Horita Susumu 堀田將

… Alternative Names

堀田將ホリタススム

HORITA Susumu 堀田將

堀田将ホリタススム

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Researcher Number	60199552
Other IDs
External Links
Affiliation (Current)	2025: 北陸先端科学技術大学院大学, 先端科学技術研究科, 教授
Affiliation (based on the past Project Information) *help	2023: 北陸先端科学技術大学院大学, 先端科学技術研究科, 教授 2021: 北陸先端科学技術大学院大学, 先端科学技術研究科, 教授 2016 – 2018: 北陸先端科学技術大学院大学, 先端科学技術研究科, 教授 2009 – 2011: Japan Advanced Institute of Science and Technology, マテリアルサイエンス研究科, 准教授 2003 – 2004: 北陸先端科学技術大学院大学, 材料科学研究科, 助教授 … More 2000 – 2001: 北陸先端科学技術大学院大学, 材料科学研究科, 助教授 1995 – 1998: 北陸先端科学技術大学院大学, 材料科学研究科, 助教授 1994: 北陸先端大学院大学, 材料科学研究科, 助教授 1991: Faculty of Technology, Kanazawa University, 工学部, 助教授 1988 – 1990: Kanazawa University, Assistant Professor., 工学部, 講師 Less
Review Section/Research Field	Principal Investigator Electronic materials/Electric materials / Electronic materials/Electric materials / Basic Section 26020:Inorganic materials and properties-related / Electron device/Electronic equipment / Applied materials science/Crystal engineering Except Principal Investigator 電子材料工学 / Applied physics, general / Applied materials / 電子デバイス・機器工学
Keywords	Principal Investigator シリコン / Silicon / イットリア安定化ジルコニア / PZT / 強誘電体 / Reactive Sputtering / ヘテロエピタキシャル成長 / 低温作製 / Ferroelectric / Si … More / YSZ / Ferroelectric Memory / 強誘電体メモリ / Sputtering / Heteroepitaxial Growth / Yttria-Stabilized Zirconia / 反応性スパッタ / 薄膜トランジスタ / 酸化Ｓｉ膜 / シリコーンオイル / アンモニアガス / 酸化Si膜 / OH / シリカ膜 / デバイス設計・製造プロセス / 電子デバイス・機器 / 電子・電気材料 / YSZ薄膜低温作製 / 結晶化シリコン膜 / セルロースナノペーパー / 結晶化シリコン / セルロースナノペーパ / BIT / Heteroepitaxy / Yttria Stabilized Zirconia / 誘電率 / ヘシロエピタオシャル / 反脳性スパッタ / チタン酸ビスマス / Ir / イリジウム / 反応性スパッタリング / ジルコン酸チタン酸鉛 / Dielectric Materials / 誘電体 / スパッタリング / 多結晶Si / 低温プロセス / 固相成長 / YSZ薄膜 / Si薄膜 / 低温結晶化 / 単結晶膜 / 非晶質 / 二次元 / 人工格子 / イオン注入 / チャネリング … More Except Principal Investigator Si / PAS / Photoacoustic Spectroscopy / InP / 熱伝導率 / LiNbO_3 / GaAs / GaInP / 光音響分光法 / Plasma control / Silicide / Sputtering / スパッタリング / 人工格子 / プラズマ発光分光分析 / プラズマ制御 / 傾斜機能材料 / シリサイド / マグネトロンスパッタ / 薄膜 / Thermal Diffusivity / Photothermal Spectroscopy / Thermal Conductivity / Thermal conductivity / 薄膜の熱拡散率 / 熱拡散率 / Ion implantation / Optical absorption coefficient / Piezoelectric transducer / Multilayered structures / ImP / 積層構造 / PAS(光音響分光法) / 透明トランスジュ-サ法PAS / イオン注入 / 光吸収係数 / 圧電トランスジュ-サ / 多層構造 / 熱酸化 / スパッタ膜 / TFT / 薄膜トランジスター / 酸化銅 Less

Significant improvement of electrical properties of low-temperature deposited silica film by annealed at lower than 200oCPrincipal Investigator
- Principal Investigator
  
  堀田將
- Project Period (FY)
  2021 – 2024
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Review Section
  
  Basic Section 26020:Inorganic materials and properties-related
- Research Institution
  Japan Advanced Institute of Science and Technology
Fabrication of thin-film transistor of crystallized silicon film on cellulose nanopaperPrincipal Investigator
- Principal Investigator
  
