hokkaido, Japan
- Year and Date
  2016-11-21
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K14439
[Presentation] Radiation-induced synthesis of metal nanoparticles in ethers THF and PGMEA2015
- Author(s)
  Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa,Jean-Louis Marignier，Mehran Mostafavi，Jacqueline Belloni
- Organizer
  Pacifichem 2015
- Place of Presentation
  ハワイ　(アメリカ）
- Year and Date
  2015-12-15
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26706027
[Presentation] Study on Fusion between Electron Beam Lithography and Self-assembly for Advanced Patterning2015
- Author(s)
  Hiroki Yamamoto, Takahiro Kozawa
- Organizer
  15th International Congress of Radiation Research
- Place of Presentation
  国立京都国際会館　（京都府　京都市）
- Year and Date
  2015-05-25
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26706027
[Presentation] Study on Dissolution Behavior of Poly(4-hydroxystyrene) as model Polymer of Chemically Amplified Resists for Extreme Ultraviolet Lithography2015
- Author(s)
  Masaki Mitsuyasu, Hiroki Yamamoto, Takahiro Kozawa
- Organizer
  The 32nd International Conference of Photopolymer Science and Technology
- Place of Presentation
  幕張メッセ　（千葉県　千葉市）
- Year and Date
  2015-06-24
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26706027
[Presentation] Dissolution Dynamics of Chemically Amplified Resists for Extreme Ultraviolet Lithography Studied by Quartz Crystal Microbalance2015
- Author(s)
  M. Mitsuyasu, H. Yamamoto, and T. Kozawa
- Organizer
  2015 International Workshop on EUV Lithography
- Place of Presentation
  米国ハワイ
- Year and Date
  2015-07-15
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] 微細加工技術による金属ナノ粒子の位置制御2015
- Author(s)
  山本洋揮
- Organizer
  先端放射線化学シンポジウム
- Place of Presentation
  浜名湖　かんざんじ荘　（静岡県　浜松市）
- Year and Date
  2015-09-29
- Data Source
  KAKENHI-PROJECT-26706027
[Presentation] Study on Resist Performance of Chemically Amplified Molecular Resist based on Noria Derivative and Calixarene Derivative for EUV lithography2015
- Author(s)
  Hiroki Yamamoto, Hiroto Kudo, Takahiro Kozawa
- Organizer
  2015 International EUVL Symposiuｍ
- Place of Presentation
  マーストリヒト　（オランダ）
- Year and Date
  2015-10-05
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26706027
[Presentation] Acid Generation Mechanism in Solid Poly(4-hydroxystyrene) upon Exposure to Electron Beam2013
- Author(s)
  H. Yamamoto, K. Okamoto, T. Kozawa
- Organizer
  26th International Microprocesses and Nanotechnology Conference
- Place of Presentation
  Hokkaido, Japan,
- Data Source
  KAKENHI-PROJECT-24656447
[Presentation] Controlled Array of Silver Nanoparticles on Nanopatterns2013
- Author(s)
  H. Yamamoto, A. Ohnuma, B. Ohtani, T. Kozawa
- Organizer
  30th International Conference of Photopolymer Science and Tecnology Conference
- Place of Presentation
  Chiba, Japan
- Data Source
  KAKENHI-PROJECT-24656447
[Presentation] Controlled arrangement of nanoparticles capped with protecting ligand2013
- Author(s)
  H. Yamamoto, A. Ohnuma, B. Ohtani, T. Kozawa
- Organizer
  The 39th International Conference on Micro and Nano Engineering
- Place of Presentation
  London, England
- Data Source
  KAKENHI-PROJECT-24656447
[Presentation] Formation of Nano Reaction Field Using Combination of Top-down and Bottom-up Nanofabricaiton2012
- Author(s)
  H. Yamamoto、A. Ohnuma、B. Ohtani and T. Kozawa
- Organizer
  38th International Micro & Nano Engineering Conference (MNE 2012)
- Place of Presentation
  Toulouse、France
- Data Source
  KAKENHI-PROJECT-24656447
[Presentation] Position Control of Gold Nano-particles by Fine Fabrication Technology of Topdown-Bottom-up2012
- Author(s)
  H. Yamamoto、A. Ohnuma、T. Kozawa, and B. Ohtani
- Organizer
  29th International Conference of Photopolymer Science and Technology
- Place of Presentation
  Chiba, Japan
- Data Source
  KAKENHI-PROJECT-24656447
[Presentation] Dissolution Kinetics and Deprotection Reaction in Chemi cally Amplified Resistsupon Exposure to Extreme Ultraviolet Radiation2011
- Author(s)
