TOSHIRO Ono 小野俊郎

Researcher Number	30374812
Other IDs
Affiliation (based on the past Project Information) *help	2007 – 2010: Hirosaki University, Graduate school of Science and Technology, Professer 2005 – 2006: 弘前大学, 理工学部, 教授
Review Section/Research Field	Principal Investigator Electronic materials/Electric materials Except Principal Investigator Physical properties of metals / Intelligent mechanics/Mechanical systems
Keywords	Principal Investigator 誘電体薄膜 / ゲート膜 / プラズマ成膜 / 作成評価技術 / 誘電体 / ECRプラズマ / 低温形成 / MIS / 作成・評価技術 Except Principal Investigator lower magnetic field … More / micro-gas-valve / actuator / Bimorph multi-layers / magnetostriction / 複合材料・物性 / マイクロデバイス / 振動型アクチュエータ / ナノ多層膜 / 複合膜・物性 / マイクロバルブ / 振動型アクチュエータ素子 / バイモルフタイプ / 弱磁場駆動 / マイクロガスバルブ / アクチュエータ素子 / バイモルフ複合箔 / 磁歪 / 臓器モデル / 人間機械システム / 知能機械 Less

内視鏡医療トレーニングのための括約筋をもつアクティブ臓器モデルの開発
- Principal Investigator
  
  牧野英司
- Project Period (FY)
  2009 – 2010
- Research Category
  
  Grant-in-Aid for Challenging Exploratory Research
- Research Field
  
  Intelligent mechanics/Mechanical systems
- Research Institution
  Hirosaki University
Investigation of deposition process and electrical chracteristics of oxy-nitride dielectrics by using ECR sputteringPrincipal Investigator
- Principal Investigator
  
  TOSHIRO Ono
- Project Period (FY)
  2008 – 2010
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Hirosaki University
Development of magnetostrictive foil with nano multilayer-hetero magnetic domain driven by lower magnetic field
- Principal Investigator
  
  OKAZAKI Teiko
- Project Period (FY)
  2005 – 2007
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Physical properties of metals
- Research Institution
  Hirosaki University

All 2010 2009 2008 2005

All Journal Article Presentation

[Journal Article] Formation of Al_2O_3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique2010
- Author(s)
  H.Ishizaki, Y.Otani, Y.Fukuda, T.Sato, T.Takamatsu, T.Ono
- Journal Title
  
  Electrochemical Society, Trans.
  
  Volume: 33 Pages: 227-233
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560287
[Journal Article] Low-Temperature Formation of High-Quality GeO_2 Interlayerfor High-k Gate Dielectrics/Ge by Electron Cyclotron Resonance Plasma Techniques2010
- Author(s)
  Y.Fukuda, Y.Yazaki, Y.Otani, T.Sato, H.Toyota, T.Ono
- Journal Title
  
  IEEE Trans.Electron Devices 57(1)
  
  Pages: 282-287
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560287
[Journal Article] Formation of Al_2O_3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique2010
- Author(s)
  H.Ishizaki, Y.Otani, Y.Fukuda, T.Sato, T.Takamatsu, T.Ono
- Journal Title
  
  Electrochem.Soc.Trans. 33
  
  Pages: 227-233
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560287
[Journal Article] Low-Temperature Formation of High-Quality GeO_2 Interlayer for High-k Gate Dielectrics/Ge by Electron-Cyclotron-Resonance Plasma Techniques.2010
- Author(s)
  Y.Fukuda, Y.Yazaki, Y.Otani, T.Sato, H.Toyota, T.Ono
- Journal Title
  
  IEEE Trans. Electron Devices 57(1)
  
  Pages: 282-287
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560287
[Journal Article] Characterization of tantalum oxy-nitrides deposited by ECR sputtering2009
- Author(s)
  K.Kato, H.Toyota, Y.Jin, T.Ono
- Journal Title
  
  Vacuum 83(3)
  
  Pages: 592-595
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560287
[Journal Article] Development of Magnetostrictive Fe-Ga and Fe-Pd Thin Film,2005
- Author(s)
  T. Okazaki, S. Watanabe, N. Okanisi, T. Ono, Y.Furuya
- Journal Title
  