  Horita Susumu
- Project Period (FY)
  2016 – 2018
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Japan Advanced Institute of Science and Technology
Control of grain size in a low-temperature-crystallized Si film using seed layerPrincipal Investigator
- Principal Investigator
  
  HORITA Susumu
- Project Period (FY)
  2009 – 2011
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Japan Advanced Institute of Science and Technology
Development of New FET-Type Ferroelectric Memory with an Intermediate ElectrodePrincipal Investigator
- Principal Investigator
  
  HORITA Susumu
- Project Period (FY)
  2003 – 2004
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electron device/Electronic equipment
- Research Institution
  Japan Advanced Institute of Science and Technology
Fabrication of single ferroelectric films on silicon substrates by interface controlPrincipal Investigator
- Principal Investigator
  
  HORITA Susumu
- Project Period (FY)
  2000 – 2001
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Japan Advanced Institute of Science and Technology, School of Materials Science
チャネリングイオンを用いた非晶質表面上への二次元人工結晶格子の作製Principal Investigator
- Principal Investigator
  
  堀田将
- Project Period (FY)
  1997
- Research Category
  
  Grant-in-Aid for Exploratory Research
- Research Field
  
  Applied materials science/Crystal engineering
- Research Institution
  Japan Advanced Institute of Science and Technology
Hoteroepitaxial growth of ferroelectric thin film on Si substrate by controlling the interfacePrincipal Investigator
- Principal Investigator
  
  HORITA Susumu
- Project Period (FY)
  1997 – 1998
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Japan Advanced Institute of Science and Technology
酸化銅を用いた高移動度薄膜トランジスタの低温形成
- Principal Investigator
  
  松村英樹
- Project Period (FY)
  1995
- Research Category
  
  Grant-in-Aid for General Scientific Research (B)
- Research Field
  
  電子デバイス・機器工学
- Research Institution
  Japan Advanced Institute of Science and Technology
Heteroepitaxial growth of oxide thin film on Si substrate by controlling the interfacePrincipal Investigator
- Principal Investigator
  
  HORITA Susumu
- Project Period (FY)
  1995 – 1996
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Japan Advanced Institute of Science and Technology, Hokuriku
Study of high reslution measurement of thin-film-thermal-properties by the ultra-high sensitive PAS
- Principal Investigator
  
  HATA Tomonobu
- Project Period (FY)
  1994 – 1996
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Applied physics, general
- Research Institution
  Kanazawa University
Evaluation of Multilayer Structure by Using new High Sensitivity PAS
- Principal Investigator
  
  HATA Tomonobu
- Project Period (FY)
  1989 – 1991
- Research Category
  
  Grant-in-Aid for General Scientific Research (B)
- Research Field
  
  Applied materials
- Research Institution
  Kanazawa University
Development of new method to control composition ratio of alloy film by low temperature, high rate deposition
- Principal Investigator
  
  HATA Tomonobu
- Project Period (FY)
  1986 – 1988
- Research Category
  
  Grant-in-Aid for Developmental Scientific Research
- Research Field
  
  電子材料工学
- Research Institution
  Kanazawa University

All 2024 2023 2019 2018 2017 2016 2012 2011 2010 2009 2004

All Journal Article Presentation Patent

[Journal Article] Study on residual OH content in low-temperature Si oxide films after in situ post-deposition heating (PDH)2023
- Author(s)
  Horita Susumu、Pu Di
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 63 Issue: 1 Pages: 01SP12-01SP12
- DOI
  10.35848/1347-4065/acf477
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-21K04649
[Journal Article] Highly effective removal of OH bonds in low-temperature silicon oxide films by annealing with ammonia gas at a low temperature of 175 °C2019
- Author(s)
  Susumu Horita
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 58 Issue: 3 Pages: 038002-038002
- DOI
  10.7567/1347-4065/aafb64
- NAID
  210000135350
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16K06257
[Journal Article] Dependences of deposition rate and OH content on concentration of added trichloroethylene in low-temperature silicon oxide films deposited using silicone oil and ozone gas2018
- Author(s)
  Susumu Horita and Puneet Jain
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 57 Issue: 3S1 Pages: 03DA02-03DA02
- DOI
  10.7567/jjap.57.03da02
- NAID
  120006584034
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-16K06257
[Journal Article] Effect of trichloroethylene enhancement on deposition rate of low-temperature silicon oxide films by silicone oil and ozone2017
- Author(s)
  Susumu Horita and Puneet Jain
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 56 Issue: 8 Pages: 088003-088003
- DOI
  10.7567/jjap.56.088003
- NAID
  120006486935
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-16K06257
[Journal Article] Low-Temperature Crystallization of Silicon Films Directly Deposited on Glass Substrates Covered with Yttria-Stabilized Zirconia Layers2010
- Author(s)
  Susumu Horita, Sukreen Hana
- Journal Title
  
