KOZAWA Takahiro 古澤孝弘

… Alternative Names

古澤孝弘コザワタカヒロ

古沢孝弘フルザワタカヒロ

小澤孝弘コザワタカヒロ

Less

Researcher Number	20251374
Other IDs	https://orcid.org/0009-0004-5240-5859
External Links
Affiliation (Current)	2025: 大阪大学, 産業科学研究所, 教授
Affiliation (based on the past Project Information) *help	2024: 大阪大学, 産業科学研究所, 教授 2011 – 2022: 大阪大学, 産業科学研究所, 教授 2007 – 2010: Osaka University, 産業科学研究所, 准教授 2003 – 2006: 大阪大学, 産業科学研究所, 助教授 1996 – 2002: Inst.Sci.Ind.Research Osaka University, 産業科学研究所, 助手 1994 – 1995: 東京大学, 工学部, 助手
Review Section/Research Field	Principal Investigator Nuclear engineering / Medium-sized Section 31:Nuclear engineering, earth resources engineering, energy engineering, and related fields / エネルギー学一般・原子力学 / Quantum beam science / Nuclear engineering Except Principal Investigator Nuclear engineering / Nuclear engineering / エネルギー学一般・原子力学 / Nanomaterials/Nanobioscience
Keywords	Principal Investigator 放射線、X線、粒子線 / 計算物理 / シミュレーション工学 / 半導体超微細化 / 粒子線 / 放射線 / X線 / データ科学 / レジスト / 熱化過程 … More / 放射線化学 / リソグラフィ / 電子ビーム / 放射線、Ｘ線、粒子線 / X 線 / 原子力エネルギー / 原子・分子物理 / 有機材料 / 二次電子 / ナノ空間 / 微細加工 / 極端紫外光 / 酸 / 化学増幅 / 限界解像度 / ナノテクノロジー / ナノビームプロセス / フェムト秒パルスジオリシス / 分布形状 / 酸発生剤 / 化学増幅型 / レジスト材料 / ナノリソグラフィ / サブピコ秒パルスラジオリシス / 線形加速器 / 磁気パルス圧縮 / Xバンド / 電子線 / フェムト秒 / プロトン / ノボラック / オニウム塩 / パルスラジオリシス / 化学増幅型レジスト … More Except Principal Investigator パルスラジオリシス / DNA / レジスト / pulse radiolysis / 放射線化学初期過程 / 電子線 / レーザー / フェムト秒パルスジオリシス / ナノテクノロジー / フェムト秒パルスラジオリシス / 放射線、X線、粒子線 / ΠーΠ相互作用 / ＥＵＶリソグラフィ / 芳香族分子 / 放射線、Ｘ線、粒子線 / ラジカルイオン / 半導体超微細化 / 極端紫外線（ＥＵＶ） / 放射線化学 / photocathode rf gun / double-decker electron beams / ultrafast reactions / time-resolved spectroscopy / attosecond electron beam / femtosecond electron beam / Ultrafast measurement / アト秒電子線励起時間分解吸収分光 / サブフェムト秒電子パルス / ダブルテッカー電子加速器 / アト秒電子線連記時間分解吸収分光 / サブフェムト秒電子線励起時間分解吸収分光 / フォトカソードRF電子銃加速器 / ダブルデッカー電子加速器 / 電子線励起時間分解吸収分光 / フォトカソードRF電子銃 / ダブルデッカー電子ビーム / 超高速反応解析 / 時間分解呼吸分光 / アト秒電子パルス / フェムト秒電子パルス / 計測工学 / resist / spatiotemporal dynamics / reaction mechanism / diffusion / spatial distribution / nanotechnology / nanostructure / femtosecond pulse radiolysis / モンテカルロシミュレーション / 時間挙動 / 反応機構 / 拡散方程式 / 空間分布 / ナノ構造 / primary processes of radiation chemistry / coherent radiation / guanine / hydrated electron / water / femtosecond / 初期過程 / 生体 / 電子ビーム / コヒーレント放射 / 溶媒和電子 / 遠赤外コヒーレント放射 / グアニン / 水和電子 / 水 / フェムト秒 / Charge Transfer Reaction / Smoluchowski equation / Cation Radical / Electron / Geminate Ion Recombination / Alkane / Picosecond Pulse Radiolysis / Primary Processes / フェムト秒レーザー / 電荷移動反応 / スモルコフスキー方程式 / カチオンラジカル / 電子 / ジェミネートイオン再結合 / アルカン / ピコ秒パルスラジオリシス / 放射線分解初期過程 / x-ray diffraction / short x-ray pulse / linac / electron beam / pulseradiolysis / subpicosecond / 中間活性種 / X線回折 / 極短X線パルス / ライナック / サブピコ秒 / プラズマ / 加速器 / プラズマ加速 / レーザー加速 / plasma acceleration / laser acceleration / ナノ空間 / 熱化過程 / 高分子科学 / 化学増幅レジスト / シミュレーション / 量子ビーム / ナノ時空間反応 / 過渡吸収 / カーボンナノチューブ / ポリゲルマン / ポリシラン / 分子素子 / 共役高分子 / 電極レス / 移動度 / 伝導度 / 孤立分子 / マイクロ波 Less

Reaction mechanism of metal-containing resist for ionizing radiationPrincipal Investigator
- Principal Investigator
  
  古澤孝弘
- Project Period (FY)
  2024 – 2028
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Review Section
  
  Medium-sized Section 31:Nuclear engineering, earth resources engineering, energy engineering, and related fields
- Research Institution
  Osaka University
Development of single nano materials based on quantum beam and data sciencePrincipal Investigator
- Principal Investigator
  
  Kozawa Takahiro
- Project Period (FY)
  2018 – 2022
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Review Section
  
  Medium-sized Section 31:Nuclear engineering, earth resources engineering, energy engineering, and related fields
- Research Institution
  Osaka University
Influence of charge delocalization in nanofabrication induced by ionizing radiations
- Principal Investigator
  
  Okamoto Kazumasa
- Project Period (FY)
  2015 – 2017
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Nuclear engineering
- Research Institution
  Hokkaido University
Study on nanochemistry in latest nanofabrication materials using quantum beamsPrincipal Investigator
- Principal Investigator
  
  Kozawa Takahiro
- Project Period (FY)
  2013 – 2017
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Quantum beam science
- Research Institution
  Osaka University
Study on nanoscale chemical reactions and reaction sites using quantum beamsPrincipal Investigator
- Principal Investigator
  
  KOZAWA Takahiro
- Project Period (FY)
  2010 – 2012
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Nuclear engineering
- Research Institution
  Osaka University
Study on the expanse of thermalized electrons in condensed mattersPrincipal Investigator
- Principal Investigator
  
  KOZAWA Takahiro
- Project Period (FY)
  2009 – 2011
- Research Category
  
  Grant-in-Aid for Challenging Exploratory Research
- Research Field
  
  Nuclear engineering
- Research Institution
  Osaka University
Study on nanoscale chemical reaction for the establishment of scientific foundation of ultrafine patterning using extreme ultraviolet radiationPrincipal Investigator
- Principal Investigator
  
  KOZAWA Takahiro
- Project Period (FY)
  2007 – 2009
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Nuclear engineering
- Research Institution
  Osaka University
Femtosecond Pulse Radiolysis Study on Nanoscale Time Space Reaction Process
- Principal Investigator
  
  TAGAWA Seiichi
- Project Period (FY)
  2005 – 2008
- Research Category
  
  Grant-in-Aid for Scientific Research (S)
- Research Field
  
  Nuclear engineering
- Research Institution
  Osaka University
フェムト秒パルスラジオリシスによる極限ナノビームプロセスの創生Principal Investigator
- Principal Investigator
  
  古澤孝弘
- Project Period (FY)
  2004 – 2006
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Nuclear engineering
- Research Institution
  Osaka University
孤立したナノ構造体・分子素子の電極レス伝導度評価技術の開発
- Principal Investigator
  
  SEKI Shuhei
- Project Period (FY)
  2003 – 2005
- Research Category
  
  Grant-in-Aid for Exploratory Research
- Research Field
  
  Nanomaterials/Nanobioscience
- Research Institution
  Osaka University
Sub-femtosecond/attosecond pulse radiolysis study
- Principal Investigator
  
  YOSHIDA Youichi
- Project Period (FY)
  2003 – 2005
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Nuclear engineering
- Research Institution
  Osaka University
サブピコ秒パルスラジオリシス法によるナノリソグラフィ材料の反応機構の解明と開発Principal Investigator
- Principal Investigator
  
  古澤孝弘
- Project Period (FY)
  2002 – 2003
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Nuclear engineering
- Research Institution
  Osaka University
Femtosecond pulse radiolysis study on reaction mechanism induced in nanostructures
- Principal Investigator
  
  TAGAWA Seiichi
- Project Period (FY)
  2002 – 2004
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Nuclear engineering
- Research Institution
  Osaka University
Study on primary processes of radiation chemistry in aqueous solutions using femtosecond quantum multibeams
- Principal Investigator
  
  TAGAWA Seiichi
- Project Period (FY)
  1999 – 2001
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Nuclear engineering
- Research Institution
  Osaka University
Study of Primary Processes of Radiation Chemistry by using Laser-Synchronized Pulse Radiolysis
- Principal Investigator
  
  YOSHIDA Yoichi
- Project Period (FY)
  1997 – 1998
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  エネルギー学一般・原子力学
- Research Institution
  Osaka University
次世代Xバンド加速によるフェムト秒ライナックの設計Principal Investigator
- Principal Investigator
  
  古澤孝弘
- Project Period (FY)
  1996
- Research Category
  
  Grant-in-Aid for Encouragement of Young Scientists (A)
- Research Field
  
  エネルギー学一般・原子力学
- Research Institution
  Osaka University
Reserch of Ultra-High Gradient Laser-Plasma Accelerator
- Principal Investigator
  
  OGATA Astushi
- Project Period (FY)
  1995 – 1996
- Research Category
  
  Grant-in-Aid for international Scientific Research
- Research Institution
  National Laboratory for High Energy Physics
Study on Subpicosecond Radiation Interactions with Materials
- Principal Investigator
  
  UESAKA Mitsuru
- Project Period (FY)
  1995 – 1996
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  エネルギー学一般・原子力学
- Research Institution
  University of Tokyo
化学増幅型レジストの放射線誘起反応機構の解明Principal Investigator
- Principal Investigator
  
  古澤孝弘
- Project Period (FY)
  1994
- Research Category
  
  Grant-in-Aid for Encouragement of Young Scientists (A)
- Research Field
  
  エネルギー学一般・原子力学
- Research Institution
  The University of Tokyo

[Journal Article] Protected unit distribution near interfaces of chemically amplified resists used for extreme ultraviolet lithography2023
- Author(s)
  Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 62 Issue: 1 Pages: 016509-016509
- DOI
  10.35848/1347-4065/acb0b2
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Stochastic defect generation depending on tetraalkylhydroxide aqueous developers in extreme ultraviolet lithography2023
- Author(s)
  Harumoto Masahiko、dos Santos Andreia Figueiredo、Santillan Julius Joseph、Itani Toshiro、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 62 Issue: 1 Pages: 016503-016503
- DOI
  10.35848/1347-4065/aca9ae
- Peer Reviewed / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Exploration of charge transport materials to improve the radiation tolerance of lead halide perovskite solar cells2022
- Author(s)
  Yoshiyuki Murakami, Ryosuke Nishikubo, Fumitaka Ishiwari, Kazumasa Okamoto, Takahiro Kozawa , Akinori Saeki
- Journal Title
  
  Materials Advances
  
  Volume: 3 Issue: 12 Pages: 4861-4869
- DOI
  10.1039/d2ma00385f
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-22K04986, KAKENHI-PLANNED-20H05836, KAKENHI-PROJECT-18H03895, KAKENHI-PROJECT-20H00398, KAKENHI-PROJECT-20H02784, KAKENHI-PROJECT-21K20558, KAKENHI-PUBLICLY-21H00400, KAKENHI-PUBLICLY-22H04541
[Journal Article] Formulation of trade-off relationships between resolution, line edge roughness, and sensitivity in sub-10 nm half-pitch region for chemically amplified extreme ultraviolet resists2022
- Author(s)
  Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 61 Issue: 1 Pages: 016501-016501
- DOI
  10.35848/1347-4065/ac3ea7
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Estimation of effective reaction radius for catalytic chain reaction of chemically amplified resist by Bayesian optimization2022
- Author(s)
  Jin Yuqing、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 61 Issue: 6 Pages: 066504-066504
- DOI
  10.35848/1347-4065/ac6a36
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Relationship between surface free energy and development process (swelling and dissolution kinetics) of poly(4-hydroxystyrene) film in water and 2.38 wt% tetramethylammonium hydroxide aqueous solution2022
- Author(s)
  Ito Yuko Tsutsui、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 61 Issue: 1 Pages: 016502-016502
- DOI
  10.35848/1347-4065/ac3d42
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Classification of lines, spaces, and edges of resist patterns in scanning electron microscopy images using unsupervised machine learning2022
- Author(s)
  Jin Yuqing、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 61 Issue: 5 Pages: 056505-056505
- DOI
  10.35848/1347-4065/ac56b5
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Interfacial effects on sensitization of chemically amplified extreme ultraviolet resists2022
- Author(s)
  Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 61 Issue: 11 Pages: 116501-116501
- DOI
  10.35848/1347-4065/ac9500
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Effect of surface free energy of organic underlayer on the dissolution kinetics of poly(4-hydroxystyrene) film in tetramethylammonium hydroxide aqueous developer2022
- Author(s)
  Otsuka Tomoe、Jin Yuqing、Tanaka Naoki、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 61 Issue: 5 Pages: 056503-056503
- DOI
  10.35848/1347-4065/ac5947
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Theoretical study on defect risks of chemically amplified resists used for extreme ultraviolet lithography2022
- Author(s)
  Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 61 Issue: 10 Pages: 106502-106502
- DOI
  10.35848/1347-4065/ac8dd1
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Dependence of photoresist dissolution dynamics in alkaline developers on alkyl chain length of tetraalkylammonium hydroxide2022
- Author(s)
  Harumoto Masahiko、Santillan Julius Joseph、Itani Toshiro、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 61 Issue: 5 Pages: 056506-056506
- DOI
  10.35848/1347-4065/ac61f2
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Synthesis and Resist Sensitive Property of Iodine-Containing Materials using Extreme Ultraviolet (EUV) Exposure Tool2022
- Author(s)
  Yutaro Iwashige, Hiroto Kudo, Kazumasa Okamoto, Takahiro Kozawa
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 35 Issue: 1 Pages: 41-47
- DOI
  10.2494/photopolymer.35.41
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2022-12-16
- Language
  English
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-22K04986, KAKENHI-PROJECT-18H03895
[Journal Article] Analysis of mitigating factors for line edge roughness generated during electron beam lithography using machine learning2021
- Author(s)
  Jin Yuqing、Kozawa Takahiro、Tamura Takao
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 60 Issue: 7 Pages: 076509-076509
- DOI
  10.35848/1347-4065/ac0d13
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Dependence of dose rate on the sensitivity of the resist under ultra-high flux extreme ultraviolet (EUV) pulse irradiation2021
- Author(s)
  Okamoto Kazumasa, Kawai Shunpei, Ikari Yuta, Hori Shigeo, Konda Akihiro, Ueno Koki, Arai Yohei, Ishino Masahiko, Thanhhung Dinh, Nishikino Masaharu, Kon Akira, Owada Shigeki, Inubushi Yuichi, Kinoshita Hiroo, Kozawa Takahiro
- Journal Title
  
