Kakiuchi Hiroaki 垣内弘章

… Alternative Names

KAKIUCHI Hiroaki 垣内弘章

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Researcher Number	10233660
Other IDs
External Links
Affiliation (Current)	2023: 大阪大学, 大学院工学研究科, 准教授
Affiliation (based on the past Project Information) *help	2016 – 2019: 大阪大学, 工学研究科, 准教授 2013 – 2015: 大阪大学, 工学(系)研究科(研究院), 准教授 2013 – 2014: 大阪大学, 大学院工学研究科, 准教授 2012: 大阪大学, 工学研究科, 准教授 2007 – 2012: 大阪大学, 大学院・工学研究科, 准教授 … More 2009 – 2010: Osaka University, 工学研究科, 准教授 2001 – 2004: Graduate School of Engineering, Osaka University, Associate Professor, 大学院・工学研究科, 助教授 1998 – 2001: Precision Science and Technology, Research Associate, 大学院・工学研究科, 助手 1995 – 1997: 大阪大学, 工学部, 助手 1992: Department of Presision Eng. Osak assistant, 工学部, 助手 Less
Review Section/Research Field	Principal Investigator 機械工作・生産工学 / Production engineering/Processing studies Except Principal Investigator 機械工作・生産工学 / Production engineering/Processing studies / Applied materials science/Crystal engineering / 金属材料(含表面処理・腐食防食) / Materials engineering and related fields
Keywords	Principal Investigator 大気圧プラズマ / 高圧力プラズマ / プラズマ計測 / 大気圧プラズマCVD / 多結晶シリコン / 超高速成膜 / 低温成膜 / 多結晶Si / 低温・高速成膜 / 電子・電気材料 … More / 薄膜トランジスタ / 微結晶シリコン / 酸化シリコン / 窒化シリコン / 太陽電池 / プラスチックフィルム / フレキシブルデバイス / 特殊加工 / 薄膜作製技術 / 薄膜デバイス … More Except Principal Investigator シリコン / エピタキシャル成長 / 大気圧プラズマ / 大気圧プラズマCVD / レーザー冷却 / laser cooling / プラズマ酸化 / 大気圧プラズマ酸化 / 表面パッシベーション / 太陽電池 / 単色原子ビーム / 原子光学 / monochromatic atomic beam / velocity spectrometer / nanostructure / atom lithography / atom optics / atom interferometer / 窒化物半導体 / AlN / レーザ / 紫外光 / PA-MBE / Al_xGa_<1-x>N / 半導体プロセス / エピタキシャル / 薄膜成長 / 機能材料 / 大気圧プラズマ窒化 / 全低温プロセス / ドーピング・エピ技術 / Al_2O_3 / 界面準位 / 表面再結合 / 超薄型Si結晶太陽電池 / 多結晶Si / 高速成膜 / ポーラスSi / 水素還元 / 二酸化ケイ素 / プラズマエッチング / 高圧力プラズマ / SiO2 / 珪砂 / 太陽電池級Si / 半導体レーザ / 位相制御エピタキシー / 歪み量子井戸 / フォトルミネッセンス / 半導体レ-ザ / 位相制御エピタキシ- / semiconductor laser / phase locked epitaxy / strained quantum well / photoluminescence / Si薄膜 / 多結晶 / 低温成膜 / 高周波スパッタ蒸着法 / 多結晶Si薄膜 / low temperature growth / polycrystalline silicon film / RF sputtering method / atomic hydrogen radicals / 無転位単結晶Si / Siシート / 液相成長 / 無転移単結晶Si / dislocation-free single crystal Si / Si sheet / liquid phase crystal growth / 異方性ドライエッチング / NF_3プラズマ / 中性Fラジカルビーム / レーザーコリメーション / 準安定寿命 / ECRプラズマ / 誘導放射圧 / 半導体ドライエッチング / Fラジカルビーム / ECRラジカル源 / フッ素ラジカル / anisotropic dry etching / NFィイD23ィエD2 plasma / neutral F radical beam / laser collimation / metastable lifetime / ECR plasma / stimulated light force / 原子ビーム速度分光装置 / 高磁気勾配磁気回路 / ナノ構造 / アトムリソグラフィー / 原子干渉計 / ナノストラクチャー / 単一速度原子ビーム / magnetic quadrupole lens / 原子干渉磁気回路 / 原子波干渉 / 中性原子ビーム / 中性原子速度分光 / 速度圧縮 / magnetic quadruple lens / アモルファスSiC / 超高速成膜 / Atmospheric pressure plasma CVD / Amorphous SiC / High-rate deposition / InNナノ構造 / 電子密度 / 電子温度 / 電磁場シミュレーション / インピーダンス整合 / 窒素プラズマ / 窒素ラジカル / 窒化物ナノ構造 Less

Formation of Nitride Nanostructures by Reaction of High Density N Radicals with Metals
- Principal Investigator
  
  Yasutake Kiyoshi
- Project Period (FY)
  2017 – 2019
- Research Category
  
  Grant-in-Aid for Challenging Research (Exploratory)
- Research Field
  
  Materials engineering and related fields
- Research Institution
  Osaka University
Development of highly efficient formation process of thin film devices based on atmospheric-pressure plasma sciencePrincipal Investigator
- Principal Investigator
  
  Kakiuchi Hiroaki
- Project Period (FY)
  2014 – 2018
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
Formation process of solar grade silicon by atomic hydrogen reduction of quartz sand
- Principal Investigator
  
  YASUTAKE Kiyoshi
- Project Period (FY)
  2012 – 2014
- Research Category
  
  Grant-in-Aid for Challenging Exploratory Research
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
Atmospheric-pressure plasma processes for high-rate film formation applicable for thin crystalline Si solar cells
- Principal Investigator
  
  KIYOSHI Yasutake
- Project Period (FY)
  2010 – 2013
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
大気圧プラズマを用いた機能性界面創生によるSi表面パッシベーション技術の開発
- Principal Investigator
  
  安武潔
- Project Period (FY)
  2009 – 2010
- Research Category
  
  Grant-in-Aid for Challenging Exploratory Research
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
Development of highly efficient fabrication process of thin film devices on plastic materials using atmospheric-pressure plasmaPrincipal Investigator
- Principal Investigator
  
  KAKIUCHI Hiroaki
- Project Period (FY)
  2008 – 2012
- Research Category
  
  Grant-in-Aid for Young Scientists (S)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
Development and application of totally low-temperature semiconductor process using atmospheric-pressure plasma
- Principal Investigator
  
  YASUTAKE Kiyoshi
- Project Period (FY)
  2007 – 2009
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
窒化物半導体による紫外光(UV)レーザへの発展
- Principal Investigator
  
  YOSHII Kumayasu
- Project Period (FY)
  2002 – 2004
- Research Category
  
  Grant-in-Aid for Exploratory Research
- Research Field
  
  Applied materials science/Crystal engineering
- Research Institution
  Osaka University
任意材料基板上への結晶シリコンの低温・高速成膜に関する研究Principal Investigator
- Principal Investigator
  
  垣内弘章
- Project Period (FY)
  2001 – 2002
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  機械工作・生産工学
- Research Institution
  Osaka University
Extremely High-Rate Deposition of High-Quality Amorphous Silicon Carbide Films
- Principal Investigator
  
  YOSII Kumayasu
- Project Period (FY)
  2001 – 2003
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  機械工作・生産工学
- Research Institution
  Osaka University
Formation of Monochromatic Atomic Beam for Atom interferometer
- Principal Investigator
  
  YASUTAKE Kiyoshi
- Project Period (FY)
  1999 – 2001
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  機械工作・生産工学
- Research Institution
  Osaka University
Formation of Monochromatic Atomic Beam for Nanolithography
- Principal Investigator
  
  YOSHII Kumayasu
- Project Period (FY)
  1998 – 2000
- Research Category
  
  Grant-in-Aid for Scientific Research (B).
- Research Field
  
  機械工作・生産工学
- Research Institution
  Osaka University
Development of Anisotropic Dry Etching Process Using Laser Cooling Method
- Principal Investigator
  
  YASUTAKE Kiyoshi
- Project Period (FY)
  1997 – 1999
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  機械工作・生産工学
- Research Institution
  Osaka University
Growth of Dislocation-Free Single Crystal Silicon Sheet
- Principal Investigator
  
  YASUTAKE Kiyoshi
- Project Period (FY)
  1996 – 1998
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  機械工作・生産工学
- Research Institution
  Osaka University
LIF法による高圧力プラズマプロセスの計測Principal Investigator
- Principal Investigator
  
  垣内弘章
- Project Period (FY)
  1995
- Research Category
  
  Grant-in-Aid for Encouragement of Young Scientists (A)
- Research Field
  
  機械工作・生産工学
- Research Institution
  Osaka University
Low temperature growth of polycrystalline semiconductor and diamond films
- Principal Investigator
  
  YOSHII Kumayasu
- Project Period (FY)
  1995 – 1996
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  機械工作・生産工学
- Research Institution
  Osaka University
Development of InGaAs/GaAs strained single quantum well laser by phase looked epitaxy method.
- Principal Investigator
  