  Jpn.J.Appl.Phys.
  
  Volume: 49
- NAID
  120002515707
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21560324
[Journal Article] Low-Temperature Crystallization of Silicon Films Directly Deposited on Glass Substrates Covered with Yttria-Stabilized Zirconia Layers2010
- Author(s)
  Susumu Horita and Sukreen Hana
- Journal Title
  
  Jpn. J. Appl. Phys
  
  Volume: Vol.49, No.10
- NAID
  120002515707
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21560324
[Journal Article] Low-temperature Fabrication of a Crystallized Si Film Deposited on a Glass Substrate using an Yttria-stabilized Zirconia Seed Layer2009
- Author(s)
  Sukreen Hana Herman and Susumu Horita
- Journal Title
  
  Mat. Res. Soc. Symp. Proc.
  
  Volume: Vol.1153 Pages: 77-82
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21560324
[Journal Article] Enhancement of the crystalline quality of reactively sputtered yttria-stabilized zirconia by oxidation of the metallic target surface2009
- Author(s)
  S. Hana, K. Nishioka, and S. Horita
- Journal Title
  
  Thin Solid Films
  
  Volume: Vol.517, Issue 20 Pages: 5830-5836
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21560324
[Journal Article] Influence of Pre-Oxidation of an Ir Film on Chemical Composition and Crystal Property of a PZT Film Deposited on the Ir Film by Sputtering2004
- Author(s)
  S.Horita, M.Shouga
- Journal Title
  
  Mat.Res.Soc.Symp.Proc. Vol.811
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560293
[Journal Article] Influence of electrode material on ferroelectric hysteresis loop of a PZT film deposited by sputtering.2004
- Author(s)
  S.Horita, H.Kasagawa, M.Syoga
- Journal Title
  
  Proc.The 7th International Symp.on Sputtering and Plasma Processes Vol.AP P-4
  
  Pages: 491-494
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560293
[Journal Article] Retention and Read Endurance Characteristics of a Ferroelectric Gate Field Effect Transistor Memory with an Intermediate Electrode.2004
- Author(s)
  T.D.Khoa, S.Horita
- Journal Title
  
  Jpn.J.Appl.Phys Vol.43, No.4B
  
  Pages: 2220-2225
- NAID
  10012949833
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560293
[Journal Article] Study on Operation of a Ferroelectric Gate Field-Effect Transistor Memory with an Intermediate Electrode2004
- Author(s)
  T.D.Khoa, S.Horita
- Journal Title
  
  IEEE Transaction on Electron Devices Vol.51, No.5
  
  Pages: 820-823
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560293
[Journal Article] Study on Operation of a Ferroelectric Gate Field-Effect Transistor Memory with an Intermediate Electrode2004
- Author(s)
  T.D.Khoa, S.Horita
- Journal Title
  
  IEEE Transaction on Electron Devices Vol.51,No.5
  
  Pages: 820-823
- Data Source
  KAKENHI-PROJECT-15560293
[Journal Article] Retention and Read Endurance Characteristics of a Ferroelectric Gate Field Effect Transistor Memory with an Intermediate Electrode2004
- Author(s)
  T.D.Khoa, S.Horita
- Journal Title
  
  Jpn.J.Appl.Phys Vol.43,No.4B
  
  Pages: 2220-2225
- NAID
  10012949833
- Data Source
  KAKENHI-PROJECT-15560293
[Journal Article] Study on Operation of a Ferroelectric Gate Field-Effect Transistor Memory with an Intermediate Electrode.2004
- Author(s)
  T.D.Khoa, S.Horita
- Journal Title
  