  Hiroki Yamamoto
- Organizer
  The 12th Pacific Polymer Conference
- Place of Presentation
  Jeju・Korea
- Year and Date
  2011-11-14
- Data Source
  KAKENHI-PROJECT-21760584
[Presentation] EUV化学増幅レジストの現像解析2011
- Author(s)
  山本洋揮
- Organizer
  2011年秋季第72回応用物理学会学術講演会
- Place of Presentation
  山形大学(山形市)
- Year and Date
  2011-08-30
- Data Source
  KAKENHI-PROJECT-21760584
[Presentation] EUV化学増幅レジストの現像解析2011
- Author(s)
  山本洋揮
- Organizer
  International Conference of Photopolymer Sciecne and Technology (ICPST-28)
- Place of Presentation
  千葉市千葉大学
- Year and Date
  2011-06-24
- Data Source
  KAKENHI-PROJECT-21760584
[Presentation] Disolution Kinetics and Deprotection Reaction in Chemically Amplified EUV Resists2011
- Author(s)
  Hiroki Yamamoto
- Organizer
  2011 International Symposium on Extreme Ultraviolet Lithography
- Place of Presentation
  Miami Florida USA
- Year and Date
  2011-10-17
- Data Source
  KAKENHI-PROJECT-21760584
[Presentation] Disolution Kinetics and Deprotection Reaction in Chemically Amplified EUV Resists2011
- Author(s)
  Hiroki Yamamoto
- Organizer
  2011 International Symposium on Extreme Ultraviolet Lithography
- Place of Presentation
  Miami Florida・USA
- Year and Date
  2011-10-17
- Data Source
  KAKENHI-PROJECT-21760584
[Presentation] Dissolution Kinetics and Deprotection Reaction in Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation2011
- Author(s)
  Hiroki Yamamoto
- Organizer
  The 12th Pacific Polymer Conference
- Place of Presentation
  Jeju Korea
- Year and Date
  2011-11-14
- Data Source
  KAKENHI-PROJECT-21760584
[Presentation] EUV化学増幅レジストの現像解析2011
- Author(s)
  山本洋揮
- Organizer
  2011年秋季第72回応用物理学会学術講演会
- Place of Presentation
  山形市山形大学
- Year and Date
  2011-08-30
- Data Source
  KAKENHI-PROJECT-21760584
[Presentation] EUV化学増幅レジストの現像解析2011
- Author(s)
  山本洋揮
- Organizer
  International Conference of Photopolymer Sciecne and Technology
- Place of Presentation
  千葉大学(千葉市)
- Year and Date
  2011-06-24
- Data Source
  KAKENHI-PROJECT-21760584
[Presentation] ナノリソグラフィ用新規フラーレン誘導体に基づいたネガ型化学増幅型分子レジスト2010
- Author(s)
  山本洋揮
- Organizer
  第71回応用物理学会学術講演会
- Place of Presentation
  長崎大学文教キャンパス
- Year and Date
  2010-09-14
- Data Source
  KAKENHI-PROJECT-21760584
[Presentation] ナノリソグラフィ用新規フラーレン誘導体に基づいたネガ型化学増幅型分子レジスト2010
- Author(s)
  山本洋揮
- Organizer
  第71回応用物理学会学術講演会
- Place of Presentation
  長崎大学文教キャンパス(長崎市)
- Year and Date
  2010-09-14
- Data Source
  KAKENHI-PROJECT-21760584
[Presentation] 化学増幅型EUVレジストにおける脱保護反応2009
- Author(s)
  山本洋揮
- Organizer
  放射線化学討論会
- Place of Presentation
  福井工業大学(福井県)
- Year and Date
  2009-09-26
- Data Source
  KAKENHI-PROJECT-21760584
[Presentation] 化学増幅型EUVレジストにおける脱保護反応2009
- Author(s)
  山本洋揮
- Organizer
  第52回放射線化学討論会
- Place of Presentation
  福井工業大学福井大学(福井市)
- Year and Date
  2009-09-26
- Data Source
  KAKENHI-PROJECT-21760584
[Presentation] Study on Reactivity of Halogenated Resist Polymer with Low-Energy Electrons2008
- Author(s)
  H. Yamamoto, T. Kozawa, A. Saeki, S. Tagawa, T. Mimura, H. Yukawa, and J. Onodera
- Organizer
  21st International Microprocesses and Nanotechnology Conference
- Place of Presentation
  Fukuoka, Japan
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Acid generation mechanism in anion bound chemically amplified resists used for extreme-ultraviolet lithography
- Author(s)
  Y. Komuro, H. Yamamoto, K. Kobayashi, K. Ohomori, and T. Kozawa
- Organizer
  SPIE Advanced Lithography
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2015-02-22 – 2015-02-26
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa, K. Ohmori, M. Sato, H. Komano
- Organizer
  SPIE Advanced Microlithography
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2007-02-25 – 2007-03-02
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Effects of low-molecular weight resist components on dissolution behavior of chemically-amplified resists for extreme ultraviolet lithography studied by quartz crystal microbalance
- Author(s)
  M. Masaki, H. Yamamoto, and T. Kozawa
- Organizer