  YOSHII Kumayasu
- Project Period (FY)
  1991 – 1992
- Research Category
  
  Grant-in-Aid for General Scientific Research (B)
- Research Field
  
  金属材料(含表面処理・腐食防食)
- Research Institution
  Osaka University

[Book] 大気圧プラズマ CVD による Si 高速成膜と太陽電池への応用, OPTRONICS 2012 No. 62012
- Author(s)
  垣内弘章, 大参宏昌, 安武潔
- Data Source
  KAKENHI-PROJECT-20676003
[Book] 改訂版「大気圧プラズマの生成制御と応用技術」第5章第1節"大気圧プラズマCVDによるシリコン薄膜の形成"(監修小駒益弘)2012
- Author(s)
  安武潔, 垣内弘章, 大参宏昌
- Publisher
  サイエンス&テクノロジー
- Data Source
  KAKENHI-PROJECT-22246017
[Book] 大気圧プラズマの生成制御と応用技術(監修小駒益弘),大気圧プラズマCVD によるシリコン薄膜の形成2012
- Author(s)
  安武潔,垣内弘章,大参宏昌
- Publisher
  サイエンス & テクノロジー, 改訂版
- Data Source
  KAKENHI-PROJECT-22246017
[Book] 薄膜Si太陽電池開発に向けたプラズマCVD技術,「大気圧プラズマの技術とプロセス開発」,第II編,第2章(沖野晃俊監修)2011
- Author(s)
  垣内弘章, 大参宏昌, 安武潔
- Publisher
  シーエムシー出版
- Data Source
  KAKENHI-PROJECT-20676003
[Book] in Generation and Applications of Atmospheric Pressure Plasmas (eds. M. Kogoma et al.), Preparation of Si-based thin films using atmospheric pressure plasma chemical vapor deposition2011
- Author(s)
  K. Yasutake, H. Kakiuchi and H. Ohmi
- Publisher
  Nova Science Publishers
- Data Source
  KAKENHI-PROJECT-22246017
[Book] 薄膜Si 太陽電池開発に向けたプラズマ CVD技術, 「大気圧プラズマの技術とプロセス開発」2011
- Author(s)
  垣内弘章, 大参宏昌, 安武潔
- Publisher
  シーエムシー出版
- Data Source
  KAKENHI-PROJECT-20676003
[Book] "Preparation of Si-based thin films using atmospheric pressure plasma chemical vapour deposition" in Generation and Applications of Atmospheric Pressure Plasmas Eds : M.Kogoma, M.Kusano, Y.Kusano2011
- Author(s)
  Kiyoshi Yasutake, Hiroaki Kakiuchi, Hiromasa Ohmi
- Total Pages
  22
- Publisher
  Nova Science Publishers, Inc.
- Data Source
  KAKENHI-PROJECT-22246017
[Book] ケミカルエンジニヤリング 55[12]2010
- Author(s)
  垣内弘章, 大参宏昌, 安武潔
- Publisher
  (株)化学工業社
- Data Source
  KAKENHI-PROJECT-20676003
[Book] 大気圧プラズマを用いた低温・高速成膜技術2010
- Author(s)
  垣内弘章, 大参宏昌, 安武潔
- Publisher
  ケミカルエンジニヤリング
- Data Source
  KAKENHI-PROJECT-20676003
[Book] 第21回プラズマエレクトロニクス講習会「プラズマプロセスの基礎から応用最前線～実践的プラズマ制御技術～先進デバイスから環境基盤技術を中心に～テキスト2010
- Author(s)
  垣内弘章
- Publisher
  (社)応用物理学会
- Data Source
  KAKENHI-PROJECT-20676003
[Book] 新コーティングのすべて(フィルムコーティングのための大気圧・超高周波プラズマ技術)2009
- Author(s)
  垣内弘章, 大参宏昌, 安武潔
- Total Pages
  639
- Publisher
  (株)加工技術研究会
- Data Source
  KAKENHI-PROJECT-20676003
[Book] 大気圧・超高周波プラズマを用いた微結晶 Siの低温・高速成膜, 表面技術, 60[6]2009
- Author(s)
  垣内弘章, 大参宏昌, 安武潔
- Data Source
  KAKENHI-PROJECT-20676003
[Book] シリコン系 CVD,「大気圧プラズマ基礎と応用」(日本学術振興会プラズマ材料科学第153 委員会編, 2009), 第6 章, 6.7.3 [2]2009
- Author(s)
  安武潔, 垣内弘章, 大参宏昌
- Data Source
  KAKENHI-PROJECT-20676003
[Book] 大気圧プラズマ CVD 法(フィルムコーティングのための大気圧・超高周波プラズマ技術), 「新コーティングのすべて」(加工技術研究会編, 2009)第2 章, 2.2 (1)2009
- Author(s)
  垣内弘章, 大参宏昌, 安武潔
- Data Source
  KAKENHI-PROJECT-20676003
[Book] 新コーティングのすべて,第2章,2.2(1),pp. 294-298(フィルムコーティングのための大気圧・超高周波プラズマ技術)2009
- Author(s)
  垣内弘章, 大参宏昌, 安武潔
- Total Pages
  639
- Publisher
  (株)加工技術研究会
- Data Source
  KAKENHI-PROJECT-20676003
[Book] 表面技術Vo1.60,pp.9-132009
- Author(s)
  垣内弘章, 大参宏昌, 安武潔
- Total Pages
  56
- Publisher
  (社)表面技術協会
- Data Source
  KAKENHI-PROJECT-20676003
[Book] 「大気圧プラズマ基礎と応用」第6章,6.7.3(2),シリコン系CVD2009
- Author(s)
  安武潔, 垣内弘章, 大参宏昌
- Total Pages
  5
- Publisher
  オーム社
- Data Source
  KAKENHI-PROJECT-19206018
[Book] 大気圧プラズマ基礎と応用(日本学術振興会プラズマ材料科学第153委員会編)2009
- Author(s)
  安武潔, 垣内弘章, 大参宏昌, 他
- Publisher
  オーム社
- Data Source
  KAKENHI-PROJECT-19206018
[Book] 新コーティングのすべて」第2章,2.2(1),大気圧プラズマCVD法-フィルムコーティングのための大気圧・超高周波プラズマ技術-2009
- Author(s)
  垣内弘章, 大参宏昌, 安武潔
- Total Pages
  5
- Publisher
  加工技術研究会
- Data Source
  KAKENHI-PROJECT-19206018
[Book] 大気圧プラズマ基礎と応用,第6章,6.7.3[2],pp.334-3382009
- Author(s)
  安武潔, 垣内弘章, 大参宏昌
- Total Pages
  404
- Publisher
  (株)オーム社(日本学術振興会プラズマ材料科学第153委員会編)
- Data Source
  KAKENHI-PROJECT-20676003
[Book] 大気圧プラズマ CVD, 「フィルムベースエレクトロニクスの最新要素技術」, 中山弘, 中山正昭, 小川倉一監修2008
- Author(s)
  垣内弘章, 大参宏昌, 安武潔
- Publisher
  シーエムシー出版
- Data Source
  KAKENHI-PROJECT-20676003
[Book] フイルムベースエレクトロニクスの最新要素技術(第4.3節, )2008
- Author(s)
  垣内弘章, 大参宏昌, 安武潔
- Publisher
  シーェムシー出版
- Data Source
  KAKENHI-PROJECT-20676003
[Book] "High-Rate and Low-Temperature Film Growth Technology Using Stable Glow Plasma at Atmospheric Pressure"in Trends in Thin Solid Films Research(ed. A. R. Jost)2007
- Author(s)
  H. Kakiuchi, H. Ohmi, K. Yasutake
- Total Pages
  50
- Publisher
  Nova Science, New York
- Data Source
  KAKENHI-PROJECT-19206018
[Book] NY, Trends in Thin Solid Films Research (ed. A. R. Jost), High-rate and low-temperature film growth technology using stable glow plasma at atmospheric pressure2007
- Author(s)
  H. Kakiuchi, H. Ohmi, K. Yasutake, et. al.
- Publisher
  Nova Science
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] Controllability of structural and electrical properties of silicon films grown in atmospheric-pressure very high-frequency plasma2018
- Author(s)
  H. Kakiuchi, H. Ohmi, and K. Yasutake
- Journal Title
  
  J. Phys. D: Appl. Phys.
  
  Volume: 51
- DOI
  10.1088/1361-6463/aad47c
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-26249010
[Journal Article] Determination of plasma impedance of microwave plasma system by electric field simulation2017
- Author(s)
  M. Shuto, H. Ohmi, H. Kakiuchi, T. Yamada, and K. Yasutake
- Journal Title
  
  J. Appl. Phys.
  
  Volume: 122 Pages: 0433031-8
- DOI
  10.1063/1.4993902
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-26249010
[Journal Article] Atmospheric Pressure Plasmas: Low-Temperature Processes2016
- Author(s)
  H. Kakiuchi, H. Ohmi, and K. Yasutake
- Journal Title
  
  Encyclopedia of Plasma Technology
  
  Volume: 1 Pages: 82-91
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-26249010
[Journal Article] Characterization of Si and SiOx films deposited in very high-frequency excited atmospheric-pressure plasma and their application to bottom-gate thin film transistors2015
- Author(s)
  H. Kakiuchi, H. Ohmi, T. Yamada, S. Tamaki, T. Sakaguchi, W. Lin, and K. Yasutake
- Journal Title
  
  Phys. Stat. Sol. (a)
  
  Volume: 212
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-26249010
[Journal Article] Characterization of Si and SiOx films deposited in very high-frequency excited atmospheric-pressure plasma and their application to bottom-gate thin film transistors2015
- Author(s)
  H. Kakiuchi, H. Ohmi, T. Yamada, S. Tamaki, T. Sakaguchi, W. Lin, and K. Yasutake
- Journal Title
  
  Phys. Status Solidi A
  
  Volume: 212 Pages: 1571-1577
- DOI
  10.1002/pssa.201532328
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-26249010
[Journal Article] Atmospheric-pressure low-temperature plasma processes for thin film deposition2014
- Author(s)
  H. Kakiuchi, H. Ohmi and K. Yasutake
- Journal Title
  
  J. Vac. Sci. Technol. A
  
  Volume: vol.32 (published online 31 October 2013)
- DOI
  10.1116/1.4828369
- Data Source
  KAKENHI-PROJECT-22246017
[Journal Article] Interface properties of SiOxNy layer on Si prepared by atmospheric-pressure plasma oxidationnitridation2013
- Author(s)
  Z. Zhuo, Y. Sannomiya, Y. Kanetani, T. Yamada, H. Ohmi, H. Kakiuchi and K. Yasutake
- Journal Title
  
  Nanoscale Research Letters
  
  Volume: 8 Pages: 201-201
- DOI
  10.1186/1556-276x-8-201
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246017
[Journal Article] Deposition of Functional Membranes by Through-Substrate Surface Discharge2013
- Author(s)
  H. Kobayashi, H. Kakiuchi, K. Yasutake, T. Suzuki, M. Noborisaka, N. Negishi
- Journal Title
  
  J. Phys. : Conference Series
  
  Volume: (印刷中)
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] Voltage distribution over capacitively coupled plasma electrode for atmosphericpressure plasma generation2013
- Author(s)
  M. Shuto, F. Tomino, H. Ohmi, H. Kakiuchi and K. Yasutake
- Journal Title
  
  Nanoscale Research Letters
  
  Volume: 8 Pages: 202-202
- DOI
  10.1186/1556-276x-8-202
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246017
[Journal Article] Study on the Growth of Microcrystalline Silicon Films in Atmospheric-Pressure VHF Plasma Using Porous Carbon Electrode2013
- Author(s)
  H. Kakiuchi, H. Ohmi, T. Yamada, A. Hirano, T. Tsushima, K. Yasutake
- Journal Title
  
  J. Phys. : Conference Series
  
  Volume: (印刷中)
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] High-Rate HMDSO-Based Coatings in Open Air Using Atmospheric-Pressure Plasma Jet2012
- Author(s)
  H. Kakiuchi, K. Higashida, T. Shibata, H. Ohmi, T. Yamada, and K. Yasutake
- Journal Title
  
  J. Non-Cryst. Solids
  
  Volume: 358 Pages: 2462-2465
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] Silicon Oxide Coatings with Very High Rates (>10nm/s) by Hexamethildisiloxane-Oxygen Fed Atmospheric-Pressure VHF Plasma : Film-Forming Behavior Using Cylindrical Rotary Electrode2012
- Author(s)
  H.Kakiuchi, H.Ohmi, T.Yamada, K.Yokoyama, K.Okamura, K.Yasutake
- Journal Title
  
  Plasma Chem. Plasma Process
  
  Volume: (印刷中) Pages: 533-545
- DOI
  10.1007/s11090-012-9363-2
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] Formation of SiO2/Si structure with low interface state density by atmospheric-pressure VHF plasma oxidation2012
- Author(s)
  Z. Zhuo, Y. Sannomiya, K. Goto, T. Yamada, H. Ohmi, H. Kakiuchi and K. Yasutake
- Journal Title
  
  Current Appl. Phys
  
  Volume: vol.12
- DOI
  10.1016/j.cap.2012.04.015
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246017
[Journal Article] Silicon Oxide Coatings with Very High Rates (>10 nm/s) by Hexamethyldisiloxane-Oxygen Fed Atmospheric-Pressure VHF Plasma: Film-Forming Behavior Using Cylindrical Rotary Electrode2012
- Author(s)
  H. Kakiuchi, H. Ohmi, T. Yamada, K. Yokoyama, K. Okamura, and K. Yasutake
- Journal Title
  
  Plasma Chem. Plasma Process
  
  Volume: 32 Pages: 533-545
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] High-Rate HMDSO-Based Coatings in Open Air Using Atmospheric- Pressure Plasma Jet2012
- Author(s)
  H.Kakiuchi, K.Higashida, T.Shibata, H.Ohmi, T.Yamada, K.Yasutake
- Journal Title
  
  J. Non-Cryst. Solids
  
  Volume: (印刷中) Pages: 2462-2465
- DOI
  10.1016/j.jnoncrysol.2011.12.081
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] Room-Temperature Formation of Low Refractive Index Silicon Oxide Films Using Atmospheric-Pressure Plasma2011
- Author(s)
  K.Nakamura, Y.Yamaguchi, K.Yokoyama, K.Higashida, H.Ohmi, H.Kakiuchi, K.Yasutake
- Journal Title
  
  J.Nanosci.Nanotechnol.
  