  Applied Physics Express
  
  Volume: 14 Issue: 6 Pages: 066502-066502
- DOI
  10.35848/1882-0786/abfca3
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-19K15402, KAKENHI-PROJECT-19K05330, KAKENHI-PROJECT-18H03895, KAKENHI-PROJECT-21H03750
[Journal Article] Study on radical dianions of carboxylates used as ligands of metal oxide nanocluster resists2021
- Author(s)
  Ikeuchi Kengo、Muroya Yusa、Ikeda Takuya、Komuro Yoshitaka、Kawana Daisuke、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 60 Issue: 7 Pages: 076503-076503
- DOI
  10.35848/1347-4065/ac06db
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895, KAKENHI-PROJECT-20H02667
[Journal Article] Estimation of electron affinity of photoacid generators: density functional theory calculations using static and dynamic models2021
- Author(s)
  Kazumasa Okamoto, Takahiro Kozawa
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 60 Issue: SC Pages: SCCC03-SCCC03
- DOI
  10.35848/1347-4065/abf469
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19K05330, KAKENHI-PROJECT-18H03895
[Journal Article] Application of machine learning to stochastic effect analysis of chemically amplified resists used for extreme ultraviolet lithography2021
- Author(s)
  Azumagawa Kazuki、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 60 Issue: SC Pages: SCCC02-SCCC02
- DOI
  10.35848/1347-4065/abe802
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists2020
- Author(s)
  Ikari Yuta、Okamoto Kazumasa、Konda Akihiro、Kozawa Takahiro、Tamura Takao
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 59 Issue: 8 Pages: 086506-086506
- DOI
  10.35848/1347-4065/aba7d7
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments2020
- Author(s)
  Yamamoto Hiroki、Dawson Guy、Kozawa Takahiro、Robinson Alex P. G.
- Journal Title
  
  Quantum Beam Science
  
  Volume: 4 Issue: 2 Pages: 1-10
- DOI
  10.3390/qubs4020019
- Peer Reviewed / Open Access / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K14439, KAKENHI-PROJECT-18H03895, KAKENHI-PROJECT-20H02489
[Journal Article] Analysis of trade-off relationships between resolution, line edge roughness, and sensitivity in extreme ultraviolet lithography using lasso regression2020
- Author(s)
  Azumagawa Kazuki、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 59 Issue: 7 Pages: 076501-076501
- DOI
  10.35848/1347-4065/ab984e
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System2020
- Author(s)
  Kudo Hiroto、Fukunaga Mari、Yamada Teppei、Yamakawa Shinji、Watanabe Takeo、Yamamoto Hiroki、Okamoto Kazumasa、Kozawa Takahiro
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 32 Issue: 6 Pages: 805-810
- DOI
  10.2494/photopolymer.32.805
- NAID
  130007789016
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2020-01-31
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Resist thickness dependence of line width roughness of chemically amplified resists used for electron beam lithography2020
- Author(s)
  Maeda Naoki、Konda Akihiro、Okamoto Kazumasa、Kozawa Takahiro、Tamura Takao
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 59 Issue: 8 Pages: 086501-086501
- DOI
  10.35848/1347-4065/ab9fde
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Regression analysis of photodecomposable quencher concentration effects on chemical gradient in chemically amplified extreme ultraviolet resist processes2020
- Author(s)
  Azumagawa Kazuki、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 59 Issue: 11 Pages: 116505-116505
- DOI
  10.35848/1347-4065/abc29d
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Relationship between Resolution Blur and Stochastic Defect of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography2019
- Author(s)
  Kozawa Takahiro、Santillan Julius Joseph、Itani Toshiro
- Journal Title
  
  J. Photopol. Sci. Technol.
  
  Volume: 32 Issue: 1 Pages: 161-167
- DOI
  10.2494/photopolymer.32.161
- NAID
  130007744330
- ISSN
  0914-9244, 1349-6336
- Year and Date
  2019-06-24
- Language
  English
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography2019
- Author(s)
  Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 58 Issue: 9 Pages: 096502-096502
- DOI
  10.7567/1347-4065/ab37ff
- NAID
  210000156877
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Pulse radiolysis of carboxylic acids used as ligands of metal oxide nanocluster resists2019
- Author(s)
  Yamada Teppei、Muroya Yusa、Yamashita Shinichi、Komuro Yoshitaka、Kawana Daisuke、Yamazaki Akiyoshi、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 58 Issue: 9 Pages: 096504-096504
- DOI
  10.7567/1347-4065/ab3911
- NAID
  210000156909
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Incorporation of chemical amplification in dual insolubilization resists2019
- Author(s)
  Enomoto Satoshi、Yoshino Takumi、Machida Kohei、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 58 Issue: 5 Pages: 056504-056504
- DOI
  10.7567/1347-4065/ab0645
- NAID
  210000155634
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Study of electron-beam and extreme-ultraviolet resist utilizing polarity change and radical crosslinking2018
- Author(s)
  Enomoto Satoshi、Kozawa Takahiro
- Journal Title
  
  Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
  
  Volume: 36 Issue: 3 Pages: 031601-031601
- DOI
  10.1116/1.5023061
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Relationship between C=C double bond conversion and dissolution kinetics in cross-linking-type photoresists for display manufacture, studied by real-time Fourier transform infrared spectroscopy and quartz crystal microbalance methods2018
- Author(s)
  Tsuneishi Asuka、Uchiyama Sachiyo、Hayashi Ryouta、Taki Kentaro、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 57 Issue: 9 Pages: 096501-096501
- DOI
  10.7567/jjap.57.096501
- NAID
  210000149643
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Dissolution behavior of negative-type photoresists for display manufacture studied by quartz crystal microbalance method2018
- Author(s)
  Tsuneishi Asuka、Uchiyama Sachiyo、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 57 Issue: 4 Pages: 046501-046501
- DOI
  10.7567/jjap.57.046501
- NAID
  210000148841
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Effects of an organotin compound on radiation-induced reactions of extreme-ultraviolet resists utilizing polarity change and radical crosslinking2018
- Author(s)
  Enomoto Satoshi、Yoshino Takumi、Machida Kohei、Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 58 Issue: 1 Pages: 016504-016504
- DOI
  10.7567/1347-4065/aae986
- NAID
  210000135196
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Comparison of Radical Generation Efficiencies of the Oxime-Based Initiator Radicals Using Galvinoxyl Radical as an Indicator2018
- Author(s)
  A. Tsuneishi, D. Sakamaki, Q. Gao, T. Shoda, T. Kozawa, and S. Seki
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 57(8) Issue: 8 Pages: 86504-86504
- DOI
  10.7567/jjap.57.086504
- NAID
  210000149427
- Peer Reviewed
- Data Source
  KAKENHI-PLANNED-26102011, KAKENHI-PROJECT-18H03895, KAKENHI-PROJECT-17H04874
[Journal Article] Analysis of dissolution factor of line edge roughness formation in chemically amplified electron beam resist2018
- Author(s)
  Kozawa Takahiro
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 57 Issue: 12 Pages: 126502-126502
- DOI
  10.7567/jjap.57.126502
- NAID
  210000149888
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Sensitizers in extreme ultraviolet chemically amplified resist: mechanism of sensitivity improvement2018
- Author(s)
  Yannick Vesters Jing Jiang, Hiroki Yamamoto Danilo De Simone Takahiro Kozawa Stefan De Gendt Geert Vandenberghe
- Journal Title
  
  J. Micro/Nanolith. MEMS. MOEMS
  
  Volume: 17 Issue: 04 Pages: 1-1
- DOI
  10.1117/1.jmm.17.4.043506
- Peer Reviewed / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K14439, KAKENHI-PROJECT-18H03895
[Journal Article] Synthesis of hyperbranched polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene: Resist properties for extreme ultraviolet (EUV) lithography2018
- Author(s)
  Kudo Hiroto、Fukunaga Mari、Shiotsuki Kohei、Takeda Hiroya、Yamamoto Hiroki、Kozawa Takahiro、Watanabe Takeo
- Journal Title
  
  Reactive and Functional Polymers
  
  Volume: 131 Pages: 361-367
- DOI
  10.1016/j.reactfunctpolym.2018.08.013
- NAID
  120006881343
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18H03895
[Journal Article] Ecofriendly ethanol-developable processes for electron beam lithography using positive-tone dextrin resist material2017
- Author(s)
  S. Takei, N. Sugino, M. Hanabata, A. Oshima, M. Kashiwakura, T. Kozawa, and S. Tagawa
- Journal Title
  
  Appl. Phys. Express
  
  Volume: 10 Issue: 7 Pages: 076502-076502
- DOI
  10.7567/apex.10.076502
- NAID
  210000135930
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties by means of Extreme Ultraviolet Irradiation2017
- Author(s)
  H. Yamamoto, H. Kudo, and T. Kozawa
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 30 Pages: 627-631
- NAID
  130006309146
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Synthesis and Property of Tellurium-Containing Polymer for Extreme Ultraviolet Resist Material2017
- Author(s)
  M. Fukunaga, H. Yamamoto, T. Kozawa, T. Watanabe, and H. Kudo
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 30 Pages: 103-107
- NAID
  130005950306
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Theoretical study on effects of photodecomposable quenchers in line-and-space pattern fabrication with 7 nm quarter-pitch using chemically amplified electron beam resist process2017
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 56 Issue: 4 Pages: 046502-046502
- DOI
  10.7567/jjap.56.046502
- NAID
  210000147536
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Rational Tuning of Superoxide Sensitivity in SoxR, the [2Fe-2S] Transcription Factor: Implications of Species-Specific Lysine Residues2017
- Author(s)
  M. Fujikawa, K. Kobayashi, Y. Tsutsui, T. Tanaka, and T. Kozawa
- Journal Title
  
  Biochemistry
  
  Volume: 56 Issue: 2 Pages: 403-410
- DOI
  10.1021/acs.biochem.6b01096
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Sensitivity enhancement of chemically amplified EUV resists by adding acid-generating promoters2017
- Author(s)
  Shinya Fujii, Kazumasa Okamoto, Hiroki Yamamoto, Takahiro Kozawa, Toshiro Itani
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 56 Issue: 6S1 Pages: 06GD01-06GD01
- DOI
  10.7567/jjap.56.06gd01
- NAID
  210000147863
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-15K06662
[Journal Article] Dynamics of Radical Ions of Hydroxyhexafluoroisopropyl-Substituted Benzenes2017
- Author(s)
  K. Okamoto, N. Nomura, R. Fujiyoshi, K. Umegaki, H. Yamamoto, K. Kobayashi, and T. Kozawa
- Journal Title
  
  J. Phys. Chem. A
  
  Volume: 121 Issue: 49 Pages: 9458-9465
- DOI
  10.1021/acs.jpca.7b09842
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036, KAKENHI-PROJECT-15K06662
[Journal Article] Requirement for Suppression of Line Width Roughness in Fabrication of Line-and-Space Patterns with 7 nm Quarter-Pitch Using Electron Beam Lithography with Chemically Amplified Resist Process2016
- Author(s)
  T. Kozawa
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 29 Pages: 809-816
- NAID
  130005338001
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: IV. Comparison with experimental results2016
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 55 Issue: 5 Pages: 056503-056503
- DOI
  10.7567/jjap.55.056503
- NAID
  210000146475
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Dynamics of radical cations of poly(4-hydroxystyrene) in the presence and absence of triphenylsulfonium triflate as determined by pulse radiolysis of its highly concentrated solution2016
- Author(s)
  K. Okamoto, T. Ishida, H. Yamamoto, T. Kozawa, R. Fujiyoshi, and K. Umegaki
- Journal Title
  
  Chem. Phys. Lett.
  
  Volume: 657 Pages: 44-48
- DOI
  10.1016/j.cplett.2016.05.058
- NAID
  120006488393
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036, KAKENHI-PROJECT-15K06662
[Journal Article] Synthesis and Resist Properties of Calixarene Polymers with Pendant Haloalkyl Groups2016
- Author(s)
  H. Kudo, H. Ogawa, H. Yamamoto, and T. Kozawa
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 29 Pages: 495-500
- NAID
  130005256573
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography2016
- Author(s)
  H. Yamamoto, S. Tagawa, T. Kozawa, H. Kudo, and K. Okamoto
- Journal Title
  
  J. Vac. Sci. Technol. B
  
  Volume: 34 Issue: 4 Pages: 041606-041606
- DOI
  10.1116/1.4953068
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036, KAKENHI-PROJECT-26706027
[Journal Article] Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: V. Optimum beam size2016
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 55 Issue: 10 Pages: 106502-106502
- DOI
  10.7567/jjap.55.106502
- NAID
  210000147139
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Relationships between quencher diffusion constant and exposure dose dependences of line width, line edge roughness, and stochastic defect generation in extreme ultraviolet lithography2015
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 54 Issue: 1 Pages: 016502-016502
- DOI
  10.7567/jjap.54.016502
- NAID
  210000144712
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Effects of dose shift on line width, line edge roughness, and stochastic defect generation in chemically amplified extreme ultraviolet resist with photodecomposable quencher2015
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 54 Issue: 1 Pages: 016503-016503
- DOI
  10.7567/jjap.54.016503
- NAID
  210000144713
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Modeling and simulation of acid generation in anion-bound chemically amplified resists used for extreme ultraviolet lithography2015
- Author(s)
  Y. Komuro, D. Kawana, T. Hirayama, K. Ohomori, and T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 54 Issue: 3 Pages: 036506-036506
- DOI
  10.7567/jjap.54.036506
- NAID
  210000144872
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Effects of diffusion constant of photodecomposable quencher on chemical gradient of chemically amplified extreme-ultraviolet resists2015
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 54 Issue: 5 Pages: 056502-056502
- DOI
  10.7567/jjap.54.056502
- NAID
  210000145155
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Optimum concentration ratio of photodecomposable quencher to acid generator in chemically amplified extreme ultraviolet resists2015
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 54 Issue: 12 Pages: 126501-126501
- DOI
  10.7567/jjap.54.126501
- NAID
  210000145864
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Dynamics of radical ions of fluorinated polymer for Extreme Ultraviolet (EUV) lithography2015
- Author(s)
  N. Nomura, K. Okamoto, H. Yamamoto, T. Kozawa, R. Fujiyoshi, K. Umegaki
- Journal Title
  
  Proc. SPIE
  
  Volume: 9658 Pages: 96581C-96581C
- DOI
  10.1117/12.2193060
- Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-15K06662, KAKENHI-PROJECT-25630424
[Journal Article] Study on Dissolution Behavior of Poly(4-hydroxystyrene) as Model Polymer of Chemically Amplified Resists for Extreme Ultraviolet Lithography2015
- Author(s)
  M. Mitsuyasu, H. Yamamoto, and T. Kozawa
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 28 Pages: 119-124
- NAID
  130005090251
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Acid Quantum Efficiency of Anion-bound Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation2015
- Author(s)
  Y. Komuro, D. Kawana, T. Hirayama, K. Ohmori, and T. Kozawa
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 28 Pages: 501-505
- NAID
  130005101106
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Resist material options for extreme ultraviolet lithography2015
- Author(s)
  T. Kozawa
- Journal Title
  
  Adv. Opt. Techn.
  