  Mater. Res. Soc. Symp. Proc. 855E
- Description
  「研究成果報告書概要(和文)」より
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17560581
[Presentation] Effective passivation of Ge surface by high-quality GeO2 formed by Electron-Cyclotron-Resonance plasma oxidation for Ge-based electronic and photonic devices2010
- Author(s)
  Y.Fukuda, Y.Otani, T.Sato, H.Toyota, T.Ono
- Organizer
  5th Int.Workshop on New Group IV Semiconductor Nanoelectronics
- Place of Presentation
  東北大学
- Year and Date
  2010-01-29
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] Effective passivation of Ge surface by high quality GeO_2 formed by Electron Cyclotron Resonance plasma oxidation for Ge-based electronic and photonic devices2010
- Author(s)
  Y.Fukuda, Y.Otani, T.Sato, H.Toyota, T.Ono
- Organizer
  5th Int.Workshop on New Group IV Semiconductor Nano-electronics
- Place of Presentation
  Tohoku University, Sendai
- Year and Date
  2010-01-29
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] ECRプラズマ法によるSiN/GeN/Ge-MIS界面のDLTS評価2010
- Author(s)
  佐藤真哉,岩崎拓郎,鈴木聡一郎,小野俊郎,福田幸夫,岡本浩
- Organizer
  第71回応用物理学会学術講演会
- Place of Presentation
  長崎大学
- Year and Date
  2010-09-15
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] ECRイオンアシスト加工におけるMIS界面制御の検討2010
- Author(s)
  泉康平,豊田宏,福田幸夫,室田淳一,櫻庭政夫,小野俊郎
- Organizer
  2010精密工学会東北支部学術講演会
- Place of Presentation
  岩手県工業技術センター
- Year and Date
  2010-11-27
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] マイクロ波リモートプラズマを用いた原子層堆積法によるSi基板上へのAl_2O_3薄膜の堆積2010
- Author(s)
  石崎博基、飯田真正、王谷洋平、福田幸夫、佐藤哲也、高松利行、小野俊郎
- Organizer
  第71回応肋理学会学術講演会
- Place of Presentation
  長崎大学
- Year and Date
  2010-09-15
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] Formation of Al_2O_3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique2010
- Author(s)
  H.Ishizaki, Y.Otani, Y.Fukuda, T.Sato, T.Takamatsu, T.Ono
- Organizer
  218th Electrochemical Society Meeting
- Place of Presentation
  Riviera Hotel, LA(USA)
- Year and Date
  2010-10-10
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] Formation of Al_2O_3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique2010
- Author(s)
  H.Ishizaki, Y.Otani, Y.Fukuda, T.Sato, T.Takamatsu, T.Ono
- Organizer
  218th Electrochemical Society Meeting
- Place of Presentation
  Riviera Hotel, (LA, USA)
- Year and Date
  2010-10-10
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] ECRプラズマ法によるAl_2O_3/GeO_2/Ge-MOSキャパシタの電気的特性に及ぼすPDA処理雰囲気の影響2009
- Author(s)
  小野俊郎
- Organizer
  第56回応用物理学関係連合講演会
- Place of Presentation
  筑波大学
- Year and Date
  2009-03-30
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] Al_2O_3/GeO_2/Ge-MOSキャパシタにおける誘電緩和現象の評価2009
- Author(s)
  小野俊郎
- Organizer
  第56回応用物理学関係連合講演会
- Place of Presentation
  筑波大学
- Year and Date
  2009-03-30
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] ECRプラズマ酸化法による高品質GeO_2/Ge-MOS界面の形成2009
- Author(s)
  小野俊郎
- Organizer
  第56回応用物理学関係連合講演会
- Place of Presentation
  筑波大学
- Year and Date
  2009-03-30
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] IPE法によるECRプラズマ酸化GeO2-Ge構造のバンドアライメントの検討2009
- Author(s)
  福田幸夫、矢崎祐那、王谷洋平、佐藤哲也、豊田宏、小野俊郎
- Organizer
  第70回応用物理学会学術講演会
- Place of Presentation
  富山大学
- Year and Date
  2009-09-08
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] ECRスパッタ成膜誘電体を用いたMISキャパシタの電気特性安定化2009
- Author(s)
  小野俊郎,豊田宏,有原浩之,福田幸夫,室田淳一,櫻庭政夫
- Organizer
  第70回応用物理学会学術講演会
- Place of Presentation
  富山大学
- Year and Date
  2009-09-08
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] ECRプラズマ法によるAl_2O_3/GeO_2/Ge-MOSキャパシタの電気特性に及ぼすPDA処理雰囲気の影響2009
- Author(s)
  福田幸夫,王谷洋平,佐藤哲也,有原浩之,豊田宏,小野俊郎
- Organizer
  第56回応用物理学関係連合講演会
- Place of Presentation
  筑波大学
- Year and Date
  2009-03-23
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] An electrical chracterization of metal oxy-nitrides deposited by an ECR sputtering for MIS gates.2009
- Author(s)
  H.Arihara, H.Toyota, J.Murota, M.Sakuraba, Y.Fukuda, T.Ono
- Organizer
  The 10th International Symposium on Sputtering and Plasma Processes
- Place of Presentation
  金沢国際ホテル
- Year and Date
  2009-07-08
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] An electrical characterization of metal oxy-nitrides deposited by an ECR sputtering for MIS gates2009
- Author(s)
  H.Arihara, H.Toyota, J.Murota, M.Sakuraba, Y.Fukuda, T.Ono
- Organizer
  The 10th International Symposium on Sputtering and Plasma Processes
- Place of Presentation
  Kanazawa Intern'l Hotel, Kanazawa
- Year and Date
  2009-07-08
- Data Source
  KAKENHI-PROJECT-20560287
[Presentation] ECRスパッタによる酸窒化高誘電体薄膜の形成と電気特性評価2008
- Author(s)
  有原浩之,豊田宏,小野俊郎
- Organizer
  2008年度精密工学会秋季大会学術講演会
- Place of Presentation
  東北大学
- Year and Date
  2008-09-17
- Data Source
  KAKENHI-PROJECT-20560287