  Volume: (印刷中)
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] An atomically controlled Si film formation process at low temperatures using atmospheric-pressure VHF plasma2011
- Author(s)
  K.Yasutake, H.Kakiuchi, H.Ohmi, K.Inagaki, Y.Oshikane, M.Nakano
- Journal Title
  
  J.Phys. : Condens. Matter
  
  Volume: 23 Pages: 1-22
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246017
[Journal Article] An atomically controlled Si film formation process at low temperatures using atmospheric-pressure VHF plasma2011
- Author(s)
  K. Yasutake, H. Kakiuchi, H. Ohmi, K. Inagaki, Y. Oshikane and M. Nakano
- Journal Title
  
  Journal of Physics-Condensed Matter
  
  Volume: vol.23 Pages: 1-22
- DOI
  10.1088/0953-8984/23/39/394205
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246017, KAKENHI-PROJECT-22560110
[Journal Article] Low refractive index silicon oxide coatings at room temperature using atmospheric-pressure very high-frequency plasma2010
- Author(s)
  H.Kakiuchi, H.Ohmi, Y.Yamaguchi, K.Nakamura, K.Yasutake
- Journal Title
  
  Thin Solid Films
  
  Volume: 519 Pages: 258-262
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] Low refractive index silicon oxide coatings at room temperature using atmospheric-pressure very high-frequency plasma2010
- Author(s)
  H.Kakiuchi, H.Ohmi, Y.Yamaguchi, K.Nakamura, K.Yasutake
- Journal Title
  
  Thin Solid Films 519
  
  Pages: 258-262
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] Room-Temperature Silicon Nitrides Prepared with Very High Rates (>50 nm/s) in Atmospheric-Pressure Very High-Frequency Plasma2010
- Author(s)
  H.Kakiuchi, H.Ohmi, K.Nakamura, Y.Yamaguchi, K.Yasutake
- Journal Title
  
  Plasma Chem.Plasma Process.
  
  Volume: 30 Pages: 579-590
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] Low refractive index silicon oxide coatings at room temperature using atmospheric- pressure very high- frequency plasma2010
- Author(s)
  H. Kakiuchi, H. Ohmi, Y. Yamaguchi, K. Nakamura, and K. Yasutake
- Journal Title
  
  Thin Solid Films
  
  Volume: 519 Pages: 258-262
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] Room-Temperature Silicon Nitrides Prepared with Very High Rates (>50 nm/s) in Atmospheric-Pressure Very High-Frequency Plasma2010
- Author(s)
  H.Kakiuchi, H.Ohmi, K.Nakamura, Y.Yamaguchi, K.Yasutake
- Journal Title
  
  Plasma Chem.Plasma Process. 30
  
  Pages: 579-590
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] Room-Temperature Silicon Nitrides Prepared with Very High Rates (>50 nm/s) in Atmospheric-Pressure Very High- Frequency Plasma2010
- Author(s)
  H. Kakiuchi, H. Ohmi, K. Nakamura, Y. Yamaguchi, and K. Yasutake
- Journal Title
  
  Plasma Chem. Plasma Process
  
  Volume: 30 Pages: 579-590
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] Microcrystalline Si films grown at low temperatures (90-220℃) with high rates in atmospheric-pressure VHF plasma2009
- Author(s)
  H.Kakiuchi, H.Ohmi, K.Ouchi, K.Tabuchi, K.Yasutake
- Journal Title
  
  Journal of Applied Physics 106
  
  Pages: 0135211-6
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] In Situ Doped Si Selective Epitaxial Growth at Low Temperatures by Atmospheric Pressure Plasma CVD2009
- Author(s)
  T.Ohnishi, Y.Kirihata, H.Ohmi, H.Kakiuchi, K.Yasutake
- Journal Title
  
  ECS Trans. 25
  
  Pages: 309-315
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] Characterization of high-rate deposited microcrystalline Si films preparedusing atmospheric-pressure very high-frequency plasma2009
- Author(s)
  K.Tabuchi, K.Ouchi, H.Ohmi, H.Kakiuchi, K.Yasutake
- Journal Title
  
  ECS Transactions 25[8]
  
  Pages: 405-412
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] n situ doped Si selective epitaxial growth at low temperatures by atmospheric pressure plasma CVD2009
- Author(s)
  T. Ohnishi, Y. Kirihata, H. Ohmi, H. Kakiuchi, K. Yasutake
- Journal Title
  
  ECS Trans. vol.25
  
  Pages: 309-315
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] Microcrystalline Si films grown at low temperatures (90-220℃) with high rates in atmospheric-pressure VHF plasma2009
- Author(s)
  H.Kakiuchi, H.Ohmi, K.Ouchi, K.Tabuchi, K.Yasutake
- Journal Title
  
  J.Appl.Phys. 106
  
  Pages: 0135211-6
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] Microcrystalline Si films grown at low temperatures (90-220 ℃) with high rates in atmospheric-pressure VHF plasma2009
- Author(s)
  H. Kakiuchi, H. Ohmi, K. Ouchi, K. Tabuchi, and K. Yasutake
- Journal Title
  
  J. Appl. Phys
  
  Volume: 106 Pages: 0135211-6
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] In situ B-doped Si epitaxial growth at low temperatures by atmospheric-pressure plasma CVD2008
- Author(s)
  Y. Kirihata, T. Nomura, H. Ohmi, H. Kakiuchi, K. Yasutake
- Journal Title
  
  Surf. Interface Anal 40
  
  Pages: 984-987
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] Enhancement of film-forming reactions for microcrystalline Sigrowth in atmospheric-pressure plasma using porous carbonelectrode2008
- Author(s)
  H. Kakiuchi, H. Ohmi, R. Inudzuka, K. Ouchi, K. Yasutake
- Journal Title
  
  Journal of Appllied Physics 104
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] n situ B-doped Si epitaxial growth at low temperatures by atmospheric-pressure plasma CVD2008
- Author(s)
  Y. Kirihata, T. Nomura, H. Ohmi, H. Kakiuchi, K. Yasutake
- Journal Title
  
  Surf. Interface Anal. vol.40
  
  Pages: 984-987
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] High-quality epitaxial Si growth at low temperatures by atmospheric pressure plasma CVD2008
- Author(s)
  K. Yasutake, H. Ohmi, Y. Kirihata, H. Kakiuchi
- Journal Title
  
  Thin Solid Films vol.517
  
  Pages: 242-244
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] In situ B-doped Si epitaxial growth at low temperatures by atmospheric-pressure plasma CVD2008
- Author(s)
  Y. Kirihata, T. Nomura, H. Ohmi, H. Kakiuchia and K. Yasutakea
- Journal Title
  
  Surf. Interface Anal. 40(in press)
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] SiO_2 Formation by Oxidation of Crystalline and Hydrogenated Amorphous Si in Atmospheric Pressure Plasma Excited by Very High Frequency Power2008
- Author(s)
  H. Kakiuchi, H. Ohmi, M. Harada, H. Watanabe, K. Yasutake
- Journal Title
  
  Jpn. J. Appl. Phys 47
  
  Pages: 1884-1888
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] High-quality epitaxial Si growth at low temperatures by atmospheric pressure plasma CVD2008
- Author(s)
  K. Yasutake, H. Ohmi, Y. Kirihata, H. Kakiuchi
- Journal Title
  
  Thin Solid Films 517
  
  Pages: 242-244
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] Enhancement of film-forming reactions for microcrystalline Si growth in atmospheric-pressure plasma using porous carbon electrode2008
- Author(s)
  H. Kakiuchi, H. Ohmi, R. Inudzuka, K. Ouchi, and K. Yasutake
- Journal Title
  
  J. Appl. Phys
  
  Volume: 104 Pages: 0535221-8
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] 大気圧プラズマCVD法によるSiの低温・高速エピタキシャル成長2007
- Author(s)
  安武潔, 大参宏昌, 垣内弘章
- Journal Title
  
  応用物理 75
  
  Pages: 1031-1036
- NAID
  10019855405
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] 大気圧プラズマCVD法によるSiの低温・高速エピタキシャル成長2007
- Author(s)
  安武潔, 大参宏昌, 垣内弘章
- Journal Title
  
  応用物理 vol.75
  
  Pages: 1031-1036
- NAID
  10019855405
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] Investigation of structural properties of high-rate deposited SiN_X films prepared at low temperatures (100-300℃) by atmospheric-pressure plasma CVD
- Author(s)
  Y.Yamaguchi, K.Nakamura, H.Ohmi, H.Kakiuchi, K.Yasutake
- Journal Title
  
  Physica Status Solidi C (DOI 10.1002/pssc.200982693)
  
  Pages: 2010-2010
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] Study on the Growth of Microcrystalline Silicon Films in Atmospheric-Pressure VHF Plasma Using Porous Carbon Electrode
- Author(s)
  H. Kakiuchi, H. Ohmi, T. Yamada, A. Hirano, T. Tsushima, and K. Yasutake
- Journal Title
  
  J. Phys.: Conference Series
- Data Source
  KAKENHI-PROJECT-20676003
[Journal Article] Characterization of microcrystalline Si films deposited at low temperatures with high rates by atmospheric-pressure plasma CVD
- Author(s)
  K.Ouchi, K.Tabuchi, H.Ohmi, H.Kakiuchi, K.Yasutake
- Journal Title
  
  Physica Status Solidi C (DOI 10.1002/pssc.200982805)
  