  IEEE Transaction on Electron Devices Vol.51, No.5
  
  Pages: 820-823
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560293
[Journal Article] Influence of electrode material on ferroelectric hysteresis loop of a PZT film deposited by sputtering2004
- Author(s)
  S.Horita, H.Kasagawa, M.Syoga
- Journal Title
  
  Proc. The 7th International Symp. on Sputtering and Plasma Processes AP P-4
  
  Pages: 491-494
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560293
[Journal Article] Retention and Read Endurance Characteristics of a Ferroelectric Gate Field Effect Transistor Memory with an Intermediate Electrode2004
- Author(s)
  T.D.Khoa, S.Horita
- Journal Title
  
  Jpn.J.Appl.Phys. Vol.43, No.4B
  
  Pages: 2220-2225
- NAID
  10012949833
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560293
[Journal Article] Influence of Pre-Oxidation of an Ir Film on Chemical Composition and Crystal Property of a PZT Film Deposited on the Ir Film by Sputtering.2004
- Author(s)
  S.Horita, M.Shouga
- Journal Title
  
  Mat.Res.Soc.Symp.Proc. Vol.811
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560293
[Patent] 半導体装置の製造方法、基板処理装置及びプログラム2017
- Inventor(s)
  堀田將, 堀井貞義
- Industrial Property Rights Holder
  堀田將, 堀井貞義
- Industrial Property Rights Type
  特許
- Filing Date
  2017
- Overseas
- Data Source
  KAKENHI-PROJECT-16K06257
[Presentation] エタノール蒸気を添加したNH3ガスによる低温酸化Si膜中残留OH基量の低減効果2024
- Author(s)
  堀田　將
- Organizer
  第71回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-21K04649
[Presentation] NH3ガス添加アニールによる低温酸化Si膜の絶縁特性2023
- Author(s)
  堀田　將
- Organizer
  第84回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-21K04649
[Presentation] Study on residual OH content in low-temperature Si oxide films after in-situ post-deposition heating2023
- Author(s)
  Susumu Horita, Di Pu
- Organizer
  The 9th International symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies (EM-NANO2023)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K04649
[Presentation] Effect of ammonia gas in annealing process on reduction of residual OH-bonds and improvement of electrical properties of low-temperature silicon oxide films2023
- Author(s)
  Susumu Horita
- Organizer
  The 4th International Workshop on Advanced Materials and Devices IWAMD 2023
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-21K04649
[Presentation] NH3ガスを用いた酸化Si膜残留OH成分除去量の低温アニール条件依存性2019
- Author(s)
  堀田　將
- Organizer
  第66回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-16K06257
[Presentation] 低温(150oC)アニールによる低温酸化Si膜中残留OH成分の除去2018
- Author(s)
  堀田　將
- Organizer
  第79回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-16K06257
[Presentation] Reduction of Residual OH Content in a Low-temperature Si Oxide2018
- Author(s)
  Susumu Horita
- Organizer
  The 25th International Display Workshops(IDW'18) in conjunction with Asia Display 2018
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06257
[Presentation] セルロースナノペーパー(CNP)上への多結晶Si-TFT作製への挑戦－－－基盤技術への取り組みについて－－－2018
- Author(s)
  堀田　將
- Organizer
  第79回応用物理学会秋季学術講演会
- Invited
- Data Source
  KAKENHI-PROJECT-16K06257
[Presentation] 触媒作用による低温酸化Si膜中残留OH成分の除去2018
- Author(s)
  堀田　將
- Organizer
  薄膜材料デバイス研究会第15回研究集会「未来のエネルギー社会に貢献する薄膜技術」
- Data Source
  KAKENHI-PROJECT-16K06257
[Presentation] CNPを被覆したガラス基板上への結晶化YSZ薄膜の室温堆積2018
- Author(s)
  堀田將、柳生瞳、能木雅也
- Organizer
  第65回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-16K06257
[Presentation] Trichloroethene Concentration Effect on Deposition Rate and Properties of Low-Temperature2017
- Author(s)
  Puneet Jain and Susumu Horita
- Organizer
  第64回応用物理学会春季学術講演会
- Place of Presentation
  パシフィコ横浜（神奈川県横浜市）
- Year and Date
  2017-03-15
- Data Source
  KAKENHI-PROJECT-16K06257
[Presentation] トリクロロエチレンによる有機SiガスAPCVD低温酸化Si膜中の残留OH量減少の効果2017
- Author(s)