1. TOYOTA Hiroshi (90400126)

# of Collaborated Projects: 1 results

# of Collaborated Products: 12 results
2. FUKUDA Yukio (50367546)

# of Collaborated Projects: 1 results

# of Collaborated Products: 16 results
3. OKAZAKI Teiko (10003328)

# of Collaborated Projects: 1 results

# of Collaborated Products: 1 results
4. FURUYA Yasubumi (20133051)

# of Collaborated Projects: 1 results

# of Collaborated Products: 1 results
5. 牧野英司 (70109495)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
6. 笹川和彦 (50250676)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
7. 峯田貴 (50374814)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results

TOSHIRO Ono 小野 俊郎

Research Projects

Research Products

Co-Researchers

内視鏡医療トレーニングのための括約筋をもつアクティブ臓器モデルの開発

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Investigation of deposition process and electrical chracteristics of oxy-nitride dielectrics by using ECR sputteringPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Development of magnetostrictive foil with nano multilayer-hetero magnetic domain driven by lower magnetic field

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

[Journal Article] Formation of Al_2O_3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique2010

Author(s)

Journal Title

Data Source

[Journal Article] Low-Temperature Formation of High-Quality GeO_2 Interlayerfor High-k Gate Dielectrics/Ge by Electron Cyclotron Resonance Plasma Techniques2010

Author(s)

Journal Title

Data Source

[Journal Article] Formation of Al_2O_3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique2010

Author(s)

Journal Title

Data Source

[Journal Article] Low-Temperature Formation of High-Quality GeO_2 Interlayer for High-k Gate Dielectrics/Ge by Electron-Cyclotron-Resonance Plasma Techniques.2010

Author(s)

Journal Title

Data Source

[Journal Article] Characterization of tantalum oxy-nitrides deposited by ECR sputtering2009

Author(s)

Journal Title

Data Source

[Journal Article] Development of Magnetostrictive Fe-Ga and Fe-Pd Thin Film,2005

Author(s)

Journal Title

Description

Data Source

[Presentation] Effective passivation of Ge surface by high-quality GeO2 formed by Electron-Cyclotron-Resonance plasma oxidation for Ge-based electronic and photonic devices2010

Author(s)

Organizer

Place of Presentation

Year and Date

Data Source

[Presentation] Effective passivation of Ge surface by high quality GeO_2 formed by Electron Cyclotron Resonance plasma oxidation for Ge-based electronic and photonic devices2010

Author(s)

Organizer

Place of Presentation

Year and Date

Data Source

[Presentation] ECRプラズマ法によるSiN/GeN/Ge-MIS界面のDLTS評価2010

Author(s)

Organizer

Place of Presentation

Year and Date

Data Source

[Presentation] ECRイオンアシスト加工におけるMIS界面制御の検討2010

Author(s)

Organizer

Place of Presentation

Year and Date

Data Source

[Presentation] マイクロ波リモートプラズマを用いた原子層堆積法によるSi基板上へのAl_2O_3薄膜の堆積2010

Author(s)

Organizer

Place of Presentation

Year and Date

Data Source

[Presentation] Formation of Al_2O_3 Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Technique2010

Author(s)

Organizer

TOSHIRO Ono 小野俊郎