  Pages: 2010-2010
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20676003
[Patent] 成膜装置2010
- Inventor(s)
  柴田哲司,平井孝彦,垣内弘章,安武潔
- Industrial Property Rights Holder
  パナソニック株式会社
- Industrial Property Number
  2010-070769
- Filing Date
  2010-03-25
- Data Source
  KAKENHI-PROJECT-20676003
[Patent] 成膜装置2010
- Inventor(s)
  柴田哲司, 平井孝彦, 垣内弘章, 安武潔
- Industrial Property Rights Holder
  パナソニック電工(株)
- Industrial Property Number
  2010-070769
- Filing Date
  2010-03-25
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 電磁場シミュレーションを用いた大気圧プラズマパラメータの解析―不均一密度モデルによる解析―2020
- Author(s)
  新田健，吉田和史，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  2020年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] 大気圧プラズマCVDを用いたSiOx機能性コーティング技術の開発2019
- Author(s)
  前川将哉，山崎啓史，大参宏昌，垣内弘章，安武潔
- Organizer
  2019年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧プラズマCVDによるプラスチックフィルム上へのSi成膜とその特性評価2019
- Author(s)
  縄田慈人，前川健史，垣内弘章，大参宏昌，安武潔
- Organizer
  2019年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 電磁場シミュレーションを用いた大気圧プラズマパラメータの解析－シース厚さを含めた高精度解析－2019
- Author(s)
  吉田和史，新田健，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  2019年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] 電磁場シミュレーションによるシースを考慮したプラズマパラメータ解析2019
- Author(s)
  吉田和史，新田健，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会2019年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] 電磁場シミュレーションを用いた大気圧プラズマパラメータの解析2018
- Author(s)
  吉田和史，田中恭輔，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  2018年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] 大気圧プラズマCVDによるSiOxゲート絶縁膜の低温・高能率形成プロセスの研究2018
- Author(s)
  木元雄一朗，寺脇功士，山崎啓史，前川健史，大参宏昌，垣内弘章，安武潔
- Organizer
  第65回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧プラズマ装置の電磁場シミュレーションとプラズマパラメータ解析―酸化プラズマパラメータと酸化膜特性の関係―2018
- Author(s)
  田中恭輔，吉田和史，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  2018年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] 大気圧プラズマCVDにより形成した微結晶Siの高品質化の検討2018
- Author(s)
  前川健史，縄田慈人，垣内弘章，大参宏昌，安武潔
- Organizer
  2018年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧下におけるプラズマ生成と薄膜作製プロセスへの応用2018
- Author(s)
  垣内弘章，大参宏昌，安武潔
- Organizer
  2018年度精密工学会秋季大会学術講演会
- Invited
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] SiOx薄膜のTFTゲート絶縁膜への応用と機能性コーティングプロセスの研究2018
- Author(s)
  山崎啓史，前川将哉，大参宏昌，垣内弘章，安武潔
- Organizer
  2018年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧プラズマCVDによるPENフィルム上へのSiOx薄膜形成とその評価2018
- Author(s)
  前川将哉，山崎啓史，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会 2018年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧プラズマ装置の電磁場シミュレーションとプラズマパラメータ解析－ヘリウム及びヘリウム酸素混合プラズマの内部パラメータ比較－2018
- Author(s)
  田中恭輔，吉田和史，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会 2018年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧プラズマCVDにより形成したSi薄膜の構造・電気的特性と成膜パラメータの相関2018
- Author(s)
  縄田慈人，前川健史，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会 2018年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] フレキシブルデバイスへの応用を目指した大気圧プラズマCVDによるSiOxゲート絶縁膜形成プロセスの研究2018
- Author(s)
  山崎啓史，木元雄一朗，寺脇功士，前川健史，大参宏昌，垣内弘章，安武潔
- Organizer
  2018年度精密工学会春季大会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧プラズマ装置の電磁場シミュレーションとプラズマパラメータ解析　―ヘリウム及びヘリウム酸素混合プラズマの内部パラメータ比較―2018
- Author(s)
  田中恭輔，吉田和史，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会2018年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] 大気圧プラズマ装置の電磁場シミュレーションとプラズマパラメータ解析－酸化パラメータと酸化膜特性の関係－2017
- Author(s)
  田中恭輔，吉田和史，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  2018年度精密工学会春季大会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧プラズマCVDによるSi低温成膜プロセスにおける投入電力のパルス変調の効果2017
- Author(s)
  前川健史，寺脇功士，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会2017年度関西支部定期学術講演会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] Structural and electrical characterization of silicon and silicon oxide films prepared in atmospheric-pressure very high-frequency plasma at low temperatures2017
- Author(s)
  H. Kakiuchi, H. Ohmi, and K. Yasutake
- Organizer
  The 21st International Colloquium on Plasma Process
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧プラズマ装置の電磁場シミュレーションとプラズマパラメータ解析2017
- Author(s)
  田中恭輔，吉田和史，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  2017年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] Siの大気圧プラズマCVDプロセスにおける投入電力のパルス変調の効果2017
- Author(s)
  寺脇功士，前川健史，大参宏昌，垣内弘章，安武潔
- Organizer
  2017年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 電磁場解析によるマイクロ波プラズマの電子密度算出手法の開発2017
- Author(s)
  吉田和史，田中恭輔，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会2017年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] 低温薄膜トランジスタに向けた大気圧プラズマCVDによるSiOxゲート絶縁膜形成プロセスの研究2017
- Author(s)
  木元雄一朗，寺脇功士，鎌田航平，山崎啓史，大参宏昌，垣内弘章，安武潔
- Organizer
  2017年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧プラズマ装置の電磁場シミュレーションとプラズマパラメータ解析2017
- Author(s)
  田中恭輔，吉田和史，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  2017年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧プラズマCVDによるSiOxゲート絶縁膜の形成プロセスの開発2017
- Author(s)
  木元雄一朗，寺脇功士，山崎啓史，前川健史，大参宏昌，垣内弘章，安武潔
- Organizer
  第78回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧プラズマCVDによるSiおよびSiOxの高速成膜とTFTの作製・評価2016
- Author(s)
  寺脇功士，田牧祥吾，木元雄一朗，鎌田航平，大参宏昌，垣内弘章，安武潔
- Organizer
  2016年度精密工学会秋季大会
- Place of Presentation
  茨城大学
- Year and Date
  2016-09-06
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧プロセスCVDによるSiOxゲート絶縁膜の低温形成と構造・特性評価2016
- Author(s)
  木元雄一朗，田牧祥吾，寺脇功士，鎌田航平，大参宏昌，垣内弘章，安武潔
- Organizer
  第77回応用物理学会秋季学術講演会
- Place of Presentation
  朱鷺メッセ
- Year and Date
  2016-09-13
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧プラズマCVDによるSiの高速成膜とTFTの特性評価2016
- Author(s)
  寺脇功士，田牧祥吾，木元雄一朗，鎌田航平，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会 2016年度関西地方定期学術講演会
- Place of Presentation
  （株）島津製作所
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧プラズマCVDにより形成したSiOx薄膜の構造・電気特性の基板温度依存性2016
- Author(s)
  鎌田航平，木元雄一朗，田牧祥吾，寺脇功士，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会 2016年度関西地方定期学術講演会
- Place of Presentation
  （株）島津製作所
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 電磁場解析による高圧力プラズマの電子密度算出手法の開発2016
- Author(s)
  田中恭輔，鈴木貴之，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会 2016年度関西地方定期学術講演会
- Place of Presentation
  （株）島津製作所
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 低温TFTに向けた大気圧プラズマCVDによるSi成膜プロセスの研究2016
- Author(s)
  田牧祥吾，寺脇功士，木元雄一朗，鎌田航平，大参宏昌，垣内弘章，安武潔
- Organizer
  第77回応用物理学会秋季学術講演会
- Place of Presentation
  朱鷺メッセ
- Year and Date
  2016-09-13
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧・超高周波プラズマを用いたSiの低温・高速成膜技術の研究2015
- Author(s)
  寺脇功士，木元雄一朗，田牧祥吾，坂口尭之，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会 2015年度関西地方定期学術講演会
- Place of Presentation
  京都工芸繊維大学松ヶ崎キャンパス
- Year and Date
  2015-06-23
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] シミュレーションによる挟ギャップマイクロ波プラズマの解析2015
- Author(s)
  足立昂拓，首藤光利，山田高寛，大参宏昌，垣内弘章，安武潔
- Organizer
  2015年度精密工学会春季大会学術講演会
- Place of Presentation
  東洋大学
- Year and Date
  2015-03-17
- Data Source
  KAKENHI-PROJECT-24656103
[Presentation] Study on the growth of silicon films in very high-frequency plasma under atmospheric pressure2015
- Author(s)
  S. Tamaki, T. Sakaguchi, W. Lin, T. Yamada, H. Ohmi, H. Kakiuchi, K. Yasutake
- Organizer
  20th Biennial European Conference on Chemical Vapor Deposition (EuroCVD 20)
- Place of Presentation
  Festhalle Seepark Sempach, Switzerland
- Year and Date
  2015-07-13
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 高圧力マイクロ波水素プラズマ中のH密度評価2015
- Author(s)
  安武潔，山田高寛，垣内弘章，大参宏昌
- Organizer
  2015年度精密工学会春季大会学術講演会
- Place of Presentation
  東洋大学
- Year and Date
  2015-03-17
- Invited
- Data Source
  KAKENHI-PROJECT-24656103
[Presentation] Characterization of Si films deposited at 220 C in atmospheric-pressure very high-frequency plasma and their application to thin film transistors2015
- Author(s)
  H. Kakiuchi, H. Ohmi, S. Tamaki, T. Sakaguchi, W. Lin, and K. Yasutake
- Organizer
  22nd International Symposium on Plasma Chemistry (ISPC 2015)
- Place of Presentation
  University of Antwerp, Belgium
- Year and Date
  2015-07-05
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] Investigation on the deposition characteristics of silicon and silicon oxide thin films in atmospheric-pressure very high-frequency plasma for their application to thin film transistors2015
- Author(s)
  H. Kakiuchi, H. Ohmi, T. Yamada, W. Lin, T. Sakaguchi, S. Tamaki, K. Yasutake
- Organizer
  20th Biennial European Conference on Chemical Vapor Deposition (EuroCVD 20)
- Place of Presentation
  Festhalle Seepark Sempach, Switzerland
- Year and Date
  2015-07-13
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] HMDSOを原料とした大気圧プラズマCVDによるSiOx薄膜の常温・高速形成とその評価2015
- Author(s)
  木元雄一朗，寺脇功士，田牧祥吾，坂口尭之，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会 2015年度関西地方定期学術講演会
- Place of Presentation
  京都工芸繊維大学松ヶ崎キャンパス
- Year and Date
  2015-06-23
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] Silicon oxide thin films prepared with high rates at room temperature using atmospheric-pressure very high-frequency plasma2015
- Author(s)
  T. Sakaguchi, S. Tamaki, W. Lin, T. Yamada, H. Ohmi, H. Kakiuchi, K. Yasutake
- Organizer
  20th Biennial European Conference on Chemical Vapor Deposition (EuroCVD 20)
- Place of Presentation
  Festhalle Seepark Sempach, Switzerland
- Year and Date
  2015-07-13
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 高圧かつ狭ギャップマイクロ波水素プラズマにおける解離度の評価2014
- Author(s)
  山田高寛，足立昴拓，山田浩輔，大参宏昌，垣内弘章，安武潔
- Organizer
  2014年第61回応用物理学会春季学術講演会
- Place of Presentation
  青山学院大学
- Data Source
  KAKENHI-PROJECT-24656103
[Presentation] Development of Open Air Plasma Oxidation Process for Crystalline Si Solar Cells2014
- Author(s)
  Y. Fujiwara, Y. Kanetani, T. Yamada, H.　Ohmi, H.　Kakiuchi and K. Yasutake
- Organizer
  International Workshop on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪大学
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 高圧マイクロ波水素プラズマ中の原子状水素密度―電力バランスカロリメトリによる評価―2014
- Author(s)
  足立昂拓，山田高寛，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会 2014年度関西地方定期学術講演会
- Place of Presentation
  近畿大学
- Year and Date
  2014-07-04
- Data Source
  KAKENHI-PROJECT-24656103
[Presentation] 大気圧プラズマ酸化によるAlOx/SiO2/Siスタック構造の形成と評価2014
- Author(s)
  藤原裕平，金谷優樹，山田高寛，大参宏昌，垣内弘章，安武潔
- Organizer
  2014年度精密工学会春季大会学術講演会
- Place of Presentation
  東京大学
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 高圧マイクロ波水素プラズマ中の原子状水素密度－アクチノメトリによる相対密度変化の検討－2014
- Author(s)
  山田高寛，平野達也，山田浩輔，大参宏昌，垣内弘章，安武潔
- Organizer
  2014年第75回応用物理学会秋季学術講演会
- Place of Presentation
  北海道大学
- Year and Date
  2014-09-19
- Data Source
  KAKENHI-PROJECT-24656103
[Presentation] 大気圧VHFプラズマによる低温下(60-120 ℃)でのSi薄膜形成と薄膜トランジスタ特性評価2014
- Author(s)
  田牧祥吾，坂口尭之，林威成，山田高寛，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会 2014年度関西地方定期学術講演会
- Place of Presentation
  近畿大学　東大阪キャンパス
- Year and Date
  2014-07-04
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 高圧マイクロ波水素プラズマによるシリコン高速エッチングにおけるプラズマ中でのシラン分解2013
- Author(s)
  山田浩輔，山田高寛，足立昂拓，大参宏昌，垣内弘章，安武潔
- Organizer
  2013年度精密工学会秋季大会学術講演会
- Place of Presentation
  関西大学
- Data Source
  KAKENHI-PROJECT-24656103
[Presentation] 大気圧VHFプラズマによるカーボンフリーSiO_x薄膜の常温・高速形成とその評価2013
- Author(s)
  岡村康平, 横山京司, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2013年度精密工学会春季大会学術講演会
- Place of Presentation
  東京工業大学
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気開放プラズマ酸化による太陽電池用Si表面パッシベーョン技術の開発2013
- Author(s)
  藤原裕平，金谷優樹，山田高寛，大参宏昌，垣内弘章，安武潔
- Organizer
  2013年度精密工学会秋季大会学術講演会
- Place of Presentation
  関西大学
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] Atmospheric Pressure Plasma Processing for Si Photovoltaics2012
- Author(s)
  K. Yasutake, H. Ohmi, T. Yamada and H. Kakiuchi
- Organizer
  2012 Kyrgyz-Japan Solar Energy Workshop
- Place of Presentation
  Bishkek (Kyrgyz)
- Invited
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 大気圧VHFプラズマによるSiO_x常温・高速成膜とその特性評価2012
- Author(s)
  岡村康平, 横山京司, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会2012年度関西地方定期学術講演会
- Place of Presentation
  立命館大学
- Year and Date
  2012-06-15
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Calculation of Voltage Distribution over CCP Electrode during Atmospheric-Pressure Plasma Generation2012
- Author(s)
  M. Shuto, F. Tomino, H. Kakiuchi, K. Yasutake
- Organizer
  5th International Symposium on Atomically Controlled Fabrication Technology (ACFT-5)
