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ITO Shigeru
伊藤 滋
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Alternative Names
伊藤 滋 イトウ シゲル
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Researcher Number
10120164
Other IDs
External Links
Affiliation (based on the past Project Information)
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2001: Tokyo University of Science, Industrial Chemistry, Professor, 理工学部, 教授
2000 – 2001: 東京理科大学, 理工学部・工業化学科, 教授
1999: 東京理科大学, 理工学部, 教授
1997 – 1998: 東京理科大学, 理工学部・工業化学科, 助教授
1993 – 1998: Science University of Tokyo, Associate Professor, 理工学部, 助教授
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1993 – 1995: 東京理科大学, 理工学部・工業化学科, 助教授
1991 – 1992: 東京理科大学, 理工学部, 講師
1989: 東京理科大学, 理工学部・工業化学科, 講師
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Review Section/Research Field
Principal Investigator
無機工業化学
/
無機工業化学
Except Principal Investigator
金属精錬・金属化学
/
Material processing/treatments
/
Metal making engineering
Keywords
Principal Investigator
MOCVD / BN-C / ナノコンポジット / トリメチルアミンボラン / カーボンアロイ / プラズマ / 高密度プラズマ / HIP / 磁気特性 / ITO
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/ β-フェライト / β″-フェライト / β-アルミナ / 超イオン伝導体 / 混合導電性 / 混合アルカリ効果 / 結晶構造解析 / 湿度センサ- / 薄膜 / プラズマCVD / マイクロ波プラズマ / 窒化 / アルミニウム / 窒素 / 窒化アルミニウム / 酸化イットリウム / 電解エッチング / 気相反応 / 線材 / 窒素ガス / 窒化反応 / Nitriding / Aluminum / Nitrogen / Aluminum Nitride / Yttrium Oxide / Etching / Vapor Phase Reaction / Wire / Fe_4N / 飽和磁化 / 酸素量 / 耐食性 / 非晶質 / 結晶質 / SiO_2 / 熱間等方圧プレス / 低温焼結 / FE_4N / saturation magnetization / corrosion resistance / oxygen content / amorphous / crystalline / silica / (Ni,Zn)Fe_2O_4 / 組成制御 / 微量添加 / Pb(Zr,Tz)O_3 / Pb(Zr,Ti)O_3 / (Ni,Zn)Fe2O4 / Magnetic Properties / Control of film composition / Doping / Pb(Zr,Ti)O3
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Except Principal Investigator
プラズマ / 高周波 / Nitriding / 水素 / 窒素 / ホウ素 / 窒化ホウ素 / 高周波プラズマ / マイクロ波プラズマ / シリコン基板 / 化学輸送法 / 石英管 / マイクロ波 / 化学輸送 / CVD / 立方晶 / Hydrogen / Nitrogen / Boron / Boron Nitride / Radio Frequency Plasma / Micro Wave Plasma / Silicon Substrate / Chemical Transport / ダイヤモンド / 燃焼炎 / 高周波誘導 / 核発生密度 / 堆積 / アセチレン / 燃焼 / ラマン分光 / 非晶質炭素 / 堆積速度 / 膜成長 / Diamond / Combustion Flame / Plasma / R.F.Induction / Nucleation Density / Deposition / Acetylene / 高密度プラズマ / 誘導結合 / 窒化 / 滲炭 / バイアス電圧 / 窒化鉄 / 窒化チタン / チタン / 鉄 / High Density Plasma / Inductive Coupling / Carburizing / Bias Voltage / Iron / Titanium / Iron Nitride / グロー放電プラズマ / 窒化アルミニウム / アルミニウム / 迅速合成 / バルク状 / 直接窒化 / 窒素グロー放電プラズマ / 繊維状物質 / 窒化率 / 水素プラズマ前処理 / 残留ガス分析 / 酸化皮膜除去 / Glow plasma / Aluminum nitride / Aluminum / Rapid preparation / Bulk
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Research Projects
(
11
results)
Co-Researchers
(
2
People)
Project Start Year (Newest)
Project Start Year (Oldest)
Development of novel MOCVD apparatus for the malti-component films and preparation of some functional turns
Principal Investigator
Principal Investigator
SHIGERU Lto
Project Period (FY)
2000 – 2001
Research Category
Grant-in-Aid for Scientific Research (C)
Research Field
無機工業化学
Research Institution
Tokyo University of Science