  堀田將, Jain Puneet
- Organizer
  第78回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-16K06257
[Presentation] Room-Temperature Deposition of a Crystallized Dielectric YSZ Film on Glass Substrate Covered with Cellulose Nanopaper2017
- Author(s)
  Susumu Horita, Jyotish Patidar, Hitomi Yagyu, and Masaya Nogi
- Organizer
  The 24th International Display Workshops(IDW'17) in conjunction with Asia Display 2017
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06257
[Presentation] Effect of Trichloroethene (TCE) on Deposition Rate and Film Quality of Low-Temperature SiO2 Films Grown Using Silicone Oil and Ozone Gas2017
- Author(s)
  Puneet Jain and Susumu Horita
- Organizer
  The 24th International Workshop on Active-Matrix Flat Panel Displays and Devices (AM-FPD 17)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06257
[Presentation] Effect of Adding Organic Solution on the Deposition Rate and Quality of Silicon Oxide Films using Silicone Oil and Ozone Gas2016
- Author(s)
  Puneet Jain and Susumu Horita
- Organizer
  薄膜材料デバイス研究会第13回研究集会
- Place of Presentation
  響都ホール校友会館（京都市）
- Year and Date
  2016-10-21
- Data Source
  KAKENHI-PROJECT-16K06257
[Presentation] Effect of Added Organic Solution on Low-Temperature Deposition of SiOx Films by2016
- Author(s)
  Puneet Jain and Susumu Horita
- Organizer
  第77回応用物理学会秋季学術講演会
- Place of Presentation
  朱鷺メッセ (新潟県新潟市)
- Year and Date
  2016-09-16
- Data Source
  KAKENHI-PROJECT-16K06257
[Presentation] Catalytic Effect of Trichloroethene on Deposition Rate of Silicon Oxides Films Deposited by APCVD Using Silicone Oil and Ozone Gas2016
- Author(s)
  Puneet Jain and Susumu Horita
- Organizer
  The 23rd International Display Workshops(IDW'16) in conjunction with Asia Display 2016
- Place of Presentation
  Fukuoka International Congress Center (Fukuoka)
- Year and Date
  2016-12-07
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16K06257
[Presentation] H_2O_2溶液をバブリングしたオゾンガスとシリコーンオイルを用いて堆積した酸化Si薄膜の膜質特性2012
- Author(s)
  辻埜太一,谷口勇太,堀田將
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  早稲田大学、東京
- Year and Date
  2012-03-15
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] H_2O_2溶液をバブリングしたオゾンガスとシリコーンオイルを用いた酸化Si薄膜の堆積反応の検討2012
- Author(s)
  谷口勇太、辻埜太一、堀田將
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  早稲田大学、東京
- Year and Date
  2012-03-15
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] 結晶化誘発YSZ層のプレアニールによる非晶質Si薄膜の固相結晶化への影響2012
- Author(s)
  竹本和幸,森井健太,堀田將
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  早稲田大学、東京
- Year and Date
  2012-03-16
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] H_2O_2溶液をバブリングしたオゾンガスとシリコーンオイルを用いて堆積した酸化Si薄膜の膜質特性2012
- Author(s)
  辻埜太一, 谷口勇太, 堀田將
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  東京都、早稲田大学早稲田キャンパス
- Year and Date
  2012-03-15
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] ボトムゲート電極を有したYSZゲート絶縁膜上へ固相結晶化Si薄膜の形成2012
- Author(s)
  森井健太、竹本和幸、堀田將
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  早稲田大学、東京
- Year and Date
  2012-03-16
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] H_2O_2溶液をバブリングしたオゾンガスとシリコーンオイルを用いた酸化Si薄膜の堆積反応の検討2012
- Author(s)
  谷口勇太、辻埜太一、堀田將
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  東京都、早稲田大学早稲田キャンパス
- Year and Date
  2012-03-15
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] 結晶化誘発YSZ層のプレアニールによる非晶質Si薄膜の固相結晶化への影響2012
- Author(s)
  竹本和幸, 森井健太, 堀田將
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  東京都、早稲田大学早稲田キャンパス
- Year and Date
  2012-03-16
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] ボトムゲート電極を有したYSZゲート絶縁膜上へ固相結晶化Si薄膜の形成2012
- Author(s)
  森井健太、竹本和幸、堀田將
- Organizer
  第59回応用物理学関係連合講演会
- Place of Presentation
  東京都、早稲田大学早稲田キャンパス
- Year and Date
  2012-03-16
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] SRO/Tiボトムゲート電極上のYSZゲート絶縁膜の作製2011