- Place of Presentation
  Osaka, Japan
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] エピタキシャルSi太陽電池形成のための大気圧プラズマCVD技術の開発2012
- Author(s)
  金谷優樹, 後藤一磨, 三宮佑太, 卓澤騰, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2012年度精密工学会春季大会学術講演会
- Place of Presentation
  首都大学東京
- Year and Date
  2012-03-14
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 大気圧VHFプラズマを用いたSiの高速成膜とその電気特性評価2012
- Author(s)
  平野亮, 對馬哲平, 林威成, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  第73回応用物理学会学術講演会
- Place of Presentation
  愛媛大学
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Highly Efficient Formation of Amorphous and Microcrystalline Silicon Films at Low Temperatures Using Atmospheric-Pressure Very High-Frequency Plasma2012
- Author(s)
  H. Kakiuchi, H. Ohmi, T. Yamada, K. Yasutake
- Organizer
  5th International Symposium on Atomically Controlled Fabrication Technology (ACFT-5)
- Place of Presentation
  Osaka, Japan
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧 VHF プラズマによる Si の低温・高速成膜と Si成長プロセスの考察2012
- Author(s)
  對馬哲平,平野亮,山田高寛,大参宏昌,垣内弘章,安武潔
- Organizer
  2012 年度精密工学会春季大会学術講演会
- Place of Presentation
  首都大学東京
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧VHFプラズマによるシリコン表面パッシベーションプロセスの開発2012
- Author(s)
  三宮佑太, 後藤一磨, 卓澤騰, 金谷優樹, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2012年春季第59回応用物理学関係連合講演会
- Place of Presentation
  早稲田大学
- Year and Date
  2012-03-17
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 大気圧VHFプラズマにより常温・高速形成したSiOx薄膜の特性評価2012
- Author(s)
  岡村康平, 横山京司, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2012年度精密工学会春季大会学術講演会
- Place of Presentation
  首都大学東京南大沢キャンパス
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Deposition of Functional Membranes by Through-Substrate Surface Discharge2012
- Author(s)
  H. Kobayashi, H. Kakiuchi, K. Yasutake, T. Suzuki, M. Noborisaka, N. Negishi
- Organizer
  11th APCPST (Asia Pacific Conference on Plasma Science and Technology) and 25th SPSM (Symposium on Plasma Science for Materials)
- Place of Presentation
  Kyoto, Japan
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧VHFプラズマにより常温・高速形成したシリコン酸化膜の特性評価2012
- Author(s)
  横山京司, 岡村康平, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2012年春季<第59回>応用物理学関係連合講演会
- Place of Presentation
  早稲田大学早稲田キャンパス
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧VHFプラズマによるSiの低温・高速成膜とSi成長プロセスの考察2012
- Author(s)
  對馬哲平, 平野亮, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2012年度精密工学会春季大会学術講演会
- Place of Presentation
  首都大学東京南大沢キャンパス
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Highly Efficient Formation Technology for Si-Based Functional Thin Films at Low Temperatures Using Atmospheric-Pressure Very High-Frequency Plasma2012
- Author(s)
  H. Kakiuchi, H. Ohmi, T. Yamada, A. Hirano, T. Tsushima, K. Yasutake
- Organizer
  8th Handai Nanoscience and Nanotechnology International Symposium
- Place of Presentation
  Osaka, Japan(招待講演)
- Year and Date
  2012-12-11
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧VHFプラズマを用いたSiの低温・高速形成とその特性評価2012
- Author(s)
  平野亮, 對馬哲平, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2012年春季<第59回>応用物理学関係連合講演会
- Place of Presentation
  早稲田大学早稲田キャンパス
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Characterization of Si Films Prepared with Very High Rates Using Atmospheric-Pressure Very High-Frequency Plasma2012
- Author(s)
  T. Tsushima, A. Hirano, T. Yamada, H. Ohmi, H. Kakiuchi, K. Yasutake
- Organizer
  5th International Symposium on Atomically Controlled Fabrication Technology (ACFT-5)
- Place of Presentation
  Osaka, Japan
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] エピタキシャルSi 太陽電池形成のための大気圧プラズマCVD 技術の開発2012
- Author(s)
  金谷優樹,後藤一磨,三宮佑太,卓澤騰,山田高寛,大参宏昌,垣内弘章,安武潔
- Organizer
  2012年度精密工学会春季大会学術講演会
- Place of Presentation
  首都大学東京
- Year and Date
  2012-03-14
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] Highly Efficient Formation Technology for Si-Based Functional Thin Films at Low Temperatures Using Atmospheric- Pressure Very High-Frequency Plasma2012
- Author(s)
  H. Kakiuchi, H. Ohmi, T. Yamada, A. Hirano, T. Tsushima, and K. Yasutake
- Organizer
  8th Handai Nanoscience and Nanotechnology International Symposium
- Place of Presentation
  Icho-Kaikan
- Year and Date
  2012-12-11
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Surface passivation of Si by atmospheric-pressure plasma oxidation at low temperatures2012
- Author(s)
  卓澤騰, 三宮佑太, 後藤一磨, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2012年度精密工学会春季大会学術講演会
- Place of Presentation
  首都大学東京
- Year and Date
  2012-03-14
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] Atmospheric Pressure Plasma Processes for Preparation of Si-Based Thin Films2012
- Author(s)
  K. Yasutake, H. Ohmi, T. Yamada, H. Kakiuchi
- Organizer
  59th AVS International Symposium
- Place of Presentation
  Tampa (USA)
- Invited
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] Silicon Oxide Depositions with High Rates at Room Temperature from Hexamethyldisiloxane Using Atmospheric-Pressure VHF Plasma2012
- Author(s)
  K. Okamura, K. Yokoyama, T. Yamada, H. Ohmi, H. Kakiuchi, K. Yasutake
- Organizer
  5th International Symposium on Atomically Controlled Fabrication Technology (ACFT-5)
- Place of Presentation
  Osaka, Japan
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Characterization of Amorphous and Microcrystalline Si Films Grown in Atmospheric-Pressure Very High-Frequency Plasma2012
- Author(s)
  H. Kakiuchi, H. Ohmi, T. Yamada, A. Hirano, T. Tsushima, and K. Yasutake
- Organizer
  59th AVS International Symposium
- Place of Presentation
  Tampa, USA
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧RFプラズマを用いたZnO薄膜の高速形成と特性評価2012
- Author(s)
  水野裕介, 峰執大, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2012年度精密工学会春季大会学術講演会
- Place of Presentation
  首都大学東京南大沢キャンパス
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Structural Characterization of Zinc Oxide Films Prepared in Atmospheric-Pressure Radio Frequency Plasma2012
- Author(s)
  Y. Mizuno, M. Nagashima, T. Yamada, H. Ohmi, H. Kakiuchi, K. Yasutake
- Organizer
  5th International Symposium on Atomically Controlled Fabrication Technology (ACFT-5)
- Place of Presentation
  Osaka, Japan
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] プラズマジェットにより常温・大気開放下で形成したシリコン酸化膜の特性2011
- Author(s)
  東田皓介, 中村慶, 柴田哲司, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2011年秋季<第72回>応用物理学会学術講演会
- Place of Presentation
  山形大学小白川キャンパス
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Deposition Characteristics of Silicon Oxides in Open Air Using Atmospheric-Pressure Plasma Jet2011
- Author(s)
  K.Higashida, K.Nakamura, T.Shibata, T.Yamada, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  The 24th International Conference on Amorphous and Nanocrystalline Semiconductors (ICANS 24)
- Place of Presentation
  The Nara Prefectural New Public Hall (Nara, Japan)
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧VHFプラズマによる微結晶Siの成膜特性に及ぼす電極構造の影響2011
- Author(s)
  平野亮, 對馬哲平, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会2011年度関西地方定期学術講演会
- Place of Presentation
  兵庫県立大学姫路書写キャンパス
- Year and Date
  2011-06-30
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Study on the Growth of Hydrogenated Amorphous and Microcrystalline Silicon Films Deposited with High Rates Using Atmospheric-Pressure VHF Plasma2011
- Author(s)
  H.Kakiuchi, H.Ohmi, T.Yamada, A.Hirano, T.Tsushima, K.Yasutake
- Organizer
  15th International Conference on Thin Films
- Place of Presentation
  Kyoto TERRSA (Kyoto, Japan)
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧プラズマCVDによるZnO薄膜の形成とその電気特性評価2011
- Author(s)
  峰執大, 大参宏昌, 垣内弘章, 安武潔, 岡崎慎也
- Organizer
  精密工学会2011年度関西地方定期学術講演会
- Place of Presentation
  兵庫県立大学姫路書写キャンパス
- Year and Date
  2011-06-30
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Atmospheric-Pressure Plasma Oxidation Process for Si Surface Passivation2011
- Author(s)
  Y.Sannnomiya, K.Goto, ZT.Zhuo, Y.Kanetani, T.Yamada, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  15th International Conference on Thin Films
- Place of Presentation
  京都
- Year and Date
  2011-11-09
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] Structural Characterization of Room-Temperature Silicon Oxides Deposited from Hexamethyldisiloxane-Oxygen Mixtures Using Atmospheric-Pressure VHF Plasma2011
- Author(s)
  K.Yokoyama, K.Okamura, T.Yamada, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  15th International Conference on Thin Films
- Place of Presentation
  Kyoto TERRSA (Kyoto, Japan)
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Deposition Characteristics of Silicon Oxides in Open Air Using Atmospheric-Pressure Plasma Jet2011
- Author(s)
  K.Higashida, T.Shibata, T.Yamada, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  4th International Symposium on Atomically Controlled Fabrication Technology (ACFT-4)
- Place of Presentation
  Nakanoshima Center (Osaka, Japan)
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Atmospheric-Pressure Plasma Processes for Efficient Formation of Functional Thin Films at Low-Temperatures2011
- Author(s)
  K.Yasutake, H.Ohmi, T.Yamada, H.Kakiuchi
- Organizer
  4th Int.Symp.on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪
- Year and Date
  2011-11-01
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] Formation of SiO_xN_y Films for Passivation of Si Surfaces by Atmospheric-Pressure Plasma Oxidation2011
- Author(s)
  ZT.Zhuo, K.Goto, Y.Sannomiya, Y.Kanetani, T.Yamada, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  4th Int.Symp.on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪
- Year and Date
  2011-11-01
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 大気圧プラズマジェットを用いた常温・大気開放下でのシリコン酸化膜の成膜特性2011
- Author(s)
  東田皓介, 中村慶, 柴田哲司, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2011年春季第58回応用物理学関係連合講演会
- Place of Presentation
  神奈川工科大学(神奈川県厚木市)
- Year and Date
  2011-03-26
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧VHFプラズマによるSiOx反射防止膜形成プロセスの検討2011
- Author(s)
  横山京司, 岡村康平, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会2011年度関西地方定期学術講演会
- Place of Presentation
  兵庫県立大学姫路書写キャンパス
- Year and Date
  2011-06-30
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧プラズマ酸化による太陽電池用Si表面パッシベーション技術の開発2011
- Author(s)
  後藤一磨, 卓澤騰, 三宮佑太, 金谷優樹, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2011年度精密工学会秋季大会学術講演会
- Place of Presentation
  金沢大学
- Year and Date
  2011-09-20
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 大気圧プラズマCVD法を用いたZnO薄膜の形成と真空アニール処理効果の検討2011
- Author(s)
  峰執大, 山田高寛, 大参宏昌, 垣内弘章, 安武潔, 岡崎真也
- Organizer
  2011年秋季<第72回>応用物理学会学術講演会
- Place of Presentation
  山形大学小白川キャンパス
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] High-Rate Deposition of Amorphous and Microcrystalline Si Films Using Atmospheric-Pressure VHF Plasma2011
- Author(s)
  H. Kakiuchi, H. Ohmi, H. Yamada, and K. Yasutake
- Organizer
  2011 Korea & Japan Int. Symp. on Solar Cells
- Place of Presentation
  Mokpo, Korea.(招待講演)
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧VHFプラズマにより常温・高速形成したシリコン酸化膜の構造評価2011
- Author(s)
  横山京司, 岡村康平, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2011年秋季<第72回>応用物理学会学術講演会
- Place of Presentation
  山形大学小白川キャンパス
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Atmospheric-Pressure Plasma Processes for Efficient Formation of Functional Thin Films at Low-Temperatures2011
- Author(s)
  K.Yasutake, H.Ohmi, T.Yamada, H.Kakiuchi
- Organizer
  4th International Symposium on Atomically Controlled Fabrication Technology (ACFT-4)
- Place of Presentation
  Nakanoshima Center (Osaka, Japan)
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] High-Rate Deposition of Amorphous and Microcrystalline Si Films Using Atmospheric-Pressure VHF Plasma2011
- Author(s)
  H.Kakiuchi, H.Ohmi, H.Yamada, K.Yasutake
- Organizer
  2011 Korea & Japan International Symposium on Solar Cells
- Place of Presentation
  Hotel Hyundai Mokpo (Mokpo, Korea)(招待講演)
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Surface Passivation of N-type Si surfaces using SiO_2 grown by of Atmospheric-Pressure Plasma Oxidation Processing2011
- Author(s)
  卓澤騰, 大参宏昌, 垣内弘章, 安武潔, 他3名
- Organizer
  2011年度精密工学会春季大会学術講演会