プラズマMOCVD法によるC-B-N系ナノコンポジット膜の作製
Principal Investigator
Principal Investigator
伊藤 滋
Project Period (FY)
1997
Research Category
Grant-in-Aid for Scientific Research on Priority Areas
Research Institution
Tokyo University of Science
プラズマMOCVD法によるBN-C系ナノコンポジット膜の作製
Principal Investigator
Principal Investigator
伊藤 滋
Project Period (FY)
1997 – 1998
Research Category
Grant-in-Aid for Scientific Research on Priority Areas (A)
Research Institution
Tokyo University of Science
プラズマMOCVD法によるBN-C系ナノコンポジット膜の作製
Principal Investigator
Principal Investigator
伊藤 滋
Project Period (FY)
1997 – 1999
Research Category
Grant-in-Aid for Scientific Research on Priority Areas (A)
Research Institution
Tokyo University of Science
Rapid Nitriding of Aluminum Using Nitrogen Glow Plasma
Principal Investigator
AKASHI Kazuo
Project Period (FY)
1997 – 1998
Research Category
Grant-in-Aid for Scientific Research (B)
Research Field
Metal making engineering
Research Institution
Science University of Tokyo
Preparation of new functional materials using low temperature densification by HIP
Principal Investigator
Principal Investigator
ITO Shigeru
Project Period (FY)
1996 – 1997
Research Category
Grant-in-Aid for Scientific Research (C)
Research Field
無機工業化学
Research Institution
Science University of Tokyo
The Effect of Bias Voltage Application to Metals to Promote Their Nitriding and Carburizing in High-Density Inductively Coupled Plasma
Principal Investigator
AKASHI Kazuo
Project Period (FY)
1994 – 1995
Research Category
Grant-in-Aid for General Scientific Research (C)
Research Field
Material processing/treatments
Research Institution
Science University of Tokyo
Preparation of Aluminum Nitride by Direct Nitriding of Large-Sized Aluminums
Principal Investigator
Principal Investigator
ITO Shigeru
Project Period (FY)
1993 – 1994
Research Category
Grant-in-Aid for General Scientific Research (C)
Research Field
無機工業化学
Research Institution
SCIENCE UNIVERSITY OF TOKYO
Rapid Growth of Diamond Film by Combustion Plasma Coupled Inductively with Radio Frequency Power
Principal Investigator
AKASHI Kazuo
Project Period (FY)
1992 – 1993
Research Category
Grant-in-Aid for Developmental Scientific Research (B)
Research Field
金属精錬・金属化学
Research Institution
Science University of Tokyo
Application of Chemical Transport Using Micro Wave Plasma to Deposition of Cubic Boron Nitride Film
Principal Investigator
AKASHI Kazuo
Project Period (FY)
1991 – 1992
Research Category
Grant-in-Aid for General Scientific Research (C)
Research Field
金属精錬・金属化学
Research Institution
Science University of Tokyo
各種β-およびβ″-フェライトの合成並びに物性とんの応用
Principal Investigator
Principal Investigator
伊藤 滋
Project Period (FY)
1989
Research Category
Grant-in-Aid for General Scientific Research (C)
Research Field
無機工業化学
Research Institution
Tokyo University of Science
# of Projects (Dsc)
# of Projects (Asc)
1.
AKASHI Kazuo
(00013095)
# of Collaborated Projects:
7 results
# of Collaborated Products:
0 results
2.
TAKASHI Fujii
(10318214)
# of Collaborated Projects:
1 results
# of Collaborated Products:
0 results
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