  SPIE Advanced Lithography
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2015-02-22 – 2015-02-26
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Fundamental Study on Dissolution Behavior of Chemically Amplified Resist for EUV Lithography
- Author(s)
  M. Mitsuyasu, H. Yamamoto and T. Kozawa
- Organizer
  Photomask Japan 2014
- Place of Presentation
  Yokohama, Kanagawa, Japan
- Year and Date
  2014-04-15 – 2014-04-16
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Difference between initial distributions of proton and counter anion in chemically amplified electron-beam resist
- Author(s)
  T. Kozawa, H. Yamamoto, A. Saeki and S. Tagawa
- Organizer
  31st Int. Symp. Microlithography
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2006-02-19 – 2006-02-24
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Study on Dissolution Behavior of Chemically Amplified Resists for Extreme Ultraviolet Lithography
- Author(s)
  M. Mitsuyasu, H. Yamamoto and T. Kozawa
- Organizer
  27th International Microprocesses and Nanotechnology Conference
- Place of Presentation
  Fukuoka, Japan
- Year and Date
  2014-11-04 – 2014-11-07
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] 環状オリゴマーに基づいた化学増幅型分子レジストのレジスト性能評価に関する研究
- Author(s)
  山本　洋揮
- Organizer
  第75回応用物理学会秋季学術講演会
- Place of Presentation
  北海道大学
- Year and Date
  2014-09-17 – 2014-09-20
- Data Source
  KAKENHI-PROJECT-26706027
[Presentation] Position Control of Metal Nano Particle by Self Assembly
- Author(s)
  山本　洋揮
- Organizer
  31st International Conference of Photopolymer Science and Technology (ICPST-31) 
- Place of Presentation
  千葉大学
- Year and Date
  2014-07-08 – 2014-07-11
- Data Source
  KAKENHI-PROJECT-24656447
[Presentation] Radiation-induced Synthesis of Metal Nanoparticles in Ethers THF and PGMEA
- Author(s)
  山本　洋揮
- Organizer
  The 5th Asia Pacific Symposium on Radiation Chemistry
- Place of Presentation
  東京大学
- Year and Date
  2014-09-08 – 2014-09-11
- Data Source
  KAKENHI-PROJECT-24656447
[Presentation] Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness
- Author(s)
  H. Yamamoto, T. Kozawa, A. Saeki, K. Okamoto, S. Tagawa, K. Ohmori, M. Sato, H. Komano
- Organizer
  Int. Microprocesses and Nanotechnology Conf.
- Place of Presentation
  Kamakura, Japan
- Year and Date
  2006-10-25 – 2006-10-27
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Radiation-induced Synthesis of Metal Nanoparticles in Ethers THF and PGMEA
- Author(s)
  山本　洋揮
- Organizer
  The 5th Asia Pacific Symposium on Radiation Chemistry
- Place of Presentation
  東京大学弥生講堂
- Year and Date
  2014-09-08 – 2014-09-11
- Data Source
  KAKENHI-PROJECT-26706027
[Presentation] Effect of Fluorine Atom on Acid Generation in Chemically Amplified EUV Resist
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa, H. Yukawa, M. Sato, J. Onodera
- Organizer
  Microprocess and Nanotechnology Conference
- Place of Presentation
  Kyoto, Japan
- Year and Date
  2007-11-05 – 2007-11-08
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Effect of Fluorine Atom on Acid Generation in Chemically Amplified EUV Resist
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa H. Yukawa, M. Sato, H. Komano
- Organizer
  2007 International EUVL Symposium
- Place of Presentation
  Sapporo, Japan
- Year and Date
  2007-10-28 – 2007-10-31
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] The reaction mechanism of poly[4-hydroxystyrene-co-4-(1, 1, 1, 3, 3, 3-hexafluoro-2- hydroxypropyl)-styrene]
- Author(s)
  H. Yamamoto, T. Kozawa, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
- Organizer
  31st Int. Symp. Microlithography
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2006-02-19 – 2006-02-24
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] High-aspect-ratio patterning by ClF3-Ar neutral cluster etching
- Author(s)
  山本　洋揮
- Organizer
  40th Micro nad Nano Engineering 2014
- Place of Presentation
  ローザンヌ　スイス
- Year and Date
  2014-09-22 – 2014-09-26
- Data Source
  KAKENHI-PROJECT-24656447