- Place of Presentation
  講演論文集A66東洋大学(東京)
- Year and Date
  2011-03-01
- Data Source
  KAKENHI-PROJECT-21656039
[Presentation] 大気圧プラズマジェットを用いた常温・大気開放下でのシリコン酸化膜の高速形成とその評価2011
- Author(s)
  東田皓介, 中村慶, 山田高寛, 大参宏昌, 垣内弘章, 安武潔, 柴田哲司
- Organizer
  精密工学会2011年度関西地方定期学術講演会
- Place of Presentation
  兵庫県立大学姫路書写キャンパス
- Year and Date
  2011-06-30
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Study on the Growth of Hydrogenated Amorphous and Microcrystalline Silicon Films Deposited with High Rates Using Atmospheric-Pressure VHF Plasma2011
- Author(s)
  H. Kakiuchi, H. Ohmi, T. Yamada, A. Hirano, T. Tsushima, and K. Yasutake
- Organizer
  15th International Conference on Thin Films
- Place of Presentation
  Kyoto, Japan.
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Influence of the Electrode Configuration on the Growth of Microcrystalline Si Films in Atmospheric-Pressure Very High-Frequency Plasma2011
- Author(s)
  A.Hirano, T.Tsushima, T.Yamada, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  4th International Symposium on Atomically Controlled Fabrication Technology (ACFT-4)
- Place of Presentation
  Nakanoshima Center (Osaka, Japan)
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧プラズマを用いたシリコン表面パッシベーションプロセスの開発2011
- Author(s)
  三宮佑太, 後藤一磨, 卓澤騰, 金谷優樹, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会2011年度関西地方定期学術講演会
- Place of Presentation
  兵庫県立大学
- Year and Date
  2011-06-30
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] Growth and Properties of Zinc Oxide Films Prepared in Atmospheric-Pressure Radio Frequency Plasma2011
- Author(s)
  S.Mine, S.Okazaki, T.Yamada, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  The 24th International Conference on Amorphous and Nanocrystalline Semiconductors (ICANS 24)
- Place of Presentation
  The Nara Prefectural New Public Hall (Nara, Japan)
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Fundamental Study on the Film Growth from Organometallic precursors Using Atmospheric-Pressure Radio-Frequency Plasma2011
- Author(s)
  S.Mine, K.Okamura, T.Yamada, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  4th International Symposium on Atomically Controlled Fabrication Technology (ACFT-4)
- Place of Presentation
  Nakanoshima Center (Osaka, Japan)
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧VHFプラズマによるシリコン酸化膜の常温・高速形成とその構造評価2011
- Author(s)
  横山京司, 水野裕介, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2011年春季第58回応用物理学関係連合講演会
- Place of Presentation
  神奈川工科大学(神奈川県厚木市)
- Year and Date
  2011-03-26
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Silicon Oxide Anti-Reflection Coatings from Hexamethyldisiloxane at Room Temperature Using Atmospheric-Pressure VHF plasma2011
- Author(s)
  K.Yokoyama, K.Okamura, T.Yamada, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  4th International Symposium on Atomically Controlled Fabrication Technology (ACFT-4)
- Place of Presentation
  Nakanoshima Center (Osaka, Japan)
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧プラズマを用いたSi薄膜形成2010
- Author(s)
  安武潔, 大参宏昌, 山田高寛, 垣内弘章
- Organizer
  日本学術振興会プラズマ材料科学第153委員会第98回研究会「高速・高品質化を実現する先端プラズマ技術(シリコン薄膜形成)」
- Place of Presentation
  弘済会館(東京)
- Year and Date
  2010-09-10
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] Atmospheric-Pressure Plasma Technology for the High-Rate and Low-Temperature Deposition of Si Thin Films2010
- Author(s)
  H.Kakiuchi, H.Ohmi, K.Yasutake
- Organizer
  32^<nd> International Symposium on Dry Process
- Place of Presentation
  東京工業大学(東京都目黒区大岡山)(招待講演)
- Year and Date
  2010-11-11
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Open Air Deposition of Silicon Oxide Films at Room Temperature Using Atmospheric-Pressure Plasma Jet2010
- Author(s)
  K.Higashida, K.Nakamura, T.Shibata, T.Yamada, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  Third International Symposium on Atomically Controlled Fabrication Technology
- Place of Presentation
  Nakanoshima Center(大阪府大阪市)
- Year and Date
  2010-11-24
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Atmospheric-Pressure Plasma Technology for the High-Rate and Low-Temperature Deposition of Si Thin Films2010
- Author(s)
  H. Kakiuchi, H. Ohmi, and K. Yasutake
- Organizer
  32nd International Symposium on Dry Process
- Place of Presentation
  東京工業大学.(招待講演)
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧プラズマCVDによるSiO_2の常温・高速成膜とその構造評価2010
- Author(s)
  横山京司, 水野裕介, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会 2010年度関西地方定期学術講演会
- Place of Presentation
  京都大学(京都府京都市)
- Year and Date
  2010-05-28
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Structural Characterization of Room-Temperature Silicon Oxides Deposited from Hexamethyldisiloxane-Oxygen Mixtures at Room Temperature Using Atmospheric-Pressure VHF Plasma2010
- Author(s)
  K.Yokoyama, Y.Mizuno, T.Yamada, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  Third International Symposium on Atomically Controlled Fabrication Technology
- Place of Presentation
  Nakanoahima Center(大阪府大阪市)
- Year and Date
  2010-11-24
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Atmospheric-Pressure Plasma Oxidation Process for Passivation of Si Surface2010
- Author(s)
  Z.T.Zhuo, H.Ohmi, H.Kakiuchi, K.Yasutake, 他3名
- Organizer
  63rd Gaseous Electronics Conf.and 7th Int.Conf on Reactive Plasmas
- Place of Presentation
  Maison de la Chimie (Paris)
- Year and Date
  2010-10-05
- Data Source
  KAKENHI-PROJECT-21656039
[Presentation] Atmospheric-Pressure Plasma Technology for the High-Rate and Low-Temperature Deposition of Si Thin Films2010
- Author(s)
  H.Kakiuchi, H.Ohmi, K.Yasutake
- Organizer
  32^<nd> International Symposium on Dry Process
- Place of Presentation
  東京工業大学(招待講演)
- Year and Date
  2010-11-11
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Atmospheric-Pressure Plasma Oxidation Process for Passivation of Si Surface2010
- Author(s)
  Z.T.Zhuo, H.Ohmi, H.Kakiuchi, K.Yasutake, 他2名
- Organizer
  精密工学会2010年度関西地方定期学術講演会
- Place of Presentation
  京都大学(京都)
- Year and Date
  2010-05-28
- Data Source
  KAKENHI-PROJECT-21656039
[Presentation] 大気圧・超高周波プラズマの生成と Si およびその化合物の低温・高速成膜2010
- Author(s)
  垣内弘章
- Organizer
  表面技術協会材料機能ドライプロセス部会および関西支部表面物性研究会合同研究会
- Place of Presentation
  京都大学.(招待講演)
- Year and Date
  2010-11-19
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Development of Atmospheric-Pressure Plasma Oxidation Process for Surface Passivation of Si2010
- Author(s)
  Z.T.Zhuo, H.Ohmi, H.Kakiuchi, K.Yasutake, 他3名
- Organizer
  3rd Int.Symp.on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪大学中之島センター(大阪)
- Year and Date
  2010-11-24
- Data Source
  KAKENHI-PROJECT-21656039
[Presentation] Room-Temperature Deposition of Silicon Nitride Films with Very High Rates Using Atmospheric-Pressure Plasma Chemical Vapor Deposition2010
- Author(s)
  H.Kakiuchi, H.Ohmi, K.Yasutake
- Organizer
  63^<rd> Gaseous Electronics Conference & 7^<th> International Conference on Reactive Plasmas
- Place of Presentation
  Paris, France
- Year and Date
  2010-10-05
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Room-Temperature Deposition of Silicon Nitride Films with Very High Rates Using Atmospheric-Pressure Plasma Chemical Vapor Deposition2010
- Author(s)
  H.Kakiuchi, H.Ohmi, K.Yasutake
- Organizer
  63^<rd> Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas
- Place of Presentation
  Maison de la Chimie (Paris, France)
- Year and Date
  2010-10-05
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧・超高周波プラズマの生成とSiおよびその化合物の低温・高速成膜2010
- Author(s)
  垣内弘章
- Organizer
  表面技術協会材料機能ドライプロセス部会および関西支部表面物性研究会合同研究会
- Place of Presentation
  京都大学(京都)
- Year and Date
  2010-11-19
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 大気圧プラズマ酸化による太陽電池用Si表面パッシベーション膜の形成2010
- Author(s)
  後藤一磨, 大参宏昌, 垣内弘章, 安武潔, 他3名
- Organizer
  2010年度精密工学会秋季大会学術講演会
- Place of Presentation
  名古屋大学(名古屋)
- Year and Date
  2010-09-27
- Data Source
  KAKENHI-PROJECT-21656039
[Presentation] Room-Temperature Deposition of Silicon Nitride Films with Very High Rates Using Atmospheric-Pressure Plasma Chemical Vapor Deposition2010
- Author(s)
  H. Kakiuchi, H. Ohmi, and K. Yasutake
- Organizer
  63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas
- Place of Presentation
  Paris, France.
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Influence of Process Parameters on the Material Properties of Microcrystalline Si Prepared Using Atmospheric-Pressure Very High-Frequency Plasma2010
- Author(s)
  K.Tabuchi, A.Hirano, T.Yamada, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  Third International Symposium on Atomically Controlled Fabrication Technology
- Place of Presentation
  Nakanoshima Center(大阪府大阪市)
- Year and Date
  2010-11-24
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧プラズマを用いたSi 薄膜形成2010
- Author(s)
  安武潔,大参宏昌,山田髙寛,垣内弘章
- Organizer
  日本学術振興会プラズマ材料科学第153委員会第98回研究会「高速・高品質化を実現する先端プラズマ技術 (シリコン薄膜形成)
- Place of Presentation
  弘済会館(東京)
- Year and Date
  2010-09-10
- Invited
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] プラズマCVDの基礎～大気圧プラズマによる薄膜形成～2010
- Author(s)
  垣内弘章
- Organizer
  第4回プラズマエレクトロニクスインキュベーションホール
- Place of Presentation
  国立中央青少年交流の家(静岡県御殿場市)
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 大気圧VHFプラズマを用いた微結晶シリコン薄膜の低温・高速形成と膜成長プロセスの考察2010
- Author(s)
  田渕圭太, 平野亮, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会 2010年度関西地方定期学術講演会
- Place of Presentation
  京都大学(京都府京都市)
- Year and Date
  2010-05-28
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧・超高周波プラズマの生成とSiおよびその化合物の低温・高速成膜2010
- Author(s)
  垣内弘章
- Organizer
  表面技術協会材料機能ドライプロセス部会および関西支部表面物性研究会合同研究会
- Place of Presentation
  京都大学(京都府京都市)(招待講演)
- Year and Date
  2010-11-19
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧プラズマCVD法によるSi選択エピタキシャル成長2009
- Author(s)
  大西崇之, 桐畑豊, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会春季大会学術講演会
- Place of Presentation
  中央大学(東京)
- Year and Date
  2009-03-11
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] Characterization of Room-Temperature Silicon Oxide Films Deposited with High Rates in Atmospheric-Pressure VHF Plasma2009
- Author(s)
  K.Nakamura, Y.Yamaguchi, K.Yokoyama, K.Higashida, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  Second International Symposium on Atomically Controlled Fabrication Technology
- Place of Presentation
  Nakanoshima Center, Osaka, Japan
- Year and Date
  2009-11-25
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Investigation of Deposition Characteristics and Properties of High-Rate Deposited SiN_x Films Prepared at low temperatures (100-300℃) by Atmospheric-Pressure Plasma CVD2009
- Author(s)
  Y.Yamaguchi, K.Nakamura, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  The 23rd International Conference on Amorphous and Nanocrystalline Semiconductors (ICANS 23)
- Place of Presentation
  Educatorium, Utrecht, the Netherlands
- Year and Date
  2009-08-25
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧 VHF プラズマによる微結晶 Si 薄膜の低温・高速形成に関する研究-熱流体解析を用いた膜成長プロセスの考察-2009
- Author(s)
  田渕圭太,尾内健太郎,大参宏昌,垣内弘章,安武潔
- Organizer
  2009 年度精密工学会秋季大会学術講演会
- Place of Presentation
  神戸大学
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧・超高周波プラズマ中で低温・高速形成した微結晶Si薄膜の特性2009
- Author(s)
  田渕圭太, 尾内健太郎, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会 2009年度関西地方定期学術講演会
- Place of Presentation
  千里ライフサイエンスセンター(大阪府豊中市)
- Year and Date
  2009-05-13
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] New Formation Process of Solar-Grade Si Material Based on Atmospheric-Pressure Plasma Science2009
- Author(s)
  K.Yasutake, H.Ohmi, K.Inagaki, H.Kakiuchi
- Organizer
  2nd Int. Symp. on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪大学中之島会館(大阪市)
- Year and Date
  2009-11-26
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] In Situ Doped Si Selective Epitaxial Growth at Low Temperatures by Atmospheric Pressure Plasma CVD2009
- Author(s)
  T.Ohnishi, Y.Kirihata, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  216th ECS meeting CVD-XVII & EUROCVD-17
- Place of Presentation
  Austria Center Vienna(オーストリア、ウィーン)
- Year and Date
  2009-10-05
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] Si Selective Epitaxial Growth at Low Temperatures by Atmospheric-Pressure Plasma CVD2009
- Author(s)