  Volume: 4 Pages: 311-317
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Relationship between stochasticity and wavelength of exposure source in lithography2014
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 53 Issue: 6 Pages: 066505-066505
- DOI
  10.7567/jjap.53.066505
- NAID
  210000144040
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Acid diffusion length in contact hole imaging of chemically amplified extreme ultraviolet resists2014
- Author(s)
  T. Kozawa and T. Hirayama
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 53 Issue: 1 Pages: 16503-16503
- DOI
  10.7567/jjap.53.016503
- NAID
  210000143250
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Theoretical relationship between quencher diffusion constant and effective reaction radius for neutralization in contact hole imaging using chemically amplified extreme ultraviolet resists2014
- Author(s)
  T. Kozawa and T. Hirayama
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 53 Issue: 6 Pages: 066502-066502
- DOI
  10.7567/jjap.53.066502
- NAID
  210000144037
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Effect of photodecomposable quencher on latent image quality in extreme ultraviolet lithography2014
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 53 Issue: 6 Pages: 066508-066508
- DOI
  10.7567/jjap.53.066508
- NAID
  210000144043
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography2014
- Author(s)
  Y. Komuro, H. Yamamoto, K. Kobayashi, Y. Utsumi, K. Ohomori, and T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 53 Issue: 11 Pages: 116503-116503
- DOI
  10.7567/jjap.53.116503
- NAID
  210000144600
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Theoretical Relationship between Quencher Diffusion Constant and Image Quality in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography2013
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 52 Issue: 7R Pages: 76504-76504
- DOI
  10.7567/jjap.52.076504
- NAID
  210000142465
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Chemical Gradient of Contact Hole Latent Image Created in Chemically Amplified ExtremeUltraviolet Resists2013
- Author(s)
  T. Kozawa and T. Hirayama
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 52巻 Issue: 4R Pages: 46502-46502
- DOI
  10.7567/jjap.52.046502
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Stochastic Effect on Contact Hole Imaging of Chemically Amplified Extreme Ultraviolet Resists2013
- Author(s)
  T. Kozawa and T. Hirayama
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 52 Issue: 8R Pages: 86501-86501
- DOI
  10.7567/jjap.52.086501
- NAID
  40019757406
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Deprotonation of poly(4-hydroxystyrene) intermediates: pulse radiolysis study of EUV and electron beam resist2013
- Author(s)
  Kazumasa Okamoto, Tyo Matsuda, Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Ryoko Fujiyoshi, and Takashi Sumiyoshi
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 52 Issue: 6S Pages: 06GC04-06GC04
- DOI
  10.7567/jjap.52.06gc04
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24561037, KAKENHI-PROJECT-25246036, KAKENHI-PROJECT-25630424
[Journal Article] Effect of Initial Dispersion of Protected Units on Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resists2013
- Author(s)
  T. Kozawa
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 26 Pages: 643-648
- NAID
  130004465046
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-25246036
[Journal Article] Theoretical Study on Acid Diffusion Length in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography2013
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 52巻 Issue: 1R Pages: 16501-16501
- DOI
  10.7567/jjap.52.016501
- NAID
  210000141741
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in ExtremeUltraviolet Lithography2013
- Author(s)
  Y. Komuro, H. Yamamoto, Y. Utsumi, K. Ohomori, and T. Kozawa
- Journal Title
  
  Appl. Phys. Express
  
  Volume: 6巻 Issue: 1 Pages: 14001-14001
- DOI
  10.7567/apex.6.014001
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Lower Limit of Line Edge Roughness in High-Dose Exposure of Chemically Amplified Extreme Ultraviolet Resists2012
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 51巻 Issue: 6S Pages: 06FC01-06FC01
- DOI
  10.1143/jjap.51.06fc01
- NAID
  210000140711
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Relationship between Stochastic Effect and Line Edge Roughness in Chemically Amplified Resists for Extreme Ultraviolet Lithography Studied by Monte Carlo Simulation2012
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 51巻 Issue: 8R Pages: 86504-86504
- DOI
  10.1143/jjap.51.086504
- NAID
  40019395627
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Effect of Ultrahigh-Density Ionization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser2012
- Author(s)
  K. Okamoto, T. Kozawa, K. Oikawa, T. Hatsui, M. Nagasono, T. Kameshima, T. Togashi, K. Tono, M. Yabashi, H. Kimura, Y. Senba, H. Ohashi, R. Fujiyoshi, and T. Sumiyoshi
- Journal Title
  
  Appl. Phys. Express
  
  Volume: 5巻 Issue: 9 Pages: 96701-96701
- DOI
  10.1143/apex.5.096701
- NAID
  40019425422
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128, KAKENHI-PROJECT-24561037
[Journal Article] Relationship between Absorption Coefficient and Line Edge Roughness of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography2012
- Author(s)
  T. Kozawa
- Journal Title
  
  J. Photopolym. Sci. Technol.
  
  Volume: 25 Pages: 625-631
- NAID
  130004833489
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Relationship between Absorption Coefficient and Line Edge Roughness of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography2012
- Author(s)
  T. Kozawa
- Journal Title
  
  J. Photopolym. Sci. Technol
  
  Volume: 25巻 Pages: 625-631
- NAID
  130004833489
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Stochastic Effect of Acid Catalytic Chain Reaction in Chemically Amplified Extreme Ultraviolet Resists2012
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 51巻 Issue: 11R Pages: 116503-116503
- DOI
  10.1143/jjap.51.116503
- NAID
  40019496245
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Effect of Molecular Weight and Protection Ratio on Latent Image Fluctuation of Chemically Amplified ExtremeUltraviolet Resists2012
- Author(s)
  T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 51巻 Issue: 12R Pages: 126501-126501
- DOI
  10.1143/jjap.51.126501
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Resist Properties Required for 6.67nm Extreme Ultraviolet Lithography2012
- Author(s)
  T. Kozawa and A. Erdmann
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 51巻 Issue: 10R Pages: 106701-106701
- DOI
  10.1143/jjap.51.106701
- NAID
  40019456428
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist2011
- Author(s)
  T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 50巻 Issue: 12R Pages: 126501-126501
- DOI
  10.1143/jjap.50.126501
- NAID
  40019141217
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Effect of Acid Generator Decomposition during Exposure on Acid Image Quality of Chemically Amplified Extreme Ultraviolet Resists2011
- Author(s)
  T. Kozawa and S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 50巻 Issue: 7R Pages: 76505-76505
- DOI
  10.1143/jjap.50.076505
- NAID
  40018915999
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Geminate Charge Recombination in Liquid Alkane with Concentrated CCl4 : Effects of CCl4 Radical Anion and Narrowing of Initial Distribution of Cl-2011
- Author(s)
  A.Saeki, N.Yamamoto, Y.Yoshida, T.Kozawa
- Journal Title
  
  J.Phys.Chem.A
  
  Volume: 115 Issue: 36 Pages: 10166-10173
- DOI
  10.1021/jp205989r
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20686064, KAKENHI-PROJECT-21656238
[Journal Article] Determination of Optimum Thermalization Distance Based on Trade-off Relationship between Resolution, Line Edge Roughness, and Sensitivity of Chemically Amplified Extreme Ultraviolet Resists2011
- Author(s)
  T. Kozawa and S. Tagawa
- Journal Title
  
  J. Photopolym. Sci. Technol
  
  Volume: 24巻 Pages: 137-142
- NAID
  130004833385
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Assessment and Extendibility of Chemically Amplified Resists for Extreme Ultraviolet Lithography: Consideration of Nanolithography beyond 22nm Half-Pitch2011
- Author(s)
  T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 50巻 Issue: 7R Pages: 76503-76503
- DOI
  10.1143/jjap.50.076503
- NAID
  40018915997
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Thermalization Distance of Electrons Generated in Poly(4-hydroxystyrene) Film Containing Acid Generator upon Exposure to Extreme Ultraviolet Radiation2011
- Author(s)
  T. Kozawa and S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 50巻 Issue: 3R Pages: 30209-30209
- DOI
  10.1143/jjap.50.030209
- NAID
  210000070073
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Determination of Optimum Thermalization Distance Based on Trade-off Relationship between Resolution, Line Edge Roughness, and Sensitivity of Chemically Amplified Extreme Ultraviolet Resists2011
- Author(s)
  T.Kozawa, S.Tagawa
- Journal Title
  
  J.Photopolym.Sci.Technol.
  
  Volume: 24 Pages: 137-142
- NAID
  130004833385
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Radiation Chemistry in Chemically Amplified Resists2010
- Author(s)
  T. Kozawa and S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 49巻 Issue: 3R Pages: 30001-30001
- DOI
  10.1143/jjap.49.030001
- NAID
  40017033684
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Dynamics of Radical Cation of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Extreme-Ultraviolet and Electron Beam Lithographies2010
- Author(s)
  K. Okamoto, M. Tanaka, T. Kozawa, and S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 49巻 Issue: 10R Pages: 106501-106501
- DOI
  10.1143/jjap.49.106501
- NAID
  40017341248
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128, KAKENHI-PROJECT-22760669
[Journal Article] Radiation Chemistry of Fluoronbphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists2010
- Author(s)
  S.Ikeda, K.Okamoto, H.Yamamoto, A.Saeki, S.Tagawa, T.Kozawa
- Journal Title
  
  Jpn.J.Appl.Phys.
  
  Volume: 49 Pages: 96504-96504
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Diffusion Control Using Matrix Change during Chemical Reaction for Inducing Anisotropic Diffusion in Chemically Amplified Resists2010
- Author(s)
  T.Kozawa, H.Oizumi, T.Itani, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys.
  
  Volume: 49 Pages: 36506-36506
- NAID
  40017033747
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Formation and Decay of Fluorobenzene Radical Anions Affected by Their Isomeric Structures and the Number of Fluorine Atoms2010
- Author(s)
  S.Higashino, A.Saeki, K.Okamoto, S.Tagawa, T.Kozawa
- Journal Title
  
  J.Phys.Chem.A
  
  Volume: 114 Pages: 8069-8074
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography2010
- Author(s)
  T.Kozawa, H.Oizumi, T.Itani, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys.
  
  Volume: 49 Pages: 66504-66504
- NAID
  40017176043
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography2010
- Author(s)
  T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 49巻 Issue: 6R Pages: 66504-66504
- DOI
  10.1143/jjap.49.066504
- NAID
  40017176043
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Dynamics of Radical Cation of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Extreme-Ultraviolet and Electron Beam Lithographies2010
- Author(s)
  K.Okamoto, M.Tanaka, T.Kozawa, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys.
  
  Volume: 49 Pages: 106501-106501
- NAID
  40017341248
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Radiation Chemistry in Chemically Amplified Resists2010
- Author(s)
  T.Kozawa, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys.
  
  Volume: 49 Pages: 30001-30001
- NAID
  40017033684
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Radiation Chemistry of Fluoronaphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists2010
- Author(s)
  S. Ikeda, K. Okamoto, H. Yamamoto, A. Saeki, S. Tagawa, T. Kozawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 49巻 Issue: 9R Pages: 96504-96504
- DOI
  10.1143/jjap.49.096504
- NAID
  40017294753
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Diffusion Control Using Matrix Change during Chemical Reaction for Inducing Anisotropic Diffusion in Chemically Amplified Resists2010
- Author(s)
  T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 49巻 Issue: 3R Pages: 36506-36506
- DOI
  10.1143/jjap.49.036506
- NAID
  40017033747
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246128
[Journal Article] Formation and Decay of Fluorobenzene Radical Anions Affected by Their Isomeric Structures and the Number of Fluorine Atoms2010
- Author(s)
  S. Higashino, A. Saeki, K. Okamoto, S. Tagawa, T. Kozawa
- Journal Title
  
  J. Phys. Chem. A
  
  Volume: 114巻 Issue: 31 Pages: 8069-8074
- DOI
  10.1021/jp102828g
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Latent Image Created Using Small-Field Exposure Tool for Extreme Ultraviolet Lithography2009
- Author(s)
  T.Kozawa, H.Oizumi, T.Itani, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 48
  
  Pages: 106506-106506
- NAID
  40016796079
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] 放射線化学に基づく化学増幅型EB・EUVレジスト材料・プロセスの研究2009
- Author(s)
  古澤孝弘
- Journal Title
  
  放射線化学 87巻
  
  Pages: 2-13
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Correlation between C37 Parameters and Acid Yields in Chemically Amplified Resists upon Exposure to 75 keV Electron Beam2009
- Author(s)
  K.Natsuda, T.Kozawa, K.Okamoto, A.Saeki, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 48
  
  Pages: 6-5
- NAID
  210000066905
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Evaluation of Chemical Gradient Enhancement Methods for Chemically Amplified Extreme Ultraviolet Resists2009
- Author(s)
  T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 48巻 Issue: 12 Pages: 126004-126004
- DOI
  10.1143/jjap.48.126004
- NAID
  40016890521
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Dynamics of Radical Cation of Poly(4-hydroxystyrene) and Its Copolymer for Extreme Ultraviolet and Electron Beam Resists2009
- Author(s)
  K. Okamoto, M. Tanaka, T. Kozawa, S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys 48巻
- NAID
  210000066906
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] 放射線化学に基づく化学増幅型EB・EUVレジスト材料・プロセスの研究2009
- Author(s)
  古澤孝弘
- Journal Title
  
  放射線化学 87
  
  Pages: 2-13
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Latent Image Created Using Small-Field Exposure Tool for Extreme Ultraviolet Lithography2009
- Author(s)
  T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 48巻 Issue: 10 Pages: 106506-106506
- DOI
  10.1143/jjap.48.106506
- NAID
  40016796079
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Correlation between C37 Parameters and Acid Yields in Chemically Amplified Resists upon Exposure to 75 keV Electron Beam2009
- Author(s)
  K. Natsuda, T. Kozawa, K. Okamoto, A. Saeki, and S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 48巻 Issue: 6S Pages: 06FC05-06FC05
- DOI
  10.1143/jjap.48.06fc05
- NAID
  210000066905
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Reactivity of Haloge nated Resist Polymer with Low-Energy Electrons2009
- Author(s)
  H.Yamamoto, T.Kozawa, A.Saeki, S.Tagawa, T.Mimura, H.Yukawa, J.Onodera
- Journal Title
  
  Jpn.J.Appl.Phys. 48
  
  Pages: 6-9
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Evaluation of Chemical Gradient Enhancement Methods for Chemically Amplified Extreme Ultraviolet Resists2009
- Author(s)
  T.Kozawa, H.Oizumi, T.Itani, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 48
  