1. KOZAWA Takahiro (20251374)

# of Collaborated Projects: 4 results

# of Collaborated Products: 42 results
2. KOBAYASHI Kazuo (30116032)

# of Collaborated Projects: 2 results

# of Collaborated Products: 3 results
3. TAGAWA Seiichi (80011203)

# of Collaborated Projects: 1 results

# of Collaborated Products: 22 results
4. SEKI Shuhei (30273709)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
5. SAEKI Akinori (10362625)

# of Collaborated Projects: 1 results

# of Collaborated Products: 9 results
6. OKAMOTO Kazumasa (10437353)

# of Collaborated Projects: 1 results

# of Collaborated Products: 11 results
7. YANG Jinfeng (90362631)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
8. 室屋裕佐 (40334320)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
9. 濱田崇 (30600019)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
10. Belloni J.

# of Collaborated Projects: 1 results

# of Collaborated Products: 2 results
11. Robinson A. P. G.

# of Collaborated Projects: 1 results

# of Collaborated Products: 1 results

YAMAMOTO HIROKI 山本 洋揮

YAMAMOTO Hiroki 山本 洋揮

Research Projects

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Establishment of the Scientific Foundation for creation of fine fabrication materials and processes for single nanometer.Principal Investigator

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EUVリソグラフィ×自己組織化による分子サイズに迫る超極微細加工技術の創製Principal Investigator

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Creation of Metal Ultrafine Fabrication Materials and Processes for Realization of Direct LithographyPrincipal Investigator

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Development of fine wire for mass production to achieve the precision of less than 1 nmPrincipal Investigator

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Creation of Nanofabrication process for extreme quantum beam using organic-inorganice hybrid nanoparticlesPrincipal Investigator

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Study on nanochemistry in latest nanofabrication materials using quantum beams

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Creation and Control of Metal Nano-structure Using Combination of Top-down and Bottom up NanofabricationPrincipal Investigator

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Study on nanoscale chemical reactions and reaction sites using quantum beams

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Study on the expanse of thermalized electrons in condensed matters

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Educaiton and Control of Nano-topography Mechanism in Ultrafine FabricationPrincipal Investigator

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Femtosecond Pulse Radiolysis Study on Nanoscale Time Space Reaction Process

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[Journal Article] A study on the resist performance of inorganic-organic resist materials for EUV and electron-beam lithography2024

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[Journal Article] Competitive coexistence of ferromagnetism and metal insulator transition of VO2 nanoparticles2024

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YAMAMOTO HIROKI 山本洋揮

YAMAMOTO Hiroki 山本洋揮