  Y. Kirihata, T. Ohnishi, H. Ohmi, H. Kakiuchi, K. Yasutake
- Organizer
  1^<st> Int. Symp. on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-
- Place of Presentation
  大阪大学
- Year and Date
  2009-02-16
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] (招待講演)大気圧プラズマCVD法による高品質Si系薄膜の低温形成2009
- Author(s)
  安武潔, 大参宏昌, 垣内弘章
- Organizer
  2009年春季第56回応用物理学関係連合講演会第44回応用物理学会スクール「安価,簡単,便利～大気圧プラズマの基礎と応用～」
- Place of Presentation
  筑波大学(筑波市)
- Year and Date
  2009-04-02
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVDによる低温in situドープSi選択エピタキシャル成長に関する研究2009
- Author(s)
  大西崇之, 後藤一磨, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会 2009年度関西地方学術講演会
- Place of Presentation
  千里ライフサイエンスセンター(豊中市)
- Year and Date
  2009-05-13
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] Study on the Growth of Microcrystalline Si Films at Low Temperatures in Atmospheric-Pressure VHF Plasma2009
- Author(s)
  K.Tabuchi, K.Ouchi, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  Second International Symposium on Atomically Controlled Fabrication Technology
- Place of Presentation
  Nakanoshima Center, Osaka, Japan
- Year and Date
  2009-11-25
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Investigation of Deposition Characteristics and Properties of High-Rate Deposited SiNx Films Prepared at low temperatures (100-300 ℃) by Atmospheric-Pressure Plasma CVD2009
- Author(s)
  Y. Yamaguchi, K. Nakamura, H. Ohmi, H. Kakiuchi, and K. Yasutake
- Organizer
  The 23rd International Conference on Amorphous and Nanocrystalline Semiconductors (ICANS 23)
- Place of Presentation
  Utrecht, The Netherlands.
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧VHFプラズマによる微結晶Si薄膜の低温・高速形成に関する研究-熱流体解析を用いた膜成長プロセスの考察-2009
- Author(s)
  田渕圭太, 尾内健太郎, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2009年度精密工学会秋季大会学術講演会
- Place of Presentation
  神戸大学(兵庫県神戸市)
- Year and Date
  2009-09-13
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Characterization of Microcrystalline Si Films Deposited at Low Temperatures with High Rates by Atmospheric-Pressure Plasma CVD2009
- Author(s)
  K.Ouchi, K.Tabuchi, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  The 23rd International Conference on Amorphous and Nanocrystalline Semiconductors (ICANS 23)
- Place of Presentation
  Educatorium, Utrecht, the Netherlands
- Year and Date
  2009-08-24
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Low-Temperature Si Epitaxial Growth by Atmospheric-Pressure Plasma CVD2009
- Author(s)
  T.Ohnishi, K.Goto, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  2nd Int. Symp. on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪大学中之島会館(大阪市)
- Year and Date
  2009-11-26
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] Atmospheric-Pressure Plasma Processes for Efficient Formation of Si Thin Films at Low Temperatures2009
- Author(s)
  K. Yasutake, H. Ohmi, H. Kakiuchi
- Organizer
  1^<st> Int. Symp. on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-
- Place of Presentation
  大阪大学
- Year and Date
  2009-02-16
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] Room-Temperature Formation of Silicon Dioxide Films by Atmospheric-Pressure Plasma CVD Using Cylindrical Rotary Electrode2009
- Author(s)
  Y. Yamaguchi, K. Nakamura, H. Ohmi, H. Kakiuchi, K. Yasutake
- Organizer
  First International Symposium on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪大学
- Year and Date
  2009-02-16
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧プラズマCVDにより常温で形成したSiO_2薄膜の構造評価2009
- Author(s)
  中村慶, 山口賀人, 東田晧介, 横山京司, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会 2009年度関西地方定期学術講演会
- Place of Presentation
  千里ライフサイエンスセンター(大阪府豊中市)
- Year and Date
  2009-05-13
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧プラズマCVD法による高品質Si系薄膜の低温形成2009
- Author(s)
  安武潔, 大参宏昌, 垣内弘章
- Organizer
  第44回応用物理学会スクール「安価, 簡単, 便利～大気圧プラズマの基礎と応用～」
- Place of Presentation
  筑波大学(筑波市)(招待講演)
- Year and Date
  2009-04-02
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] Characterization of Microcrystalline Si Films Deposited with Highrates by At mo spheric-Pressure Plasma Chemical Vapor Deposition2009
- Author(s)
  K. Ouchi, K. Tabuchi, H. Ohnmi, H. Kakiuchi, K. Yasutake
- Organizer
  First International Symposium on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪大学
- Year and Date
  2009-02-16
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧 VHF プラズマによるシリコンナイトライドの常温・高速成膜2009
- Author(s)
  中村慶,山口賀人,大参宏昌,垣内弘章,安武潔
- Organizer
  2009 年度精密工学会秋季大会学術講演会
- Place of Presentation
  神戸大学
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] Characterization of High-Rate Deposited Microcrystalline Si Films Prepared Using Atmospheric-Pressure Very High-Frequency Plasma2009
- Author(s)
  K.Tabuchi, K.Ouchi, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  216^<th> ECS Meeting with EuroCVD-17 and SOFC XI
- Place of Presentation
  Austria Center Vienna, Vienna, Austria
- Year and Date
  2009-10-05
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧VHFプラズマによるシリコンナイトライドの常温・高速成膜2009
- Author(s)
  中村慶, 山口賀人, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2009年度精密工学会秋季大会学術講演会
- Place of Presentation
  神戸大学(兵庫県神戸市)
- Year and Date
  2009-09-13
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧VHFプラズマにより常温・高速形成したSiO_2薄膜の構造に及ぼすH_2添加の効果2009
- Author(s)
  山口賀人, 横山京司, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  第70回応用物理学会学術講演会
- Place of Presentation
  富山大学(富山県富山市)
- Year and Date
  2009-09-10
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 回転電極を用いた大気圧プラズマCVDによるSiO_2薄膜の常温高速形成2008
- Author(s)
  山口賀人, 中村慶, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  第69回応用物理学会学術講演会
- Place of Presentation
  中部大学
- Year and Date
  2008-09-05
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧プラズマCVDによる微結晶Si薄膜の低温・高速形成2008
- Author(s)
  尾内健太郎, 田渕圭太, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  第69回応用物理学会学術講演会
- Place of Presentation
  中部大学
- Year and Date
  2008-09-05
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧プラズマプロセスによるSi系薄膜の低温形成2008
- Author(s)
  安武潔, 大参宏昌, 垣内弘章
- Organizer
  応用物理学会プラズマエレクトロニクス分科会第2回プラズマ新領域研究会
- Place of Presentation
  広島大学
- Year and Date
  2008-12-19
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVD法による高品質Si系薄膜の形成2008
- Author(s)
  安武潔, 垣内弘章, 大参宏昌
- Organizer
  日本学術振興会プラズマ材料科学第153委員会第87回研究会
- Place of Presentation
  ホテル明山荘(蒲郡市)(招待講演)
- Year and Date
  2008-07-02
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVD法による低温in situドープSi選択エピタキシャル成長2008
- Author(s)
  桐畑豊, 大西崇之, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2008年秋季第69回応用物理学会学術講演会
- Place of Presentation
  中部大学(愛知)
- Year and Date
  2008-09-02
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVDにより高速形成しだ微結晶Si薄膜の構造および電気特性評価2008
- Author(s)
  尾内健太郎, 田渕圭太, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  薄膜材料デバイス研究会第5回研究集会
- Place of Presentation
  奈良市なら100年会館
- Year and Date
  2008-11-01
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] 大気圧プラズマCVD法による高品質Si系薄膜の形成2008
- Author(s)
  安武潔, 垣内弘章, 大参宏昌
- Organizer
  日本学術振興会プラズマ材料科学第153委員会第87回研究会
- Place of Presentation
  ホテル明山荘(愛知)
- Year and Date
  2008-07-02
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧VHFプラズマによるシリコンナイトライトの低温・高速成膜2008
- Author(s)
  中村慶, 山口賀人, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2008年度精密工学会秋季大会学術講演会
- Place of Presentation
  東北大学
- Year and Date
  2008-09-17
- Data Source
  KAKENHI-PROJECT-20676003
[Presentation] High-quality epitaxial Si growth at low temperatures by atmospheric pressure plasma CVD2007
- Author(s)
  K. Yasutake, H. Ohmi, Y. Kirihata, H. Kakiuchi
- Organizer
  5th Int. Conf. on Silicon Epitaxy and Heterostructures
- Place of Presentation
  Marseille, France
- Year and Date
  2007-05-21
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] Atmospheric-Pressure Plasma Processes for Fabrication of Si and SiO_2 Thin Films at Low-Temperatures (Invited)2007
- Author(s)
  安武潔, 垣内弘章, 大参宏昌
- Organizer
  第18回日本MRS学術シンポジウム
- Place of Presentation
  日本大学(駿河台)
- Year and Date
  2007-12-08
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVD法による高品質Siエピタキシャル膜の低温成長2007
- Author(s)
  桐畑豊, 田原直剛, 大参宏昌, 垣内弘章, 渡部平司, 安武潔
- Organizer
  2007年春季第54回応用物理学関係連合講演会
- Place of Presentation
  青山学院大学(相模原)
- Year and Date
  2007-03-29
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] In situ B doped Si Epitaxial Growth at Low Temperatures by Atmospheric Pressure Plasma CVD2007
- Author(s)
  Y. Kirihata, T. Nomura, H. Ohmi, H. Kakiuchi and K. Yasutake
- Organizer
  Int. 21st Century COE Symp. on Atomistic Fabrication Technology 2007
- Place of Presentation
  大阪大学(吹田)
- Year and Date
  2007-10-15
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] Atmospheric-pressure plasma processes for fabrication of Si and SiO2 thin films at low-temperatures2007
- Author(s)
  K. Yasutake, H. Ohmi, H. Kakiuchi
- Organizer
  第18回日本MRS学術シンポジウム
- Place of Presentation
  日本大学(千代田区)(招待講演)
- Year and Date
  2007-12-08
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVD法で低温成長したエピタキシャルSi薄膜の電気特性評価2007
- Author(s)
  桐畑豊, 野村徹, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2007年度精密工学会秋季大会学術講演会
- Place of Presentation
  旭川市ときわ市民ホール
- Year and Date
  2007-09-14
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVDによる高品質エピタキシャルSiの低温成長2007
- Author(s)
  桐畑豊, 野村徹, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会 2007年度関西地方定期学術講演会
- Place of Presentation
  大阪産業大学(大東市)
- Year and Date
  2007-08-09
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] Characterization of epitaxial Si films grown at low-temperatures by atmospheric pressure plasma CVD2007
- Author(s)
  Y. Kirihata, N. Tawara, H. Ohmi, H. Kakiuchi, H. Watanabe, K. Yasutake
- Organizer
  5th Int. Conf. on Silicon Epitaxy and Heterostructures, 2007
- Place of Presentation
  マルセイユ
- Year and Date
  2007-05-21
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] High-quality epitaxial Si growth at low temperatures by atmospheric pressure plasma CVD2007
- Author(s)
  K. Yasutake, H. Ohmi, Y. Kirihata, H. Kakiuchi
- Organizer
  5th Int. Conf. on Silicon Epitaxy and Heterostructures, 2007
- Place of Presentation
  マルセイユ
- Year and Date
  2007-05-21
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 薄型結晶Si太陽電池のための大気開放プラズマ酸化プロセスの開発
- Author(s)
  藤原裕平,金谷優樹,山田高寛,大参宏昌,垣内弘章,安武潔
- Organizer
  精密工学会 2013年度関西地方定期学術講演会
- Place of Presentation
  大阪工業大学
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] Room Temperature Deposition of Silicon Oxide Films with High Rates Using Atmosphere-Pressure Very High-Frequency Plasma
- Author(s)
  T. Sakaguchi, S. Tamaki, W. Lin, T. Yamada, H. Ohmi, H. Kakiuchi, and K. Yasutake
- Organizer
  2nd KANSAI Nanoscience and Nanotechnology International Symposium
- Place of Presentation
  Knowledge Capital Congres Convention Center, Osaka
- Year and Date
  2014-12-10 – 2014-12-11
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] 大気圧VHFプラズマによるSiの低温・高速成膜技術の開発－TFT特性に対する電極長さの影響－
- Author(s)
  坂口尭之，林威成，田牧祥吾，山田高寛，大参宏昌，垣内弘章，安武　潔
- Organizer
  2015年度精密工学会春季大会学術講演会
- Place of Presentation
  東洋大学　白山キャンパス
- Year and Date
  2015-03-17 – 2015-03-19
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] Low Temperature Deposition of Silicon Films Using Very High-Frequency Plasma under Atmospheric Pressure
- Author(s)
  S. Tamaki, T. Sakaguchi, W. Lin, T. Yamada, H. Ohmi, H. Kakiuchi, and K. Yasutake
- Organizer
  2nd KANSAI Nanoscience and Nanotechnology International Symposium
- Place of Presentation
  Knowledge Capital Congres Convention Center, Osaka
- Year and Date
  2014-12-10 – 2014-12-11
- Data Source
  KAKENHI-PROJECT-26249010
[Presentation] Calorimetry study of degree of dissociation in narrow-gap microwave hydrogen plasma for high-rate Si etching
- Author(s)
  K. Yamada, T. Adachi, T. Yamada, H. Ohmi, H. Kakiuchi and K. Yasutake
- Organizer
  1st KANSAI Nanoscience and Nanotechnology International Symposium
- Place of Presentation
  Senri Life Science Center
- Data Source
  KAKENHI-PROJECT-24656103
[Presentation] 大気圧VHFプラズマによるSi及びSiOx の低温・高速成膜と薄膜トランジスタ特性評価
- Author(s)
  林威成，田牧祥吾，坂口尭之，山田高寛，大参宏昌，垣内弘章，安武潔
- Organizer
  2014年度精密工学会秋季大会学術講演会
- Place of Presentation
  鳥取大学　鳥取キャンパス
- Year and Date
  2014-09-16 – 2014-09-18
- Data Source
  KAKENHI-PROJECT-26249010