- Author(s)
  森井健太、竹本和幸、堀田將
- Organizer
  薄膜材料デバイス研究会第8回研究集会「新しいデバイス材料」
- Place of Presentation
  京都市、アバンティ9階、響都ホール(龍谷大)
- Year and Date
  2011-11-04
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] SRO/Tiボトムゲート電極上のYSZゲート絶縁膜の作製2011
- Author(s)
  森井健太、竹本和幸、堀田將
- Organizer
  薄膜材料デバイス研究会第8回研究集会
- Place of Presentation
  アバンティ9階、響都ホール、京都市
- Year and Date
  2011-11-04
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] Si-TFT用SRO/Tiボトムゲート電極とYSZゲート絶縁膜の作製2011
- Author(s)
  森井健太、竹本和幸、堀田將
- Organizer
  第72回応用物理学会学術講演会
- Place of Presentation
  山形大学小白川キャンパス、山形市
- Year and Date
  2011-08-30
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] オゾンとシリコーンオイルを用いた酸化Si薄膜堆積におけるH_2O_2溶液バブリングの効果2011
- Author(s)
  谷口勇太、辻埜太一、堀田將
- Organizer
  薄膜材料デバイス研究会第8回研究集会
- Place of Presentation
  アバンティ9階、響都ホール、京都市
- Year and Date
  2011-11-04
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] Si-TFT用SRO/Tiボトムゲート電極とYSZゲート絶縁膜の作製2011
- Author(s)
  森井健太、竹本和幸、堀田將
- Organizer
  第72回応用物理学会学術講演会
- Place of Presentation
  山形市、山形大学小白川キャンパス
- Year and Date
  2011-08-30
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] YSZ層上a-Si薄膜の固相結晶化におけるプレアニール時間とインキュベーション時間との関係2011
- Author(s)
  竹本和幸、森井健太、堀田將
- Organizer
  薄膜材料デバイス研究会第8回研究集会
- Place of Presentation
  アバンティ9階、響都ホール、京都市
- Year and Date
  2011-11-15
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] YSZ層上a-Si薄膜の固相結晶化におけるプレアニール時間とインキュベーション時間との関係2011
- Author(s)
  竹本和幸、森井健太、堀田將
- Organizer
  薄膜材料デバイス研究会第8回研究集会「新しいデバイス材料」
- Place of Presentation
  京都市、アバンティ9階、響都ホール(龍谷大)
- Year and Date
  2011-11-05
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] オゾンとシリコーンオイルを用いた酸化Si薄膜堆積におけるH_2O_2溶液バブリングの効果2011
- Author(s)
  谷口勇太、辻埜太一、堀田將
- Organizer
  薄膜材料デバイス研究会第8回研究集会「新しいデバイス材料」
- Place of Presentation
  京都市、アバンティ9階、響都ホール(龍谷大)
- Year and Date
  2011-11-04
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] 結晶化誘発層イットリア安定化ジルコニアを用いた低温結晶化シリコン薄膜作製における堆積前基板加熱によるSi結晶化の効果2011
- Author(s)
  竹本和幸森井健太堀田將
- Organizer
  平成23年度電気関係学北陸支部連合大会
- Place of Presentation
  福井大学文京キャンパス、福井市
- Year and Date
  2011-09-17
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] オゾンガスのH_2O、H_2O_2溶液バブリングによるシリコーンオイル酸化Si膜の形成2011
- Author(s)
  谷口勇太、辻埜太一、堀田將
- Organizer
  第72回応用物理学会学術講演会
- Place of Presentation
  山形大学小白川キャンパス、山形市
- Year and Date
  2011-08-31
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] 結晶化誘発層イットリア安定化ジルコニアを用いた低温結晶化シリコン薄膜作製における堆積前基板加熱によるSi結晶化の効果2011
- Author(s)
  竹本和幸, 森井健太, 堀田將
- Organizer
  平成23年度電気関係学北陸支部連合大会
- Place of Presentation
  福井市、福井大学文京キャンパス
- Year and Date
  2011-09-17
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] オゾンガスのH_2O、H_2O_2溶液バブリングによるシリコーンオイル酸化Si膜の形成2011
- Author(s)
  谷口勇太、辻埜太一、堀田將
- Organizer
  第72回応用物理学会学術講演会
- Place of Presentation
  山形市、山形大学小白川キャンパス
- Year and Date
  2011-08-31
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] 非晶質Si薄膜の固相結晶化に及ぼすイットリア安定化ジルコニア(YSZ)の影響2010
- Author(s)
  堀田將、赤堀達矢
- Organizer
  薄膜材料デバイス研究会第7回研究集会
- Place of Presentation
  なら100年会館、奈良市。
- Year and Date
  2010-11-06
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] イットリア安定化ジルコニア(YSZ)による非晶質Si薄膜の固相結晶化への効果2010
- Author(s)
  赤堀達矢,堀田將
- Organizer
  第57回応用物理学関係連合講演会
- Place of Presentation
  東海大学(湘南キャンパス)、神奈川県
- Year and Date
  2010-03-18
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] YSZ層上の直接体積Si薄膜の低温結晶化におけるF+Y単分子層のパッシベイション効果2010
- Author(s)
  堀田將
- Organizer
  第71回応用物理学会学術講演会
- Place of Presentation
  長崎大学文教キャンパス、長崎市
- Year and Date
  2010-09-15
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] Ysz層上の直接堆積Si薄膜の低温結晶化におけるF+Y単分子層のパッシベイション効果2010
- Author(s)
  堀田將
- Organizer
  第71回応用物理学会学術講演会
- Place of Presentation
  長崎市、長崎大学文教キャンパス
- Year and Date
  2010-09-15
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] 非晶質Si薄膜の固相結晶化に及ぼすイットリア安定化ジル4ア(Ysz)の影響2010