  Pages: 126004-126004
- NAID
  40016890521
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Effect of Polymer Protection and Film Thickness on Acid Generator Distribution in Chemically Amplified Resists2009
- Author(s)
  T. Fukuyama, T. Kozawa, H. Yamamoto, S. Tagawa, M. Irie, T. Mimura, T. Iwai, J. Onodera, I. Hirosawa, T. Koganesawa, K. Horie
- Journal Title
  
  J. Photopolym. Sci. Technol 22巻
  
  Pages: 105-109
- NAID
  40016635401
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Effect of Molecular Structure on Depth Profile of Acid Generator Distribution in Chemically Amplified Resist Films2009
- Author(s)
  T.Fukuyama, T.Kozawa, K.Okamoto, S.Tagawa, M.Irie, T.Mimura, T.Iwai, J.Onodera, I.Hirosawa, T.Koganesawa, K.Horie
- Journal Title
  
  Jpn.J.Appl.Phys. 48
- NAID
  210000066903
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Effect of Polymer Protection and Film Thickness on Acid Generator Distribution in Chemically Amplified Resists2009
- Author(s)
  T.Fukuyama, T.Kozawa, H.Yamamoto, S.Tagawa, M.Irie, T.Mimura, T.Iwai, J.Onodera, I.Hirosawa, T.Koganesawa, K.Horie
- Journal Title
  
  J.Photopolym.Sci.Technol. 22
  
  Pages: 105-109
- NAID
  40016635401
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Effect of Molecular Structure on Depth Profile of Acid Generator Distribution in Chemically Amplified Resist Films2009
- Author(s)
  T. Fukuyama, T. Kozawa, K. Okamoto, S. Tagawa, M. Irie, T. Mimura, T. Iwai, J. Onodera, I. Hirosawa, T. Koganesawa, K. Horie
- Journal Title
  
  Jpn. J. Appl. Phys 48巻
- NAID
  210000066903
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Dynamics of Radical Cation of Poly (4-hydroxystyrene) and Its Copolymer for Extreme Ultraviolet and Electron Beam Resists2009
- Author(s)
  K.Okamoto, M.Tanaka, T.Kozawa, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 48
- NAID
  210000066906
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Reactivity of Halogenated Resist Polymer with Low-Energy Electrons2009
- Author(s)
  H. Yamamoto, T. Kozawa, A. Saeki, S. Tagawa, T. Mimura, H. Yukawa, and J. Onodera
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: 48巻 Issue: 6S Pages: 06FC09-06FC09
- DOI
  10.1143/jjap.48.06fc09
- NAID
  210000066909
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21656238
[Journal Article] Resolution degradation caused by multispur effect in chemically amplified extreme ultraviolet resists2008
- Author(s)
  T. Kozawa, S. Tagawa, M. Shell
- Journal Title
  
  J. Appl. Phys 103巻
  
  Pages: 84306-84306
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons2008
- Author(s)
  K. Natsuda, T. Kozawa, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 47 Pages: 4932-4935
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] X-ray reflectivity study on depth profile of acid generator distribution in chemically amplified resists2008
- Author(s)
  T. Fukuyama, T. Kozawa, S. Tagawa, R. Takasu, H. Yukawa, M. Sato, J. Onodera, I. Hirosawa, T. Koganesawa, K. Horie
- Journal Title
  
  Appl. Phys. Express 1
  
  Pages: 65004-65004
- NAID
  10025081173
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Resolution degradation caused by multispur effect in chemically amplified extreme ultraviolet resists2008
- Author(s)
  T. Kozawa, S. Tagawa, M. Shell
- Journal Title
  
  J. Appl. Phys. (2008) 103
  
  Pages: 84306-84306
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Formation of Intramolecular Poly(4-hydroxystyrene) Dimer Radical Cation2008
- Author(s)
  K. Okamoto, T. Kozawa, K. Natsuda, S. Seki, and S. Tagawa
- Journal Title
  
  J. Phys. Chem B 112
  
  Pages: 9275-9280
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons2008
- Author(s)
  K. Natsuda, T. Kozawa, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
- Journal Title
  
  Jpn. J. Appl. Phys. 47
  
  Pages: 4932-4935
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Theoretical Study on the Dependence of Acid Distribution on Material Properties of Chemically Amplified Extreme Ultraviolet Resists2008
- Author(s)
  T. Kozawa, S. Tagawa, M. Shell
- Journal Title
  
  Jpn. J. Appl. Phys. 47
  
  Pages: 6288-6292
- NAID
  40016210997
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Effects of Rate Constant for Deprotection on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists2008
- Author(s)
  T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 47 Pages: 4926-4931
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Resolution degradation caused by multispur effect in chemically amplified extreme ultraviolet resists2008
- Author(s)
  T. Kozawa, S. Tagawa, M. Shell
- Journal Title
  
  J. Appl. Phys.
  
  Volume: 103 Pages: 84306-84306
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography2008
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa, H. Yukawa, M. Sato, J. Onodera
- Journal Title
  
  Appl. Phys. Express 1
  
  Pages: 47001-47001
- NAID
  10025080127
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Latent image formation in chemically amplified extreme ultraviolet resists with low activation energy for deprotection reaction2008
- Author(s)
  T. Kozawa, S. Tagawa J. J. Santillan, T. Itani
- Journal Title
  
  J. Vac. Sci. Technol. B
  
  Volume: 26 Pages: 2257-2260
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] heoretical Study on the Dependence of Acid Distribution on Material Properties of Chemically Amplified Extreme Ultraviolet Resists2008
- Author(s)
  T. Kozawa, S. Tagawa, M. Shell
- Journal Title
  
  Jpn. J. Appl. Phys 47巻
  
  Pages: 6288-6292
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Difference between Acid Generation Mechanisms in Poly(hydroxystyrene)- and Polyacrylate-Based Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation2008
- Author(s)
  R. Hirose, T. Kozawa, S. Tagawa, D. Shimizu, T. Kai, T. Shimokawa
- Journal Title
  
  Jpn. J. Appl. Phys. 47
  
  Pages: 7125-7127
- NAID
  40016294928
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248 nm and Dry/Wet 193 nm Resists2008
- Author(s)
  Y. Matsui, H. Sugawara, S. Seki, T. Kozawa, S. Tagawa, T. Itani
- Journal Title
  
  Appl. Phys. Express
  
  Volume: 1 Pages: 36001-36001
- NAID
  10025079690
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm Fabrication2008
- Author(s)
  T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 47 Pages: 4465-4468
- NAID
  40016110961
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons2008
- Author(s)
  K. Natsuda, T. Kozawa, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
- Journal Title
  
  Jpn. J. Appl. Phys 47巻
  
  Pages: 4932-4935
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Dependence of Acid Generation Efficiency on Molecular Structures of Acid Generators upon Exposure to Extreme Ultraviolet Radiation2008
- Author(s)
  R. Hirose, T. Kozawa, S. Tagawa, T. Kai, T. Shimokawa
- Journal Title
  
  Appl. Phys. Express
  
  Volume: 1 Pages: 27004-27004
- NAID
  10025079296
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Stroboscopic picosecond pulse radiolysis using near-ultraviolet-enhanced femtosecond continuum generated by CaF22007
- Author(s)
  A. Saeki, T. Kozawa, K. Okamoto, and S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys 46
  
  Pages: 407-411
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Acid distribution in chemically amplified extreme ultraviolet resist2007
- Author(s)
  T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, M. J. Leeson
- Journal Title
  
  J. Vac. Sci. Technol. B
  
  Volume: 25 Pages: 2481-2485
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography2007
- Author(s)
  T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
- Journal Title
  
  J. Vac. Sci. Technol. B
  
  Volume: 25 Pages: 2295-2300
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Acid distribution in chemically amplified extreme ultraviolet resist2007
- Author(s)
  T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, and M. J. Leeson
- Journal Title
  
  J. Vac. Sci. Technol. B 25
  
  Pages: 2481-2485
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Subpicosecond pulse radiolysis in liquid methyl-substituted benzene derivatives, Radiat2007
- Author(s)
  K. Okamoto, T. Kozawa, A. Saeki, Y. Yoshida, and S. Tagawa
- Journal Title
  
  Phys. Chem 76
  
  Pages: 818-826
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists Used for Electron-Beam Lithography2007
- Author(s)
  T. Kozawa, S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys 46巻
- NAID
  210000063830
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Reactivity between Biphenyl and Precursor of Solvated Electrons in Tetrahydrofuran Measured by Picosecond Pulse Radiolysis in Near-ultraviolet, Visible, and Infrared2007
- Author(s)
  A. Saeki, T. Kozawa, Y. Ohnishi, and S. Tagawa
- Journal Title
  
  J. Phys. Chem. A 111
  
  Pages: 1229-1235
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Study of Acid-Base Equilibrium in Chemically Amplified Resist2007
- Author(s)
  K. Natsuda, T. Kozawa, K. Okamoto, S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys 46巻
  
  Pages: 7285-7289
- NAID
  40015705098
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists Used for Electron-Beam Lithography2007
- Author(s)
  T. Kozawa and S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys. 46
- NAID
  210000063830
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Stroboscopic picosecond pulse radiolysis using near-ultraviolet-enhanced femtosecond continuum generated by CaF_22007
- Author(s)
  A. Saeki, T. Kozawa, K. Okamoto, and S. Tagawa,
- Journal Title
  
  Jpn. J. Appl. Phys. 46
  
  Pages: 407-411
- NAID
  10018705573
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Reactivity between Biphenyl and Precursor of Solvated Electrons in Tetrahydrofuran Measured by Picosecond Pulse Radiolysis in Near-ultraviolet, Visible, and Infrared2007
- Author(s)
  A. Saeki, T. Kozawa, Y. Ohnishi, and S. Tagawa
- Journal Title
  
  Reactivity between Biphenyl and Precursor of Solvated Electrons in Tetrahydrofuran Measured by Picosecond Pulse Radiolysis in Near-ultraviolet, Visible, and Infrared A 111
  
  Pages: 1229-1235
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified Resist for Extreme Ultraviolet Lithography2007
- Author(s)
  R. Hirose, T. Kozawa, S. Tagawa, T. Kai, T. Shimokawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 46
- NAID
  40015671035
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Polymer structure dependence of acid generation in chemically amplified extreme ultraviolet resists2007
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, M. J. Leeson
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 46
- NAID
  10018868104
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists Used for Electron-Beam Lithography2007
- Author(s)
  T. Kozawa, S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 46
- NAID
  210000063830
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Theoretical Study on Relationship between Acid Generation Efficiency and Acid Generator Concentration in Chemically Amplified Extreme Ultraviolet Resists2007
- Author(s)
  T. Kozawa, S. Tagawa, M. Shell
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 46
- NAID
  210000063809
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer2007
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa, K. Ohmori, M. Sato, and H. Komano,
- Journal Title
  
  Jpn. J. Appl. Phys. 46
- NAID
  40015511976
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Sensitization Distance and Acid Generation Efficiency in a Model System of Chemically Amplified Electron Beam Resist with Methacrylate Backbone Polymer2007
- Author(s)
  T. Kozawa, S. Tagawa, T. Kai, and T. Shimokawa
- Journal Title
  
  J. Photopolym. Sci. Technol. 20
  
  Pages: 577-583
- NAID
  130004464589
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Study of Acid-Base Equilibrium in Chemically Amplified Resist2007
- Author(s)
  K. Natsuda, T. Kozawa, K. Okamoto, and S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys. 46
  
  Pages: 7285-7289
- NAID
  40015705098
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness2007
- Author(s)
  H. Yamamoto, T. Kozawa, A. Saeki, K. Okamoto, S. Tagawa, K. Ohmori, M. Sato, and H. Komano,
- Journal Title
  
  Jpn. J. Appl. Phys. 46
  
  Pages: 6187-6190
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Study of Acid-Base Equilibrium in Chemically Amplified Resist2007
- Author(s)
  K. Natsuda, T. Kozawa, K. Okamoto, S. Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 46 Pages: 7285-7289
- NAID
  40015705098
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Subpicosecond pulse radiolysis in liquid methyl-substituted benzene derivatives2007
- Author(s)
  K. Okamoto, T. Kozawa, A. Saeki, Y. Yoshida, and S. Tagawa
- Journal Title
  
  Radiat. Phys. Chem. 76
  
  Pages: 818-826
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Acid distribution in chemically amplified extreme ultraviolet resist2007
- Author(s)
  T. Kozawa, S. Tagawa, H.B. Cao, H. Deng, M.J. Leeson
- Journal Title
  
  J. Vac. Sci. Technol. B 25巻
  
  Pages: 2481-2485
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19360428
[Journal Article] Resolution blur of latent acid image and acid generation efficiency of chemically amplified resists for electron beam lithography2006
- Author(s)
  T.Kozawa, S.Tagawa
- Journal Title
  
  J. Appl. Phys. 99
  
  Pages: 54509-54509
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Line edge roughness of a latent image in post-optical lithography2006
- Author(s)
  A. Saeki, T. Kozawa, S. Tagawa, H. B. Cao
- Journal Title
  
  Nanotechnology
  
  Volume: 17 Pages: 1543-1546
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons2006
- Author(s)
  A. Nakano, T. Kozawa, S. Tagawa, T. Szreder, J. F. Wishart, T. Kai, T. Shimokawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 45
- NAID
  10018159212
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Picosecond pulse radiolysis using femtosecond white light with a high S/N spectrum acquisition system in one beam shot2006
- Author(s)
  A.Saeki, T.Kozawa, S.Tagawa
- Journal Title
  
  Nucl. Instrum. Meth. A 556
  
  Pages: 391-396
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Pulse radiolysis of polystyrene in cyclohexane -Effect of carbon tetrachloride on kinetic dynamics of dimer radical cation-2006
- Author(s)
  K.Okamoto, T.Kozawa, M.Miki, Y.Yoshida, S.Tagawa
- Journal Title
  
  Chem. Phys. Lett. 426
  
  Pages: 306-310
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Acid Generation Mechanism of Poly (4-hydroxystyrene) -Based Chemically Amplified Resists for Post-Optical Lithography : Acid Yield and Deprotonation Behavior of Poly (4-hydroxystyrene) and Poly (4-methoxystyrene)2006
- Author(s)
  A. Nakano, T. Kozawa, K. Okamoto, S. Tagawa, T. Kai, T. Shimokawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 45 Pages: 6866-6871
- NAID
  10018245439
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Resolution blur of latent acid image and acid generation efficiency of chemically amplified resists for electron beam lithography2006
- Author(s)
  T. Kozawa and S. Tagawa
- Journal Title
  
  J. Appl. Phys 99
  
  Pages: 54509-54509
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Picosecond pulse radiolysis using femtosecond white light with a high S/N spectrum acquisition system in one beam shot, Nucl2006
- Author(s)
  A. Saeki, T. Kozawa, and S. Tagawa
- Journal Title
  