1. YASUTAKE Kiyoshi (80166503)

# of Collaborated Projects: 13 results

# of Collaborated Products: 84 results
2. YOSHII Kumayasu (30029152)

# of Collaborated Projects: 8 results

# of Collaborated Products: 0 results
3. OHMI Hiromasa (00335382)

# of Collaborated Projects: 5 results

# of Collaborated Products: 77 results
4. KAWABE Hideaki (90028978)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
5. MORI Yuzo (00029125)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
6. 押鐘寧 (40263206)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
7. 稲垣耕司

# of Collaborated Projects: 0 results

# of Collaborated Products: 1 results

Kakiuchi Hiroaki 垣内 弘章

KAKIUCHI Hiroaki 垣内 弘章

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Development of highly efficient formation process of thin film devices based on atmospheric-pressure plasma sciencePrincipal Investigator

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Development of highly efficient fabrication process of thin film devices on plastic materials using atmospheric-pressure plasmaPrincipal Investigator

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任意材料基板上への結晶シリコンの低温・高速成膜に関する研究Principal Investigator

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LIF法による高圧力プラズマプロセスの計測Principal Investigator

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Kakiuchi Hiroaki 垣内弘章

KAKIUCHI Hiroaki 垣内弘章

[Book] 大気圧プラズマの生成制御と応用技術(監修小駒益弘),大気圧プラズマCVD によるシリコン薄膜の形成2012