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HIRAI HIROHISA  平井 悠久

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平井 悠久  ヒライ ヒロヒサ

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Researcher Number 10828122
Other IDs
Affiliation (Current) 2022: 国立研究開発法人産業技術総合研究所, エネルギー・環境領域, 研究員
Affiliation (based on the past Project Information) *help 2021 – 2022: 国立研究開発法人産業技術総合研究所, エネルギー・環境領域, 研究員
Review Section/Research Field
Principal Investigator
Basic Section 21050:Electric and electronic materials-related
Except Principal Investigator
Basic Section 21050:Electric and electronic materials-related
Keywords
Principal Investigator
パワーエレクトロニクス / 窒化ガリウム / トランジスタ / 省エネ / MOS
Except Principal Investigator
SiC / MOS界面 / 散乱 / 原子的平坦化 / パワーデバイス / MOSFET / 移動度
  • Research Projects

    (2 results)
  • Research Products

    (1 results)
  • Co-Researchers

    (2 People)
  •  Development of lightly-tilted crystal face trench MOS channels toward the realization of ultra-low resistance GaN power devicesPrincipal Investigator

    • Principal Investigator
      平井 悠久
    • Project Period (FY)
      2022 – 2024
    • Research Category
      Grant-in-Aid for Early-Career Scientists
    • Review Section
      Basic Section 21050:Electric and electronic materials-related
    • Research Institution
      National Institute of Advanced Industrial Science and Technology
  •  SiC-MOS界面特有の散乱体の起源検証とその抑制によるチャネル抵抗低減

    • Principal Investigator
      染谷 満
    • Project Period (FY)
      2021 – 2023
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Review Section
      Basic Section 21050:Electric and electronic materials-related
    • Research Institution
      National Institute of Advanced Industrial Science and Technology

All 2021

All Presentation

  • [Presentation] 4H-SiC非極性面上のMOS界面散乱に対する酸化プロセスの影響2021

    • Author(s)
      染谷満、平井悠久、岡本光央、畠山哲夫、原田信介
    • Organizer
      先進パワー半導体分科会第8回講演会
    • Data Source
      KAKENHI-PROJECT-21K04166
  • 1.  染谷 満 (60783644)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 1 results
  • 2.  升本 恵子 (60635324)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results

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