- Author(s)
  堀田將、赤堀達矢
- Organizer
  薄膜材料デバイス研究会第7回研究集会「薄膜デバイスの理解と解析」
- Place of Presentation
  奈良市、なら100年会館
- Year and Date
  2010-11-06
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] Passivation Effect of F+Y Monolayer on Yttria-stabilized Zirconia(YSZ) Layers of LTPS2010
- Author(s)
  S. Horita
- Organizer
  16th International Display Workshops(IDW' 10)
- Place of Presentation
  Fukuoka International Congress Center, Fukuoka
- Year and Date
  2010-12-02
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] イットリア安定化ジルコニア(YSZ)による非晶質Si薄膜の固相結晶化への効果2010
- Author(s)
  赤堀達矢、堀田將
- Organizer
  第57回応用物理学関係連合講演会
- Place of Presentation
  神奈川県平塚市、東海大学平塚キャンパス
- Year and Date
  2010-03-18
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] Passivation Effect of F+Y Monolayer on Yttria-stabilized Zirconia (YSZ) Layers of UPS2010
- Author(s)
  S.Horita
- Organizer
  Proc.of the 16th International Display Workshops(IDW 10)
- Place of Presentation
  Fukuoka International Congress Center, Fukuoka, Japan ?
- Year and Date
  2010-12-02
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] 固相成長法による結晶化誘発YSZ層上の非晶質Si薄膜の結晶化2009
- Author(s)
  赤堀達矢、スクリーン・ハナ、杉田恵美、堀田將
- Organizer
  薄膜材料デバイス研究会第6回研究集会
- Place of Presentation
  京都市、龍谷大学大宮学舎
- Year and Date
  2009-11-03
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] Crystalline Properties of the Low-temperature Polycrystalline Silicon Film on Glass Substrate Deposited by Yttria-Stabilized Zirconia Stimulation Layer Method2009
- Author(s)
  スクリーン・ハナ, 赤堀達矢, 堀田將
- Organizer
  薄膜材料デバイス研究会第6回研究集会
- Place of Presentation
  京都市、龍谷大学大宮学舎
- Year and Date
  2009-11-03
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] Relation of YSZ stimulation layer crystalline quality with the low-temperature crystallization of the Si film2009
- Author(s)
  スクリーン・ハナ, 堀田將
- Organizer
  第70回応用物理学会学術講演会
- Place of Presentation
  富山市、富山大学五福キャンパス
- Year and Date
  2009-09-09
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] Low-temperature Growth of Crystallized Si Film on Yttria-Stabilized Zirconia Stimulation Layer2009
- Author(s)
  S. Hana, T. Akahori and S. Horita
- Organizer
  15th International Display Workshops
- Place of Presentation
  World Convention Center Summit, Miyazaki
- Year and Date
  2009-12-09
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] 固相成長による結晶化誘発YSZ層上の非晶質Si薄膜の結晶化2009
- Author(s)
  赤堀達矢、スクリーン・ハナ、堀田將
- Organizer
  第70回応用物理学会学術講演会
- Place of Presentation
  富山市、富山大学五福キャンパス
- Year and Date
  2009-09-09
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] Low-temperature Growth of Crystallized Si Film on Yttria-Stabilized Zirconia Stimulation Layer2009
- Author(s)
  スクリーン・ハナ, 赤堀達矢, 堀田將
- Organizer
  15th International Display Workshops(IDW'08)
- Place of Presentation
  宮崎市、シーガイア
- Year and Date
  2009-12-09
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] Lowtemperature Fabrication of a Crystallized Si Film Deposited on a Glass Substrate using an Yttria stabilized Zirconia Seed Layer2009
- Author(s)
  S. Hana and S. Horita
- Organizer
  Material Research Society(MRS) Spring Meeting
- Place of Presentation
  San San Francisco, U. S. A.
- Year and Date
  2009-04-14
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] Relation of YSZ stimulation layer crystalline quality with the low-temperature crystallization of the Si film2009
- Author(s)
  Hana SUKREEN and Susumu HORITA
- Organizer
  第70回応用物理学会学術講演会
- Place of Presentation
  富山大学五福キャンパス、富山市
- Year and Date
  2009-09-09
- Data Source
  KAKENHI-PROJECT-21560324
[Presentation] 固相成長による結晶化誘発YSZ層上の非晶質Si薄膜の結晶化2009
- Author(s)
  赤堀達矢, SUKREEN Hana,堀田將
- Organizer
  第70回応用物理学会学術講演会
- Place of Presentation
  富山大学五福キャンパス、富山市
- Year and Date
  2009-09-09
- Data Source
  KAKENHI-PROJECT-21560324