  Instrum. Meth A 556
  
  Pages: 391-396
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Reaction mechanism of fluorinated chemically amplified resists2006
- Author(s)
  H. Yamamoto, T. Kozawa, K. Okamoto, A. Saeki, S. Tagawa, T. Ando, M. Sato, H. Komano
- Journal Title
  
  J. Vac. Sci. Technol. B
  
  Volume: 24 Pages: 1833-1836
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Effects of Low Energy Electrons on Pattern Formation in Chemically Amplified Resist2006
- Author(s)
  T.Kozawa, H.Yamamoto, A.Saeki, S.Tagawa
- Journal Title
  
  J. Photopolym. Sci. Technol. 19
  
  Pages: 361-366
- NAID
  130004833103
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Resolution blur of latent acid image and acid generation efficiency of chemically amplified resists for electron beam lithography2006
- Author(s)
  T.Kozawa, S.Tagawa
- Journal Title
  
  J. Appl. Phys. 99
  
  Pages: 54509-54509
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Femtosecond single electron bunch generation by rotating longitudinal bunch phase space in magnetic field2006
- Author(s)
  J. Yang, T. Kondoh, K. Kan, T. Kozawa, Y. Yoshida, S. Tagawa
- Journal Title
  
  Nucl. Instrum. Meth. A
  
  Volume: 556 Pages: 52-56
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Femtosecond single electron bunch generation by rotating longitudinal bunch phase space in magnetic field2006
- Author(s)
  J.Yang, T.Kondoh, K.Kan, T.Kozawa, Y.Yoshida, S.Tagawa
- Journal Title
  
  Nuclear Instruments and Methods in Physics Research A 556
  
  Pages: 52-56
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Protonation sites in chemically amplified resists for electron beam lithography2006
- Author(s)
  K.Natsuda, T.Kozawa, K.Okamoto, S.Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys. 45
- NAID
  10018460952
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Equivalent Velocity Spectroscopy for Femtosecond Pulse Radiolysis2006
- Author(s)
  T.Kondoh, J.Yang, T.Kozawa, S.Tagawa, Y.Yoshida
- Journal Title
  
  Japanese Journal of Applied Physics (in press)
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist2006
- Author(s)
  T. Shigaki, K. Okamoto, T. Kozawa, H. Yamamoto, S. Tagawa, T. Kai, T. Shimokawa
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 45 Pages: 5735-5737
- NAID
  10017999650
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Protonation sites in chemically amplified resists for electron beam lithography2006
- Author(s)
  K.Natsuda, T.Kozawa, K.Okamoto, S.Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys. 45
- NAID
  10018460952
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Femtosecond single electron bunch generation by rotating longitudinal bunch phase space in magnetic field2006
- Author(s)
  J.Yang, T.Kondoh, K.Kan, T.Kozawa, Y.Yoshida, S.Tagawa
- Journal Title
  
  Nucl.Instr.and Meth.A 556
  
  Pages: 52-56
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Pulse radiolysis of polystyrene in cyclohexane -Effect of carbon tetrachloride on kinetic dynamics of dimer radical cation-2006
- Author(s)
  K.Okamoto, T.Kozawa, M.Miki, Y.Yoshida, S.Tagawa
- Journal Title
  
  Chem. Phys. Lett. 426
  
  Pages: 306-310
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Protonation sites in chemically amplified resists for electron beam lithography Jpn2006
- Author(s)
  K. Natsuda, T. Kozawa, K. Okamoto and S. Tagawa
- Journal Title
  
  J. Appl. Phys 45
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Correlation between proton dynamics and line edge roughness in chemically amplified resist for post-optical lithography2006
- Author(s)
  A. Saeki, T. Kozawa, S. Tagawa, H. B. Cao
- Journal Title
  
  J. Vac. Sci. Technol. B
  
  Volume: 24 Pages: 3066-3072
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Acid generation efficiency in a model system of chemically amplified extreme ultraviolet resist2006
- Author(s)
  T. Kozawa, S. Tagawa, H. Oizumi, I. Nishiyama
- Journal Title
  
  J. Vac. Sci. Technol. B
  
  Volume: 24
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Analysis of Acid Yield Generated in Chemically Amplified Electron Beam Resist2006
- Author(s)
  T. Kozawa, T. Shigaki, K. Okamoto, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
- Journal Title
  
  J. Vac. Sci. Technol. B
  
  Volume: 24 Pages: 3055-3060
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Effects of Low Energy Electrons on Pattern Formation in Chemically Amplified Resist2006
- Author(s)
  T.Kozawa, H.Yamamoto, A.Saeki, S.Tagawa
- Journal Title
  
  J. Photopolym. Sci. Technol. 19
  
  Pages: 361-366
- NAID
  130004833103
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Equivalent Velocity Spectroscopy for Femtosecond Pulse Radiolysis2006
- Author(s)
  T.Kondoh, J.Yang, T.Kozawa, S.Tagawa, Y.Yoshida
- Journal Title
  
  Japanese Journal of Applied Physics (In press)
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Pulse radiolysis based on a femtosecond electron beam and a femtosecond laser light with double-pulse injection technique2006
- Author(s)
  J. Yang, T. Kondoh, T. Kozawa, Y. Yoshida, S. Tagawa
- Journal Title
  
  Radiat. Phys. Chem.
  
  Volume: 75 Pages: 1034-1040
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Dependence of Acid Yield on Chemically Amplified Electron Beam Resist Thickness2006
- Author(s)
  T.Shigaki, K.Okamoto, T.Kozawa, H.Yamamoto, S.Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys. 45
  
  Pages: 5445-5449
- NAID
  10017998648
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Picosecond pulse radiolysis using femtosecond white light with a high S/N spectrum acquisition system in one beam shot2006
- Author(s)
  A.Saeki, T.Kozawa, S.Tagawa
- Journal Title
  
  Nucl. Instrum. Meth. A 556
  
  Pages: 391-396
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Dependence of Acid Yield on Chemically Amplified Electron Beam Resist Thickness2006
- Author(s)
  T.Shigaki, K.Okamoto, T.Kozawa, H.Yamamoto, S.Tagawa
- Journal Title
  
  Jpn. J. Appl. Phys. 45
  
  Pages: 5445-5449
- NAID
  10017998648
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Pulse radiolysis based on a femtosecond electron beam and a femtosecond laser light with double-pulse injection technique2006
- Author(s)
  J.Yang, T.Kondoh, T.Kozawa, Y.Yoshida, S.Tagawa
- Journal Title
  
  Radiation Physics and Chemistry (in press)
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Proton and anion distribution and line edge roughness of chemically amplified electron beam resist2005
- Author(s)
  T.Kozawa, H.Yamamoto, A.Saeki, S.Tagawa
- Journal Title
  
  J.Vac.Sci.Technol.B 23
  
  Pages: 2716-2720
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Multi spur effect on decay kinetics of geminate ion recombination using Monte Carlo technique2005
- Author(s)
  A.Saeki, T.Kozawa, Y.Yoshida, S.Tagawa
- Journal Title
  
  Nucl.Instrum.Meth. B234
  
  Pages: 285-290
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Resist Thickness Effect on Acid Concentration Generated in Poly(4-hydroxystyrene) Film upon Exposure to 75 keV Electron Beam2005
- Author(s)
  T.Shigaki, K.Okamoto, T.Kozawa, H.Yamamoto, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 44
- NAID
  10016856520
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Basic Aspects of Acid Generation Process in Chemically Amplified Electron Beam Resist2005
- Author(s)
  T.Kozawa, S.Tagawa
- Journal Title
  
  Journal of Photopolymer Science and Technology., 18
  
  Pages: 471-474
- NAID
  130004464438
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Effects of Dielectric Constant on Acid Generation in Chemically Amplified Resists for Post-Optical Lithography2005
- Author(s)
  T.Kozawa, K.Okamoto, A.Saeki, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 44
  
  Pages: 3908-3912
- NAID
  10016441312
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Effects of Dielectric Constant on Acid Generation in Chemically Amplified Resists for Post-Optical Lithography2005
- Author(s)
  T.Kozawa, K.Okamoto, A.Saeki, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 44
  
  Pages: 3908-3912
- NAID
  10016441312
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography2005
- Author(s)
  H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 44 Pages: 5836-5838
- NAID
  10016678367
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Requirements for Laser-Induced Desorption/Ionization on Submicrometer Structures2005
- Author(s)
  S. Okuno, R. Arakawa, K. Okamoto, Y. Matsui, S. Seki, T. Kozawa, S. Tagawa, Y. Wada
- Journal Title
  
  Anal. Chem.
  
  Volume: 77 Pages: 5364-5369
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Proton and anion distribution and line edge roughness of chemically amplified electron beam resist2005
- Author(s)
  T.Kozawa, H.Yamamoto, A.Saeki, S.Tagawa
- Journal Title
  
  Journal of Vacuum Science Technology B 23
  
  Pages: 2716-2720
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Nanopatterning of polyfluorene derivative using electron-beam lithography2005
- Author(s)
  Y.Doi, A.Saeki, T.Kozawa, S.Tagawa et al.
- Journal Title
  
  J.Vac.Sci.Technol. B23
  
  Pages: 2051-2055
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Resist Thickness Effect on Acid Concentration Generated in Poly(4-hydroxystyrene) Film upon Exposure to 75 keV Electron Beam2005
- Author(s)
  T.Shigaki, K.Okamoto, T.Kozawa, H.Yamamoto, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 44
- NAID
  10016856520
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Proton and anion distribution and line edge roughness of chemically amplified electron beam resist2005
- Author(s)
  T.Kozawa, H.Yamamoto, A.Saeki, S.Tagawa
- Journal Title
  
  J.Vac.Sci.Technol. B23
  
  Pages: 2716-2720
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Synchronization of femtosecond UV-IR laser with electron beam for pulse radiolysis studies2005
- Author(s)
  A.Saeki, T.Kozawa, S.Kashiwagi, K.Okamoto, G.Isoyama, Y.Yoshida, S.Tagawa
- Journal Title
  
  Nuclear Instruments and Methods in Physics Research A 546
  
  Pages: 627-633
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Basic Aspects of Acid Generation Process in Chemically Amplified Electron Beam Resist2005
- Author(s)
  T.Kozawa, S.Tagawa
- Journal Title
  
  Journal of Photopolymer Science and Technology 18
  
  Pages: 471-474
- NAID
  130004464438
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Dependence of Acid Yield on Acid Generator in Chemically Amplified Resist for Post-Optical Lithography2005
- Author(s)
  A. Nakano, K. Okamoto, Y. Yamamoto, T. Kozawa, S. Tagawa, T. Kai, H. Nemoto
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 44 Pages: 5832-5835
- NAID
  10016678348
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Proton and anion distribution and line edge roughness of chemically amplified electron beam resist2005
- Author(s)
  T. Kozawa, H. Yamamoto, A. Saeki, and S. Tagawa
- Journal Title
  
  J. Vac. Sci. Technol B23
  
  Pages: 2716-2720
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Proton and anion distribution and line edge roughness of chemically amplified electron beam resist2005
- Author(s)
  T.Kozawa, H., Yamamoto, A.Saeki, S.Tagawa
- Journal Title
  
  J.Vac.Sci.Technol. B23
  
  Pages: 2716-2720
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Reaction Mechanisms of Brominated Chemically Amplified Resists2005
- Author(s)
  H. Yamamoto, T. Kozawa, A. Nakano, S. Tagawa, T. Ando, M. Sato, H. Komano
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 44
- NAID
  10016590890
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Synchronization of femtosecond UV-IR laser with electron beam for pulse radiolysis studies2005
- Author(s)
  A.Saeki, T.Kozawa, S.Tagawa et al.
- Journal Title
  
  Nucl.Instrum.Meth. A546
  
  Pages: 627-633
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Basic Aspects of Acid Generation Process in Chemically Amplified Electron Beam Resist2005
- Author(s)
  T.Kozawa, Seiichi Tagawa
- Journal Title
  
  J.Photopolym.Sci.Technol. 18
  
  Pages: 471-474
- NAID
  130004464438
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Multi spur effect on decay kinetics of geminate ion recombination using Monte Carlo technique2005
- Author(s)
  A.Saeki, T.Kozawa, Y.Yoshida, S.Tagawa
- Journal Title
  
  Nucl.Instrum.Meth. B234
  
  Pages: 285-290
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Study on acid generation from polymer2005
- Author(s)
  H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
- Journal Title
  
  J. Vac. Sci. Technol. B
  
  Volume: 23 Pages: 2728-2732
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17106014
[Journal Article] Synchronization of femtosecond UV-IR laser with electron beam for pulse radiolysis studies2005
- Author(s)
  A.Saeki, T.Kozawa, S.Tagawa et al.
- Journal Title
  
  Nucl.Instrum.Meth. A546
  
  Pages: 627-633
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Nanopatterning of polyfluorene derivative using electron-beam lithography2005
- Author(s)
  Y.Doi, A.Saeki, T.Kozawa, S.Tagawa et al.
- Journal Title
  
  J.Vac.Sci.Technol. B23
  
  Pages: 2051-2055
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Synchronization of femtosecond UV-IR laser with electron beam for pulse radiolysis studies2005
- Author(s)
  A.Saeki, T.Kozawa, S.Kashiwagi, K.Okamoto, G.Isoyama, Y.Yoshida, S.Tagawa
- Journal Title
  
  Nucl.Instrum.Meth.A 546
  
  Pages: 627-633
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Adjacent Effect on Positive Charge Transfer from Radical Cation of n-Dodecane to Scavenger Studied by Picosecond Pulse Radioly sis, Statistical Model, and Monte Carlo Simulation2004
- Author(s)
  A.Saeki, T.Kozawa, Y.Yoshida, S.Tagawa
- Journal Title
  
  Journal of Physics and Chemistry A 108
  
  Pages: 1475-1481
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Modeling and simulation of chemically amplified electron beam, x-ray, and EUV resist processes2004
- Author(s)
  T.Kozawa, A.Saeki, S.Tagawa
- Journal Title
  
  J.Vac.Sci.Technol. B22
  
  Pages: 3489-3492
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Effects of Ester Groups on Proton Generation and Diffusion in Polymethacrylate Matrices2004
- Author(s)
  A.Nakano, K.Okamoto, T.Kozawa, S.Tagawa
- Journal Title
  
  Japanese Journal of Applied Physics 43
  
  Pages: 3981-3983
- NAID
  10013276420
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Effects of Ester Groups on Proton Generation and Diffusion in Polymethacrylate Matrices2004
- Author(s)
  A.Nakano, K.Okamoto, T.Kozawa, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 3981-3983
- NAID
  10013276420
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Pulse Radiolysis Study on Proton and Charge Transfer Reactions in Solid Poly(methyl methacrylate)2004
- Author(s)
  A.Nakano, K.Okamoto, T.Kozawa, S.Tagawa
- Journal Title
  
  Japanese Journal of Applied Physics 43
  
  Pages: 4363-4367
- NAID
  10013317792
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Effects of Ester Groups on Proton Generation and Diffusion in Polymethacrylate Matrices2004
- Author(s)
  A.Nakano, K.Okamoto, T.Kozawa, S.Tawaga
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 3981-3983
- NAID
  10013276420
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Adjacent effect on positive charge transfer from radical cation of n-dodecane to scavenger studied by picosecond pulse radiolysis, statistical model, and Monte Carlo simulation.2004
- Author(s)
  A.Saeki, T.Kozawa, Y.Yoshida, S.Tagawa
- Journal Title
  
  J.Phys.Chem., A 108
  
  Pages: 1475-1481
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-14208060
[Journal Article] Modeling and simulation of chemically amplified electron beam, x-ray, and EUV resist processes2004
- Author(s)
  T.Kozawa, A.Saeki, S.Tagawa
- Journal Title
  
  J.Vac.Sci.Technol. B22
  
  Pages: 3489-3492
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-14208060
[Journal Article] Polymer screening method for chemically amplified electron beam and X-ray resists2004
- Author(s)
  H.Yamamoto, A.Nakano, K.Okamoto, T.Kozawa, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 3971-3973
- NAID
  10013276391
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-14208060
[Journal Article] Modeling and simulation of chemically amplified electron beam, x-ray, and EUV resist processes2004
- Author(s)
  T.Kozawa, A.Saeki, S.Tagawa
- Journal Title
  
  J.Vac.Sci.Technol. B22
  
  Pages: 3489-3492
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Effects of Ester Groups on Proton Generation and Diffusion in Polymethacrylate Matrices2004
- Author(s)
  A.Nakano, K.Okamoto, T.Kozawa, S.Tawaga
- Journal Title
  
  Japanese Journal of Applied Physics 43
  
  Pages: 3981-3983
- NAID
  10013276420
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Pulse Radiolysis Study on Proton and Charge Transfer Reactions in Solid Poly(methyl methacrylate)2004
- Author(s)
  A.Nakano, K.Okamoto, T.Kozawa, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 4363-4367
- NAID
  10013317792
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Modeling and simulation of chemically amplified electron beam, x-ray, and EUV resist processes2004
- Author(s)
  T.Kozawa, A.Saeki, S.Tagawa
- Journal Title
  
  Journal of Vacuum Science Technology B 22
  
  Pages: 3489-3492
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists2004
- Author(s)
  H.Yamamoto, A.Nakano, K.Okamoto, T.Kozawa, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 3971-3973
- NAID
  10013276391
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-14208060
[Journal Article] Pulse Radiolysis Study on Proton and Charge Transfer Reactions in Solid Poly(methyl methacrylate)2004
- Author(s)
  A.Nakano, K.Okamoto, T.Kozawa, S.Tawaga
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 4363-4367
- NAID
  10013317792
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists2004
- Author(s)
  H.Yamamoto, A.Nakano, K.Okamoto, T.Kozawa, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 3971-3973
- NAID
  10013276391
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Adjacent Effect on Positive Charge Transfer from Radical Cation of n-Dodecane to Scavenger Studied by Picosecond Pulse Radiolysis, Statistical Model, and Monte Carlo Simulation2004
- Author(s)
  A.Saeki, T.Kozawa, Y.Yoshida, S.Tagawa
- Journal Title
  
  J.Phys.Chem. A108
  
  Pages: 1475-1481
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Electron Dynamics in Chemically Amplified Resists2004
- Author(s)
  T.Kozawa, H.Yamamoto, A.Nakano, A.Saeki, K.Okamoto, S.Tagawa
- Journal Title
  
  J.Photopolym.Sci.Technol. 17
  
  Pages: 733-738
- NAID
  40006276572
- Data Source
  KAKENHI-PROJECT-16760691
[Journal Article] Precise Control of Nanowire Formation Based on Polysilane for Photoelectronic Device Application2004
- Author(s)
  S.Tsukuda, S.Seki, A.Saeki, T.Kozawa, S.Tagawa
- Journal Title
  
  Japanese Journal of Applied Physics 43
  
  Pages: 3810-3814
- NAID
  10013275865
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Effects of Ester Groups on Proton Generation and Diffusion in Polymethacrylate Matrices2004
- Author(s)
  A.Nakano, K.Okamoto, T.Kozawa, S.Tawaga
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 3981-3983
- NAID
  10013276420
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-14208060
[Journal Article] Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists2004
- Author(s)
  H.Yamamoto, A.Nakano, K.Okamo to, T.Kozawa, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 3971-3973
- NAID
  10013276391
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Precise Control of Nanowire Formation Based on Polysilane for Photoelectronic Device Application2004
- Author(s)
  S.Tsukuda, S.Seki, A.Saeki, T.Kozawa, S.Tagawa et al.
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 3810-3814
- NAID
  10013275865
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-14208060
[Journal Article] Adjacent Effect on Positive Charge Transfer from Radical Cation of n-Dodecane to Scavenger Studied by Picosecond Pulse Radiolysis, Statistical Model, and Monte Carlo Simulation2004
- Author(s)
  A.Saeki, T.Kozawa, Y.Yoshida, S.Tagawa
- Journal Title
  
  J.Phys.Chem. A108
  
  Pages: 1475-1481
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Pulse Radiolysis Study on Proton and Charge Transfer Reactions in Solid Poly(methyl methacrylate)2004
- Author(s)
  A.Nakano, K.Okamoto, T.Kozawa, S.Tawaga
- Journal Title
  
  Japanese Journal of Applied Physics 43
  
  Pages: 4363-4367
- NAID
  10013317792
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Precise control of nanowire formation based on polysilane for photoelectronic device application2004
- Author(s)
  S.Tsukuda, S.Seki, A.Saeki, T.Kozawa, S.Tagawa, M.Sugimoto, A.Idesaki, S.Tanaka
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 3810-3814
- NAID
  10013275865
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-14208060
[Journal Article] Effects of ester groups on proton generation and diffusion in polymethacrylate matrices.2004
- Author(s)
  A.Nakano, K.Okamoto, T.Kozawa, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 3981-3983
- NAID
  10013276420
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-14208060
[Journal Article] Precise Control of Nanowire Formation Based on Polysilane for Photoelectronic Device Application2004
- Author(s)
  S.Tsukuda, S.Seki, A.Saeki, T.Kozawa, S.Tagawa et al.
- Journal Title
  
  Japanese Journal of Applied Physics 43
  
  Pages: 3810-3814
- NAID
  10013275865
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists2004
- Author(s)
  H.Yamamoto, A.Nakano, K.Okamoto, T.Kozawa, S.Tagawa
- Journal Title
  
  Japanese Journal of Applied Physics 43
  
  Pages: 3971-3973
- NAID
  10013276391
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Pulse Radiolysis Study on Proton and Charge Transfer Reactions in Solid Poly(methyl methacrylate)2004
- Author(s)
  A.Nakano, K.Okamoto, T.Kozawa, S.Tawaga
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 4363-4367
- NAID
  10013317792
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-14208060
[Journal Article] Pulse radiolysis study on proton and charge transfer reactions in solid poly(methyl methacrylate).2004
- Author(s)
  A.Nakano, K.Okamoto, T.Kozawa, S.Tagawa
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 4363-4367
- NAID
  10013317792
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-14208060
[Journal Article] Adjacent Effect on Positive Charge Transfer from Radical Cation of n-Dodecane to Scavenger Studied by Picosecond Pulse Radiolysis, Statistical Model, and Monte Carlo Simulation2004
- Author(s)
  A.Saeki, T.Kozawa, Y.Yoshida, S.Tagawa
- Journal Title
  
  J.Phys.Chem. A108
  
  Pages: 1475-1481
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-14208060
[Journal Article] Adjacent Effect on Positive Charge Transfer from Radical Cation of n-Dodecane to Scavenger Studied by Picosecond Pulse Radiolysis, Statistical Model, and Monte Carlo Simulation2004
- Author(s)
  A.Saeki, T.Kozawa, Y.Yoshida S.Tagawa
- Journal Title
  
  J.Phys.Chem. A108
  
  Pages: 1475-1481
- Data Source
  KAKENHI-PROJECT-14208060
[Journal Article] Precise Control of Nanowire Formation Based on Polysilane for Photoelectronic Device Application2004
- Author(s)
  S.Tsukuda, S.Seki, A.Saeki, T.Kozawa, S.Tagawa et al.
- Journal Title
  
  Jpn.J.Appl.Phys. 43
  
  Pages: 3810-3814
- NAID
  10013275865
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Modeling and simulation of chemically amplified electron beam, x-ray, and EUV resist processes.2004
- Author(s)
  T.Kozawa, A.Saeki, S.Tagawa
- Journal Title
  
  J.Vac.Sci.Technol., B 22
  
  Pages: 3489-3492
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-14208060
[Journal Article] Adjacent Effect on Positive Charge Transfer from Radical Cation of n-Dodecane to Scavenger Studied by Picosecond Pulse Radiolysis, Statistical Model, and Monte Carlo Simulation2003
- Author(s)
  A.Saeki, T.Kozawa, Y.Yoshida, S.Tagawa
- Journal Title
  
  Journal of Physics and Chemistry A 108
  
  Pages: 1475-1481
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Journal Article] Subpicosecond Pulse Radiolysis Study of Geminate Ion Recombination in Liquid Benzene2003
- Author(s)
  K.Okamoto, A.Saeki, T.Kozawa, Y.Yoshida, S.Tagawa
- Journal Title
  