1. HATA Tomonobu (50019767)

# of Collaborated Projects: 3 results

# of Collaborated Products: 0 results
2. MASUDA Astushi (30283154)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
3. SASAKI Kimihiro (40162359)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
4. NISHIOKA Kensuke (00377441)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
5. HASEGAWA Seiichi (10019755)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
6. 松村英樹 (90111682)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
7. 能木雅也 (80379031)

# of Collaborated Projects: 1 results

# of Collaborated Products: 2 results
8. 和佐清孝

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
9. WASA Kiyotaka

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results

Horita Susumu 堀田 將

堀田 將 ホリタ ススム

HORITA Susumu 堀田 將

堀田 将 ホリタ ススム

Research Projects

Research Products

Co-Researchers

Significant improvement of electrical properties of low-temperature deposited silica film by annealed at lower than 200oCPrincipal Investigator

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Fabrication of thin-film transistor of crystallized silicon film on cellulose nanopaperPrincipal Investigator

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Control of grain size in a low-temperature-crystallized Si film using seed layerPrincipal Investigator

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Development of New FET-Type Ferroelectric Memory with an Intermediate ElectrodePrincipal Investigator

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Fabrication of single ferroelectric films on silicon substrates by interface controlPrincipal Investigator

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チャネリングイオンを用いた非晶質表面上への二次元人工結晶格子の作製Principal Investigator

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Hoteroepitaxial growth of ferroelectric thin film on Si substrate by controlling the interfacePrincipal Investigator

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酸化銅を用いた高移動度薄膜トランジスタの低温形成

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Heteroepitaxial growth of oxide thin film on Si substrate by controlling the interfacePrincipal Investigator

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Study of high reslution measurement of thin-film-thermal-properties by the ultra-high sensitive PAS

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Evaluation of Multilayer Structure by Using new High Sensitivity PAS

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Development of new method to control composition ratio of alloy film by low temperature, high rate deposition

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[Journal Article] Study on residual OH content in low-temperature Si oxide films after in situ post-deposition heating (PDH)2023

Horita Susumu 堀田將

堀田將ホリタススム

HORITA Susumu 堀田將

堀田将ホリタススム