  Chemical Letters 32
  
  Pages: 834-835
- NAID
  10012819332
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15206109
[Presentation] Chemical information extraction from scanning electron microscopy images on the basis of image recognition2023
- Author(s)
  Yuqing Jin, Takahiro Kozawa, Kota Aoki, Tomoya Nakamura, Yasushi Makihara, and Yasushi Yagi
- Organizer
  IEUVI Resist TWG meeting
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Chemical information extraction from scanning electron microscopy images on the basis of image recognition2023
- Author(s)
  Yuqing Jin, Takahiro Kozawa, Kota Aoki, Tomoya Nakamura, Yasushi Makihara, and Yasushi Yagi
- Organizer
  SPIE Advanced Lithography + Patterning
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Current status and prospect of extreme ultraviolet resists2023
- Author(s)
  Takahiro Kozawa
- Organizer
  7th EUV-FEL Workshop
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Bayesian optimization-based estimation of effective reaction radius of chemically amplified resist in acid catalyzed deprotection reaction2022
- Author(s)
  Yuqing Jin, Takahiro Kozawa
- Organizer
  SPIE Photomask Technology + EUV Lithography
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Study of RLS trade-off mitigation utilizing an organotin-containing chemically amplified resist for high sensitivity patterning2022
- Author(s)
  Satoshi Enomoto, Kohei Machida, Michiya Naito, Takahiro Kozawa
- Organizer
  SPIE Photomask Technology + EUV Lithography
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Photoresist stochastic defect generation depending on alkalibased developer’s alkyl chain length and concentration2022
- Author(s)
  Masahiko Harumoto, Andreia Figueiredo dos Santos, Julius Joseph Santillan, Toshiro Itani, and Takahiro Kozawa
- Organizer
  MNC2022
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Effect of surface free energy of organic underlayer on dissolution kinetics of poly(4-hydroxystyrene) film in tetramethylammonium hydroxide aqueous developer2022
- Author(s)
  Yuqing Jin, Tomoe Otsuka, Naoki Tanaka, Takahiro Kozawa
- Organizer
  SPIE Photomask Technology + EUV Lithography
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Application of machine learning to development of chemically amplified resist materials and processes2022
- Author(s)
  Takahiro Kozawa
- Organizer
  The 39th International Conference of Photopolymer Science and Technology
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Defect Risks in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography2022
- Author(s)
  Takahiro Kozawa
- Organizer
  SPIE Photomask Technology + EUV Lithography
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Mechanism of electron beam resists2021
- Author(s)
  T. Kozawa
- Organizer
  Photomask Japan
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Stochastic Effects in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography2021
- Author(s)
  T. Kozawa
- Organizer
  SPIE Photomask Technology and the Extreme Ultraviolet Lithography
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Resist thickness dependence of latent images in chemically amplified resists used for electron beam lithography2021
- Author(s)
  T. Kozawa and T. Tamura
- Organizer
  38th Int. Conf. Photopolymer Science and Technology
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] EUVL Stochastics Symposium2021
- Author(s)
  T. Kozawa
- Organizer
  MNC
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Regression analysis of photodecomposable quencher concentration effects on chemical gradient in chemically amplified extreme ultraviolet resist processes2021
- Author(s)
  Kazuki Azumagawa and Takahiro Kozawa
- Organizer
  SPIE Advanced Lithography
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Machine Learning of Stochastic Effects in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography2020
- Author(s)
  Kazuki Azumagawa and Takahiro Kozawa
- Organizer
  MNC2020
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Study on dependence of transient swelling layer formation on molecular weight and dispersion of backbone polymer of chemically amplified EUV resists2020
- Author(s)
  Takahiro Kozawa, Kyoko Watanabe, Kyoko Matsuoka, Naoki Tanaka, Kazuki Azumagawa, Takuya Ikeda, Yoshitaka Komuro and Daisuke Kawana
- Organizer
  SPIE Photomask Technology + Extreme Ultraviolet Lithography
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Estimation of Electron Affinity of Photoacid Generators: Density Functional TheoryCalculations Using Static and Dynamic Models2020
- Author(s)
  Kazumasa Okamoto and Takahiro Kozawa
- Organizer
  MNC2020
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Study on Primary Process of Beam-Induced Reaction of Metal Resist Ligands2020
- Author(s)
  Kengo Ikeuchi, Tomoe Otsuka, Yusa Muroya, Takahiro Kozawa, Takuya Ikeda, Yoshitaka Komuro and Daisuke Kawana
- Organizer
  MNC2020
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Relationship between Resolution Blur and Stochastic Defect of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography2019
- Author(s)
  T. Kozawa, J. J. Santillan, and T. Itani
- Organizer
  The 36th International Conference of Photopolymer Science and Technology (Makuhari Messe, Chiba, Japan, June 24-27, 2019)
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Radiation chemistry in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography2019
- Author(s)
  T. Kozawa
- Organizer
  2nd ELENA Conf. (Leuven, Belgium, Sep. 4-6, 2019),
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Analysis of line-and-space patterns of ZrO2 nanoparticle resist on the basis of EUV sensitization mechanism2019
- Author(s)
  T. Kozawa, T. Yamada, Y. Muroya, J. J. Santillan, and T. Itani
- Organizer
  SPIE Advanced Lithography
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Theoretical study of line edge roughness and stochastic defect generation2019
- Author(s)
  T. Kozawa
- Organizer
  SPIE Photomask Technology + EUV Lithography (Monterey, California, Sep. 16-19, 2019)
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] パルスラジオリシスによるフェニルスルホン化合物の放射線化学反応2018
- Author(s)
  岡本一将, 河合俊平, 山本洋揮, 古澤孝弘
- Organizer
  日本原子力学会２０１８年春の大会
- Data Source
  KAKENHI-PROJECT-15K06662
[Presentation] Stochasticity in EUV lithography2018
- Author(s)
  T. Kozawa, J. J. Santillan, and T. Itani
- Organizer
  16th Fraunhofer IISB Lithography Simulation Workshop
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Pattern formation mechanism of zirconia nanoparticle resist used for extreme-ultraviolet lithography2018
- Author(s)
  T. Kozawa, T. Yamada, S. Ishihara, H. Yamamoto, Y. Muroya, J. J. Santillan, and T. Itani
- Organizer
  International Symposium on Extreme Ultraviolet Lithography
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18H03895
[Presentation] Resist material options for extreme ultraviolet lithography2017
- Author(s)
  T. Kozawa
- Organizer
  Kickoff Meeting (JSPS Symposium) for the ZIAM/GBB and ISIR/IPR collaboration
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] ポリスチレンのフェニルトリメトキシシラン溶液のパルスラジオリシス2017
- Author(s)
  堀成生, 岡本一将, 山本洋揮, 古澤孝弘, 藤吉亮子, 梅垣菊男
- Organizer
  第60回放射線化学討論会
- Data Source
  KAKENHI-PROJECT-15K06662
[Presentation] 化学増幅型レジストへのスルホン化合物の添加効果2017
- Author(s)
  岡本一将, 藤井槙哉, 山本洋揮, 古澤孝弘, 井谷俊郎
- Organizer
  第６４回応用物理学会春季学術講演会
- Place of Presentation
  パシフィコ横浜（神奈川県・横浜市）
- Year and Date
  2017-03-14
- Data Source
  KAKENHI-PROJECT-15K06662
[Presentation] 次世代半導体の微細化限界の打破は可能か？2017
- Author(s)
  古澤孝弘
- Organizer
  第11回　産研ざっくばらんトーク
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] 光・ビーム科学と計算機科学の融合による超微細加工材料開発2017
- Author(s)
  古澤孝弘
- Organizer
  第22回光エレクトロニクスフォーラム
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Sensitivity enhancement of chemically amplified EUV by adding acid generation promoters2016
- Author(s)
  Shinya Fujii, Kazumasa Okamoto, Hiroki Yamamoto, Takahiro Kozawa, Toshiro Itani
- Organizer
  29th International Microprocesses and Nanotechnology Conference (MNC2016)
- Place of Presentation
  ANA Crowne Plaza Kyoto (京都府・京都市)
- Year and Date
  2016-11-08
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K06662
[Presentation] Synthesis and Resist Properties of Calixarene Polymers with Pendant Haloalkyl Groups2016
- Author(s)
  H. Kudo, H. Ogawa, H. Yamamoto, and T. Kozawa
- Organizer
  The 33rd International Conference of Photopolymer Science and Technology
- Place of Presentation
  Chiba, Japan
- Year and Date
  2016-06-22
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Molecular Resist Materials for Extreme Ultraviolet Lithography2016
- Author(s)
  H. Yamamoto, H. Kudo, and T. Kozawa
- Organizer
  2016 International Workshop on EUV Lithography
- Place of Presentation
  CA, USA
- Year and Date
  2016-06-13
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Challenges in sub-10 nm fabrication using EUV lithography2016
- Author(s)
  T. Kozawa, J.J. Santillan, and T. Itani
- Organizer
  14th Fraunhofer IISB Lithography Simulation Workshop
- Place of Presentation
  Hersbruck, Germany
- Year and Date
  2016-09-22
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] 添加剤を用いた酸生成促進によるEUV 用化学増幅型レジストの感度向上2016
- Author(s)
  藤井槙哉、岡本一将、山本洋揮、古澤孝弘、井谷俊郎
- Organizer
  第59回放射線化学討論会
- Place of Presentation
  量子科学技術研究開発機構　高崎量子応用研究所(群馬県・高崎市)
- Year and Date
  2016-09-20
- Data Source
  KAKENHI-PROJECT-15K06662
[Presentation] Radiation chemistry of fluorinated polymers for Extreme-ultraviolet resist2015
- Author(s)
  N. Nomura, K. Okamoto, H. Yamamoto, T. Kozawa, R. Fujiyoshi, K. Umegaki
- Organizer
  28th International Microprocesses and Nanotechnology Conference
- Place of Presentation
  富山国際会議場（富山県富山市）
- Year and Date
  2015-11-10
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K06662
[Presentation] Dynamics of radical ions of fluorinated polymer for Extreme Ultraviolet (EUV) lithography2015
- Author(s)
  N. Nomura, K. Okamoto, H. Yamamoto, T. Kozawa, R. Fujiyoshi, K. Umegaki
- Organizer
  Photomask Japan 2015
- Place of Presentation
  パシフィコ横浜（神奈川県横浜市）
- Year and Date
  2015-04-20
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K06662
[Presentation] Dissolution Dynamics of Chemically Amplified Resists for Extreme Ultraviolet Lithography Studied by Quartz Crystal Microbalance2015
- Author(s)
  M. Mitsuyasu, H. Yamamoto, and T. Kozawa
- Organizer
  2015 International Workshop on EUV Lithography
- Place of Presentation
  米国ハワイ
- Year and Date
  2015-07-15
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Resist material options for extreme ultraviolet lithography2015
- Author(s)
  T. Kozawa
- Organizer
  MNE2015
- Place of Presentation
  オランダ
- Year and Date
  2015-09-21
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Pulse radiolysis in concentrated poly(4-hydroxystyrene) solution: Acid generation dynamics in EUV and electron-beam chemically amplified resist2015
- Author(s)
  K. Okamoto, T. Ishida, H. Yamamoto, T. Kozawa, R. Fujiyoshi, K. Umegaki
- Organizer
  28th International Microprocesses and Nanotechnology Conference
- Place of Presentation
  富山国際会議場（富山県富山市）
- Year and Date
  2015-11-10
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K06662
[Presentation] Radiation-induced reaction of fluorinated polymers and related compounds for extreme-ultraviolet lithography2015
- Author(s)
  N. Nomura, K. Okamoto, H. Yamamoto, T. Kozawa, R. Fujiyoshi, K. Umegaki
- Organizer
  Pacifichem 2015
- Place of Presentation
  Hawii Convention Center(Honolulu, Hawaii, USA)
- Year and Date
  2015-12-15
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K06662
[Presentation] パルスラジオリシス法によるフッ素樹脂の放射線化学反応の解明2015
- Author(s)
  野村直矢、岡本一将、藤吉亮子、梅垣菊男、山本洋揮、古澤孝弘
- Organizer
  日本原子力学会２０１５年秋の大会
- Place of Presentation
  静岡大学静岡キャンパス（静岡県静岡市）
- Year and Date
  2015-09-09
- Data Source
  KAKENHI-PROJECT-15K06662
[Presentation] Pulse radiolysis study of resist polymers with and without photoacid generator2015
- Author(s)
  K. Okamoto, T. Ishida, H. Yamamoto, T. Kozawa, R. Fujiyoshi, K. Umegaki
- Organizer
  Pacifichem 2015
- Place of Presentation
  Hawii Convention Center(Honolulu, Hawaii, USA)
- Year and Date
  2015-12-15
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K06662
[Presentation] リソグラフィにおけるラインエッジラフネス生成機構と極限解像度2014
- Author(s)
  古澤孝弘
- Organizer
  日本学術振興会第１３２委員会第２０９回研究会
- Place of Presentation
  東京
- Invited
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Nanochemistry in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography2013
- Author(s)
  T. Kozawa
- Organizer
  The 57th International Conference on Electron, Ion, and Photon Beam Technology, and Nanofabrication
- Place of Presentation
  Nashville, Tennessee, USA
- Invited
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Stochastic effects in chemically amplified resists2013
- Author(s)
  T. Kozawa
- Organizer
  11th Fraunhofer IISB Lithography Simulation Workshop
- Place of Presentation
  Hersbruck, Germany
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Resist properties required for 6.67 nm extreme ultraviolet lithography2012
- Author(s)
  T. Kozawa
- Organizer
  10th Fraunhofer IISB Lithography Simulation Workshop
- Place of Presentation
  Hersbruck, Germany
- Year and Date
  2012-09-21
- Data Source
  KAKENHI-PROJECT-22246128
[Presentation] Status and Challenge of Chemically Amplified Resists for Extreme Ultraviolet Lithography2012
- Author(s)
  T. Kozawa
- Organizer
  2012 International Workshop on EUVL
- Place of Presentation
  Maui, Hawaii, USA
- Year and Date
  2012-06-06
- Data Source
  KAKENHI-PROJECT-22246128
[Presentation] Reaction of thermalized electrons in resist materials2011
- Author(s)
  T.Kozawa
- Organizer
  14th International Congress of Radiation Research
- Place of Presentation
  Warsaw, Poland(招待講演)
- Year and Date
  2011-08-31
- Data Source
  KAKENHI-PROJECT-21656238
[Presentation] Theoretical study of 11-nm-fabrication using 6.67-nm EUV lithography2011
- Author(s)
  T.Kozawa, A.Erdmann
- Organizer
  9TH Fraunhofer IISB Lithography simulation Workshop
- Place of Presentation
  Hersbruck, Germany
- Year and Date
  2011-09-16
- Data Source
  KAKENHI-PROJECT-22246128
[Presentation] Reaction of thermalized electrons in resist materials2011
- Author(s)
  T. Kozawa
- Organizer
  14th International Congress of Radiation Research(招待講演)
- Place of Presentation
  Warsaw, Poland
- Year and Date
  2011-08-31
- Data Source
  KAKENHI-PROJECT-21656238
[Presentation] Theoretical study of 11-nm-fabrication using 6.67-nm EUV lithography2011
- Author(s)
  T. Kozawa, and A. Erdmann
- Organizer
  9th Fraunhofer IISB Lithography Simulation Workshop
- Place of Presentation
  Hersbruck, Germany
- Year and Date
  2011-09-16
- Data Source
  KAKENHI-PROJECT-22246128
[Presentation] Dynamics of Radical Cation of Poly(4-hydroxystyrene) Generated in Thin Film upon Exposure to Electron Beam2010
- Author(s)
  K. Natsuda, T. Kozawa, K. Okamoto, A. Saeki, and S. Tagawa
- Organizer
  SPIE Advanced Lithography
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2010-02-22
- Data Source
  KAKENHI-PROJECT-21656238
[Presentation] Use Efficiency of Photon, Electron, and Proton in Chemically Amplified Resists-Resist Design for Cost Effective Lithography2010
- Author(s)
  T. Kozawa
- Organizer
  23rd International Microprocesses and Nanotechnology Conference
- Place of Presentation
  小倉(福岡)
- Year and Date
  2010-11-12
- Data Source
  KAKENHI-PROJECT-21656238
[Presentation] Analysis of Chemical Reactions Induced in Chemically Amplified Extreme Ultraviolet Resists2010
- Author(s)
  T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa
- Organizer
  European Symposium of Photopolymer Science
- Place of Presentation
  Mulhouse, France
- Year and Date
  2010-11-30
- Data Source
  KAKENHI-PROJECT-22246128
[Presentation] Analysis of Chemical Reactions Induced in Chemically Amplified Extreme Ultraviolet Resists2010
- Author(s)
  T.Kozawa, H.Oizumi, T.Itani, S.Tagawa
- Organizer
  European Symposium of Photopolymer Science
- Place of Presentation
  Mulhouse(France)
- Year and Date
  2010-11-30
- Data Source
  KAKENHI-PROJECT-22246128
[Presentation] Use Efficiency of Photon, Electron, and Proton in Chemically Amplified Resists -Resist Design for Cost Effective Lithography2010
- Author(s)
  T.Kozawa
- Organizer
  23rd International Microprocesses and Nanotechnology Conference
- Place of Presentation
  小倉(福岡)
- Year and Date
  2010-11-12
- Data Source
  KAKENHI-PROJECT-21656238
[Presentation] Sensitization mechanisms of chemically amplified resists and resist design for 22 nm node2009
- Author(s)
  T. Kozawa and S. Tagawa
- Organizer
  2009 International Workshop on EUV Lithography
- Place of Presentation
  Oahu, Hawaii, USA
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Development Status and Future Prospect of Extreme Ultraviolet Resists2009
- Author(s)
  T. Kozawa
- Organizer
  International Workshop on EUV Lithography
- Place of Presentation
  Honolulu, Hawaii, USA
- Year and Date
  2009-07-16
- Data Source
  KAKENHI-PROJECT-19360428
[Presentation] Modeling and simulation of chemically amplified resists for EUV lithography2009
- Author(s)
  T. Kozawa and S. Tagawa
- Organizer
  7th Fraunhofer IISB Lithography Simulation Workshop
- Place of Presentation
  Hersbruck, Germany
- Year and Date
  2009-09-27
- Data Source
  KAKENHI-PROJECT-21656238
[Presentation] Effect of molecular structures of acid generators on acid generation in chemically amplified resists upon exposure to 75 keV electron beam2008
- Author(s)
  K. Natsuda, T. Kozawa, K. Okamoto, and S. Tagawa
- Organizer
  21st International Microprocesses and Nanotechnology Conference
- Place of Presentation
  Fukuoka, Japan
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Dependence of Acid Generation Efficiency on Molecular Structure and Concentration of Acid Generator in Chemically Amplified EUV Resist, SPIE Advanced Lithography2008
- Author(s)
  R. Hirose, T. Kozawa, S. Tagawa, T. Kai, and T. Shimokawa
- Organizer
  San Jose
- Place of Presentation
  California, USA
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Dynamics of Radical Cation of Poly(4-Hydroxystyrene)and its Copolymer2008
- Author(s)
  K. Okamoto, M. Tanaka, T. Kozawa, S. Tagawa
- Organizer
  21st International Microprocesses and Nanotechnology Conference
- Place of Presentation
  Fukuoka, Japan
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Dynamics of Radical Cations of Resist Model Compounds2008
- Author(s)
  K. Okamoto, M. Tanaka, T. Kozawa, S. Tagawa
- Organizer
  2nd Asia-Pacific Symposium on Radiation Chemistry
- Place of Presentation
  Waseda University
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Effect of molecular structures of acid generators on acid generation in chemically amplified resists upon exposure to 75 keV electron beam2008
- Author(s)
  K. Natsuda, T. Kozawa, K. Okamoto, S. Tagawa
- Organizer
  21st International Microprocesses and Nanotechnology Conference
- Place of Presentation
  Fukuoka, Japan
- Year and Date
  2008-10-28
- Data Source
  KAKENHI-PROJECT-19360428
[Presentation] Horie, Effect of acid generator structure on its depth distribution in chemically amplified resist films2008
- Author(s)
  T. Fukuyama, T. Kozawa, K. Okamoto, S. Tagawa, M. Irie, T. Mimura, T. Iwai, J. Onodera, I. Hirosawa, T. Koganesawa, and K
- Organizer
  21st International Microprocesses and Nanotechnology Conference
- Place of Presentation
  Fukuoka, Japan
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Study on Reactivity of Halogenated Resist Polymer with Low-Energy Electrons2008
- Author(s)
  H. Yamamoto, T. Kozawa, A. Saeki, S. Tagawa, T. Mimura, H. Yukawa, and J. Onodera
- Organizer
  21st International Microprocesses and Nanotechnology Conference
- Place of Presentation
  Fukuoka, Japan
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Acid-base equilibrium in chemically amplified resist, SPIE Advanced Lithography2008
- Author(s)
  K. Natsuda, T. Kozawa, K. Okamoto, and S. Tagawa
- Organizer
  San Jose
- Place of Presentation
  California, USA
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Study on acid generation of acid generators in chemically amplified resists for electron beam2008
- Author(s)
  K. Natsuda, T. Kozawa, K. Okamoto, and S. Tagawa
- Organizer
  International Workshop on Molecular Information and Dynamics 2008
- Place of Presentation
  Taipei, Taiwan
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Effect of acid generator structure on its depth distribution in chemically amplified resist films2008
- Author(s)
  T. Fukuyama, T. Kozawa, K. Okamoto, S. Tagawa, M. Irie, T. Mimura, T. Iwai, J. Onodera, I. Hirosawa, T. Koganesawa, K. Horie
- Organizer
  21st International Microprocesses and Nanotechnology Conference
- Place of Presentation
  Fukuoka, Japan
- Year and Date
  2008-10-28
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Pico-and subpico-second pulse radiolysis based on L-band linac with femtosecond white light continuum2007
- Author(s)
  A. Saeki, T. Kozawa, and S. Tagawa (invited)
- Organizer
  The 7th International Symposium on Advanced Science Research
- Place of Presentation
  Tokai, Ibaraki, Japan
- Year and Date
  2007-12-01
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Nanoscale Distribution of Intermediates in Resist Materials for Next Generation Lithography2007
- Author(s)
  T. Kozawa, S. Tagawa
- Organizer
  ASR Symposium
- Place of Presentation
  茨城県那珂郡東海村
- Year and Date
  2007-11-08
- Data Source
  KAKENHI-PROJECT-19360428
[Presentation] Nanoscale Distribution of Intermediates in Resist Materials for Next Generation Lithography
- Author(s)
  T. Kozawa, and S. Tagawa
- Organizer
  ASR Symposium
- Place of Presentation
  Ibaraki, Japan
- Year and Date
  2007-11-06 – 2007-11-09
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Line edge roughness in chemically amplified resist of electron beam lithography
- Author(s)
  A. Saeki, T. Kozawa, S. Tagawa and H. B. Cao
- Organizer
  50th EIPBN
- Place of Presentation
  Baltimore, Maryland, USA
- Year and Date
  2006-05-30 – 2006-06-02
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Acid distribution in chemically amplified extreme ultraviolet resist
- Author(s)
  T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, M. J. Leeson
- Organizer
  The fifty-first international conference on electron, ion, and photon beam technology and nanofabrication (51st EIPBN)
- Place of Presentation
  Denver, Colorado, USA
- Year and Date
  2007-05-29 – 2007-06-01
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa, K. Ohmori, M. Sato, H. Komano
- Organizer
  SPIE Advanced Microlithography
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2007-02-25 – 2007-03-02
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Study on Dissolution Behavior of Chemically Amplified Resists for Extreme Ultraviolet Lithography
- Author(s)
  M. Mitsuyasu, H. Yamamoto and T. Kozawa
- Organizer
  27th International Microprocesses and Nanotechnology Conference
- Place of Presentation
  Fukuoka, Japan
- Year and Date
  2014-11-04 – 2014-11-07
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Effects of rate constant for deprotection reaction on latent image formation in chemically amplified EUV resists
- Author(s)
  T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, and T. Itani
- Organizer
  Microprocess and Nanotechnology Conference
- Place of Presentation
  Kyoto, Japan
- Year and Date
  2007-11-05 – 2007-11-08
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness
- Author(s)
  H. Yamamoto, T. Kozawa, A. Saeki, K. Okamoto, S. Tagawa, K. Ohmori, M. Sato, H. Komano
- Organizer
  Int. Microprocesses and Nanotechnology Conf.
- Place of Presentation
  Kamakura, Japan
- Year and Date
  2006-10-25 – 2006-10-27
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Study on photochemical analysis system for EUV lithography
- Author(s)
  A. Sekiguchi, Y. Kono, M. Kadoi, Y. Minami, T. Kozawa, S. Tagawa, D. Gustafson, P. Plackborow
- Organizer
  SPIE Advanced Microlithography
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2007-02-25 – 2007-03-02
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Pulse radiolysis of polystyrene and derivatives
- Author(s)
  K. Okamoto, M. Tanaka, T. Kozawa, S. Seki, S. Tagawa
- Organizer
  13th International Congress of Radiation Research
- Place of Presentation
  San Francisco, California, USA
- Year and Date
  2007-07-07 – 2007-07-13
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Effects of activation energy for deprotection reaction on latent image contrast
- Author(s)
  T. Kozawa, A. Saeki, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
- Organizer
  2007 International EUVL Symposium
- Place of Presentation
  Sapporo, Japan
- Year and Date
  2007-10-28 – 2007-10-31
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Acid generation mechanism in anion bound chemically amplified resists used for extreme-ultraviolet lithography
- Author(s)
  Y. Komuro, H. Yamamoto, K. Kobayashi, K. Ohomori, and T. Kozawa
- Organizer
  SPIE Advanced Lithography
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2015-02-22 – 2015-02-26
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Proton Dynamics and Amines in Chemically Amplified Resist
- Author(s)
  K. Natsuda, T. Kozawa, K. Okamoto, S. Tagawa
- Organizer
  Int. Microprocesses and Nanotechnology Conf.
- Place of Presentation
  Kamakura, Japan
- Year and Date
  2006-10-25 – 2006-10-27
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Fundamental Study on Dissolution Behavior of Chemically Amplified Resist for EUV Lithography
- Author(s)
  M. Mitsuyasu, H. Yamamoto and T. Kozawa
- Organizer
  Photomask Japan 2014
- Place of Presentation
  Yokohama, Kanagawa, Japan
- Year and Date
  2014-04-15 – 2014-04-16
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Depth profile of acid generator distribution in chemically amplified resists
- Author(s)
  T. Fukuyama, T. Kozawa, S. Tagawa, R. Takasu, H. Yukawa, M. Sato, J. Onodera, I. Hirosawa, T. Koganesawa, K. Horie
- Organizer
  Microprocess and Nanotechnology Conference
- Place of Presentation
  Kyoto, Japan
- Year and Date
  2007-11-05 – 2007-11-08
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Effect of Fluorine Atom on Acid Generation in Chemically Amplified EUV Resist
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa, H. Yukawa, M. Sato, J. Onodera
- Organizer
  Microprocess and Nanotechnology Conference
- Place of Presentation
  Kyoto, Japan
- Year and Date
  2007-11-05 – 2007-11-08
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Effect of Fluorine Atom on Acid Generation in Chemically Amplified EUV Resist
- Author(s)
  H. Yamamoto, T. Kozawa, S. Tagawa H. Yukawa, M. Sato, H. Komano
- Organizer
  2007 International EUVL Symposium
- Place of Presentation
  Sapporo, Japan
- Year and Date
  2007-10-28 – 2007-10-31
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] High precision measurement of higher diffraction-order contamination in monochromatized soft X-ray by using a compact transmission-grating spectrometer
- Author(s)
  K. Fukui, T. Sakai, T. Hatsui, N. Kosugi, Y. Hamamura, K. Okamoto, Y. Matsui, T. Kozawa, S. Seki, S. Tagawa
- Organizer
  International Conference on Vacuum Ultraviolet Radiation Physics 15th
- Place of Presentation
  Berlin, Germany
- Year and Date
  2007-06-29 – 2007-07-03
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Difference between initial distributions of proton and counter anion in chemically amplified electron-beam resist
- Author(s)
  T. Kozawa, H. Yamamoto, A. Saeki and S. Tagawa
- Organizer
  31st Int. Symp. Microlithography
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2006-02-19 – 2006-02-24
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified EUV Resist
- Author(s)
  R. Hirose, T. Kozawa, S. Tagawa, T. Kai and T. Shimokawa
- Organizer
  Microprocess and Nanotechnology Conference
- Place of Presentation
  Kyoto, Japan
- Year and Date
  2007-11-05 – 2007-11-08
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Image Contrast Slope and Line Edge Roughness of Chemically Amplified Resists for Post-Optical Lithography
- Author(s)
  T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
- Organizer
  The fifty-first international conference on electron, ion, and photon beam technology and nanofabrication (51st EIPBN)
- Place of Presentation
  Denver, Colorado, USA
- Year and Date
  2007-05-29 – 2007-06-01
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Analysis of Acid Yield Generated in Chemically Amplified Electron Beam Resist
- Author(s)
  T. Kozawa, T. Shigaki, K. Okamoto, A. Saeki and S. Tagawa
- Organizer
  50th EIPBN
- Place of Presentation
  Baltimore, Maryland, USA
- Year and Date
  2006-05-30 – 2006-06-02
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Study on dynamics of radical ions of polystyrenes by pulse radiolysis
- Author(s)
  K. Okamoto, M. Tanaka, S. Seki, T. Kozawa, S. Tagawa
- Organizer
  13th International Congress of Radiation Research
- Place of Presentation
  San Francisco, California, USA
- Year and Date
  2007-06-07 – 2007-06-13
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Effects of low-molecular weight resist components on dissolution behavior of chemically-amplified resists for extreme ultraviolet lithography studied by quartz crystal microbalance
- Author(s)
  M. Masaki, H. Yamamoto, and T. Kozawa
- Organizer
  SPIE Advanced Lithography
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2015-02-22 – 2015-02-26
- Data Source
  KAKENHI-PROJECT-25246036
[Presentation] Study on the Reaction of Acid Generators with Epithermal Electrons
- Author(s)
  K. Natsuda, T. Kozawa, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
- Organizer
  Microprocess and Nanotechnology Conference
- Place of Presentation
  Kyoto, Japan
- Year and Date
  2007-11-05 – 2007-11-08
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] Development and performance of quasi-free standing transmission-grating for soft X-ray emission spectrometer
- Author(s)
  T. Hatsui, K. Okamoto, Y. Matsui, T. Kozawa, S. Seki, S. Tagawa, Y. Hamamura, N. Kosugi
- Organizer
  International Conference on Vacuum Ultraviolet Radiation Physics 15th
- Place of Presentation
  Berlin, Germany
- Year and Date
  2007-06-29 – 2007-07-03
- Data Source
  KAKENHI-PROJECT-17106014
[Presentation] The reaction mechanism of poly[4-hydroxystyrene-co-4-(1, 1, 1, 3, 3, 3-hexafluoro-2- hydroxypropyl)-styrene]
- Author(s)
  H. Yamamoto, T. Kozawa, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
- Organizer
  31st Int. Symp. Microlithography
- Place of Presentation
  San Jose, California, USA
- Year and Date
  2006-02-19 – 2006-02-24
- Data Source
  KAKENHI-PROJECT-17106014

1. SEKI Shuhei (30273709)

# of Collaborated Projects: 5 results

# of Collaborated Products: 14 results
2. TAGAWA Seiichi (80011203)

# of Collaborated Projects: 5 results

# of Collaborated Products: 129 results
3. YOSHIDA Yoichi (50210729)

# of Collaborated Projects: 4 results

# of Collaborated Products: 14 results
4. SAEKI Akinori (10362625)

# of Collaborated Projects: 4 results

# of Collaborated Products: 39 results
5. YAMAMOTO Hiroki (00516958)

# of Collaborated Projects: 4 results

# of Collaborated Products: 44 results
6. OKAMOTO Kazumasa (10437353)

# of Collaborated Projects: 3 results

# of Collaborated Products: 55 results
7. KOBAYASHI Kazuo (30116032)

# of Collaborated Projects: 3 results

# of Collaborated Products: 4 results
8. 室屋裕佐 (40334320)

# of Collaborated Projects: 3 results

# of Collaborated Products: 5 results
9. YANG Jinfeng (90362631)

# of Collaborated Projects: 2 results

# of Collaborated Products: 5 results
10. SHIBATA Hiromi (30216014)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
11. LEEMANS Wim

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
12. OGATA Astushi (60023727)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
13. KAWAKUBO Tadamichi (70044774)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
14. NAKANISHI Hiroshi (00044769)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
15. NAKAJIMA Kazuhisa (80164177)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
16. UESAKA Mitsuru (30232739)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
17. HIROISHI Daisuke (20199110)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
18. KATSUMURA Yosuke (70111466)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
19. MIKI Miyako (10167661)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
20. OKUDA Shuichi (00142175)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
21. HONDA Yoshihide (40209333)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
22. 丑田公規 (60183018)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
23. 砂川武義 (60329456)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
24. 大沼正人 (90354208)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
25. GORBUNOV Leonid

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
26. ANDREEV Nikolai

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
27. SIDERS Craig

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
28. DOWNER Michel

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
29. KIRSANOV Victor

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
30. FALCONE Roger

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
31. TAJIMA Toshiki

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
32. ILAN Ben-Zvi

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
33. MATHIEUSSENT Gilles

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
34. CROS Brigitte

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
35. MILCHEBERG Howard

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
36. CHATTOPADHVAV Swapon

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
37. MOUROU Gerald

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
38. WURTELE Jonathan

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
39. WHITTUM David

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
40. CHEN Pisin

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
41. KATSOULEAS Tom

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
42. GORBUNOV Leo

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
43. MOUROU Geral

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
44. MILCHBERG Ho

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
45. WURTELE Jona

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
46. CROS Brigitt

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
47. WHITTUM Davi

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
48. SHATOPADHYAY シャボン

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
49. FISHER David

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
50. PERRY Mike

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
51. KATSOULEAS T

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
52. DANGOR A.E.

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
53. GORUBUNOV Le

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
54. SIDERS Claig

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
55. MATHIEUSSENT ジル

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
56. 田島俊樹

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
57. ヂンタンフン

# of Collaborated Projects: 0 results

# of Collaborated Products: 1 results
58. 酒巻大輔

# of Collaborated Projects: 0 results

# of Collaborated Products: 1 results

KOZAWA Takahiro 古澤 孝弘

古澤 孝弘 コザワ タカヒロ

古沢 孝弘 フルザワ タカヒロ

小澤 孝弘 コザワ タカヒロ

Research Projects

Research Products

Co-Researchers

Reaction mechanism of metal-containing resist for ionizing radiationPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

Development of single nano materials based on quantum beam and data sciencePrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Study on nanochemistry in latest nanofabrication materials using quantum beamsPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Study on nanoscale chemical reactions and reaction sites using quantum beamsPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Study on the expanse of thermalized electrons in condensed mattersPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Study on nanoscale chemical reaction for the establishment of scientific foundation of ultrafine patterning using extreme ultraviolet radiationPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

フェムト秒パルスラジオリシスによる極限ナノビームプロセスの創生Principal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

サブピコ秒パルスラジオリシス法によるナノリソグラフィ材料の反応機構の解明と開発Principal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

KOZAWA Takahiro 古澤孝弘

古澤孝弘コザワタカヒロ

古沢孝弘フルザワタカヒロ

小澤孝弘コザワタカヒロ